CN107584858A - A kind of half tone manufacturing process being exposed using collotype - Google Patents

A kind of half tone manufacturing process being exposed using collotype Download PDF

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Publication number
CN107584858A
CN107584858A CN201710852001.2A CN201710852001A CN107584858A CN 107584858 A CN107584858 A CN 107584858A CN 201710852001 A CN201710852001 A CN 201710852001A CN 107584858 A CN107584858 A CN 107584858A
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Prior art keywords
half tone
collotype
exposure
exposed
film
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CN201710852001.2A
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CN107584858B (en
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杨家生
裴改梅
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MURAKAMI (KUNSHAN) CO Ltd
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MURAKAMI (KUNSHAN) CO Ltd
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention relates to a kind of half tone manufacturing process being exposed using collotype:1) collotype is placed on exposure machine platform according to positioning, figuratum one upwardly;2) collotype is cleaned;3) half tone is cleaned;4) by the P of half tone downwards, it is placed on according to positioning on collotype;5) the suitable time for exposure is selected to be exposed;6) said process is repeated, manufacture obtains half tone.Compared with prior art, the present invention instead of the film film of PET sheet base using collotype, after collotype is placed on into exposure machine platform, it need not move, after upper half tone end exposure, after cleaning panes, next half tone can be placed, activity time can be saved., can be with continuous exposure, the problem of without worrying change in size and influence of the humiture to glass substrate is small.

Description

A kind of half tone manufacturing process being exposed using collotype
Technical field
The present invention relates to silk-screen printing field, and work is manufactured more particularly, to a kind of half tone being exposed using collotype Skill.
Background technology
Silk-screen printing belongs to porous printing, and it is collectively known as four big printing processes with flat stamping, convex print, gravure.Hole version print Brush includes stencil, engraves hole flower stencil, spraying decoration and silk-screen printing etc..
Silk-screen printing general principle:Using half tone need printing mesh can saturating ink, non-printing part mesh is not The general principle of strike through is printed.Ink is poured on screen printing forme one end during printing, with oil of the scraper plate on screen printing forme Black position applies certain pressure, while is moved towards the screen printing forme other end.The ink net by scraper plate from printing on the move It is expressed in hole on stock.
The principle that half tone makes, be using emulsion (or being " photoresists ") to the chemical reaction of ultraviolet and The opening that is formed carries out photosensitive lithographic after silk screen latitude and longitude interweave so that the emulsion of non-printing part by photo-hardening and Mesh is blocked, and prints part then because of emulsion not after chemical reaction, can be dissolved and airbreak when meeting water.This technique As exposure, development.
In exposure, the film film for the figure for describing printing in need is sticked on into half tone surface, the partial graphical is Black, when ultraviolet irradiates, ultraviolet is sheltered from, remainder ultraviolet passes through film film by the emulsion on half tone Solidification.
Film film is made up of chip base and sensitive emulsion layer.The material of sensitive emulsion layer is silver halide.High-precision laser is retouched Draw equipment to be irradiated film film according to the data editted, promote silver halide to decompose, become black Argent grain, pass through Cross fixing, the development of specific decoction so that the black graphics consistent with design original text are produced on film film.
But the film film of PET sheet base, the change to humiture is more sensitive, the figure after change occurs in humiture Size also occurs change or even exceeds acceptability limit.And the easy injured of film film, the scuffing of PET sheet base, acid and alkali-resistance, is not used Life-span is shorter.And with the continuous development of solar cell, PCB, IC package industry, increasingly thinner to the width of printed pattern, Dimension precision requirement more and more higher.
Chinese patent CN104339900A discloses a kind of silk-screen printing technique, generally comprises and prepares screen printing forme, prepares Photoresists, the processing steps such as photoresists, upper photoresists, exposure, development, maintenance, examination printing and formal printing are prepared, and in this work Careful process modification has been carried out on the basis of skill step.But the patent application is still the PET film films, easily because warm and humid The change of degree causes changing for size, and PET materials are easier to injured scuffing.
The content of the invention
It is an object of the present invention to overcome the above-mentioned drawbacks of the prior art and provide one kind is replaced using collotype The technique for carrying out half tone making for film film.
The purpose of the present invention can be achieved through the following technical solutions:
A kind of half tone manufacturing process being exposed using collotype, using following steps:
1) collotype is placed on exposure machine platform according to positioning, figuratum one upwardly;
2) collotype is cleaned;
3) half tone is cleaned;
4) by the P of half tone downwards, it is placed on according to positioning on collotype;
5) the suitable time for exposure is selected to be exposed;
6) said process is repeated, manufacture obtains half tone.
The substrate of described collotype is typically high-purity, antiradar reflectivity, the quartz glass or soda of low thermal coefficient of expansion Glass, be not in easy injured, scuffing, and the situation of harmomegathus occur with humiture change.
In addition, glass pane surface film layer uses crome metal, the thickness of film layer will relative to the halogenation silver film of film film Low, the effect of shield lights is more preferable.What the width of lines can make than the film after photoetching is thinner, and the imaging of line edge Acutance can reach 0.1-0.2um.
As preferable technical scheme, the thickness of crome metal film layer is in 0.1-0.15um.
The surface of described collotype is provided with crome metal film layer
Step 2) specifically uses following methods:Brushed away using antistatic except the electrostatic on glass plate, it is spirituous using being stained with Non-dust cloth cleaning glass window plate removes the dust foreign matter of glass pane surface.
Step 3) specifically uses following methods:Half tone is placed on light table, throws off the PET film on half tone surface, confirmation form Whether face has the attachment of dust foreign matter, if any then being removed using dust sticking bar.
Step 5) is before exposure, it is necessary to calculate the time for exposure.The light of half tone receiving is determined using the length of time for exposure Measure total value.The determination of time for exposure, with the thickness of the illumination (average light quantity) of exposure machine and sensitive emulsion layer, the type of silk screen It is number relevant.Most important of which is that the illumination of exposure machine, it is therefore desirable to measured to the illumination of exposure machine.Last foundation exposure The illumination of machine calculates the time for the light summation for meeting half tone needs, according to the illumination intensity of exposure machine and half tone measured daily Silk screen model, the thickness of emulsion set the suitable time for exposure, and the final time for determining exposure is in 1-5 minutes.
The innovative point of most critical of the present invention is that, the film film of PET sheet base is instead of using collotype.Film film It is required to remove every time, is fitted in after re-registrating on half tone.It can be wasted on time, after long-time use, cut on film, Injured can influence the transmission of light in exposure, so as to have influence on figure.In addition, and because PET is to the sensitiveness of humiture, lead Cause the change of film dimension of picture, it is necessary to suspend use after causing continuous exposure.
After collotype is placed on exposure machine platform by the application, it is not necessary to move, after upper half tone end exposure, clean glass After glass plate, you can place by next half tone, activity time can be saved., can be with and influence of the humiture to glass substrate is small Continuous exposure, without worry change in size the problem of.
Traditional film film, 0.000018/ DEG C of temperature expansion coefficient;0.000008/ DEG C of collotype temperature expansion coefficient.
Traditional film film, humidity expansion coefficient 0.000009/%RH;Collotype is not influenceed by humidity.
Traditional film film, not acid and alkali-resistance;Collotype acid and alkali-resistance.
Traditional film film, wear resistence are poor;Collotype wear resistence is good.
Traditional film film, 10 microns of minimum line slit width degree;1 micron of collotype minimum line slit width degree.
Traditional film film, Line-width precision ± 1 micron;Collotype Line-width precision ± 0.5 micron.
Traditional film film, overall length precision ± 10 micron;Collotype overall length precision ± 2 micron.
Traditional film film, service life are short;Collotype service life is grown.
The manufacture craft of half tone, essentially by the mode of exposure, by the pattern transfer on medium to half tone, medium Can be film film or glass plate.The film film of PET materials is compared with glass plate, the change to humiture More sensitive, in production, the size for the figure that can make to be transferred on half tone changes.In addition, precision and the imaging of the film Acutance compares glass plate and wants poor, also influences whether the graphical effect of half tone figure.
Embodiment
With reference to specific embodiment, the present invention is described in detail.Following examples will be helpful to the technology of this area Personnel further understand the present invention, but the invention is not limited in any way.It should be pointed out that the ordinary skill to this area For personnel, without departing from the inventive concept of the premise, various modifications and improvements can be made.These belong to the present invention Protection domain.
Embodiment 1
A kind of half tone manufacturing process being exposed using collotype, using following steps:
1) high-purity, antiradar reflectivity, the quartz glass version of low thermal coefficient of expansion are placed on exposure machine platform according to positioning On, figuratum one upwardly, is not in easy injured, scuffing, and change with humiture and occur using such glass The situation of harmomegathus, in addition, the surface of collotype are provided with 0.1um crome metal film layer, and the thickness of film layer is relative to film glue The halogenation silver film of piece is low, and the effect of shield lights is more preferable.What the width of lines can make than the film after photoetching is thinner, And the imaging acutance of line edge can reach 0.1um;
2) brushed away using antistatic except the electrostatic on glass plate, glass is removed using spirituous non-dust cloth cleaning glass window plate is stained with The dust foreign matter on glass plate surface;
3) half tone is placed on light table, throws off the PET film on half tone surface, confirm whether surface has the attachment of dust foreign matter, If any then being removed using dust sticking bar;
4) by the P of half tone downwards, it is placed on according to positioning on collotype;
5) the suitable time for exposure is selected to be exposed, this is most important critical technical parameter, before exposure, it is necessary to count Calculate the time for exposure.The light quantity total value of half tone receiving is determined using the length of time for exposure.The determination of time for exposure, with exposure machine Illumination (average light quantity) and the thickness of sensitive emulsion layer, the model of silk screen it is relevant.Most important of which is that the photograph of exposure machine Degree, it is therefore desirable to measured to the illumination of exposure machine.The last illumination according to exposure machine meets half tone needs to calculate The time of light summation, the thickness setting according to the illumination intensity of exposure machine and the silk screen model of half tone, emulsion that measure daily are closed The suitable time for exposure, the final time for determining exposure was at 1 minute;
6) said process is repeated, manufacture obtains half tone.
Embodiment 2
A kind of half tone manufacturing process being exposed using collotype, using following steps:
1) high-purity, antiradar reflectivity, the soda glass version of low thermal coefficient of expansion are placed on exposure machine platform according to positioning On, figuratum one upwardly, is not in easy injured, scuffing, and change with humiture and occur using such glass The situation of harmomegathus, in addition, the surface of collotype are provided with 0.15um crome metal film layer, and the thickness of film layer is relative to film glue The halogenation silver film of piece is low, and the effect of shield lights is more preferable.What the width of lines can make than the film after photoetching is thinner, And the imaging acutance of line edge can reach 0.15um;
2) brushed away using antistatic except the electrostatic on glass plate, glass is removed using spirituous non-dust cloth cleaning glass window plate is stained with The dust foreign matter on glass plate surface;
3) half tone is placed on light table, throws off the PET film on half tone surface, confirm whether surface has the attachment of dust foreign matter, If any then being removed using dust sticking bar;
4) by the P of half tone downwards, it is placed on according to positioning on collotype;
5) the suitable time for exposure is selected to be exposed, this is most important critical technical parameter, before exposure, it is necessary to count Calculate the time for exposure.The light quantity total value of half tone receiving is determined using the length of time for exposure.The determination of time for exposure, with exposure machine Illumination (average light quantity) and the thickness of sensitive emulsion layer, the model of silk screen it is relevant.Most important of which is that the photograph of exposure machine Degree, it is therefore desirable to measured to the illumination of exposure machine.The last illumination according to exposure machine meets half tone needs to calculate The time of light summation, the thickness setting according to the illumination intensity of exposure machine and the silk screen model of half tone, emulsion that measure daily are closed The suitable time for exposure, the final time for determining exposure was at 2 minutes;
6) said process is repeated, manufacture obtains half tone.
Embodiment 3
A kind of half tone manufacturing process being exposed using collotype, using following steps:
1) high-purity, antiradar reflectivity, the soda glass version of low thermal coefficient of expansion are placed on exposure machine platform according to positioning On, figuratum one upwardly, is not in easy injured, scuffing, and change with humiture and occur using such glass The situation of harmomegathus, in addition, the surface of collotype are provided with 0.15um crome metal film layer, and the thickness of film layer is relative to film glue The halogenation silver film of piece is low, and the effect of shield lights is more preferable.What the width of lines can make than the film after photoetching is thinner, And the imaging acutance of line edge can reach 0.2um;
2) brushed away using antistatic except the electrostatic on glass plate, glass is removed using spirituous non-dust cloth cleaning glass window plate is stained with The dust foreign matter on glass plate surface;
3) half tone is placed on light table, throws off the PET film on half tone surface, confirm whether surface has the attachment of dust foreign matter, If any then being removed using dust sticking bar;
4) by the P of half tone downwards, it is placed on according to positioning on collotype;
5) the suitable time for exposure is selected to be exposed, this is most important critical technical parameter, before exposure, it is necessary to count Calculate the time for exposure.The light quantity total value of half tone receiving is determined using the length of time for exposure.The determination of time for exposure, with exposure machine Illumination (average light quantity) and the thickness of sensitive emulsion layer, the model of silk screen it is relevant.Most important of which is that the photograph of exposure machine Degree, it is therefore desirable to measured to the illumination of exposure machine.The last illumination according to exposure machine meets half tone needs to calculate The time of light summation, the thickness setting according to the illumination intensity of exposure machine and the silk screen model of half tone, emulsion that measure daily are closed The suitable time for exposure, the final time for determining exposure was at 5 minutes;
6) said process is repeated, manufacture obtains half tone.
The innovative point of most critical of the present invention is that, the film film of PET sheet base is instead of using collotype.Film film It is required to remove every time, is fitted in after re-registrating on half tone.It can be wasted on time, after long-time use, cut on film, Injured can influence the transmission of light in exposure, so as to have influence on figure.In addition, and because PET is to the sensitiveness of humiture, lead Cause the change of film dimension of picture, it is necessary to suspend use after causing continuous exposure.
After collotype is placed on exposure machine platform by the application, it is not necessary to move, after upper half tone end exposure, clean glass After glass plate, you can place by next half tone, activity time can be saved., can be with and influence of the humiture to glass substrate is small Continuous exposure, without worry change in size the problem of.
The technological parameter used using embodiment 3 makes the film and half tone, and measures comparison.Measured value is 25 dotted lines Wide and 9 overall lengths.
From the number of measurement it has been observed that glass plate and the half tone size made using glass plate are better than the film and with luxuriant and rich with fragrance The half tone that woods makes.
The specific embodiment of the present invention is described above.It is to be appreciated that the invention is not limited in above-mentioned Particular implementation, those skilled in the art can make various deformations or amendments within the scope of the claims, this not shadow Ring the substantive content of the present invention.

Claims (6)

1. a kind of half tone manufacturing process being exposed using collotype, it is characterised in that the technique uses following steps:
1) collotype is placed on exposure machine platform according to positioning, figuratum one upwardly;
2) collotype is cleaned;
3) half tone is cleaned;
4) by the P of half tone downwards, it is placed on according to positioning on collotype;
5) the suitable time for exposure is selected to be exposed;
6) said process is repeated, manufacture obtains half tone.
2. a kind of half tone manufacturing process being exposed using collotype according to claim 1, it is characterised in that described Collotype substrate quartz glass or soda glass.
3. a kind of half tone manufacturing process being exposed using collotype according to claim 1, it is characterised in that described The surface of collotype be provided with crome metal film layer, crome metal thicknesses of layers is 0.1-0.15um.
A kind of 4. half tone manufacturing process being exposed using collotype according to claim 1, it is characterised in that step 2) following methods are specifically used:Brushed away using antistatic except the electrostatic on glass plate, glass is wiped using spirituous non-dust cloth is stained with Glass plate removes the dust foreign matter of glass pane surface.
A kind of 5. half tone manufacturing process being exposed using collotype according to claim 1, it is characterised in that step 3) following methods are specifically used:Half tone is placed on light table, throws off the PET film on half tone surface, surface is removed using dust sticking bar The dust foreign matter of attachment.
A kind of 6. half tone manufacturing process being exposed using collotype according to claim 1, it is characterised in that step 5) time that exposure is controlled in is 1-5min.
CN201710852001.2A 2017-09-19 2017-09-19 A kind of halftone manufacturing process being exposed using collotype Expired - Fee Related CN107584858B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110341294A (en) * 2019-08-28 2019-10-18 江苏盛矽电子科技有限公司 A kind of manufacturing method of screen based on metal plate engraving

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1040170A (en) * 1988-07-12 1990-03-07 安格尔·山巴拉·卡尼尔 The navigation system of screen process press and the printing down of web plate and positioner
CN1076035A (en) * 1992-02-29 1993-09-08 洪帝坤 Sun light exposure plate making method and device thereof
KR20040063309A (en) * 2003-01-06 2004-07-14 구창모 Screen plating apparatus for textile printing
US20150336372A1 (en) * 2013-05-28 2015-11-26 Claude Louis Van Ness Screen Printing Device and Method
CN105269995A (en) * 2015-09-15 2016-01-27 赫日光电(苏州)有限公司 Smooth mirror surface processing technology based on composite screen printing plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1040170A (en) * 1988-07-12 1990-03-07 安格尔·山巴拉·卡尼尔 The navigation system of screen process press and the printing down of web plate and positioner
CN1076035A (en) * 1992-02-29 1993-09-08 洪帝坤 Sun light exposure plate making method and device thereof
KR20040063309A (en) * 2003-01-06 2004-07-14 구창모 Screen plating apparatus for textile printing
US20150336372A1 (en) * 2013-05-28 2015-11-26 Claude Louis Van Ness Screen Printing Device and Method
CN105269995A (en) * 2015-09-15 2016-01-27 赫日光电(苏州)有限公司 Smooth mirror surface processing technology based on composite screen printing plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110341294A (en) * 2019-08-28 2019-10-18 江苏盛矽电子科技有限公司 A kind of manufacturing method of screen based on metal plate engraving

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Granted publication date: 20191025