CN108060409A - 一种适用于环形工件的沉积室和化学气相沉积*** - Google Patents
一种适用于环形工件的沉积室和化学气相沉积*** Download PDFInfo
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- CN108060409A CN108060409A CN201711309802.0A CN201711309802A CN108060409A CN 108060409 A CN108060409 A CN 108060409A CN 201711309802 A CN201711309802 A CN 201711309802A CN 108060409 A CN108060409 A CN 108060409A
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- deposition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201711309802.0A CN108060409B (zh) | 2017-12-11 | 2017-12-11 | 一种适用于环形工件的沉积室和化学气相沉积*** |
Applications Claiming Priority (1)
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CN201711309802.0A CN108060409B (zh) | 2017-12-11 | 2017-12-11 | 一种适用于环形工件的沉积室和化学气相沉积*** |
Publications (2)
Publication Number | Publication Date |
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CN108060409A true CN108060409A (zh) | 2018-05-22 |
CN108060409B CN108060409B (zh) | 2020-02-21 |
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CN201711309802.0A Active CN108060409B (zh) | 2017-12-11 | 2017-12-11 | 一种适用于环形工件的沉积室和化学气相沉积*** |
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CN (1) | CN108060409B (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170260A (ja) * | 1983-03-17 | 1984-09-26 | Minolta Camera Co Ltd | 容量結合型グロ−放電分解装置 |
US20050053890A1 (en) * | 2003-03-28 | 2005-03-10 | Asahi Glass Company, Limited | Thermal treatment system for semiconductors |
CN101198719A (zh) * | 2005-06-16 | 2008-06-11 | 京瓷株式会社 | 沉积膜形成方法、沉积膜形成装置、沉积膜及使用其的感光体 |
CN101268538A (zh) * | 2005-08-24 | 2008-09-17 | 肖特股份公司 | 空心体内面的等离子体处理的方法和设备 |
CN101831623A (zh) * | 2010-05-28 | 2010-09-15 | 湖南金博复合材料科技有限公司 | 化学气相增密炉炉膛 |
CN203360573U (zh) * | 2013-07-22 | 2013-12-25 | 湖南顶立科技有限公司 | 一种化学气相沉积*** |
CN104878367A (zh) * | 2015-06-07 | 2015-09-02 | 上海华虹宏力半导体制造有限公司 | 反应腔室以及化学气相沉积设备 |
-
2017
- 2017-12-11 CN CN201711309802.0A patent/CN108060409B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170260A (ja) * | 1983-03-17 | 1984-09-26 | Minolta Camera Co Ltd | 容量結合型グロ−放電分解装置 |
US20050053890A1 (en) * | 2003-03-28 | 2005-03-10 | Asahi Glass Company, Limited | Thermal treatment system for semiconductors |
CN101198719A (zh) * | 2005-06-16 | 2008-06-11 | 京瓷株式会社 | 沉积膜形成方法、沉积膜形成装置、沉积膜及使用其的感光体 |
CN101268538A (zh) * | 2005-08-24 | 2008-09-17 | 肖特股份公司 | 空心体内面的等离子体处理的方法和设备 |
CN101831623A (zh) * | 2010-05-28 | 2010-09-15 | 湖南金博复合材料科技有限公司 | 化学气相增密炉炉膛 |
CN203360573U (zh) * | 2013-07-22 | 2013-12-25 | 湖南顶立科技有限公司 | 一种化学气相沉积*** |
CN104878367A (zh) * | 2015-06-07 | 2015-09-02 | 上海华虹宏力半导体制造有限公司 | 反应腔室以及化学气相沉积设备 |
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Publication number | Publication date |
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CN108060409B (zh) | 2020-02-21 |
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Address after: 410118 Hunan Dingli Technology Co., Ltd., east of Lantian North Road, north of liangtang East Road and west of Shuangtang Road, Xingsha industrial base, Changsha Economic and Technological Development Zone, Changsha City, Hunan Province Patentee after: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. Address before: 410118 Hunan province Changsha City Economic Development Zone Muyun Dingli Science & Technology Park Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |
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CP02 | Change in the address of a patent holder |
Address after: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee after: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. Address before: 410118 Hunan Dingli Technology Co., Ltd., east of Lantian North Road, north of liangtang East Road and west of Shuangtang Road, Xingsha industrial base, Changsha Economic and Technological Development Zone, Changsha City, Hunan Province Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee after: Hunan Dingli Technology Co.,Ltd. Address before: 410199 No. 1271, liangtang East Road, Xingsha industrial base (Changlong Street), Changsha area, China (Hunan) pilot Free Trade Zone, Changsha, Hunan Province Patentee before: ADVANCED CORPORATION FOR MATERIALS & EQUIPMENTS Co.,Ltd. |