CN107892420A - A kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions - Google Patents
A kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions Download PDFInfo
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- CN107892420A CN107892420A CN201711395955.1A CN201711395955A CN107892420A CN 107892420 A CN107892420 A CN 107892420A CN 201711395955 A CN201711395955 A CN 201711395955A CN 107892420 A CN107892420 A CN 107892420A
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- water
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- organic carbon
- water inlet
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- 229910021642 ultra pure water Inorganic materials 0.000 title claims abstract description 41
- 239000012498 ultrapure water Substances 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 239000007788 liquid Substances 0.000 title claims abstract description 14
- 238000000671 immersion lithography Methods 0.000 title claims abstract description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 162
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 40
- 238000004140 cleaning Methods 0.000 claims abstract description 27
- 239000012535 impurity Substances 0.000 claims abstract description 25
- 238000001514 detection method Methods 0.000 claims abstract description 18
- 230000001954 sterilising effect Effects 0.000 claims abstract description 15
- 241000894006 Bacteria Species 0.000 claims abstract description 14
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 12
- 230000004888 barrier function Effects 0.000 claims abstract description 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 9
- 238000007872 degassing Methods 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 230000007547 defect Effects 0.000 claims description 4
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 claims description 4
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 238000002242 deionisation method Methods 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 238000010583 slow cooling Methods 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 238000000746 purification Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000012528 membrane Substances 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 2
- 230000008676 import Effects 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 210000003608 fece Anatomy 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/60—Silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
- C02F2001/427—Treatment of water, waste water, or sewage by ion-exchange using mixed beds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/03—Pressure
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/23—O3
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/14—Maintenance of water treatment installations
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physical Water Treatments (AREA)
Abstract
The present invention relates to a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions.The present invention includes electron level factory service water tank, pure water pump, flow control meter, self-cleaning temperature control check valve, self-cleaning temperature control module, uviol lamp and goes total organic carbon module, deoxidation module, other impurities to remove module, detection module diaphragm valve, detection module, water repellant barrier valve, water outlet diaphragm valve, return flow meter, first check-valve etc..The invention kills bacterium in pipeline and water purification module at different levels by being passed through heating gradient ultra-pure water, because the biomembrane of water purification module is the main attachment of bacteria breed, by the way that most bacterium can be removed to the sterilization with membrane module, and flowed by certain water circulation, save the consumption of heat energy, cost can be being saved to a certain degree, there is great application value so that water quality reaches the requirement of liquid immersion lithography ultra-pure water total organic carbon.
Description
Technical field
The present invention relates to a kind of ultra-pure water to remove organic carbon device, and being used for liquid immersion lithography more particularly, to one kind has automatically
The ultrapure water preparation device of degerming functions.
Background technology
In 193nm ArF immersion lithographic systems, it is general using in optical projection system last object lens between silicon chip
One layer of ultra-pure water is filled in gap as immersion liquid, photoetching resolution is improved with this.Due to one of this layer of ultra-pure water as light path
Part, and directly contacted with silicon chip, therefore very high requirement is proposed to the water quality of the ultra-pure water.In order to prevent in ultra-pure water
There is organic fine particles generation, it should go organic carbon to handle the ultra-pure water, however, in general, only using and removing organic carbon mould
Block is inadequate, because the bacteria breed of pipeline causes organic carbon endlessly to be produced from internal system, causes organic carbon total
Amount is constantly in higher state.If in addition, containing foreign body or particulate in the water for cleaning of IC photo-mask process, will lead
Cause gate oxide film thickness uneven, defect occurs for product figure, and pressure-resistant function degenerates, therefore we should be as far as possible in system for a long time
It is not used or does not carry out carrying out sterilization processing to device when sterilization is safeguarded for a long time.
All unit flows being related in ultrapure water production system are designed around quality requirement.However, ultra-pure water
Often there is unexpected organic carbon pollutant to pollute water quality in making link.Illustrate herein, such as in purifier
Upper formation biological membranous layer, then bacterium will be bred in a manner of violent, this may cause bacteria levels to steeply rise and cause water purification
The device life-span declines.Once being contaminated in device, it is a stubborn problem that it, which recovers clean state, is because being produced in ultra-pure water
In system, will not typically add the chemicals for sterilization, this device interior element can be caused it is huge infringement and generate other can not
The pollution of control.
In large-scale semiconductor factory, the sterilization of the general source water using prime, but do not consider rear class water cleaning systems
The ligotrophic of middle growth falls, the excreta of such bacterium, a significant source of remains also organic carbon.In this method
In, by the way of hot pure water parallel connection enters system, by certain thermograde, kill except the bacterium in pipeline is without to device
Internal filter damages.
The content of the invention
The invention discloses a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions.
The present invention includes electron level factory service water tank, pure water pump, flow control meter, self-cleaning temperature control check valve, self-cleaning
Temperature control module, uviol lamp go total organic carbon module, deoxidation module, other impurities to remove module, detection module diaphragm valve, water quality inspection
Survey module, water repellant barrier valve, with water diaphragm valve, return flow meter and check-valves.
The first water inlet is provided with electron level factory service water tank, electron level factory service water tank delivery port meets entering for pure water pump
The mouth of a river, pure water pump delivery port connect the water inlet of flow control meter.Flow control meter delivery port connects uviol lamp and goes total organic carbon module
Water inlet, uviol lamp goes the delivery port of total organic carbon module to connect the water inlet of degassing module, and the delivery port for the module that deaerates connects it
The water inlet of his impurity treatment module.The delivery port of other impurities processing module is divided into two-way：Pass through water quality detection module all the way
The water inlet of diaphragm valve water receiving quality detection module；Another way connects with the water inlet of water repellant barrier valve, with the water inlet of water diaphragm valve
Connect the water inlet for being followed by return flow meter.The delivery port of water quality detection module run in water diaphragm valve delivery port after be used as draining
Mouthful.The delivery port of return flow meter enters water by what check-valves was connected on the delivery port of flow control meter and total organic carbon removing module
Between mouthful.Water nozzle is used as by the use of the delivery port of water diaphragm valve.Self-cleaning temperature control module is connected on stream by self-cleaning temperature control check valve
Between the delivery port of amount control meter and the water inlet of total organic carbon removing module；Second is provided with self-cleaning temperature control module and enters water
Mouthful.
Pure water pump is used to control intake pressure and flow velocity, and self-cleaning temperature control module is used to carry out pipeline in device and device
Sterilization treatment；Return flow meter is used to control circling water flow rate, and the anti-non-return water of check-valves flows backwards.Uviol lamp goes total organic carbon module to use
Total organic carbon and some bacteriums in ultra-pure water are removed.Deoxidation module be used for remove ozone remaining in ultra-pure water and
Uviol lamp go total organic carbon module caused by carbon dioxide, prevent impurity introduce post-module.Pass through other impurities processing module
Other impurities are removed, water quality detection module is monitored in real time to water quality.
Water temperature is regulated and controled using self-cleaning temperature control module, gradient is heated to be slowly heated 28 with 2-3 DEG C per minute
DEG C ultra-pure water circulates 80-85 DEG C of hot ultra-pure water 30-60 minute, to device interior conduit until reach 80-85 DEG C in device afterwards
Sterilization processing is carried out with other filter films, afterwards with 2-3 DEG C per minute of the Slow cooling ultra-pure water of falling temperature gradient 23 to 28 DEG C,
After water temperature recovers 28 DEG C, preparation is supplied water 10 minutes.
Described uviol lamp goes total organic carbon module to include ozone source, multiple uviol lamps, multiple flow controllers and every
Film valve.
Described degassing module includes nitrogen access source, multiple electromagnetism magnetic valve, gas pressure regulator and degassing films.
Described other impurities, which remove module, to include deionization mixed bed, removes single of silicon and end-filtration.
Described defects inspecting module includes total organic carbon table, ozone table, resistivity table.
Present invention employs self-cleaning temperature control module to regulate and control to water temperature, to kill in pipeline and water purification module at different levels
Bacterium, because the biomembrane of water purification module is the main attachment of bacteria breed, by the way that the sterilization with film module can remove a bit to this
Most bacterium is gone, and is flowed by certain water circulation, the consumption of heat energy is saved, is saving cost to a certain degree, have
There is great application value.
Brief description of the drawings
Fig. 1 is the overall structure diagram of the present invention.
Embodiment
As shown in figure 1, a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions, including electronics
Level factory service water tank 1, pure water pump 2, flow control meter 3, self-cleaning temperature control check valve 4, self-cleaning temperature control module 5, uviol lamp are gone
Total organic carbon module 6, deoxidation module 7, other impurities remove module 8, detection module diaphragm valve 9, water quality detection module 10, draining
Diaphragm valve 11, with water diaphragm valve 12, return flow meter 13 and check-valves 14.
Electron level factory service water water inlet (the first water inlet), electron level factory service water are provided with electron level factory service water tank 1
The delivery port of water tank 1 connects the water inlet of pure water pump, and the delivery port of pure water pump 2 connects the water inlet of flow control meter 3.Flow control meter 3 goes out
The mouth of a river connects the water inlet that uviol lamp goes total organic carbon module 6, and uviol lamp goes the delivery port of total organic carbon module 6 to connect degassing module 7
Water inlet, the delivery port of degassing module 7 connects the water inlet of other impurities processing module 8.The water outlet of other impurities processing module 8
Mouth is divided into two-way：Pass through the water inlet of the water receiving quality detection module 10 of detection module diaphragm valve 9 all the way；Another way and water repellant barrier valve
11 water inlet, the water inlet for being followed by return flow meter 13 is connected with the water inlet of water diaphragm valve 12.Water quality detection module 10
Delivery port run in water diaphragm valve 11 delivery port after be used as discharge outlet.The delivery port of return flow meter 13 is connected on stream by check-valves
Between the delivery port of amount control meter 3 and the water inlet of total organic carbon removing module.By the use of the delivery port of water diaphragm valve 12 as using water
Mouthful.Self-cleaning temperature control module 5 is connected on the delivery port and total organic carbon removing of flow control meter 3 by self-cleaning temperature control check valve 4
Between the water inlet of module；Electron level factory service water water inlet (the second water inlet) is provided with self-cleaning temperature control module 5.
Pure water pump 2 is used to control intake pressure and flow velocity, and self-cleaning temperature control module 5 is used to enter pipeline in device and device
Row sterilization treatment；Return flow meter 13 is used to control circling water flow rate, and 14 anti-non-return water of check-valves flows backwards.Uviol lamp removes total organic carbon
Module 6 is used to be removed the total organic carbon in ultra-pure water and some bacteriums.Deoxidation module 7 is used to remove remaining in ultra-pure water
Ozone and uviol lamp go total organic carbon module 6 caused by carbon dioxide, prevent impurity introduce post-module.Pass through other impurities
Processing module 8 is removed to some other impurity, including metallic element, dissolved oxygen etc., finally by water quality detection module
10 pairs of water quality are monitored in real time.
Uviol lamp goes total organic carbon module 6 to include ozone source, multiple uviol lamps, multiple flow controllers and diaphragm valve.
The module 7 that deaerates includes nitrogen access source, multiple electromagnetism magnetic valve, gas pressure regulator and degassing films.Other impurities remove
Module 8 includes deionization mixed bed, removes single of silicon and end-filtration.Defects inspecting module 9 includes total organic carbon table, ozone table, electricity
Resistance rate table.
The present invention uses self-cleaning temperature control module to regulate and control water temperature with the sensitive filters in protection device, while complete
Into the sterilization processing of interior conduit He other filter films.Specially：Gradient is heated with 2-3 DEG C per minute to be slowly heated 28 DEG C
Ultra-pure water is until reach 80-85 DEG C, if wherein temperature rises too fast, meeting oxidation damage rear end filter, it is therefore desirable to very
Strict temperature control, 80-85 DEG C of hot ultra-pure water 30-60 minute is circulated in device afterwards, afterwards with 2-3 DEG C per minute of drop
For warm gradient Slow cooling ultra-pure water to 28 DEG C, its effect is identical with method and slow heating process, and recovers 28 DEG C in water temperature
Afterwards, preparation, which is supplied water 10 minutes, allows device inner member to carry out certain Acclimation temperature.
The course of work：The present invention shares three states, is service position, preparation service position and sterilizing state respectively：When
When being in service position, the first water inlet can be opened, and the second water inlet is closed, and water nozzle magnetic valve is opened, discharge outlet electromagnetism
Valve is closed, and electron level factory service water is passed through from the first water inlet.When program is in prepared service position, the first water inlet can be beaten
Open, the second water inlet is closed, water nozzle closed electromagnetic valve, and discharge outlet magnetic valve is opened, wherein being passed through electronics from the first water inlet
Level factory service water.When program is in sterilizing state, the first water inlet can be closed, and the second water inlet is opened, water nozzle magnetic valve
Close, discharge outlet magnetic valve is opened, and the electron level factory service water with temperature control is passed through from the second water inlet.Do not cleaned for a long time in device
Or after being not used for a long time, by opening system sterilizing state, the ultra-pure water of certain temperature is passed through into the second water inlet introgressive line
In system, total organic carbon module, deoxidation module and other impurities are gone to remove filter screen or biomembrane in module to pipeline and uviol lamp
Carry out sterilization；And parameters are detected by water quality detection module.Simultaneously by the regulation to return flow meter,
Circling water flow rate is controlled, improves the degerming efficiency of system and for the ultra-pure water demand with water, and reduce self-cleaning temperature control mould
The energy resource consumption of block, while by discharge outlet to System drainage.
During the non-bacterial heap of also not qualified but pipeline or rear class instruction of supplying water is not initiated, open system ready in water quality and supply water
State, by electron level factory service water by the first water inlet import system, by interior circulation regulating water quality, and by discharge outlet to being
System carries out draining.When water quality is qualified and rear class supplies water instructs initiation, system water supply state is opened, electron level factory service water is passed through
First water inlet import system, by water nozzle, level supplies water backward.
Water repellant barrier valve and one can only be opened in the same time with water diaphragm valve, its delivery port is respectively as waste water draining
Outlet and ultra-pure water water out.
Circling water flow rate control meter provides corresponding flow according to water demand dynamic, ensures the supply to rear class, leads to simultaneously
Cross the temperature of feedback stability water spot, pressure, flow value, each element in protection device inside.
Above-mentioned embodiment is used for illustrating the present invention, rather than limits the invention, the present invention's
In spirit and scope of the claims, to any modifications and changes of the invention made.
Claims (6)
1. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions, including electron level factory service water water
Case, pure water pump, flow control meter, self-cleaning temperature control check valve, self-cleaning temperature control module, uviol lamp go total organic carbon module, taken off
Oxygen module, other impurities remove module, detection module diaphragm valve, detection module, water repellant barrier valve, with water diaphragm valve, backwater stream
Gauge and check-valves；It is characterized in that：
The first water inlet is provided with described electron level factory service water tank, electron level factory service water tank delivery port connects pure water pump
Water inlet, pure water pump delivery port connect the water inlet of flow control meter；Flow control meter delivery port connects uviol lamp and removes total organic carbon mould
The water inlet of block, uviol lamp go the delivery port of total organic carbon module to connect the water inlet of degassing module, and the delivery port for the module that deaerates connects
The water inlet of other impurities processing module；The delivery port of other impurities processing module is divided into two-way：All the way by detection module every
Film valve connects the water inlet that other impurities remove module；Another way and water inlet, the water inlet with water diaphragm valve of water repellant barrier valve
Connection is followed by the water inlet of return flow meter；Other impurities remove module delivery port run in water diaphragm valve delivery port after conduct
Discharge outlet；The delivery port of return flow meter is connected on the delivery port and total organic carbon removing module of flow control meter by check-valves
Between water inlet；Water nozzle is used as by the use of the delivery port of water diaphragm valve；Self-cleaning temperature control module is connect by self-cleaning temperature control check valve
Between the delivery port of flow control meter and the water inlet of total organic carbon removing module；Second is provided with self-cleaning temperature control module
Water inlet.
Pure water pump is used to control intake pressure and flow velocity, and self-cleaning temperature control module is used to sterilize to pipeline in device and device
Processing；Return flow meter is used to control circling water flow rate, and the anti-non-return water of check-valves flows backwards；Uviol lamp go total organic carbon module be used for pair
Total organic carbon and some bacteriums in ultra-pure water are removed；Deoxidation module is used to remove ozone remaining in ultra-pure water and ultraviolet
Lamp go total organic carbon module caused by carbon dioxide, prevent impurity introduce post-module；By other impurities processing module to it
He is removed impurity, and detection module is monitored in real time to water quality.
2. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions as claimed in claim 1, its
It is characterised by：Water temperature is regulated and controled using self-cleaning temperature control module, gradient is heated to be slowly heated 28 with 2-3 DEG C per minute
DEG C ultra-pure water circulates 80-85 DEG C of hot ultra-pure water 30-60 minute, to device interior conduit until reach 80-85 DEG C in device afterwards
Sterilization processing is carried out with other filter films, afterwards with 2-3 DEG C per minute of the Slow cooling ultra-pure water of falling temperature gradient 23 to 28 DEG C,
After water temperature recovers 28 DEG C, preparation is supplied water 10 minutes.
3. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions as claimed in claim 1, its
It is characterised by：Described uviol lamp goes total organic carbon module to include ozone source, multiple uviol lamps, multiple flow controllers and every
Film valve.
4. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions as claimed in claim 1, its
It is characterised by：Described degassing module includes nitrogen access source, multiple electromagnetism magnetic valve, gas pressure regulator and degassings
Film.
5. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions as claimed in claim 1, its
It is characterised by：Described other impurities, which remove module, to include deionization mixed bed, removes single of silicon and end-filtration.
6. a kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions as claimed in claim 1, its
It is characterised by：Described defects inspecting module includes total organic carbon table, ozone table, resistivity table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711395955.1A CN107892420A (en) | 2017-12-21 | 2017-12-21 | A kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711395955.1A CN107892420A (en) | 2017-12-21 | 2017-12-21 | A kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions |
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| Publication Number | Publication Date |
|---|---|
| CN107892420A true CN107892420A (en) | 2018-04-10 |
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|---|---|---|---|
| CN201711395955.1A Withdrawn CN107892420A (en) | 2017-12-21 | 2017-12-21 | A kind of ultrapure water preparation device for liquid immersion lithography with automatic degerming functions |
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| CN (1) | CN107892420A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01148387A (en) * | 1987-12-02 | 1989-06-09 | Daicel Chem Ind Ltd | Thermal sterilization of final filter for preparing extremely pure water |
| CN103172185A (en) * | 2013-04-02 | 2013-06-26 | 浙江大学 | Ultrapure water preparation device with outlet water quality regulating mechanism |
-
2017
- 2017-12-21 CN CN201711395955.1A patent/CN107892420A/en not_active Withdrawn
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01148387A (en) * | 1987-12-02 | 1989-06-09 | Daicel Chem Ind Ltd | Thermal sterilization of final filter for preparing extremely pure water |
| CN103172185A (en) * | 2013-04-02 | 2013-06-26 | 浙江大学 | Ultrapure water preparation device with outlet water quality regulating mechanism |
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