CN107986224A - Large area multilevel surface folding structure and its preparation - Google Patents

Large area multilevel surface folding structure and its preparation Download PDF

Info

Publication number
CN107986224A
CN107986224A CN201711021125.2A CN201711021125A CN107986224A CN 107986224 A CN107986224 A CN 107986224A CN 201711021125 A CN201711021125 A CN 201711021125A CN 107986224 A CN107986224 A CN 107986224A
Authority
CN
China
Prior art keywords
multilevel
large area
cycle
preparation
fold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201711021125.2A
Other languages
Chinese (zh)
Other versions
CN107986224B (en
Inventor
张浩然
刘前
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Center for Nanosccience and Technology China
Original Assignee
National Center for Nanosccience and Technology China
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Center for Nanosccience and Technology China filed Critical National Center for Nanosccience and Technology China
Priority to CN201711021125.2A priority Critical patent/CN107986224B/en
Publication of CN107986224A publication Critical patent/CN107986224A/en
Application granted granted Critical
Publication of CN107986224B publication Critical patent/CN107986224B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B1/00Devices without movable or flexible elements, e.g. microcapillary devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00214Processes for the simultaneaous manufacturing of a network or an array of similar microstructural devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/03Static structures
    • B81B2203/0369Static structures characterized by their profile
    • B81B2203/0392Static structures characterized by their profile profiles not provided for in B81B2203/0376 - B81B2203/0384

Abstract

The present invention provides a kind of large area multilevel surface folding structure, is the multilevel pleated structure with binary cycle, and the wherein cycle of minor cycle fold is 100 200nm, and the cycle of large period fold is 34 μm.The present invention also proposes the preparation method of the large area multilevel surface folding structure.The pleated structure for the multilevel bi-period structure that the present invention is prepared, two sets of folds formation multilevel structure nested against one another, isotropism, the area of multilevel hierarchy can accomplish more than 200mm, have good industrial applicibility.

Description

Large area multilevel surface folding structure and its preparation
Technical field
The invention belongs to multilevel structure material field, and in particular to a kind of organic polymer and the multistage knot of metal composite Structure.
Background technology
Wrinkle is considered as the mark of material failure for a long time as a kind of common natural phenomena.But in recent years, Many researchs find that fold also has in flexible electronic, special surface structure manufacture, thin film mechanical performance measurement etc. and are permitted More positive application.In nature, either in the upper of organism, or on the surface of man-made structures, all there is very much Complicated multilevel surface micro-nano structure.These more secondary structures have many unique surface naturies, such as wetability, adhesiveness With photoelectric properties etc., therefore have in solar cell, LED, activated adoption, self-cleaning surface, surface catalysis etc. extensive Application, have stimulated the methods that researcher constantly explored and developed various new preparation surface multilevel structures.
Typically, pleated structure can be simply by the double-deck membrane body to being made of soft substrate and rigid top layer System applies compression strain to produce.Pleated structure has an eigenperiod, the eigenperiod by materials at two layers thickness and springform Amount determines.Although the pleated structure with binary cycle is also prepared in some researchs, the most complicated difficult of these preparation methods is with reality With.
One layer of metal layer is plated on PDMS after hardening or by forming one layer on surface the methods of UVO (UV ozone) Oxide layer, then discharge strain can produce fold pattern (N.Bowden et al, Nature, 1998,393:146–149). If being strained by first discharging part, then one layer of new top layer film is plated, then discharge residual strain again, can realize two sets of cycles Nested multilevel pleated structure (K.Efimenko et al, Nat.Mater.2005,4,293-297).This kind of method lacks Point is that step is complex, and technique is cumbersome.Also studies have found that, on PDMS surfaces directly by FIB (focused ion beam) direct write, The region of inscription can produce multilevel fold (M.Moon et al, PNAS, 2007,104 (4):1130-1133).It is but more Level fold can only be produced in the local tiny area of inscription, it is difficult to realize that large area is uniformly prepared.In conclusion at present also There is no a kind of simple one step forming method, the uniform more secondary binary cycle surface folding structures of large area can be prepared.
The content of the invention
Part in view of the shortcomings of the prior art, the purpose of the present invention is to propose to a kind of large area multilevel surface folding Structure.
Second object of the present invention is to propose the preparation method of the multilevel surface folding structure.
The technical solution for realizing above-mentioned purpose of the present invention is:
A kind of large area multilevel surface folding structure, is the multilevel pleated structure with binary cycle, wherein minor cycle The cycle of fold is 100~200nm, and the cycle of large period fold is 3~4 μm.
Further, the folded structure is made of metal film on surface and polymeric substrates, the metal film on surface covering In polymeric substrate surface, the metal for forming metal film on surface is the one or more in Au, Ag, Cu, Pt, the polymer matrix Bottom is made of the one or more in dimethyl silicone polymer, thermoplastic polyurethane TPU, thermoplastic polyester elastomer TPEE.
The polymeric base material of this method preferably is PDMS, the english abbreviation of dimethyl silicone polymer.It is with light Learn it is transparent, and under normal circumstances, it is considered to be inertia, it is nontoxic, it is nonflammable.Because its cost is low, using simple, between silicon chip With good adhesiveness, and there is good chemical inertness, become one kind and be widely used in the field such as micro-fluidic Polymeric material.In addition, PDMS, which is also artificial fold, prepares common polymeric base material.
Wherein, the area of the folded structure is 1-1000mm2
Wherein, the thickness of the metal film on surface is 10-50nm.
Preferably, the polymeric substrates are that area is 300-350mm2Regular shape, thickness is 1 ± 0.2mm, surface Thickness of metal film is 25-35nm.So-called regular shape, is one kind in rectangle, square, circle, ellipse, triangle.
The preparation method of large area multilevel surface folding structure of the present invention, comprises the following steps:
Step 1):By pouring into a mould and curing prepares polymer elasticity substrate;
Step 2):With magnetron sputtering metallic film is prepared in the polymeric substrates obtained by step 1) at high temperature;
Step 3):The sample for treating to have sputtered in step 2) is cooled to room temperature to be taken out from sputtering chamber.
Wherein, in the step 1), the mass ratio of polymer body and curing agent is 5:1-40:1, solidification temperature is 50-90 DEG C, the operation of step 2) is carried out when polymer is not fully cured.
Preferably, in the step 1), the mass ratio of polymer body and curing agent is 8:1-12:1, polymer body Stirred 1-10 minutes after being mixed with curing agent, vacuumize the bubble produced to remove in whipping process, pour into plastic containers, it is right In pour into height be 0.5-3mm mixing object amount, cure 0.5-2 it is small when after progress step 2) operation.
Wherein, the step 2) sputter procedure carries out at 200-300 DEG C of temperature.
Sputtering uses higher temperature, this is because PDMS meeting expanded by heating, so as to produce strain, strain is the shape of fold Into necessary condition.
Wherein, in the step 2), polymeric substrates is sticked on substrate and are put into sputtering chamber, first heated the substrate and be allowed to rise Temperature, then passes to argon gas, and pressure when controlling sputtering is 4-6mTorr, sputtering power 100-200W, sputtering time 200- 400s。
The beneficial effects of the present invention are:
The present invention proposes a kind of simple one step forming method, uniformly has multilevel binary cycle knot to prepare large area The pleated structure surface of structure.Metal film on surface is plated using magnetically controlled sputter method, preferably with gold.The metals such as platinum, silver, bucket, its property Stablize, is not oxidizable, and ductility is preferable, and crack is not likely to produce during corrugated.
The pleated structure for the multilevel bi-period structure that the present invention is prepared, two sets of folds formation multilevel nested against one another Structure, isotropism, the area of multilevel hierarchy can accomplish more than 200mm, have good industrial applicibility.
Brief description of the drawings
Fig. 1:The photo of sample with large area multilevel pleated structure surface.Size:16×16×1mm.
Fig. 2:The AFM shape appearance figures on multilevel pleated structure surface.
Fig. 3:The SEM surface topography maps on multilevel pleated structure surface.
Embodiment
Illustrate the performance in terms of material preparation and its separation of the present invention below by way of specific embodiment.People in the art Member is not construed as the concrete restriction to the present invention it will be clearly understood that the embodiment, which is used only for help, understands the present invention.
The raw material used in embodiment is commercially available.Means used in following embodiments are unless otherwise specified Techniques known in the art means.
Experimental example
PDMS (polydimethylsiloxane, dimethyl silicone polymer) body with curing agent be it is purchased in market, body and Curing agent is coordinates.The operation of conventional PDMS is by a certain percentage (10:1) the PDMS bodies and curing agent of mixing, in room Middle benefit gas places two to three days, can be fully cured.Or by heating 4 hours at 80 DEG C or so, it can also be rapidly achieved completely Cure.
By 10:The PDMS bodies and curing agent of 1 mass ratio mixing, place two days or heat four at 80 DEG C at room temperature Hour, the PDMS that can be all fully cured.The PDMS elasticity modulus being fully cured is larger, and Au is deposited on this surface, only meeting Since the thermal dilation difference of PDMS and Au produces the single cycle pleated structure of micro-meter scale.
By thinking and comparing, it is proposed that a kind of simple one step forming method, uniformly has to prepare large area There is the pleated structure surface of multilevel bi-period structure.And PDMS prepared in the present invention is different from a bit of other work It is that PDMS is not fully cured.
Embodiment 1
In this preferred embodiment of the present invention, the cure parameter that uses heats 1 hour for 60 DEG C, and PDMS is not at this time It is fully cured, this is conducive to the generation of binary cycle fold.Specifically experimental method is:A certain amount of PDMS is toppled over into plastic cup Body, then by quality 10:1 ratio instills curing agent, and stirring is allowed to substantially uniformity fusion for 5 minutes.It is subsequently placed into drying box, Vacuumize the bubble produced to remove in whipping process.Taken out after about 10 minutes, pour into a certain amount of body and curing agent Mixing liquid in plastic petri dishes, is stood for a moment, the height poured into is about 1mm.Then put it into baking oven, 60 DEG C of heating 1 it is small when after take out.
The fritter that 16 × 16mm square is cut with blade is treated to use in next step.The size is conducive to binary cycle multilevel fold Formation.It is needing it is noted that PDMS take out after i.e. at once carry out next step operation, if wait time it is too long Words, its curing degree can also change.
Second step is the metal-coated membrane in the PDMS substrates prepared.Used here as Au, it is because Au properties are stablized, is not easy Oxidation, and ductility is preferable, and crack is not likely to produce during corrugated.Plating Au uses magnetron sputtering, and sputter procedure is 250 Carried out at DEG C.Specific sputter procedure and parameter are as follows:The PDMS substrates prepared are sticked on substrate and are put into sputtering chamber, first Heat the substrate and be allowed to be warming up to 250 DEG C, then pass to argon gas, pressure during sputtering is remained 5mTorr, then begin to sputter Process, sputtering power 100W, sputtering time 300s.The Au film thicknesses sputtered under this parameter are about 30nm.It has been sputtered that, sample Product are in intracavitary natural cooling.
3rd step is taken out after sample is cooled to room temperature, and the sample after taking-up is shown in Fig. 1.As can be seen from the figure surface is simultaneously It is equally smoothless like minute surface, but similar frosted glass, illustrate to show there has been pleated structure generation.Pass through further AFM (Fig. 2) Observed with SEM (Fig. 3, right figure are left figure partial enlargements), it can be found that the multilevel pleated structure that there is binary cycle on PDMS surfaces produces It is raw.Wherein larger a set of fold is micro-meter scale, and the cycle is about 3~4 μm;And less a set of fold is nanoscale , the cycle is about 100~200nm.Two sets of folds are nested against one another to form multilevel structure, and is isotropic, takes at random To.
The compacting mechanism of binary cycle multilevel pleated structure is as described below.The machine that the pleated structure of two sets of different cycles is formed Reason is different.Nanoscale fold be due to the ion that is sputtered in magnetron sputtering process for the modifying function on PDMS surfaces and Produce.The cycle of nanoscale fold is unrelated with Au film thicknesses, therefore should not adjust, therefore is fixed as 100~200nm.And Caused by the fold of micro-meter scale is due to then the mismatch of the thermal coefficient of expansion of PDMS and Au.Particularly, PDMS substrates are heated Expansion, plates layer of Au above at this time, treats that sample cools down, PDMS shrinks back original size, and the Au coefficients of expansion compare PDMS It is much smaller, the size same with PDMS can not be returned to, therefore the Au films on top layer can be subject to compression, then produce flexing and formed Fold.The cycle of the pleated structure is related with the elasticity modulus of the thickness of Au and PDMS.It is worth noting that control PDMS bases The size at bottom is 16 × 16mm, thickness 1mm, is provided to produce strain easy to its expanded by heating.If area is too small or thick If degree is too thick, all it is unfavorable for the generation of fold.More importantly in the present invention, the micro-meter scale of suitable period in order to obtain Fold, it is 30nm that we, which control Au film thicknesses, and does not allow PDMS to be fully cured, and controls the elasticity modulus of PDMS to be in a phase To less value.In the case, the fold cycle obtained is larger.The fold Cycle accurate control of micro-meter scale in this patent For 3~4 μm.The purpose of so controlling cycle is in order to allow the periodic inequality of two sets of folds away from an order of magnitude or so, so It can significantly observe that the fold in two sets of cycles is nested against one another, be collectively forming the pleated structure surface of multilevel.
Embodiment 2
In the present embodiment, the cured operation of polymeric substrates is the same as embodiment 1.
The size of the PDMS substrates of cutting is 8 × 8mm, and thickness 1mm, sputtering golden film is 7nm, and the pleated structure of generation is only It is observed that a cycle, is 100-200nm.The fold of the nanoscale is due to the ion pair sputtered in magnetron sputtering process Produced in the modifying function on PDMS surfaces.In this case, the mismatch of the thermal coefficient of expansion of PDMS and Au still remains, but Since golden film is too thin, and PDMS sizes are too small, can not produce the fold of micro-meter scale.
Applicant states that the present invention illustrates the detailed process equipment of the present invention and technological process by above-described embodiment, But the invention is not limited in above-mentioned detailed process equipment and technological process, that is, it is above-mentioned detailed not mean that the present invention has to rely on Process equipment and technological process could be implemented.Person of ordinary skill in the field it will be clearly understood that any improvement in the present invention, The addition of equivalence replacement and auxiliary element to each raw material of product of the present invention, selection of concrete mode etc., all fall within the present invention's Within protection domain and the open scope.

Claims (10)

  1. A kind of 1. large area multilevel surface folding structure, it is characterised in that it is the multilevel pleated structure with binary cycle, its The cycle of middle minor cycle fold is 100-200nm, and the cycle of large period fold is 3-4 μm.
  2. 2. large area multilevel surface folding structure according to claim 1, it is characterised in that the folded structure is by surface Metal film and polymeric substrates are formed, and the metal film on surface is covered in substrate surface, the metal for forming metal film on surface is Au, One or more in Ag, Cu, Pt, the polymeric substrates are by dimethyl silicone polymer, thermoplastic polyurethane TPU, thermoplasticity One or more compositions in polyester elastomer TPEE.
  3. 3. large area multilevel surface folding structure according to claim 1, it is characterised in that the area of the folded structure For 1-1000mm2
  4. 4. according to any one of the claim 1-3 large area multilevel surface folding structures, it is characterised in that the surface gold The thickness for belonging to film is 10-50nm.
  5. 5. according to any one of the claim 1-3 large area multilevel surface folding structures, it is characterised in that the polymer Substrate is that area is 300-350mm2Regular shape, thickness is 1 ± 0.2mm, and surface metal film thickness is 25-35nm.
  6. 6. the preparation method of any one of the claim 1-5 large area multilevel surface folding structures, it is characterised in that including Following steps:
    Step 1):By pouring into a mould and curing preparation polymeric substrates;
    Step 2):With magnetron sputtering metallic film is prepared in the polymeric substrates obtained by step 1) at high temperature;
    Step 3):The sample for treating to have sputtered in step 2) is cooled to room temperature to be taken out from sputtering chamber.
  7. 7. preparation method according to claim 6, it is characterised in that in the step 1), polymer body and curing agent Mass ratio be 5:1-40:1, solidification temperature is 50-90 DEG C, and the behaviour of step 2) is carried out when polymer is not fully cured Make.
  8. 8. preparation method according to claim 6, it is characterised in that in the step 1), polymer body and curing agent Mass ratio be 8:1-12:1, stir 1-10 minutes, vacuumize stirred to remove after polymer body and curing agent mixing The bubble produced in journey, is poured into plastic containers, for pour into height be 0.5-3mm mixing object amount, cure 0.5-2 it is small when after Carry out the operation of step 2).
  9. 9. according to claim 6-8 any one of them preparation methods, it is characterised in that the step 2) sputter procedure is in temperature Carried out at 200-300 DEG C.
  10. 10. according to claim 6-8 any one of them preparation methods, it is characterised in that in the step 2), by polymer matrix Bottom is sticked on substrate and is put into sputtering chamber, first heats the substrate and is allowed to heat up, then passes to argon gas, and pressure when controlling sputtering is 4- 6mTorr, sputtering power 100-200W, sputtering time 200-400s.
CN201711021125.2A 2017-10-26 2017-10-26 Large area multilevel surface folding structure and its preparation Active CN107986224B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711021125.2A CN107986224B (en) 2017-10-26 2017-10-26 Large area multilevel surface folding structure and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711021125.2A CN107986224B (en) 2017-10-26 2017-10-26 Large area multilevel surface folding structure and its preparation

Publications (2)

Publication Number Publication Date
CN107986224A true CN107986224A (en) 2018-05-04
CN107986224B CN107986224B (en) 2019-10-15

Family

ID=62030547

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711021125.2A Active CN107986224B (en) 2017-10-26 2017-10-26 Large area multilevel surface folding structure and its preparation

Country Status (1)

Country Link
CN (1) CN107986224B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110903508A (en) * 2019-12-08 2020-03-24 香港中文大学(深圳) Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN111766001A (en) * 2019-04-01 2020-10-13 天津大学 Micro-wrinkle gold thin film flexible crack sensor with controllable scale
CN111766000A (en) * 2019-04-01 2020-10-13 天津大学 Gold thin film flexible crack sensor based on micro-scale wrinkles
CN114318262A (en) * 2021-12-08 2022-04-12 杭州电子科技大学 Method for preparing multistage micro-nano folded structure

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103204459A (en) * 2013-03-19 2013-07-17 清华大学 Forming method of flexible substrate film surface micro-structure
CN103789741A (en) * 2014-02-20 2014-05-14 苏州华维纳纳米科技有限公司 Method for preparing drape-based metal surface nanostructure
CN104129752A (en) * 2014-07-15 2014-11-05 华中科技大学 Manufacturing method of cross-scale micro-nano folded structure
CN106601933A (en) * 2016-12-12 2017-04-26 吉林大学 Preparation method for stretchable electronic device with regular corrugated structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103204459A (en) * 2013-03-19 2013-07-17 清华大学 Forming method of flexible substrate film surface micro-structure
CN103789741A (en) * 2014-02-20 2014-05-14 苏州华维纳纳米科技有限公司 Method for preparing drape-based metal surface nanostructure
CN104129752A (en) * 2014-07-15 2014-11-05 华中科技大学 Manufacturing method of cross-scale micro-nano folded structure
CN106601933A (en) * 2016-12-12 2017-04-26 吉林大学 Preparation method for stretchable electronic device with regular corrugated structure

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
WILHELM T.S.HUCK,ET AL: ""Ordering of Spontaneously Formed Buckles on Planar", 《LANGMUIR》 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111766001A (en) * 2019-04-01 2020-10-13 天津大学 Micro-wrinkle gold thin film flexible crack sensor with controllable scale
CN111766000A (en) * 2019-04-01 2020-10-13 天津大学 Gold thin film flexible crack sensor based on micro-scale wrinkles
CN110903508A (en) * 2019-12-08 2020-03-24 香港中文大学(深圳) Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN110903508B (en) * 2019-12-08 2022-05-24 香港中文大学(深圳) Stimulus-responsive polymer grafted wrinkled intelligent surface and preparation method and application thereof
CN114318262A (en) * 2021-12-08 2022-04-12 杭州电子科技大学 Method for preparing multistage micro-nano folded structure

Also Published As

Publication number Publication date
CN107986224B (en) 2019-10-15

Similar Documents

Publication Publication Date Title
CN107986224A (en) Large area multilevel surface folding structure and its preparation
CN104379529B (en) Glass and ceramic product and manufacturing method
CN106006546B (en) A kind of method for shifting and controlling nanostructured
CN102794904A (en) Preparation method and application of PDMS (polydimethylsiloxane) surface double-layer selected area wrinkle
CN105731364B (en) PDMS elastomer micro-nano processing method based on surface oxidation control transfer printing
JP2016128799A (en) Method for producing decorated element of timepiece or piece of jewelry and element produced by the same
CN104086791B (en) A kind of optical characteristics controllable shape memory polymer film and preparation method thereof
Morin et al. Graphene transfer to 3-dimensional surfaces: a vacuum-assisted dry transfer method
TW201107109A (en) Method of manufacturing plastic surface with superhydrophobicity and high transparency
CN102795595A (en) Preparation method of wrinkles by combining selected area ultraviolet ozonization and solvent swelling and application thereof
CN104862784B (en) A kind of method for the monocrystal thin films for manufacturing near stoichiometric proportion
CN108817309A (en) A kind of formwork and its manufacturing method of model casting cobalt chrome molybdenum prosthetic joint implants
Pikul et al. Micromechanical devices with controllable stiffness fabricated from regular 3D porous materials
CN102501344A (en) Method for constructing hemocompatible material surface with bionic periodic structure
CN104602910B (en) Decorative glass board with the reflecting layer being deposited on veining base material
CN104733292B (en) Preparing method for ultrathin self-supporting monocrystal barium titanate thin film
CN107993929A (en) A kind of low stress polysilicon membrane production method without blister
CN105603388B (en) A kind of preparation method of long-life pyrolytic boron nitride crucible
TW201002635A (en) Silica glass crucible and method for manufacturing the same
CN106574394A (en) Quartz glass crucible for single crystal silicon pulling and method for producing same
US20090297867A1 (en) Semiconductor thin film-attached substrate and production method thereof
CN1666969A (en) Preparation of high performance glass cladded silicon nitride ceramic by hot isostatic pressing
CN107043471B (en) Method for preparing polymer multilevel pattern through ultrasonic-assisted treatment
Duan et al. Growth and electrical properties of Pb (In0. 5Nb0. 5) O3–PbTiO3 crystals by the solution Bridgman method
JPS5926935A (en) Decoration of glass product by laminating different glass

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant