CN107403874B - 制备阴极环防反射膜用的掩膜及其使用方法 - Google Patents
制备阴极环防反射膜用的掩膜及其使用方法 Download PDFInfo
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- CN107403874B CN107403874B CN201710365617.7A CN201710365617A CN107403874B CN 107403874 B CN107403874 B CN 107403874B CN 201710365617 A CN201710365617 A CN 201710365617A CN 107403874 B CN107403874 B CN 107403874B
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- mask
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- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000000694 effects Effects 0.000 claims abstract description 10
- 230000003014 reinforcing effect Effects 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 238000009792 diffusion process Methods 0.000 claims description 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 238000001259 photo etching Methods 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 230000009286 beneficial effect Effects 0.000 abstract description 3
- 238000005457 optimization Methods 0.000 abstract description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000010549 co-Evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
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Claims (4)
Priority Applications (1)
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CN201710365617.7A CN107403874B (zh) | 2017-05-22 | 2017-05-22 | 制备阴极环防反射膜用的掩膜及其使用方法 |
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CN201710365617.7A CN107403874B (zh) | 2017-05-22 | 2017-05-22 | 制备阴极环防反射膜用的掩膜及其使用方法 |
Publications (2)
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CN107403874A CN107403874A (zh) | 2017-11-28 |
CN107403874B true CN107403874B (zh) | 2020-03-17 |
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CN201710365617.7A Active CN107403874B (zh) | 2017-05-22 | 2017-05-22 | 制备阴极环防反射膜用的掩膜及其使用方法 |
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CN (1) | CN107403874B (zh) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101752401A (zh) * | 2008-12-11 | 2010-06-23 | 奇晶光电股份有限公司 | 双面显示装置及其制造方法 |
CN104020902A (zh) * | 2014-05-22 | 2014-09-03 | 京东方科技集团股份有限公司 | 一种触摸屏及显示装置 |
CN104701338A (zh) * | 2013-12-09 | 2015-06-10 | 昆山国显光电有限公司 | 一种有机发光显示器件及其掩膜板 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003234066A (ja) * | 2002-02-07 | 2003-08-22 | Toshiba Corp | シャドウマスクの製造方法およびシャドウマスク製造用耐エッチング層塗布装置 |
FR2977720A1 (fr) * | 2011-07-08 | 2013-01-11 | Commissariat Energie Atomique | Dispositif optoelectronique organique et son procede d'encapsulation. |
CN102591134B (zh) * | 2012-03-15 | 2015-05-13 | 昆山维信诺显示技术有限公司 | 掩膜板及其制备方法 |
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2017
- 2017-05-22 CN CN201710365617.7A patent/CN107403874B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101752401A (zh) * | 2008-12-11 | 2010-06-23 | 奇晶光电股份有限公司 | 双面显示装置及其制造方法 |
CN104701338A (zh) * | 2013-12-09 | 2015-06-10 | 昆山国显光电有限公司 | 一种有机发光显示器件及其掩膜板 |
CN104020902A (zh) * | 2014-05-22 | 2014-09-03 | 京东方科技集团股份有限公司 | 一种触摸屏及显示装置 |
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CN107403874A (zh) | 2017-11-28 |
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Effective date of registration: 20210824 Address after: 518000 706, block w2-a, Gaoxin industrial storage, No. 025, Gaoxin South Fourth Road, Gaoxin community, Yuehai street, Nanshan District, Shenzhen, Guangdong Province Patentee after: Shenzhen Shouda Hengxin technology partnership (L.P.) Address before: 518000 Room 302, building 2, chunhaian Yaju, No. 4, Gaoxin South Ring Road, Nanshan District, Shenzhen, Guangdong Patentee before: Bu Dan Effective date of registration: 20210824 Address after: 518000 Room 302, building 2, chunhaian Yaju, No. 4, Gaoxin South Ring Road, Nanshan District, Shenzhen, Guangdong Patentee after: Bu Dan Address before: 518000 floor 44, Xinhao e Du, 7018 CaiTian Road, Futian District, Shenzhen, Guangdong Patentee before: Sheng Sheng |
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Effective date of registration: 20210917 Address after: 210000 room 603, building C, Xingzhi science and Technology Park, No. 6, Xingzhi Road, Nanjing Economic and Technological Development Zone, Jiangsu Province Patentee after: Nanjing Ruixian Electronic Technology Co.,Ltd. Address before: 518000 706, block w2-a, Gaoxin industrial storage, No. 025, Gaoxin South Fourth Road, Gaoxin community, Yuehai street, Nanshan District, Shenzhen, Guangdong Province Patentee before: Shenzhen Shouda Hengxin technology partnership (L.P.) |
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