CN107677699A - It is a kind of under high conditions in mirror surface dew point method detection gas micro-water content method - Google Patents
It is a kind of under high conditions in mirror surface dew point method detection gas micro-water content method Download PDFInfo
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- CN107677699A CN107677699A CN201710918356.7A CN201710918356A CN107677699A CN 107677699 A CN107677699 A CN 107677699A CN 201710918356 A CN201710918356 A CN 201710918356A CN 107677699 A CN107677699 A CN 107677699A
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- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/56—Investigating or analyzing materials by the use of thermal means by investigating moisture content
- G01N25/66—Investigating or analyzing materials by the use of thermal means by investigating moisture content by investigating dew-point
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Abstract
The invention discloses it is a kind of under high conditions in mirror surface dew point method detection gas micro-water content method, comprise the following steps, (1) test equipment temperature T1, the atmospheric pressure P of test site1；(2) start dew point hygrometer, be passed through nitrogen gas drying system, (3) test sample gas, obtain dew point T2, measure at least 3 times, untill numerical value is basicly stable；(4) the saturated vapor pressure table of ice is used, checks in dew point T2Corresponding water vapour pressure P2；(5) pressure correction of water vapor pressure and sulfur hexafluoride is returned 20 DEG C, under conditions of 1 atmospheric pressure using updating formula, tries to achieve the micro-water content X in the SF6 of standard state after correction of a final proof1.The present invention is corrected the test result of dew point hygrometer using the updating formula provided, makes test result more accurate according to the temperature of test equipment and the atmospheric pressure of testing location.
Description
Technical field
The invention belongs to dew point testing alignment technique field, more particularly to one kind mirror surface dew point method under high conditions to detect
The method of micro-water content in gas.
Background technology
Dew point hygrometer is a kind of important moisture measurement equipment, is widely applied in power system SF6Dew point detects, purification of air
And toilet, compressed air drying, steam turbine is anti-icing, dry industry, food processing, plastic substrate dry, ammonia production and it is pure
Degree maintenance etc., is widely applied in high altitude localities at present, but the test result and low altitude area of high altitude localities dew point hygrometer
There is very big deviation in area.The method of dew point hygrometer test water content is 20 DEG C, corresponding with dew point value in the case of 1 atmospheric pressure
Water vapour pressure divided by corresponding atmospheric pressure, obtain water content.But arrived under altitude environment, atmospheric pressure reduces, dew
Point value declines, and the partial pressure of water also reduces, but according to old computational methods, is still divided by 1 atmospheric pressure, then test knot
Great deviation will occur for fruit, if atmospheric pressure drops to 0.65, deviation can be up to 40%.But there has been no document report at present
Road how under high conditions in mirror surface dew point method detection gas the actual value of micro-water content method.
The content of the invention
In view of the shortcomings of the prior art, the present invention provides one kind micro- water in mirror surface dew point method detection gas under high conditions
The method of content.Correction calculation method provided by the invention mainly solves to run into pressure change and the environment band that altitude environment is brought
The temperature change come, correction mirror surface dew point method test measurement error during micro-water content.The present invention to temperature under altitude environment and
Pressure correct simultaneously, achieves more accurate result.
Technical scheme is as follows：It is a kind of under high conditions in mirror surface dew point method detection gas micro-water content side
Method, comprise the following steps：
Step (1) test equipment temperature T under high conditions1, the atmospheric pressure P of test site environment1；
Step (2) starts dew point hygrometer, is passed through nitrogen gas drying system；
Step (3) test sample gas, obtains dew-point temperature T2；The saturated vapor pressure table of ice is inquired about, obtains dew point T2It is corresponding
Water vapour pressure P2；
Step (4) by updating formula by the pressure correction of water vapor pressure and sample gas under high conditions return 20 DEG C, 1
Under conditions of individual atmospheric pressure, i.e., the micro-water content X under standard state in sample gas1；
The updating formula is as follows：
In formula：X1For the micro-water content in the SF6 of standard state after correction of a final proof；P2For water vapour pressure corresponding to dew point；
R is ideal gas constant；T1For device temperature；P1For live atmospheric pressure；T3For the temperature of standard state, typically take
293.15K。
Further, device temperature T described in step (1)1For equipment surface temperature.
Further, dew point testing more than 3 times in step (2), until dew-point temperature T2It is stable, when calculating value, with most
The latter measured value is defined.
Further, the sample gas is SF6 gases.
The features of the present invention is as follows：Because high conditions temperature and pressure all deviate from 20 DEG C, 1 of professional standard mark
The condition of atmospheric pressure, according to formula X1=PWater vapor pressure/PMixed gasBut dew point hygrometer test result be still water vapour pressure divided by 1
Atmospheric pressure, due to denominator numerical value change, molecule does not become, therefore produces very big deviation and need to correct.According to professional standard
It is required that the present invention is exactly that water vapor pressure and atmospheric pressure are corrected into 20 DEG C, 1 simultaneously using updating formula provided by the invention
Be divided by the standard water content after being corrected under conditions of atmospheric pressure.
The derivation of the updating formula approximately as：
If SF6 gases are the mixture of SF6 and water, according to the fitting of lot of experimental data,
The state equation of mixed gas is as follows：
V1For the specific volume of mixed gas, because being to wait specific volume change specific volume is constant.P3SF6 gases through excess temperature and
Pressure value after pressure correction under the status of criterion (20 DEG C).
For state equation of the atmospheric pressure of SF6 gases at the scene with a temperature of
For state equation of the SF6 gases at 1 atmospheric pressure and 20 DEG C
Upper and lower formula is linked up, deforms the SF6 gases asked after temperature and pressure corrects under the status of criterion (20 DEG C)
Pressure value (P3)。
Finally final water content is obtained using the pressure after water vapour pressure divided by SF6 gas calibrations.
Using the school
Positive formula can obtain the more accurate test result of micro-water content in sample gas.
Compared with prior art, the invention has the advantages that：Temperature and test of the present invention according to test equipment
The atmospheric pressure in place, the test result of dew point hygrometer is corrected using the updating formula provided, makes test result more accurate, tested
Process is simple, is easy to promote the use of.
Embodiment
Technical scheme is described in further details with reference to specific embodiment, but the present invention does not limit to
In following technical scheme.
Embodiment 1
Step (1) test equipment temperature T under Kunming Plateau environment1(303.15K), the atmospheric pressure P of test site1
(0.08MPa)；
Step (2) starts dew point hygrometer, leads to nitrogen gas drying system；
Step (3) tests sulfur hexafluoride (SF6) gaseous sample, obtains dew point T2(- 20.2 DEG C), measure at least 3 times, to number
Be worth it is basicly stable untill；The saturated vapor pressure table of ice is inquired about, checks in dew point T2Water vapour pressure P corresponding to (- 20.2 DEG C)2
(101.296Pa)。
The pressure correction of water vapor pressure and sulfur hexafluoride is returned 20 DEG C by step (4) using updating formula, the bar of 1 atmospheric pressure
Under part, and calculate micro-water content X in SF61,
Updating formula is as follows, updating formula result of calculation, in units of ppm：
Bring P into2P1T1T3Result is calculated in R, and calculating water content should be：1267.23ppm.This sample standard water content
It is 1260ppm, the deviation of calculated value of the invention and standard water-content is in the range of.But the water content that now equipment is shown also exists
1000ppm, the measured value of instrument are far smaller than standard value, and test method results provided by the invention are more accurate.
Claims (4)
1. it is a kind of under high conditions in mirror surface dew point method detection gas micro-water content method, it is characterised in that including following
Step：
Step (1) test equipment temperature T under high conditions1, the atmospheric pressure P of test site environment1；
Step (2) starts dew point hygrometer, is passed through nitrogen gas drying system；
Step (3) test sample gas, obtains dew-point temperature T2；The saturated vapor pressure table of ice is inquired about, obtains dew point T2Corresponding water
Steam pressure P2；
The pressure correction of water vapor pressure and sample gas under high conditions is returned 20 DEG C by step (4) by updating formula, 1 big
Under conditions of air pressure, i.e., the micro-water content X under standard state in sample gas1；
The updating formula is as follows：
<mrow>
<msub>
<mi>X</mi>
<mn>1</mn>
</msub>
<mo>=</mo>
<mfrac>
<mrow>
<msub>
<mi>P</mi>
<mn>2</mn>
</msub>
<mo>&times;</mo>
<mrow>
<mo>(</mo>
<mfrac>
<mrow>
<msub>
<mi>RT</mi>
<mn>1</mn>
</msub>
</mrow>
<msub>
<mi>P</mi>
<mn>1</mn>
</msub>
</mfrac>
<mo>-</mo>
<mn>0.0007972</mn>
<mo>&times;</mo>
<mo>(</mo>
<mrow>
<mfrac>
<mn>4268</mn>
<msubsup>
<mi>T</mi>
<mn>3</mn>
<mn>1.6</mn>
</msubsup>
</mfrac>
<mo>+</mo>
<mfrac>
<mrow>
<mn>1.2264</mn>
<mo>&times;</mo>
<msup>
<mn>10</mn>
<mn>9</mn>
</msup>
</mrow>
<msubsup>
<mi>T</mi>
<mn>3</mn>
<mn>4.2</mn>
</msubsup>
</mfrac>
<mo>-</mo>
<mfrac>
<mn>4268</mn>
<msubsup>
<mi>T</mi>
<mn>1</mn>
<mn>1.6</mn>
</msubsup>
</mfrac>
<mo>-</mo>
<mfrac>
<mrow>
<mn>1.2264</mn>
<mo>&times;</mo>
<msup>
<mn>10</mn>
<mn>9</mn>
</msup>
</mrow>
<msubsup>
<mi>T</mi>
<mn>1</mn>
<mn>4.2</mn>
</msubsup>
</mfrac>
</mrow>
<mo>)</mo>
<mo>)</mo>
</mrow>
</mrow>
<mrow>
<msub>
<mi>RT</mi>
<mn>3</mn>
</msub>
</mrow>
</mfrac>
<mo>;</mo>
</mrow>
In formula：X1For the micro-water content in the SF6 of standard state after correction of a final proof；P2For water vapour pressure corresponding to point；R is to think
Gas constant；T1For device temperature；P1For live atmospheric pressure；T3The temperature for the state that is defined, typically takes 293.15K.
2. as claimed in claim 1 under high conditions in mirror surface dew point method detection gas micro-water content method, its feature
It is, device temperature T described in step (1)1For equipment surface temperature.
3. as claimed in claim 1 under high conditions in mirror surface dew point method detection gas micro-water content method, its feature
It is, dew point testing more than 3 times in step (2), until dew-point temperature T2It is stable, when calculating value, with last measured value
It is defined.
4. as described in claims 1 to 3 is any under high conditions in mirror surface dew point method detection gas micro-water content method,
Characterized in that, the sample gas is SF6 gases.
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| CN201710918356.7A CN107677699B (en) | 2017-09-30 | 2017-09-30 | Method for detecting micro-water content in SF6 gas by mirror dew point method under plateau condition |
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| CN201710918356.7A CN107677699B (en) | 2017-09-30 | 2017-09-30 | Method for detecting micro-water content in SF6 gas by mirror dew point method under plateau condition |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109813866A (en) * | 2019-01-24 | 2019-05-28 | 中南大学 | The measuring system and measurement method of unsaturation frozen soil matric potential |
| CN110632120A (en) * | 2019-10-24 | 2019-12-31 | 广州供电局有限公司 | Method, system and device for detecting humidity of mixed gas and computer equipment |
| CN111198205A (en) * | 2018-11-20 | 2020-05-26 | 诚田自动化仪表（上海）有限公司 | Dew point sensor's test system |
| CN112051080A (en) * | 2020-08-07 | 2020-12-08 | 福建福清核电有限公司 | Evaluation method for dew point measurement test of nuclear power station compressed air dryer |
| CN113865288A (en) * | 2021-10-14 | 2021-12-31 | 江苏鑫华半导体材料科技有限公司 | Method for evaluating drying effect of bagged polycrystalline silicon |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111198205A (en) * | 2018-11-20 | 2020-05-26 | 诚田自动化仪表（上海）有限公司 | Dew point sensor's test system |
| CN109813866A (en) * | 2019-01-24 | 2019-05-28 | 中南大学 | The measuring system and measurement method of unsaturation frozen soil matric potential |
| CN109813866B (en) * | 2019-01-24 | 2021-08-17 | 中南大学 | Method for measuring matrix potential of unsaturated frozen soil |
| CN110632120A (en) * | 2019-10-24 | 2019-12-31 | 广州供电局有限公司 | Method, system and device for detecting humidity of mixed gas and computer equipment |
| CN110632120B (en) * | 2019-10-24 | 2022-08-02 | 广东电网有限责任公司广州供电局 | Method, system and device for detecting humidity of mixed gas and computer equipment |
| CN112051080A (en) * | 2020-08-07 | 2020-12-08 | 福建福清核电有限公司 | Evaluation method for dew point measurement test of nuclear power station compressed air dryer |
| CN113865288A (en) * | 2021-10-14 | 2021-12-31 | 江苏鑫华半导体材料科技有限公司 | Method for evaluating drying effect of bagged polycrystalline silicon |
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