CN108072171A - The heating unit and semiconductor processing equipment of gas piping - Google Patents

The heating unit and semiconductor processing equipment of gas piping Download PDF

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Publication number
CN108072171A
CN108072171A CN201611025301.5A CN201611025301A CN108072171A CN 108072171 A CN108072171 A CN 108072171A CN 201611025301 A CN201611025301 A CN 201611025301A CN 108072171 A CN108072171 A CN 108072171A
Authority
CN
China
Prior art keywords
flange
heating unit
gas
inner tube
heater element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201611025301.5A
Other languages
Chinese (zh)
Inventor
琚里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Naura Microelectronics Equipment Co Ltd
Beijing North Microelectronics Co Ltd
Original Assignee
Beijing North Microelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing North Microelectronics Co Ltd filed Critical Beijing North Microelectronics Co Ltd
Priority to CN201611025301.5A priority Critical patent/CN108072171A/en
Publication of CN108072171A publication Critical patent/CN108072171A/en
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H3/00Air heaters
    • F24H3/002Air heaters using electric energy supply
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H9/00Details
    • F24H9/0052Details for air heaters
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H9/00Details
    • F24H9/18Arrangement or mounting of grates or heating means
    • F24H9/1854Arrangement or mounting of grates or heating means for air heaters
    • F24H9/1863Arrangement or mounting of electric heating means
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H9/00Details
    • F24H9/20Arrangement or mounting of control or safety devices
    • F24H9/2064Arrangement or mounting of control or safety devices for air heaters
    • F24H9/2071Arrangement or mounting of control or safety devices for air heaters using electrical energy supply
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67069Apparatus for fluid treatment for etching for drying etching
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24HFLUID HEATERS, e.g. WATER OR AIR HEATERS, HAVING HEAT-GENERATING MEANS, e.g. HEAT PUMPS, IN GENERAL
    • F24H2250/00Electrical heat generating means
    • F24H2250/02Resistances

Abstract

The present invention provides a kind of heating unit and semiconductor processing equipment of gas piping, and component and power supply are introduced including heater element, electricity, wherein, heater element uniform winding is on the outer wall of inner tube, to heat the gas in inner tube;Electricity introduces component and is arranged on outer tube and the gas input of inner tube, to by annular gap and extraneous vacuum insulation, and the positive/negative of heater element is electrically connected to a power source.The heating unit of gas piping provided by the invention, can not only improve and inner tube in gas between heat exchanger effectiveness, but also can solve the problems, such as that heat losses are very fast.

Description

The heating unit and semiconductor processing equipment of gas piping
Technical field
The present invention relates to semiconductor processing technology fields, and in particular, to a kind of heating unit of gas piping and partly leads Body process equipment.
Background technology
In semiconductor etching process, the temperature controlled precision of reaction chamber plays etching technics result most important Effect, precision is higher, is more conducive to improve the uniformity of etch rate, and the particle that can reduce reaction chamber side wall sinks Product promotes volatile residue to discharge reaction chamber in time and effectively extends the maintenance period of reaction chamber.Common temperature Prosecutor formula is typically that the side wall of reaction chamber and the temperature of electrostatic chuck are controlled.Also a kind of temperature control mode be to The temperature of the pipeline of conveying process gas is controlled in reaction chamber, and the indoor work of reaction chamber is flowed into so as to accurately control The temperature of skill gas.
Fig. 1 is the connection diagram of existing gas piping.As shown in Figure 1, gas piping 2 respectively with source of the gas 1 and reaction Chamber 4 connects, and is transmitted to by the process gas that source of the gas 1 provides via gas piping 2 in reaction chamber 4.Moreover, in gas piping Electric-heating belt 3, its one end connection AC power 5 are wound on 2, the other end fixes protection by special terminal fixing members 6. When carrying out technique, electric-heating belt 3 heats gas piping 2, so as to the process gas of indirectly heat transmission wherein, so that Process gas reaches required temperature.In addition, the external sheath of electric-heating belt 3 has heat safe foam glass, protected to play The effect of temperature, and coat one layer of mineral wool again in the outer layer of the foam glass and be thermally shielded protection.
In practical applications, since process gas is usually to include special gas, to prevent special gas from leaking, gas Pipeline need to usually use Double layer pipeline.Fig. 2 is the partial sectional view of existing gas piping.As shown in Fig. 2, gas piping 2 wraps Mutually nested outer tube 21 and inner tube 23 are included, wherein, by the process gas that source of the gas 1 provides reaction chamber is delivered to via inner tube 23 In 4.There is annular gap 22 between outer tube 21 and inner tube 23, the pressure of the annular gap 22 less than the pressure in inner tube 23 and Extraneous atmospheric pressure, if so as to the gases did escape in inner tube 23, and enter annular gap 22, by detecting annular gap 22 pressure value, it is possible to find that gas is leaked.
But since electric-heating belt 3 is wrapped on outer tube 21, due to the presence of above-mentioned annular gap 22, cause electric tracing With progress heat exchange is not easy between the gas in 3 and inner tube 23, so as to influence the heating effect of electric-heating belt 3.In addition, by Be directly exposed in electric-heating belt 3 in atmospheric environment, though kept the temperature using foam glass and mineral wool materials at two layers and every Heat, remains on that there are the faster situations of heat losses.
The content of the invention
It is contemplated that at least solve one of technical problem in the prior art, it is proposed that a kind of gas piping adds Thermal and semiconductor processing equipment, can not only improve and inner tube in gas between heat exchanger effectiveness, but also can To solve the problems, such as that heat losses are very fast.
Purpose to realize the present invention and a kind of heating unit of gas piping is provided, the gas piping includes mutually embedding The outer tube and inner tube of set, therebetween with annular gap, the heating unit includes heater element, electricity introduces component and electricity Source, wherein, the heater element uniform winding is on the outer wall of said inner tube, to heat the gas in said inner tube;It is described Electricity introduces component and is arranged on the outer tube and the gas input of inner tube, to by the annular gap and extraneous vacuum insulation, And by the positive/negative of the heater element and the power electric connection.
Preferably, the electricity, which introduces component, includes first flange, two electrical connectors and two sealing rings, wherein, in institute The gas input for stating outer tube and inner tube is provided with second flange, and the second flange is docked with the first flange, and is passed through It is multiple to be bolted;The inner end of described two electrical connectors sequentially passes through the first flange and second flange, and respectively with institute State the anode of heater element and cathode electrical connection;The outer end of described two electrical connectors extends to the external world, and electric with the power supply Connection;Each sealing ring is arranged between the electrical connector and first flange;Alternatively, each sealing ring is arranged on Between the electrical connector and second flange;Alternatively, each sealing ring be arranged on the electrical connector and second flange it Between and the electrical connector and first flange between.
Preferably, the electricity, which introduces component, includes flange, two electrical connectors and two sealing rings, wherein, the flange It is tightly connected simultaneously with the outer tube and the gas input of inner tube;The flange is run through in the inner end of described two electrical connectors, And it is electrically connected respectively with the anode of the heater element and cathode;The outer end of described two electrical connectors extends to the external world, and with The power electric connection;Each sealing ring is arranged between the electrical connector and flange.
Preferably, the flange is tightly connected by the way of welding with the outer tube and the input terminal of inner tube.
Preferably, the heater element includes electric-heating belt or resistance wire.
Preferably, matcoveredn is coated in the outer surface of the heater element, for improving the resistance to height of the heater element Warm nature energy.
Preferably, the protective layer includes mineral wool or mineral wool.
Preferably, the heating unit further includes temperature control unit, adds for controlling to what the heater element exported Thermal power.
Preferably, pressure gauge is provided on the outside of the outer tube, to detect the air pressure in the annular gap.
The present invention also provides a kind of semiconductor processing equipment, including reaction chamber, gas piping and heating unit, wherein, The gas piping includes mutually nested outer tube and inner tube, therebetween with annular gap, and said inner tube be used for Conveying process gas in the reaction chamber;The heating unit is for heating the process gas in said inner tube, institute Heating unit is stated using above-mentioned heating unit provided by the invention.
The invention has the advantages that:
The heating unit of gas piping provided by the invention, by by heater element uniform winding in gas piping In pipe outer wall, i.e. heater element is contacted directly with outer wall of inner tube, can be made direct by outer wall of inner tube by heater element generation heat The gas being transferred in inner tube, so as to improve and inner tube in gas between heat exchanger effectiveness, and then can improve plus The temperature control effect of thermal.Moreover, by the gas input of outer tube and inner tube electricity being set to introduce component, which introduces component For by annular gap and extraneous vacuum insulation, and the positive/negative of heater element is electrically connected to a power source, can not only realize by Electric current introduces heater element, but also can make the heater element being located in annular gap and extraneous vacuum insulation, so as to Heat losses are reduced, improve the efficiency of heating surface.
Semiconductor processing equipment provided by the invention, by using the heating unit of gas piping provided by the invention, The temperature control effect of heating unit can be not only improved, but also heat losses can be reduced, so as to improve the efficiency of heating surface.
Description of the drawings
Fig. 1 is the connection diagram of existing gas piping;
Fig. 2 is the partial sectional view of existing gas piping;
Fig. 3 A are the partial sectional view of the heating unit of gas piping provided in an embodiment of the present invention;
Fig. 3 B are the partial sectional view at the back side of heating unit in Fig. 3 A;
Fig. 3 C are the sectional view of the line A-A along Fig. 3 A;
Fig. 4 is the right view of first flange in Fig. 3 A;And
Fig. 5 is the broken section of the heating unit for the gas piping that a variant embodiment of the embodiment of the present invention provides Figure.
Specific embodiment
For those skilled in the art is made to more fully understand technical scheme, come below in conjunction with the accompanying drawings to the present invention The heating unit and semiconductor processing equipment of the gas piping of offer are described in detail.
Fig. 3 A are the partial sectional view of the heating unit of gas piping provided in an embodiment of the present invention.Fig. 3 B are to add in Fig. 3 A The partial sectional view at the back side of thermal.Fig. 3 C are the sectional view of the line A-A along Fig. 3 A.Fig. 4 is the right side of first flange in Fig. 3 A View.Also referring to Fig. 3 A- Fig. 4, gas piping is used to convey process gas to reaction chamber, outside mutually nested Pipe 7 and inner tube 8, the two coaxial arrangement, and the outer diameter of inner tube 8 is less than the internal diameter of outer tube 7, so as to the shape between outer tube 7 and inner tube 8 Circularize gap 15.The inner tube 8 is connected with reaction chamber, to convey process gas.
Heating unit is for heating the process gas in inner tube 8, so as to fulfill to flowing into the work in reaction chamber The temperature of skill gas is accurately controlled.Specifically, heating unit includes heater element 9, electricity introduces component and power supply 13, In, 9 uniform winding of heater element is on the outer wall of inner tube 8, i.e. heater element 9 is contacted directly with 8 outer wall of inner tube, can make by The heat that heater element 9 generates is transferred directly to gas in inner tube 8 by 8 outer wall of inner tube, so as to improve in inner tube 8 Heat exchanger effectiveness between gas, and then the temperature control effect of heating unit can be improved.Heater element 9 include electric-heating belt or Resistance wire etc. can generate the element of heat.
Electricity introduces component and is arranged on outer tube 7 and the gas input of inner tube 8, to by annular gap 15 and extraneous vacuum every From, and the positive/negative of heater element 9 is electrically connected with power supply 13, electric current is introduced into heater element 9 so as to can not only realize, But also the heater element 9 being located in annular gap 15 and extraneous vacuum insulation can be made, so as to reduce heat losses, carry The high efficiency of heating surface.
In the present embodiment, electricity, which introduces component, includes 11, two electrical connectors (12,16) of first flange and sealing ring 14, Wherein, the gas input of outer tube 7 and inner tube 8 is provided with second flange 10, is docked with first flange 11, and by multiple Bolt 111 connects, as shown in figure 4, multiple bolts 111 are uniformly distributed along the circumferential direction of first flange 111.Moreover, in first flange Be provided with sealing ring (not shown) between 11 and two interfaces of second flange 10, to gap therebetween into Row sealing, so that it is guaranteed that the gas in inner tube 8 will not be leaked between first flange 11 and two interfaces of second flange 10 It goes out.In addition, first flange 11 and second flange 10 are respectively provided with two centre bores 112, the two coaxial arrangement, and with inner tube 8 Inner space be connected, by the way that the connecting line (not shown) of source of the gas is docked with the centre bore 112 of first flange 11, To realize the conveying to gas.In addition, second flange 10 may be employed the mode of welding respectively with outer tube 7 and inner tube 8 Gas input is tightly connected, so that annular gap 15 and extraneous vacuum insulation.
The inner end of two electrical connectors (12,16) sequentially passes through first flange 11 and second flange 10, extends between annular It in gap 15, and is electrically connected respectively with the anode of heater element 9 and cathode (91,92), the outer end of two electrical connectors (12,16) is prolonged The external world is extended, and is electrically connected with power supply 13, so as to fulfill to the circuit turn-on between heater element 9 and power supply 13.In this implementation In example, one of electrode 92 of heater element 9 is all to pass through conducting wire 17 and wherein one because distant with electrical connector 16 A electrical connector 16 is electrically connected, as shown in Figure 3B.Sealing ring 14 is two, and each sealing ring 14 is arranged on electrical connector and first Between flange 11 and between electrical connector and second flange 10, between sealing between electrical connector and first flange 11 Gap between gap and electrical connector and second flange 10, so as to ensure annular gap 15 and extraneous vacuum insulation.It is specific next It says, is respectively correspondingly provided in first flange 11 and second flange 10 along the perforative through hole 113 of its thickness, two through holes 113 coaxial arrangements, and be connected respectively with annular gap 15 and the external world;Each electrical connector passes through the through hole 113, sealing ring 14 The electrical connector is arranged on respectively between first flange 11 and the through hole 113 of second flange 10.Since sealing ring 14 is through the One flange 11 and second flange 10, simultaneously can be by the gap between first flange 11 and two interfaces of second flange 10 Sealing, without separately setting sealing ring, simplifies the structure of heating unit.Certainly, in practical applications, can also only be electrically connected Sealing ring between fitting and first flange is set or sealing ring is set only between electrical connector and second flange, this is similary Annular gap 15 and extraneous vacuum insulation can be realized, in this case it is necessary to sealing ring separately be set, to 11 He of first flange Clearance seal between two interfaces of second flange 10.
Preferably, matcoveredn is coated in the outer surface of heater element 9, for improving the high temperature resistance of heater element 9, The protective layer includes the heat-resisting material of mineral wool or mineral wool etc..Further, since the presence of annular gap 15, fever Element 9 will not be contacted with the tube wall of outer tube 7, so as to so that heater element 9 in annular gap 15 and extraneous vacuum every From, and then heat losses can be reduced, improve the efficiency of heating surface.In this case, it is only necessary to which individual layer is set on heater element 9 Above-mentioned protective layer, without adding other protection materials such as thermal insulation layer again, so as to reduce being manufactured into for heating unit This.
Preferably, heating unit further includes temperature control unit, for controlling the heating power exported to heater element.It is logical The output power of heater element is overregulated, the gas temperature in inner tube can be accurately controlled, so that indoor into reaction chamber Gas reaches required temperature.
Preferably, in order to monitor the situation of gas leakage, the outside of outer tube 7 is provided with pressure gauge, to detect annular Air pressure in gap 15.During technique is carried out, if air pressure is in constant or preset value, judge that there is no gases to leak Situation;If atmospheric pressure value changes, judge that the air pressure in annular gap changes, gas leakage occur, at this time by operating personnel It takes measures on customs clearance to equipment.
As a variant embodiment of the present embodiment, Fig. 5 is what a variant embodiment of the embodiment of the present invention provided The partial sectional view of the heating unit of gas piping.Referring to Fig. 5, the heating unit for the gas piping that this variant embodiment provides With differing only in for above-described embodiment:Above-mentioned second flange is eliminated, and is only set in the gas input of outer tube 7 and inner tube 8 Single flange 18 is put, in other words, flange 18 forms integral structure with outer tube 7 and inner tube 8 respectively.Specifically, flange 18 can be with It is tightly connected respectively with outer tube 7 and the gas input of inner tube 8 by the way of welding, so that annular gap 15 and the external world are true Sky isolation.The 26S Proteasome Structure and Function of two electrical connectors and two sealing rings is similar with above-described embodiment, and details are not described herein.
As another technical solution, the present invention also provides a kind of semiconductor processing equipment, including reaction chamber, gas Pipeline and heating unit, wherein, gas piping includes mutually nested inner and outer tubes, should therebetween with annular gap Inner tube is used to convey process gas into reaction chamber.Heating unit should add for being heated to the process gas in inner tube Thermal employs the heating unit of the gas piping of the above embodiment of the present invention offer.
Semiconductor processing equipment provided in an embodiment of the present invention, by using gas piping provided in an embodiment of the present invention Heating unit, can not only improve the temperature control effect of heating unit, but also heat losses can be reduced, so as to improving plus The thermal efficiency.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses Mode, however the present invention is not limited thereto.For those skilled in the art, the essence of the present invention is not being departed from In the case of refreshing and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.

Claims (10)

1. a kind of heating unit of gas piping, the gas piping includes mutually nested outer tube and inner tube, has therebetween There is annular gap, which is characterized in that the heating unit includes heater element, electricity introduces component and power supply, wherein,
The heater element uniform winding is on the outer wall of said inner tube, to heat the gas in said inner tube;
The electricity introduces component and is arranged on the outer tube and the gas input of inner tube, to the annular gap and the external world is true Sky isolation, and by the positive/negative of the heater element and the power electric connection.
2. the heating unit of gas piping according to claim 1, which is characterized in that the electricity, which introduces component, includes first Flange, two electrical connectors and two sealing rings, wherein, the gas input of the outer tube and inner tube is provided with the second method Orchid, the second flange are docked with the first flange, and are bolted by multiple;
The inner end of described two electrical connectors sequentially passes through the first flange and second flange, and respectively with the heater element Anode and cathode electrical connection;The outer end of described two electrical connectors extends to the external world, and with the power electric connection;
Each sealing ring is arranged between the electrical connector and first flange;Alternatively, each sealing ring is arranged on Between the electrical connector and second flange;Alternatively, each sealing ring be arranged on the electrical connector and second flange it Between and the electrical connector and first flange between.
3. the heating unit of gas piping according to claim 1, which is characterized in that the electricity, which introduces component, includes method Blue, two electrical connectors and two sealing rings, wherein,
The flange is tightly connected simultaneously with the outer tube and the gas input of inner tube;
The flange is run through in the inner end of described two electrical connectors, and is electrically connected respectively with the anode of the heater element and cathode It connects;The outer end of described two electrical connectors extends to the external world, and with the power electric connection;
Each sealing ring is arranged between the electrical connector and flange.
4. the heating unit of gas piping according to claim 3, which is characterized in that the flange is by the way of welding It is tightly connected with the outer tube and the input terminal of inner tube.
5. the heating unit of gas piping according to claim 1, which is characterized in that the heater element includes electric tracing Band or resistance wire.
6. the heating unit of gas piping according to claim 5, which is characterized in that in the outer surface of the heater element Matcoveredn is coated, for improving the high temperature resistance of the heater element.
7. the heating unit of gas piping according to claim 6, which is characterized in that the protective layer include mineral wool or Person's mineral wool.
8. the heating unit of gas piping according to claim 1, which is characterized in that the heating unit further includes temperature Control unit, for controlling the heating power exported to the heater element.
9. the heating unit of gas piping according to claim 1, which is characterized in that be provided on the outside of the outer tube Pressure gauge, to detect the air pressure in the annular gap.
10. a kind of semiconductor processing equipment, including reaction chamber, gas piping and heating unit, wherein, the gas piping bag Mutually nested outer tube and inner tube are included, therebetween with annular gap, and said inner tube is used for into the reaction chamber Convey process gas;The heating unit is used to heat the process gas in said inner tube, which is characterized in that described to add Thermal uses heating unit described in any one of claim 1-9.
CN201611025301.5A 2016-11-16 2016-11-16 The heating unit and semiconductor processing equipment of gas piping Pending CN108072171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611025301.5A CN108072171A (en) 2016-11-16 2016-11-16 The heating unit and semiconductor processing equipment of gas piping

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611025301.5A CN108072171A (en) 2016-11-16 2016-11-16 The heating unit and semiconductor processing equipment of gas piping

Publications (1)

Publication Number Publication Date
CN108072171A true CN108072171A (en) 2018-05-25

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CN201611025301.5A Pending CN108072171A (en) 2016-11-16 2016-11-16 The heating unit and semiconductor processing equipment of gas piping

Country Status (1)

Country Link
CN (1) CN108072171A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113186515A (en) * 2021-05-19 2021-07-30 江苏微导纳米科技股份有限公司 Process pipeline heating device
CN116294215A (en) * 2023-03-29 2023-06-23 绵阳禾本生物工程有限公司 Air heater, stoving hold device
WO2023140983A1 (en) * 2022-01-24 2023-07-27 Lam Research Corporation Multiple-zone gas box block surface heater

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CN103132053A (en) * 2011-11-29 2013-06-05 绿种子科技(潍坊)有限公司 Gas preheating system for chemical vapor deposition
JP2014059022A (en) * 2012-09-19 2014-04-03 Saho Midori Heat insulation support spacer in vacuum heat insulation low temperature equipment
CN205536540U (en) * 2016-01-28 2016-08-31 广东华特气体股份有限公司 High -efficient gaseous heating device

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Publication number Priority date Publication date Assignee Title
US5383984A (en) * 1992-06-17 1995-01-24 Tokyo Electron Limited Plasma processing apparatus etching tunnel-type
CN1573200A (en) * 2003-05-26 2005-02-02 住友电气工业株式会社 Baking method
EP1571390A1 (en) * 2004-03-01 2005-09-07 Nexans Double wall tank with magnetic suspension
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CN202660794U (en) * 2012-06-04 2013-01-09 北京清华阳光能源开发有限责任公司 Built-in through way type solar heat-absorbing pipe
JP2014059022A (en) * 2012-09-19 2014-04-03 Saho Midori Heat insulation support spacer in vacuum heat insulation low temperature equipment
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113186515A (en) * 2021-05-19 2021-07-30 江苏微导纳米科技股份有限公司 Process pipeline heating device
WO2023140983A1 (en) * 2022-01-24 2023-07-27 Lam Research Corporation Multiple-zone gas box block surface heater
CN116294215A (en) * 2023-03-29 2023-06-23 绵阳禾本生物工程有限公司 Air heater, stoving hold device
CN116294215B (en) * 2023-03-29 2023-11-03 绵阳禾本生物工程有限公司 Air heater, stoving hold device

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Application publication date: 20180525