CN107407270A - Pump, actuator and relevant apparatus and the method for making - Google Patents
Pump, actuator and relevant apparatus and the method for making Download PDFInfo
- Publication number
- CN107407270A CN107407270A CN201480060091.6A CN201480060091A CN107407270A CN 107407270 A CN107407270 A CN 107407270A CN 201480060091 A CN201480060091 A CN 201480060091A CN 107407270 A CN107407270 A CN 107407270A
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- China
- Prior art keywords
- micropump
- pump
- barrier film
- magnet
- valve
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
- F04B43/04—Pumps having electric drive
- F04B43/043—Micropumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B17/00—Pumps characterised by combination with, or adaptation to, specific driving engines or motors
- F04B17/03—Pumps characterised by combination with, or adaptation to, specific driving engines or motors driven by electric motors
- F04B17/04—Pumps characterised by combination with, or adaptation to, specific driving engines or motors driven by electric motors using solenoids
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/0009—Special features
- F04B43/0054—Special features particularities of the flexible members
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/0009—Special features
- F04B43/0081—Special features systems, control, safety measures
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
- F04B45/04—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids having plate-like flexible members, e.g. diaphragms
- F04B45/047—Pumps having electric drive
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/02—Stopping, starting, unloading or idling control
- F04B49/022—Stopping, starting, unloading or idling control by means of pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
- F04B49/065—Control using electricity and making use of computers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/22—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00 by means of valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2203/00—Motor parameters
- F04B2203/04—Motor parameters of linear electric motors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2205/00—Fluid parameters
- F04B2205/03—Pressure in the compression chamber
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Reciprocating Pumps (AREA)
Abstract
A kind of Miniature diaphragm pump.Barrier film loaded energy during discharge stroke, and loaded energy discharges during pump stroke, this improves the efficiency of micropump.Energy loads via fixed to the permanent magnet on barrier film.Pump includes being used for the processor of the performance for the position and pump for dynamically controlling barrier film.
Description
Background technology
Micropump is for the micro- of such as chemical analysis and other " chip lab (lab-on-a-chip) " application fields
Fluid application manufacture.Many in these micropumps is the membrane pump driven by electromagnetic mechanism.Permanent magnet and magnet coil (energy
Enough make its polarity inversion) between interaction cause barrier film reciprocal and transfer tube.Barrier film is typically secured to coil or permanent magnet
On, and other elements of electromagnetism pairing keep fixing relative to barrier film.
Such arrangement can effectively operate when pumping fluid or in the case of no larger pressure difference.If however,
Pressure difference through the barrier film of this pump is very big, then need it is more high-power come transfer tube.Under the background of micropump, it may be difficult to not
Produce in the case of the problem of unexpected such as heat history will more high-power transmission to electromagnetic mechanism.
Mammoth pump assists to promote barrier film to handle the larger pressure through barrier film by using mechanical energy during pump stroke
Difference.For example, only electromagnetic force can drive barrier film during discharge stroke, and mechanical spring can be assisted during pump stroke driving every
Film.That is, during discharge stroke, mechanical spring compression, and when electromagnetism field reversal, mechanical spring unloads its loading
Energy returns to barrier film.However, this, which is arranged in, has its highest energy when pump stroke starts, and high-drag is run into barrier film
Off-energy simultaneously.In addition, this mechanical load is not actual in micropump.
These challenges can solve with other by embodiment disclosed herein.
The content of the invention
Certain embodiments of the present invention is related to for improving Miniature diaphragm pump and being specifically by the micro- of electromagnetic actuator driving
The apparatus and method of the efficiency of type membrane pump.
In certain embodiments, Miniature diaphragm pump loaded energy during discharge stroke, and loaded energy is in the pump stroke phase
Between discharge, which improve the efficiency of micropump.
In certain embodiments, on the barrier film for supplementing the membrane pump that permanent magnet is fixed to micro electromagnetic driving.Supplement permanent magnetism
Iron separates during the discharge stroke of pump with fixed pole magnet, and magnetic is attracted to fixed pole magnet during pump stroke.Will forever
Magnet is divided among loaded energy during discharge stroke with pole magnet.
Certain embodiments of the present invention includes being used for the control system for operating Miniature diaphragm pump.Control system may include to control
System, storage, sensing and I/O components.
Certain embodiments of the present invention includes dynamically controlling the position of barrier film and/or the place of performance in Miniature diaphragm pump
Manage device.In certain embodiments, skew and/or gain response are dynamically controlled in measuring operating parameter, desired to realize
Operating characteristics.
Brief description of the drawings
Fig. 1 shows the perspective view of micropump according to an embodiment of the invention.
Fig. 2 shows the section of Fig. 1 perspective view.
Fig. 3 shows the decomposition diagram of micropump according to an embodiment of the invention.
Fig. 4 shows the close-up view of the section view in Fig. 2.
Fig. 5 A and 5B respectively illustrate the perspective view and plane in the section of a part for the micropump according to some embodiments
View.
Fig. 6 A and 6B show the machine according to the interaction between the actuator of some embodiments and the barrier film of micropump
The sketch of structure.
Fig. 7 is the micro electromagnetic membrane pump and no loading magnetic according to the additional loading magnet of the use of embodiments of the invention
The graphical diagram of efficiency comparison between the electromagnetic diaphragmpump of iron.
Fig. 8 A and 8B respectively illustrate the section of a part for the micropump pump housing according to some embodiments perspective view and
Plan view.
Fig. 9 A are shown according to the control including certain amount of some embodiments of the present invention, storage and I/O components
Control and I/O subsystems.
Fig. 9 B show according to some embodiments of the present invention by the step of computing device certain amount so as to basis
The pressure value measured by sensor dynamically controls the flow chart of barrier film.
Fig. 9 C show above-mentioned some parameters according to some embodiments of the present invention in the pump circulation of certain amount
Exemplary evolution.
Fig. 9 D are shown performs step to implement the exemplary series of automatic start pattern by control system.
Figure 10 shows the decomposition diagram of the embodiment of micropump.
Figure 11 A and 11B show the different views in the section of the part of one embodiment of dump valve.
Figure 12 A and 12B show the external view of the dump valve according to some embodiments of the present invention.
Figure 13 A and 13B show the different views of the lower pump pump housing according to some embodiments of the present invention.
Figure 14 A, 14B and 14C show the different views of the upper pump pump housing according to some embodiments of the present invention.
Figure 15 A, 15B and 15C show the different views of the lower valve assembly body according to some embodiments of the present invention.
Figure 16 A and 16B show the different views of the upper valve assembly body according to some embodiments of the present invention.
Embodiment
Before the description present apparatus and method, it will be appreciated that, the invention is not restricted to the specific embodiment.It will also be appreciated that
, the purpose of description specific embodiment has been merely using term herein, and be not intended to be limiting, because the present invention
Scope only is limited by the following claims.
Unless otherwise defined, then all technologies used herein and scientific terminology have with it is of the art common
The identical meaning that technical staff is generally understood that.Although similar or equivalent any method and material can be with those described herein
Used in the implementation or test of the present invention, but preferable method and material will now be described.All publications as described herein are by drawing
The method and/or material that its reference is combined come disclosure and description publication with being incorporated herein.
The summary of some terms proposes in the description of the invention.Each term is explained everywhere in description, accompanying drawing and example
With enumerate.Any understanding of term in this description be all contemplated that set forth herein complete description, accompanying drawing and example.
Singular references " one ", " one kind " and " being somebody's turn to do " include plural referents, unless context clearly dictates otherwise.Cause
This, for example, the object mentioned may include multiple objects, unless context clearly dictates otherwise.Similarly, that mentions is multiple right
As may include single object, unless context clearly dictates otherwise.
Term " substantially (substantially) ", " basic (substantial) " etc. refer to sizable degree or model
Enclose.Together with event or situation in use, the term can (can) expression event or situation situation about accurately occurring, and thing
Part or the situation of the very approximate generation of situation, e.g., cause the typical tolerances level or changeability for illustrating embodiment as described herein.
Term " about " refers to approximation or the value, amount or degree close to a reference value.By term " about " cover from benchmark
The degree of value changes is typical in tolerance levels or measuring condition.
All connections can be to be directly connected to and/or connected via the indirect operation of intermediate structure.
One set of pieces includes one or more elements.
Unless otherwise noted, then the comparison between two elements of execution, which is covered to perform, directly relatively determines that an element is big
In (or more than or equal to) another, and for example by comparing the ratio of two elements and threshold value or the indirect comparison of difference.
Fig. 1 shows the perspective view of micropump 10, and micropump 10 includes ingress port 12 and outlet port 14.Micropump 10
Including the pump housing 11, it can be single-piece or can be formed by more than one piece.In Fig. 1, the pump housing 11 includes upper pump casing 11a and lower pump body 11b.It is micro-
Type pump 10 also includes actuator 15.Preferably, actuator 15 is the actuator of electromagnetic voice coil type, such as mobile phone and other electronics
Those commonly used in device.
Fig. 2 shows the section of Fig. 1 of micropump 10 perspective view.Fig. 2 shows the diaphragm assembly 50 including barrier film 55.
Fig. 2 is also shown for the actuator membrane 5 on the upper surface of actuator 15.Actuator membrane 5 is connected on diaphragm assembly 50, and is driven
The motion of actuating miniature pump is worked.
Fig. 3 shows the decomposition diagram of micropump 10.Diaphragm assembly 50 is shown as including upper spacer 53, barrier film by Fig. 3
55th, magnet 57 and housing 59.Upper spacer 53 helps to limit the top of the reciprocal pumping chamber wherein of barrier film 55.As standby
Choosing, upper spacer 53 can be lower pump body 11b component, e.g., molded components.Magnet 57 is attached on the lower surface of barrier film 55, and
It is also attached on the upper surface of actuator membrane 5.Housing 59 is attached on lower pump body 11b lower surface.Spacer 53 is configured to
Coordinate in the inner circumferential of the upper curtate of housing 59.The outer rim of barrier film 55 is clipped in the lower surface of spacer 53 and the inner ring of housing 59
Between upper surface so that spacer 53 and housing 59 cooperate to keep the outer rim of barrier film 55 to fix.The edge of barrier film 55 keeps solid
It is fixed, while the inside of barrier film 55 can be reciprocal up and down, and barrier film 55 accordingly acts as the volume displacement mechanism of micropump 10.
Forming the component of diaphragm assembly 50 should be linked in a manner of fluid tight and/or air proof.
Fig. 3 shows lower pump body 11b, and it can be the mould of many flow passages and flow control features with reference to micropump 10
Part processed.For example, inlet valve recess 21a is configured to store inlet valve 20a, and outlet valve recess 21b is configured to store outlet valve
20b.Also in lower pump body 11b it is opening and port, it is configured to complementary with valve and barrier film arrangement, and allows gas or liquid
Controlled flow passes through lower pump body 11b.
Fig. 3 shows control panel 70, dump valve 60 and sensor 80, and all of which can be accommodated in the recessed area in the pump housing
In domain.In figure 3, upper pump casing 11a and lower pump body 11b includes being configured to store control panel 70, dump valve 60 and sensor 80
Feature.
Generally speaking, inlet valve 20a and outlet valve 20b operation are similar to positive displacement diaphragm pump.That is, when barrier film is from entrance
Port 12 take from when, inlet valve 20a is also pulled away from by the negative pressure from upper inlet room port 202a, and relative to ingress port branch
Pipe 201a is engaged.The movement generate by ingress port 12, by upper inlet room port 203a (see Fig. 8 B), through inlet valve
20a and the flow passage for passing downwardly through lower inlet room port 202a.Negative pressure is also by outlet valve 20b suctions and lower downstream chamber port
202b is sealingly engaged, and it seals downstream chamber and prevented by the flowing to outlet 14.
When barrier film 55 starts its backward stroke towards ingress port 12, normal pressure promotes inlet valve 20a away from ingress port
Branch pipe 201a, and be sealingly engaged with upper inlet room port 203a.Normal pressure also promotes outlet valve 20b away from lower downstream chamber port
202b and engaged with outlet port branch pipe 201b.The movement generates from chamber of septum, by lower downstream chamber port 202b, pass through out
Mouthful valve 20b, pass through upper outlet room port 203b (see Fig. 8 B) and the flow passages that are left via outlet 14.
Fig. 4 shows the close-up view of the section view in Fig. 2.In Fig. 4, inlet valve 20a is plotted in its closing position, makes
Obtain its upper surface to be sealingly engaged relative to upper inlet room port 202a, and outlet valve 20b is plotted as relative to outlet port branch pipe
201b is engaged.In addition, outlet valve 20b is plotted as from lower downstream chamber port 202b debondings.
Valve sets size and is configured to be moved by the expecting pressure scope of the use environment of micropump 10.For example, valve should
When with constant weight and surface area ratio so that they can be moved when micropump uses by liquid stream or air-flow.In addition, valve by
The material for allowing valve to be sealingly engaged when being moved to such as sealing station by liquid stream or air-flow relative to its corresponding port is made.Rubber
Glue is an example for making the suitable material of the valve in this micropump.
Fig. 5 A and 5B respectively illustrate the perspective view peace in the section of a part for the micropump 10 according to some embodiments
Face view.Fig. 5 A and 5B show the housing 59 engaged with lower pump body 11b section.A part for barrier film is shown engaged to housing
59, and marked with label 55a.In fact, barrier film 55 crosses over housing 59, and magnet will be blocked from view in the perspective view
57.For the purpose of these views, a part for barrier film 55 illustrate only.Magnet 57 is attached to actuator membrane 5.
When known diaphragm displacement pump is connected in closed-chamber to be vacuumized in this room, each pump stroke is through barrier film
Pressure difference increase when need than last stroke successively bigger energy.That is, the vacuum in closed-chamber is bigger, then barrier film is advanced complete
Stroke is just more difficult to.Generally, with more high-power driving pump, to generate longer pump stroke under high vacuum state.
By contrast, according to the pump of some embodiments need not be so big power increase come raw under high vacuum state
Into longer pump stroke, because these micropumps load on discharge stroke.It is miniature compared to positive displacement diaphragm pump known before
Pump 10 includes magnet 57, and it act as the pump stroke that miniature displacement pump is loaded during discharge stroke.Actuator membrane 5 can be used
Sinusoidal signal drives so that actuator membrane 5 is reciprocal between upper position and lower position.Due to actuator membrane 5 be attached to every
On film 55, therefore the reciprocal of actuator membrane 5 causes the similar reciprocal of barrier film 55.When actuator membrane 5 and barrier film 55 are away from the pump housing
11 it is reciprocal when, diaphragm movement makes the dimension enlargement of chamber of septum, and in pump stroke sucks gas or liquid indoor.Work as actuator
Diaphragm 5 and barrier film 55 towards the pump housing 11 it is reciprocal when, diaphragm movement shrinks the size of chamber of septum 54 in discharge stroke.Inlet valve 20a
Moved simultaneously with this pump stroke and discharge stroke certainly with outlet valve 20b, to allow gas or liquid unidirectional from the inlet to the outlet
Flow through micropump.
Actuator 15 can be electromagnetic voice coil, and it includes the electromagnetic drive element being connected in actuator membrane 5.This voice coil loudspeaker voice coil promotees
Dynamic device is substantially similar to loudspeaker execution so that pattern of the waveform signal of transmission to electromagnetic drive element to be generated by waveform
To drive actuator membrane.
Fig. 6 A and 6B show the sketch of the mechanism of the interaction between actuator and barrier film.Actuator 15 includes actuating
Device base 15b, actuator membrane 5, actuator pole magnet 7 and actuator coil 3.Actuator pole magnet 7 is fixed to actuator bottom
On seat 15b.Actuator coil 3 is fixed on the downside of actuator membrane 5.Magnet 57 is permanent magnet, and is fixed to actuator film
On the upper surface of piece 5 and the downside of barrier film 55.In some cases, the position of magnet 57 can be upward relative to actuator membrane 5
Adjusted with downward, but in figures 6 a and 6b, it is plotted as being fixed in actuator membrane 5.
During pump stroke, electric current is applied on actuator coil 3, and to produce electromagnetism magnetic field, it inhales actuator coil 3
Lead to actuator pole magnet 7.Actuator coil 3 is fixed in actuator membrane 5, and diaphragm 5 is connected on barrier film 55.Therefore, every
Film 55 is pulled away from chamber of septum 54, so as to add room volume, and attracts air or liquid by inlet valve and to enter in pump stroke
Enter in chamber of septum.
Referring still to Fig. 6 A and 6B, magnet 57 is oriented magnetic and is attracted to actuator pole magnet 7.Chamber of septum is pulled away from barrier film 55
During 54 pump stroke, the magnetic between magnet 57 and actuator pole magnet 7 attracts to contribute to barrier film 55 and actuator membrane 5
More completely retracted towards actuator pole magnet 7 in the case of this position than magnet 57 being present.This is particularly useful under high suction,
Its septation 55 typically can not be travelled downwardly further due to the pressure drop through barrier film 55.That is, it is low negative in chamber of septum 54
Under voltage levels, exist low to barrier film 55 to be pulled away to the resistance of chamber of septum 54.Therefore, generated by the low-power in actuator coil 3
Electromagnetic force be enough to drive pump stroke.However, under the negative pressure of higher level in chamber of septum 54, exist to pulling barrier film 55
Resistance is higher, and therefore will need higher-wattage.Magnet 57 is helpful in this context, because it adds magnetic force to pull down
Barrier film 55, without additional power, because magnet 57 is permanent magnet.
Fig. 6 B depict discharge stroke, and wherein electric current is applied on actuator coil 3, and to produce electromagnetic field, electromagnetic field makes
Actuator coil 3 repels actuator pole magnet 7.Repel actuator coil 3 and promote actuator membrane 5 and barrier film towards chamber of septum 54
55, this reduce the volume of barrier film, and drive air or liquid to pass through outlet valve in discharge stroke.In the discharge stroke phase
Between, iron 57 also pushed away from actuator pole magnet 7.That is, electromagnetic force is enough all structures for repelling actuator coil 3 He being fixed to the upper
Part (e.g., actuator membrane 5, magnet 57 and diaphragm membrane 55) is away from actuator pole magnet 7.
Advantageously, magnet 57 is moved away from actuator pole magnet 7 during discharge stroke.This is favourable, because barrier film 55 exists
Gas or liquid from chamber of septum 54 shift when discharge stroke during run into relatively low resistance.Therefore, discharge stroke is with than magnetic
Iron 57 not on barrier film 55 in the case of relatively low secondary power demand magnet 57 is separated with actuator pole magnet 7.
So even, during pump stroke, the separation between magnet 57 and actuator pole magnet 7 provides additional magnetic force as described above.
As a result, micropump can more effectively operate compared with conventional electromagnetic membrane pump under lower-wattage.
Fig. 7 is to add the micro electromagnetic membrane pump of " loading " magnet with not loading according to the use of embodiments of the invention
The graphical diagram of efficiency comparison between the electromagnetic diaphragmpump of magnet.The fig plots make when electromagnetic pump is used for and evacuates closed-chamber
For the physical displacement or length of stroke of the barrier film of the numerical function of pump stroke.In addition, the figure assumes pump in less constant work(
Driven under rate, but the benefit for loading magnet is not limited to constant power application.Due to the pump depletion closed-chamber in figure, thus through every
Negative pressure of the pressure difference of film in closed-chamber increases when increasing with each pump stroke.Although both barrier films of loading and unloading are initial
During pump stroke all with its complete displacement or close to its complete bit divide a word with a hyphen at the end of a line into, but the efficiency of pump with negative pressure increase and graduation.Unloading
Barrier film (being designated as " not loading ") has the pump stroke quickly reduced so that it is in the following relative inefficiencies of higher pump stroke.Compare
Under, due to the passive magnetic loading force fixed to the permanent magnet on barrier film, therefore loading barrier film can be in the firm power application
In largely physics top offset.
The relative intensity of magnetic force of the actuator member (for example, magnet coil and pole magnet) between barrier film magnet can be used for
Adjust the efficiency of micropump.For example, stronger barrier film magnet will when being separated with pole magnet by more loaded energies provide to every
The pump stroke of film, but more power will be also needed to separate during discharge stroke.
In certain embodiments, barrier film magnet coordinates with adjustment mechanism, this allow that between barrier film magnet and pole magnet
Separation changes.For example, barrier film magnet can be accommodated in the recess on the upper surface fixed to actuator membrane.Barrier film magnet can support
On the top for leaning against taper adjusting screw so that when screw rotates in one direction, magnet moves closer to actuator membrane,
And when screw opposite direction rotates, magnet moves further away from actuator membrane.
Advantageously, magnetic field is adjusted the distance sensitivity.Magnetic field between two permanent magnets (actuator pole magnet and barrier film magnet)
Intensity can follow anti-cube of decline with a distance from from source.That is, if D is the distance between magnet, and F is the intensity of power, then F=
1/D3.This is favourable for embodiments of the invention, because when permanent magnet is nearer, e.g., barrier film during pump stroke
Under maximum displacement, power is much higher.Also, power is much lower under the least displacement of the barrier film during discharge stroke.The reality of the present invention
The micropump design of the loading of example is applied because this inverse relationship between power and distance can be than the design of non-load pump significantly more
Operated under big efficiency.
According to some embodiments, micropump preferably about 12 is long, about 10 to 15mm wide and about 3 arrive 9mm to 20mm
Height, more preferably from about 18mm are long, about 12mm is wide and about 7mm is high.Preferably about 1 to 5 grams of quality, more preferably from about 3 grams.
Peak point current and about 20 arrives the steady of 40mA when micropump is preferably run with the voltage of about 3.5 to 5 volts, about 100 to 200mA
State current practice.Micropump is automatically injected, and is preferably less than about 90dB outside two inches, more preferably outer small at two inches
In about 70dB.Micropump preferably has about -6Hg, more preferably from about -8Hg peak value suction.Absorptivity is preferably less than big
It is about 0 to arrive -6Hg under 10mL volume of air in about 10 seconds, more preferably in less than about 10 seconds under 10mL volume of air
- 8Hg is arrived for 0.
Fig. 8 A and 8B respectively illustrate the perspective view and plane in the section of a part for the pump housing 11 according to some embodiments
View.In these views, upper channel 52a and lower channel 52b are fluidly connected to dump valve 60 and sensor 80 from chamber of septum.Valve
Passage 62 and sensor passage 82 and upper channel 52a are fluidly connected.These passages allow to supervise via sensor 80 and dump valve 60
Survey and control the pressure in chamber of septum.Passage may be designed as a part for the section of the pump housing 11 of molding, can pierce after molding
In the pump housing 11, or can be the pipe or other conduits included in over-molded step or during the assembling of the pump housing.
Dump valve 60, sensor 80 and control panel 70 work together in closed-loop control system, miniature to monitor and adjust
The performance of pump.In an example, closed-loop control system is programmed for keeping the pressure-reduction level in chamber of septum.That is, sensor connects
The stress level in chamber of septum is monitored continuously, and the data are provided to control panel.Firmware (or software) on control panel can incite somebody to action
Then data are sent power to actuator to drive micropump to increase pressure compared with the stress level programmed, or
Dump valve is sent the signal to discharge negative pressure.In another example, pre-programmed or the suction overview of user's selection can be used
Closed-loop control system generates.That is, closed-loop control system by what is specified in the pressure-reduction level in chamber of septum and overview by depending on
The horizontal continuity of time relatively seeks the stress level pattern depending on the time, rather than seeks the setting level of negative pressure.Discharge
Then valve or pump can actuate on demand.
In another example, closed-loop control system can help to optimize operating efficiency and reduce noise level.In the reality
In example, firmware finds out the optimum operation condition of the micropump under given pressure-reduction level using look-up table.At a given pressure, it is micro-
Type pump can most effectively operate under a certain power signal overview.That is, the given shape of signal waveform is (for example, sinusoidal signal
Amplitude and frequency) micropump can be allowed more undisturbedly to be operated than another like shape at a given pressure.Generally, in micropump
Noise the wall of chamber of septum impacted by barrier film and the wall of its valve recess and branch pipe is impacted by valve generate.By in given power level
With the position of calibration barrier film and valve under stress level and cross-reference is relative to the power level in the retrievable look-up table of firmware
With those positions of stress level, micropump can be operated in a manner of valve and/or barrier film noise is reduced or eliminated.In addition, subtract
It is small or minimize the efficiency that barrier film and valve noise improve micropump because less energy by valve and/or barrier film and the pump housing it
Between expansion and lose to the pump housing.
Another advantage of closed-loop control system is that dump valve can actuate under certain conditions.For example, if negative pressure surpasses
Certain level is crossed, then firmware can actuate dump valve to allow air into chamber of septum.As another example, if valve temperature liter
Height is to certain level (such as by being incorporated integrally into micropump and with controlling the temperature sensor of board communications to detect) is higher than, then admittedly
Part can actuate dump valve.
Generally, the control of micropump and sensing member can be located in pump case, or can be away from pump.That is, processor and biography
Sensor can be located remotely from the actual pump housing, and still be able to provide sensing and controlling feature as described herein.Carried in addition, it is assumed that it has
For fluidly connecting needed for pressure relief performance, then dump valve can be located remotely from the pump housing.Therefore, closed loop feedback system may be present in function
In the system of the physically single component of upper interconnection.
Fig. 9 A are shown according to the control including certain amount of some embodiments of the present invention, storage and I/O components
Control and I/O subsystems 220.Some components can be a part for control panel 70, and other such as one group of user's input/output (I/
O) device 232 can electrically connect but be physically separated with control plate 70.In certain embodiments, control panel 70 includes processor 224, deposited
226, one groups of storage devices 234 of reservoir, and only one group of external communication interface controller 230, and modulus (A/D) converter
234 and digital-to-analogue (D/A) converter 236, it is all to be interconnected by one group of bus 250.Analog circuit 238 is connected to A/D converter 234
On.Analog circuit 238 includes component, and such as amplifier and wave filter, it is configured to perform simulation process, such as to by control panel 70 from
The analog signal amplification and filtering that external sensor receives.Analog circuit 240 is connected on D/A converter 236.Analog circuit
240 include component such as amplifier, and it is configured to perform simulation process, e.g., to the analog signal received from D/A converter 236
Amplification.As described below, processor 224 is connected to dump valve 60, sensor 80 by A/D converter 234 and D/A converter 236
On barrier film 55.
In certain embodiments, processor 224 includes microcontroller integrated circuit or other microprocessors, and it is configured to profit
Calculating and/or logical operation are performed with one group of signal and/or data.This logical operation is with a series of processor instructions (for example, machine
Device code or other types of software) form to processor 224 specify.Memory cell 226 may include random access memory
Data/signal that device (RAM, for example, DRAM) is read and/or generated by processor 224 during being stored in execute instruction.Place
Reason device 224 may also include additional core and integrate RAM and/or other holders.
Storage device 228 includes allowing software instruction and/or nonvolatile storage, reading and the computer of write-in of data
Computer-readable recording medium, e.g., EEPROM/ flash memory devices.Communication interface controller 230 allow subsystem 220 via wired and/or
Wireless connection is connected in digital device/computer system outside control panel 70.For example, wired connection can be used for being connected to structure
On part such as user I/O devices 232, and wireless connection such as Wi-Fi or bluetooth connection can be used for being connected on external member, e.g., intelligence
Can phone, tablet PC, PC or other peripheral control units.Bus 250 represent allow processor 224 and device 226,228,
230th, multiple systems of the communication between 234 and 236, ancillary equipment and/or other buses, and/or all other circuit.Depend on
Some or all of in hardware manufacturer, these components are incorporated integrally into single integrated circuit and/or can be with processors
224 is integrated.
User I/O devices 232 include user input apparatus, and it, which is provided, allows user to introduce data and/or instruction to control
One or more user interfaces of the operation of subsystem 220, and user's output device, it will be sensed (for example, vision, the sense of hearing
And/or tactile) offer is exported to user.User input apparatus may include button, touch screen interface and microphone etc..User exports
Device may include one or more display devices, loudspeaker and vibrating device etc..Input and output device can share common it is hard
Part, e.g., in the case of touch panel device.
In certain embodiments, processor 224 dynamically controls barrier film drive signal by using analog circuit 240
Direct current (DC) is offset with gain to control the positioning of barrier film 55.Offset level controls the resting position of barrier film 55, and gain controls
The amplitude of sinusoidal or other periodic signal waves, the amplitude that its determination barrier film 55 is deviateed by its resting position.Skew and gain can
Dynamically controlled in response to the operating parameter measured, to realize desired operating characteristics as described below.Specifically,
Skew and/or the gain pressure change that may be in response to be measured using sensor 80 are changed.
When pump is temporally operated with given evacuation order, the pressure difference through barrier film 55 generally increases.Offseting and increasing
In the case that benefit is constant, increase pressure difference gradually changing the resting position for causing barrier film 55.The increase of pressure difference causes to realize spy
Determine pump feature such as maximum differential pressure increase speed (rate of pumping), minimal current consumption (or increase efficiency) or minimum noise is optimal
Skew and the change of yield value.In certain embodiments, offset and reduce (or increase) with the time, to compensate the increasing through barrier film 55
Big influence of the pressure difference to the resting position of barrier film 55.Skew and yield value can change according to pressure look-up table, and/or according to dynamic
The change for the pressure difference (Δ) that the one or more parameters interested measured are observed such as in a pump circulation changes.
Fig. 9 B show the step of performing certain amount by processor 224 according to some embodiments of the present invention so as to root
The flow chart of barrier film 55 is dynamically controlled according to the pressure value measured by sensor 80.In step 300, processor 224 receive by
Sensor 80 is when the instantaneous pressure value measured in preceding pumping cycles.In step 302, it is determined that relative to the pressure value measured before
The pressure difference (Δ) of (for example, the pressure value measured just now in the one before pump circulation).In step 304, it is determined that pressure Δ and one
Or multiple reference values compare, to determine to the skew of subsequent pump circulation progress and/or the amplitude of Gain tuning and/or
Symbol.Reference value can be equal to following or in other cases according to identified below:The pressure measured in the one before pump circulation just now
Power Δ, or the expecting pressure Δ of the given measurement pump pressure such as obtained from correction card or other holders.Performing that this compares can
Including subtracting reference value from measuring pressure Δ.
Within step 306, it is determined that whether skew updates for next pump circulation.In certain embodiments, it is determined whether more
New skew can relatively perform independently of pressure Δ described above.For example, skew renewal can be held during some pieces of circulation
OK, and gain renewal can perform during other pieces of circulation, to attempt separately measured skew and change in gain to pressure
The effect of power Δ.In another embodiment, skew and gain renewal can perform in alternate pump circulation.In some embodiments
In, both skew and gain renewal perform during at least some pump circulations.In certain embodiments, if it is determined that offset variation
Pump performance may be improved, it is determined whether renewal skew can relatively perform according to pressure Δ described above.
In step 308, offset and renewal is compared according to the pressure Δ performed in step 304.In certain embodiments, if
Determine that this increase/reduction may cause the pump performance for improving next pump circulation, then renewal skew is included with fixed step (example
Such as, ± 1) skew is increased or decreased.
In the step 310, it is determined whether for next pump circulation more new gain.Step 310 can be with similar to pin above
Mode described in step 306 is performed.Then, in step 312, gain is compared more according to the pressure Δ performed in step 304
Newly.In certain embodiments, if it is determined that this increase/reduction may cause the pump performance for improving next pump circulation, then update
Gain includes increasing or decreasing gain with fixed step (for example, ± 1).
Fig. 9 C show above-mentioned some parameters according to some embodiments of the present invention in the pump circulation of certain amount
Exemplary evolution.X-axis represents the time (or pump circulation), and y-axis shows various parameters value.The skew 400 of estimation represents
The skew selected independently of the pressure dynamically measured according to predetermined calibration table value.The skew 402 being dynamically determined is represented according to such as
The skew of the pressure Δ value being dynamically determined selection described above.Vacuum level (compression) 404 represent the vacuum level that measures or
Through the pressure difference of barrier film 55.Gain 408 represents gain.Pressure Δ 406 represents the pressure Δ observed in each pump circulation,
That is, effective derivative of vacuum level 404.
As shown in Figure 9 C, vacuum level 404 increases over time when pump operates, wherein the pressure Δ 406 each circulated
Generally reduce when pump works relative to the barrier film pressure difference of increase with the time.Suitable for pump is maintained at optimum operation scope
Gain 408 increase over time.It is low if barrier film 55 collides at the end of its deviation with external structure in Each point in time
Gain causes the transfer volume of suboptimal, and high-gain can cause loss in efficiency and/or noise.Meanwhile corresponding to optimum operation
The skew of scope reduces with the time, to compensate influence of the pressure difference through barrier film 55 to the center of barrier film 55.For example, due to
The independent characteristic (its determination skew 402) of pump with for generate the calibration data for determining estimation skew 400 overall pump feature it
Between difference, therefore the skew 402 dynamically determined may differ from before determine (calibration) skew 400.For example, increase is overall inclined
400 dull reductions are moved, and the skew 402 dynamically determined increases once in a while.In addition, the skew 402 dynamically determined is not sometimes with
The speed for being same as overall offset 400 reduces.It is easy to use less tight manufacturing tolerance to make using the skew 402 dynamically determined
Pump is made, because the optimal less any mistake relied between the overall pump feature reflected in single pump feature and calibration data of pump operation
Match somebody with somebody.
In certain embodiments, pump as described above and associated control system can be used for generation except dull increase
Pressure pattern outside one (e.g., one shown in Fig. 9 C).For example, alternative pressure (suction) cycle can be by that will increase pump
Give cycle of (and/or reduce associated relief valve use) and reduce or stop to pump (and/or the relief valve that increase is associated
Using) cycle alternately use.
Fig. 9 D are shown performs step to implement the exemplary series of automatic start pattern by control system.In step 500
In, processor 224 receives the pressure value currently measured while pump is closed.In step 502, processor 224 will measure
Pressure is compared with making a reservation for positive threshold value.Detect high-caliber normal pressure and indicate that the room for needing to be evacuated is engaged and slightly close
Envelope.If the pressure measured is not higher than threshold value, process returns to step 500.If the pressure measured is higher than threshold value, processor
224 start pump automatic start process (step 504) by opening pump.The current pressure values of this pump circulation connect in step 506
Receive, and in step 508 compared with pressure value before.In step 510, it is determined that whether the pressure value measured points out room
Sealing has been destroyed.For example, pressure larger decline suddenly or returning to the atmospheric pressure room of may indicate that and no longer sealing.If detect
Most of sealing is not lost, then skew and/or gain adjust (step 512) as above, and the process returns to step
Rapid 506 receive the pressure value of next pump circulation.Most of sealing is lost if detected, pump closes (step 514), and mistake
Journey returns to step 500 to allow the new engagement of sensing chamber.
In certain embodiments, step 512 may include to open and close pump, to keep the negative pressure of certain level.Step
512 may include monitoring parameters, and e.g., pump is opened or the slow time score of pump pressure, to determine to increase or reduce the activity of pump.
Then pump is automatically adjusted to keep the negative pressure of certain level.
Figure 10 shows the decomposition diagram of the embodiment of micropump 1010.Micropump 1010 includes actuator 1015, its
Can be the actuator of electromagnetic voice coil type, e.g., those commonly used in mobile phone and other electronic installations.Lower pump body 1011b is attached to
On actuator 1015, lower pump body 1011b includes diaphragm assembly as described earlier in this article.Figure 10 specifically depicts diaphragm assembly
Some elements, including magnet 1057 and barrier film 1055.Lower pump body 1011b and lower valve assembly body 1200b forms this paper such as and existed together
Chamber of septum described in other places.Figure 10 also show via control panel installed part 1070m and the control extended from control panel 1070
Printed line 1071a, 1072b support the lower pump body 1011b of control panel 1070, to provide electrical connection to the electromagnetic signature of diaphragm assembly
Property.Sensor 1080 is existed on control panel 1070, sensor 1080 have formed sensor 1080 and upper pump casing 1011a and
The sensor packing ring 1085 of sealing between dump valve 1060.Discharging valve diaphragm 1065, figure 10 illustrates and dump valve is upper
Section, including its outlet port, do not draw specifically.
Referring still to Figure 10, lower valve assembly body 1200b is attached to the upper table of the outer shroud of barrier film 1055 in a manner described herein
On face (for example, seeing Fig. 5 A, 5B, 6A and 6B and associated description).Lower valve assembly body 1200b may include to provide valve as described herein
Valve recess, ingress port and sealing surfaces needed for action.These features can overall Combining with terrain into lower valve assembly body
In 1200b, e.g., by injection-molded integral part, they can be formed by multiple molding processes, or they can pass through cutting or machine
Processing etc. is produced in lower valve assembly body 1200b.Lower valve module packing ring 1205b is placed in lower valve assembly body 1200b and upper valve group
Between part body 1200a, and fluid-tight sealing is provided to valve chamber.Inlet valve 1020a and outlet valve 1020b can float over valve chamber
It is interior, and act on as described elsewhere herein.
Lower valve assembly body 1200b still is similar to referring again to Figure 10, upper valve assembly body 1200a, wherein it may include to provide this
Valve recess, ingress port and sealing surfaces needed for valve events described in text, and these features can be with for lower valve assembly body
Identical various ways described in 1200b are formed.Further it is provided that needed for connection between valve chamber, pressure sensor and dump valve
Fluid flow passages may be formed in upper valve assembly body 1200a.Upper valve module packing ring 1205a can be formed in these flow passages
The coboundary of some, and the sealing between upper valve assembly body 1200a and upper pump casing 1011a is provided.Upper pump casing 1011a is then gone back again
There can be flow passage, it is plotted as upper pump casing passage 1008 in Fig. 10.Upper valve module packing ring 1205a and upper pump casing seal
1009 are respectively used to the lower boundary of some flow passages and coboundary.In addition, otch in upper valve module packing ring 1205a provide with
Ingress port 1012 and outlet port 1014 on upper pump casing 1011a fluidly connect.Screw 1001 is used for micropump 1010 most
Eventually in assembling, but other methods upper pump casing 1011a dresses being affixed on lower pump body 1011b can be used certainly.
Flow passage in upper pump casing 1011a provides some connections, such as:(1) ingress port of dump valve and micropump it
Between connection;(2) connection between dump valve and the outlet port of micropump;And between (3) pressure sensor and suction room
Connection.
Figure 11 A and 11B show the different views in the section of the part of one embodiment of dump valve.Discharge valve diaphragm
Port on the shell of 1065 upper surface engagement dump valve (it is not drawn).The downside dress for discharging valve diaphragm 1065 is fixed to row
Go out in valve attracting board 1068, attracting board 1068 is formed by iron material.Attracting board 1068 is discharge valve yoke 1067 below dump valve
With discharge valve coil 1069, its cooperation can attract the electromagnetic force of dump valve attracting board 1068 to provide.Discharge the shape of valve diaphragm 1065
As causing in its inactive state, it forms the sealing relative to the port on dump valve.When electric current passes through discharge valve coil
When 1069, dump valve attracting board 1068 is pulled down, and discharge valve diaphragm 1065 is then pulled away from its sealing station by this again.Discharge valve yoke
1067th, discharge valve coil 1069 and dump valve attracting board 1068 is accommodated in discharge valve casing 1061.Figure 12 A and 12B show row
Go out the external view of valve 1060, including dump valve port 1062 and discharge valve casing 1061.
Discharge valve diaphragm 1065 can be formed by material such as silicon rubber or its equivalent.Dump valve attracting board 1068 and dump valve
Yoke 1067 can be formed by such as dilval of the alloy with of a relatively high permeability.Discharge valve coil 1069 can be by the copper cash that winds
Or other call wires are formed.Discharge valve casing 1061 can be formed by the makrolon of such as glass-filled of the material based on polymer.
Dump valve is worked by being preloaded with minimum, and minimum preloads is pressed against valve port by barrier film, to ensure that valve is starting
Closed before suction.Preloading can be selected by using the diaphragm material with enough modulus of elasticity so that barrier film is assembling
State keeps engaging relative to valve port.In certain embodiments, dump valve may also include the non magnetic compression in electromagnetic assembly
Spring, it always promotes attracting board.In this scheme, barrier film will be designed to as far as possible flexible, and preload can be according to normal with spring
The tolerance that number and drift are associated changes.
Because the electromagnetism dump valve operates in micropump, micropump is driven itself by electromagnetic force, therefore needs to consider by inhaling
The overall magnetic field of corbel back slab experience.Valve diaphragm should be sufficiently rigid without being influenceed by this periphery magnetic force.That is, barrier film should be via connection
Unwanted displacement is resisted in the interaction between attracting board and periphery magnetic field on to barrier film.In addition, harder barrier film needs
Local magnetic field that will be stronger makes itself and attracting board displacement.Realize that a kind of method of desired local magnetic field is to optimize dump valve
Coil turn in coil.Larger coil turn can be realized by increasing height or the diameter of overall electromagnet.Although increase
Height is that more space-efficient (assuming that can prevent that the bus length that must skip to the line of relatively low specification is lower, get over by resistance increase
Slowly), but increase external diameter may also provide for the space of more multi-coil, and this can more efficiently use available closing space.
In certain embodiments, the maximum current available for electromagnet is assumed to 300mA.This is based on battery (1C max)
The limit.If source obtains more high current, it is assumed that the resistance to micropump using 3.0V minimum cell voltage, then component
(current 10-12ohm) must also reduce.Generally, the current drain of dump valve should monitor according to the application of micropump.
Term " dump valve " as used herein is generally referred to for controlling or limiting the pressure in system or container
The type of valve.This valve is alternatively referred to as relief valve, safety valve etc., and some embodiments herein covers such valve, but regardless of it such as
What is named.
Figure 13 A and 13B show the different views of the lower pump body 1011b according to some embodiments.Lower pump body 1011b includes
Form the otch of barrier film spacer 1053.The edge of the EDGE CONTACT barrier film spacer 1053 of barrier film, and therefore with actuator
Actuator membrane is spaced apart, and actuator is attached on lower pump body 1011b downside.
Figure 14 A, 14B and 14C show the different views of the upper pump casing 1011a according to some embodiments.Upper pump casing 1011a
Including upper pump casing passage 1008, port 1012 and 1014 is connected to upper pump casing 1011a sensor region and dump valve area by it
Domain.Upper pump casing 1011a includes seal feature 1206.The upper pump casing 1011a's of the generally external treatment fluid of seal feature 1206
Region upper pump casing 1011a region.Seal feature 1206 can be riser region, e.g., convex ridge, its with the mutual mechanism of packing ring with
Form the reliable sealing around fluid treatment zone.
Figure 15 A, 15B and 15C show the different views of the upper valve assembly body 1200a according to some embodiments.Upper valve group
Part body 1200a includes being similar to herein port, recess and the branch pipe of those elsewhere.Figure 15 A depict upper valve assembly body
The translucent perspective view of 1200a lower surface, and Figure 15 B depict the plan view of the similar face.Upper valve assembly body 1200a
Including inlet valve recess 1021a and outlet valve recess 1021b, its provide be respectively used to inlet valve and outlet valve seat against position
Put.Inlet valve and outlet valve interact with upper inlet room port 1203a and upper outlet room port 1203b, to provide this paper institutes
The valve pump action stated.In addition, upper valve assembly body 1200a includes outlet port branch pipe 1201b.Seal feature 1206 is present in
On the valve module body 1200a lower surface, improved sealing and entrance area and outlet are provided with downward valve module packing ring 1205b
The separation in region.Figure 15 C depict upper valve assembly body 1200a upper surface, and it has upper inlet room port 1203a and upper outlet
Room port 1203b.Seal feature 1206 is present on the upper valve assembly body 1200a upper surface, with upward valve module packing ring
1205a provides separating for improved sealing and entrance area and exit region.
Figure 16 A and 16B show the different views of the lower valve assembly body 1200b according to some embodiments.Figure 16 A are depicted
The translucent view of lower valve assembly body 1200b upper surface, and Figure 16 B depict the plan view of the similar face.Lower valve group
Part body 1200b includes inlet valve recess 1021a and outlet valve recess 1021b, and it, which is each provided, is respectively used to inlet valve and goes out
Mouth valve seats against position.Inlet valve and outlet valve interact with lower inlet room port 1202a and lower downstream chamber port 1202b,
To provide valve pump action as described herein.In addition, upper valve assembly body 1200a includes ingress port branch pipe 1201a.Seal feature
1206 are present on the lower valve assembly body 1200b upper surface, provide improved sealing with downward valve module packing ring 1205b and enter
Mouth region domain and the separation of exit region.
Although the present invention is described with reference to certain embodiments, it will be appreciated by those skilled in the art that can produce
Various change and equivalent is replaceable, and without departing from the scope of the present invention.In addition, many remodeling can be produced to make specific feelings
Shape or material are suitable to the teachings of the present invention content, without departing from its scope.Therefore, it is desirable to the invention is not restricted to be disclosed as spy
Determine embodiment, but it is of the invention by all embodiments including falling within the scope of the appended claims.
Claims (19)
1. a kind of micropump, including:
Voice coil actuators [15], it includes supporting member [5], magnet coil [3] and pole magnet [7], wherein the magnet coil
It is connected on the supporting member;
Barrier film [55], it is connected on the supporting member, wherein the motion of the supporting member drives institute relative to room [54]
State the motion in barrier film;And
Permanent magnet [57], is connected on the barrier film.
2. micropump according to claim 1, wherein the permanent magnet and the pole magnet are separated with the first distance, it is described
First distance increases to second distance when the magnet coil repels the pole magnet.
3. micropump according to claim 1, wherein each magnetic pole arrangement in the pole magnet and the permanent magnet
It is attracted to each other into the pole magnet and the permanent magnetism ferromagnetism is caused.
4. micropump according to claim 1, wherein in the space of the pole magnet and the permanent magnet between them
It is disposed with the magnet coil.
5. micropump according to claim 1, the micropump also includes being used for the position for dynamically controlling the barrier film
Processor [224].
6. micropump according to claim 5, wherein the processor response dynamically controlled in the data measured it is described
Barrier film.
7. micropump according to claim 5, the micropump also include for measurement data sensor [80,
1080]。
8. according to the micropump described in claim 6 or claim 7, wherein the data are pressure.
9. according to the micropump described in claim 6 or claim 7, wherein the data are diaphragm position.
10. micropump according to claim 5, wherein the processor dynamically controls the direct current offset in electric signal.
11. micropump according to claim 5, wherein the processor dynamically controls the DC current gain in electric signal.
12. micropump according to claim 1, the micropump also includes being used for the processor for starting automatic start process
[224]。
13. micropump according to claim 12, sensor that the micropump also includes being used for measuring pressure [80,
1080]。
14. micropump according to claim 13, wherein the processor response is in the pressure measured by the sensor
Change to start the automatic start process.
15. micropump according to claim 13, wherein the processor response is in the pressure measured by the sensor
Change to close the pump.
16. according to the micropump described in claim 1 or claim 15, the micropump also includes dump valve [60,1060].
17. micropump according to claim 16, wherein the dump valve is opened in response to the temperature change measured.
18. micropump according to claim 1, wherein the permanent magnet the barrier film it is reciprocal during keep with it is described
The fixed range of magnet coil.
19. micropump according to claim 1, wherein the permanent magnet and the pole magnet are separated by a distance, and institute
It is adjustable via adjustment part to state distance.
Applications Claiming Priority (5)
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US201361871832P | 2013-08-29 | 2013-08-29 | |
US61/871,832 | 2013-08-29 | ||
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US61/993,041 | 2014-05-14 | ||
PCT/US2014/052430 WO2015031216A1 (en) | 2013-08-29 | 2014-08-24 | Pumps, actuators and related devices and methods for making |
Publications (1)
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CN107407270A true CN107407270A (en) | 2017-11-28 |
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CN201480060091.6A Pending CN107407270A (en) | 2013-08-29 | 2014-08-24 | Pump, actuator and relevant apparatus and the method for making |
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US (1) | US20160298620A1 (en) |
EP (1) | EP3039295A4 (en) |
CN (1) | CN107407270A (en) |
CA (2) | CA2922610C (en) |
WO (1) | WO2015031216A1 (en) |
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2014
- 2014-08-24 WO PCT/US2014/052430 patent/WO2015031216A1/en active Application Filing
- 2014-08-24 US US14/913,815 patent/US20160298620A1/en not_active Abandoned
- 2014-08-24 CN CN201480060091.6A patent/CN107407270A/en active Pending
- 2014-08-24 CA CA2922610A patent/CA2922610C/en not_active Expired - Fee Related
- 2014-08-24 EP EP14839004.0A patent/EP3039295A4/en not_active Withdrawn
- 2014-08-24 CA CA2975210A patent/CA2975210A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
---|---|
WO2015031216A1 (en) | 2015-03-05 |
US20160298620A1 (en) | 2016-10-13 |
CA2975210A1 (en) | 2015-03-05 |
EP3039295A1 (en) | 2016-07-06 |
CA2922610A1 (en) | 2015-03-05 |
WO2015031216A9 (en) | 2015-10-15 |
EP3039295A4 (en) | 2017-07-05 |
CA2922610C (en) | 2017-11-14 |
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Application publication date: 20171128 |