CN107632479A - A kind of modified electrochromism automobile rear view mirror lens - Google Patents
A kind of modified electrochromism automobile rear view mirror lens Download PDFInfo
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Abstract
The present invention relates to a kind of modified electrochromism vehicle mirrors eyeglass.Eyeglass includes first layer transparent conducting glass, electrochromic material intermediate layer and second layer conducting reflective glass.First layer transparent conducting glass by the first face of ingress of air and contact electrochromic material and be coated with the reflective coating of edge annular, the second face of transparency conducting layer and insulating film layer is formed.Multilayer film is disposably deposited by continuous vacuum coating on a glass substrate, is included in one layer of dielectric film of deposition on conductive film layer, prevents that conducting film is short-circuit with electrode contacts and causes electrochromism eyeglass colour change function to fail.It can be applied to the fields such as vehicle inside/outside rearview mirror.
Description
Technical field
The present invention relates to electrochromism field, relates more specifically in electrochromism inside-automobile rear mirror and outside rear-view mirror
Glass film layers preparation structure.
Background technology
The electrochromism of material refers to that reversible change can occur for the color of the material under extra electric field.That is, when apply certain
During kind polar voltages, the color of material can shoal and visible light transmissivity increases therewith, and this phenomenon referred to as " is faded "；Work as voltage
Opposite polarity when, the color burn and visible light transmissivity of material are reduced therewith, and this phenomenon referred to as " colours ".Electrochromism
Material can be used to make a variety of devices and be used for multiple fields to improve work and living environment.For example utilize the technological development
Anti-glare rear-view mirror for automobile can be increased absorption to light by electrochromic material and be reduced from strong dizzy of rear view of vehicle
Light, so as to improve the security of driving.At present, anti-dazzle driving mirror turns into the standard fitting that most automakers provide.
Earliest electrochromic rearview construction be followed successively by the first substrate of glass, the first transparency conducting layer, electrochromic layer,
Second transparency conducting layer, the second substrate of glass and reflecting layer.Reflecting layer is by silver metal layer, copper metal layer and one or more layers protection
Paint is formed.Wherein, light is to enter electrochromic rearview from the first substrate of glass side.To simplify preparation technology and eliminating miscellaneous
Scattered reflection and ghost image, follow-up developments are by reflecting layer from the rear of the second substrate of glass（4th surface）It is transferred to the second glass base
The front at bottom（3rd surface）；In addition, conducting reflective film layer is also gradually evolved into mesh from initial multiple layer metal film layer such as Cr/Ag
Preceding metal oxide film layer/metallic diaphragm or metal oxide film layer/transparent conductive film layer.Correspondingly, EC mirror
The structure of piece also carried out miscellaneous transformation, including film layer structure is greatly improved, such as CN201610972286.9
In, it is noted that endless metal film layer is added in above a piece of transparent conducting glass, improves energization discoloration rate.Simultaneously by original
The electric current come collects bar and has made electrode contacts into, and original longer buckle-type metal copper bar is replaced with electroconductive resin.Due to conduction
Resin is easily contacted with the conductive film layer of first piece and the second sheet glass and causes short circuit, and aforementioned patent is carried out to conductive film layer
Etching, realizes contact of the electroconductive resin with respective electrode contact.Etching mode is to use laser sintered or chemical etching, but is easily made
Together it is eclipsed with conductive film layer into reflecting layer, causes whole electrochromic rearview product to be reduced in production because short circuit increases
Qualification rate.
The content of the invention
To overcome above-mentioned the deficiencies in the prior art, the present invention provides a kind of one layer of insulating film layer of preparation on conductive film layer
Method, it is intended to improve currently employed lithographic method and solve the problems, such as conductive film layer and conductive adhesive short circuit, and improve electroluminescent change
The production efficiency of color car mirror and the production technology for simplifying electrochromism car mirror.
The technical solution used in the present invention is：
A kind of Electrochromic automobile rearview mirror, eyeglass include first layer transparent conducting glass, electrochromic material intermediate layer and the
Two layers of conducting reflective glass；First face and contact electrochromic material of the described first layer transparent conducting glass by ingress of air
And the second face for being coated with the annular reflective coating in edge, transparency conducting layer and oxide membranous layer is formed；The described second layer is conductive
Reflecting glass is made up of the 3rd face of conducting reflective film layer and the fourth face of ingress of air for being coated with contact electrochromic material；
The thickness of each film layers such as the annular reflection film layer, transparency conducting layer, oxidation film transparent material layer and conducting reflective film layer
Spend for 10 ~ 300nm.
The film layer structure of the first layer transparent conducting glass is：Glass substrate/annular reflection film layer/nesa coating
Layer/insulating film layer；
The annular reflection film layer from the width of glass substrate periphery inwards be 0.2 ~ 10mm, thickness be 10 ~ 300nm；
The film material of described annular reflection film layer is by silver, gold, platinum, ruthenium, rhodium, palladium, chromium, nickel, niobium, titanium oxide, niobium oxide, oxygen
Change zirconium, silica or one kind and the material composition of the above in tantalum oxide；
Described nesa coating layer material is by indium tin oxide target, fluorine doped tin oxide, gallium oxide zinc, oxidation gallium indium tin, aluminum zinc oxide
In one kind and the above material form；
Described insulating film layer material by one kind in titanium oxide, niobium oxide, silica, tantalum oxide, aluminum oxide, magnesium fluoride and with
On material form；
Described insulating film layer, from the second face conductive film layer periphery inwards, width is 0.5 ~ 6mm, and length is outer rim electrode
Contact extends 0.1mm ~ 100mm to both sides or forms loop configuration.
The described facial mask Rotating fields of the second transparent conducting glass the 3rd are：Transparent conductive film layer/reflecting layer/glass substrate
Or conductive reflective/metal oxide film layer/substrate；
Described reflective coating material is by one kind and the material of the above in titanium oxide, niobium oxide, zirconium oxide, silica, tantalum oxide
Material is formed；
Described conducting reflective film material is made up of the one or more in silver, gold, chromium, ruthenium, platinum, rhodium and palladium；
Described metal oxide film layer, it is characterised in that film material is by titanium oxide, niobium oxide, silica, tantalum oxide, oxygen
The material for changing tin indium, fluorine doped tin oxide, gallium oxide zinc, oxidation gallium indium tin, one kind in aluminum zinc oxide and the above is formed.
First layer transparent conducting glass film layer structure of the present invention is glass substrate/annular reflection film layer/electrically conducting transparent
Film layer/insulating film layer, successfully solving electroconductive resin and directly being contacted with transparency conducting layer causes short circuit and causes electrochromism EC
The problem of mirror product electrochromism disabler.This technology has equally also successfully been used in the second conducting reflective glass.
Further preferably, the material of annular reflection film layer is selected from metal material（Silver, gold, platinum, ruthenium, rhodium, palladium, chromium, nickel, niobium）
Or cheap metal oxide（Titanium oxide, niobium oxide, zirconium oxide, silica or tantalum oxide）, by therein a kind of or more
Kind is formed.
Further preferably, the film material of annular reflection film layer is cheap single-layer metal material（Silver, gold, platinum,
Ruthenium, rhodium, palladium, chromium, nickel, niobium）Or metal oxide（Titanium oxide, niobium oxide, zirconium oxide）Or containing symmetrical sandwiched type structure（Oxidation
Titanium/silicon/titanium, niobium oxide/silica/niobium oxide, zirconium oxide/silica/zirconium oxide）And asymmetric sandwich style
Structure（Titanium oxide/silica/niobium oxide, zirconium oxide/silicon/titanium, niobium oxide/silica/zirconium oxide）A variety of gold
Belong to oxide.
Insulating film layer material of the present invention is by one kind and the metal of the above in titanium, niobium, silicon, tantalum, aluminium, chromium or magnesium thing
Oxide or metal nitride materials are formed.
Further preferably, the thicknesses of layers of insulating film layer material is 10 ~ 300nm, and insulating film layer is from the second face conductive film layer
The width of periphery inwards is 0.5 ~ 6mm, the length 1mm ~ 100mm extended from outer rim electrode contacts to both sides or be ring junction
Structure.
Further preferably, the thicknesses of layers of insulating film layer material is 50 ~ 100nm, and insulating film layer is from the second face conductive film layer
Periphery inwards, width are 1.5 ~ 4mm, and the length extended from outer rim electrode contacts to both sides is 5mm ~ 40mm or is ring junction
Structure.
The facial mask Rotating fields of second transparent conducting glass the 3rd of the present invention are transparent conductive film layer/reflecting layer/glass
Base, described reflective coating material is by one kind and the material of the above in titanium oxide, niobium oxide, zirconium oxide, silica, tantalum oxide
Form.
Further preferably, reflective coating structure is symmetrical sandwiched type structure（Titanium oxide/silicon/titanium, oxidation
Niobium/silica/niobium oxide, zirconium oxide/silica/zirconium oxide）And asymmetric sandwiched type structure（Titanium oxide/silica/oxygen
Change niobium, zirconium oxide/silicon/titanium, niobium oxide/silica/zirconium oxide）.
The facial mask Rotating fields of second transparent conducting glass the 3rd of the present invention are that conducting reflective film layer/metal oxide is anti-
Film layer/substrate is penetrated, described reflective coating material is by one or more structures in silver, gold, chromium, ruthenium, platinum, rhodium, titanium, nickel and palladium
Into the metal oxide film layer is by titanium oxide, niobium oxide, silica, tantalum oxide, indium tin oxide target, fluorine doped tin oxide, gallium oxide
Zinc, the material composition for aoxidizing gallium indium tin, one kind in aluminum zinc oxide and the above.
Further preferably, metal oxide film layer structure is low-refraction transparent conductive oxide/high index of refraction metal oxygen
Compound/substrate, high refractive index metal oxide contact with substrate, plate last layer low-refraction transparent conductive oxide afterwards and help
In the reflectivity for not reducing whole electrochromism eyeglass, the thickness of conducting reflective film layer precious metal material is reduced, reaches reduction electricity
Cause the purpose of color-changing lens cost.
Compared with prior art, beneficial effects of the present invention are：
In the present invention, first layer electrically conducting transparent is formed with glass substrate/annular reflection film layer/transparent conductive film layer/insulating film layer
Glass film layers structure, second layer conducting reflective glass film layers structure is by transparent conductive film layer/reflecting layer/glass substrate or conductive anti-
Film layer/metal oxide reflective coating/substrate is penetrated to form.Wherein insulating film layer, which has, prevents that conductive film layer is direct with electroconductive resin
Contact causes the function of short circuit.Physical vapour deposition (PVD) can be utilized in first layer transparent conductive film layer glass due to insulating film layer or
The preparation technology of second layer conducting reflective film layer glass continuously produces, therefore significantly excellent in production technology and production cost
In the method for presently used etching conductive film layer.Second layer conducting reflective glass film layers structure is also improved, by tradition
The film layer structure of all-metal film layer structure substrate/chromium/silver be changed into glass substrate/reflecting layer/transparent conductive film layer or glass
Substrate/high refractive index metal oxide film layer/low-refraction metal conductive oxide film layer/metallic conductive reflective film layer.
Brief description of the drawings
Fig. 1 is the structural representation of the Electrochromic automobile rearview mirror eyeglass of the embodiment of the present invention 1.Wherein, 101 first is saturating
The substrate glass of bright electro-conductive glass, the substrate glass of 102 second conducting reflective glass, 103 it is electrochromic material layer, 104 saturating
Bright conductive film layer, 105 conducting reflective film layers, 108 conducting reflective film layers, 109 annular reflection film layers, 106 conducting reflective film layers are carved
Lose cut-off rule, 107 fluid sealants, 110 insulating film layers, 111 metal electrode films.
Fig. 2 is the structural representation of the conducting reflective film layer of patent Example 1 of the present invention.Wherein, 102 second conducting reflective
The substrate glass of glass, 106 conducting reflective film layers etching cut-off rule, 112 high refractive index metal oxide film layers, 113 low refractions
Rate metal conductive oxide film layer, 114 metallic conductive reflective film layers.
Fig. 3 A and 3B are the structural representation of the transparent conducting glass film layer of patent Example 1 of the present invention.Wherein 101 first
The substrate glass of transparent conducting glass, 104 transparent conductive film layers, 109 annular reflection film layers, 110 insulating film layers, 115 negative poles touch
Point, 116 cathode contacts.
Fig. 4 is the structural representation of the Electrochromic automobile rearview mirror eyeglass of the present embodiment 2.Wherein, 101 first transparent lead
The substrate glass of electric glass, the substrate glass of 102 second conducting reflective glass, 103 be electrochromic material layer, 104 transparent lead
Electrolemma layer, 105 conducting reflective film layers, 108 conducting reflective film layers, 109 annular reflection film layers, 106 conducting reflective film layers etching point
Secant, 107 fluid sealants, 110 insulating film layers, 111 metal electrode films.
Fig. 4 is the structural representation of the conducting reflective film layer of patent Example 2 of the present invention.Wherein, 102 second conducting reflective
The substrate glass of glass, 112 high refractive index metal oxide film layers, 113 low-refraction metal conductive oxide film layers, 114 gold medals
Belong to conducting reflective film layer.
Fig. 5 is the structural representation of the conducting reflective film layer of patent Example 3 of the present invention.Wherein, 102 second is conductive anti-
Penetrate the substrate glass of glass, 118 high-index material film layers, 119 low-index material film layers, 120 high-index material film layers,
121 transparent conductive film layers, 110 insulating film layers.
Fig. 6 be patent Example 4 of the present invention the first transparent conducting glass film layer in 109 annular reflection film layers combination
Schematic diagram.Wherein film layer order is respectively 101/ high refractive index transparent film layer of the first transparent conducting glass substrate, 130/ low folding
Penetrate the high refractive index transparent film layer 132 of rate transparent material film layer 131/.
Specific embodiment
The present invention is described in further detail below in conjunction with specific embodiment, the present embodiment is only further to the present invention
Explanation, it is impossible to be interpreted as limiting the scope of the invention.
Embodiment 1
According to the structure shown in Fig. 1, by noble silver be target by vacuum magnetic-control sputtering in a manner of it is heavy in substrate glass 101
The annular silver layer 109 that one tunic thickness of product is the wide 5mm of 15nm；Then the thick indium tin oxide targets of 200nm are deposited in whole substrate glass
Transparent conductive film layer 104, the film layer square resistance for depositing annular silver layer redeposition indium tin oxide layer after tested are less than 3 ohm,
The square resistance that indium tin oxide target film layer is only plated in substrate glass intermediate region is 9 ~ 11 ohm；The mode finally blocked with mould is in oxygen
Change the insulating film layer 110 that the wide 100mm length of layer of silicon dioxide 30nm thickness 4mm is deposited in tin indium film layer；Pass through above-mentioned continuous vacuum
The mode and film deposition technical process of magnetron sputtering obtain transparent conducting glass（See Fig. 3 A and 3B).According to shown in Fig. 2, second
Conducting reflective glass is that 200nm silica 1 12/50nm gallium oxide zinc 113/20nm gold is sequentially depositing on glass substrate 102
Belong to silver layer 114, the reflectivity of obtained conducting reflective film layer is 75%（400 ~ 800nm of visible-range）, surface resistance is 1.6 Europe
Nurse, need that conductive film layer is etched into a line 106 outside electrode contacts after film deposition is complete, in order to avoid positive wire is caused with leading
The conductive film layer of galvanic reflex glass kind directly contacts and short-circuit.
First transparent conducting glass 101 of gained and the second conducting reflective glass 102 are sealed to form sky with fluid sealant 107
Chamber, electrochromic material 103 is filled in cavity inside, at the same be embedded to respectively at the both ends of fluid sealant 107 115 cathode contacts and
116 cathode contacts（See Fig. 3 B）And it is bonded contact conductor 111 with electroconductive resin respectively and positive and negative electrode is led into conducting reflective glass
The back side of glass 102, thus form Electrochromic automobile rearview mirror eyeglass.
As can be seen that mask method disclosed by the invention can be by on-line coating mode once from above-described embodiment
Property prepare the first transparent conducting glass, it is not necessary to the offline side with etching after film layer has been deposited using transparent conducting glass again
Formula prepares the cut-off rule of conductive film layer, reduces the production stage of product, so as to improve production efficiency, reduces product
Disqualification rate.
Embodiment 2
According to the structure shown in Fig. 4, by noble ruthenium be target by vacuum magnetic-control sputtering in a manner of deposit in substrate glass 101
One tunic thickness is the wide 3mm of 25nm annular layer of ruthenium 109；Then the thick fluorine doped tin oxides of 400nm are deposited in whole substrate glass
Transparent conductive film layer 104, the film layer square resistance for depositing annular layer of ruthenium redeposition indium tin oxide layer after tested are less than 4 ohm,
The square resistance that substrate glass intermediate region only deposits fluorine doped tin oxide film layer is 10 ~ 12 ohm；The side finally blocked with mould
Formula deposits the insulating film layer alundum (Al2O3) 110 of the wide 60mm length of one layer of 80nm thickness 2.5mm in fluorine doped tin oxide film layer；By upper
State film deposition technical process and obtain the first transparent conducting glass.Second conducting reflective glass be on glass substrate 102 successively
Deposit 150nm tantalum pentoxide 112/80nm indium gallium zinc 113/15nm metals silver film 114, obtained conducting reflective film layer
Reflectivity be 76%（400 ~ 800nm of visible-range）, surface resistance is 1.7 ohm, needs to touch in electrode after film deposition is complete
Point is outer to etch a line 106 by conductive film layer, in order to avoid cause positive wire and the conductive film layer of conducting reflective glass kind to contact
It is and short-circuit.
First transparent conducting glass 101 of gained and the second conducting reflective glass 102 are sealed to form sky with fluid sealant 107
Chamber, electrochromic material 103 is filled in cavity inside, at the same be embedded to respectively at the both ends of fluid sealant 107 115 cathode contacts and
116 cathode contacts（See Fig. 3 B）And it is bonded contact conductor 111 with electroconductive resin respectively and positive and negative electrode is led into conducting reflective glass
The back side of glass 102, thus form Electrochromic automobile rearview mirror eyeglass.
As can be seen that mask method disclosed by the invention can be by on-line coating mode once from above-described embodiment
Property prepare the first transparent conducting glass, it is not necessary to the offline side with etching after film layer has been deposited using transparent conducting glass again
Formula prepares the cut-off rule of conductive film layer, so as to improve production efficiency, reduces the disqualification rate of product.In addition, in this hair
For the bright middle film layer using high index of refraction as underlayer film material, the nesa coating layer material with respect to low-refraction is the second film layer
Material, same effect can also be reached by then depositing one layer of relative relatively thin Ag layer of embodiment 1 on the surface, reduce your gold
Belong to materials'use amount, reduce production cost and shorten the sedimentation time of noble metal silver layer.
Embodiment 3
According to the structure shown in Fig. 1, by rhodium be target by vacuum magnetic-control sputtering in a manner of in substrate glass 101 deposit a tunic
Thickness is the wide 6mm of 30nm annular rhodium layer 109；Then the thick aluminum zinc oxide electrically conducting transparents of 400nm are deposited in whole substrate glass
Film layer 104, the film layer square resistance for depositing annular rhodium layer redeposition indium tin oxide layer after tested is less than 3 ohm, in substrate glass
The square resistance that aluminum zinc oxide film layer is only plated in intermediate region is 10 ~ 12 ohm；The mode finally blocked with mould is in aluminum zinc oxide
One layer of wide annular insulating film layer 110 of niobium pentaoxide 100nm thickness 5mm is deposited in film layer；Pass through above-mentioned continuous vacuum magnetron sputtering
Mode and film deposition technical process obtain transparent conducting glass（See Fig. 3 A and 3B).As shown in figure 5, the second conducting reflective glass
Glass is that 150nm tantalum pentoxide high index rate material 118/120nm magnesium fluoride low-refractions are sequentially depositing on glass substrate 102
Material 119/200nm niobium pentaoxide high-index material 120/500nm indium tin oxide targets transparent conductive material 121, finally uses mould
Have the mode blocked and the exhausted of the wide 80mm length of one layer of alundum (Al2O3) 100nm thickness 5mm is deposited on indium tin oxide target transparent conductive film layer
Velum layer 110.The reflectivity of obtained conducting reflective film layer is 65%（400 ~ 800nm of visible-range）, surface resistance is 10 ~ 12
Ohm, conductive film layer a line 106 need not be etched into outside electrode contacts after film deposition is complete.
First transparent conducting glass 101 of gained and the second conducting reflective glass 102 are sealed to form sky with fluid sealant 107
Chamber, electrochromic material 103 is filled in cavity inside, at the same be embedded to respectively at the both ends of fluid sealant 107 115 cathode contacts and
116 cathode contacts（See Fig. 3 B）And it is bonded contact conductor 111 with electroconductive resin respectively and positive and negative electrode is led into conducting reflective glass
The back side of glass 102, thus form Electrochromic automobile rearview mirror eyeglass.
As can be seen that mask method disclosed by the invention can be by on-line coating mode once from above-described embodiment
Property prepare the first transparent conducting glass and the second electrically conducting transparent reflecting glass, it is not necessary to again using the first transparent conducting glass and
Second electrically conducting transparent reflecting glass has deposited the offline cut-off rule that conductive film layer is prepared with the mode etched after film layer, simplifies
Production technology, substantially increases production efficiency, reduces the disqualification rate of product.
Embodiment 4
According to the structure shown in Fig. 1 and Fig. 6, by niobium and silicon be target by vacuum reaction magnetron sputtering in a manner of in substrate glass
The 101 annular reflective coatings of deposition, the structure of annular reflection film layer is substrate glass/150nm niobium pentaoxide 130/120nm dioxies
SiClx 131/200nm titanium dioxide 132, width are 6mm annular reflection film layer 109；Then deposited in whole substrate glass
Indium tin oxide target transparent conductive film layer 104 thick 160nm, it is 10 ~ 12 in the square resistance of substrate glass deposition of transparent conductive film layer
Ohm；The wide 150mm length insulation of one layer of magnesium fluoride 50nm thickness 2mm is finally deposited in aluminum zinc oxide film layer with the mode that mould blocks
Film layer 110；By way of above-mentioned continuous vacuum magnetron sputtering and film deposition technical process obtains transparent conducting glass（See figure
3A and 3B).As shown in figure 5, the second conducting reflective glass is that 150nm tantalum pentoxides height is sequentially depositing on glass substrate 102
Refraction materials 118/120nm magnesium fluoride low-index material 119/200nm niobium pentaoxide high-index materials 120/20nm
Silver-platinum alloy conducting reflective film material 121, one layer is finally deposited on silver-platinum alloy conductive film layer with the mode that mould blocks
The wide annular insulating film layers 110 of silicon nitride 100nm thickness 3mm.The reflectivity of obtained conducting reflective film layer is 75%（Visible ray model
Enclose 400 ~ 800nm）, surface resistance is 1.3 ~ 1.5 ohm, need not be carved conductive film layer outside electrode contacts after film deposition is complete
Lose a line 106.
First transparent conducting glass 101 of gained and the second conducting reflective glass 102 are sealed to form sky with fluid sealant 107
Chamber, electrochromic material 103 is filled in cavity inside, at the same be embedded to respectively at the both ends of fluid sealant 107 115 cathode contacts and
116 cathode contacts（See Fig. 3 B）And it is bonded contact conductor 111 with electroconductive resin respectively and positive and negative electrode is led into conducting reflective glass
The back side of glass 102, thus form Electrochromic automobile rearview mirror eyeglass.
As can be seen that mask plate method disclosed by the invention can be by on-line coating mode once from above-described embodiment
Property prepare the first transparent conducting glass and the second electrically conducting transparent reflecting glass, it is not necessary to again using the first transparent conducting glass and
Second electrically conducting transparent reflecting glass has deposited the offline cut-off rule that conductive film layer is prepared with the mode etched after film layer, simplifies
Production technology, substantially increases production efficiency, reduces the disqualification rate of product.
Claims (14)
1. a kind of modified electrochromism vehicle mirrors eyeglass, it is characterised in that the eyeglass includes first layer electrically conducting transparent
Glass, electrochromic material intermediate layer and second layer conducting reflective glass；Described first layer transparent conducting glass is empty by contact
First face of gas and contact electrochromic material and reflective coating, transparency conducting layer and oxide or the nitridation for being coated with edge annular
Second face of thing film layer is formed；Described second layer conducting reflective glass contacts the conducting reflective film of electrochromic material by being coated with
3rd face of layer and the fourth face of ingress of air are formed.
2. electrochromic window assemblies as claimed in claim 1, it is characterised in that the annular reflection film layer, transparency conducting layer, oxygen
The thickness of compound or each film layer such as nitride film transparent material layer and conducting reflective film layer is 10 ~ 500nm.
3. the second face of the first transparent conducting glass as claimed in claim 1, it is characterised in that the glass substrate and transparent
Contain annular reflection film layer between conductive film layer, separately have in nesa coating outer layer and an insulating film layer is set.
4. annular reflection film layer as claimed in claim 3, it is characterised in that the annular film layer is inside from glass substrate outer rim
Extension, width is 0.2 ~ 10mm, thicknesses of layers is 10 ~ 500nm.
5. annular reflection film layer as claimed in claim 3, it is characterised in that film material by silver, gold, platinum, ruthenium, rhodium, palladium, chromium,
The material of one kind and the above in nickel, niobium, titanium oxide, zirconium oxide, niobium oxide, silica or tantalum oxide is formed.
6. transparent conductive film layer as claimed in claim 3, it is characterised in that the film material is by indium tin oxide target, fluorine doped
Tin oxide, gallium oxide zinc, the material composition for aoxidizing gallium indium tin, one kind in aluminum zinc oxide and the above.
7. insulating film layer as claimed in claim 3, it is characterised in that the film material by silicon, titanium, niobium, tantalum, aluminium, magnesium,
The oxide or nitride material of one kind and the above in chromium, nickel, tungsten are formed.
8. insulating film layer as claimed in claim 3, it is characterised in that insulating film layer is wide from conductive film layer periphery inwards
It is respectively to extend 0.1mm ~ 100mm or formation loop configuration from electrode contacts to both sides to spend for 0.5 ~ 6mm, length.
9. the 3rd face of the second transparent conducting glass as claimed in claim 1, it is characterised in that the glass substrate and transparent
Contain reflective coating between conductive film layer.
10. transparent conductive film layer as claimed in claim 9, it is characterised in that the film material is by indium tin oxide target, fluorine doped
Tin oxide, gallium oxide zinc, the material composition for aoxidizing gallium indium tin, one kind in aluminum zinc oxide and the above.
11. reflective coating as claimed in claim 9, it is characterised in that film material by titanium oxide, zirconium oxide, niobium oxide,
The material of one kind and the above in silica, tantalum oxide is formed.
12. the 3rd face of the second transparent conducting glass as claimed in claim 1, it is characterised in that the glass substrate and lead
Contain metal oxide film layer between galvanic reflex film.
13. the conducting reflective film material as described in claims 12 is by silver, gold, chromium, ruthenium, platinum, rhodium, titanium, nickel and palladium
One or more are formed.
14. the metal oxide film layer as described in claims 12, it is characterised in that film material by titanium oxide, niobium oxide,
Silica, tantalum oxide, indium tin oxide target, fluorine doped tin oxide, gallium oxide zinc, oxidation gallium indium tin, one kind in aluminum zinc oxide and more than
Material form.
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| CN201711083551.9A CN107632479A (en) | 2017-11-07 | 2017-11-07 | A kind of modified electrochromism automobile rear view mirror lens |
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| CN201711083551.9A CN107632479A (en) | 2017-11-07 | 2017-11-07 | A kind of modified electrochromism automobile rear view mirror lens |
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| CN115261792A (en) * | 2022-07-05 | 2022-11-01 | 锦西化工研究院有限公司 | Preparation method of electrochromic coating |
| CN115291449A (en) * | 2022-08-12 | 2022-11-04 | 台玻(青岛)光电科技有限公司 | Conductive mirror of electrochromic mirror |
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| CN108363257A (en) * | 2018-02-11 | 2018-08-03 | 宁波祢若电子科技有限公司 | A kind of modified electrochromic device |
| CN108363257B (en) * | 2018-02-11 | 2022-04-19 | 宁波祢若电子科技有限公司 | Improved electrochromic device |
| CN108646497A (en) * | 2018-07-17 | 2018-10-12 | 合肥威驰科技有限公司 | Using the traffic electrochomeric glass and glass assembly of laser grooving circuit arrangement |
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| CN110196465A (en) * | 2019-06-14 | 2019-09-03 | 安徽大河镜业有限公司 | A kind of silver-plated mirror and preparation method thereof |
| CN111025809A (en) * | 2019-11-18 | 2020-04-17 | 爱卓智能科技(上海)有限公司 | Method for conveniently filling electrochromic liquid into electrochromic rearview mirror |
| WO2021110161A1 (en) * | 2019-12-05 | 2021-06-10 | 常州雅谱新材料有限公司 | Electrochromic rear-view mirror assembly |
| CN111455334A (en) * | 2020-04-23 | 2020-07-28 | 爱卓智能科技(上海)有限公司 | Method for manufacturing shielding layer conductive film for anti-glare rearview mirror |
| JP7373463B2 (en) | 2020-05-29 | 2023-11-02 | 美里工業株式会社 | All-solid-state EC mirror, vehicle mirror device |
| CN111650799A (en) * | 2020-06-09 | 2020-09-11 | 爱卓智能科技(上海)有限公司 | Shielding layer conducting film for anti-glare rearview mirror and manufacturing method thereof |
| CN115261792A (en) * | 2022-07-05 | 2022-11-01 | 锦西化工研究院有限公司 | Preparation method of electrochromic coating |
| CN115261792B (en) * | 2022-07-05 | 2023-10-13 | 锦西化工研究院有限公司 | Preparation method of electrochromic coating |
| CN115291449A (en) * | 2022-08-12 | 2022-11-04 | 台玻(青岛)光电科技有限公司 | Conductive mirror of electrochromic mirror |
| CN115390171A (en) * | 2022-08-17 | 2022-11-25 | 鹤山市嘉米基光电科技有限公司 | Color-changeable high-reflection reflector and preparation method thereof |
| CN115390171B (en) * | 2022-08-17 | 2023-10-13 | 鹤山市嘉米基光电科技有限公司 | Variable-color high-reflection reflector and preparation method thereof |
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