CN107818902B - Microchannel plate and preparation method thereof - Google Patents
Microchannel plate and preparation method thereof Download PDFInfo
- Publication number
- CN107818902B CN107818902B CN201710966941.4A CN201710966941A CN107818902B CN 107818902 B CN107818902 B CN 107818902B CN 201710966941 A CN201710966941 A CN 201710966941A CN 107818902 B CN107818902 B CN 107818902B
- Authority
- CN
- China
- Prior art keywords
- microchannel plate
- preparation
- salt
- ion exchange
- rubidium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/04—Electron multipliers
- H01J43/06—Electrode arrangements
- H01J43/18—Electrode arrangements using essentially more than one dynode
- H01J43/24—Dynodes having potential gradient along their surfaces
- H01J43/246—Microchannel plates [MCP]
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
Abstract
The present invention relates to a kind of microchannel plate and preparation method thereof, preparation method includes: that core rod and skin glass tube 1) are carried out the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtains microchannel plate blank；2) the microchannel plate blank is subjected in fused salt ion exchange, cleaned, high temperature reduction, plated film obtains microchannel plate；Wherein, the fused salt includes rubidium salt and/or cesium salt.The present invention is by carrying out ion exchange for microchannel plate blank, thick atom amount, the rubidium of large atomic radius, cesium ion part are replaced to potassium, the sodium ion in emission layer, by the increase and volume " jammed " effect of alkali metal ion atom amount, improve the resistance to electronic Scrubbing performance of emission layer, to improve the service life and gain performance of microchannel plate, microchannel plate service life, gain are respectively increased 30% and 20% or more.
Description
Technical field
The present invention relates to a kind of micro optical element manufacturing technology fields, more particularly to a kind of microchannel plate and its preparation side
Method.
Background technique
Microchannel plate (Microchannel Plate, MCP) is a kind of millions of micron order glazing channel composition
Sheet type electron multiplication array, each of which channel is all an electron multiplication system, has conductive layer and emission layer, conductive layer mentions
Supplied for electronic, emission layer emits secondary electron, when incident electron enters channel and hits vias inner walls, can generate Secondary Emission electricity
Son, under the action of electric field, these secondary emission electrons are accelerated to be continued to hit vias inner walls, after multiple impacts, in channel
Output end form a large amount of outgoing electron, so as to form the enhancing to small-signal.
The advantages that microchannel plate is small in size with its, light-weight, room and time resolving power is high is visited in lll night vision, particle
It is used widely in the fields such as survey, medical consultations.But in use due to for a long time by electronic Scrubbing, microchannel plate transmitting
Potassium, sodium ion in layer occur migration or overflow, and lead to its bad stability, gain reduction seriously affects its service life.
Summary of the invention
It is a primary object of the present invention to provide a kind of novel microchannel plate and preparation method thereof, skill to be solved
Art problem is the increase and volume " jammed " effect for making it by alkali metal ion atom amount, the resistance to electronics punching of Lai Tigao emission layer
Brush performance improves the service life and gain performance of microchannel plate, thus more suitable for practical.
The object of the invention to solve the technical problems adopts the following technical solutions to realize.It proposes according to the present invention
A kind of microchannel plate preparation method comprising:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained
Microchannel plate blank；
2) the microchannel plate blank is subjected in fused salt ion exchange, cleaned, high temperature reduction, plated film obtains micro-
Channel plate；
Wherein, the fused salt includes rubidium salt and/or cesium salt.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Preferably, the preparation method of microchannel plate above-mentioned, wherein the rubidium salt is rubidium nitrate.
Preferably, the preparation method of microchannel plate above-mentioned, wherein the cesium salt is cesium nitrate.
Preferably, the preparation method of microchannel plate above-mentioned, wherein the temperature of the ion exchange is 200-400 DEG C.
Preferably, the preparation method of microchannel plate above-mentioned, wherein the time of the ion exchange is 2-30min.
Also the following technical solution is employed for the object of the invention to solve the technical problems to realize.It proposes according to the present invention
A kind of microchannel plate, be prepared by method above-mentioned.
The object of the invention to solve the technical problems also can be used following technical measures and further realize.
Preferably, microchannel plate above-mentioned, wherein the aperture of the microchannel plate is 4-25 μm.
Preferably, microchannel plate above-mentioned, wherein the service life of the microchannel plate is greater than 20000h, gain exists
It is greater than 10000 when 800V voltage.
By above-mentioned technical proposal, microchannel plate of the present invention and preparation method thereof is at least had the advantage that
The present invention is by carrying out ion exchange for microchannel plate blank, by thick atom amount, the rubidium of large atomic radius, cesium ion
Part replaces potassium, sodium ion in emission layer, by the increase and volume " jammed " effect of alkali metal ion atom amount, improves hair
The resistance to electronic Scrubbing performance of layer is penetrated, to improve the service life and gain performance of microchannel plate, microchannel plate service life increases
Benefit is respectively increased 30% and 20% or more.
The above description is only an overview of the technical scheme of the present invention, in order to better understand the technical means of the present invention,
And can be implemented in accordance with the contents of the specification, with presently preferred embodiments of the present invention, detailed description is as follows below.
Specific embodiment
It is of the invention to reach the technical means and efficacy that predetermined goal of the invention is taken further to illustrate, below in conjunction with
Preferred embodiment, to microchannel plate proposed according to the present invention and preparation method thereof its specific embodiment, structure, feature and its
Effect, detailed description is as follows.In the following description, what different " embodiment " or " embodiment " referred to is not necessarily same implementation
Example.In addition, the special characteristic, structure or feature in one or more embodiments can be combined by any suitable form.
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes comprising:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained
Microchannel plate blank；
2) the microchannel plate blank is subjected to ion exchange in fused salt, cleaning removes fused salt remained on surface, high
Temperature reduction, plated film obtain microchannel plate；
Wherein, the fused salt includes rubidium salt and/or cesium salt.The component of fused salt can also include sylvite and sodium salt, be used for
Adjust fused salt fusing point and ion exchange activity.
Preferably, rubidium salt is rubidium nitrate, and cesium salt is cesium nitrate.The fusing point of nitrate is low, no more than the inversion point of glass, fits
Cooperation is fused salt；And nitrate is soluble easily in water, easy to clean；Furthermore nitrate corrosivity is low, will not cause to microchannel plate
Damage.Fused salt is not limited to nitrate, when the conversion temperature of glass is high, can select phosphate, oxalates etc..According to difference
Chloride, sulfate, phosphate etc. or multicomponent fused salt mixt also can be selected in process conditions.
Preferably, the temperature of ion exchange is 200-400 DEG C, and the time of ion exchange is 2-30min.The temperature of ion exchange
Degree is not above glass transition temperature.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by method above-mentioned.The hole of microchannel plate
Diameter is 4-25 μm, and service life is greater than 20000h, and gain is greater than 10000 in 800V voltage.
Embodiment 1
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes comprising:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained
Diameter 25mm, thickness 0.38mm, the microchannel plate blank in 6 μm of channel aperture；
2) the microchannel plate blank is subjected to ion exchange in fused salt, 350 DEG C of temperature of molten salt, ion-exchange time
15min removes fused salt remained on surface with deionized water ultrasonic cleaning, cleans 15min every time, clean 3 times, high temperature reduction, plating
Film obtains microchannel plate；
Wherein, the fused salt is the fused salt mixt of rubidium nitrate and cesium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.
The aperture of the microchannel plate of embodiment 1 is 6 μm, and service life is greater than 20000h, and gain is greater than in 800V voltage
10000。
Embodiment 2
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes comprising:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained
Diameter 30mm, thickness 0.50mm, the microchannel plate blank in 25 μm of channel aperture；
2) the microchannel plate blank is subjected to ion exchange in fused salt, 400 DEG C of temperature of molten salt, ion-exchange time
2min removes fused salt remained on surface with deionized water ultrasonic cleaning, cleans 15min every time, clean 3 times, high temperature reduction, plating
Film obtains microchannel plate；
Wherein, the fused salt is the fused salt mixt of rubidium nitrate, cesium nitrate and potassium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.Embodiment 1
The aperture of microchannel plate is 25 μm, and service life is greater than 20000h, and gain is greater than 10000 in 800V voltage.
Embodiment 3
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes comprising:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained
Diameter 20mm, thickness 0.30mm, the microchannel plate blank in 4 μm of channel aperture；
2) the microchannel plate blank is subjected to ion exchange in fused salt, 200 DEG C of temperature of molten salt, ion-exchange time
30min removes fused salt remained on surface with deionized water ultrasonic cleaning, cleans 15min every time, clean 3 times, high temperature reduction, plating
Film obtains microchannel plate；
Wherein, the fused salt is rubidium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.Embodiment 1
The aperture of microchannel plate is 4 μm, and service life is greater than 20000h, and gain is greater than 10000 in 800V voltage.
The above described is only a preferred embodiment of the present invention, be not intended to limit the present invention in any form, according to
According to technical spirit any simple modification, equivalent change and modification to the above embodiments of the invention, this hair is still fallen within
In the range of bright technical solution.
Claims (8)
1. a kind of preparation method of microchannel plate, characterized in that it comprises:
1) core rod and skin glass tube are subjected to the combination of stick pipe, wire drawing, plate-laying, fusion pressure, machining, pickling, obtained micro- logical
Guidance tape blank；
2) the microchannel plate blank is subjected in fused salt ion exchange, cleaned, high temperature reduction, plated film obtains microchannel
Plate；
Wherein, the fused salt includes rubidium salt and/or cesium salt.
2. the preparation method of microchannel plate according to claim 1, which is characterized in that the rubidium salt is rubidium nitrate.
3. the preparation method of microchannel plate according to claim 1, which is characterized in that the cesium salt is cesium nitrate.
4. the preparation method of microchannel plate according to claim 1, which is characterized in that the temperature of the ion exchange is
200-400℃。
5. the preparation method of microchannel plate according to claim 1, which is characterized in that the time of the ion exchange is
2-30min。
6. a kind of microchannel plate, which is characterized in that be prepared by the described in any item methods of claim 1-5.
7. microchannel plate according to claim 6, which is characterized in that the aperture of the microchannel plate is 4-25 μm.
8. microchannel plate according to claim 6, which is characterized in that the service life of the microchannel plate is greater than
20000h, gain are greater than 10000 in 800V voltage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710966941.4A CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710966941.4A CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107818902A CN107818902A (en) | 2018-03-20 |
| CN107818902B true CN107818902B (en) | 2019-06-14 |
Family
ID=61608332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710966941.4A Active CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107818902B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108922646B (en) * | 2018-07-02 | 2020-01-17 | 中国建筑材料科学研究总院有限公司 | Collimator and preparation method |
| CN111863582B (en) * | 2020-07-24 | 2022-04-22 | 北方夜视技术股份有限公司 | Ultrasonic suspension rotary type microchannel plate corrosion method |
| CN113436947B (en) * | 2021-06-28 | 2022-04-22 | 北方夜视技术股份有限公司 | Method for improving gain of microchannel plate and chemical stability of inner wall of micropore |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4365150A (en) * | 1978-05-08 | 1982-12-21 | Tektronix, Inc. | Gain stabilized microchannel plates and MCP treatment method |
| CN1717770A (en) * | 2002-11-26 | 2006-01-04 | Itt制造企业公司 | Microchannel plate having microchannels with deep funneled and/or step funneled openings and method of manufacturing same |
-
2017
- 2017-10-17 CN CN201710966941.4A patent/CN107818902B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4365150A (en) * | 1978-05-08 | 1982-12-21 | Tektronix, Inc. | Gain stabilized microchannel plates and MCP treatment method |
| CN1717770A (en) * | 2002-11-26 | 2006-01-04 | Itt制造企业公司 | Microchannel plate having microchannels with deep funneled and/or step funneled openings and method of manufacturing same |
Non-Patent Citations (1)
| Title |
|---|
| 《微通道板增益疲劳机理研究》;闫金良等;《应用光学》;19961231;第17卷(第4期);第27页左栏第3行-10行、以及附图3 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107818902A (en) | 2018-03-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107818902B (en) | Microchannel plate and preparation method thereof | |
| JP6138686B2 (en) | Electron multiplier with nanodiamond layer | |
| CN104028771B (en) | A kind of method preparing copper-tungsten powder | |
| CN103641308B (en) | The neutron-sensitive microchannel plate of one seed coat glass and manufacture thereof | |
| Medved et al. | Kinetic ejection of electrons from solids | |
| EP1568062B1 (en) | Microchannel plate having microchannels with deep funneled and/or step funneled openings and method of manufacturing same | |
| CN106783489A (en) | A kind of titanium window construction X-ray tube | |
| CN110220929A (en) | A kind of device and method measuring material secondary electron emission coefficiency | |
| CN103762149B (en) | A kind of device improving velocity of electrons imaging resolution | |
| TW200719379A (en) | X-ray tube and x-ray source including the same | |
| CN206685345U (en) | A kind of titanium window construction X-ray tube | |
| CN107039223B (en) | Big object plane X-ray striped image converter tube and electron optical imaging system | |
| CN108866801A (en) | A kind of carbon cloth weaving method for carbon/carbon compound material grid | |
| US8822081B2 (en) | Electrode structure and electrochemical cell using the same | |
| Chong et al. | High power millimeter wave helix TWT programs at L-3 ETI | |
| WO2014030179A1 (en) | Thermionic converter | |
| CN103143801A (en) | Surface treatment method before brazing space traveling-wave tube collector and radiator | |
| CN102610474A (en) | Focusing cathode for X-ray tube, X-ray source of focusing cathode and preparation method | |
| CN103000483A (en) | Bulk conductive microchannel plate | |
| CN105627841A (en) | Ignition method, structure and manufacturing method for electric detonator | |
| CN202487529U (en) | High-valence ion source modulating device | |
| CN102324351A (en) | Novel carbon nano tube field emission cold cathode and manufacturing method thereof | |
| CN109986232A (en) | A kind of quartz glass sealing-in Sn-Ti-Cu ternary alloy three-partalloy solder | |
| CN111029230A (en) | Micro-channel plate in-channel polishing method | |
| WO2013178414A1 (en) | Method for attaching an unsymmetrical coating on an inner side of a tube, tube with an unsymmetrically coating on an inner side of the tube and use of the tube |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |