CN107934905B - Moving part of micro-electro-mechanical system and processing method thereof - Google Patents
Moving part of micro-electro-mechanical system and processing method thereof Download PDFInfo
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- CN107934905B CN107934905B CN201711191094.5A CN201711191094A CN107934905B CN 107934905 B CN107934905 B CN 107934905B CN 201711191094 A CN201711191094 A CN 201711191094A CN 107934905 B CN107934905 B CN 107934905B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
Abstract
The invention relates to a moving part of a micro electro mechanical system and a processing method thereof, belonging to the technical field of processing technology of the micro electro mechanical system, and being capable of reducing the friction force of the side wall of the moving part and improving the wear resistance of the moving part. The side wall of the moving part is formed with a micro-nano pattern comprising a convex structure and a corrugated structure crossed with the convex structure. The processing method comprises the steps of transferring a convex structure formed by the photoresist layer to the side wall of the moving part by adopting a reactive ion deep etching process, and forming a corrugated structure on the side wall of the moving part through alternately etching and passivating by adopting the etching process, so that a net-shaped micro-nano pattern formed by the convex structure and the corrugated structure is formed on the side wall surface of the moving part. The moving part of the micro-electro-mechanical system and the processing method thereof provided by the invention can be used for the micro-electro-mechanical system.
Description
Technical Field
The present invention relates to a processing technology of a micro electro mechanical system, and more particularly, to a moving part of a micro electro mechanical system and a processing method thereof.
Background
Micro-Electro-Mechanical systems (MEMS) are independent intelligent systems, have internal structures generally in the micron or even nanometer level, have the characteristics of small size, light weight, low power consumption, stable performance and the like, and are widely applied to the fields of automobiles, consumer electronics, medical treatment and the like.
Microelectromechanical systems include a plurality of moving parts (sliding and/or rotating) that present significant wear problems. In the prior art, a material surface modification technology or a molecular lubricating film technology is generally adopted to reduce abrasion.
However, the above method cannot be applied to the side wall of the moving part where the shielding structure exists, and the subsequent operation of performing surface modification or molecular lubricating film is complicated, thereby causing waste of time and cost.
At present, the micro-nano texture technology is considered to be a very potential advanced technology for improving the surface friction and wear performance. However, the micro-nano texture technology is difficult to be applied to the moving parts of the micro-electro-mechanical system because the moving parts of the micro-electro-mechanical system are relatively small in size (the thickness is dozens of microns) and the surface roughness quality is difficult to control, and the micro-nano texture technology is often subjected to genetic processing to form abundant micro-morphology and large roughness.
Disclosure of Invention
In view of the above analysis, the present invention aims to provide a moving part of a micro electro mechanical system and a processing method thereof, which can reduce the friction force of the side wall of the moving part and improve the wear resistance of the moving part.
The purpose of the invention is mainly realized by the following technical scheme:
the invention provides a moving part of a micro-electro-mechanical system, wherein a reticular micro-nano pattern is formed on the side wall of the moving part; the micro-nano pattern comprises a convex structure and a corrugated structure crossed with the convex structure.
Further, the protruding structure is formed through an etching process, and the protruding structure is parallel to the etching direction; the corrugated structure is formed by alternately performing etching and passivation processes in an etching process, and the corrugated structure is perpendicular to the etching direction.
Further, the projection structure comprises a plurality of mutually parallel projections; the corrugated structure includes a plurality of mutually parallel stripe patterns.
Further, the characteristic dimension of the moving part is 0.1mm to 1mm, the pitch between the plurality of protrusions is 0.1 μm to 300 μm, the width of the protrusions is 0.1 μm to 300 μm, and the height of the protrusions is 0.1 μm to 100 μm.
Further, the moving member has a characteristic dimension of 0.1 μm to 100 μm, a pitch between the plurality of protrusions is 0.01 μm to 10 μm, a width of the protrusions is 0.01 μm to 10 μm, and a height of the protrusions is 0.01 μm to 10 μm.
Further, the space between the plurality of stripes is 0.01 μm to 10 μm, the width of the stripes is 0.01 μm to 10 μm, and the height of the stripes is 0.01 μm to 10 μm.
Further, the surface of the side wall of the moving member is formed with a surface modification layer and/or a molecular lubricating film.
Further, the shape of the cross section of the protrusion in the direction perpendicular to the etching direction is a sine wave shape or a periodic pulse wave shape.
Further, it is characterized in that the cross section of the protrusion is rectangular, trapezoidal or arc-shaped in a direction perpendicular to the etching direction.
The invention also provides a processing method of the moving part of the micro-electro-mechanical system, which comprises the following steps:
step S1: coating a photoresist layer on the upper surface of the moving part substrate;
step S2: forming the cross section shape of the convex structure on the photoresist layer through exposure and development processes;
step S3: a convex structure is formed on the side wall of the moving part through a reactive ion deep etching process, and a corrugated structure is formed on the side wall of the moving part in the etching and passivating processes alternately performed by the etching process, so that the convex structure and the corrugated structure form a net-shaped micro-nano pattern, and the moving part of the micro-electro-mechanical system with the micro-nano pattern formed on the side wall is obtained.
Compared with the prior art, the invention has the following beneficial effects:
a) in the preparation process of the moving part of the micro electro mechanical system, a convex structure is formed on the side wall of the moving part through an etching process, a corrugated structure is formed through the etching and passivating processes alternately carried out in the etching process, the convex structure and the corrugated structure are mutually cross-coupled to form a net-shaped three-dimensional micro-nano pattern meeting the wear-resisting requirement, on the basis of ensuring that the side wall of the moving part has certain mechanical strength, the negative influence of the processing genetic micro-morphology on the frictional wear performance is weakened, the abrasive particle storage capacity of the side wall is improved, the dynamic friction force between the side walls of two moving parts in contact can be reduced by abrasive particles between the micro-nano patterns, meanwhile, the contact area and the static friction force between the side walls of two moving parts in contact can be further reduced by the micro-nano patterns, and the micro-nano texture technology can be applied to, the friction resistance and the wear resistance of the side wall of the moving part of the micro electro mechanical system are improved, and the friction reduction and wear resistance treatment of the side wall of the moving part with the shielding structure is realized.
b) According to the moving part of the micro-electro-mechanical system, the micro-nano pattern and the moving part are integrally designed and formed in one-step processing, a special processing technology and an additional process are not needed, and the method is simple and high in operability.
c) The moving part of the micro-electro-mechanical system provided by the invention can accurately control the size of the micro-nano pattern by designing the mask in the etching process and adjusting the parameters of the etching and passivation processes in the etching process, thereby optimizing the friction resistance and wear resistance of the side wall of the moving part of the micro-electro-mechanical system.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
Drawings
The drawings are only for purposes of illustrating particular embodiments and are not to be construed as limiting the invention, wherein like reference numerals are used to designate like parts throughout.
FIG. 1 is a schematic structural diagram of a moving part of a MEMS according to a first embodiment of the present invention;
FIG. 2 is a schematic diagram of a first shape of a raised structure of a moving part of a MEMS device according to a first embodiment of the present invention;
FIG. 3 is a diagram illustrating a second shape of a raised structure of a moving part of a MEMS device according to a first embodiment of the present invention;
FIG. 4 is a schematic diagram of a third shape of a protrusion structure of a moving part of a MEMS according to a first embodiment of the present invention;
FIG. 5 is a diagram illustrating a fourth shape of a raised structure of a moving part of a MEMS device according to a first embodiment of the present invention;
FIG. 6 is a flow chart of a method of fabricating a moving part of a MEMS device according to an embodiment of the present invention.
Reference numerals:
1-projection; 2-stripe; 3-a moving part base; 4-photoresist layer.
Detailed Description
The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, which form a part hereof, and which together with the embodiments of the invention serve to explain the principles of the invention.
Example one
The embodiment provides a moving part of a micro-electromechanical system, as shown in fig. 1 to 5, a mesh-shaped micro-nano pattern is formed on a side wall of the moving part, the micro-nano pattern includes a convex structure and a corrugated structure, and the convex structure and the corrugated structure are intersected with each other to form the mesh-shaped micro-nano pattern. The convex structure is formed through an etching process and is parallel to the etching direction; the corrugated structure is formed by alternately performing etching and passivation processes in an etching process, and the corrugated structure is perpendicular to the etching direction.
Compared with the prior art, in the preparation process of the moving part of the micro electro mechanical system, the convex structure is formed on the side wall of the moving part through the etching process, the corrugated structure is formed through the alternate etching and passivation processes in the etching process, the convex structure and the corrugated structure are mutually cross-coupled to form the net-shaped three-dimensional micro-nano pattern meeting the wear-resisting requirement, on the basis of ensuring that the side wall of the moving part has certain mechanical strength, the negative influence of the processing genetic micro-morphology on the frictional wear performance is weakened, the abrasive particle storage capacity of the side wall is improved, the dynamic friction force between the side walls of two moving parts in contact can be reduced by the abrasive particles between the micro-nano patterns, meanwhile, the contact area and the static friction force between the side walls of two moving parts in contact can be further reduced by the micro-nano patterns, and the micro-nano texture technology can be applied, the friction resistance and the wear resistance of the side wall of the moving part of the micro electro mechanical system are improved, and the friction reduction and wear resistance treatment of the side wall of the moving part with the shielding structure is realized. In addition, due to the integral design and one-time processing formation of the micro-nano pattern and the moving part, a special processing technology and an additional process are not needed, the method is simple, and the operability is strong.
In addition, the size of the micro-nano pattern can be accurately controlled by designing a mask in the etching process and adjusting parameters of the etching and passivation processes in the etching process, so that the friction resistance and the wear resistance of the side wall of a moving part of the micro-electro-mechanical system are optimized.
In order to further optimize the size of the micro-nano pattern, the bump structure may include a plurality of bumps 1 parallel to each other, when the characteristic size of the moving part is 0.1mm to 1mm, the pitch between the plurality of bumps 1 is 0.1 μm to 300 μm, the width of the bump 1 is 0.1 μm to 300 μm, and the height of the bump 1 is 0.1 μm to 100 μm; when the characteristic dimension of the moving part is 0.1 μm to 100 μm, the pitch between the plurality of protrusions 1 is 0.01 μm to 10 μm, the width of the protrusions 1 is 0.01 μm to 10 μm, and the height of the protrusions 1 is 0.01 μm to 10 μm. Inject protruding 1's size and the interval between a plurality of protruding 1 in above-mentioned within range, on the basis that the lateral wall that guarantees moving part has certain mechanical strength, micro-nano pattern's abrasive particle storage capacity has further been improved, the abrasive particle can reduce the kinetic friction power between the lateral wall that two moving parts contact between micro-nano pattern, and simultaneously, micro-nano pattern can also further reduce area of contact and the static friction power between the lateral wall that two moving parts contact, thereby further improve the antifriction and the wear resistance of micro-electro-mechanical system's moving part's lateral wall.
The characteristic dimension is a ratio of four times a cross-sectional area of the moving member to a cross-sectional circumference of the moving member, and for example, when the cross-section of the moving member is circular, the characteristic dimension is 4 pi R22R, that is to say the characteristic dimension of a circle is its diameter D, where R is the radius of the circle and D is the diameter of the circle; when the cross section of the moving part is rectangular, the characteristic dimension is 4AB/2(A + B), wherein A is the width of the rectangle, and B is the length of the rectangle.
Accordingly, when the characteristic size of the moving part is 0.1mm to 1mm, the ratio of the interval between the plurality of protrusions 1 to the width of the protrusions 1 may be 0.5 to 0.9, which further defines the size of the protrusion structure such that the abrasive particles generated from the protrusions 1 can have enough space to enter the gaps between the plurality of protrusions 1. Likewise, when the characteristic dimension of the moving part is 0.1 μm to 100 μm, the ratio of the pitch between the plurality of protrusions 1 to the width of the protrusions 1 may be 0.3 to 0.9.
In order to further optimize the size of the micro-nano pattern, the corrugated structure may include a plurality of parallel stripe patterns 2, a distance between the stripe patterns 2 is 0.01 μm to 10 μm, a width of the stripe pattern 2 is 0.01 μm to 10 μm, and a height of the stripe pattern 2 is 0.01 μm to 10 μm.
In order to further improve the friction and wear resistance of the side wall of the moving part of the micro-electro-mechanical system, a surface modification layer and/or a molecular lubricating film can be arranged on the surface of the side wall of the moving part. The friction-resistant and wear-resistant performance of the side wall of the moving part of the micro-electro-mechanical system can be further improved by combining the conventional friction-resistant and wear-resistant method with the micro-nano pattern provided by the embodiment.
Specifically, as for the shape of the protrusions 1, the shape of the cross section of the protrusions 1 in the direction perpendicular to the etching direction may be a sine wave, a periodic pulse wave, or other periodic wave. In consideration of convenience of design and processing and controllability of friction and wear resistance, the cross-sectional shape of the protrusion 1 may be rectangular (as shown in fig. 2), trapezoidal (as shown in fig. 3 to 4), or arc (as shown in fig. 5), wherein when the cross-sectional shape of the protrusion 1 is rectangular, the abrasive grain storage capacity of the micro-nano pattern is maximized.
Example two
The embodiment provides a method for processing a moving part of a micro-electromechanical system, as shown in fig. 6, including the following steps:
step S1: coating a photoresist layer 4 on the upper surface of the moving part substrate 3;
step S2: forming the cross-sectional shape of the convex structure on the photoresist layer 4 by exposure and development processes;
step S3: forming a convex structure on the side wall of the moving part through a reactive ion deep etching process, and forming a corrugated structure on the side wall of the moving part in the alternate etching and passivation process of the etching process, so that the convex structure and the corrugated structure form a net-shaped micro-nano pattern, and the moving part with the micro-nano pattern formed on the side wall is obtained.
The processing method of the moving part of the mems provided in this embodiment has substantially the same advantages as the moving part of the mems provided in the first embodiment, and thus, the following description is omitted.
It should be noted that the cross-sectional shape of the protruding structure of the photoresist layer 4 is mainly formed by a patterning process using a mask having the cross-sectional shape of the protruding structure.
As for the material of the moving part base 3, it may be single crystal silicon, polycrystalline silicon, germanium, gallium arsenide, silicon oxide, silicon nitride, aluminum alloy, tungsten alloy, titanium alloy, nickel, or nickel alloy.
For the etching and passivating time, a corrugated structure with a larger size can be generated due to the long etching and passivating time, and the side wall roughness is larger; short etching and passivation times result in a corrugated structure of smaller dimensions and smoother sidewalls. Illustratively, the etching time is 5s to 15s, the passivation time is 5s to 15s, and the time interval between etching and passivation is 0s to 1 s. The etching time, the passivation time and the time interval between the etching and the passivation are limited in the range, the micro-nano pattern with optimized shape and size can be obtained, the uniformity of the micro-nano pattern is good, and therefore the friction resistance and the wear resistance of the side wall of the moving part of the micro-electro-mechanical system are optimized.
In order to combine the existing antifriction and antiwear method with the micro-nano pattern and further improve the friction resistance and the abrasion resistance of the side wall of the moving part of the micro-electro-mechanical system, the processing method also comprises the following steps:
step S4: and forming a surface modification layer and/or a molecular lubricating film on the surface of the moving part with the micro-nano pattern formed on the side wall.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention.
Claims (2)
1. A moving part of a micro electro mechanical system is characterized in that a reticular micro-nano pattern is formed on the side wall of the moving part; the micro-nano pattern comprises a convex structure and a corrugated structure crossed with the convex structure;
the protruding structure is formed through an etching process and is parallel to the etching direction;
the corrugated structure is formed through alternately performing etching and passivation processes in the etching process, and the corrugated structure is perpendicular to the etching direction;
the bump structure comprises a plurality of mutually parallel bumps;
the corrugated structure comprises a plurality of parallel stripe patterns;
the characteristic size of the moving part is 0.1mm-1mm, the space between a plurality of bulges is 0.1 μm-300 μm, the width of the bulges is 0.1 μm-300 μm, the height of the bulges is 0.1 μm-100 μm, and the ratio of the space between the bulges to the width of the bulges is 0.5-0.9;
the space between the plurality of stripes is 0.01-10 μm, the width of the stripes is 0.01-10 μm, and the height of the stripes is 0.01-10 μm;
the surface of the side wall of the moving component is provided with a surface modification layer and/or a molecular lubricating film;
the cross section of the bulge is in a sine wave shape, an arc shape or a periodic pulse wave shape along the direction vertical to the etching direction.
2. A method for processing a moving part of a micro-electro-mechanical system is characterized by comprising the following steps:
step S1: coating a photoresist layer on the upper surface of the moving part substrate;
step S2: forming the cross section shape of the convex structure on the photoresist layer through exposure and development processes;
step S3: forming a convex structure on the side wall of the moving part through a reactive ion deep etching process, and forming a corrugated structure on the side wall of the moving part in the etching and passivating processes alternately carried out by the etching process, so that the convex structure and the corrugated structure form a net-shaped micro-nano pattern, and the moving part of the micro-electro-mechanical system with the micro-nano pattern formed on the side wall is obtained;
step S4: forming a surface modification layer and/or a molecular lubricating film on the surface of the moving part with the micro-nano pattern formed on the side wall;
the etching time is 5 s-15 s, the passivation time is 5 s-15 s, and the time interval between the etching and the passivation is more than 0s and less than or equal to 1 s.
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| CN107934905B true CN107934905B (en) | 2020-02-28 |
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| CH698837B1 (en) * | 2003-02-06 | 2009-11-13 | Eta Sa Mft Horlogere Suisse | Flat hairspring for balance wheel/hairspring resonator, has strip formed of turns that are formed with single band from interior curve to exterior curve, where portion of exterior curve has section larger than section of strip |
| CN104166016B (en) * | 2013-05-16 | 2016-06-01 | 中国科学院地质与地球物理研究所 | A kind of highly sensitive 3 axis MEMS jerkmeter and manufacturing process thereof |
| US9488293B2 (en) * | 2014-08-14 | 2016-11-08 | Dunan Microstaq, Inc. | On-off microvalve with improved sealing mechanism |
| EP3109199B1 (en) * | 2015-06-25 | 2022-05-11 | Nivarox-FAR S.A. | Silicon-based part with at least one chamfer and method for manufacturing same |
| EP3109200B1 (en) * | 2015-06-25 | 2023-06-28 | Nivarox-FAR S.A. | Micromechanical part with reduced contact surface and method for manufacturing same |
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