CN107993958B - Orthogonality compensation method and compensation system in semiconductor defect detection/photoetching - Google Patents

Orthogonality compensation method and compensation system in semiconductor defect detection/photoetching Download PDF

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CN107993958B
CN107993958B CN201711273529.0A CN201711273529A CN107993958B CN 107993958 B CN107993958 B CN 107993958B CN 201711273529 A CN201711273529 A CN 201711273529A CN 107993958 B CN107993958 B CN 107993958B
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motion platform
horizontal
image acquisition
acquisition device
orthogonality
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CN107993958A (en
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刘庄
刘建明
张彦鹏
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Jiangsu Vision Optoelectronics Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring

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  • Manufacturing & Machinery (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

The invention relates to an orthogonality compensation method and a compensation system in semiconductor defect detection/photoetching, wherein the orthogonality compensation method comprises the following steps: in the process of scanning an object to be detected, acquiring deviation angles of the object to be detected in the horizontal and vertical directions relative to a motion platform, and performing real-time position compensation on the motion platform; according to the method and the system, the obtained horizontal and vertical angle deviation is utilized to perform real-time position compensation on the motion platform in the process of scanning the mask and the wafer, and the method and the system can effectively achieve the purpose of obtaining images of accurate positions in the process of detecting the mask, the wafer and the thin film circuit.

Description

Orthogonality compensation method and compensation system in semiconductor defect detection/photoetching
Technical Field
The invention belongs to the technical field of semiconductor defect detection/photoetching, and relates to an orthogonality compensation method in semiconductor defect detection/photoetching.
Background
In the semiconductor photoetching process, the previous layer image of a mask plate and a wafer needs to be accurately written on the other layer image. In the semiconductor inspection process, images of a mask and a wafer need to be acquired and compared with a design template (such as GDS) to find defects in the images. Even if the orthogonality of the high-precision motion platform is very good, due to the installation deviation of the vacuum chuck device for bearing the mask and the wafer and the deviation angle when the mask and the wafer are placed, images of the motion platform are not orthogonal during scanning, and finally the motion platform is subjected to error detection, namely false defects, due to overlarge deviation.
Disclosure of Invention
The invention aims to provide an orthogonality compensation method and an orthogonality compensation system so as to acquire images of accurate positions of a mask, a wafer and a thin film circuit in a detection process.
In order to solve the above technical problem, the present invention provides an orthogonality compensation method, including:
and scanning the object to be detected to obtain the deviation angle of the object to be detected in the horizontal and vertical directions relative to the motion platform so as to perform real-time position compensation on the motion platform.
Further, in the process of scanning the object to be measured, the method for acquiring the deviation angle of the object to be measured in the horizontal and vertical directions relative to the motion platform and performing real-time position compensation on the motion platform comprises the following steps:
step S1, angle measurement is carried out on the horizontal line and the vertical line of the object to be measured, and first deviation angles of the image acquisition device relative to the horizontal direction and the vertical direction of the object to be measured are obtained;
and step S2, enabling the object to be detected to move at a constant speed, using the image acquisition device to acquire images at the same position, and calculating a second deviation angle between a horizontal line and a vertical line in the images acquired by the linear array camera in the image acquisition device and a horizontal line and a vertical line in the images acquired by the planar array camera in the image acquisition device, so as to obtain an orthogonality compensation parameter of the image acquisition device relative to the object to be detected.
Further, the method for calculating the deviation angle in step S1 includes:
step S11, placing the object to be measured on the motion platform, wherein the motion platform is controlled by the motion platform controller;
step S12, a main control computer sends positioning instructions to the motion platform controller, that is, the main control computer sends positioning instructions to the motion platform controller
The motion platform acts to enable the view field of the image acquisition device positioned above the motion platform to be positioned in an area containing patterns of horizontal lines or vertical lines in the object to be detected, and the current position of the motion platform is calibrated;
step S13, the main control computer sends a positioning instruction to the motion platform controller, namely
Controlling a rotating shaft of the moving platform to rotate so as to rotate a horizontal line or a vertical line in the image acquisition device;
step S14, the main control computer sends a positioning instruction to the motion platform controller, namely
Positioning two horizontal Mark points at the left side and the right side of the object to be detected, moving the Mark points to the center of a view field of the image acquisition device, recording the coordinates (x1, y1) and (x2, y2) of the motion platform of the left Mark point and the motion platform of the right Mark point, calculating the horizontal orthogonality angle theta 1 of the image acquisition device relative to the object to be detected,
θ1=arctan[(y2-y1)/(x2-x1)];
the horizontal orthogonality angle θ 1 is the deviation angle.
Further, the method for obtaining the orthogonality compensation parameter in step S2 includes:
after the motion platform moves at a constant speed to the calibration position in step S12, the synchronization module is triggered to send a pulse signal to the image acquisition device, so that the image acquisition device acquires an image of the current object to be measured, and an angle θ 2 of a horizontal line or a vertical line in the image relative to the horizontal direction or the vertical direction is calculated, which is the second deviation angle, and is used as the orthogonality compensation parameter.
Further, the main control computer sends a positioning instruction to the motion platform controller, namely
And controlling a rotating shaft in the motion platform to rotate theta 2 so as to enable the image acquired by the image acquisition device to be a positive image.
Further, the orthogonality compensation method further includes:
step S3, the main control computer sends a positioning instruction to the motion platform controller, namely
And moving the X axis in the moving platform along the direction of theta 1+ theta 2, and then reciprocating the stepping axis along the stepping direction to realize line-by-line scanning.
In yet another aspect, the present invention further provides an orthogonality compensation system.
The orthogonality compensation system includes:
the motion platform is used for placing an object to be detected and is controlled by a motion platform controller;
the main control machine is suitable for sending a positioning instruction to the motion platform controller;
an image acquisition device is arranged above the motion platform; and
further comprising: a synchronization module connected to the motion platform controller;
the synchronization module is suitable for sending pulse signals for image acquisition to the image acquisition device;
and scanning the object to be detected to obtain the deviation angle of the object to be detected in the horizontal and vertical directions relative to the motion platform so as to perform real-time position compensation on the motion platform.
Further, the main control computer is suitable for measuring the angles of the horizontal line and the vertical line of the object to be measured, and acquiring first deviation angles of the image acquisition device relative to the object to be measured in the horizontal and vertical directions;
and then enabling the object to be detected to move at a constant speed, acquiring images at the same position by using the image acquisition device, and calculating a second deviation angle between a horizontal line and a vertical line in the images acquired by the linear array camera in the image acquisition device and a horizontal line and a vertical line in the images acquired by the planar array camera in the image acquisition device, so as to obtain an orthogonality compensation parameter of the image acquisition device relative to the object to be detected.
Further, the orthogonality compensation system obtains the first deviation angle by performing the orthogonality compensation method of claim 3.
Further, the orthogonality compensation system obtains the orthogonality compensation parameter by performing the orthogonality compensation method of claim 4.
The method and the system have the advantages that the method and the system carry out angle measurement on the horizontal line and the vertical line on the mask plate, the wafer and the thin film circuit (namely the object to be measured), first deviation angles in the horizontal and vertical directions of the image acquisition device relative to the mask plate and the wafer are obtained, then the object to be measured moves at a constant speed, the image acquisition device is used for acquiring images at the same position, a second deviation angle between the horizontal line and the vertical line in the image acquired by the linear array camera in the image acquisition device and the horizontal line and the vertical line in the image acquired by the planar array camera in the image acquisition device is calculated, and further orthogonality compensation parameters of the image acquisition device relative to the mask plate, the wafer and the thin film circuit are obtained. And in the process of scanning the mask and the wafer, carrying out real-time position compensation on the motion platform by using the acquired deviation of the horizontal angle and the vertical angle. The method and the system can effectively acquire the image of the accurate position in the detection process of the mask, the wafer and the thin film circuit.
Drawings
The invention is further illustrated with reference to the following figures and examples.
Fig. 1 is a flow chart of a method in an orthogonality compensation method of the present invention;
fig. 2 is a schematic block diagram of the orthogonality compensation system of the present invention.
In the figure: the device comprises a motion platform 1 and an object 2 to be detected.
Detailed Description
The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic views illustrating only the basic structure of the present invention in a schematic manner, and thus show only the constitution related to the present invention.
Example 1
The embodiment provides an orthogonality compensation method, which includes:
in the process of scanning the object to be detected, the deviation angle of the object to be detected in the horizontal and vertical directions relative to the motion platform is obtained, and real-time position compensation is carried out on the motion platform.
As shown in fig. 1, in the process of scanning the object to be measured, the method for obtaining the deviation angle of the object to be measured in the horizontal and vertical directions with respect to the motion platform and performing real-time position compensation on the motion platform includes:
specifically, in the process of scanning an object to be measured, the deviation angle of the object to be measured in the horizontal and vertical directions relative to the motion platform is obtained; step S1, angle measurement is carried out on the horizontal line and the vertical line of the object to be measured, and first deviation angles of the image acquisition device relative to the horizontal direction and the vertical direction of the object to be measured are obtained;
performing real-time position compensation on the motion platform; and step S2, enabling the object to be detected to move at a constant speed, using the image acquisition device to acquire images at the same position, and calculating a second deviation angle between a horizontal line and a vertical line in the images acquired by the linear array camera in the image acquisition device and a horizontal line and a vertical line in the images acquired by the planar array camera in the image acquisition device, so as to obtain an orthogonality compensation parameter of the image acquisition device relative to the object to be detected.
In this embodiment, the method for calculating the deviation angle in step S1 includes:
step S11, placing the object to be measured on the motion platform, wherein the motion platform is controlled by the motion platform controller;
step S12, a main control computer sends positioning instructions to the motion platform controller, that is, the main control computer sends positioning instructions to the motion platform controller
The motion platform acts to enable the view field of the image acquisition device positioned above the motion platform to be positioned in an area containing patterns of horizontal lines or vertical lines in the object to be detected, and the current position of the motion platform is calibrated;
step S13, the main control computer sends a positioning instruction to the motion platform controller, namely
Controlling a rotating shaft of the moving platform to rotate so as to rotate a horizontal line or a vertical line in the image acquisition device; and whether the figure is rotated can be observed using the image collected using the image collecting means.
Step S14, the main control computer sends a positioning instruction to the motion platform controller, namely
Positioning two horizontal Mark points at the left side and the right side of the object to be detected, moving the Mark points to the center of a view field of the image acquisition device, recording the coordinates (x1, y1) and (x2, y2) of the motion platform of the left Mark point and the motion platform of the right Mark point, calculating the horizontal orthogonality angle theta 1 of the image acquisition device relative to the object to be detected,
θ1=arctan[(y2-y1)/(x2-x1)];
the horizontal orthogonality angle θ 1 is the first deviation angle.
Further, the method for obtaining the orthogonality compensation parameter in step S2 includes:
after the motion platform moves at a constant speed to the calibration position in step S12, the synchronization module is triggered to send a pulse signal to the image acquisition device, so that the image acquisition device acquires an image of the current object to be measured, and an angle θ 2 of a horizontal line or a vertical line in the image relative to the horizontal direction or the vertical direction is calculated, which is the second deviation angle, and is used as the orthogonality compensation parameter.
And, the orthogonality compensation method further includes: the main control machine sends a positioning instruction to the motion platform controller, namely, the main control machine controls a rotating shaft in the motion platform to rotate theta 2, so that the image acquired by the image acquisition device is a positive image.
In this embodiment, the orthogonality compensation method further includes: and step S3, the main control computer sends a positioning instruction to the motion platform controller, namely, the X axis in the motion platform moves along the direction of theta 1+ theta 2, and then the Y axis of the stepping axis moves back and forth along the stepping direction, so as to realize progressive scanning.
In this embodiment, the image capturing apparatus may include: area cameras and line cameras, which can be collectively referred to as cameras in fig. 2, and microscopes or tube mirrors; the motion platform comprises a synchronous axis X, a stepping axis Y and a vertical axis Z; the object to be detected comprises a mask plate and a wafer, and a thin film circuit can be attached.
Example 2
As shown in fig. 2, this embodiment 2 provides an orthogonality compensation system based on embodiment 1.
The orthogonality compensation system includes:
the motion platform is used for placing an object to be detected and is controlled by a motion platform controller;
the main control machine is suitable for sending a positioning instruction to the motion platform controller;
an image acquisition device is arranged above the motion platform; and
further comprising: a synchronization module connected to the motion platform controller;
the synchronization module is suitable for sending pulse signals for image acquisition to the image acquisition device;
in the process of scanning the object to be detected, the deviation angle of the object to be detected in the horizontal and vertical directions relative to the motion platform is obtained, and real-time position compensation is carried out on the motion platform.
Preferably, in this embodiment, the orthogonality compensation system further includes an active focusing device, which is adapted to a real-time focusing function, and the function enables the object to be measured to be located on the focal plane of the image capturing device in real time during the movement process, so that the image capturing device continuously obtains a clear image. The present active focusing device can also be used in the orthogonality compensation method of embodiment 1.
The main control machine is suitable for measuring the angles of the horizontal line and the vertical line of the object to be measured and acquiring first deviation angles of the image acquisition device relative to the horizontal direction and the vertical direction of the object to be measured;
and then enabling the object to be detected to move at a constant speed, acquiring images at the same position by using the image acquisition device, and calculating a second deviation angle between a horizontal line and a vertical line in the images acquired by the linear array camera in the image acquisition device and a horizontal line and a vertical line in the images acquired by the planar array camera in the image acquisition device, so as to obtain an orthogonality compensation parameter of the image acquisition device relative to the object to be detected.
The orthogonality compensation system obtains the first deviation angle by performing the orthogonality compensation method as described in embodiment 1.
The orthogonality compensation system obtains the orthogonality compensation parameter by performing the orthogonality compensation method as described in embodiment 1.
The accurate pattern acquired by the line camera can be used for subsequent detection, such as D2DB (Die to database) detection with GDS pattern and D2D (Die to Die) detection of wafer and thin film circuit.
The orthogonality compensation method and the orthogonality compensation system can utilize an area-array camera to obtain the orthogonality compensation parameters of the line-array camera; and in the semiconductor detection, correct patterns are acquired through orthogonality compensation, and accurate detection is further achieved.
In light of the foregoing description of the preferred embodiment of the present invention, many modifications and variations will be apparent to those skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.

Claims (2)

1. An orthogonality compensation method, comprising:
scanning an object to be detected to obtain deviation angles of the object to be detected in the horizontal and vertical directions relative to the motion platform so as to perform real-time position compensation on the motion platform;
the method for scanning the object to be measured to obtain the deviation angle of the object to be measured in the horizontal and vertical directions relative to the motion platform so as to compensate the position of the motion platform in real time comprises the following steps:
step S1, angle measurement is carried out on the horizontal line and the vertical line of the object to be measured, and first deviation angles of the image acquisition device relative to the horizontal direction and the vertical direction of the object to be measured are obtained;
step S2, enabling the object to be measured to move at a constant speed, collecting images at the same position by using an image collecting device, and calculating a second deviation angle between a horizontal line and a vertical line in the images collected by the linear array camera in the image collecting device and a horizontal line and a vertical line in the images collected by the planar array camera in the image collecting device, so as to obtain an orthogonality compensation parameter of the image collecting device relative to the object to be measured;
the method for calculating the deviation angle in step S1 includes:
step S11, placing the object to be measured on the motion platform, wherein the motion platform is controlled by the motion platform controller;
step S12, a main control computer sends positioning instructions to the motion platform controller, that is, the main control computer sends positioning instructions to the motion platform controller
The motion platform acts to enable the view field of the image acquisition device positioned above the motion platform to be positioned in an area containing patterns of horizontal lines or vertical lines in the object to be detected, and the current position of the motion platform is calibrated;
step S13, the main control computer sends a positioning instruction to the motion platform controller, namely
Controlling a rotating shaft of the moving platform to rotate so as to rotate a horizontal line or a vertical line in the image acquisition device;
step S14, the main control computer sends a positioning instruction to the motion platform controller, namely
Positioning two horizontal Mark points at the left side and the right side of the object to be detected, moving the Mark points to the center of a view field of the image acquisition device, recording the coordinates (x1, y1) and (x2, y2) of the motion platform of the left Mark point and the motion platform of the right Mark point, calculating the horizontal orthogonality angle theta 1 of the image acquisition device relative to the object to be detected,
θ1=arctan[(y2-y1)/(x2-x1)];
the horizontal orthogonality angle θ 1 is the first deviation angle;
the method for obtaining the orthogonality compensation parameter in step S2 includes:
after the motion platform moves to the position marked in step S12 at a constant speed, triggering the synchronization module to send a pulse signal to the image acquisition device, so that the image acquisition device acquires an image of the current object to be measured, and calculating an angle θ 2 of a horizontal line or a vertical line in the image relative to the horizontal direction or the vertical direction, which is the second deviation angle, and which is used as the orthogonality compensation parameter;
the main control machine sends a positioning instruction to the motion platform controller, i.e.
Controlling a rotating shaft in the motion platform to rotate theta 2 so as to enable the image acquired by the image acquisition device to be a positive image;
the orthogonality compensation method further includes:
step S3, the main control computer sends a positioning instruction to the motion platform controller, namely
And moving the X axis in the moving platform along the direction of theta 1+ theta 2, and then reciprocating the stepping axis along the stepping direction to realize line-by-line scanning.
2. An orthogonality compensation system using the orthogonality compensation method of claim 1, comprising:
the motion platform is used for placing an object to be detected and is controlled by a motion platform controller;
the main control machine is suitable for sending a positioning instruction to the motion platform controller;
an image acquisition device is arranged above the motion platform; and
further comprising: a synchronization module connected to the motion platform controller;
the synchronization module is suitable for sending pulse signals for image acquisition to the image acquisition device;
and scanning the object to be detected to obtain the deviation angle of the object to be detected in the horizontal and vertical directions relative to the motion platform so as to perform real-time position compensation on the motion platform.
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CN111025853A (en) * 2019-10-23 2020-04-17 苏州源卓光电科技有限公司 Alignment method and direct-writing photoetching equipment applying same
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