CN107513683A - Plate and preparation method thereof is prevented in one kind vapour deposition - Google Patents

Plate and preparation method thereof is prevented in one kind vapour deposition Download PDF

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Publication number
CN107513683A
CN107513683A CN201710783549.6A CN201710783549A CN107513683A CN 107513683 A CN107513683 A CN 107513683A CN 201710783549 A CN201710783549 A CN 201710783549A CN 107513683 A CN107513683 A CN 107513683A
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CN
China
Prior art keywords
plate
mixed liquor
metal
prevent
adhesive film
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Pending
Application number
CN201710783549.6A
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Chinese (zh)
Inventor
张军
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to CN201710783549.6A priority Critical patent/CN107513683A/en
Publication of CN107513683A publication Critical patent/CN107513683A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)

Abstract

The invention discloses one kind vapour deposition to prevent plate, and described to prevent that plate surface is attached with metal adhesive film, the metal adhesive film has metal corsslinking network structure.In the PVD equipment course of work, the presence of metal adhesive film can be such that relatively firm being grown in of film plating layer prevents on plate, difficult for drop-off, while can also increase and prevent adsorbance of the plate to film plating layer;So as to extend service life and the cleaning frequency of preventing plate, and then reduce the cleaning cost for preventing plate.

Description

Plate and preparation method thereof is prevented in one kind vapour deposition
Technical field
The present invention relates to surface diposition field, prevents plate and preparation method thereof more particularly to one kind vapour deposition.
Background technology
Vapour deposition (Physical Vapor Deposition, PVD) is that atom or molecule are transferred into base material table by source Process on face, it is usually used in substrate surface film forming.PVD basic skills includes vacuum evaporation, sputtering, ion plating etc., its principle It is under vacuum, using low-voltage, the arc-discharge technique of high current, to evaporate target using gas discharge and make to be steamed Stimulating food matter and gas all ionize, and using the acceleration of electric field, make to be deposited on base material by evaporated material and its reaction product On surface, the purpose in substrate surface plated film is finally reached.But in film forming procedure, by evaporated material and its reaction product Target substrate surface can't be completely deposited at, moieties can be deposited in the substrate that should not be deposited or equipment cavity, from And influence follow-up quality of forming film.Therefore, it can be added in PVD equipment and prevent plate to prevent unnecessary film plating layer is attached to from should not adhere to Substrate or equipment cavity on.
Present inventor has found in long-term research and development, during PVD equipment continuously works, prevents above plate Thick film plating layer can be accumulated out, when film plating layer reaches certain thickness, its adhesive force will be deteriorated, and drop therewith in substrate table Particle is caused in face, so as to cause component failure or surface defect occur, at this moment with regard to needing to preventing that plate carries out the clear of film plating layer Wash.But prevent that plate is the fine features in PVD equipment, cleaning is difficult and spends substantial amounts of fund, greatly improve plated film into This, therefore urgently need to find a kind of method for reducing and preventing plate cleaning cost.
The content of the invention
The present invention solves the technical problem of providing a kind of vapour deposition to prevent plate and preparation method thereof, can reduce The cleaning cost of plate is prevented in vapour deposition.
In order to solve the above technical problems, one aspect of the present invention is:A kind of vapour deposition is provided and prevents plate, Described to prevent that plate surface is attached with metal adhesive film, the metal adhesive film has metal corsslinking network structure.
In order to solve the above technical problems, another technical solution used in the present invention is:A kind of vapour deposition is provided to prevent The preparation method of plate, this method include:Plate is prevented in offer, there is provided the first mixed liquor, the first mixed liquor is coated in and prevents plate Surface, solidify under the first preparatory condition;Plate is prevented in vacuum high-temperature baking, and being formed on the surface for preventing plate has metal corsslinking net The metal adhesive film of shape structure.
The beneficial effects of the invention are as follows:The situation of prior art is different from, the present invention provides a kind of vapour deposition and prevents plate, Described to prevent that plate surface is attached with metal adhesive film, the metal adhesive film has metal corsslinking network structure.Worked in PVD equipment During, evaporated or the material that sputters can penetrate into the inside of metal adhesive film by the hole of cross-linked structure, with Metal adhesive film mutually merges, and relatively firm being grown in of film plating layer is prevented on plate, difficult for drop-off, while can also increase and prevent Adsorbance of the plate to film plating layer;So as to extend service life and the cleaning frequency of preventing plate, and then reduce the cleaning for preventing plate Cost.
Further, the metal adhesive film can be with preventing that plate is peeled off, when metal adhesive film reaches the absorption to film plating layer During the upper limit, it can make to prevent that plate recovers clean together with metal adhesive film and its film plating layer of absorption from preventing tearing on plate, No longer need, to preventing that plate surface is cleaned, to simplify processing step, while greatly reduce cleaning cost.
Brief description of the drawings
Fig. 1 is the structural representation that the embodiment of plate one is prevented in present invention vapour deposition;
Fig. 2 is the structural representation that the embodiment of plate one is prevented in present invention vapour deposition;
Fig. 3 is the schematic flow sheet for the embodiment of preparation method one that plate is prevented in present invention vapour deposition;
Fig. 4 is the structural representation for the metal adhesive film that plate is prevented in present invention vapour deposition;
Fig. 5 is that the application flow schematic diagram of plate one is prevented in present invention vapour deposition;
Fig. 6 is the schematic flow sheet for the embodiment of preparation method one that plate is prevented in present invention vapour deposition.
Embodiment
To make the purpose of the present invention, technical scheme and effect clearer, clear and definite, develop simultaneously embodiment pair referring to the drawings The present invention is further described.
Referring to Fig. 1, Fig. 1 is the structural representation that the embodiment of plate one is prevented in present invention vapour deposition.Present embodiment A kind of vapour deposition is provided and prevents plate, the vapour deposition prevents that the surface attachment of plate 101 has metal adhesive film 102, metal adhesive film 102 have metal corsslinking network structure.
In the embodiment, in the PVD equipment course of work, the material for being evaporated or being sputtered can be by crosslinking net knot The hole of structure penetrates into the inside of metal adhesive film, is mutually merged with metal adhesive film, make film plating layer it is relatively firm be grown in it is anti- On plate, it is difficult for drop-off, while can also increase and prevent adsorbance of the plate to film plating layer;Prevent that using for plate is all so as to extend Phase and cleaning frequency, and then reduce the cleaning cost for preventing plate.
Fig. 2 and Fig. 3 are referred to, Fig. 2 is the structural representation that the embodiment of plate one is prevented in present invention vapour deposition;Fig. 3 is The schematic flow sheet of the embodiment of preparation method one of plate is prevented in present invention vapour deposition.In one embodiment, metal glued membrane Layer 102 is included in the basic unit 1021 for preventing sequentially being set on plate 101 and network structure layer 1022, wherein basic unit 1021 and netted knot Structure layer 1022 is formed in the manufacturing process of metal adhesive film 102.In the embodiment, the making of plate is prevented in vapour deposition Method is as follows:
(a):Plate 301 is prevented in offer.
Wherein, it can conventional use of arbitrarily prevent plate to prevent plate 301.
(b):Second mixed liquor is provided, the second mixed liquor is coated in the surface for preventing plate 301, under the second preparatory condition It is formed by curing substrate layer 302.
Wherein, the second mixed liquor includes fluorine silicon class compound, surfactant and deionized water;Specifically, fluorine silicon class Compound can be that ammonium hexafluorosilicate, surfactant can be alkylolamideses (FFA) etc..Wherein, fluorine silicon class compound is Content in two mixed liquors is 20%~35%, such as 20%, 24%, 28%, 32%, 35% etc.;Surfactant is second Content in mixed liquor is 5%~10%, such as 5%, 6%, 8%, 9%, 10% etc.;Deionized water is in the second mixed liquor Content is 55%~75%, such as 55%, 60%, 65%, 70%, 75% etc..
Prevent plate 301 it is alternatively possible to uniformly be coated in the second mixed liquor using modes such as spraying, brushing or bat printings Surface;Substrate layer 302 is formed by curing under second preparatory condition, allowing for any auxiliary operation can be not added with normal temperatures and pressures Second mixed liquor spontaneous curing forms substrate layer 302, can also accelerate to solidify by blowing or slightly hot mode.
Alternatively, the thickness of substrate layer 302 is 0.01~1mm, for example, 0.01mm, 0.05mm, 0.1mm, 0.3mm, 0.5mm, 0.8mm, 1mm etc..Substrate layer 302 is to prevent the transition zone between plate 301 and metal adhesive film 304;Served as a contrast by setting Bottom, it can make metal adhesive film easier with preventing that plate is peeled off.
(c):First mixed liquor is provided, the first mixed liquor is coated in the surface of substrate layer 302, under the first preparatory condition Solidification, form metal glued membrane preparation layers 303.
Wherein, the first mixed liquor includes metallics, resinous material and solvent;Specifically, metallics be bismuth, tin, One or more in indium, magnesium, aluminium, iron, copper, nickel, zinc, or metallics are to contain bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, zinc Metal alloy in one or more, or metallics is bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, the one or more in zinc With containing bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, zinc metal alloy in one or more mixtures;In other embodiment party In formula, metallics can also be the relatively low metal simple-substance or alloy of other fusing points, such as the fusing point of metallics can be 100 DEG C or so;Wherein, metallics can be evenly distributed in the first mixed liquor with the state of fine powder.Resinous material is water Property polyurethane, polymethyl methacrylate, polyethylene terephthalate, dimethyl acetamide, dibutyl phthalate, One or more in allyl carbonate, benzoic acid dibutyl ester, makrolon;In other embodiments, resinous material Can be medium-viscosity, high temperature resistant, the polymer easily solidified.Solvent is deionized water;In other embodiments, solvent also may be used Think other solvents without oxidisability.
Alternatively, metallics, resinous material and solvent are formed dispersed molten by certain fusion more mutual than row Liquid, different ratios can be allocated for different PVD equipments.Wherein, content of the metallics in the first mixed liquor is 10%-50%, such as 10%, 20%, 30%, 40%, 50% etc.;Content of the resinous material in the first mixed liquor is 5%- 45%, such as 5%, 10%, 20%, 30%, 45% etc.;Specifically, when resinous material selects aqueous polyurethane When (Polyurethane Dispersion), its content in the first mixed liquor is 30%-45%, when resinous material selects During with polyethylene terephthalate (Polyethylene terephthalate), its content in the first mixed liquor is 5%-10%, when resinous material selects dimethyl acetamide (DMAc), its content in the first mixed liquor is 5%- 10%.Content of the solvent in the first mixed liquor is 50%-70%, such as 50%, 55%, 60%, 65%, 70% etc..
It is alternatively possible to the first mixed liquor is uniformly coated in by substrate layer 302 using modes such as spraying, brushing or bat printings Surface;Metal glued membrane preparation layers 303 are formed by curing under first preparatory condition, any auxiliary can be not added with normal temperatures and pressures Operation allows mixed liquor spontaneous curing to form metal glued membrane preparation layers 303, can also be accelerated by blowing or slightly hot mode Solidification.
(d):Vacuum high-temperature baking prevents plate 301 with substrate layer 302 and metal glued membrane preparation layers 303, is preventing plate 301 surface forms the metal adhesive film 304 with metal corsslinking network structure.
Specifically, baking temperature is 80~200 DEG C, such as 80 DEG C, 110 DEG C, 140 DEG C, 170 DEG C, 200 DEG C etc.;During baking Between be 1~6 hour, such as 1 hour, 2 hours, 3.5 hours, 5 hours, 6 hours etc..In baking process, metal glued membrane preparation The basic unit 3041 and network structure layer 3042 that layer 303 can gradually form sequentially to set;Specifically, referring to Fig. 4, Fig. 4 is this The structural representation of the metal adhesive film of plate is prevented in invention vapour deposition.During vacuum bakeout, metallics is reaching Start to melt and be cross-linked to form island interconnection architecture 421 after fusing point, island interconnection architecture 421, which floats, forms network structure layer 42, wherein island interconnection architecture 421 can be as the support frame of metal adhesive film;The organic matters such as resinous material volatilize and by There is contraction and collapsed in the absorption of dissolving each other of substrate layer organic matter, and sinking forms basic unit 41.Wherein, metal is contained in network structure layer 42 And assistant metal produces the resin of crosslinking;Also the larger metal of the density deposited, therefore network structure are contained in basic unit 41 All include metal and resin in layer 42 and basic unit 41, simply both proportional amounts are different with existence form state.
Referring to Fig. 5, Fig. 5, which is present invention vapour deposition, prevents the application flow schematic diagram of plate one.In this embodiment, will Prevent that plate 501 is inserted in PVD equipment with metal adhesive film 503 and apply, with the continuous work of PVD equipment, metal glued membrane One layer of film plating layer 504 is gradually adsorbed on layer 503, please continue to refer to Fig. 4, the material for being evaporated or being sputtered can pass through crosslinking net The hole of structure 421 penetrates into the inside of metal adhesive film, is mutually merged with metal adhesive film, makes the growth that film plating layer is more firm It is difficult for drop-off on plate is prevented, while can also increase and prevent adsorbance of the plate to film plating layer.In one embodiment, also may be used With by with metal adhesive film 503 prevent that plate 501 inserts PVD equipment before, first metal adhesive film 503 surface high power One layer of film plating layer of pre-sputtering (the pre- film plating layer shown in Fig. 4).
, can be together with substrate layer 502, metal glued membrane when metal adhesive film 503 reaches the absorption upper limit to film plating layer 504 Layer 503 and its film plating layer 504 of absorption make to prevent that plate 501 recovers clean, it is no longer necessary to right together from preventing tearing on plate 501 Prevent that the surface of plate 501 is cleaned, recover it is clean prevent plate 501 can also again in its surface metallization adhesive film 304, So recycling PVD prevents plate.In the embodiment, the manufacture craft for preventing plate with metal adhesive film is simple, is made Prevent plate convenient use, and need not clean, being capable of effectively save cost.
Referring to Fig. 6, Fig. 6 is the schematic flow sheet for the embodiment of preparation method one that plate is prevented in present invention vapour deposition. The embodiment provides a kind of be vapor-deposited and prevents the preparation method of plate, and this method comprises the following steps:
S601:Plate is prevented in offer.
S602:First mixed liquor is provided, the first mixed liquor is coated in the surface for preventing plate, it is solid under the first preparatory condition Change.
S603:Plate is prevented in vacuum high-temperature baking, and the metal with metal corsslinking network structure is formed on the surface for preventing plate Adhesive film.
Wherein, in one embodiment, also include before step S602:The second mixed liquor is provided, by the second mixed liquor Coated in the surface for preventing plate, solidify under the second preparatory condition;Specific method implementation procedure refer in above-mentioned embodiment Description, will not be repeated here.
Plate is prevented in a kind of vapour deposition that presently filed embodiment is provided, described to prevent that plate surface is attached with metal-to-metal adhesive Film layer, the metal adhesive film have metal corsslinking network structure.In the PVD equipment course of work, the material that is evaporated or sputtered The inside of metal adhesive film can be penetrated into by the hole of cross-linked structure, is mutually merged with metal adhesive film, makes plated film Relatively firm being grown in of layer is prevented on plate, difficult for drop-off, while can also increase and prevent adsorbance of the plate to film plating layer;So as to prolong The service life for preventing plate and cleaning frequency have been grown, and then has reduced the cleaning cost for preventing plate.
Further, the metal adhesive film can be with preventing that plate is peeled off, when metal adhesive film reaches the absorption to film plating layer During the upper limit, it can make to prevent that plate recovers clean together with metal adhesive film and its film plating layer of absorption from preventing tearing on plate, No longer need, to preventing that plate surface is cleaned, to simplify processing step, while greatly reduce cleaning cost.
Embodiments of the present invention are the foregoing is only, are not intended to limit the scope of the invention, it is every to utilize this The equivalent structure or equivalent flow conversion that description of the invention and accompanying drawing content are made, or directly or indirectly it is used in other correlations Technical field, it is included within the scope of the present invention.

Claims (10)

1. plate is prevented in one kind vapour deposition, it is characterised in that described to prevent that plate surface is attached with metal adhesive film, the metal-to-metal adhesive Film layer has metal corsslinking network structure.
2. according to claim 1 prevent plate, it is characterised in that the metal adhesive film be included in it is described prevent on plate according to The basic unit and network structure layer that sequence is set.
3. according to claim 1 prevent plate, it is characterised in that
The metal adhesive film is coated by the first mixed liquor to be formed, and first mixed liquor includes metallics, resinous material And solvent;Wherein, content of the metallics in first mixed liquor is 10%-50%, and the resinous material exists Content in first mixed liquor is 5%-45%, and content of the solvent in first mixed liquor is 50%-70%;
The metallics be bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, the one or more in zinc, or the metallics be containing Have an one or more in the metal alloy of bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, zinc, or the metallics be bismuth, tin, In indium, magnesium, aluminium, iron, copper, nickel, zinc one or more with containing bismuth, tin, indium, magnesium, aluminium, iron, copper, nickel, zinc metal alloy In one or more mixtures;
The resinous material is aqueous polyurethane, polymethyl methacrylate, polyethylene terephthalate, dimethyl second One or more in acid amides, dibutyl phthalate, allyl carbonate, benzoic acid dibutyl ester, makrolon;
The solvent is deionized water.
4. according to claim 1 prevent plate, it is characterised in that the thickness of the metal adhesive film is 0.1~2mm.
5. according to claim 1 prevent plate, it is characterised in that described to prevent also wrapping between plate and the metal adhesive film Include substrate layer;
The substrate layer is coated by the second mixed liquor and formed, and second mixed liquor includes fluorine silicon class compound, surfactant And deionized water;Wherein, content of the fluorine silicon class compound in second mixed liquor is 20%~35%, the surface Content of the activating agent in second mixed liquor is 5%~10%, the deionized water containing in second mixed liquor Measure as 55%~75%.
6. according to claim 5 prevent plate, it is characterised in that the thickness of the substrate layer is 0.01~1mm.
7. prevent plate according to claim any one of 1-6, it is characterised in that the metal adhesive film can be prevented with described Plate stripping.
8. a kind of be vapor-deposited prevents the preparation method of plate, it is characterised in that methods described includes:
Plate is prevented in offer;
First mixed liquor is provided, first mixed liquor is coated in the surface for preventing plate, it is solid under the first preparatory condition Change;
Vacuum high-temperature baking is described to prevent plate, and the metal-to-metal adhesive with metal corsslinking network structure is formed on the surface for preventing plate Film layer.
9. according to the method for claim 8, it is characterised in that described that first mixed liquor is prevented into plate coated in described Surface step before also include:Second mixed liquor is provided, second mixed liquor is coated in the surface for preventing plate, Substrate layer is formed by curing under second preparatory condition.
10. according to the method for claim 8, it is characterised in that the vacuum high-temperature baking is described to prevent plate, described anti- Surface metal adhesive film step of the formation with metal corsslinking network structure of plate includes:Baking temperature is 80~200 DEG C, is dried The roasting time is 1~6 hour.
CN201710783549.6A 2017-08-31 2017-08-31 Plate and preparation method thereof is prevented in one kind vapour deposition Pending CN107513683A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109652773A (en) * 2019-02-25 2019-04-19 京东方科技集团股份有限公司 One kind preventing component and evaporated device

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268367A (en) * 1996-04-01 1997-10-14 Hitachi Ltd Thin film forming device and method by plasma treatment
JP2007051330A (en) * 2005-08-18 2007-03-01 Neos Co Ltd Vacuum thin film deposition system
CN101491962A (en) * 2008-01-23 2009-07-29 精工爱普生株式会社 Method of forming bonded body and bonded body
US20100206628A1 (en) * 2006-09-04 2010-08-19 Toray Industries, Inc. Transparent electromagnetic wave shield member and method for manufacturing the same
CN102011085A (en) * 2010-10-29 2011-04-13 宁波江丰电子材料有限公司 Method for processing surface of attachment-resisting plate
CN201962346U (en) * 2010-11-09 2011-09-07 宁波江丰电子材料有限公司 Anti-adhesion plate structure for vacuum sputtering
CN104032259A (en) * 2013-03-07 2014-09-10 富士胶片株式会社 Adhesion-prevention Plate Used For Vacuum Film-forming Device And Applications Thereof
CN106222617A (en) * 2016-08-26 2016-12-14 武汉华星光电技术有限公司 Plate structure and manufacture method, filming equipment is prevented for filming equipment
CN107043919A (en) * 2017-04-18 2017-08-15 合肥鑫晟光电科技有限公司 Prevent plate and its surface treatment method, material recovery method and film deposition equipment

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268367A (en) * 1996-04-01 1997-10-14 Hitachi Ltd Thin film forming device and method by plasma treatment
JP2007051330A (en) * 2005-08-18 2007-03-01 Neos Co Ltd Vacuum thin film deposition system
US20100206628A1 (en) * 2006-09-04 2010-08-19 Toray Industries, Inc. Transparent electromagnetic wave shield member and method for manufacturing the same
CN101491962A (en) * 2008-01-23 2009-07-29 精工爱普生株式会社 Method of forming bonded body and bonded body
CN102011085A (en) * 2010-10-29 2011-04-13 宁波江丰电子材料有限公司 Method for processing surface of attachment-resisting plate
CN201962346U (en) * 2010-11-09 2011-09-07 宁波江丰电子材料有限公司 Anti-adhesion plate structure for vacuum sputtering
CN104032259A (en) * 2013-03-07 2014-09-10 富士胶片株式会社 Adhesion-prevention Plate Used For Vacuum Film-forming Device And Applications Thereof
CN106222617A (en) * 2016-08-26 2016-12-14 武汉华星光电技术有限公司 Plate structure and manufacture method, filming equipment is prevented for filming equipment
CN107043919A (en) * 2017-04-18 2017-08-15 合肥鑫晟光电科技有限公司 Prevent plate and its surface treatment method, material recovery method and film deposition equipment

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
黄汉尧编: "《半导体器件工艺原理》", 30 June 1980, 国防工业出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109652773A (en) * 2019-02-25 2019-04-19 京东方科技集团股份有限公司 One kind preventing component and evaporated device
WO2020173413A1 (en) * 2019-02-25 2020-09-03 京东方科技集团股份有限公司 Deposition-preventing assembly and vapor deposition device

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Applicant after: TCL Huaxing Photoelectric Technology Co.,Ltd.

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Application publication date: 20171226