CN107884996A - Light orientation equipment - Google Patents
Light orientation equipment Download PDFInfo
- Publication number
- CN107884996A CN107884996A CN201711444152.0A CN201711444152A CN107884996A CN 107884996 A CN107884996 A CN 107884996A CN 201711444152 A CN201711444152 A CN 201711444152A CN 107884996 A CN107884996 A CN 107884996A
- Authority
- CN
- China
- Prior art keywords
- light
- light source
- baffle plate
- substrate
- reflecting plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
Abstract
The present invention provides a kind of smooth orientation equipment, for the orientation to substrate, including microscope carrier, support above the microscope carrier, the baffle plate that several spaced light sources and each corresponding described light source are set, several light sources are fixed on the support towards the microscope carrier, several baffle intervals arrange and rotationally loaded on the supports, each baffle plate surrounds a light source, and each baffle plate is connected with an actuator, the actuator drives the baffle plate being connected with the actuator to be overturn around the light source, with the light for blocking the light of the light source or exposing the light source, and then stop the substrate described in the light directive of the light source on microscope carrier or make the substrate described in the light directive of the light source on microscope carrier.The light orientation equipment of the present invention improves the orientation yield of substrate.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of smooth orientation equipment.
Background technology
The lamp tube shapes that light allocating process generally use spacing side by side is set are irradiated to substrate, and every substrate receives photograph
The time penetrated needs strictly to be controlled according to the brightness of fluorescent tube.And fluorescent tube is higher, it is necessary to longer in the moment brightness just opened
Setting time could realize the output of stable light, and the change of brightness is unfavorable for the control of irradiation time, therefore matches somebody with somebody in light
Into technique, the fluorescent tube for irradiation is arranged to always-on, and the irradiation time of light is controlled with shadow shield, anti-to avoid
Multiple setting time needed for multiple switch, improves production efficiency.
Existing anti-dazzle plate structure, it is oppositely arranged using both sides flat board, passes through opposite translational motion or reversely remote
Translational motion open or close action realize light.When opening shadow shield and starting exposure, two be oppositely arranged it is flat
Plate is located remotely from each other translation toward both sides, and substrate central areas is first first subjected to the irradiation of ultraviolet light, and two side areas finally receives purple
Outer light；And after end exposure, for two side visors toward intermediate closed, substrate two side areas is first isolated ultraviolet light, and central area is most
Ultraviolet light is just isolated afterwards.The time about 3-4s that existing G4.5 moves for the shadow shield of production line, with reference to opening and closing twice
Action, central area about 6-8s more than two side areas irradiation time, when this causes the care of two side areas and central area
Between it is inconsistent, so as to cause orientation abnormal, reduce product yield.And G8.5 for production line when, because substrate size is bigger, shading
The time that plate is moved to both sides among board then reaches 6-8s, is acted twice with reference to opening and closing, both sides are compared in central area
Region about 12-16s irradiation time, substrate each position orientation difference can will further amplify more, and yield is lower.
The content of the invention
It is an object of the invention to provide a kind of smooth orientation equipment, the orientation yield of substrate is improved.
The present invention provides a kind of smooth orientation equipment, for the orientation to substrate, including microscope carrier, above the microscope carrier
The baffle plate that support, several spaced light sources and each corresponding described light source are set, several light sources are fixed on institute
State and arrange and be rotationally loaded on the support, each gear towards the microscope carrier, several baffle intervals on support
Plate surrounds a light source, and each baffle plate is connected with an actuator, and the actuator drives to be connected with the actuator
The baffle plate connect is overturn around the light source, with the light for blocking the light of the light source or exposing the light source, and then is hindered
Keep off the substrate described in the light directive of the light source on microscope carrier or make institute described in the light directive of the light source on microscope carrier
State substrate.
Wherein, reflecting plate, the reflecting plate and the baffle plate are equipped with above each light source of in the vertical direction
Form the confined space for housing the light source.
Wherein, the cross section of the baffle plate is semicircle, and the cross section of the reflecting plate is semicircle, and the light source houses
In the circular confined space that the semicircular baffle plate is formed with the semicircular reflecting plate.
Wherein, the baffle plate may be reversed on the reflecting plate, and the reflecting plate will reach the light of the reflecting plate
Reflection.
Wherein, the baffle plate may be reversed under the reflecting plate, and the baffle plate serves as the reflecting plate, and the baffle plate will
Reach the light reflection of the baffle plate.
Wherein, the junction of the reflecting plate and the baffle plate is provided with sealing strip, and the sealing strip is used to prevent the light
The light in source exposes the confined space.
Wherein, edge filter is fixedly installed between the substrate and the light source, the edge filter is used to supply
The light of orientation demand passes through.
Wherein, the light of the light source transmitting is ultraviolet light.
Wherein, the actuator includes motor.
Wherein, the smooth orientation equipment includes control device, and the control device controls startup and the pass of the actuator
Close.
Each baffle plate of light orientation equipment of the present invention is connected with an actuator, and the baffle plate can be controlled simultaneously by realizing
Upset, so the light that sends of the light source irradiate the substrate different zones time it is equal, the substrate different zones
Energy accumulation is impartial, improves the orientation yield of the substrate；The Region control of orientation can be needed according to the substrate by also achieving
The corresponding baffle plate turning, and the substrate is not required to the overlying regions of orientation, still has the baffle plate to block the light source
Light, and then the light of the light source irradiates the substrate needs the region of orientation, and then realize orientation is needed according to the substrate
Region complete the differentiation orientation of the substrate.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, can be with
Other accompanying drawings are obtained according to these accompanying drawings.
Fig. 1 is the structural representation of smooth orientation equipment provided in an embodiment of the present invention, and which includes substrate.
Fig. 2 is the structural representation of the baffle plate and reflecting plate in Fig. 1.
Fig. 3 is structural representation of the light orientation equipment in second of state in Fig. 1, and which includes substrate.
Fig. 4 is the structural representation that light orientation equipment in Fig. 1 is in the third state, and which includes substrate.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under the premise of creative work is not made
Embodiment, belong to the scope of protection of the invention.
The present invention provides a kind of smooth orientation equipment, for the orientation to substrate 10, including microscope carrier 20, on the microscope carrier
The baffle plate 40 that support 90, several spaced light sources 30 and each corresponding described light source 30 of side are set, it is several described
Light source 30 is fixed on the support 90 towards the microscope carrier 20, and several baffle plates 40 are spaced and are rotationally loaded on institute
To state on support 90, each baffle plate 40 surrounds a light source 30, and each baffle plate 40 is connected with an actuator 50,
The actuator 50 drives and overturn with the baffle plate 40 that the actuator 50 is connected around the light source 30, to block the light
The light in source 30 or the light for exposing the light source 30, and then stop the institute described in the light directive of the light source 30 on microscope carrier 20
State substrate 10 or make the substrate 10 described in the light directive of the light source 30 on microscope carrier 20.
In the present embodiment, the light that the light source 30 is launched is ultraviolet light.The actuator 50 includes motor.Positioned at water
Several light sources 30 with a line are fixed by the support 90 square upwards carries, positioned at several baffle plates of same a line
40 rotationally loaded on the support 90, and the baffle plate 40 can be overturn around the support 90, and when the baffle plate 40 is overturn, institute
Support 90 is stated to remain stationary.
Each baffle plate 40 of light orientation equipment of the present invention is connected with an actuator 50, realizes can control simultaneously described in
Baffle plate 40 is overturn, so the light that sends of the light source 30 irradiate the different zones of substrate 10 time it is equal, the substrate
The energy accumulation of 10 different zones is impartial, improves the orientation yield of substrate 10；Also achieve what can be needed according to the substrate 10
The baffle plate 40 is overturn orientation Region control accordingly, and the substrate 10 is not required to the overlying regions of orientation, still there is the gear
Plate 40 blocks the light of the light source 30, and then the light irradiation substrate 10 of the light source 30 needs the region of orientation, and then
Realize needs the region of orientation to complete the differentiation orientation of the substrate 10 according to the substrate 10.
Specifically, the ultraviolet light is used to irradiate the substrate 10, to carry out orientation to the substrate 10.The light source 30
To be multigroup, it is spaced in the surface of the substrate 10, to ensure that all areas of the substrate 10 have light irradiation.Institute
It can be area source or line source to state light source 30, so that ensure can be with uniform in light emission.The light source 30 is being placed in the substrate 10 just
Top, to realize the uniform orientation to the substrate 10, ensure orientation quality.
Further, the glass substrate 10 includes orientation region, and the width of the side of orientation region one is not more than institute
State ultraviolet light, to ensure that the size in orientation region is less than the size that light source 30 can irradiate, can make purple with the width of irradiation area
Outer light can be with uniform irradiation to the orientation region.It should be noted that the uniform light of the ultraviolet light, just can guarantee that
The orientation of substrate 10 is uniform.
The top of each light source 30 of in the vertical direction is equipped with reflecting plate 60, the reflecting plate 60 and the baffle plate
40 form the closing space 70 for housing the light source 30.Specifically, because the light source 30 needs longer time to realize
The stable output of light, therefore in the 10 non-orientation of substrate, the light source needs just to can guarantee that in the state opened for a long time
The stable output of light, can be only achieved requirement of the orientation of substrate 10 to the light, the reflecting plate 60 and the baffle plate
The closing space 70 of the 40 collecting light sources 30 formed is realized and can be in the light source 30 in the state of unlatching for a long time
The not light leak of light caused by the light source 30.
The junction of the reflecting plate 60 and the baffle plate 40 is provided with sealing strip (not shown), and the sealing strip is used for
Prevent the light of the light source 30 from exposing the confined space 70.Specifically, filled between the reflecting plate 60 and the baffle plate 40
If sealing strip the inside of the confined space 70 is isolated from the outside, furthermore achieved that light caused by the light source 30
It is blocked in the confined space 70, the not light leak of light caused by the light source 30.
Referring to Fig. 2, in the present embodiment, the cross section of the baffle plate 40 is semicircle, the reflecting plate 60 it is transversal
Face is semicircle, and the light source 30 is contained in the circle that the semicircular baffle plate 40 is formed with the semicircular reflecting plate 60
In closing space 70.Specifically, each baffle plate 40 has the end 402 of first end 401 and second being oppositely arranged, it is each described
Reflecting plate 60 has the 3rd end 601 being adapted to the first end 401 and the 4th end 602 being adapted to second end 402,
The first end 401 and the 3rd end 601 dock and second end 402 to be formed with the 4th the docking for end 602
The closing space 70 of the closing space 70 of the collecting light source 30.The sealing strip is loaded on the described 3rd of the reflecting plate 60
End 601 and the 4th end 602, and then when the baffle plate 40 is overturn, the sealing strip is securable to the reflecting plate 60
On, keep fixing.
Referring to Fig. 3, in the present embodiment, the baffle plate 40 may be reversed on the reflecting plate 60, the reflecting plate
60 reflect the light for reaching the reflecting plate 60.Specifically, in 10 orientation of substrate, the baffle plate 40 is overturn in described
On reflecting plate 60, and the baffle plate 40 is fitted on the reflecting plate 60, and the light portion that the light source 30 is sent reaches
After the reflecting plate 60, the reflecting plate 60 reflexes to the light for reaching the reflecting plate 60 on the substrate 10, real
Show light described in the vertical direction and be irradiated to the substrate 10 from top to bottom, improve the utilization rate of the light.This hair
The bright baffle plate 40 overturns to realize on the reflecting plate 60 and avoids traditional shadow shield in 10 orientation of substrate
Structure, it is oppositely arranged using both sides flat board, light is realized by opposite translational motion or reversely remote translational motion
Open or close action, and then avoiding which needs longer time to open the shadow shield.Therefore the present invention
For the baffle plate 40 in 10 orientation of substrate, overturn realizes the unlatching for reducing the baffle plate 10 on the reflecting plate 60
Time, improve operating efficiency.In the present embodiment, the baffle plate 40 overturns 180 degree, the reflecting plate around fixed axle center
60 furthermore achieved that the stabilization for ensureing the baffle plate 40 in the switching process of the baffle plate 40.
Referring to Fig. 4, in other embodiments, the baffle plate 40 may be reversed under the reflecting plate 60, the baffle plate
40 serve as the reflecting plate 60, and the baffle plate 40 reflects the light for reaching the baffle plate 40.Specifically, match somebody with somebody in the substrate 10
Xiang Shi, the baffle plate 40 are overturn under the reflecting plate 60, and the baffle plate 40 is fitted within the reflecting plate 60, described
Baffle plate 40 serves as the reflecting plate 60, and after the light portion that the light source 30 is sent reaches the baffle plate 40, the baffle plate 40 will
The light for reaching the baffle plate 40 is reflexed on the substrate 10, realizes light described in the vertical direction from top to bottom
The substrate 10 is irradiated to, improves the utilization rate of the light.The present invention the baffle plate 40 in 10 orientation of substrate,
Overturn to realize within the reflecting plate 60 and avoid traditional anti-dazzle plate structure, be oppositely arranged using both sides flat board, pass through phase
To translational motion or reversely remote translational motion open or close action realize light, and then avoid which
Longer time is needed to open the shadow shield.Therefore the baffle plate 40 of the present invention is overturn in 10 orientation of substrate
The opening time for reducing the baffle plate 10 is realized within the reflecting plate 60, improves operating efficiency.In the present embodiment,
The baffle plate 40 is overturn overturns 180 degree around fixed axle center, and the reflecting plate 60 furthermore achieved that to be turned in the baffle plate 40
Ensure the stabilization of the baffle plate 40 during turning.
Edge filter 80 is fixedly installed between the substrate 10 and the light source 30, the edge filter 80 is used for
Pass through for the light of orientation demand.Specifically, light caused by the light source 30 has a different wavelength, and the substrate 10 by
The light of different wave length is needed to carry out orientation in the difference of material, therefore the edge filter 80 is used to that the substrate 10 will to be matched somebody with somebody
To demand light by by remaining light ray cut.
The smooth orientation equipment includes control device, and the control device controls the startup and closing of the actuator 50.
Specifically, during 10 orientation of substrate, the control device controls the actuator 50 to start；When the orientation of substrate 10 terminates
And after the baffle plate 40 downwardly turns over the closing space 70 that the collecting light source 30 is continuously formed with the reflecting plate 60, it is described
Control device controls the actuator 50 to close.
When not working, the light source 30 is opened, and the reflecting plate 60 forms a closing space 70 with the baffle plate 40, described
Light source 30 is contained in the closing space 70.During work, the control device controls the actuator 50 to start, the driving
Part 50 controls the baffle plate 40 for being connected to the actuator 50 to overturn within the reflecting plate 60, or overturns in the reflecting plate 60
On, light caused by the light source 30 is irradiated to the substrate 10 through the edge filter 80, and the substrate 10 starts
Orientation.At the end of the orientation of substrate 10, the actuator 50 controls the baffle plate 40 to downwardly turn over and the reflecting plate 60
The closing space 70 of the collecting light source 30 is continuously formed, the control device controls the actuator 50 to close.
Above disclosure is only preferred embodiment of present invention, can not limit the right model of the present invention with this certainly
Enclose, one of ordinary skill in the art will appreciate that all or part of flow of above-described embodiment is realized, and will according to right of the present invention
Made equivalent variations are sought, still falls within and invents covered scope.
Claims (10)
1. a kind of smooth orientation equipment, for the orientation to substrate, it is characterised in that including microscope carrier, above the microscope carrier
The baffle plate that support, several spaced light sources and each corresponding described light source are set, several light sources are fixed on institute
State and arrange and be rotationally loaded on the support, each gear towards the microscope carrier, several baffle intervals on support
Plate surrounds a light source, and each baffle plate is connected with an actuator, and the actuator drives to be connected with the actuator
The baffle plate connect is overturn around the light source, with the light for blocking the light of the light source or exposing the light source, and then is hindered
Keep off the substrate described in the light directive of the light source on microscope carrier or make institute described in the light directive of the light source on microscope carrier
State substrate.
2. smooth orientation equipment according to claim 1, it is characterised in that the top of each light source of in the vertical direction
Reflecting plate is equipped with, the reflecting plate forms the confined space for housing the light source with the baffle plate.
3. smooth orientation equipment according to claim 2, it is characterised in that the cross section of the baffle plate is semicircle, described
The cross section of reflecting plate is semicircle, and the light source is contained in the semicircular baffle plate and formed with the semicircular reflecting plate
Circular confined space in.
4. smooth orientation equipment according to claim 3, it is characterised in that the baffle plate may be reversed in the reflecting plate it
On, the reflecting plate reflects the light for reaching the reflecting plate.
5. smooth orientation equipment according to claim 3, it is characterised in that the baffle plate may be reversed in the reflecting plate it
Under, the baffle plate serves as the reflecting plate, and the baffle plate reflects the light for reaching the baffle plate.
6. smooth orientation equipment according to claim 2, it is characterised in that the junction of the reflecting plate and the baffle plate is set
There is sealing strip, the sealing strip is used to prevent the light of the light source from exposing the confined space.
7. the light orientation equipment according to claim any one of 1-6, it is characterised in that between the substrate and the light source
Edge filter is fixedly installed, the edge filter is used to pass through for the light of orientation demand.
8. smooth orientation equipment according to claim 7, it is characterised in that the light of the light source transmitting is ultraviolet light.
9. smooth orientation equipment according to claim 8, it is characterised in that the actuator includes motor.
10. smooth orientation equipment according to claim 9, it is characterised in that the smooth orientation equipment includes control device, institute
State startup and closing that control device controls the actuator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711444152.0A CN107884996A (en) | 2017-12-27 | 2017-12-27 | Light orientation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711444152.0A CN107884996A (en) | 2017-12-27 | 2017-12-27 | Light orientation equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107884996A true CN107884996A (en) | 2018-04-06 |
Family
ID=61772546
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711444152.0A Pending CN107884996A (en) | 2017-12-27 | 2017-12-27 | Light orientation equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107884996A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110658653A (en) * | 2018-06-29 | 2020-01-07 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and method |
| CN111679512A (en) * | 2020-06-05 | 2020-09-18 | Tcl华星光电技术有限公司 | Photo-alignment device and photo-alignment method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2926791Y (en) * | 2006-06-28 | 2007-07-25 | 谢轩瑞 | Fluorescent light with rotary variation |
| KR20120113525A (en) * | 2011-04-05 | 2012-10-15 | 엘지디스플레이 주식회사 | Light aligning device having a shutter for preventing polarizer from being damaged by reflecting light |
| CN103336389A (en) * | 2013-06-03 | 2013-10-02 | 深圳市华星光电技术有限公司 | Optical alignment device and method |
| CN107255890A (en) * | 2017-07-25 | 2017-10-17 | 武汉华星光电技术有限公司 | A kind of smooth orientation equipment |
-
2017
- 2017-12-27 CN CN201711444152.0A patent/CN107884996A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2926791Y (en) * | 2006-06-28 | 2007-07-25 | 谢轩瑞 | Fluorescent light with rotary variation |
| KR20120113525A (en) * | 2011-04-05 | 2012-10-15 | 엘지디스플레이 주식회사 | Light aligning device having a shutter for preventing polarizer from being damaged by reflecting light |
| CN103336389A (en) * | 2013-06-03 | 2013-10-02 | 深圳市华星光电技术有限公司 | Optical alignment device and method |
| CN107255890A (en) * | 2017-07-25 | 2017-10-17 | 武汉华星光电技术有限公司 | A kind of smooth orientation equipment |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110658653A (en) * | 2018-06-29 | 2020-01-07 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and method |
| CN111679512A (en) * | 2020-06-05 | 2020-09-18 | Tcl华星光电技术有限公司 | Photo-alignment device and photo-alignment method |
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| PB01 | Publication | ||
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Application publication date: 20180406 |