CN1077114C - Photosensitive resin composition for corrugated board printing plate - Google Patents
Photosensitive resin composition for corrugated board printing plate Download PDFInfo
- Publication number
- CN1077114C CN1077114C CN94190128A CN94190128A CN1077114C CN 1077114 C CN1077114 C CN 1077114C CN 94190128 A CN94190128 A CN 94190128A CN 94190128 A CN94190128 A CN 94190128A CN 1077114 C CN1077114 C CN 1077114C
- Authority
- CN
- China
- Prior art keywords
- resin composition
- weight
- liquid light
- printing forme
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/006—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00
- C08F283/008—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers provided for in C08G18/00 on to unsaturated polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
- C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
Embodiment | (I) acrylate monomer of structural formula (I) expression | n | The carbonatoms of R | Bounce impact elasticity (%) |
2 3 4 5 6 7 | Acrylic acid diethylene glycol-2-ethyl ether-ether acrylic acid diethylene glycol ethyl ether-ether acrylic acid TEG-2-ethylhexyl ether-ether acrylic acid, eight ethylene glycol-2-ethylhexyl ether-ether acrylic acid, nine ethylene glycol tridecyl ether-ether acrylic acid triethylene glycol hexyl ether-ethers | 2 2 4 8 9 3 | 8 2 8 8 13 6 | 57 57 60 61 59 62 |
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17086793 | 1993-06-18 | ||
JP170867/93 | 1993-06-18 | ||
JP170867/1993 | 1993-06-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1107278A CN1107278A (en) | 1995-08-23 |
CN1077114C true CN1077114C (en) | 2002-01-02 |
Family
ID=15912789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN94190128A Expired - Fee Related CN1077114C (en) | 1993-06-18 | 1994-06-16 | Photosensitive resin composition for corrugated board printing plate |
Country Status (7)
Country | Link |
---|---|
US (1) | US5716757A (en) |
EP (1) | EP0656378B1 (en) |
CN (1) | CN1077114C (en) |
AU (1) | AU675552B2 (en) |
ES (1) | ES2080027B1 (en) |
GB (1) | GB2283244B (en) |
WO (1) | WO1995000567A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1996018932A1 (en) * | 1994-12-13 | 1996-06-20 | Macdermid Imaging Technology, Inc. | Photosensitive compositions and clean running photopolymer printing plates therefrom |
US5965460A (en) * | 1997-01-29 | 1999-10-12 | Mac Dermid, Incorporated | Polyurethane composition with (meth)acrylate end groups useful in the manufacture of polishing pads |
JP2003277453A (en) * | 2002-03-27 | 2003-10-02 | Jsr Corp | Liquid curable resin composition |
JP4093557B2 (en) * | 2002-11-14 | 2008-06-04 | 東洋合成工業株式会社 | Photosensitive resin composition, method for forming hydrogel, and hydrogel |
JP5214467B2 (en) | 2006-12-26 | 2013-06-19 | 旭化成イーマテリアルズ株式会社 | Resin composition for printing plate |
WO2008125200A1 (en) * | 2007-04-11 | 2008-10-23 | Bayer Materialscience Ag | Radiation-crosslinking and thermally crosslinking pu systems based on isocyanate-reactive block copolymers |
CN101945905B (en) * | 2008-02-15 | 2013-06-26 | 旭化成电子材料株式会社 | Resin composition |
KR102665293B1 (en) | 2019-04-01 | 2024-05-09 | 주식회사 엘지화학 | Antibacterial polymer coating composition and antibacterial polymer film |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0263366A2 (en) * | 1986-10-02 | 1988-04-13 | Asahi Kasei Kogyo Kabushiki Kaisha | A photoresin printing plate for use in printing a corrugated board |
EP0427950A2 (en) * | 1989-11-16 | 1991-05-22 | Asahi Kasei Kogyo Kabushiki Kaisha | A photosensitive resin composition for use in forming a relief structure |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS527363B2 (en) * | 1973-05-21 | 1977-03-02 | ||
US3960572A (en) * | 1973-02-21 | 1976-06-01 | Asahi Kasei Kogyo Kabushiki Kaisha | Photosensitive compositions comprising a polyester-polyether block polymer |
JPS5335481B2 (en) * | 1974-04-08 | 1978-09-27 | ||
JPS5921541B2 (en) * | 1977-05-18 | 1984-05-21 | 東洋紡績株式会社 | Photosensitive resin composition for printing plates |
US4298630A (en) * | 1978-03-23 | 1981-11-03 | Northern Telecom Ltd. | Method of manufacturing electrically insulated conductors with ultra-violet cured coatings |
US4932750A (en) * | 1982-12-09 | 1990-06-12 | Desoto, Inc. | Single-coated optical fiber |
JPS6121118A (en) * | 1984-07-10 | 1986-01-29 | Yokohama Rubber Co Ltd:The | Photosetting resin composition |
US5288571A (en) * | 1986-10-02 | 1994-02-22 | Asahi Kasei Kogyo Kabushiki Kaisha | Photoresin printing plate for use in printing a corrugated board |
US4854666A (en) * | 1987-02-04 | 1989-08-08 | Mitsui Toatsu Chemicals, Incorporated | Photosetting resin composition |
JP2944164B2 (en) * | 1990-08-08 | 1999-08-30 | 旭化成工業株式会社 | Liquid photosensitive resin composition for flexographic printing plates |
JPH05301935A (en) * | 1992-04-28 | 1993-11-16 | Sekisui Chem Co Ltd | Photocurable resin composition |
-
1994
- 1994-06-16 US US08/325,405 patent/US5716757A/en not_active Expired - Lifetime
- 1994-06-16 WO PCT/JP1994/000974 patent/WO1995000567A1/en active IP Right Grant
- 1994-06-16 EP EP94918531A patent/EP0656378B1/en not_active Expired - Lifetime
- 1994-06-16 AU AU69820/94A patent/AU675552B2/en not_active Ceased
- 1994-06-16 CN CN94190128A patent/CN1077114C/en not_active Expired - Fee Related
- 1994-06-16 GB GB9422035A patent/GB2283244B/en not_active Expired - Lifetime
- 1994-12-09 ES ES09450032A patent/ES2080027B1/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0263366A2 (en) * | 1986-10-02 | 1988-04-13 | Asahi Kasei Kogyo Kabushiki Kaisha | A photoresin printing plate for use in printing a corrugated board |
EP0427950A2 (en) * | 1989-11-16 | 1991-05-22 | Asahi Kasei Kogyo Kabushiki Kaisha | A photosensitive resin composition for use in forming a relief structure |
Also Published As
Publication number | Publication date |
---|---|
EP0656378B1 (en) | 1999-12-08 |
AU675552B2 (en) | 1997-02-06 |
GB2283244A (en) | 1995-05-03 |
GB9422035D0 (en) | 1995-03-01 |
ES2080027B1 (en) | 1996-08-01 |
EP0656378A4 (en) | 1997-12-29 |
AU6982094A (en) | 1995-01-17 |
GB2283244B (en) | 1997-08-13 |
CN1107278A (en) | 1995-08-23 |
EP0656378A1 (en) | 1995-06-07 |
US5716757A (en) | 1998-02-10 |
WO1995000567A1 (en) | 1995-01-05 |
ES2080027A1 (en) | 1996-01-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Applicant after: Asahi Kasei Kogyo K. K. Applicant before: Asahi Kasei Kogyo K. K. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: ASAHI KASEI CORPORATION TO: ASAHI KASEI CORPORATION |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD. Free format text: FORMER OWNER: ASAHI KASEI CORPORATION Effective date: 20091016 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20091016 Address after: Tokyo, Japan Patentee after: Asahi Chemical Corp. Address before: Osaka Japan Patentee before: Asahi Kasei Kogyo K. K. |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20020102 Termination date: 20100616 |