CN107561878A - A kind of display screen photoresist lift off liquid - Google Patents
A kind of display screen photoresist lift off liquid Download PDFInfo
- Publication number
- CN107561878A CN107561878A CN201710829084.3A CN201710829084A CN107561878A CN 107561878 A CN107561878 A CN 107561878A CN 201710829084 A CN201710829084 A CN 201710829084A CN 107561878 A CN107561878 A CN 107561878A
- Authority
- CN
- China
- Prior art keywords
- display screen
- hydroxide
- photoresist lift
- ammonium
- glass substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a kind of display screen photoresist lift off liquid, and it is made up of the raw material of following mass fraction:Quaternary ammonium hydroxide 22 34%, characteristic organic amine 18 25%, complementary organic amine 10 16%, additive 3 5%, surfactant 5 14%, polar organic solvent 20 40%, corrosion inhibitor 5 9%, preservative 4 7% and water.Compared with prior art, stripper of the present invention can be peeled off effectively to rotten photoresist occurs in etching work procedure, and the inorganic material material of metal film, oxide-film for display screen glass substrate has extremely low corrosivity;This stripping liquid energy removes the colour resist and protective layer on glass substrate optical filter at a lower temperature, in the short period simultaneously, glass substrate is not damaged, the glass substrate after being handled with stripper can recycle;The stripper peeling effect of the present invention is preferable, while has the security of height to environment and human body.
Description
Technical field
The present invention relates to stripper technical field, and in particular to a kind of display screen photoresist lift off liquid.
Background technology
Generally include to carry out successively on the glass substrate in the photoetching technique of the production of display screen substrate:Set metal or
The metal wiring formation process of metal oxide layer;The process that photoresist layer is set;Transcription mask on the photoresist
The exposure process of figure;The etching work procedure being etched according to figure to mould;And remove the stripping process of photoresist.
Photo-mask process can be up to more than ten time in common manufacturing process.
Stripping can not be also removed easily formed with layer protective layer on resist layer on substrate.Due to glass substrate cost
It is very high, if directly discarded can cause very big waste, therefore the film layer on bad colored filter substrate can all be peeled off
Fall, reuse, can be with cost-effective.But if film layer is peeled off unclean, or thoroughly to peel off the time needed very long,
Cost-effective effect can not just be played.
In general stripper can include inorganic acid, organic acid, inorganic base or organic solvent, but, as stripping
The active ingredient of agent, when using inorganic acid or inorganic base, or make lower metal erosion, or with being harmful to lacking for human body
The operational difficulty such as point.Therefore usually using organic solvent.Mainly contained using stripper in PDP panels manufacture at present
The stripper of the system of organic polar solvent, amine and water.But there is problems with these existing strippers:1st, work is produced
Skill is complicated.During lift-off processing is carried out, need to be rinsed respectively with organic solvent and water after photoresist is peeled off, increase
Add the matting time, produce a large amount of waste liquid waste water;2nd, stripping performance is weak, wire corrosion is influenceed big;3rd, residue gold after cleaning
Belong to the quantity of ion beyond standard requirement, easily cause surface metal ion pollution.
The content of the invention
The present invention is intended to provide a kind of display screen photoresist lift off liquid.
The present invention provides following technical scheme:
A kind of display screen photoresist lift off liquid, it is made up of the raw material of following mass fraction:Quaternary ammonium hydroxide 22-
34%th, characteristic organic amine 18-25%, complementary organic amine 10-16%, additive 3-5%, surfactant 5-14%, pole
Property organic solvent 20-40%, corrosion inhibitor 5-9%, preservative 4-7% and water.
The quaternary ammonium hydroxide structural formula is:
Described R1, R2 and R3 are selected from any one in C1-C5 alkyl and C1-C5 hydroxyalkyl.
The quaternary ammonium hydroxide is selected from TMAH, tetraethyl ammonium hydroxide, TPAOH, hydrogen
Aoxidize monomethyl dipropyl allyl-ammonium, the allyl ammonium of dimethyl one, hydroxide (1,2- dihydroxy ethyl) one
Allyl ammonium, the allyl ammonium of one ethyl of hydroxide monomethyl one, cetyltrimethylammonium hydroxide and benzyl three
One or more in ammonium hydroxide.
The additive includes azole compounds.
The surfactant is the one or more in APEO, polyethenoxy ether.
The polar organic solvent is selected from least one of amide-type and alcohol ethers.
The corrosion inhibitor is ethylene glycol, 1,2- propane diols, diethylene glycol, one kind or more of 4- methyl pyrocatechols
Kind.
Compared with prior art, the beneficial effects of the invention are as follows:Stripper of the present invention is to occurring what is gone bad in etching work procedure
Photoresist can be peeled off effectively, the inorganic material material of metal film, oxide-film for display screen glass substrate
With extremely low corrosivity;This stripping liquid energy is removed on glass substrate optical filter at a lower temperature, in the short period simultaneously
Colour resist and protective layer, glass substrate is not damaged, the glass substrate after being handled with stripper can recycle;This hair
Bright stripper peeling effect is preferable, while has the security of height to environment and human body.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of display screen photoresist lift off liquid of embodiment 1, it is made up of the raw material of following mass fraction:Quaternary amine hydroxide
Thing 22%, characteristic organic amine 18%, complementary organic amine 10%, additive 3%, surfactant 5%, polar organic solvent
20%th, corrosion inhibitor 5%, preservative 4% and water.
The quaternary ammonium hydroxide structural formula is:
Described R1, R2 and R3 are selected from any one in C1-C5 alkyl and C1-C5 hydroxyalkyl.
The quaternary ammonium hydroxide is selected from TMAH, tetraethyl ammonium hydroxide, TPAOH, hydrogen
Aoxidize monomethyl dipropyl allyl-ammonium, the allyl ammonium of dimethyl one, hydroxide (1,2- dihydroxy ethyl) one
Allyl ammonium, the allyl ammonium of one ethyl of hydroxide monomethyl one, cetyltrimethylammonium hydroxide and benzyl three
One or more in ammonium hydroxide.
The additive includes azole compounds.
The surfactant is the one or more in APEO, polyethenoxy ether.
The polar organic solvent is selected from least one of amide-type and alcohol ethers.
The corrosion inhibitor is ethylene glycol, 1,2- propane diols, diethylene glycol, one kind or more of 4- methyl pyrocatechols
Kind.
A kind of display screen photoresist lift off liquid of embodiment 2, it is made up of the raw material of following mass fraction:Quaternary amine hydroxide
Thing 34%, characteristic organic amine 25%, complementary organic amine 16%, additive 5%, surfactant 14%, polarity are organic molten
Agent 40%, corrosion inhibitor 9%, preservative 7% and water.
The quaternary ammonium hydroxide structural formula is:
Described R1, R2 and R3 are selected from any one in C1-C5 alkyl and C1-C5 hydroxyalkyl.
The quaternary ammonium hydroxide is selected from TMAH, tetraethyl ammonium hydroxide, TPAOH, hydrogen
Aoxidize monomethyl dipropyl allyl-ammonium, the allyl ammonium of dimethyl one, hydroxide (1,2- dihydroxy ethyl) one
Allyl ammonium, the allyl ammonium of one ethyl of hydroxide monomethyl one, cetyltrimethylammonium hydroxide and benzyl three
One or more in ammonium hydroxide.
The additive includes azole compounds.
The surfactant is the one or more in APEO, polyethenoxy ether.
The polar organic solvent is selected from least one of amide-type and alcohol ethers.
The corrosion inhibitor is ethylene glycol, 1,2- propane diols, diethylene glycol, one kind or more of 4- methyl pyrocatechols
Kind.
A kind of display screen photoresist lift off liquid of embodiment 3, it is made up of the raw material of following mass fraction:Quaternary amine hydroxide
Thing 28%, characteristic organic amine 23%, complementary organic amine 14%, additive 4%, surfactant 11%, polarity are organic molten
Agent 32%, corrosion inhibitor 7%, preservative 6% and water.
The quaternary ammonium hydroxide structural formula is:
Described R1, R2 and R3 are selected from any one in C1-C5 alkyl and C1-C5 hydroxyalkyl.
The quaternary ammonium hydroxide is selected from TMAH, tetraethyl ammonium hydroxide, TPAOH, hydrogen
Aoxidize monomethyl dipropyl allyl-ammonium, the allyl ammonium of dimethyl one, hydroxide (1,2- dihydroxy ethyl) one
Allyl ammonium, the allyl ammonium of one ethyl of hydroxide monomethyl one, cetyltrimethylammonium hydroxide and benzyl three
One or more in ammonium hydroxide.
The additive includes azole compounds.
The surfactant is the one or more in APEO, polyethenoxy ether.
The polar organic solvent is selected from least one of amide-type and alcohol ethers.
The corrosion inhibitor is ethylene glycol, 1,2- propane diols, diethylene glycol, one kind or more of 4- methyl pyrocatechols
Kind.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (7)
- A kind of 1. display screen photoresist lift off liquid, it is characterised in that:It is made up of the raw material of following mass fraction:Quaternary amine hydrogen-oxygen Compound 22-34%, characteristic organic amine 18-25%, complementary organic amine 10-16%, additive 3-5%, surfactant 5- 14%th, polar organic solvent 20-40%, corrosion inhibitor 5-9%, preservative 4-7% and water.
- A kind of 2. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The quaternary ammonium hydroxide knot Structure formula is:Described R1, R2 and R3 are selected from any one in C1-C5 alkyl and C1-C5 hydroxyalkyl.
- A kind of 3. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The quaternary ammonium hydroxide is Selected from TMAH, tetraethyl ammonium hydroxide, TPAOH, hydroxide monomethyl dipropyl allyl-ammonium, The allyl ammonium of dimethyl one, the allyl ammonium of hydroxide (1,2- dihydroxy ethyl) one, hydroxide monomethyl The allyl ammonium of one ethyl one, cetyltrimethylammonium hydroxide and one kind or more in benzyltrimethylammonium hydroxide Kind.
- A kind of 4. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The additive includes azole Compound.
- A kind of 5. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The surfactant is poly- One or more in oxygen vinethene, polyethenoxy ether.
- A kind of 6. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The polar organic solvent is Selected from least one of amide-type and alcohol ethers.
- A kind of 7. display screen photoresist lift off liquid according to claim 1, it is characterised in that:The corrosion inhibitor is second Glycol, 1,2- propane diols, diethylene glycol, the one or more of 4- methyl pyrocatechols.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710829084.3A CN107561878A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen photoresist lift off liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710829084.3A CN107561878A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen photoresist lift off liquid |
Publications (1)
Publication Number | Publication Date |
---|---|
CN107561878A true CN107561878A (en) | 2018-01-09 |
Family
ID=60979954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710829084.3A Pending CN107561878A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen photoresist lift off liquid |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107561878A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102200700A (en) * | 2011-06-08 | 2011-09-28 | 绵阳艾萨斯电子材料有限公司 | Stripping liquid as well as preparation method and application |
CN102866601A (en) * | 2012-10-10 | 2013-01-09 | 绵阳艾萨斯电子材料有限公司 | Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid |
CN107121900A (en) * | 2017-05-19 | 2017-09-01 | 合肥市惠科精密模具有限公司 | A kind of MicroLED screens stripper |
-
2017
- 2017-09-14 CN CN201710829084.3A patent/CN107561878A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102200700A (en) * | 2011-06-08 | 2011-09-28 | 绵阳艾萨斯电子材料有限公司 | Stripping liquid as well as preparation method and application |
CN102866601A (en) * | 2012-10-10 | 2013-01-09 | 绵阳艾萨斯电子材料有限公司 | Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid |
CN107121900A (en) * | 2017-05-19 | 2017-09-01 | 合肥市惠科精密模具有限公司 | A kind of MicroLED screens stripper |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI334883B (en) | Polymer-stripping composition | |
JP4716225B2 (en) | Photoresist stripper composition | |
US20070078072A1 (en) | Photoresist stripping solution | |
KR101946379B1 (en) | Composition for photoresist stripping solution and stripping method of photoresist using the same | |
CN106200283B (en) | Anticorrosive additive stripping liquid controlling | |
CN104155854A (en) | Low-temperature photoresist reworking stripping liquid and application thereof | |
CN101139712B (en) | Stripping method | |
CN103019051B (en) | A kind of anticorrosive additive stripping liquid controlling | |
CN107121900A (en) | A kind of MicroLED screens stripper | |
CN106292209A (en) | A kind of efficiency light photoresist stripper and application thereof | |
JP2006074039A (en) | Manufacturing method for thin-film transistor (tft) substrate and stripping composition | |
CN101968610A (en) | Method for removing optical resist after all-wet etching process | |
CN107561878A (en) | A kind of display screen photoresist lift off liquid | |
CN107168021A (en) | A kind of photoresist stripper and its preparation method and application | |
KR101758051B1 (en) | Stripping composition for color filter | |
JP7160238B2 (en) | Stripping composition for removing dry film resist and method for stripping dry film resist using the same | |
KR101374565B1 (en) | Stripper Composition for removing photoresist | |
CN106019863B (en) | A kind of advanced lines plate copper wiring photoresist stripper | |
CN106997158A (en) | Photoresist removal remover composition | |
CN107995960A (en) | Anticorrosive additive stripping liquid controlling | |
KR20220124916A (en) | Photo resist stripper composition | |
KR20220043131A (en) | Composition for photoresist removal | |
CN102298277B (en) | Cleaning solution for thick-film photoresist | |
KR20130025830A (en) | Stripper composition for photoresist | |
JP6293004B2 (en) | Etching resist composition, substrate and method for producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180109 |