CN107453052B - A kind of electromagnetic absorption Meta Materials - Google Patents
A kind of electromagnetic absorption Meta Materials Download PDFInfo
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- CN107453052B CN107453052B CN201710685056.9A CN201710685056A CN107453052B CN 107453052 B CN107453052 B CN 107453052B CN 201710685056 A CN201710685056 A CN 201710685056A CN 107453052 B CN107453052 B CN 107453052B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
- H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
- H01Q15/0086—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices having materials with a synthesized negative refractive index, e.g. metamaterials or left-handed materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
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Abstract
The present invention provides a kind of electromagnetic absorption Meta Materials, its upper surface is in working environment, including periodical resonant element array, electromagnetic absorption Meta Materials upper surface described in the electromagnetic absorption Meta Materials is equipped with one layer of dielectric medium composite film, the film be solid dielectric layer by the material for being superimposed the dielectric medium composite film of different-thickness ratio in silica, silicon nitride, aluminium oxide, magnesium fluoride or silicon at least two.Electromagnetic absorption Meta Materials of the invention are by choosing different types of dielectric film, and they are superimposed according to a certain percentage, dielectric film of the refractive index in choosing medium between maximum and minimum refractive index can be obtained, to realize the more flexible and controllable modulation of lattice surface resonance；Dielectric medium composite film is superposition of the solid dielectric layer in different-thickness ratio, so can almost work under any working environment, the even environment of liquid or movement.
Description
Technical field
The present invention relates to electromagnetic absorption Meta Materials technical fields, more particularly to humorous based on metal local surface plasma
Vibration, the Meta Materials of array arrangement resonant element.
Background technique
Here the absorption characteristic of electromagnetic absorption Meta Materials, is generally made of the resonant element of array arrangement, in visible light
To middle infrared band, resonant element can be made of metallic particles, and the local of metallic particles is mainly utilized in this resonant element
Surface plasma body resonant vibration (Localized Surface Plasmon Resonance, LSPR), also referred to as dipole photon,
Resonance frequency is controlled in which can be convenient by metal particle size.The position at the peak LSPR are as follows:
Wherein D* is particle effective dimensions, ndFor working environment refractive index, ωpFor metal plasma body frequency.
It is intrinsic due to metal however, in these electromagnetic absorption Meta Materials based on metallic particles or metal resonant ring
Loss causes resonance to damp with biggish resonance, causes the halfwidth at the peak LSPR larger, and it is super that this severely limits electromagnetic absorptions
Application of the material in narrowband field.
2004, Shengli Zou of Northwestern Univ USA et al. was theoretically demonstrated: in this periodic arrangement
It resonates the communality formant of small 1~2 magnitude, the formant and array in resonant element there is also a kind of halfwidth ratio LSPR
Period is highly relevant, is referred to as lattice surface resonance (Surface lattice resonance, SLR).Next year, Ta Men
The presence of this formant is confirmed in experiment.
It the position of SLR can be by abnormal (Rayleigh abnormal, the RA) position estimation of Rayleigh.The position at the peak SLR generally goes out
Near present RA, but it cannot fit like a glove with RA again.The position that RA occurs are as follows:
Wherein, n is working environment refractive index；I, j are integer, indicate the different orders of diffraction；Px, Py are the battle array of different directions
Arrange the period.With Rayleigh extremely, the position of SLR depends strongly on array period and working environment refractive index, in addition, it also has
The characteristic of angled dispersion, the i.e. position of SLR are related to light-source angle or detection angle.
SLR has extremely low halfwidth, typically down to a few nanometers to tens of nanometers, can send out in the application scenarios of narrowband
The effect of waving, such as the infrared detector of narrowband.In addition, SLR can also be coupled with LSPR, so that two overlap of peaks, to be used to adjust
The resonance peak type of LSPR is saved, such as obtains asymmetric Fano resonance line style (distinguishing with symmetrical lorentzian curve)；Or
While keeping LSPR items advantage, the halfwidth of LSPR is further decreased, for example, 2008, Harvard University
Two-dimensional gold array of particles is produced on ITO material by Yizhuo Chu et al., and designs different array periods, by the position of SLR
The position for being slowly moved to LSPR is set, SLR is coupled with LSPR, as a result will be reduced to by combined resonance peak width
26.6nm, in contrast, the sample for not utilizing SLR to couple, LSPR halfwidth is 311.6nm.
There are no the narrow-band light sources or narrowband absorbers that directly utilize spectral characteristic of the SLR in far field to realize at this stage
Part is still in conceptual phase.The main problem encountered in the application of the far field of SLR is that the observation of current SLR needs to meet uniformly
Media environment and the height consistent period.Wherein, media environment, which refers to, is close to resonant element or more possessed by device itself
The environment (not working environment) on surface, the refractive index of resonant element upper and lower surface is not identical to may cause the strong of SLR formant
Degree becomes very faint, and broadens increase；The intensity of SLR formant is also highly susceptible to the influence of array consistency, array
The inconsistent and resonant element in period it is inconsistent, all may cause same problem.These all limit SLR in far-field optics
Practical application.
In order to guarantee the uniformity of media environment, the work of above-mentioned Yizhuo Chu et al. has just used high-precision electronics
Beam exposure, meanwhile, relatively uniform media environment is obtained using " water " in array upper surface.In addition, 2010, Ronen
Adato et al. proposes a kind of structure for being embedded in resonant element, i.e., digs groove in substrate first, be then produced on resonant element recessed
In slot, resonant element is embedded into substrate, in this way it can be considered that resonant element upper and lower surface is in this uniform Jie of substrate
In matter environment, to realize relatively uniform media environment.
But, high precision electro beamlet exposure technique, or manufacture groove are introduced, device fabrication difficulty can be all obviously increased,
Manufacturing cost is undoubtedly also increased, and limits the application of SLR.In addition, liquid matching layer can also be added to the resonance list
The upper surface of meta structure is to realize the observation of SLR.2013, Andrey G.Nikitin et al. discovery, SLR can be in resonance list
Observation is realized in first non-uniform media environment of upper and lower surface.Resonant element is done (n=1.5) on a glass substrate by they, point
It not compared the case where three kinds of glycerine (n=1.47), water (n=1.33) and air (n=1) layer liquids are as upper surface, tie
Fruit still observed SLR to the shadow of LSPR in the non-uniform media environment of resonant element upper and lower surface (such as water and air)
It rings.But since SLR is a kind of crystalline surface resonance, when using liquid matching layer, resonance peak is highly susceptible to liquid
The influence of matching layer thickness, and in practical applications, SLR intensity is weaker when liquid matching layer uniformity difference, and liquid matching layer
Thickness and uniformity and bad control, this results in the position of SLR to become uncertain；In addition, if device work is in liquid
In state or movement working environment, this liquid matching layer just cannot play a role.
SEYED M.SADEGHI in 2016 et al. discovery, near infrared band, using the Si film of tens nano thickness,
SLR intensity can equally be effectively enhanced.This method does not need to reach using very thick layer liquid (or liquid+medium block)
The close effect of the refractive index of media of both sides above and below array, but Jie for directly adding dielectric film, and being covered above array
Matter is not and the refractive index of lower dielectric is close, therefore no longer needs to realize index matching.But this method is due to using
The modulation capability of silicon thin film is limited, and in different operating environments, silicon thin film may not be able to get a desired effect.For example, working as
When working environment refractive index locating for device is much larger than the refractive index of silicon.
Summary of the invention
The present invention is intended to provide a kind of electromagnetic absorption Meta Materials, to realize the flexible tune to its lattice surface resonance (SLR)
System, and enhance it to working environment adaptability.
To achieve the goals above, the present invention provides a kind of electromagnetic absorption Meta Materials, upper surface is in working environment
In, including periodical resonant element array, which is characterized in that electromagnetic absorption Meta Materials upper surface is equipped with one layer of dielectric complex
Film is closed, which is the solid dielectric layer of multiple layers of different materials in the superposition of different-thickness ratio.
The material of the dielectric medium composite film in silica, silicon nitride, aluminium oxide, magnesium fluoride or silicon at least two
Kind.
The dielectric medium composite film is deposited by using SEMICONDUCTING THIN FILM TECHNOLOGY on electromagnetic absorption Meta Materials surface, should
SEMICONDUCTING THIN FILM TECHNOLOGY includes CVD, PVD or ALD.
The dielectric medium composite film gives to the lattice surface resonant position of the electromagnetic absorption Meta Materials and to SLR intensity
Modulation.
The dielectric medium composite film includes making the position of SLR at shortwave to the intensity modulated of the electromagnetic absorption Meta Materials
Mobile or SLR remitted its fury, for the equivalent refractive index of the dielectric medium composite film is set smaller than working environment refraction
Rate.
The dielectric medium composite film includes making the position of SLR at long wave to the intensity modulated of the electromagnetic absorption Meta Materials
Mobile or SLR enhanced strength, for the equivalent refractive index of the dielectric medium composite film is set greater than working environment refraction
Rate.
The equivalent refractive index n of the dielectric medium composite film (3)effAre as follows:
Wherein, N is the number of plies of dielectric medium composite film, and ni is i-th layer of medium refraction index, and hi is i-th layer of dielectric thickness, h
For composite membrane overall thickness.
The difference of the thickness of the dielectric medium composite film or the equivalent refractive index of thin dielectric film and working environment refractive index
Away from directly proportional to modulation effect, and film thickness needed for modulation effect identical as realization is inversely proportional.
The resonant element of the resonant element array (23) is the resonant element based on LSPR or LC resonance.
The dielectric medium composite film passes through CVD, PVD or ALD preparation in semiconductor technology.
Electromagnetic absorption Meta Materials provided by the invention, which pass through, chooses different types of dielectric film, and them according to certain
Ratio superposition can obtain dielectric film of the refractive index in choosing medium between maximum and minimum refractive index, thus by changing
The difference of the film thickness of variable dielectric laminated film and the equivalent refractive index of thin dielectric film and working environment refractive index is real
The more flexible and controllable modulation of existing SLR；Replace existing liquid matching layer with surface dielectric laminated film enhancing or
The SLR of the Meta Materials is modulated, does not consider the problems of that the index matching of existing liquid matching layer, dielectric medium composite film are solid
State dielectric layer in different-thickness ratio superposition, so can almost work under any working environment, even liquid or
The working environment of movement.In addition, dielectric medium composite film thickness in several 100 nanometer level, can be easy to pass through semiconductor technology
Deposition gets on, simple for production.
Detailed description of the invention
Fig. 1 is the structural representation of the electromagnetic absorption Meta Materials according to an embodiment of the invention with laminated film
Figure；
Fig. 2 is the cross-sectional view of electromagnetic absorption Meta Materials as shown in Figure 1；
Fig. 3 is the cross-sectional view of the electromagnetic absorption Meta Materials with laminated film according to another embodiment of the invention；
Fig. 4 is electromagnetic absorption Meta Materials as shown in Figure 1, and laminated film has the reflected light in the case of different-thickness
Spectrum, wherein dielectric medium composite film equivalent refractive index is 1；
Fig. 5 is electromagnetic absorption Meta Materials as shown in Figure 1, and laminated film has the reflected light in the case of different-thickness
Spectrum, wherein dielectric medium composite film equivalent refractive index is 1.4；
Fig. 6 is electromagnetic absorption Meta Materials as shown in Figure 1, and laminated film has the reflected light in the case of different-thickness
Spectrum, wherein dielectric medium composite film equivalent refractive index is 1.6；
Appended drawing reference
1- general substrate；21- metallic film；22- intermediate isolating dielectric layer；23- periodicity resonant element array；
3- dielectric medium composite film；101- light-transmissive substrates
Specific embodiment
With reference to the accompanying drawing, presently preferred embodiments of the present invention is provided, and is described in detail.
It is electromagnetic absorption Meta Materials according to an embodiment of the invention as depicted in figs. 1 and 2, which is one kind
Non-transparent formula Meta Materials 2 on substrate 1, the Meta Materials 2 are made by metal-dielectric-metal trilaminate material, are specifically included
Continuous metallic film 21, continuous intermediate isolating dielectric layer 22 and the periodical resonant element array being sequentially overlapped from top to bottom
23.The upper surface of the Meta Materials 2 is in working environment, and its upper surface is glued with one layer of dielectric medium composite film 3, for adjusting
Make the lattice surface resonance (SLR) of the Meta Materials.
Wherein, which is the metal resonant element based on local surface plasma resonance (LSPR)；The electricity is situated between
Matter laminated film 3 is that the solid dielectric layer of multiple layers of different materials such as silica, silicon nitride, aluminium oxide, magnesium fluoride or silicon is pressed
The superposition of different-thickness ratio.Since this dielectric medium composite film 3 is the compound of multiple material, for example, the silica of 100nm
The silicon nitride of the silica+50nm of the silicon nitride or 150nm of+100nm, even 50nm silica+50nm silicon nitride+
50nm aluminium oxide etc..Due to combining form multiplicity, thickness proportion multiplicity, so referred to herein as dielectric medium composite film.Electricity
Complex thin film 3 passes through chemical vapor deposition (CVD), physical vapour deposition (PVD) (PVD) or the atomic layer deposition in semiconductor technology
Product (ALD) deposits on Meta Materials surface.The overall thickness of dielectric medium composite film 3 studied at present 100nm-400nm it
Between, it can be easy to deposit up by semiconductor technology, it is simple for production.
The equivalent refractive index n of the thin dielectric film 3effIt can be calculate by the following formula:
Wherein, N is the number of plies of dielectric medium composite film 3, niFor the refractive index of i-th layer of solid dielectric layer, hiIt is i-th layer
The thickness of solid dielectric layer, h are the overall thickness of dielectric medium composite film 3.Therefore, if ignoring the Extinction Characteristic of material, folding
The refractive index for penetrating the highest material of rate is high-n, and the refractive index of the minimum material of refractive index is low-n, by controlling dielectric
The thickness accounting of different materials film layer in film 3 can linearly control the equivalent optical parameter n of thin dielectric film 3eff, make
It is in high-n to linear regulation between low-n, to meet the needs of different operating environment.By choosing different types of Jie
Matter film, and they are superimposed according to a certain percentage, can obtain refractive index in choosing medium it is maximum with minimum refractive index it
Between dielectric film.
In the application, the equivalent refractive index n of thin dielectric film 3effModulating action is played to SLR, the modulation includes pair
The modulation of the position SLR and modulation to SLR intensity.
It is in electromagnetic absorption Meta Materials as shown in Figure 1, under different 3 depth informations of thin dielectric film such as Fig. 4-6
The simulation result of reflectance spectrum.The specifically used FDTD software of the simulation result is emulated.Wherein, the metallic film in Fig. 4-6
23 be the uniform golden film of 100nm thickness, drives skin depth since thickness is greater than, does not transmit, do not consider substrate material thus；It is intermediate
Spacer medium layer 22 is customized material thickness 180nm, and refractive index real part is 1.2, extinction coefficient zero；Periodical resonant element
The shape of the resonant element of array 23 is that radius is 1.5 μm, the cylinder of high 100nm, and material is gold, with square spread pattern, row
The column period is all 5 μm in both direction.Fig. 4-6 assumes that working environment refractive index is 1.2, i.e., entire device and light source are all
In the working environment that refractive index is 1.2.Thin dielectric film 3 is indicated using one layer of customized dielectric film in emulation,
Film refractive index real part n takes 1,1.4,1.6 respectively, ignores delustring k, and different curves represents the thin of different-thickness in each figure
Film.Such as the 97nm in Fig. 4 refers to that the thin dielectric film 3 in Fig. 2 be a layer thickness is 97nm, refractive index n=1, extinction coefficient k
=0 customized film.
The reflection position paddy, that is, SLR in Fig. 4,5,6.By Fig. 4-6 it is found that if the equivalent refractive index of thin dielectric film 3
neffLess than working environment refractive index, then super material of the Meta Materials of the thin dielectric film 3 relative to no thin dielectric film 3 is had
Material, the position of SLR is to mobile and SLR remitted its fury at shortwave；If the equivalent refractive index n of thin dielectric film 3effGreater than work
Make ambient refractive index, then Meta Materials of the Meta Materials with the thin dielectric film 3 relative to no thin dielectric film 3, SLR's
Position is to mobile and SLR enhanced strength at long wave.In addition, in the case where other conditions are constant, by control film thickness with
And the difference of the equivalent refractive index of thin dielectric film 3 and working environment refractive index, the modulation of varying strength may be implemented, that is, realize
The position of SLR and the flexible of intensity and controllable modulation.The equivalent refractive index and working environment of film thickness or thin dielectric film 3
The gap of refractive index is bigger, and modulation effect is more obvious.Using composite membrane refractive index with working environment refringence away from bigger, realization
Film thickness needed for identical modulation effect is lower.That is, the thickness or thin dielectric film of the dielectric medium composite film
Equivalent refractive index is directlyed proportional to the difference of working environment refractive index to modulation effect, and film needed for modulation effect identical as realization
Thickness is inversely proportional.
According to another embodiment of the invention, as shown in figure 3, the Meta Materials 2 or one kind are set to light-transmissive substrates
Nonopaque type electromagnetic absorption Meta Materials on 101, specifically include periodical resonant element array 23, and resonant element is based on local table
Surface plasma resonance (LSPR).In addition, the Meta Materials 2 can be other Meta Materials with periodical resonant element array,
Resonant element can be based on LSPR or LC resonance.
Above-described, only presently preferred embodiments of the present invention, the range being not intended to limit the invention, of the invention is upper
Stating embodiment can also make a variety of changes.Made by i.e. all claims applied according to the present invention and description
Simply, equivalent changes and modifications fall within the claims of the invention patent.The not detailed description of the present invention is
Routine techniques content.
Claims (8)
1. a kind of electromagnetic absorption Meta Materials, upper surface is in working environment, and the electromagnetic absorption Meta Materials (2) are by metal-
The production of dielectric-metallic trilaminate material, or be a kind of Nonopaque type electromagnetic absorption Meta Materials being set on light-transmissive substrates (101),
It includes periodical resonant element array (23), which is characterized in that electromagnetic absorption Meta Materials (2) upper surface is equipped with one layer of electricity
Complex thin film (3), the dielectric medium composite film (3) are the solid dielectric layer of multiple layers of different materials in different-thickness ratio
Superposition, the material of the dielectric medium composite film (3) in silica, silicon nitride, aluminium oxide, magnesium fluoride or silicon at least
Two kinds；The dielectric medium composite film (3) is to the lattice surface resonant position of the electromagnetic absorption Meta Materials (2) and to lattice surface
The strength of resonance is modulated, and is reflected by the equivalent refractive index and working environment of control film thickness and thin dielectric film (3)
The difference of rate, to realize the modulation of varying strength.
2. electromagnetic absorption Meta Materials according to claim 1, which is characterized in that the dielectric medium composite film (3) passes through
Using SEMICONDUCTING THIN FILM TECHNOLOGY, deposited on electromagnetic absorption Meta Materials surface.
3. electromagnetic absorption Meta Materials according to claim 2, which is characterized in that the SEMICONDUCTING THIN FILM TECHNOLOGY include CVD,
PVD or ALD.
4. electromagnetic absorption Meta Materials according to claim 1, which is characterized in that the modulation includes that lattice surface is made to resonate
Position weaken to the mobile or lattice surface strength of resonance at shortwave, by the equivalent refraction of the dielectric medium composite film (3)
Rate is set smaller than working environment refractive index.
5. electromagnetic absorption Meta Materials according to claim 1, which is characterized in that the modulation includes that lattice surface is made to resonate
Position to mobile or lattice surface strength of resonance enhancing at long wave, by the equivalent refraction of the dielectric medium composite film (3)
Rate is set greater than working environment refractive index.
6. electromagnetic absorption Meta Materials according to claim 4 or 5, which is characterized in that the dielectric medium composite film (3)
Equivalent refractive index neffAre as follows:
Wherein, N is the number of plies of dielectric medium composite film (3), and ni is i-th layer of medium refraction index, and hi is i-th layer of dielectric thickness, and h is
Dielectric medium composite film overall thickness.
7. electromagnetic absorption Meta Materials according to claim 4 or 5, which is characterized in that the dielectric medium composite film (3)
The gap and modulation effect of the equivalent refractive index of film thickness or dielectric medium composite film (3) and working environment refractive index are at just
Than, and film thickness needed for modulation effect identical as realization is inversely proportional.
8. electromagnetic absorption Meta Materials according to claim 1, which is characterized in that the periodicity resonant element array (23)
Resonant element be the resonant element based on LSPR or LC resonance.
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| PCT/CN2018/086649 WO2019029207A1 (en) | 2017-08-11 | 2018-05-14 | Electromagnetic absorption metamateria |
| US16/638,070 US20200174166A1 (en) | 2017-08-11 | 2018-05-14 | Electromagnetic Absorption Metamaterial |
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| WO2019029207A1 (en) * | 2017-08-11 | 2019-02-14 | 中国科学院上海微***与信息技术研究所 | Electromagnetic absorption metamateria |
| CN108051408B (en) * | 2018-01-04 | 2024-03-22 | 中国计量大学 | Graphene-based double-layer coupling type Fano resonance sensor |
| CN108598702B (en) * | 2018-04-23 | 2020-12-08 | 中国电子科技集团公司第二十九研究所 | Ultra-wideband low-profile antenna array structure |
| CN109256620B (en) * | 2018-08-21 | 2021-01-12 | 四川大学 | Terahertz broadband negative refractive index metamaterial structure based on dynamic regulation and control of equivalent energy level |
| CN110320579A (en) * | 2019-06-14 | 2019-10-11 | 太原理工大学 | A kind of cone cell hyperbolic Meta Materials photon structure and preparation method thereof |
| CN110888189B (en) * | 2019-12-16 | 2022-04-22 | 桂林电子科技大学 | Ultrathin substrate-free color tunable surface plasma filter |
| CN113140640B (en) * | 2021-04-16 | 2022-11-29 | 中国科学院上海微***与信息技术研究所 | Efficient back reflection crystalline silicon heterojunction solar cell and preparation method thereof |
| CN113964513B (en) * | 2021-10-25 | 2024-01-26 | 国网天津市电力公司电力科学研究院 | Wireless communication microwave antenna and forming method thereof |
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