CN107450282A - A kind of hyperfine nanometer line glass mold preparation method - Google Patents
A kind of hyperfine nanometer line glass mold preparation method Download PDFInfo
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- CN107450282A CN107450282A CN201710825833.5A CN201710825833A CN107450282A CN 107450282 A CN107450282 A CN 107450282A CN 201710825833 A CN201710825833 A CN 201710825833A CN 107450282 A CN107450282 A CN 107450282A
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- China
- Prior art keywords
- transparent base
- glass mold
- nanometer line
- mold preparation
- photoresist
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses a kind of hyperfine nanometer line glass mold preparation method, it includes having the following steps：Step S1, prepare transparent base, prepare the masterplate for forming fine textures；Step S2, photoresist is coated with transparent substrate surface using coating apparatus；Step S3, transparent base is toasted using drying plant；Step S4, template is stacked on the photoresist glue-line of transparent base, processing is exposed using exposure sources；Step S5, the transparent base after exposure is positioned in developing machine and is developed and be fixed processing；Step S6, the transparent base after fixing is cleaned, drying process.The present invention has the characteristics that high in machining efficiency, high yield rate, technique are simple, is easily achieved.
Description
Technical field
The present invention relates to die processing method, more particularly to a kind of hyperfine nanometer line glass mold preparation method.
Background technology
In the prior art, required lines or pattern are molded on the glass surface, be generally all using machinery carving
Carve or common engraving method is molded, such as laser engraving machine plant equipment, using above-mentioned mechanical and method on the glass surface
Lines and pattern required for molding have the disadvantage that:It is machined and the thickness of glass is required, the lines being molded
Or pattern is very coarse, appearance is poor, low production efficiency.In order to solve the above problems, occur in the prior art based on impressing
With the production method of photo-curable mode, but this method needs to rely on the template with fine textures, and in the prior art
Lack a kind of hyperfine glass mold that can improve processing efficiency, yield rate.
The content of the invention
The technical problem to be solved in the present invention is, in view of the shortcomings of the prior art, there is provided a kind of high in machining efficiency, finished product
The hyperfine nanometer line glass mold preparation method that rate is high, is easily achieved.
In order to solve the above technical problems, the present invention adopts the following technical scheme that.
A kind of hyperfine nanometer line glass mold preparation method, it includes having the following steps：Step S1, prepare transparent base
Material, prepare the masterplate for forming fine textures；Step S2, photoresist is coated with transparent substrate surface using coating apparatus；Step
Rapid S3, transparent base is toasted using drying plant；Step S4, template is stacked in the photoresist glue-line of transparent base
On, it is exposed processing using exposure sources；Step S5, the transparent base after exposure is positioned in developing machine carry out development and
Fixing processing；Step S6, the transparent base after fixing is cleaned, drying process.
Preferably, the exposure sources in the step S4 are uv exposure box.
Preferably, the photoresist in the step S2 is water-soluble agents.
Preferably, the baking temperature in the step S3 is 80 DEG C, and baking time is 10 minutes.
Preferably, in the step S6, transparent base is cleaned using ultrasonic cleaning apparatus.
In hyperfine nanometer line glass mold preparation method disclosed by the invention, first with computer, laser platemaker etc.
Equipment prepares template, template is covered in into the side that transparent base is coated with photoresist, by developing and being fixed transparent base
It is upper to form hyperfine textured pattern, its compared with prior art it is middle by the way of the mechanical engraving for, substantially increase processing
Efficiency and finished product yield, meanwhile, present invention process is simple, is easily achieved, and is adapted to popularization and application in the art.
Brief description of the drawings
Fig. 1 is the flow chart of the hyperfine nanometer line glass mold preparation method of the present invention.
Embodiment
The present invention is described in more detail with reference to the accompanying drawings and examples.
The invention discloses a kind of hyperfine nanometer line glass mold preparation method, Fig. 1 is refer to, it includes following step
Suddenly：
Step S1, prepare transparent base, prepare the masterplate for forming fine textures；
Step S2, photoresist is coated with transparent substrate surface using coating apparatus；
Step S3, transparent base is toasted using drying plant；
Step S4, template is stacked on the photoresist glue-line of transparent base, processing is exposed using exposure sources；
Step S5, the transparent base after exposure is positioned in developing machine and is developed and be fixed processing；
Step S6, the transparent base after fixing is cleaned, drying process.
In the above method, template is prepared first with equipment such as computer, laser platemakers, template is covered in transparent base
The side of photoresist is coated with, hyperfine textured pattern is formed on transparent base by developing and being fixed, it is compared to existing
In technology by the way of the mechanical engraving for, substantially increase processing efficiency and finished product yield, meanwhile, present invention process letter
List, it is easily achieved, is adapted to popularization and application in the art.
In the present embodiment, the exposure sources in the step S4 are uv exposure box.
Further, the photoresist in the step S2 is water-soluble agents.
As a kind of preferred embodiment, the baking temperature in the step S3 is 80 DEG C, and baking time is 10 minutes.
In the present embodiment, in the step S6, transparent base is cleaned using ultrasonic cleaning apparatus.
The specific implementation process of the present invention refers to following examples：
1st, gluing, realized using spin coating mode, one of technical requirements are：Thickness and uniform film thickness, for
Photoresist viscosity, different thickness need to use the photoresistance of different viscosities, and rotary speed/time, glue amount can also directly influence
Thickness and its uniformity；Another technical requirements is：The defects of adhesive force good free from admixture, to ensure that glass raw material is clean during processing
Cleanliness, dry tack free, and workshop condition cleanliness factor, dispensing gimmick etc. will also result in impurity defect.Under photoresistance viscosity same case,
Influence of the rotary speed/time to thickness and its uniformity refer to following table：
2nd, it is pre-baked, it is desirable to remove solvent (4%-7%), strengthen adhesion, discharge photoresist film internal stress, organize photoresist
Stain equipment/mask plate etc..First, if pre-baked deficiency, solvent can not be volatilized in time, and subregion is dissolved during development, if
Baking time is long, and glued membrane warpage hardening, the photobehavior of glue can change；Secondly, solvent can absorb light, polymerize in interference exposure
The chemical reaction of thing；In addition, it is desirable to improve the uniformity of gluing, the control ability of raising figure wire frame and improve anticorrosive energy
Power.
3rd, in step of exposure, mask plate and glue-line are exposed, by pattern transfer to glued membrane, realize graph copying.
Influenceing the factor of exposure includes：Film thickness is uneven and the film/mask plate influences directly to caused by exposure figure quality.
4th, in development step, development abnormal conditions include：Development is incomplete, surface glued membrane residual：Developer solution deficiency/development
Time deficiency/solution level is abnormal；Development is inadequate：The side wall out of plumb of development, formed by developing time deficiency；It is excessively aobvious
Shadow, lines broken string, away from tooth, developing time it is oversize according into.
5th, admittedly roasting step includes：The solvent and water of residual are removed, improves the performance such as stability, adhesive force of film structure.
Simply preferred embodiments of the present invention described above, are not intended to limit the invention, all technology models in the present invention
Interior done modification, equivalent substitution or improvement etc. are enclosed, should be included in the range of of the invention protect.
Claims (5)
1. a kind of hyperfine nanometer line glass mold preparation method, it is characterised in that including having the following steps：
Step S1, prepare transparent base, prepare the masterplate for forming fine textures；
Step S2, photoresist is coated with transparent substrate surface using coating apparatus；
Step S3, transparent base is toasted using drying plant；
Step S4, template is stacked on the photoresist glue-line of transparent base, processing is exposed using exposure sources；
Step S5, the transparent base after exposure is positioned in developing machine and is developed and be fixed processing；
Step S6, the transparent base after fixing is cleaned, drying process.
2. hyperfine nanometer line glass mold preparation method as claimed in claim 1, it is characterised in that in the step S4
Exposure sources are uv exposure box.
3. hyperfine nanometer line glass mold preparation method as claimed in claim 1, it is characterised in that in the step S2
Photoresist is water-soluble agents.
4. hyperfine nanometer line glass mold preparation method as claimed in claim 1, it is characterised in that in the step S3
Baking temperature is 80 DEG C, and baking time is 10 minutes.
5. hyperfine nanometer line glass mold preparation method as claimed in claim 1, it is characterised in that in the step S6,
Transparent base is cleaned using ultrasonic cleaning apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710825833.5A CN107450282A (en) | 2017-09-14 | 2017-09-14 | A kind of hyperfine nanometer line glass mold preparation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710825833.5A CN107450282A (en) | 2017-09-14 | 2017-09-14 | A kind of hyperfine nanometer line glass mold preparation method |
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| Publication Number | Publication Date |
|---|---|
| CN107450282A true CN107450282A (en) | 2017-12-08 |
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| CN201710825833.5A Pending CN107450282A (en) | 2017-09-14 | 2017-09-14 | A kind of hyperfine nanometer line glass mold preparation method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109465992A (en) * | 2018-11-22 | 2019-03-15 | 宁波微迅新材料科技有限公司 | The preparation method of 3D nanometers of texture molds of multichannel |
| CN112321168A (en) * | 2020-10-19 | 2021-02-05 | 武汉金鸿桦烨电子科技有限公司 | Processing method for forming precise optical grains on glass surface |
-
2017
- 2017-09-14 CN CN201710825833.5A patent/CN107450282A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109465992A (en) * | 2018-11-22 | 2019-03-15 | 宁波微迅新材料科技有限公司 | The preparation method of 3D nanometers of texture molds of multichannel |
| CN112321168A (en) * | 2020-10-19 | 2021-02-05 | 武汉金鸿桦烨电子科技有限公司 | Processing method for forming precise optical grains on glass surface |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 518000 workshop No. 12 of the third industrial district of Gongming Xia Village community, Guangming New Area, Shenzhen, Guangdong Applicant after: Shenzhen City Kam Tin materials Limited by Share Ltd Address before: 518000 workshop No. 15 of the third industrial district of Gongming Xia Village community, Guangming New Area, Shenzhen, Guangdong Applicant before: Shenzhen City Kam Tin materials Limited by Share Ltd |
|
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20171208 |