CN107390419A - The preparation method and inkjet-printing device of color membrane substrates - Google Patents
The preparation method and inkjet-printing device of color membrane substrates Download PDFInfo
- Publication number
- CN107390419A CN107390419A CN201710645586.0A CN201710645586A CN107390419A CN 107390419 A CN107390419 A CN 107390419A CN 201710645586 A CN201710645586 A CN 201710645586A CN 107390419 A CN107390419 A CN 107390419A
- Authority
- CN
- China
- Prior art keywords
- black matrix
- substrate
- mask plate
- shower nozzle
- inkjet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J3/00—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed
- B41J3/407—Typewriters or selective printing or marking mechanisms characterised by the purpose for which they are constructed for marking on special material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/0041—Digital printing on surfaces other than ordinary paper
- B41M5/0047—Digital printing on surfaces other than ordinary paper by ink-jet printing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a kind of preparation method of color membrane substrates and inkjet-printing device.Preparation method includes：Mask plate contraposition is arranged in substrate, mask plate is provided with void region, and void region is corresponding with setting the position of black matrix in substrate；Black matrix photoresist is sprayed to the void region of mask plate, black matrix is formed in substrate；Curing process is carried out to black matrix.Inkjet-printing device includes：Base station, the substrate of mask plate is set for carrying contraposition；First shower nozzle, the top of base station is arranged on, for spraying black matrix photoresist to the void region of mask plate, black matrix is formed in substrate.The embodiment of the present invention solves the problems, such as the material caused by forming black matrix using coating and photoetching process, manufacturing cost height, low production efficiency by inkjet technology formation black matrix.Equipment and material cost are saved, simplifies processing step, improves production efficiency.
Description
Technical field
The present invention relates to display technology field, and in particular to the preparation method and inkjet-printing device of a kind of color membrane substrates.
Background technology
Color liquid crystal display arrangement (Thin Film Transistor-Liquid Crystal Display, TFT-LCD)
Key player, either TV, mobile phone, or handheld device, medical science display system are play in daily life,
TFT-LCD figure is all ubiquitous.Color film (Color Filter, CF) substrate is TFT-LCD important component,
Play a part of realizing colored display in TFT-LCD.
Color membrane substrates include the black matrix formed in substrate and the photoresist formed between black matrix.Existing skill
In art, the preparation method of color membrane substrates mainly has pigment dispersion method and ink-jet printing process.Wherein ink-jet printing process is sent out in recent years
Exhibition is rapid, is favored by its processing procedure is simple, production cost is low, saves the advantages that material by numerous display device manufacturers.
At present, ink-jet printing process prepare color membrane substrates main processing procedure it is as follows：Pigment dispersion method is used first in substrate
Black matrix photoresist is coated with, corresponding figure then is made in black matrix photoresist with photoetching process, forms black matrix；With
Gap spraying red, green, blue three coloured light resistance material of the method for inkjet printing between black matrix, forms red, green, blue photoresistance.
In existing processing procedure, due to employing coating and photoetching process when forming black matrix, therefore higher material cost is generated
And manufacturing cost, and production efficiency is relatively low.
The content of the invention
Technical problem to be solved of the embodiment of the present invention is to provide the preparation method and inkjet printing of a kind of color membrane substrates
Device, imitated with solving existing processing procedure material, manufacturing cost height, production caused by using coating and photoetching process formation black matrix
The problem of rate is low.
In order to solve the above-mentioned technical problem, the embodiments of the invention provide a kind of preparation method of color membrane substrates, including：
Mask plate contraposition is arranged in substrate, mask plate is provided with void region, and void region is black with being set in substrate
The position of matrix is corresponding；
Black matrix photoresist is sprayed to the void region of mask plate, black matrix is formed in substrate；
Curing process is carried out to black matrix.
Alternatively, the preparation method also includes：Chromatic photoresist is formed between the black matrix.
Alternatively, curing process is carried out to black matrix, including：Added using infrared type firing equipment or resistance-type heater
The heat black matrix, mask plate is removed after black matrix solidification.
Alternatively, heating-up temperature is 115 DEG C to 125 DEG C.
Alternatively, the black matrix photoresist includes carbon black.
The embodiment of the present invention additionally provides a kind of inkjet-printing device, including：
Base station, the substrate of mask plate is set for carrying contraposition；
First shower nozzle, the top of the base station is arranged on, for spraying black matrix photoresistance material to the void region of mask plate
Material, forms black matrix in substrate.
Alternatively, inkjet-printing device also includes firing equipment, and the firing equipment is arranged on base station or around base station,
For solidifying to black matrix.
Alternatively, the heating-up temperature of firing equipment is 115 DEG C to 125 DEG C.
Alternatively, the first shower nozzle includes：
First storage body, for storing black matrix photoresist；
First shunting body, it is connected by pipeline with the first storage body, for obtaining black matrix photoresistance material from the first storage body
Material；
Multiple first jets, it is arranged on first shunting body, for by the black matrix photoresistance material in the first shunting body
Material sprays to the void region of mask plate.
Alternatively, inkjet-printing device also includes the second shower nozzle, and second shower nozzle is arranged on the top of the base station, uses
In spraying chromatic photoresist material between the black matrix, chromatic photoresist is formed on the substrate.
The embodiments of the invention provide a kind of preparation method of color membrane substrates and inkjet-printing device, passes through inkjet printing skill
Art forms black matrix in substrate, solves existing processing procedure material, system caused by forming black matrix using coating and photoetching process
The problem of causing this height, low production efficiency.Compared with existing pigment dispersion method forms black matrix, automatic double surface gluer and photoetching are avoided
The use of equipment, large number quipments cost is saved, while save a large amount of black matrix photoresists and mask material, simplify work
Skill step, shorten preparation time.
Other features and advantages of the present invention will be illustrated in the following description, also, partly becomes from specification
Obtain it is clear that or being understood by implementing the present invention.Objectives and other advantages of the present invention can be by specification, right
Specifically noted structure is realized and obtained in claim and accompanying drawing.
Brief description of the drawings
Accompanying drawing is used for providing further understanding technical solution of the present invention, and a part for constitution instruction, with this
The embodiment of application is used to explain technical scheme together, does not form the limitation to technical solution of the present invention.
Fig. 1 is the flow chart of the preparation method of color membrane substrates of the embodiment of the present invention；
Fig. 2 is the structural representation that mask plate contraposition is arranged in substrate；
Fig. 3 is the structural representation of second embodiment of the invention inkjet-printing device；
Fig. 4 is the structural representation of third embodiment of the invention inkjet-printing device.
Description of reference numerals：
10- substrates；20- mask plates；21- void regions；
31 one the first storage bodies；The shunting bodies of 32- first；33- first jets；
41- second stores body；The shunting bodies of 42- second；43- second nozzles.
Embodiment
For the object, technical solutions and advantages of the present invention are more clearly understood, below in conjunction with accompanying drawing to the present invention
Embodiment be described in detail.It should be noted that in the case where not conflicting, in the embodiment and embodiment in the application
Feature can mutually be combined.
First embodiment：
The embodiments of the invention provide a kind of preparation method of color membrane substrates, Fig. 1 is color membrane substrates of the embodiment of the present invention
The flow chart of preparation method, the preparation method include：
S1：Mask plate contraposition is arranged in substrate, mask plate is provided with void region, and void region in substrate with setting
The position of black matrix is corresponding；
S2：Black matrix photoresist is sprayed to the void region of mask plate, black matrix is formed in substrate；
S3：Curing process is carried out to black matrix.
In one embodiment, the preparation method can also include：Chromatic photoresist is formed between black matrix.
Wherein, curing process is carried out to black matrix, is specially：The black matrix on substrate is solidified using firing equipment, so
After remove mask plate.Preferably, firing equipment uses infrared type firing equipment or resistance-type heater.Heating-up temperature is 115
DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds hardening times.
Wherein, black matrix photoresist includes carbon black.
The preparation method of the color membrane substrates of the embodiment of the present invention will be discussed in detail by specific implementation process below.
Mask plate contraposition is arranged in substrate, mask plate is provided with void region, and void region is black with being set in substrate
The position of matrix is corresponding, and Fig. 2 is the structural representation that mask plate contraposition is arranged in substrate.Specific implementation process includes：Carry
For mask plate 20 and substrate 10, the first alignment mark is provided with outside the viewing area of substrate 10, is provided with mask plate 20
Second alignment mark corresponding with the first alignment mark, by the way that the second alignment mark and the first alignment mark are aligned, so as to
Mask plate 20 is aligned into setting on the substrate 10.Figure it is seen that void region 21, vacancy section are provided with mask plate 20
Domain 21 is corresponding with setting the position of black matrix in substrate 10.In the present embodiment, substrate is preferably glass, the first alignment mark
It can be made up of the metal such as molybdenum (Mo), aluminium (A1), copper (Cu) through array processes photoetching.Mask plate can be by metal or resin
It is made Deng material, the void region of mask plate can be made up of photoetching or laser ablation process.
Black matrix photoresist is sprayed to the void region of mask plate, black matrix, specific implementation process are formed in substrate
Including：The substrate that contraposition is set to mask plate is placed on the base station of inkjet-printing device, the hollow out with shower nozzle to mask plate
Region spray black matrix photoresist, black matrix photoresist oozed by the void region on mask plate it is basad, with substrate
Surface contacts, so as to form black matrix in substrate.Wherein, black matrix photoresist includes carbon black.Spray black matrix photoresistance material
The quantity of the shower nozzle of material can determine according to being actually needed, and be not specifically limited herein.
Curing process is carried out to black matrix, specific implementation process includes：The black matrix in substrate is consolidated using firing equipment
Change, remove mask plate after black matrix solidification.Firing equipment can use infrared type heating or resistance-type to heat, and heating-up temperature is
115 DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds hardening times.Retain mask plate when black matrix solidifies and be advantageous to black square
The stabilization of battle array, prevents black matrix from being deformed before curing or in solidification process, ensure that the making precision of black matrix.
Chromatic photoresist is formed between black matrix, colour equally can be formed between black matrix using inkjet technology
Photoresistance, naturally it is also possible to select other methods to form chromatic photoresist, coloured silk is formed between black matrix when using inkjet technology
When coloured light hinders, detailed process includes：Chromatic photoresist material is sprayed to the gap between black matrix form chromatic photoresist with shower nozzle,
During spraying, it is ensured that the position of shower nozzle is corresponding with the position where chromatic photoresist；After chromatic photoresist is formed, use
Firing equipment solidifies chromatic photoresist.In the present embodiment, chromatic photoresist is respectively red (R) photoresistance, green (G) photoresistance and indigo plant
Color (B) photoresistance.When spraying tri- kinds of photoresists of R, G, B, tri- kinds of photoresistance materials of R, G, B can be sprayed respectively using three shower nozzles
Material, can also spray tri- kinds of photoresists of R, G, B successively using a shower nozzle.R, G, B tri- is sprayed respectively when using three shower nozzles
It is during kind of photoresist, the position of three shower nozzles is corresponding with the position where R, G, B photoresistance respectively, three shower nozzles simultaneously or according to
R, G, B photoresist corresponding to secondary spraying.When spraying tri- kinds of photoresists of R, G, B successively using a shower nozzle, use first
Shower nozzle forms R photoresistances in R photoresistances corresponding position spraying R photoresists, and shower nozzle is cleaned after the completion of spraying；Then, after
It is continuous that G photoresistances are formed in G photoresistances corresponding position spraying G photoresists using same shower nozzle, shower nozzle is carried out after the completion of spraying
Cleaning；Finally, B photoresists are sprayed in B photoresistances corresponding position using same shower nozzle and forms B photoresistances, it is right after the completion of spraying
Shower nozzle is cleaned, in case next time uses.After R, G, B photoresistance are formed, three kinds of photoresistances are solidified using firing equipment.Heating is set
Standby preferably use infrared heating equipment or resistance-type heater, heating-up temperature is 115 DEG C to 125 DEG C, preferably 120 DEG C,
20 to 30 seconds hardening times.In the present embodiment, the solidification of R photoresistances, G photoresistances and B photoresistances is carried out simultaneously, it is of course also possible to right
Three kinds of photoresistances are solidified respectively, such as after formation R photoresistances, R photoresistances are solidified；After forming G photoresistances, G photoresistances are carried out
Solidification；After forming B photoresistances, B photoresistances are solidified.Herein, specific shower nozzle quantity is not defined, the tool of shower nozzle
Body usage quantity can determine according to being actually needed.
During actual implementation, chromatic photoresist can also be prepared by the way of black matrix is prepared, by chromatic photoresist mask plate pair
Position is arranged in substrate, and chromatic photoresist mask plate is provided with void region, void region and the position that chromatic photoresist is set in substrate
Put it is corresponding, to chromatic photoresist mask plate void region spray chromatic photoresist material, chromatic photoresist is formed in substrate.Use
Chromatic photoresist mask plate is advantageous to improve the making precision of chromatic photoresist.When the embodiment of the present invention color membrane substrates be used for distort to
It is color when in the display device of (Twisted Nematic, the TN) type of arranging or vertical orientated (Vertical Alignment, VA) type
The preparation method of ilm substrate is additionally may included in black matrix and the surface of chromatic photoresist forms indium tin oxide (Indium Tin
Oxide, ITO) film, ito thin film can use sputtering method be formed.If the color membrane substrates of the embodiment of the present invention are used to put down
Face conversion (In Plane Switching, IPS) or fringe field switching (Fringe Field Switching, FFS) type is shown
In device, then ito thin film need not be formed.Furthermore it is also possible to form outer coating (Over coat) in substrate surface as needed
Or separaant (Photo Spacer).
The preparation method of color membrane substrates provided in an embodiment of the present invention, formed by using ink-jet printing process in substrate black
Matrix, solve existing processing procedure material caused by forming black matrix using coating and photoetching process, manufacturing cost height, production effect
The problem of rate is low.Compared with existing pigment dispersion method forms black matrix, the use of automatic double surface gluer and lithographic equipment is avoided, is saved
Large number quipments costs, while save a large amount of black matrix photoresists and mask material, simplify processing step, shorten system
The standby time.
Second embodiment：
The embodiment of the present invention proposes a kind of inkjet-printing device of color membrane substrates, and Fig. 3 sprays for second embodiment of the invention
The structural representation of black printing equipment.The inkjet-printing device includes base station (not shown), the first shower nozzle and firing equipment
(not shown).Base station is used to carry the substrate that contraposition sets mask plate, and the first shower nozzle is arranged on the top of base station, is used for
Black matrix photoresist is sprayed to the void region of mask plate, firing equipment is arranged on base station or around base station, for heating
Solidify black matrix, heating-up temperature be 115 DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds heat times.Firing equipment is preferably
Infrared type firing equipment or resistance-type heater.Firing equipment in the present embodiment belongs to a part for inkjet-printing device,
It is of course also possible to firing equipment and inkjet-printing device split are designed.
In this embodiment, it is preferred that the first shower nozzle can move relative to base station, the first shower nozzle can be filled by mobile
Put and be connected with base station, in the presence of mobile device, the first shower nozzle can be moved to the top of the void region of mask plate, so as to
Preferably black matrix photoresist is sprayed to void region.
From figure 3, it can be seen that the first shower nozzle includes the first storage body 31, the first shunting body 32, multiple first jets 33
And the pipeline for connecting the first storage body 31 with the first shunting body 32.First storage body 31 is used to store black matrix photoresistance material
Material, the first shunting body 32 obtain black matrix photoresist by pipeline from the first storage body 31, and multiple first jets 33 are arranged on
On first shunting body 32, and the black matrix photoresist in the first shunting body 32 is sprayed to the void region of mask plate.Easily
Understanding, the particular number of first jet can determine according to the pixel rows/columns quantity on color membrane substrates, such as when color film base
When often row has M pixel on plate, the quantity of corresponding often row black matrix is M+1, at this point it is possible to which the quantity of first jet is set
It is set to M+1, so that the quantity of first jet and the quantity of black matrix match, improves production efficiency.Specifically used
In, in order to further improve the producing efficiency of black matrix, multiple first shower nozzles can be used as needed.
The inkjet-printing device of the embodiment of the present invention can also include the second shower nozzle, and the second shower nozzle is also disposed at the upper of base station
Side, for forming chromatic photoresist to spraying chromatic photoresist material between black matrix.Preferably, the second shower nozzle can be with relative to base station
Mobile, the second shower nozzle can be connected by mobile device with base station, and in the presence of mobile device, the second shower nozzle can be moved to
The top of corresponding chromatic photoresist position, preferably to spray chromatic photoresist material.
From figure 3, it can be seen that the second shower nozzle includes the second storage body 41, the second shunting body 42, multiple second nozzles 43
And the pipeline for connecting the second storage body 41 with the second shunting body 42.Second storage body 41 is used to store chromatic photoresist material,
Second shunting body 42 obtains chromatic photoresist material by pipeline from the second storage body, and multiple second nozzles 43 are arranged on the second shunting
On body 42, and by the chromatic photoresist material spraying in the second shunting body 42 between black matrix.Now, heater is also used for adding
Heat cure chromatic photoresist, heating-up temperature be 115 DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds heat times.It is readily appreciated that
It is that the particular number of second nozzle can also determine according to the corresponding number of pixels on color membrane substrates, so that second
The quantity of nozzle and the quantity of respective pixel match, and improve production efficiency.
In the present embodiment, respectively red (R) photoresistance of chromatic photoresist, green (G) photoresistance and blue (B) photoresistance, first
The quantity of shower nozzle and the second shower nozzle 11 is set as 1.Illustrate the spray of the embodiment of the present invention below in conjunction with specific implementation process
The use principle of black printing equipment.
The substrate 10 for setting mask plate 20 will be aligned fixed on base station, mask plate is set in corresponding black matrix opening position
There is void region.
First shower nozzle is moved to above void region, and to void region spray black photoresist, black photoresist
Oozed by void region basad, contacted with the surface of substrate, so as to form black matrix in substrate；Firing equipment starts, right
Black matrix is solidified, heating-up temperature be 115 DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds heat times；Solidification is completed
Afterwards, mask plate is removed.
After black matrix is formed, R photoresists are added first into the second shower nozzle, the second shower nozzle is moved on R photoresistances position
Side, spray R photoresists to R photoresistances position and form R photoresistances, after the completion of spraying, the second shower nozzle is cleaned；To the second shower nozzle
Middle addition G photoresists, the second shower nozzle are moved to above G photoresistances position, and spraying G photoresists to G photoresistances position forms G light
Resistance, after the completion of spraying, is cleaned to the second shower nozzle；B photoresists are added into the second shower nozzle, the second shower nozzle is moved to B light
Hinder above position, spraying B photoresists to B photoresistances position forms B photoresistances, and after the completion of spraying, the second shower nozzle is cleaned, with
Standby next time uses.After tri- kinds of photoresistances of R, G, B are formed, firing equipment starts, and tri- kinds of photoresistances of R, G, B are solidified, heating temperature
Spend for 115 DEG C to 125 DEG C, preferably 120 DEG C, 20 to 30 seconds heat times.In the present embodiment, R photoresistances, G photoresistances and B photoresistances
Solidification carry out simultaneously, it is of course also possible to solidify respectively to three kinds of photoresistances, such as after forming R photoresistances, R photoresistances are carried out
Solidification；After forming G photoresistances, G photoresistances are solidified；After forming B photoresistances, B photoresistances are solidified.
3rd embodiment：
For the embodiment of the present invention unlike second embodiment, the quantity of the second shower nozzle in the present embodiment can be according to coloured silk
The species setting of coloured light resistance, for example, the chromatic photoresist of the color membrane substrates in the present embodiment is respectively red (R) photoresistance, green (G)
Photoresistance and blue (B) photoresistance, then, the quantity of the second shower nozzle can be set as 3, in order to better discriminate between, herein with second
Shower nozzle R, the second shower nozzle G and the second shower nozzle B represent the second shower nozzle for spraying R, G, B photoresist respectively.Fig. 4 is the present invention
The structural representation of the inkjet-printing device of 3rd embodiment.
Preferably, the second shower nozzle R in the present embodiment, the second shower nozzle G and the second shower nozzle B can move relative to base station
It is dynamic, it is connected by mobile device with base station, in the presence of mobile device, 3 the second shower nozzles can be moved respectively to correspondingly
Chromatic photoresist position top, preferably to spray chromatic photoresist material.
In the present embodiment, it is identical with second embodiment to make the principle of black matrix, will not be repeated here.This reality is described below
Apply the Principle of Process that inkjet-printing device in example makes R, G, B photoresistance.
R, G, B photoresist have been separately added into second shower nozzle R, the second shower nozzle G and the second shower nozzle B.When black matrix is formed
Afterwards, the second shower nozzle R is moved to above R photoresistances position, and basad upper R photoresistances position spraying R photoresists form R photoresistances, spraying
After the completion of, the second shower nozzle G is moved to above G photoresistances position, and basad upper G photoresistances position spraying G photoresists form G photoresistances,
After the completion of spraying, the second shower nozzle B is moved to above B photoresistances position, and basad upper B photoresistances position spraying B photoresists form B light
Resistance, after the completion of spraying, firing equipment starts, and tri- kinds of photoresistances of R, G, B are solidified.In the present embodiment, tri- kinds of light of R, G and B
The solidification of resistance is carried out simultaneously, it is of course also possible to solidify respectively to three kinds of photoresistances, for example, after forming R photoresistances, R photoresistances are entered
Row solidification；After forming G photoresistances, G photoresistances are solidified；After forming B photoresistances, B photoresistances are solidified.
In the present embodiment, the second shower nozzle R, the second shower nozzle G and the second shower nozzle B spray corresponding photoresist successively, are having
During body is implemented, photoresist corresponding to the second shower nozzle R, the second shower nozzle G and the second shower nozzle B while spraying can also be made, to enter one
Step improves production efficiency.
In the description of the embodiment of the present invention, it is to be understood that term " middle part ", " on ", " under ", "front", "rear",
The orientation or position relationship of the instruction such as " vertical ", " level ", " top ", " bottom " " interior ", " outer " be based on orientation shown in the drawings or
Position relationship, it is for only for ease of and describes the present invention and simplify description, rather than indicates or imply that signified device or element must
There must be specific orientation, with specific azimuth configuration and operation, therefore be not considered as limiting the invention.
, it is necessary to which explanation, unless otherwise clearly defined and limited, term " are pacified in the description of the embodiment of the present invention
Dress ", " connected ", " connection " should be interpreted broadly, for example, it may be fixedly connected or be detachably connected, or integratedly
Connection；Can be mechanical connection or electrical connection；Can be joined directly together, can also be indirectly connected by intermediary,
It can be the connection of two element internals.For the ordinary skill in the art, above-mentioned art can be understood with concrete condition
The concrete meaning of language in the present invention.
Although disclosed herein embodiment as above, described content be only readily appreciate the present invention and use
Embodiment, it is not limited to the present invention.Technical staff in any art of the present invention, taken off not departing from the present invention
On the premise of the spirit and scope of dew, any modification and change, but the present invention can be carried out in the form and details of implementation
Scope of patent protection, still should be subject to the scope of the claims as defined in the appended claims.
Claims (10)
- A kind of 1. preparation method of color membrane substrates, it is characterised in that including：Mask plate contraposition is arranged in substrate, the mask plate is provided with void region, the void region and the substrate The position of upper setting black matrix is corresponding；Black matrix photoresist is sprayed to the void region of the mask plate, forms black matrix on the substrate；Curing process is carried out to the black matrix.
- 2. preparation method according to claim 1, it is characterised in that also include：Formed between the black matrix colored Photoresistance.
- 3. preparation method according to claim 1, it is characterised in that described that curing process, bag are carried out to the black matrix Include：The black matrix is heated using infrared type firing equipment or resistance-type heater, mask is removed after the black matrix solidification Version.
- 4. preparation method according to claim 3, it is characterised in that heating-up temperature is 115 DEG C to 125 DEG C.
- 5. preparation method according to claim 1, it is characterised in that the black matrix photoresist includes carbon black.
- A kind of 6. inkjet-printing device, it is characterised in that including：Base station, the substrate of mask plate is set for carrying contraposition；First shower nozzle, the top of the base station is arranged on, for spraying black matrix photoresistance material to the void region of the mask plate Material, forms black matrix on the substrate.
- 7. inkjet-printing device according to claim 6, it is characterised in that the inkjet-printing device is also set including heating Standby, the firing equipment is arranged on base station or around base station, for solidifying to the black matrix.
- 8. inkjet-printing device according to claim 7, it is characterised in that the heating-up temperature of the firing equipment is 115 DEG C to 125 DEG C.
- 9. according to any described inkjet-printing device of claim 6 to 8, it is characterised in that first shower nozzle includes：First storage body, for storing black matrix photoresist；First shunting body, it is connected by pipeline with the described first storage body, for obtaining black matrix light from the described first storage body Hinder material；Multiple first jets, it is arranged on first shunting body, for by the black matrix photoresistance material in first shunting body Material sprays to the void region of the mask plate.
- 10. according to any described inkjet-printing device of claim 6 to 8, it is characterised in that described also including the second shower nozzle Second shower nozzle is arranged on the top of the base station, for spraying chromatic photoresist material between the black matrix, in the substrate Upper formation chromatic photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710645586.0A CN107390419A (en) | 2017-07-31 | 2017-07-31 | The preparation method and inkjet-printing device of color membrane substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710645586.0A CN107390419A (en) | 2017-07-31 | 2017-07-31 | The preparation method and inkjet-printing device of color membrane substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107390419A true CN107390419A (en) | 2017-11-24 |
Family
ID=60343306
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710645586.0A Pending CN107390419A (en) | 2017-07-31 | 2017-07-31 | The preparation method and inkjet-printing device of color membrane substrates |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107390419A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761893A (en) * | 2018-06-21 | 2018-11-06 | 京东方科技集团股份有限公司 | Display base plate and preparation method, the preparation method and display device of black matrix material |
| CN108963091A (en) * | 2017-12-26 | 2018-12-07 | 广东聚华印刷显示技术有限公司 | The production method of flexible quanta coloured silk film |
| CN110147015A (en) * | 2019-04-29 | 2019-08-20 | 武汉华星光电技术有限公司 | Display panel coating method and apparatus for coating |
| CN110346960A (en) * | 2019-07-02 | 2019-10-18 | 深圳市华星光电技术有限公司 | A kind of preparation method and applications of black matrix" on glass substrate |
| CN110739267A (en) * | 2019-09-12 | 2020-01-31 | 西北工业大学 | High-precision flexible microcircuit processing method based on printing and photoetching combined mode |
| CN112981315A (en) * | 2021-02-05 | 2021-06-18 | 惠州市聚飞光电有限公司 | Black matrix forming method, display module and display device |
| CN113885246A (en) * | 2020-07-03 | 2022-01-04 | 京东方科技集团股份有限公司 | Black matrix structure, manufacturing method thereof, display substrate and display device |
| CN114242850A (en) * | 2021-12-08 | 2022-03-25 | 广东省科学院半导体研究所 | Miniature LED finished product and preparation method thereof |
| CN114913559A (en) * | 2021-02-08 | 2022-08-16 | 苏州苏大维格科技集团股份有限公司 | Production device and preparation method of micro-lens array imaging assembly |
| CN114987064A (en) * | 2022-07-08 | 2022-09-02 | 武汉华星光电半导体显示技术有限公司 | Spraying equipment |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001074928A (en) * | 1998-12-09 | 2001-03-23 | Dainippon Printing Co Ltd | Color filter and its production |
| CN1825145A (en) * | 2005-02-24 | 2006-08-30 | 大日本网目版制造株式会社 | Manufacturing method of color filter |
| JP2007223321A (en) * | 2006-02-24 | 2007-09-06 | Boe Hydis Technology Co Ltd | Inkjet printer |
| KR20080059863A (en) * | 2006-12-26 | 2008-07-01 | 주식회사 케이씨텍 | Color filter formation apparatus |
| CN102854655A (en) * | 2012-09-25 | 2013-01-02 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
| CN105445996A (en) * | 2015-12-29 | 2016-03-30 | 昆山龙腾光电有限公司 | Making method for color filter substrate and color filter substrate |
-
2017
- 2017-07-31 CN CN201710645586.0A patent/CN107390419A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001074928A (en) * | 1998-12-09 | 2001-03-23 | Dainippon Printing Co Ltd | Color filter and its production |
| CN1825145A (en) * | 2005-02-24 | 2006-08-30 | 大日本网目版制造株式会社 | Manufacturing method of color filter |
| JP2007223321A (en) * | 2006-02-24 | 2007-09-06 | Boe Hydis Technology Co Ltd | Inkjet printer |
| KR20080059863A (en) * | 2006-12-26 | 2008-07-01 | 주식회사 케이씨텍 | Color filter formation apparatus |
| CN102854655A (en) * | 2012-09-25 | 2013-01-02 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
| CN105445996A (en) * | 2015-12-29 | 2016-03-30 | 昆山龙腾光电有限公司 | Making method for color filter substrate and color filter substrate |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108963091A (en) * | 2017-12-26 | 2018-12-07 | 广东聚华印刷显示技术有限公司 | The production method of flexible quanta coloured silk film |
| CN108761893B (en) * | 2018-06-21 | 2021-10-29 | 京东方科技集团股份有限公司 | Display substrate and preparation method thereof, preparation method of black matrix material and display device |
| CN108761893A (en) * | 2018-06-21 | 2018-11-06 | 京东方科技集团股份有限公司 | Display base plate and preparation method, the preparation method and display device of black matrix material |
| CN110147015A (en) * | 2019-04-29 | 2019-08-20 | 武汉华星光电技术有限公司 | Display panel coating method and apparatus for coating |
| CN110346960A (en) * | 2019-07-02 | 2019-10-18 | 深圳市华星光电技术有限公司 | A kind of preparation method and applications of black matrix" on glass substrate |
| CN110739267A (en) * | 2019-09-12 | 2020-01-31 | 西北工业大学 | High-precision flexible microcircuit processing method based on printing and photoetching combined mode |
| CN113885246A (en) * | 2020-07-03 | 2022-01-04 | 京东方科技集团股份有限公司 | Black matrix structure, manufacturing method thereof, display substrate and display device |
| US11960164B2 (en) | 2020-07-03 | 2024-04-16 | Ordos Yuansheng Optoelectronics Co., Ltd. | Black matrix structure and manufacturing method therefor, display substrate, and display device |
| CN112981315A (en) * | 2021-02-05 | 2021-06-18 | 惠州市聚飞光电有限公司 | Black matrix forming method, display module and display device |
| CN114913559A (en) * | 2021-02-08 | 2022-08-16 | 苏州苏大维格科技集团股份有限公司 | Production device and preparation method of micro-lens array imaging assembly |
| CN114913559B (en) * | 2021-02-08 | 2024-06-21 | 苏州苏大维格科技集团股份有限公司 | Production device and preparation method of microlens array imaging assembly |
| CN114242850A (en) * | 2021-12-08 | 2022-03-25 | 广东省科学院半导体研究所 | Miniature LED finished product and preparation method thereof |
| CN114987064A (en) * | 2022-07-08 | 2022-09-02 | 武汉华星光电半导体显示技术有限公司 | Spraying equipment |
| CN114987064B (en) * | 2022-07-08 | 2024-03-22 | 武汉华星光电半导体显示技术有限公司 | Spraying equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107390419A (en) | The preparation method and inkjet-printing device of color membrane substrates | |
| Lee et al. | Color filter patterned by screen printing | |
| CN100405092C (en) | Color filter and preparation method thereof | |
| CN101011882B (en) | Spraying head unit, product using the spraying head unit and manufacturing method thereof | |
| CN105867008B (en) | The preparation method of color membrane substrates and color membrane substrates, display panel | |
| CN101008733A (en) | Color filter and manufacture method therefor | |
| CN100510798C (en) | Patterned member and production method thereof | |
| WO2012060251A1 (en) | Method for producing color filter | |
| CN202486472U (en) | Liquid crystal display (LCD) panel and display device | |
| US20120293757A1 (en) | Liquid crystal display panel and color filter | |
| CN205553568U (en) | Ink -jet printer | |
| CN102707353B (en) | Color filter and method for producing same | |
| CN101025521A (en) | Liquid crystal device and electronic device | |
| CN101226252B (en) | Forming method for predetermined pattern, forming method for colored layer, and manufacturing method for electro-optical device | |
| CN109119444A (en) | A kind of display base plate and its manufacturing method | |
| CN106707629A (en) | Liquid crystal empty box and manufacturing method thereof, liquid crystal lens using liquid crystal box empty box | |
| JP2003156616A (en) | Color filter and method for manufacturing the same, liquid crystal device and electronic appliance | |
| CN101105632A (en) | Coating device and color filter production method | |
| JP2001286812A (en) | Application method of coloring agent | |
| CN202126516U (en) | Optical filter | |
| US20070120929A1 (en) | Ink Jet Process | |
| CN102368129B (en) | Manufacturing method of liquid crystal display | |
| Lu et al. | Fabricating high-resolution offset color-filter black matrix by integrating heterostructured substrate with inkjet printing | |
| CN105665247B (en) | The coating method of polyimide resin layer in a kind of display and its display module | |
| CN101344605A (en) | Colored filter and preparation thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20171124 |