CN107526253B - Composition for hard mask - Google Patents
Composition for hard mask Download PDFInfo
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- CN107526253B CN107526253B CN201710413831.5A CN201710413831A CN107526253B CN 107526253 B CN107526253 B CN 107526253B CN 201710413831 A CN201710413831 A CN 201710413831A CN 107526253 B CN107526253 B CN 107526253B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Abstract
The present invention provides a composition for a hard mask, comprising a copolymer containing at least one repeating unit selected from the group consisting of the following chemical formulas 1-1 and 1-2, and a solvent. In the following chemical formula 1-1, Ar1And Ar2Each independently is a divalent aromatic hydrocarbon group of 6 to 30 carbon atoms, R1An alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 35 carbon atoms, Ar1、Ar2And R1Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group, and n is an integer of 1 to 190; in the following chemical formula 1-2, Ar1And Ar2Each independently is a divalent aromatic hydrocarbon group of 6 to 30 carbon atoms, R2Is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Ar1And Ar2Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group, and n is an integer of 1 to 190.
Description
Technical Field
The present invention relates to a composition for a hard mask.
Background
In the microelectronics industry and in the industrial fields of microstructures (e.g., micromachines, magnetoresistive heads, etc.), etc., there is a continuing demand to reduce the size of the structural shapes. Furthermore, in the microelectronics industry, there are requirements for: the size of microelectronic devices is reduced to provide more circuitry for a given chip size.
To reduce the size of the shapes, efficient photolithography is essential.
In a typical photolithography process, a resist is first applied to an underlying material, and then exposed to radiation to form a resist layer. Next, the resist layer is developed with a developer to form a patterned resist layer, and the substance present in the openings of the patterned resist layer is etched to transfer the pattern to the underlying material. After the transfer is finished, the following processes are carried out: the photosensitive resist is exposed pattern-wise to form a patterned resist layer. The image is then developed by contacting the exposed resist layer with an optional substance, typically an aqueous alkaline developer. Next, the substance present in the openings of the patterned resist layer is etched, whereby the pattern is transferred to the underlying material. After the transfer, the remaining resist layer is removed.
In order to minimize the reflectivity between the resist layer and the underlying material, most of the above-described photolithography processes use an anti-reflective coating (ARC) to increase resolution. However, in the step of etching the antireflective coating after patterning, the resist layer is also consumed in a large amount, and there is a possibility that additional patterning is necessary in the subsequent etching step.
In other words, in some cases, the resist used in the lithographic imaging process may not have sufficient resistance to the etching step to the extent that the desired pattern is efficiently transferred to the underlying material. Therefore, in the case of an ultra-thin film resist layer in which a resist material needs to be used extremely thinly, in the case of a substrate to be etched thick, in the case of a substrate requiring a deep etching depth, in the case of a predetermined underlayer material requiring a specific etchant (etchant), or the like, a resist underlayer film is used.
The resist underlayer film serves as an intermediate layer between the resist layer and an underlayer material that can be patterned by transfer from the patterned resist, and needs to withstand an etching step required for receiving a pattern from the patterned resist layer and transferring the pattern to the underlayer material.
In order to form such an underlayer film, many materials have been tried, but improvements in the composition of the underlayer film are still continuously demanded.
Conventionally, materials for forming an underlayer film are difficult to apply to a substrate, and therefore, they have been subjected to chemical or physical vapor deposition, special solvents, or high-temperature firing, for example, but they have a problem of high cost. In view of this, studies have been made in recent years on a composition for an underlayer film that can be applied by a spin coating method without performing high-temperature baking.
In addition, studies were conducted on the following lower layer film composition: the resist layer formed on the upper portion can be easily selectively etched using the resist layer as a mask, and particularly, when the lower layer is a metal layer, the resist film has resistance to an etching process required for patterning the lower layer using the lower layer film as a mask.
Korean laid-open patent No. 10-2010-0082844 discloses a technique concerning a resist underlayer film forming composition.
Documents of the prior art
Patent document
Korean laid-open patent No. 10-2010-0082844
Disclosure of Invention
Problems to be solved
The purpose of the present invention is to provide a composition for a hard mask, which is capable of forming a resist underlayer film (hard mask) having excellent heat resistance and coating uniformity.
Means for solving the problems
1. A composition for a hard mask, comprising a copolymer comprising at least one repeating unit selected from the group consisting of the following chemical formula 1-1 and chemical formula 1-2,
[ chemical formula 1-1]
(wherein Ar is1And Ar2Each independently a divalent aromatic hydrocarbon group (Aranediyl) having 6 to 30 carbon atoms, R1An alkyl group having 1 to 6 carbon atoms or an Aryl group (Aryl) having 6 to 35 carbon atoms, Ar1、Ar2And R1Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group, n is an integer of 1 to 190),
[ chemical formulas 1-2]
(wherein Ar is1And Ar2Each independently is a carbon atomA divalent aromatic hydrocarbon group (Arendiyl) with a molecular number of 6-302Is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, Ar is1And Ar2Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group, and n is an integer of 1 to 190).
2. The composition for a hard mask as set forth in claim 1, wherein Ar is represented by the following chemical formula 1-1 or the following chemical formula 1-21And Ar2Each independently represents at least one member selected from the group consisting of the following chemical formula a-1 to the following chemical formula a-7, and R is1Is at least one selected from the group consisting of the groups represented by the following chemical formula b-1 to the following chemical formula b-7,
[ chemical formula a-1]
[ chemical formula a-2]
[ chemical formula a-3]
[ chemical formula a-4]
[ chemical formula a-5]
[ chemical formula a-6]
[ chemical formula a-7]
(in the chemical formula a-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms)
[ chemical formula b-1]
[ chemical formula b-2]
[ chemical formula b-3]
[ chemical formula b-4]
[ chemical formula b-5]
[ chemical formula b-6]
[ chemical formula b-7]
(in the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
3. The composition for a hard mask as described in claim 1, wherein the copolymer further comprises a repeating unit of the following chemical formula 2,
[ chemical formula 2]
(wherein Ar is3Is a C6-35 divalent aromatic hydrocarbon group (Arenediyl),
Ar4aryl (Aryl) group having 6 to 35 carbon atoms, Ar3And Ar4Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group, and n is an integer of 1 to 190).
4. The composition for a hard mask as set forth in claim 3, wherein Ar is represented by the following chemical formula 23Is at least one selected from the group consisting of the groups represented by the following chemical formula a-1 to a following chemical formula a-7, in the chemical formula 2, Ar is4Is at least one selected from the group consisting of the groups represented by the following chemical formula b-1 to the following chemical formula b-7,
[ chemical formula a-1]
[ chemical formula a-2]
[ chemical formula a-3]
[ chemical formula a-4]
[ chemical formula a-5]
[ chemical formula a-6]
[ chemical formula a-7]
(the chemical formula a-7, Ra is hydrogen atom, alkyl group with 1-2 carbon atoms, alkenyl group or alkynyl group with 2-4 carbon atoms, or aryl group with 6-30 carbon atoms),
[ chemical formula b-1]
[ chemical formula b-2]
[ chemical formula b-3]
[ chemical formula b-4]
[ chemical formula b-5]
[ chemical formula b-6]
[ chemical formula b-7]
(in the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
5. The composition for a hard mask as described in claim 3, wherein the copolymer is a compound prepared by adding at least one compound selected from the group consisting of a compound of the following chemical formula p-2 and a compound of the following chemical formula p-3 to a prepolymer prepared by a condensation reaction of an aromatic hydrocarbon compound having 6 to 35 carbon atoms and a compound of the following chemical formula p-1,
[ chemical formula p-1]
[ chemical formula p-2]
[ chemical formula p-3]
(wherein Ar is4Is an aryl group having 6 to 35 carbon atoms, Ar2Is a C6-35 divalent aromatic radical (Aranediyl), R1Is alkyl of 1-6 carbon atoms or Aryl (Aryl) of 6-35 carbon atoms, R2Hydrogen atom or C1-6 alkyl group, the aromatic hydrocarbon compound, Ar2、Ar4、R1And R2Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group).
6. The composition for a hard mask as set forth in claim 1, wherein the content of the repeating unit of the chemical formula 1-1 in the copolymer is 5 to 80 mol%.
7. The composition for a hard mask as set forth in claim 1, wherein the content of the repeating unit of the chemical formula 1-2 in the copolymer is 2 to 20 mol%.
8. The composition for a hard mask according to claim 1, wherein the copolymer comprising at least one repeating unit selected from the group consisting of the above chemical formula 1-1 and chemical formula 1-2 is contained in an amount of 5 to 15% by weight, and the solvent is contained in an amount of 85 to 95% by weight, based on the total weight of the composition.
9. The composition for a hard mask as set forth in claim 1, further comprising at least one of a crosslinking agent and a catalyst.
Effects of the invention
The composition for a hard mask of the present invention can form a hard mask (resist underlayer film) having excellent heat resistance and coating uniformity.
Detailed Description
One embodiment of the present invention relates to a composition for a hard mask, which can form a resist underlayer film (hard mask) excellent in heat resistance and coating uniformity by including a copolymer containing at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 and a solvent.
Hereinafter, specific embodiments of the present invention will be described. However, this embodiment is merely an example, and the present invention is not limited thereto.
In the present invention, when the compound or resin represented by the chemical formula has isomers, the compound or resin represented by the related formula is a representative chemical formula including the isomers.
<Composition for hard mask>
Copolymer (A) comprising at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2
The composition for a hard mask of the present invention comprises a copolymer (A) comprising at least one repeating unit selected from the group consisting of the following chemical formula 1-1 and chemical formula 1-2,
[ chemical formula 1-1]
(wherein Ar is1And Ar2Each independently a divalent aromatic hydrocarbon group (Arenediyl) having 6 to 30 carbon atoms,
R1an alkyl group having 1 to 6 carbon atoms or an Aryl group (Aryl) having 6 to 35 carbon atoms,
ar above1、Ar2And R1Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190),
[ chemical formulas 1-2]
(wherein Ar is1And Ar2Each independently a divalent aromatic hydrocarbon group (Arenediyl) having 6 to 30 carbon atoms,
R2is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
ar above1And Ar2Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190).
The present invention enables a hard mask formed from the composition for a hard mask of the present invention to exhibit excellent heat resistance and coating uniformity by including the copolymer (a) containing at least one repeating unit selected from the group consisting of the above chemical formula 1-1 and chemical formula 1-2.
In this respect, it is preferable that, in the above chemical formula 1-1 or the above chemical formula 1-2 of an embodiment of the present invention,
ar above1And Ar2Each independently may be at least one selected from the group consisting of groups represented by the following chemical formulae a-1 to a-7,
[ chemical formula a-1]
[ chemical formula a-2]
[ chemical formula a-3]
[ chemical formula a-4]
[ chemical formula a-5]
[ chemical formula a-6]
[ chemical formula a-7]
(in the chemical formula a-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
In addition, in view of the above-described effects, it is preferable that, in the above-described chemical formula 1-1 or the above-described chemical formula 1-2 of an embodiment of the present invention,
r is as defined above1May be at least one selected from the group consisting of the groups represented by the following chemical formula b-1 to the following chemical formula b-7,
[ chemical formula b-1]
[ chemical formula b-2]
[ chemical formula b-3]
[ chemical formula b-4]
[ chemical formula b-5]
[ chemical formula b-6]
[ chemical formula b-7]
(in the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
The copolymer (A) according to one embodiment of the present invention may further include a repeating unit of the following chemical formula 2, if necessary,
[ chemical formula 2]
(wherein Ar is3Is a C6-35 divalent aromatic hydrocarbon group (Arenediyl),
Ar4an Aryl group (Aryl) having 6 to 35 carbon atoms,
ar above3And Ar4Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190).
In the chemical formula 2, the Ar is preferably used in order to form a hard mask having excellent heat resistance and coating uniformity3May be at least one selected from the group consisting of the following chemical formula a-1 to the following chemical formula a-7, wherein in the chemical formula 2, Ar is represented by the formula4May be at least one selected from the group consisting of the following chemical formula b-1 to the following chemical formula b-7,
[ chemical formula a-1]
[ chemical formula a-2]
[ chemical formula a-3]
[ chemical formula a-4]
[ chemical formula a-5]
[ chemical formula a-6]
[ chemical formula a-7]
(in the chemical formula a-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms),
[ chemical formula b-1]
[ chemical formula b-2]
[ chemical formula b-3]
[ chemical formula b-4]
[ chemical formula b-5]
[ chemical formula b-6]
[ chemical formula b-7]
(in the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
The copolymer (A) comprising at least one repeating unit selected from the group consisting of the above chemical formula 1-1 and chemical formula 1-2 according to one embodiment of the present invention can be produced by adding at least one compound selected from the group consisting of the compound of the following chemical formula p-2 and the compound of the chemical formula p-3 to a prepolymer produced by a condensation reaction of an aromatic hydrocarbon compound having 6 to 35 carbon atoms and the compound of the following chemical formula p-1,
[ chemical formula p-1]
[ chemical formula p-2]
[ chemical formula p-3]
(wherein Ar is4An aryl group having 6 to 35 carbon atoms,
Ar2is a C6-35 divalent aromatic hydrocarbon group (Arenediyl),
R1an alkyl group having 1 to 6 carbon atoms or an Aryl group (Aryl) having 6 to 35 carbon atoms,
R2is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
the above aromatic hydrocarbon compound, Ar2、Ar4、R1And R2Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group).
When the copolymer (a) according to one embodiment of the present invention is produced by the above method, the reactivity can be controlled, and the molecular weight adjustment and physical property control of the copolymer (a) can be facilitated.
Further, since two reactions (prepolymer production reaction and addition reaction of at least one compound selected from the group consisting of the compound of p-2 and the compound of chemical formula p-3) can be performed under the same conditions, the production can be easily performed, and the production cost can be reduced.
On the other hand, if the compound of p-1 and the compound of p-2 or the compound of p-1 and the compound of the chemical formula p-3 are not added sequentially as described above but added simultaneously, gelation proceeds together with the synthesis of the polymer, and the solubility to the solvent may be lowered.
On the other hand, in the case where the above-mentioned aromatic hydrocarbon compound is further substituted with a functional group capable of efficiently donating an electron, the production of the copolymer (a) becomes easy, and for example, as an electron donor, it is preferable that it is further substituted with a hydroxyl group or a methoxy group, and more preferably, it is further substituted with a hydroxyl group.
The aromatic hydrocarbon compound having 6 to 35 carbon atoms according to one embodiment of the present invention may be at least one compound selected from the group consisting of the following chemical formulas ar-1 to ar-5,
[ chemical formula ar-1]
[ chemical formula ar-2]
[ chemical formula ar-3]
[ chemical formula ar-4]
[ chemical formula ar-5]
(in the chemical formula ar-5, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms).
The compound of the above chemical formula p-1 according to an embodiment of the present invention may be, for example, at least one compound selected from the group consisting of the following chemical formulas p-1-1 to p-1-4,
[ chemical formula p-1-1]
[ chemical formula p-1-2]
[ chemical formula p-1-3]
[ chemical formula p-1-4]
The compound of the above chemical formula p-2 according to an embodiment of the present invention may be, for example, at least one compound selected from the group consisting of the following chemical formulas p-2-1 to p-2-5,
[ chemical formula p-2-1]
[ chemical formula p-2-2]
[ chemical formula p-2-3]
[ chemical formula p-2-4]
[ chemical formula p-2-5]
The compound of the above chemical formula p-3 according to an embodiment of the present invention may be, for example, at least one compound selected from the group consisting of the following chemical formulas p-3-1 to p-3-3,
[ chemical formula p-3-1]
[ chemical formula p-3-2]
[ chemical formula p-3-3]
The content of the repeating unit of chemical formula 1-1 in the copolymer (a) according to an embodiment of the present invention may be 5 to 80 mol%. In the case of satisfying the above range, the formed hard mask may exhibit excellent heat resistance and coating uniformity.
On the other hand, the content of the repeating unit of chemical formula 1-2 in the copolymer (a) according to an embodiment of the present invention may be 2 to 20 mol%. In the case of satisfying the above range, the formed hard mask may exhibit excellent heat resistance and coating uniformity.
The copolymer (a) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 according to an embodiment of the present invention may have a weight average molecular weight according to the above-described value of n. Specifically, for example, the weight average molecular weight of the copolymer (A) may be 1000 to 10000, preferably 2000 to 7000.
The Polydispersity index (PDI) [ weight average molecular weight (Mw)/number average molecular weight (Mn) ] of the copolymer (A) comprising at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 is preferably 1.3 to 6.0, more preferably 1.5 to 4.0.
If the above polydispersity index [ weight average molecular weight (Mw)/number average molecular weight (Mn) ] is within the above range, the effect by the copolymer (A) comprising at least one repeating unit selected from the group consisting of the above chemical formula 1-1 and chemical formula 1-2 becomes more excellent, and thus is preferable.
The content of the copolymer (a) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 of one embodiment of the present invention is not particularly limited as long as the object of the present invention can be achieved, and for example, may be 5 to 15% by weight in the total weight of the composition, and when the above range is satisfied, the above effects of the present invention can be effectively exhibited. If the content of the copolymer (a) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 is less than 5% by weight in the total weight of the composition, it may be difficult to obtain a coating layer at a desired coating thickness, and if it exceeds 15% by weight, the coating uniformity of the liquid phase may be reduced.
Solvent (B)
The solvent in one embodiment of the present invention is not particularly limited as long as it has sufficient solubility in the copolymer (a) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2, and examples thereof include Propylene Glycol Monomethyl Ether Acetate (PGMEA), Propylene Glycol Monomethyl Ether (PGME), cyclohexanone, ethyl lactate, γ -butyrolactone (GBL), acetylacetone (acetyl acetate), and the like, and preferably Propylene Glycol Monomethyl Ether Acetate (PGMEA).
The content of the solvent (B) in one embodiment of the present invention is not particularly limited as long as the object of the present invention can be achieved, and the composition of the present invention may include the balance other than the reaction components including the copolymer (a) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 and other additives. For example, in the case where only the copolymer (A) including at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 is used in the composition, the solvent may be 85 to 95% by weight in the total weight of the composition, and when the above range is satisfied, the above effects of the present invention can be effectively exhibited.
Crosslinking agent and catalyst
In addition, the composition for a hard mask according to an embodiment of the present invention may further include at least one of a crosslinking agent and a catalyst, as necessary.
The crosslinking agent is not particularly limited as long as it can crosslink the repeating units of the polymer by heating in the reaction in which the generated acid functions as a catalyst, and is capable of reacting with the hydroxyl groups of the copolymer (a) so as to function as a catalyst. As a representative example of such a crosslinking agent, any one selected from the group consisting of melamine, amino resin, glycoluril compound, and diepoxy compound can be used.
By further including the above-mentioned crosslinking agent, the curing characteristics of the composition for a hard mask can be further enhanced.
Specific examples of the crosslinking agent include etherified amino resins, such as methylated or butylated melamine (specific examples include N-methoxymethyl-melamine or N-butoxymethyl-melamine) and methylated or butylated urea (urea) resin (specific examples include Cymel U-65 resin or UFR 80 resin), glycoluril derivatives represented by the following chemical formula L-1 (specific examples include Powderlink 1174), bis (hydroxymethyl) -p-cresol compounds represented by the chemical formula L-2), and the like. Further, a bicyclo oxygen compound represented by the following chemical formula L-3 and a melamine compound represented by the following chemical formula L-4 can also be used as the crosslinking agent.
[ chemical formula L-1]
[ chemical formula L-2]
[ chemical formula L-3]
[ chemical formula L-4]
As the catalyst, an acid catalyst or a basic catalyst can be used.
The acid catalyst may be a thermally activated acid catalyst. As an example of the acid catalyst, an organic acid such as p-toluenesulfonic acid monohydrate (p-toluene sulfonic acid monohydrate) can be used, and a TAG (thermal acid generator) type compound having storage stability can be mentioned. The thermal acid generator is an acid generator compound which releases an acid upon heat treatment, and for example, pyridine p-toluenesulfonate can be used
Salts (pyridine p-toluene sulfonate), 2,4,4, 6-tetrabromocyclohexadienone, benzoin tosylate, 2-nitrobenzyl tosylate, alkyl esters of organic sulfonic acids, and the like.
As the above-mentioned basic catalyst, NH may be used4OH or is selected from NR'4Any ammonium hydroxide represented by OH (R' is an alkyl group).
In addition, other photosensitive catalysts known in the art of resist technology may be used as long as they are compatible with the other components of the antireflective composition.
When the crosslinking agent is contained, the content of the crosslinking agent may be 0.001 to 50 parts by weight, preferably 0.1 to 20 parts by weight, and more preferably 1 to 20 parts by weight, based on 100 parts by weight of the copolymer (a). When the catalyst is contained, the content of the catalyst may be 0.001 to 50 parts by weight, preferably 0.1 to 20 parts by weight, and more preferably 1 to 20 parts by weight, based on 100 parts by weight of the copolymer (a).
When the content of the crosslinking agent is in the above range, appropriate crosslinking characteristics can be obtained while maintaining optical characteristics of the formed underlayer film.
When the catalyst content is within the above range, the acidity that affects the storage stability can be appropriately maintained while appropriate crosslinking characteristics are obtained.
Additive agent
The composition for a hard mask of the present invention may further contain an additive such as a surfactant, if necessary. As the surfactant, alkyl benzene sulfonate and alkyl pyridine can be used
Salts, polyethylene glycols, quaternary ammonium salts, and the like, but are not limited thereto. In this case, the content of the surfactant may be 1 to 30 parts by weight with respect to 100 parts by weight of the copolymer (a). When the content of the surfactant is within the above range, appropriate crosslinking characteristics can be obtained while maintaining the optical characteristics of the formed underlayer film.
Hereinafter, preferred embodiments are provided to help understanding of the present invention, but these embodiments are merely illustrative of the present invention and do not limit the scope of the appended claims, and various changes and modifications of the embodiments within the scope and technical spirit of the present invention, which will be apparent to those skilled in the art, are of course also included in the scope of the appended claims.
Examples and comparative examples
Compositions for hard masks having the compositions and contents (wt%) shown in tables 1 and 2 below were prepared.
[ Table 1]
[ Table 2]
A-1: by passing
(1:0.7 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 3800)
a-2: by passing
(1:0.7 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 5500)
a-3: by passing
(1:0.7 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 6200)
a-4: by passing
(1:0.7 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 5800)
a-5: by passing
(1:0.7 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 7600)
a-6: by passing
(1:0.7 mol)Ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound)) was added to the prepolymer
(for every 1 mol)
0.3 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 7600)
a-7: by passing
(1:0.9 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.1 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 3800)
a-8: by passing
(1:0.9 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.1 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 5500)
a-9: by passing
(1:0.9 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to aromatic alcohol compound)) ) to the resulting prepolymer
(for each 1
0.1 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 6200)
a-10: by passing
(1:0.9 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.1 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 5800)
a-11: by passing
(1:0.9 molar ratio) to the prepolymer formed by the condensation reaction (acid catalyst: p-toluenesulfonic acid (5 mol% based on the aromatic alcohol compound))
(for every 1 mol)
0.1 mol) was added to the reaction solution to obtain a copolymer (weight average molecular weight: 7600)
a-12: are simultaneously thrown into
A copolymer (weight-average molecular weight: 8600) produced in the same manner as in example 1, except that the condensation reaction was carried out in the same manner as in example 1 (1:0.9:0.1 molar ratio)
A' -1: tong (Chinese character of 'tong')For treating
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to form a copolymer (weight average molecular weight: 2900)
A' -2: by passing
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to give a copolymer (weight-average molecular weight: 4700)
A' -3: by passing
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to give a copolymer (weight-average molecular weight: 5500)
A' -4: by passing
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to form a copolymer (weight average molecular weight: 2900)
A' -5: by passing
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to give a copolymer (weight-average molecular weight: 4700)
A' -6: by passing
(1:1 molar ratio) (acid catalyst: p-toluenesulfonic acid (5 mol% relative to the aromatic alcohol compound)) to give a copolymer (weight-average molecular weight: 5500)
B-1: propylene Glycol Monomethyl Ether Acetate (PGMEA)
C-1: n-methoxymethyl-melamine resin
D-1: pyridine p-toluenesulfonate
Salt (salt)
E-1: triethylene glycol
Examples of the experiments
1. Evaluation of Heat resistance
The composition was vacuum dried to remove the solvent, a portion of the sample was taken, and the mass loss rate was measured by thermogravimetric analysis (TGA) under nitrogen while the temperature was raised to 800 ℃.
The mass loss rate { (initial mass-800 ℃ mass)/initial mass } × 100%
< determination of Heat resistance >
Very good: the mass loss rate is less than 10 percent
O: the mass loss rate is more than 10 percent and less than 15 percent
And (delta): the mass loss rate is more than 15 percent and less than 25 percent
X: the mass loss rate is more than 25 percent
2. Uniformity of coating
After drying the composition, spin coating was performed to a thickness of 5 μm, and the surface was confirmed with the naked eye after drying for 3 minutes with a 100 ℃ hot air dryer.
< determination of coating uniformity >
O: unevenness of the coated surface was not confirmed with the naked eye
And (delta): local unevenness was visually confirmed
X: visually confirm that the entire surface was not uniform
[ Table 3]
As can be seen from fig. 3, the examples were excellent in both heat resistance and coating uniformity, but the comparative examples were excellent in coating uniformity but significantly reduced in effect in heat resistance.
Claims (7)
1. A composition for a hard mask, comprising a copolymer comprising at least one repeating unit selected from the group consisting of the following chemical formula 1-1 and chemical formula 1-2,
chemical formula 1-1
In the formula, Ar1And Ar2Each independently represents at least one selected from the group consisting of the groups represented by the following chemical formula a-1 to the following chemical formula a-7,
R1is at least one selected from the group consisting of the groups represented by the following chemical formula b-1 to the following chemical formula b-7,
ar is1、Ar2And R1Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190,
chemical formula 1-2
In the formula, Ar1And Ar2Each independently represents at least one selected from the group consisting of the groups represented by the following chemical formula a-1 to the following chemical formula a-7,
R2is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
ar is1And Ar2Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190,
chemical formula a-1
Chemical formula a-2
Chemical formula a-3
Chemical formula a-4
Chemical formula a-5
Chemical formula a-6
Chemical formula a-7
In the chemical formula a-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms,
chemical formula b-1
Chemical formula b-2
Chemical formula b-3
Chemical formula b-4
Chemical formula b-5
Chemical formula b-6
Chemical formula b-7
In the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1-2 carbon atoms, an alkenyl group or alkynyl group having 2-4 carbon atoms, or an aryl group having 6-30 carbon atoms.
2. The composition for a hard mask according to claim 1, the copolymer further comprising a repeating unit of the following chemical formula 2,
chemical formula 2
In the formula, Ar3Is at least one selected from the group consisting of the following chemical formula a-1 to the following chemical formula a-7,
Ar4is at least one selected from the group consisting of the following chemical formula b-1 to the following chemical formula b-7,
ar is3And Ar4Each independently further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group,
n is an integer of 1 to 190,
chemical formula a-1
Chemical formula a-2
Chemical formula a-3
Chemical formula a-4
Chemical formula a-5
Chemical formula a-6
Chemical formula a-7
In the chemical formula a-7, Ra is a hydrogen atom, an alkyl group having 1 to 2 carbon atoms, an alkenyl group or alkynyl group having 2 to 4 carbon atoms, or an aryl group having 6 to 30 carbon atoms,
chemical formula b-1
Chemical formula b-2
Chemical formula b-3
Chemical formula b-4
Chemical formula b-5
Chemical formula b-6
Chemical formula b-7
In the chemical formula b-7, Ra is a hydrogen atom, an alkyl group having 1-2 carbon atoms, an alkenyl group or alkynyl group having 2-4 carbon atoms, or an aryl group having 6-30 carbon atoms.
3. The composition for a hard mask according to claim 2, wherein the copolymer is a compound produced by adding at least one compound selected from the group consisting of a compound of the following chemical formula p-2 and a compound of the following chemical formula p-3 to a prepolymer produced by a condensation reaction of an aromatic hydrocarbon compound having 6 to 35 carbon atoms and a compound of the following chemical formula p-1,
chemical formula p-1
Chemical formula p-2
Chemical formula p-3
In the formula, Ar4An aryl group having 6 to 35 carbon atoms,
Ar2is a divalent aromatic hydrocarbon group having 6 to 35 carbon atoms,
R1an alkyl group having 1 to 6 carbon atoms or an aryl group having 6 to 35 carbon atoms,
R2is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms,
the aromatic hydrocarbon compound, Ar2、Ar4、R1And R2Each independently may be further substituted with an alkyl group having 1 to 6 carbon atoms, a hydroxyl group, a methoxy group or a phenyl group.
4. The composition for a hard mask according to claim 1, wherein the content of the repeating unit of chemical formula 1-1 in the copolymer is 5 to 80 mol%.
5. The composition for a hard mask according to claim 1, wherein the content of the repeating unit of chemical formula 1-2 in the copolymer is 2 to 20 mol%.
6. The composition for a hard mask according to claim 1, wherein the copolymer comprising at least one repeating unit selected from the group consisting of chemical formula 1-1 and chemical formula 1-2 is contained in an amount of 5 to 15% by weight, and the solvent is contained in an amount of 85 to 95% by weight, based on the total weight of the composition.
7. The composition for a hardmask according to claim 1, further comprising at least one of a crosslinking agent and a catalyst.
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| KR1020160075150A KR102452809B1 (en) | 2016-06-16 | 2016-06-16 | Composition for hard mask |
| KR1020160100007A KR102452810B1 (en) | 2016-08-05 | 2016-08-05 | Composition for hard mask |
| KR10-2016-0100007 | 2016-08-05 |
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| KR102539872B1 (en) * | 2018-08-20 | 2023-06-05 | 동우 화인켐 주식회사 | Composition for hard mask |
| KR102590366B1 (en) * | 2019-01-18 | 2023-10-17 | 동우 화인켐 주식회사 | Composition for hard mask |
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