CN107949484A - Security element with sub-wave length grating - Google Patents
Security element with sub-wave length grating Download PDFInfo
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- CN107949484A CN107949484A CN201680051540.XA CN201680051540A CN107949484A CN 107949484 A CN107949484 A CN 107949484A CN 201680051540 A CN201680051540 A CN 201680051540A CN 107949484 A CN107949484 A CN 107949484A
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- security element
- aperture plate
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- plane
- grating
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- 238000004519 manufacturing process Methods 0.000 claims abstract description 11
- 239000007769 metal material Substances 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims 2
- 229910004205 SiNX Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims 1
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 239000005083 Zinc sulfide Substances 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 239000003086 colorant Substances 0.000 description 5
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- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 4
- 241000209094 Oryza Species 0.000 description 3
- 235000007164 Oryza sativa Nutrition 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 230000018199 S phase Effects 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003459 anti-dromic effect Effects 0.000 description 1
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- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
- B42D25/29—Securities; Bank notes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/351—Translucent or partly translucent parts, e.g. windows
-
- G—PHYSICS
- G07—CHECKING-DEVICES
- G07D—HANDLING OF COINS OR VALUABLE PAPERS, e.g. TESTING, SORTING BY DENOMINATIONS, COUNTING, DISPENSING, CHANGING OR DEPOSITING
- G07D7/00—Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency
- G07D7/003—Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency using security elements
-
- G—PHYSICS
- G07—CHECKING-DEVICES
- G07D—HANDLING OF COINS OR VALUABLE PAPERS, e.g. TESTING, SORTING BY DENOMINATIONS, COUNTING, DISPENSING, CHANGING OR DEPOSITING
- G07D7/00—Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency
- G07D7/06—Testing specially adapted to determine the identity or genuineness of valuable papers or for segregating those which are unacceptable, e.g. banknotes that are alien to a currency using wave or particle radiation
- G07D7/12—Visible light, infrared or ultraviolet radiation
Abstract
The present invention relates to a kind of Security element for being used to manufacture such as banknote, check valuable document, which has：Medium substrate (1)；Period 1 property line grating structure (2), it is embedded in substrate (1), and it is made of multiple first aperture plates (3), first aperture plate (3) extends longitudinally and is arranged in the first plane (L1), therebetween with first grid gap (4)；And the second line grating structure with same period (d), it is embedded in substrate (1), and be made of the second aperture plate (7), second aperture plate (7) extends longitudinally and has second gate gap (8) therebetween；Wherein, second line grating structure (6) is located in the second parallel plane (L2) relative to the first plane (L1) in the top of First Line optical grating construction (2), and it is reversion that wherein the second line grating structure (6), which is formed as relative to First Line optical grating construction (2), so as in the plan of the first plane (L1), second aperture plate (7) is located above first grid gap (4), and second gate gap (8) is located above the first aperture plate (3), wherein described Security element (S) produces color effect when having an X-rayed (T) observation, and the aperture plate (3) of First Line optical grating construction (2) and the aperture plate (7) of the second line grating structure (6) are formed by bilayer respectively, the bilayer is by high refractiveness material layer (3a, 7a) and metal material layer (3b, 7b) form.
Description
Technical field
The present invention relates to a kind of Security element for being used to manufacture such as banknote, check valuable document, which includes：
Medium substrate；Period 1 property line grating structure, it is embedded in the substrate, and by extending longitudinally and being arranged in the first plane
Multiple first aperture plates form, the first grid net has therebetween first grid gap；And second with same period
Line grating structure, it is embedded in the substrate, and the second aperture plate by extending longitudinally is formed, and the second gate net, which has, is located at it
Between second gate gap；Wherein the second line grating structure relative to the first plane above First Line optical grating construction positioned at parallel the
In two planes, and it is reversion that wherein the second line grating structure, which is formed as relative to First Line optical grating construction, so as to the
In the top view that one plane is overlooked, the second aperture plate is located above first grid gap, and second gate gap is located at first grid side on the net.
Background technology
Security element with periodicity line grating is known, such as DE 102009012299 A1, DE
The Security element illustrated in 102009056933 A1 of 102009012300 A1 or DE.If grating profile causes in visible spectrum
There is resonance effects in scope, then these Security elements can have colour filter characteristic in the range of sub-wavelength.It is known that reflection and thoroughly
Penetrating sub-wavelength structure has this colour filter characteristic.Reflection or transmission of the structure to incident ray have very strong polarization shadow
Ring.Color depends greatly on reflection or the transmission angle of this sub-wave length grating.But if incident light is unpolarized
Light, then the color saturation of these gratings can significantly weaken.
If grating profile causes resonance effects occur in visible wavelength range, One Dimension Periodic grating is in sub-wavelength model
There can be colour filter characteristic in enclosing.The colour filter characteristic depends on the angle of incident light.
3248899 C2 of DE illustrate a kind of sub-wavelength structure having with the relevant colour filter characteristic of angle.The grating
With rectangular cross section, and deposition has high refractiveness (HRI) layer on it, wherein, for refractive index：nHRI>n2And n1≈
n2≈n3.Color change occurs with the change of angle Θ.If grating vertically tilts (Θ relative to plane of incidence>0°；Φ
=90 °), then color is held essentially constant.Angle, φ refers to azimuth.It is the anti-of title sale with DID (" diffraction identification device ")
Pseudo- element is based on the structure, and utilizes and reflect colour filter characteristic.But it is the need for light absorbs substrate and can just discover color effect.
WO2012/019226A1 illustrates a kind of same coining sub-wave length grating with rectangular profile, the sub-wavelength light
Grid voltage is imprinted on the platform being made of metallic particles or metal nanoparticle.The grating shows color effect in transmitted light
Or polarization effect.
Moreover it is known that sub-wave length grating be with the relevant color filtering mean of angle, it has metal or the semimetal double-deck
Construction, such as " the Compact Color Filter and Polarizer of of DE 102011115589 A1 or Z.Ye et al.
Double layer Metallic Nanowire Grating Based on Surface Plasmon Resonances (bases
In the compact filter of double-level-metal nanometer line grating and polariscope of surface plasma body resonant vibration) ", Plasmonics, 8,555-
Sub-wave length grating described in 559 (2012) patent documents, wherein, the coat of metal is realized by gas deposition, and is embedded in Jie
In matter.It is based on having in the method described in the document DE102011115589A1 of Security element as characterized above that discloses
The construction of two line gratings of same period, the line grating offset relative to each other half period, and by metal or semimetal
Line (such as zinc sulphide that thickness is 70 nanometers) is formed.
This known sub-wavelength structure of vulcanization zinc coating with about 70 nano thickness is adapted as reflection colour filter
Device.Therefore, which must be additionally applied to realize enough colour contrasts in light absorbs substrate, then could be
See in reflected light.Sub-wave length grating with the coat of metal shows higher color saturation in transmitted light.Due to gold
Optical absorption in category, therefore they seem dark.
Plasma resonance effect can be caused by being coated with the sinusoidal pattern grating of thin metal film.It is saturating that the resonance causes TM to polarize
Penetrating property improves, and refer to document " the Spatially and Polarization Resolved Plasmon of Jourlin et al.
Mediated Transmission through Continuous Metal Films (space and polarization in continuous metal film
Differentiate the transmission of plasmon intermediary) "；Opt.Express 17,12155-12166 (2009).This effect can be by attached
The film dielectric layer added further optimizes, such as " the High Plasmonic Resonant Reflection in T.Tenev et al.
and Transmission at Continuous Metal Films on Undulated Photosensitive
Polymer (high beta plasma resonant reflection at continuous metal film and transmission on uneven photosensitive polymer) ",
Explanation in Plasmonics (2013) document.The Security element illustrated in WO2012/136777A1 is based on this optical effect.
WO2014/033324A2 equally illustrates a kind of based on sub-wave length grating and to show and the relevant color of angle
Transmit Security element.It has been discussed in more detail in the document special with the optics of the sinusoidal pattern grating of high refractive Iy coating
Property.
The known two-dimensional and periodic sub-wave length grating with discontinuous surface shows colour filter characteristic, but with very big
Angular tolerance.Therefore when tilting, its tone is almost unchanged.
The content of the invention
It is therefore an object of the present invention to propose a kind of Security element, which shows with inclination in observation
And the excellent color effect changed.
According to the present invention, above-mentioned purpose by it is a kind of be used for manufacture such as banknote, check valuable document Security element come
Realize, which includes：
- medium substrate,
- period 1 property line grating structure, it is embedded in the substrate, and flat by extending longitudinally and being arranged in first
Multiple first aperture plates in face are formed, and the first grid net has therebetween first grid gap, and
- the second line grating structure with same period, it is embedded in the substrate, and second by extending longitudinally
Aperture plate is formed, and the second gate net has therebetween second gate gap,
- wherein the second line grating structure relative to the first plane above First Line optical grating construction it is flat positioned at parallel second
In face, and
It is reversion that-wherein the second line grating structure, which is formed as relative to First Line optical grating construction, so that in the first plane
Plan in, the second aperture plate is located above first grid gap, and second gate gap be located at the first grid on the net just, wherein
- the Security element to producing color effect during its fluoroscopic observation, and
The aperture plate of-First Line optical grating construction and the aperture plate of the second line grating structure are formed by bilayer respectively, and the bilayer is by height
Refractiveness material layer and metal material layer composition.
The high refractiveness material is preferably medium or semiconductor, such as silicon (Si), germanium (Ge), carbon (C).
According to the present invention, using the two-wire grating by line grating structure composition, the line grating structure is with complimentary to one another
Mode (that is, offsetting relative to each other) is stacked up and down in two planes.90 ° of phase shifts are ideal values, this must manufactured certainly
Consider under the background of precision.Due to manufacturing tolerance, the deviation of possibility generation herein and complementary (i.e. 90 ° of phase shifts).In addition, rectangle
Profile possibly can not be formed ideally, but by trapezoidal profile come approximate, parallel edges is shorter than lower parallel edges thereon.With square
In the case of the line grating structure of shape cross section, phase shift corresponds to half period.
Line grating structure is made of the combination of high refractive media or semi-metallic layer and metal layer.The thickness of aperture plate is small
In modulation depth, i.e. less than the interplanar spacing of line grating structure, because without producing close membrane.Therefore, first and second planes
Spacing be more than (the first layer thickness of 0.5x) and (the second layer thickness of 0.5x) and.
It turns out that in perspective, the grating of this structure is unexpectedly provided reproducible when tilting and easily examined
The color effect of feel.
The Security element can simply be fabricated to layer structure in the following way：A basic unit is provided first, at this
Bilayer formed with First Line optical grating construction in basic unit.Apply dielectric interlayer in the basic unit, dielectric interlayer covering the
One line grating structure, and it is thicker than the aperture plate of First Line optical grating construction.Then the second line grating knot of offset can be formed on
Structure, and substrate is improved with dielectric passivation, line grating structure is embedded in the substrate.Alternately, can also be situated between first
(such as coining) sub-wave length grating is formed in matter substrate, the cross section of the sub-wave length grating has rectangular profile.If using institute
State the vertical coating of material (such as passing through vapour deposition) of bilayer, then double-deck, so meeting can be produced on platform and in groove
Form the first and second aperture plates.As a result, the first and second required aperture plates are formed in different planes.
If vertical interval (that is, the modulation depth of structure) between the first and second aperture plates 100 nanometers and 500 nanometers it
Between, then it can obtain especially good color effect.The measurement of spacing is based on two planes, the two planes for example can be by the first He
The surface (that is, such as on the downside of aperture plate or the surface of the upside of aperture plate) of the identical direction of second line grating structure limits.
This, vertical interval certainly should be perpendicular to plane survey, i.e. it indicates the identical difference in height towards between surface of aperture plate.
Appropriate high refractiveness material for double-deck aperture plate is that have higher refraction compared with substrate around (i.e. base material)
Rate (all material of especially at least high 0.3).Sequence in bilayer is inessential；First and second line grating structures
Sequence can not also be same.
The Security element shows and the relevant colour filter characteristic of angle in fluoroscopic observation.If grid stroke enters perpendicular to light
Face is penetrated, then this angle-dependence is especially apparent.The pattern of multiple color can be produced using the colour filter characteristic so that they
As rotation position changes its color, or different effects is presented in planar tilt.It is therefore preferable that in the plan of plane
At least two regions of middle offer, wherein line grating structure it is longitudinally opposed in angled each other, it is particularly at a right angle.Hanging down
When intuitively examining, it can produce and consistent color is presented and does not have the pattern of more structures in right-angle view.Tilting, this is false proof
During element, the color of a region (such as background) can become different in the color in another region (such as pattern).
It is, of course, also possible to expect that there is the embodiment in the region arranged multiple and differently.For example, it is proposed that a kind of improve
Structure, the improved structure have multiple regions in Security element, wherein, direction and/or linear light of the regional in grid stroke
It is different from each other in terms of the cycle of grid structure.Pattern with different color effect when thus may be provided in fluoroscopic observation.
It is to be understood that without departing from the scope of the present invention, features described above and the feature that needs to be explained not only can be by
It is defined to be applied in combination, also it can be applied in combination or be used alone by different.
Brief description of the drawings
The present invention is described in more detail below with reference to accompanying drawings, attached drawing also discloses feature essential to the invention.Attached
In figure：
Fig. 1 is the sectional view of the Security element with two-wire grating, wherein each line grating has the grid being made of bilayer
Net；
Fig. 2 a-b show that the spectrum of the reflectivity and transmissivity of the Security element in Fig. 1 when viewing angle changes relies on
Property；
Fig. 3 a-b show the spectrum of the reflectivity and transmissivity of the Security element in Fig. 1 when modulation depth h changes according to
Lai Xing；
Fig. 4 a-b show false proof in Fig. 1 for the combination of materials different from Fig. 3 a-b when modulation depth changes
The spectral dependency of the reflectivity and transmissivity of element；
Fig. 5 shows the anti-of in double-deck thickness change Security element for different viewing angles in Fig. 1
Penetrate the colour in the LCh color spaces of rate and transmissivity；
Fig. 6 a-b show 1931 colors of CIE of the reflectivity and transmissivity of the Security element in Fig. 1 in layer thickness variation
Figure；
Fig. 7 a-b show the Security element for the thickness different from Fig. 6 a-b in Fig. 1 when viewing angle changes
Reflectivity and transmissivity 1931 chromatic graphs of CIE；
Fig. 8 a-b show the Security element for the thickness different from Fig. 7 a-b in Fig. 1 when viewing angle changes
Reflectivity and transmissivity 1931 chromatic graphs of CIE；
Fig. 9 a-b show a kind of two plans of Security element, which is configured with the grating of Fig. 1
Pattern, but the direction of grating is different；And
Figure 10 a-b show another Security element embodiment similar with Fig. 9 a-b.
Embodiment
Fig. 1 show in cross section the Security element S with two-wire grating, which is embedded in the substrate, and by
Two line grating structures 2,6 form.Substrate includes medium carrier 1, on the medium carrier 1, be arranged in plane L1 first
Line grating structure 2 is incorporated in dielectric layer (such as imprinting enamelled coating).First Line optical grating construction 2 is by the first aperture plate 3 with width b
Form, which extends along longitudinal direction (that is, perpendicular to the direction of paper).There is first grid gap 4 between the first aperture plate 3, should
First grid gap 4 has width a.
Each aperture plate 3 is made of bilayer, and the bilayer is by the high-refraction material 3a with thickness t4 and with thickness t2's
Metal material 3b is formed.Therefore, the thickness (being measured perpendicular to plane L1) of the first aperture plate 3 is t2+t4.Above the first aperture plate 3
Height h at, have the second line grating structure 6 in plane L2, it has the second aperture plate 7, and the second aperture plate 7 is equally by double-deck structure
Into the bilayer is made of the high refractiveness material 7a with thickness t3 and the metal material 7b with thickness t1.Second aperture plate 7
With width a.Second line grating structure 6 forms in plane L2 relative to 2 phase shift of First Line optical grating construction, so that the second aperture plate
7 are stacked on first grid gap 4 (under the background of the accuracy of manufacture) as accurately as possible.Meanwhile between the second aperture plate 7
Second gate gap 8 is in the top of the first aperture plate 3.
The thickness t2+t4 of first aperture plate 3 is less than height h, thus aperture plate 3 and 7 will not form continuous film layer.Height h is represented
The modulation depth of optical grating construction.
In the schematic sectional view of Fig. 1, the width b of the first aperture plate 3 is equal to the width a of the second aperture plate 7.Therefore, for
For cycle d, the occupation efficiency in each line grating structure is 50%.But this is not essential.Can according to formula b+a=d into
Any desired change of row.
In addition, in the schematic sectional view of Fig. 1, thickness is t2=t4 and t1=t3, and (t2+t4)=(t1+t3).
This is favourable for simplifying production, but is not absolutely essential.
Modulation depth h (that is, between 2 and second line grating structure 6 of First Line optical grating construction difference in height (with plane L1 and
The spacing of L2 corresponds to)) it is more than the sum of thickness of the first aperture plate 3 and the second aperture plate 7, therefore between two line grating structures 2 and 6
There are the vertical interval that size is h- (t2+t4).Optical grating construction can be considered to have same profile and h- (t2+ apart
T4 two line gratings construction).
Aperture plate 3,7 in all embodiments is all formed by bilayer, and the bilayer is by high refractiveness, medium or semimetal material
Expect that 3a, a and metal material 3b, 7b are formed.High refractiveness material has refractive index nHRI, and surrounded by medium, the medium is specific
For be dielectric interlayer 5 and dielectric passivation 10.In fact, the refractive index of these adjacent materials usually not what difference,
And about n1.The refractive index n of high refractiveness materialHRIThe refractive index of projecting material, for example, by for absolute value at least
It is high by 0.3.
The Security element S of Fig. 1 reflects incident radiation E in the form of reflected radiation R.Moreover, a part is radiated to transmit spoke
Penetrate the form transmission of T.Transmission and reflection characteristic depends on incidence angle Θ, as described below.
For example, then Security element S can be applied intermediate layer 5 on the carrier 1 by first applying First Line optical grating construction 2
It is added on First Line optical grating construction 2 to manufacture.Then the second line grating structure with the second aperture plate 7 can be incorporated into grid gap
In 4, the grid gap 4 shown here is upward.Coating 10 covers Security element.The refractive index of layer 5 and 10 and carrier 1 is one
It is essentially identical in a little embodiments, and for example can be n1=1.5, particularly 1.56.
Size b, a and t1 are to t4 in the range of sub-wavelength, i.e. less than 300 nanometers.Modulation depth preferably at 100 nanometers and
Between 500 nanometers.
Following manufacture method can also be used：First rectangular raster is produced in the upside of carrier 1.In other words, 1 structure of carrier
Make as so that the groove with width a is alternately arranged with the aperture plate with width b.Then by vapour deposition mode in structuring
Required coating is provided in substrate, so as to form the first and second line gratings and the first and second line grating structures.In vapour phase
After deposition, said structure is finally covered with coating.Substantially there is the layer knot of identical refractive index this generates the upper side and lower side
Structure.
Structured substrate can be obtained by different modes.A kind of scheme is replicated using mother matrix.Master mold is for example reproducible
In UV enamelled coatings on film (such as PET film).This provides the substrate 1 as dielectric material, the dielectric material for example with
1.56 refractive index.Alternately, hot stamping can also be used.
Mother matrix or substrate can be manufactured using electron beam device, focused ion beam or using interference light lithography in itself, and
Structure is write in photoresist and is then developed.
The structure of the mother matrix manufactured by photoetching process can be etched into quartz substrate in a subsequent step, to the greatest extent may be used with being formed
The vertical outline side of energy.Then quartz wafer is used as preformed member, and can for example be replicated in photosensitive resin
In Ormocer, or replicated by electroforming.It can also utilize galvanoplastic in Ormocer or nickel material to passing through photoetching
The prototype that mode manufactures carries out straight forming.Nano-imprint method can also be begun through from homogeneous grating mother matrix and is formed has
The pattern of different optical grating constructions.
This manufacture method of sub-wavelength grate structure and the pattern being made of different sub-wavelength structures is art technology
Known to personnel, such as the manufacture method described in DE102011115589A1.The content in this respect of the document integrally combines
Herein.
Below will be with aluminium and high refractiveness material cures zinc (ZnS) and titanium dioxide (TiO2) exemplified by discuss Security element
Optical characteristics in visible wavelength region.Adjacent material is the polymer of the refractive index with n=1.52.Herein it is also assumed that grid
The geometric profile of net is rectangle.What is occurred in practical applications is (such as trapezoidal with the little deviation of this preferably rectangular shape
Shape) optical appearance is had no significant effect, and the result similar with rectangular raster can be obtained.Fig. 2 a and Fig. 2 b show tool
There is the light of tA1=30 nanometers and tZnS=160 nanometers of d=360 nanometers, h=220 nanometers, b=180 nanometers of parameter and coating
The spectral reflectivity (Fig. 2 a) and transmissivity (Fig. 2 b) of grid.Incident light is non-polarized light.
Fig. 2 a show reflectivity (y-axis) and wavelength (x-axis) at different incidence angles (specifically 0 °, 15 ° and 30 °)
Functional relation.Fig. 2 b similarly illustrate transmissivity.Incidence angle Θ is defined in Fig. 1.
For the vertical incidence of light, spectral reflectivity is shown has two significant paddy in 404 nanometers and 672 nanometers
Point, wherein long wave valley point are spike in transmitted spectrum.As incidence angle increases, which can move into long wave limit, and
With there are other spikes in the transmitted spectrum depending on the dispersion of angle.
Fig. 3 a and 3b are related to influences of the modulation depth h to transmitted spectrum.The figure shows in light vertical incidence (Fig. 3 a)
There is coating t with (Fig. 3 b) during incidence angle Θ=30 °Al=30 nanometers and tZnS=140 nanometers of grating is in visible-range
The functional relation of transmissivity and wavelength.Modulation depth changes between 180 nanometers and 240 nanometers.For vertical incidence, can see
To three spikes, the explicitly at two of which shortwave peak is significantly affected by modulation change in depth.The intensity at blue peak carries strongly
Height, and move into green, and the intensity of the spike of 560 nanometers of wavelength significantly reduces.For incidence angle Θ=30 °, modulating
When depth h changes, it is seen that the position of the spike in optical range is almost unchanged.The grating has d=360 nanometers of parameter, b=180
Nanometer and coating tAl=30 nanometers and tZnS=140 nanometers, it is embedded in n=1.52 and modulation depth h=180 nanometers -240 is received
In the medium of rice.
Fig. 4 a and 4b are related to influence of the high refractiveness material to grating diffration behavior.The figure shows the ginseng with Fig. 3
The transmitted spectrum of several gratings, but coating has 140 nano thickness, and be titanium dioxide (TiO2), rather than zinc sulphide
(ZnS).Blue component in spectrum dramatically increases, because TiO2Absorptivity in blue spectrum is much lower.In addition, red model
Transmissivity in enclosing raises on the whole.For Θ=30 °, the resonance in this wave-length coverage is weaker, this also causes relatively low light
Absorb.
In order to study color characteristics of the Security element in LCh color spaces, transmission or reflection spectrum and D65 are marked
Quasi-optical launching curve and the susceptibility of human eye carry out process of convolution, and calculate color coordinates X, Y, Z.D65 illuminations are roughly the same
In daylight.XYZ coordinate is then converted into color value LCh.These values can directly with the colour vision of observer human color vision's phase
Association：
L*:Brightness,
C*:Colourity (=color saturation), and
h°:Tone.
Fig. 5 shows and is received at incidence angle Θ=0 ° and 30 ° with d=360 nanometers of parameter, h=210 nanometers, b=180
The thickness t3=t4 of the LCh chromatic graphs (left side is reflectogram, and right side is transmission plot) of the Security element of rice and vulcanization zinc coating 3a, 7a
Relation.From figure, it can be seen that when tilting (that is, when changing in angle Θ), about 160 nanometers of zinc sulphide thickness
Make transmission colourity that especially strong change occur.On the other hand, tone is improved with the increase of thickness.
The value of Fig. 5 is converted into x, y color coordinates, and is shown in Fig. 6 a, 6b in 1931 color spaces of CIE.White point
It is marked as " WP ".Triangle limits the color region that can usually show by screen.Color coordinates is being schemed in the form of track
In show.The endpoint that tZnS=200 nanometers of thickness is represented with point symbol.In reflected light, due to the change of the thickness of zinc sulphide
Change, tone can change.From when tilting to 30 ° for 0 °, color can change between yellow and red.On the other hand, saturating
Penetrate in light, the cure change of zinc thickness of a large area of color space is covered.Although 102011115589 A1 of DE
In the aluminium grating without additional vulcanization zinc coating can present from yellow to carmine color shift effects, but received with 180
In the grating of rice vulcanization zinc coating, these colors actually occur in reverse order.
For being embedded in the medium of n=1.52, have d=360 nanometers of parameter, h=220 nanometers, b=180 nanometers with
And thickness tAl=30 nanometers and tZnS=160 nanometers of Security element, shows reflection colour characteristic in Fig. 7 a, and shows in Fig. 7 b
Transmitted colors figure is gone out.Fig. 7 a, 7b show reflection (Fig. 7 a) and transmit 1931 color diagrams of CIE of (Fig. 7 b), and wherein color is matched somebody with somebody
Lining property is drawn as the function of the incidence angle Θ from 0 ° to 30 °.Here, it have studied the photograph of the Security element of the sequence with Fig. 1
The illumination of Security element bright and with opposite sequence (equivalent to from antidromic illumination).The track above illuminated is labeled as " V ", after
The relative trajectory of face illumination is labeled as " R ".It should be noted that due to the invertibity of light path, the transmission of both of these case is phase
With.In transmitted light, the notable color shift effects from blueness to green occur.In reflected light, color change is substantially weaker.But
It is that reflection colour above is significantly different with below.When using this optical grating construction as anti-counterfeiting characteristic, this effect is also
Strengthen antifalsification.
Fig. 8 a and 8b show the x of the Security element similar with Fig. 7 a and 7b, y color coordinates, but the Security element has
There is different grating parameters.Data equally reflect and transmitted colors figure in show as the function of -30 ° of incidence angle Θ=0 °.
Compared with Fig. 7 a and 7b, screen periods are d=320 nanometers herein.Ratio b/d is equally 0.5.Thickness is tAl=30 nanometers and
tZnS=120 nanometers.In reflected light, when tilting, green tone is almost unchanged.It mainly changes color saturation.But
In transmitted light, tone is changed into blueness from red, and color saturation is very high.With the Security element of Fig. 7 on the contrary, herein, it can be seen that
, can be with selective transmission light due to the change (the particularly change of the thickness and screen periods of high refractiveness layer) of grating parameter
Tilt color.
Due to not changing colour when being tilted perpendicular to the plane of incidence, graphic designs can be carried out to anti-counterfeiting characteristic, made
It is invisible in right-angle view to obtain pattern 15, and only just shows when tilting.This can be by rotate relative to one another 90 °
Mode arranges two grating regions 14,15 with identical grating profile to realize.This arrangement shape is shown in Fig. 9 a and 9b
Formula.
The grid stroke of formation background in region 14 extends vertically, and the grid stroke level of the formation pattern in region 15 is prolonged
Stretch.When around transverse axis Security element, pattern can show.What more directions in region were also able to think.Due to area
The direction in domain is subtly incremental, therefore can also for example form movement effects in transmission.For in this respect, such as can join
Examine 102011115589 A1 of DE.Further, it is also possible to come using the region with differently contoured (such as cycle of optical grating construction)
Form pattern.
Moreover, metal layer or high refractiveness layer can not be formed on whole area, and only in specific grating region
Formed.Figure 10 a and Figure 10 b show butterfly and digital " 12 " pattern, wherein the square area around digital " 12 " does not include
Additional high refractiveness coating (region 16 in Figure 10 b).In right-angle view, butterfly and digital " 25 " pattern are can't see, but
Region 16 and 17 shows different colors.When tilting, it can additionally show pattern.
The Security element can be used as the see-through window in banknote.Can also partly chromatography color.Can also partly it go
Removed except double-deck one or two kinds of materials, such as using ultrashort pulse by laser irradiation.It is transparent with high refractiveness
The combination of hologram is also possible.This hologram is alternatively arranged as reflectance signature.A part of Security element S, which can be located at, to be absorbed
In substrate so that the part is used only as reflectance signature, and with another part being located in see-through window region of Security element S
Present a contrast.
The Security element is particularly used as the see-through window in banknote or other valuable documents.Can also part be carried out to it
Ground chromatography color, alternatively, the coat of metal of grating region can be removed partly, or is designed without linear light by grating region
Grid, so that this region is covered with the coat of metal completely.Combination with diffraction grating structure (such as hologram) is also to set
Find out.
Label list
1 carrier or substrate
2 First Line optical grating constructions
3 first aperture plates
3a high refractiveness materials
3b metals
4 first grid gaps
5 intermediate layers
6 second line grating structures
7 second aperture plates
7a high refractiveness materials
7b metals
8 second gate gaps
10 coatings
14-17 regions
H modulation depths or height
T1, t2, t3, t4 thickness of coating
A, b aperture plate and grid gap width
The d cycles
S Security elements
L1, L2 plane
E incident radiations
R reflected radiations
T transmitted radiations
Θ incidence angles
Claims (9)
1. a kind of manufacture such as banknote, the Security element of check valuable document, Security element of being used for includes：
- medium substrate (1),
- period 1 property line grating structure (2), it is embedded in substrate (1), and by extending longitudinally and being arranged in the first plane
(L1) multiple first aperture plates (3) in are formed, and first aperture plate (3) has therebetween first grid gap (4), and
- there is the second line grating structure (6) of same period (d), it is embedded in substrate (1), and the by extending longitudinally
Two aperture plates (7) are formed, and second aperture plate (7) has therebetween second gate gap (8),
- wherein the second line grating structure (6) is relative to the first plane (L1) in First Line optical grating construction (2) top positioned at parallel
In second plane (L2), and
It is reversion that-wherein the second line grating structure (6), which is formed as relative to First Line optical grating construction (2), so that flat first
In the plan in face (L1), the second aperture plate (7) is located above first grid gap (4), and second gate gap (8) is located at the first aperture plate
(3) top,
It is characterized in that：
- Security element (S) produces color effect when having an X-rayed (T) observation to it, and
The aperture plate (3) of-First Line optical grating construction (2) and the aperture plate (7) of the second line grating structure (6) are formed by bilayer respectively, should
Bilayer is made of high refractiveness material layer (3a, 7a) and metal material layer (3b, 7b).
2. Security element as claimed in claim 1, wherein, the high refractiveness material (3a, 7a) has than substrate around (1)
Refractive index at least high 0.3 refractive index.
3. the Security element as described in one of the claims, wherein the cycle (d) is 200-700 nanometers.
4. the Security element as described in one of the claims, wherein the high refractiveness material (3a, 7a) is selected from：Si、Ge、
C、ZnS、ZnO、ZnSe、SiNx、SiOx、Cr2O3、Nb2O5、Ta2O5、TixOxAnd ZrO2, and wherein the metal material (3b,
7b) it is selected from：Al, Ag, Au, Cu, Cr and its alloy.
5. the Security element as described in one of the claims, wherein the spacing (h) between the plane (L1, L2) is 100
Nanometer is to 700 nanometers.
6. the Security element as described in one of the claims, wherein, in the top view overlooked to the plane (L1), institute
Stating Security element (S) has at least two regions (14,15), and the cycle (d) in the region is different.
7. the Security element as described in one of the claims, wherein, in the top view overlooked to the plane (L1), institute
Stating Security element (S) has at least two regions (14,15), and the direction of the aperture plate (3,7) in the region is different, preferably differs 90
Degree.
8. the Security element as described in one of preceding claims, wherein, the Security element is the form of transmissive element, special
It is not the window element as valuable document.
9. a kind of valuable document with the Security element (S) as described in one of the claims, the wherein valuable document
Window or region during with for fluoroscopic observation, the window or region are covered by the Security element (S).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015010191.9 | 2015-08-06 | ||
| DE102015010191.9A DE102015010191A1 (en) | 2015-08-06 | 2015-08-06 | Security element with subwavelength grid |
| PCT/EP2016/001291 WO2017021000A1 (en) | 2015-08-06 | 2016-07-25 | Security element having a subwavelength grating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107949484A true CN107949484A (en) | 2018-04-20 |
| CN107949484B CN107949484B (en) | 2019-08-23 |
Family
ID=56683882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680051540.XA Active CN107949484B (en) | 2015-08-06 | 2016-07-25 | Security element with sub-wave length grating |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP3331709B1 (en) |
| JP (1) | JP2018528486A (en) |
| KR (1) | KR102511203B1 (en) |
| CN (1) | CN107949484B (en) |
| CA (1) | CA2993901A1 (en) |
| DE (1) | DE102015010191A1 (en) |
| WO (1) | WO2017021000A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111836727A (en) * | 2018-05-03 | 2020-10-27 | 捷德货币技术有限责任公司 | Security element, data carrier and method |
| CN113195239A (en) * | 2018-12-17 | 2021-07-30 | 捷德货币技术有限责任公司 | Security element acting in the terahertz range and method for producing a security element |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016013690A1 (en) | 2016-11-16 | 2018-05-17 | Giesecke+Devrient Currency Technology Gmbh | Security element with subwavelength grid |
| DE102016013683A1 (en) | 2016-11-16 | 2018-05-17 | Giesecke+Devrient Currency Technology Gmbh | Security element with subwavelength grid |
| DE102017003532A1 (en) * | 2017-04-11 | 2018-10-11 | Giesecke+Devrient Currency Technology Gmbh | Security element and manufacturing method therefor |
| DE102017130588A1 (en) * | 2017-12-19 | 2019-06-19 | Giesecke+Devrient Currency Technology Gmbh | value document |
| CN113491018A (en) * | 2019-02-26 | 2021-10-08 | 凸版印刷株式会社 | Wavelength selective filter, method for manufacturing wavelength selective filter, and display device |
| AT523690B1 (en) * | 2020-03-16 | 2022-03-15 | Hueck Folien Gmbh | Flat security element with optical security features |
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| WO1983000395A1 (en) * | 1981-07-20 | 1983-02-03 | Rca Corp | Diffractive subtractive color filter responsive to angle of incidence of polychromatic illuminating light |
| DE102011115589A1 (en) * | 2011-10-11 | 2013-04-11 | Giesecke & Devrient Gmbh | security element |
| WO2014023415A1 (en) * | 2012-08-10 | 2014-02-13 | Giesecke & Devrient Gmbh | Security element having a structure creating colour effects |
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| US6243199B1 (en) * | 1999-09-07 | 2001-06-05 | Moxtek | Broad band wire grid polarizing beam splitter for use in the visible wavelength region |
| KR20080009280A (en) * | 2005-05-18 | 2008-01-28 | 더글라스 에스. 홉스 | Microstructured optical device for polarization and wavelength filtering |
| JP4621270B2 (en) * | 2007-07-13 | 2011-01-26 | キヤノン株式会社 | Optical filter |
| DE102009012299A1 (en) | 2009-03-11 | 2010-09-16 | Giesecke & Devrient Gmbh | security element |
| DE102009012300A1 (en) | 2009-03-11 | 2010-09-16 | Giesecke & Devrient Gmbh | Security element with multicolored image |
| DE102009056933A1 (en) | 2009-12-04 | 2011-06-09 | Giesecke & Devrient Gmbh | Security element with color filter, value document with such a security element and production method of such a security element |
| GB2495680B (en) | 2010-08-11 | 2018-09-05 | Ccl Secure Pty Ltd | Optically Variable Device |
| FR2973917B1 (en) | 2011-04-08 | 2014-01-10 | Hologram Ind | OPTICAL SECURITY COMPONENT WITH TRANSMISSIVE EFFECT, MANUFACTURE OF SUCH A COMPONENT AND SECURE DOCUMENT EQUIPPED WITH SUCH A COMPONENT |
| KR20140031899A (en) * | 2011-04-20 | 2014-03-13 | 더 리젠츠 오브 더 유니버시티 오브 미시건 | Spectrum filtering for visual displays and imaging having minimal angle dependence |
| DE102012108169A1 (en) | 2012-09-03 | 2014-05-28 | Ovd Kinegram Ag | Security element as well as security document |
| KR101783133B1 (en) * | 2016-03-14 | 2017-09-28 | 고려대학교 산학협력단 | Plasmonic Color Filters With High Color Reproducibility |
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2015
- 2015-08-06 DE DE102015010191.9A patent/DE102015010191A1/en not_active Withdrawn
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2016
- 2016-07-25 CN CN201680051540.XA patent/CN107949484B/en active Active
- 2016-07-25 JP JP2018526294A patent/JP2018528486A/en active Pending
- 2016-07-25 KR KR1020187003796A patent/KR102511203B1/en active IP Right Grant
- 2016-07-25 CA CA2993901A patent/CA2993901A1/en active Pending
- 2016-07-25 EP EP16750612.0A patent/EP3331709B1/en active Active
- 2016-07-25 WO PCT/EP2016/001291 patent/WO2017021000A1/en unknown
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1983000395A1 (en) * | 1981-07-20 | 1983-02-03 | Rca Corp | Diffractive subtractive color filter responsive to angle of incidence of polychromatic illuminating light |
| DE102011115589A1 (en) * | 2011-10-11 | 2013-04-11 | Giesecke & Devrient Gmbh | security element |
| WO2014023415A1 (en) * | 2012-08-10 | 2014-02-13 | Giesecke & Devrient Gmbh | Security element having a structure creating colour effects |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111836727A (en) * | 2018-05-03 | 2020-10-27 | 捷德货币技术有限责任公司 | Security element, data carrier and method |
| CN111836727B (en) * | 2018-05-03 | 2022-08-16 | 捷德货币技术有限责任公司 | Security element, data carrier and method |
| CN113195239A (en) * | 2018-12-17 | 2021-07-30 | 捷德货币技术有限责任公司 | Security element acting in the terahertz range and method for producing a security element |
| CN113195239B (en) * | 2018-12-17 | 2022-09-27 | 捷德货币技术有限责任公司 | Security element acting in the terahertz range and method for producing a security element |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107949484B (en) | 2019-08-23 |
| DE102015010191A1 (en) | 2017-02-09 |
| EP3331709B1 (en) | 2019-09-11 |
| KR20180037970A (en) | 2018-04-13 |
| WO2017021000A1 (en) | 2017-02-09 |
| EP3331709A1 (en) | 2018-06-13 |
| KR102511203B1 (en) | 2023-03-16 |
| JP2018528486A (en) | 2018-09-27 |
| CA2993901A1 (en) | 2017-02-09 |
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