CN107435148A - Apparatus and method for etching a continuous product - Google Patents
Apparatus and method for etching a continuous product Download PDFInfo
- Publication number
- CN107435148A CN107435148A CN201710669517.3A CN201710669517A CN107435148A CN 107435148 A CN107435148 A CN 107435148A CN 201710669517 A CN201710669517 A CN 201710669517A CN 107435148 A CN107435148 A CN 107435148A
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- Prior art keywords
- etching
- liquid medicine
- equipment
- continuous product
- continuous
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
Abstract
The invention provides an apparatus for etching a continuous product comprising a continuous substrate and graphene grown on the substrate, the apparatus comprising: a feeding device for feeding the continuous product; and the etching device is arranged at the downstream of the feeding device and used for receiving the continuous product, the etching device contains etching liquid medicine, and when the continuous product passes through the etching device, the etching liquid medicine removes the continuous substrate. The invention also provides a method of etching a continuous product comprising a continuous substrate and graphene grown on the substrate, the method comprising: feeding the continuous product comprising a continuous substrate and graphene through an etching bath to remove the substrate on the continuous product.
Description
Technical field
The present invention relates to graphene to fabricate field, more particularly to the metallic substrates that a kind of growth thereon has graphene are carved
The apparatus and method of erosion.
Background technology
During graphene film is manufactured, it is necessary first to graphene film is grown on the metallic substrate, then will be raw
Metallic substrates with graphene film are manually immersed in etching liquid medicine, and metallic substrates are etched away, leave graphene
Film.Following defect be present in this manual manipulation mode.
First point is that manually operated comparison is frequent, and feeding is enclosed on manually on glass framework by personnel, then places into flower
In basket, then the gaily decorated basket is put into by manipulator and etches the regular hour in liquid medicine, then put forward from etching liquid medicine, then placed into
The rinsing bowl regular hour, then put forward from rinsing bowl, then manually clean again, place into horizontal apparatus for drying, then
By manually removing, it is placed on layer car, whole process is, it is necessary to multiple manual working, it is also desirable to more operating personnel, Ren Yuancheng
This height；
When second point is that product etches in etching groove, multi-disc (such as 20) etches together, at present the liquid medicine stream of equipment
Dynamic is to circulate, and does not design jet pipe and nozzle, liquid medicine can not be uniformly flow to above the copper face of 20 flake products, copper foil
Etching and doping are uneven, with the upgrading of product, to the uniformity meeting more and more higher of graphene film product resistance, original
The product of the mode of production production of immersion type can not gradually meet the needs in market, and function caused by personnel's manual working and
The bad contribution of outward appearance is very high always.
Therefore, exist in the related art for the demand for the etching apparatus that can be worked continuously.
Above content is only the technical situation that inventor is known, natural representative does not form the prior art of the present invention.
The content of the invention
To solve one or more of problem of the prior art, the present invention provides a kind of for etching setting for continuous product
Standby, the continuous product includes continuous substrate and the graphene being grown in the continuous substrate, and the equipment includes：Feed fills
Put, for continuous product described in continuously feed；Etching device, the downstream of the feeder is arranged on, it is described for receiving
Continuous product, wherein the etching device accommodates etching liquid medicine, it is described when the continuous product passes through the etching device
Etching device will etch liquid medicine and be applied on the continuous product so that the continuous substrate to be removed.
According to an aspect of the present invention, the equipment also includes the water washing device positioned at the etching device downstream and position
Drying device in the water washing device downstream.
According to an aspect of the present invention, the rolling rewinding that the equipment is also included positioned at the drying device downstream fills
Put.
According to an aspect of the present invention, the feeder is rolling discharging device, and the rolling discharging device includes
Blowing spool.
According to an aspect of the present invention, the equipment also includes：It is arranged on the drying device and the rolling rewinding
Automatic deviation correction alignment device device between device.
According to an aspect of the present invention, the equipment includes one or more sensors, for detecting the etching medicine
One or more parameters of water.
According to an aspect of the present invention, the equipment also includes adjusting means, the adjusting means with it is one or
Multiple sensor couplings, according to the testing result of one or more of sensors, by the one or more of the etching liquid medicine
Parameter regulation is to default scope.
According to an aspect of the present invention, it is dense to include electrical conductivity, electrode potential, proportion, acidity, hydrogen peroxide for the parameter
It is one or more in degree, copper ion concentration.
According to an aspect of the present invention, the etching device includes shower nozzle, and the sprinkler configuration is into by the etching medicine
Water is ejected into through on the continuous product of the etching device, to remove the substrate.
According to an aspect of the present invention, the etching device includes temperature control equipment, the temperature control equipment bag
Include temperature sensor, heater, frozen water pipeline and controller, the temperature of the temperature sensor detection etching liquid medicine, institute
State controller to couple with the temperature sensor, heater, and control the break-make of the frozen water pipeline and the unlatching of heater, from
And when the temperature of the etching liquid medicine is less than predetermined threshold value, the controller starts the heater to improve the etching medicine
The temperature of water, when the temperature of the etching liquid medicine is higher than the predetermined threshold value, the controller opens the frozen water pipeline, with
Reduce the temperature of the etching liquid medicine.
According to an aspect of the present invention, the automatic deviation correction alignment device includes photoelectric sensor and motor, the light
The edge of the electric inductor sensing continuous product, the motor couple with the photoelectric sensor, and according to the light inductance
Answer the position for described in the signal adjustment of device, adjusting rolling material collecting device.
The present invention also provides a kind of method for etching continuous product, and the continuous product includes continuous substrate and is grown in
Graphene in the substrate, methods described include：The continuous product feed including continuous substrate and graphene is passed through
Liquid medicine is etched, to remove the substrate on the continuous product.
According to an aspect of the present invention, this method also includes：After the continuous product is by etching liquid medicine, to described
Continuous product is washed and dried.
According to an aspect of the present invention, this method also includes：After to the continuous product drying, to described continuous
Product carries out rolling rewinding.
According to an aspect of the present invention, this method also includes：After the continuous product is dried, in rolling
Before rewinding, edge contraposition is carried out to the continuous product.
According to an aspect of the present invention, this method also includes：One or more parameters of the etching liquid medicine are monitored, when
When one or more parameters exceed default scope, one or more parameters of the etching liquid medicine are adjusted.
According to an aspect of the present invention, this method is implemented by equipment of the present invention.
Brief description of the drawings
Accompanying drawing is used for providing a further understanding of the present invention, and a part for constitution instruction, the reality with the present invention
Apply example to be used to explain the present invention together, be not construed as limiting the invention.In the accompanying drawings：
Fig. 1 shows lithographic method according to a first embodiment of the present invention；
Fig. 2 shows etching apparatus according to a second embodiment of the present invention；
Fig. 3 is adjusting means according to an embodiment of the invention；
Fig. 4 is temperature control according to an embodiment of the invention；With
Fig. 5 is the schematic diagram according to automatic deviation correction alignment device of the present invention.
Embodiment
Hereinafter, some exemplary embodiments are simply just described.As one skilled in the art will recognize that
Like that, without departing from the spirit or scope of the present invention, described embodiment can be changed by various different modes.
Therefore, accompanying drawing and description are considered essentially illustrative rather than restrictive.
In the description of the invention, it is to be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width
Degree ", " thickness ", " go up ", " under ", " preceding ", " afterwards ", " left side ", " right side ", " heavily fortified point, and directly ", " level ", " top ", " bottom ", " is interior ", " outside ", "
Clockwise the orientation of the instruction such as ", " counterclockwise " or position relationship be based on orientation shown in the drawings or position relationship, merely to
Be easy to the description present invention and simplify description, rather than instruction or imply signified device or element must have specific orientation,
With specific azimuth configuration and operation, therefore it is not considered as limiting the invention.In addition, term " first ", " second " are only
For descriptive purposes, and it is not intended that instruction or hint relative importance or the implicit number for indicating indicated technical characteristic
Amount.Thus, " first " is defined, the feature of " second " can be expressed or implicitly includes one or more spy
Sign.In the description of the invention, " multiple " are meant that two or more, unless otherwise specifically defined.
In the description of the invention, it is necessary to illustrate, unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or be integrally connected:Can
To be mechanical connection or electrical connection or can mutually communicate；Can be joined directly together, can also be by between intermediary
Connect connected, can be connection or the interaction relationship of two elements of two element internals.For the ordinary skill of this area
For personnel, the concrete meaning of above-mentioned term in the present invention can be understood as the case may be.
In the present invention, unless otherwise clearly defined and limited, fisrt feature second feature its " upper " or it " under "
Can directly it be contacted including the first and second features, it is not directly to contact but pass through it that can also include the first and second features
Between other characterisation contact.Moreover, fisrt feature second feature " on ", " top " and " above " include first spy
Sign is directly over second feature and oblique upper, or is merely representative of fisrt feature level height and is higher than second feature.Fisrt feature exists
Second feature " under ", " lower section " and it is " following " including fisrt feature directly over second feature and oblique upper, or be merely representative of
Fisrt feature level height is less than second feature.
Following disclosure provides many different embodiments or example is used for realizing the different structure of the present invention.In order to
Simplify disclosure of the invention, hereinafter the part and setting of specific examples are described.Certainly, they are only example, and
And purpose does not lie in the limitation present invention.In addition, the present invention can in different examples repeat reference numerals and/or reference letter,
This repetition is for purposes of simplicity and clarity, between itself not indicating discussed various embodiments and/or setting
Relation.In addition, the invention provides various specific techniques and material examples, but those of ordinary skill in the art can be with
Recognize the application of other techniques and/or the use of other materials.
The preferred embodiments of the present invention are illustrated below in conjunction with accompanying drawing, it will be appreciated that described herein preferred real
Apply example to be merely to illustrate and explain the present invention, be not intended to limit the present invention.
The method that the metallic substrates of graphene are etched relative to the manual mode of prior art, the first embodiment of the present invention
A kind of new lithographic method worked continuously is provided, so as to significantly increase operating efficiency.Retouched below with reference to Fig. 1 and Fig. 2
State the lithographic method according to first embodiment of the invention.
As shown in figure 1, the present invention lithographic method be applicable to etch continuous product, the continuous product for example including
Continuous metallic substrates (or metal foil, copper foil) and the graphene or graphene film that are grown in the metallic substrates.
By the way that metallic substrates are etched away, graphene or graphene film thereon can be obtained.
This method includes：First, feed continuous product.The continuous product can provide in several ways,
Such as can be the metal foil on spool, by laying out metal foil and feed, such as can come from upstream work
The continuous metal paper tinsel of sequence.Shown in Fig. 1 and the continuous product is supplied by way of rolling blowing, but the invention is not restricted to
This.
Then the continuous product of feed performs etching, to remove metallic substrates therein.The lithographic method of the present invention is unlimited
In specific etching technics and etching device, as long as it disclosure satisfy that the process requirements for removing metallic substrates.Such as can be with
So that the continuous product is advanced through in etching liquid medicine, or during continuous product is advanced, it will constantly etch liquid medicine
Spray on the continuous product, these are all within the scope of the present invention., can be with pumping by liquid medicine in the case of spray
Pipeline is squeezed into by filter, into spray disk, by nozzles spray or product surface is flow to, etches the concentration and temperature of liquid medicine
Degree keeps basicly stable, therefore is uniform during arrival metallic substrates, therefore can realize the etching metallic substrates of liquid medicine at the uniform velocity.
After the etch, metallic substrates are removed, and are left graphene or graphene film, may contain residual thereon
Etching liquid medicine, it is therefore preferred to can remove the etching liquid medicine remained thereon by washing.
After the step of passing through washing, graphene or graphene film are dried.
Afterwards, as needed, graphene film is collected, such as carries out rolling rewinding (as shown in Figure 1), be wound up into
On rewinding spool, or according to technique and the demand of production, it is directly fed to next process.
According to above-mentioned technique, the continuous etching of graphene metallic substrates can be realized, whole process need not manually be situated between
Enter, improve efficiency, reduce cost.
During rolling rewinding, if edge does not line up, winding can not just keep smooth, and product wrinkle influence performance and outer
See.Therefore according to a preferred embodiment of the present invention, after being dried, before rewinding, to the continuous product
Edge contraposition is carried out, ensures that winding is smooth, reduces the wrinkle of product.The mode aligned below with reference to Fig. 5 descriptions.
According to a preferred embodiment of the present invention, this method can also be included in real time or regularly described in monitoring
One or more parameters of liquid medicine are etched, when one or more parameters exceed default scope, adjust the etching medicine
One or more parameters of water.For example, the temperature of etching liquid medicine can be monitored.Influence of the temperature to etch rate is very big,
When monitoring that the temperature for etching liquid medicine is less than preset temperature or temperature range, start heater so that etching liquid medicine liter
Temperature；When the temperature for detecting etching liquid medicine is higher than preset temperature or temperature range, by way of adding cooling water, Huo Zhetong
The mode that fan accelerates radiating that starts is crossed, reduces the temperature of etching liquid medicine.The holding of liquid medicine temperature can also be by cooling down frozen water
Titanium tube and heating titanium tube automatically control realization by automatically controlling to integrate with computer, specific reference picture 4, are visited by temperature in groove
Head, the temperature of liquid medicine in groove is perceived, when temperature is less than the lower limit of setting range, then heater opens work, and heating liquid medicine arrives
The temperature of setting：If temperature is higher than the upper limit of setting range, frozen water disengaging automatically opens up, scope of the chilling temperature to setting
Interior, typical temperature can control positive and negative two degrees Celsius of design temperature.It will be described in more detail below.
The etching apparatus 100 of continuous product is etched below with reference to Fig. 2 descriptions being used for according to the second embodiment of the present invention.
As shown in Fig. 2 the etching apparatus 100 of the present invention includes feeder 101.Feeder 101 can be with feed for example
Growth has the continuous product of the metal foil of graphene film.Feeder 101 can include one or more rollers, so as in the future
It is imported into from the continuous product of upstream in the etching apparatus 100 of the present invention.Feeder 101 can also include blowing spool, even
Continuous product lays out continuous product on the blowing spool, and with the rotation of blowing spool.Those of ordinary skill
It is contemplated that other kinds of feeder.These deformations are all within the scope of the present invention.
In the downstream of feeder 101 (the direct of travel observation of continuous product when being worked along etching apparatus 100), set
There is etching device 102, for receiving the continuous product from the feeder.The etching device for example may include liquid medicine
Groove, etching liquid medicine can be accommodated in the processing solution tank, when the continuous product is through the etching liquid medicine, the etching device can be with
Etching liquid medicine is applied on the continuous product, the continuous substrate is removed.According to one preferable implementation of the present invention
, spray disk or shower nozzle are provided with the processing solution tank, sprays and is connected with corresponding pipeline on disk or shower nozzle, so as to from processing solution tank
Etching liquid medicine is drawn, by spraying disk or shower nozzle, by the sprinkling of etching liquid medicine or the continuous product surface is flow to, then returnes to this
In processing solution tank.Spraying etching liquid medicine in a manner of spraying disk or shower nozzle, the etching of the liquid medicine at the uniform velocity metal foil can be realized.
Other modes can also be conceived to apply etching liquid medicine.For example, continuous product can be caused to be advanced through in etching liquid medicine, with
Remove the metallic substrates.It is to be appreciated by one skilled in the art that etching device 102 and feeder 101 can be it is overall or
The device to link together or two independent devices.In the latter case, it is possible to increase etching apparatus 100
Modularization, modules are assembled according to the demand of technique.
According to a preferred embodiment of the present invention, etching apparatus 100 can also include being located under the etching device 102
The water washing device 105 of trip and the drying device 106 positioned at the downstream of water washing device 105.In water washing device 105, by going
Except the continuous product of substrate is washed, the residual etching liquid medicine carried thereon can be removed.After the step of passing through washing,
Graphene or graphene film are dried in drying device, specific drying mode for example can be blower fan air blast
Mode, fan outlet have electric heater unit, and the power of heater can adjust setting, to realize corresponding temperature setting,
Hot blast enters Gas inlet tube and air knife, blows in product surface, product is dried.
According to a preferred embodiment of the present invention, etching apparatus 100 can also include being located under the drying device 106
The material collecting device 107 of trip.Similar with the feeder 101, material collecting device 107 can include one or more rollers, so as to
It will be imported into by dry, to eliminate metallic substrates continuous product in the process in downstream, material collecting device 107 can also include
Rewinding spool, by continuous product that is dry, eliminating metallic substrates on the rewinding spool.Those of ordinary skill
It is contemplated that other kinds of material collecting device.These deformations are all within the scope of the present invention.
According to a preferred embodiment of the present invention, etching apparatus 100 also includes being arranged on the He of drying device 106
Automatic deviation correction alignment device 108 between the material collecting device 107, so as in rewinding or winding, be aligned and filled by automatic deviation correction
Put 108 controls winding when it is neat, being unlikely to both sides has the material having more to come out.Automatic deviation correction alignment device is, for example, to pass through product
The sensing of marginal position, the left and right of roller, which is retreated, to be automatically adjusted to realize.Fig. 5 shows the knot of automatic deviation correction alignment device 108
Structure.
According to a preferred embodiment of the present invention, the etching apparatus 100 includes one or more sensors 112,
For detecting one or more parameters of the etching liquid medicine and/or etching device.The etching apparatus 100 may also include regulation
Device 113, the adjusting means 113 couples with one or more of sensors 112, according to one or more of sensors
Testing result, by one or more parameter regulations of the etching liquid medicine and/or etching device to default scope or
Preset value.
The various embodiments of the sensor 112 and adjusting means 113 are described with reference to figure 3 and Fig. 4 separately below.
As shown in figure 3, the sensor 112 is for example including conductivity sensor 1121, electrode potential sensor 1122, ratio
Retransmit sensor 1123.The sensor detects the etching electrical conductivity of liquid medicine in processing solution tank, electrode potential, proportion respectively.Ability
Field technique personnel are it is understood that sensor described above is only exemplary, in order to monitor etching liquid medicine and/or etching device
Other running parameters, corresponding sensor, such as pH sensors can be set up, the pH value of sensing etching liquid medicine.
The adjusting means 113 includes control device 1131.The control device 1131 be, for example, computer or PLC,
The form of single-chip microcomputer, it is able to carry out corresponding programmed logic.Control device 1131 couples with the sensor 112, so as to
The working condition and running parameter of the etching liquid medicine and/or etching device can be perceived.As shown in figure 3, the adjusting means
113 may also include hydrochloric acid addition valve 1132, hydrogen peroxide addition valve 1133, pure water addition valve 1134, hydrochloric acid storage barrel 1135, dioxygen
Water storage barrel 1136, pure water storage bucket 1137.By taking hydrochloric acid as an example.Such as when conductivity sensor 1121 detects etching liquid medicine
When electrical conductivity is too low, the control device 1131 knows the too low situation of electrical conductivity, automatically opens up hydrochloric acid addition valve 1132, or
Prompt user's manual unlocking hydrochloric acid addition valve 1132, after hydrochloric acid addition valve 1132 is opened, the salt in hydrochloric acid storage barrel 1135
Acid can be pumped into processing solution tank.After the electrical conductivity of etching liquid medicine revert to normal range (NR), control device 1131 instructs
Disconnect hydrochloric acid addition valve 1132, or prompting user's manual-lock hydrochloric acid addition valve 1132.Above is to etch liquid medicine
Describeed how exemplified by electrical conductivity according to the testing result of sensor come adjust etching liquid medicine parameter.Those of ordinary skill can
Readily it is applied to the other specification of regulation etching liquid medicine and/or etching device.In addition, hydrochloric acid, hydrogen peroxide, pure water are
Specific embodiment for the composition of regulation.Those of ordinary skill can use other materials according to technique needs.For example,
Hydrogen peroxide can be used for adjusting electrode potential, and water can be used for adjusting proportion.
Alternatively, it is also possible to monitor the etching concentration of liquid medicine, acidity, proportion, electrode potential, concentration of hydrochloric acid, hydrogen peroxide concentration,
The indexs such as copper ion concentration, the result of detection can feed back to control device 1131, and control device 1131 is real according to the index of setting
When provide signal to corresponding addition valve, after opening addition valve, the corresponding time is opened according to signal and adds to processing solution tank, liquid medicine
The liquid medicine Rapid Circulation being added is distributed to whole etching groove by the circulating pump (M in Fig. 3) of groove.The etching apparatus of the present invention
In 100, by one or more sensors and adjusting means, to the temperature of etching liquid medicine, acidity, proportion, electrode potential etc.
Index is detected and is automatically replenished, and is allowed the hydrochloric acid of erosion copper consumption of chemical reaction and hydrogen peroxide accurately to be supplemented in time, is allowed liquid medicine
In univalent copper ion be oxidized to bivalent cupric ion, allow bivalent cupric ion to maintain suitable concentration, to keep new product to enter groove
When, keep etch rate stabilization and uniformly.Sensor is to the concentration of hydrochloric acid of liquid medicine in groove, hydrogen peroxide concentration, copper ion concentration
Index real-time detection, the result of detection can feed back to control device, and control device provides signal according to the index of setting and arrived in real time
Add pumping and pneumatic operated valve, the etching groove that pneumatic operated valve supplements liquid medicine according to the signal unlatching corresponding time, the circulation of etching groove
The liquid medicine Rapid Circulation being added is distributed to whole etching groove by pump.Circulate pumping.It is preferable to carry out according to one of the present invention
, predetermined program is for example stored with the control device 1131, so as to the sensing result according to sensor, automatically control
Multiple different devices, abnormal parameter occurs so as to adjust.Such as when electrode potential parameter drift-out during normal range of operation,
Control device 1131 needs to add hydrogen peroxide into etching liquid medicine major trough, and control device 1131 can be by controlling various composition
The opening time of addition valve realizes specific control targe.
The pipeline and sensor that Fig. 4 shows the structure of etching device and arranged in it.The sensor 112 can also wrap
Include liquid level and perceive probe 1124 and temperature sensing probe 1125.Temperature sensing 1125 such as temperature sensors of probe, can sense quarter
Lose the temperature of liquid medicine.In addition to control device 1131, adjusting means 113 may also include electric heater 1138 and cooling tube 1139.
When control device 1131 knows that the temperature of etching liquid medicine is less than preset temperature or temperature range, start electrical heating
Device 1138 so that etching liquid medicine heating；When detect etching liquid medicine temperature be higher than preset temperature or temperature range, by adding
Enter the mode of cooling water, or by way of starting fan and accelerating radiating, reduce the temperature of etching liquid medicine.Shown in Fig. 4
Cooling tube 1139, for passing through cooling water.Such as when liquid medicine temperature is too high, control device 1131 is controlled into cooling tube 1139
Cooling water is pumped into, during cooling tube 1139 is flowed through, with etching liquid medicine heat exchange occurs for cooling water, so as to reduce etching medicine
The temperature of water.By such mode, can be controlled by cooling down the temperature of liquid medicine by positive and negative two degrees Celsius of design temperature.Liquid level sense
The working method for knowing probe 1124 is also similar.When liquid level perceive probe 1124 sense etching liquid medicine liquid level it is too low when, control
Device 1131 is according to built-in program, supplement etching liquid medicine or related composition.
In above embodiment, control device 1131 is both used for the temperature for controlling etching liquid medicine, is also used for control etching medicine
The other specification of water, such as proportion, acidity, proportion, electrode potential.Those of ordinary skill can also conceive, using different controls
Device processed is controlled respectively.These are all within the scope of the present invention.
In the present invention, by stable traveling, automatic deviation correction contraposition and stable etching, graphene Metal Substrate can be realized
The etching at bottom is removed, and complete grapheme material is obtained on thin-film material.
As shown in Fig. 2 the etching apparatus 100 of the present invention can also include control panel 109.Staff can for example pass through
Control panel 109 carrys out the technological parameter of etching apparatus described in adjustment control, for example, the temperature of control etching liquid medicine and concentration and
Other specification.By taking temperature as an example, when staff is setting new operating temperature on control panel 109, control device
1131 according to the new operating temperature, by way of heating or cooling down, by the temperature adjustment of etching liquid medicine to the new work
Make temperature.
The etching device 102 is also show in Fig. 4 also includes screen pack 1021, is etched for filtering in liquid medicine
Impurity.In addition, etching device 102 also includes spray pipeline 1022 and nozzle 1023.Spray pipeline 1022 is from etching device 102
Etching liquid medicine is drawn in processing solution tank, and etching liquid medicine is assigned in each nozzle 1023, so as to equably be ejected into through it
In continuous product on.
Fig. 5 shows one embodiment of the material collecting device 107 and automatic deviation correction alignment device 108 according to the present invention.Such as
Shown in Fig. 5, material collecting device 107 includes the first platform 1071 and the second platform 1072, and the first platform 1071 is used to transmit continuous production
Product, the second platform 1072 are used to wind.The first collecting shaft 1073 and the second collecting shaft 1074 are provided with first platform 1071, its
In the first collecting shaft 1073 be shorter than the second collecting shaft 1074.The 3rd collecting shaft 1075 and the 4th is provided with second platform 1072 to receive
Expect axle 1076, the length of the 3rd collecting shaft 1075 is for example essentially identical with the second collecting shaft 1074, the length of the 4th collecting shaft 1076
Degree is for example essentially identical with the first collecting shaft 1073.In the embodiment of foregoing description, on the first platform and the second platform respectively
Be provided with two collecting shafts, it is one longer, it is one shorter, be respectively used for transmitting the larger product of the wide pair of monovolume or the wide cuts of volume two compared with
Small product.Deformed according to one kind, a collecting shaft can also be only set respectively on the first platform and the second platform.
Automatic deviation correction alignment device 108 includes photoelectric sensor 1081, and it is flat that photoelectric sensor 1081 is for example arranged on first
Between the platform 1072 of platform 1071 and second, the continuous product of the second platform 1072 is advanced to from the first platform 1071 for detection
The position at edge.In the 5 embodiment of figure 5, be provided with roller 1077 on the second platform 1072, for by continuous product from
One platform 1071 is directed to the second platform 1072.Photoelectric sensor 1081 is arranged on the both ends of roller 1077, to detect continuous production
The marginal position of product.
Automatic deviation correction alignment device 108 also includes the first motor 1082 and the second motor 1083.In Fig. 5, the 3rd collecting shaft
1075 and the 4th collecting shaft 1076 be movably installed at respectively on the second platform 1072, such as installed by mobilizable bearing
On the second platform 1072.First motor 1082 and the second motor 1083 are connected respectively to the 3rd collecting shaft 1075 and the 4th rewinding
On the movable bearing support of axle 1076, so as to drive corresponding movable bearing support, to adjust the 3rd collecting shaft 1075 and the 4th rewinding
The position of axle 1076.
When photoelectric sensor 1081 senses the marginal position of continuous product, photoelectric sensor 1081 passes to signal
First motor 1082 or the second motor 1083, the first motor 1082 or the second motor 1083 drive the 3rd collecting shaft 1075 or the 4th
Collecting shaft 1076 moves up in the side vertical with discharging, allows edge and the rolling of the 3rd collecting shaft 1075 or the 4th collecting shaft 1076
Product edge alignment on wheel 1077, realize that winding is neat, i.e., whole material collecting device can at any time may be used under the drive of positioning motor
To move left and right, keep winding neat.By motor change movable bearing support position and and then change the 3rd collecting shaft 1075 or
The position of 4th collecting shaft 1076 is only one embodiment of the present of invention.Those skilled in the art are contemplated that others side
Formula comes the position that the sensing signal based on photoelectric sensor 1081 changes the 3rd collecting shaft 1075 or the 4th collecting shaft 1076.
At work, step is as follows for the etching apparatus 100 of the present invention.(1) starting device, design temperature, etching groove is set
After the parameters such as the electrical conductivity of liquid medicine, proportion, oxidation-reduction potential, (2) temperature and etching groove process conditions reach, product is being put
Placed on material device, guiding band put in device interior, starts all working key beyond transmission, allows addition, spray with
Filter normal work；(3) start transmission and EPC automatic alignings, wait guiding band to complete winding, will by product winding on axle sleeve
Guiding, which takes, stays a bit of product, takes off measure resistance；(4) at the end of a roll of product is sent, leader tape or storage device are utilized
Change of lap, volume is connect on the operating desk of storage device, new a roll of production is entered after connecting；(5) production is completed, and product backmost connects
Upper guiding band, stop transmission, then guiding band is fixed on the machine, then stopping spraying, circulation and heating；
Retractable volume job description：
It is that tension force aligns with correction and storage device, tension force are to pass through to unreel and wind main control point
Speed discrepancy and pulling force size between blowing wheel and rewinding wheel are realized, are tensed product by the adjustment knob of tension force, common
Way is to need product setting test by different tension force, the performance and harmomegathus of product is measured, to determine the setting of tension force
Scope
In the present invention, product is continuously driven through etching by rolling and adulterates liquid medicine, is had in etching doping groove designed
Jet pipe and nozzle, liquid medicine rule uniformly flow in groove, on Uniform Flow to product surface, realize uniform etching doping,
Specifically referring to the drawings 4.Liquid medicine is squeezed into pipeline by filter with pumping, into spray disk, by nozzles spray or flowing
To product surface, the liquid medicine in groove maintains the stabilization of concentration and temperature, therefore because having automatic adding device and temperature control device
It is homogeneous during arrival copper face, therefore the etching copper face of liquid medicine at the uniform velocity can be realized.
It is continuous that graphene film product is changed to rolling by the process and apparatus of the present invention 100 from traditional sheet production technology
Production technology, for the continuous production in enormous quantities of factory, and process before and after etching is set to produce and shift using rolling continuous processing
Be possibly realized, can so establish graphene film and automatically continuously grow, etch, transfer, for improve product production capacity and
Yield all improves a lot.
The key position of the design method is control and the automatic deviation correction control design case of material retractable axle tension force, and is etching
The set time etches in the liquid medicine of rate stabilization, keeps to be relaxed to and can not winding during roll good walking, can not be tensioned
To the deformation that increases.Tension force is exactly a torsion for being given to blowing roller during equipment design by electromechanical mechanism, sends wheel and rotates hair
What can be continued during material gives one fixed torsion of product, sets different torsion, the tension force of material issuing pair of rollers product is different, product
Tensioning degree it is different；To keep product in production process to be in normal tension, usual etching apparatus rewinding section
Speed is slightly larger than the transmission speed of blowing section.
This rolling device has the beneficial effect that：
(1) product of rolling equipment production does not have that employee is manually operated, product wrinkle, graphene defect, and product surface is miscellaneous
Matter etc. substantially reduces, and outward appearance yield improves 15%.
(2) continuous automatic production, operating personnel only feeding and blanking, and conventional walkaround inspection, personnel reduce half,
Production capacity improves 30%.
The purpose of the present invention, it is on the basis of existing equipment, the overall design by each functional unit by equipment, makes production
Product can continuous walking, realize disengaging of the roll good in each unit, and by the measuring and calculating of device length, make product in trough
The time of etching doping meets properties of product requirement, and gets rid of the chemical medicinal liquid of residual, and can realize the drying of product,
Automated condtrol and production are realized, except rolling feeding and blanking, it is no longer necessary to manually operation；Without handwork,
In terms of etching small range, one side continuous production withouts waiting for, and can improve production capacity, while has saved artificial and glass fibre
Tool and gaily decorated basket carrier, on the other hand without manual hand manipulation, human hand not contact product, it will not damage outer with wrinkle etc.
See bad, improve the quality and yield of graphene film product.Before and after the etching in terms of the docking of process, front and rear work is etched
Sequence also all imports rolling technique in investigation, it is contemplated that preceding process rolling production, etching can not have rolling technique, otherwise can only be again
Sheet is cut into, is produced according to existing process, and rear process can not also introduce rolling manufacturing technique method；If client
If having roll good demand, the roll good that can not also provide is to client；Etching procedure realizes rolling technique, can with it is preceding
The growth in face, press mold, transfer below, whole process realize that rolling produces.
Finally it should be noted that：The preferred embodiments of the present invention are the foregoing is only, are not intended to limit the invention,
Although the present invention is described in detail with reference to the foregoing embodiments, for those skilled in the art, it still may be used
To be modified to the technical scheme described in foregoing embodiments, or equivalent substitution is carried out to which part technical characteristic.
Within the spirit and principles of the invention, any modification, equivalent substitution and improvements made etc., it should be included in the present invention's
Within protection domain.
Claims (18)
1. a kind of equipment for etching continuous product, the continuous product includes continuous substrate and is grown in the continuous substrate
On graphene, the equipment includes：
Feeder, for continuous product described in continuously feed；
Etching device, the downstream of the feeder is arranged on, for receiving the continuous product, wherein the etching device holds
Receiving has etching liquid medicine, and when the continuous product passes through the etching device, the etching device is applied to institute by liquid medicine is etched
State on continuous product so that the continuous substrate to be removed.
2. equipment as claimed in claim 1, it is characterised in that the equipment also includes the water positioned at the etching device downstream
Cleaning device and the drying device positioned at the water washing device downstream.
3. equipment as claimed in claim 1 or 2, it is characterised in that the equipment also includes being located at the drying device downstream
Rolling material collecting device.
4. such as the equipment any one of claim 1-3, it is characterised in that the feeder is rolling discharging device,
The rolling discharging device includes blowing spool.
5. equipment as claimed in claim 3, it is characterised in that the equipment also includes：It is arranged on the drying device and institute
State the automatic deviation correction alignment device between rolling material collecting device.
6. such as the equipment any one of claim 1-5, it is characterised in that the equipment includes one or more sense
Device, for detecting one or more parameters of the etching liquid medicine.
7. equipment as claimed in claim 6, it is characterised in that the equipment also includes adjusting means, the adjusting means with
One or more of sensor couplings, according to the testing result of one or more of sensors, by the etching liquid medicine
One or more parameter regulations are to default scope.
8. equipment as claimed in claim 7, it is characterised in that the parameter include electrical conductivity, electrode potential, proportion, acidity,
It is one or more in hydrogen peroxide concentration, copper ion concentration.
9. such as the equipment any one of claim 1-8, it is characterised in that the etching device includes shower nozzle, the spray
Head structure is ejected into through on the continuous product of the etching device into by the etching liquid medicine, to remove the substrate.
10. equipment as claimed in any one of claims 1-9 wherein, it is characterised in that the etching device fills including temperature control
Put, the temperature control equipment includes temperature sensor, heater, frozen water pipeline and controller, the temperature sensor detection
The temperature of the etching liquid medicine, the controller couples with the temperature sensor, heater, and controls the frozen water pipeline
The unlatching of break-make and heater, described in when the temperature of the etching liquid medicine is less than predetermined threshold value, the controller starts
Heater is to improve the temperature of the etching liquid medicine, when the temperature of the etching liquid medicine is higher than the predetermined threshold value, the control
Device processed opens the frozen water pipeline, to reduce the temperature of the etching liquid medicine.
11. equipment as claimed in claim 5, it is characterised in that the automatic deviation correction alignment device include photoelectric sensor and
Motor, the edge of the photoelectric sensor sensing continuous product, the motor couple with the photoelectric sensor, and according to
The position of the signal adjustment institute rolling material collecting device of the photoelectric sensor.
12. a kind of method for etching continuous product, the continuous product includes continuous substrate and grown on the substrate
Graphene, methods described include：By the continuous product feed including continuous substrate and graphene by etching liquid medicine, to go
Except the substrate on the continuous product.
13. method as claimed in claim 12, it is characterised in that also include：
After the continuous product is by etching liquid medicine, the continuous product is washed and dried.
14. method as claimed in claim 13, it is characterised in that also include：
After to the continuous product drying, rolling rewinding is carried out to the continuous product.
15. method as claimed in claim 14, it is characterised in that also include：
After the continuous product is dried, before rolling rewinding, edge contraposition is carried out to the continuous product.
16. such as the method any one of claim 12-15, it is characterised in that also include：
One or more parameters of the etching liquid medicine are monitored, when one or more parameters exceed default scope, are adjusted
Save one or more parameters of the etching liquid medicine.
17. such as the method any one of claim 12-16, it is characterised in that methods described passes through claim 1-11
Described in equipment implement.
A kind of 18. graphene film that method according to described in claim 12-16 is handled.
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Address after: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Applicant after: WUXI GRAPHENE FILM Co.,Ltd. Applicant after: Changzhou sixth element Semiconductor Co., Ltd Address before: No. 518-5 Zhonghui Road, Standard Factory Building of Chang'an Industrial Park, Huishan Economic Development Zone, Wuxi City, Jiangsu Province, 214000 Applicant before: WUXI GRAPHENE FILM Co.,Ltd. Applicant before: Wuxi sixth element electronic film technology Co., Ltd |
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