CN107498456A - Erratic star wheel available for one side polishing - Google Patents
Erratic star wheel available for one side polishing Download PDFInfo
- Publication number
- CN107498456A CN107498456A CN201710925256.7A CN201710925256A CN107498456A CN 107498456 A CN107498456 A CN 107498456A CN 201710925256 A CN201710925256 A CN 201710925256A CN 107498456 A CN107498456 A CN 107498456A
- Authority
- CN
- China
- Prior art keywords
- wheel
- polishing
- contiguous block
- erratic star
- unit wheel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 37
- 238000005516 engineering process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000010009 beating Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003032 molecular docking Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The present invention relates to a kind of erratic star wheel available for one side polishing, its structure is：The erratic star wheel is made up of at least one unit wheel, polishing hole is offered in the unit wheel, at least one of upper surface or lower surface of the unit wheel are provided with connecting portion, contiguous block is provided with the connecting portion, one end of the contiguous block is connected on unit wheel by rotary shaft, connecting hole is offered on unit wheel corresponding to another end position of contiguous block, the shape of the contiguous block and connecting hole matches；When contiguous block is horizontal, its surface flushes with unit wheel surface.By the present invention optics of different-thickness can be adapted to grind work, and another side can be completed to polish work simultaneously in one side grinding.
Description
Technical field
The present invention relates to a kind of lapping device, particularly a kind of erratic star wheel available for one side polishing.
Background technology
Existing erratic star wheel is largely designed to the twin polishing of optics, i.e. the thickness of erratic star wheel can be less than light
Learn device thickness, if only need in some cases grind a face, user can typically choose the thicker erratic star wheel of thickness from
And ensure that another face of optics is not ground, but this kind of mode is less efficient, and the two sides abrasive disk of polissoir can not
It is used effectively.Chinese patent bulletin text CN103158054B discloses two kinds of single-sided polishings realized on two-sided lapping and buffing machine
Method, it is bonded two panels optics to be ground by the way of adhesive, so as to only grind each one of two optics
Face, this kind of method are chosen similarly for the thickness of erratic star wheel and there are certain requirements, and because another of optics need not be ground
The face of mill still needs to carry out the processing such as polishing, can not step completion by this kind of lapping mode.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of erratic star wheel for one side polishing, can by the erratic star wheel
To be adapted to the optics of different-thickness to grind work, and another side can be completed to polish work simultaneously in one side grinding.
Technical scheme is used by the present invention solves above-mentioned technical problem
A kind of erratic star wheel available for one side polishing, its structure are：The erratic star wheel is made up of at least one unit wheel, institute
State offered in unit wheel polishing at least one of hole, the upper surface or lower surface of the unit wheel be provided with connecting portion, it is described
Contiguous block is provided with connecting portion, one end of the contiguous block is connected on unit wheel by rotary shaft, and the contiguous block is another
Connecting hole is offered on unit wheel corresponding to end position, the shape of the contiguous block and connecting hole matches；At contiguous block
When horizontal level, its surface flushes with unit wheel surface.
Further, the erratic star wheel is at least made up of first module wheel and second unit wheel, on the first module wheel
The contiguous block on surface is in vertical position and is engaged with the connecting hole of second unit wheel lower surface, the second unit wheel following table
The contiguous block in face is in vertical position and is engaged with the connecting hole of first module wheel upper surface.
Further, in addition to polishing layer, the polishing layer are arranged on beating between first module wheel and second unit wheel
In grinding out.
Preferably, at least one of upper surface or lower surface of the unit wheel are provided with fixing hole, the fixing hole
Indent is arranged on around polishing hole, and the polishing aspect product is big compared with polishing hole, and it stretches out part of polishing and fixed by fixing hole.
Preferably, the connecting portion quantity is at least three, and it is equally distributed on same circumference.
The present invention compared with the existing technology has advantages below and effect：Erratic star wheel is made by the setting of connecting portion structure
Thickness can be adjusted freely, and when unit wheel quantity is more than or equal to two, can be formed between unit wheel for depositing polishing layer
Space, polish work for non-abrasive side.
Brief description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments of invention, for those of ordinary skill in the art, without having to pay creative labor, may be used also
To obtain other accompanying drawings according to these accompanying drawings.
Fig. 1 is the structural representation of the present invention.
Fig. 2 is the sectional view of the present invention.
Label declaration：
The polishing fixing hole 21 of hole 2 of erratic star wheel 1
The rotary shaft 32 of 3 contiguous block of connecting portion 31
The optics 4 of connecting hole 33 polishing layer 5
Embodiment
With reference to embodiment, the present invention is described in further detail, following examples be explanation of the invention and
The invention is not limited in following examples.
Embodiment 1：
As shown in Fig. 1 to 2, this erratic star wheel 1 is made up of first module wheel 1A and second unit wheel 1B, on each unit wheel
Polishing hole 2 is offered in same position to accommodate optics 4, and the fixing hole of indent is offered around polishing hole 2
21, same position of each unit wheel upper and lower surface on same circumference has been placed equidistant 3 connecting portions 3, and connecting portion 3 is by connecting
Block 31, rotary shaft 32 and connecting hole 33 form, and contiguous block 31 can rotate around rotary shaft 32, and connecting hole 33 is opened in contiguous block 31
The other end, its shape is consistent with contiguous block 31, and when contiguous block 31 is horizontal, its surface and unit wheel surface are neat
It is flat；When contiguous block 31 is in vertical position, it can be engaged with the connecting hole 33 of other unit wheels, wherein first module wheel
The contiguous block 31A of 1A upper surfaces is in vertical position and is engaged with the connecting hole 33B of second unit wheel 1B lower surfaces, and described
The contiguous block 31B of two unit wheel 1B lower surfaces is in vertical position and connecting hole 31A with first module wheel 1A upper surfaces matches
Close, so as to realize 1A drive 1B while rotate, and both 1A and 1B polishing hole 21A and 21B docking, so as in it
Accommodate polishing layer 5 and its position is relatively fixed, optics 4 is polished without the face of grinding.
Furthermore, it is necessary to illustrate, the specific embodiment described in this specification, the shape of its parts and components, it is named
Title etc. can be different.The equivalent or simple change that all construction, feature and principles according to described in inventional idea of the present invention are done, is wrapped
Include in the protection domain of patent of the present invention.Those skilled in the art can be to described specific implementation
Example is made various modifications or supplement or substituted using similar mode, structure without departing from the present invention or surmounts this
Scope as defined in the claims, protection scope of the present invention all should be belonged to.
Claims (5)
- A kind of 1. erratic star wheel available for one side polishing, it is characterised in that：The erratic star wheel is made up of at least one unit wheel, institute State offered in unit wheel polishing at least one of hole, the upper surface or lower surface of the unit wheel be provided with connecting portion, it is described Contiguous block is provided with connecting portion, one end of the contiguous block is connected on unit wheel by rotary shaft, and the contiguous block is another Connecting hole is offered on unit wheel corresponding to end position, the shape of the contiguous block and connecting hole matches；At contiguous block When horizontal level, its surface flushes with unit wheel surface.
- 2. the erratic star wheel according to claim 1 available for one side polishing, it is characterised in that：The erratic star wheel is at least by One unit wheel and second unit wheel composition, the contiguous block of the first module wheel upper surface is in vertical position and and second unit Wheel lower surface connecting hole be engaged, the contiguous block of the second unit wheel lower surface it is in vertical position and with first module wheel The connecting hole of upper surface is engaged.
- 3. the erratic star wheel according to claim 2 available for one side polishing, it is characterised in that：Also include polishing layer, it is described Polishing layer is arranged in the polishing hole between first module wheel and second unit wheel.
- 4. the erratic star wheel according to claim 3 available for one side polishing, it is characterised in that：The upper surface of the unit wheel Or at least one of lower surface is provided with fixing hole, the fixing hole indent is arranged on around polishing hole, the polishing aspect product Big compared with polishing hole, it stretches out part of polishing and fixed by fixing hole.
- 5. the erratic star wheel according to claim 1 available for one side polishing, it is characterised in that：The connecting portion quantity is at least For three, and it is equally distributed on same circumference.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710925256.7A CN107498456B (en) | 2017-10-03 | 2017-10-03 | Planetary wheel capable of being used for single-sided polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710925256.7A CN107498456B (en) | 2017-10-03 | 2017-10-03 | Planetary wheel capable of being used for single-sided polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107498456A true CN107498456A (en) | 2017-12-22 |
| CN107498456B CN107498456B (en) | 2024-06-04 |
Family
ID=60700431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710925256.7A Active CN107498456B (en) | 2017-10-03 | 2017-10-03 | Planetary wheel capable of being used for single-sided polishing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107498456B (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3375614A (en) * | 1964-12-09 | 1968-04-02 | Speedfam Corp | Lapping machine truing ring and fixture |
| US20020036182A1 (en) * | 2000-09-28 | 2002-03-28 | Kimihiko Kajimoto | Method of manufacturing silicon wafer |
| JP2007222998A (en) * | 2006-02-24 | 2007-09-06 | Kyocera Chemical Corp | Lapping carrier and manufacturing method thereof |
| CN101982302A (en) * | 2010-08-30 | 2011-03-02 | 兰州瑞德实业集团有限公司 | Planetary transmission mechanism for double-faced grinding/polishing machine |
| US20140320867A1 (en) * | 2011-10-04 | 2014-10-30 | Shin-Etsu Handotai Co., Ltd. | Method for processing wafer |
| CN105538067A (en) * | 2015-12-24 | 2016-05-04 | 昌河飞机工业（集团）有限责任公司 | Metal film pressing and grinding device |
| CN106312718A (en) * | 2016-10-30 | 2017-01-11 | 云南蓝晶科技有限公司 | Four-drive two-face chip polishing machine |
| CN207344363U (en) * | 2017-10-03 | 2018-05-11 | 德清晶生光电科技有限公司 | A kind of erratic star wheel available for single side polishing |
-
2017
- 2017-10-03 CN CN201710925256.7A patent/CN107498456B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3375614A (en) * | 1964-12-09 | 1968-04-02 | Speedfam Corp | Lapping machine truing ring and fixture |
| US20020036182A1 (en) * | 2000-09-28 | 2002-03-28 | Kimihiko Kajimoto | Method of manufacturing silicon wafer |
| JP2007222998A (en) * | 2006-02-24 | 2007-09-06 | Kyocera Chemical Corp | Lapping carrier and manufacturing method thereof |
| CN101982302A (en) * | 2010-08-30 | 2011-03-02 | 兰州瑞德实业集团有限公司 | Planetary transmission mechanism for double-faced grinding/polishing machine |
| US20140320867A1 (en) * | 2011-10-04 | 2014-10-30 | Shin-Etsu Handotai Co., Ltd. | Method for processing wafer |
| CN105538067A (en) * | 2015-12-24 | 2016-05-04 | 昌河飞机工业（集团）有限责任公司 | Metal film pressing and grinding device |
| CN106312718A (en) * | 2016-10-30 | 2017-01-11 | 云南蓝晶科技有限公司 | Four-drive two-face chip polishing machine |
| CN207344363U (en) * | 2017-10-03 | 2018-05-11 | 德清晶生光电科技有限公司 | A kind of erratic star wheel available for single side polishing |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107498456B (en) | 2024-06-04 |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
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| GR01 | Patent grant |