CN107385409A - The film plating process and coating membrane system of selective solar heat absorption product - Google Patents
The film plating process and coating membrane system of selective solar heat absorption product Download PDFInfo
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- CN107385409A CN107385409A CN201710656119.8A CN201710656119A CN107385409A CN 107385409 A CN107385409 A CN 107385409A CN 201710656119 A CN201710656119 A CN 201710656119A CN 107385409 A CN107385409 A CN 107385409A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0676—Oxynitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Abstract
The film plating process and coating membrane system of selective solar heat absorption product, are related to thin-film-coating technical field, the film plating process comprises the following steps：（1）Stainless strip (SST) first passes through entry lock closed chamber (EC1)；（2）Stainless strip (SST) enters pretreating zone, and (P1) and/or reverse ise pretreatment (P2) are pre-processed using glow discharge；（3）Stainless strip (SST) enters sputter coating area, is coated with the sub- membrane system of inter coat (CL1-CLn) and dielectric layer (DL)；（4）Pass through exit lock room (EC2).Beneficial effects of the present invention：Selective solar heat absorption film coating possesses the good resistance of centering salt fog atmosphere made of the film plating process, and has the advantages that absorptivity is stable, transmitting ratio is stable, color change Δ E*ab indexs are small.
Description
Technical field
The present invention relates to a kind of vacuum coating decorative coating, more specifically refers to a kind of selective solar heat absorption
The film plating process and coating membrane system of product.
Background technology
For the application in solar thermal collector, wherein a kind of most common and most common technology of preparing be exactly
Selective solar heat absorption coating is coated with metallic strip substrate.Metallic strip substrate is most commonly used that aluminium base and Copper base material,
It can also be used in some applications and arrive stainless steel substrate.
The coating membrane system of selective solar heat absorption product is prepared using the method for vacuum coating, this method includes
A kind of structure of plural layers, a coating membrane system is formed with this.
Selective solar heat absorption coating includes an adhesion layer under normal circumstances, and the adhesion layer also possesses infrared
Increase the function of reflectivity in line wave-length coverage, one above adhesion layer includes one layer to sandwich construction of inter coat
Membrane system constructs effective absorbing coating, and another sub- membrane system above the sub- membrane system of this inter coat then arrives comprising one layer
The coating for being used to suppress reflex of sandwich construction（Anti-reflection layer）.
Trend prepared by current selective solar heat absorption coating is to apply composite.It is coated with this composite coating
A kind of common method be straight using reactive midfrequent AC and/or pulse on the alloy target material in compound or necessarily matched
Flow magnetron sputtering technique.The method that another kind prepares this composite coating is to use wherein to comprise more than a kind of composite wood of metal
The common sputtering technology of material, i.e., two distinct types of target carry out sputter coating simultaneously in same coating chamber.It is this
Technology is also occurred in the application of some other patent.
Current most of selective solar heat absorption coating products commercially having built up do not possess centering
Property salt fog atmosphere good resistance, even in other performance common manifestations preferably on those aluminium base products, centering salt fog
The resistance of atmosphere is also to compare in general.
The content of the invention
The present invention provides a kind of film plating process and coating membrane system of selective solar heat absorption product, it is therefore intended that solves
The problem of resistance of existing solar heat absorber coatings product centering salt fog atmosphere universal deviation.
The present invention adopts the following technical scheme that：
The film plating process of selective solar heat absorption product, vacuum coating system (VCS) used in the film plating process is successively
Including entry lock closed chamber (EC1), pretreating zone, sputter coating area and exit lock room (EC2)；The film plating process includes following step
Suddenly：（1）Stainless strip (SST) first passes through entry lock closed chamber (EC1), and entry lock closed chamber (EC1) is by using some single
Seal area ensures that gas pressure is reduced to high vacuum state step by step from atmospheric pressure；（2）Stainless strip (SST) enters pre- place
Area is managed, pretreating zone is using glow discharge pretreatment (P1) and/or reverse ise pretreatment (P2)；（3）Stainless strip
(SST) sputter coating area is entered；The sputter coating area includes the second sputtering zone (SP2) and the 3rd sputtering zone (SP3) successively,
In two sputtering zones (SP2), the sub- membrane system of inter coat (CL1-CLn) is coated with；In the 3rd sputtering zone (SP3), in inter coat
Dielectric layer (DL) is coated with sub- membrane system (CL1-CLn)；（4）By exit lock room (EC2), the exit lock room (EC2) passes through
Returned to using some individually seal areas to ensure that gas pressure increases step by step from vacuum state again under atmospheric pressure.
Further, in addition to uncoiler (UC), entrance band storage area (SS1), outlet band storage area (SS2) and wind
Machine (RC), the uncoiler (UC) is located on the outside of the feed end of vacuum coating system (VCS), by stainless strip (SST) coiled strip
In uncoiler (UC), stainless strip (SST) unreels out and enters the storage of entrance band from uncoiler (UC)
In area (SS1), then pass through entry lock closed chamber (EC1)；Export band storage area (SS2) going out at vacuum coating system (VCS)
Expect on the outside of end, after stainless strip (SST) is by exit lock room (EC2), furled again in receipts through exporting band storage area (SS2)
Volume machine (RC).
Further, the step（3）In, sputter coating area is additionally provided with the first sputtering zone before the second sputtering zone (SP2)
(SP1), in the first sputtering zone (SP1), an adhesion layer (AL) is coated with the surface of stainless strip (SST).
Further, the vacuum coating system (VCS) is additionally provided with electricity between sputter coating area and exit lock room (EC2)
Beamlet evaporating area (EB), the electron beam evaporation process of electron beam evaporation area (EB) can be used to come instead of using the 3rd sputtering zone
(SP3) it is coated with dielectric layer (DL).
Further, the stainless strip (SST) surface must oil-free, without fat, free from dust and other pollutants；Can
To be realized by carrying out degreasing, cleaning and heated-air drying processing to band before plated film.
Coating membrane system prepared by above-mentioned film plating process, including stainless strip (SST), it is coated with stainless strip (SST)
There are several immersion coatings, form the sub- membrane system of an inter coat (CL1-CLn)；And several immersion coatings are by metal
A and metal B mixture form, and it is partly to being reacted completely with nitrogen N, the use of chemical formula is (MeA:MeB)Nx；This
In (MeA:MeB) the ratio between metal A and metal B, Nx index X are the reaction coefficient with nitrogen N；Two neighboring chemical combination
The component ratio of thing coating is different, can be metal A and metal B mixed proportion (MeA:MeB) different or reaction system
Number X is different, also or neither same；Plating is formed with dielectric layer (DL) on the sub- membrane system of inter coat (CL1-CLn).
Further, the mixed proportion of the metal A and metal B can be with simple metal A (100% MeA: 0% MeB)
It is leading, with simple metal B (0% MeA:100% MeB) for any ratio between leading or both；, should in chemical formula
Reaction coefficient X can change between X=0 and X=1.
Further, the metal A is pure chromium Cr, and metal B is pure silicon Si, silicochromium (Si/Cr) or silico-aluminum
(Si/Al), corresponding compound layer chemical formula is (Cr:Si)Nx、(Cr:Si/Al) Nx or (Cr:Si/Cr)Nx.
Further, also plating is formed with attachment between the stainless strip (SST) and the sub- membrane system of inter coat (CL1-CLn)
Layer (AL), the adhesion layer (AL) are the chromium Cr that by pure chromium Cr or is slightly reacted with oxygen or nitrogen.
Further, above-mentioned dielectric layer (DL) is silica SiO2, silicon nitride Si3N4 or both mixture
(SiOxNy)。
From the above-mentioned description to structure of the present invention, compared to the prior art, the invention has the advantages that：
Film plating process in the present invention comprises the following steps：（1）Stainless strip (SST) first passes through entry lock closed chamber (EC1), really
Protect gas pressure and be reduced to high vacuum state step by step from atmospheric pressure；（2）Stainless strip (SST) enters pretreating zone, uses
Glow discharge pre-processes (P1) and/or reverse ise pretreatment (P2)；（3）Stainless strip (SST) enters sputter coating
Area, it is coated with the sub- membrane system of inter coat (CL1-CLn)；Dielectric layer (DL) is coated with the sub- membrane system of inter coat (CL1-CLn)；
（4）Pass through exit lock room (EC2), it is ensured that gas pressure increases step by step from vacuum state again to be returned under atmospheric pressure.This hair
Selective solar heat absorption film coating made of bright film plating process possesses the good resistance of centering salt fog atmosphere, and
Have the advantages that absorptivity is stable, transmitting ratio is stable, color change Δ E*ab indexs are small.
Brief description of the drawings
Fig. 1 is the schematic diagram of floating coat membrane system of the present invention.
Fig. 2 is the steam circulation of compound coat and the schematic diagram of deposition distribution in the present invention.
Fig. 3 is the schematic diagram of the deposition distribution of compound coat in the present invention.
Fig. 4 is vacuum coating system used in the present invention.
Fig. 5 is the selectivity of the selective solar heat absorption product of stainless steel substrate of the present invention and the aluminium base used
Solar heat absorbs the performance comparison of product.
Fig. 6 is reflectance spectrums of the selective solar heat absorption product Al1 before and after salt mist experiment in Fig. 5.
Fig. 7 is reflectance spectrums of the selective solar heat absorption product Al2 before and after salt mist experiment in Fig. 5.
Fig. 8 is that selective solar heat absorption product SST is reflectivity of the product of the present invention before and after salt mist experiment in Fig. 5
Spectrum.
Embodiment
Illustrate the embodiment of the present invention with reference to the accompanying drawings.
The purpose of the present invention is to introduce a kind of centering salt fog atmosphere to have the selective solar heat absorption of good resistance
Coating, and manufacture the equipment and technique of the selective solar heat absorption coating.
On current actual market demands, the selective solar heat absorption coating for possessing good salt fog resistance need not
There is the optical property of brilliance, such as in 80 °C of experimental temperature, absorptivity (A)>92% and transmitting ratio (ε)< 10%.More
It is stability for what is valued.
The stability of neutral salt spray test must be real according to the NSS neutral salt spray described in ISO 9227-2012 standards
Test and tested.After laboratory sample is exposed in the experimental situation of this neutral salt spray atmosphere, stable coating should be shown
Go out the problem of appearance of corrosion-free sign or discoloration.By testing and not having the sample by testing, their discoloration can lead to
Coordinate value L*, a* and b* of CIELab color spaces are crossed to weigh, the then change of color can use CIELab colors empty
Between the color distance, delta E*ab that defines calculated.
In order to realize in the stability needed for the experiment of salt fog atmosphere, following constraint bar is must take into consideration in coating process
Part.First, selected sheet metal strip must have been provided with remarkable corrosion resistance to resist salt fog atmosphere.Second, it is selected
Coating Materials must have minimum electrochemical potential to avoid electrochemical corrosion.Our film plating process is with regard to energy in the present invention
Enough meet these constraintss.
For a better understanding of the present invention, we first describe corresponding coated film before the film plating process is introduced
System.
Reference picture 1, the coating membrane system include a stainless strip (SST), and it has corrosion resistance, and its back side is B, plating
Film surface is A.If stainless strip SST is only simultaneously by the surface treatment suitable for expected PVD plated films, then warp
Coated surface (A) should be just identified as by crossing that face being suitably surface-treated.If two faces of stainless strip (SST) are all
Similar or two sides is suitable for expected PVD plated films, then coated surface (A) can randomly choose.
Reference picture 1, adhesion layer (AL) is coated with stainless strip (SST) coated surface (A), can also select not to be coated with
This adhesion layer (AL).It is preferred that the adhesion layer (AL) that the chromium Cr by pure chromium Cr or slightly reacted with oxygen or nitrogen is formed.
Reference picture 1, above adhesion layer (AL) or directly above stainless strip (SST) coated surface (A), plate inhibition and generation
Compound coating (CL1).The compound coat (CL1) is made up of metal A and metal B mixture, and it is partly to complete
Reacted entirely with nitrogen N.Therefore the compound coat is (MeA using chemical formula:MeB)Nx.Here (MeA:MeB) it is metal A
Ratio between metal B, and metal A and metal B mixed proportion can be with simple metal A (100% MeA: 0% MeB)
It is leading, with simple metal B (0% MeA:100% MeB) for any ratio between leading or both.In chemical formula, Nx
Index X be reaction coefficient with nitrogen N.Reaction coefficient X can change between X=0 and X=1, and X=0 refers to 0% here
Nitrogen reacts and X=1 refers to 100% nitrogen reaction or meets the compound of demarcation stoichiometry.Herein, we use pure silicon
Si or silico-aluminum (Si/Al) or silicochromium (Si/Cr) deposit and created a compound layer (Cr as sputtering target material:
Si) Nx or (Cr:Si/Al) Nx or (Cr:Si/Cr)Nx.
Reference picture 1, another compound coat (CL2) can be coated with above the compound coat (CL1), can use with
Compound coat (CL1) identical mode is described to describe compound coat (CL2).Compound coat (CL2) applies with compound
The difference of layer (CL1) is that the ratio of each composition is different.The ratio difference of each composition can be the mixed of metal A and metal B
Composition and division in a proportion example (MeA:MeB it is) different or reaction coefficient X different either neither same.
Reference picture 1, above compound coat (CL1) and compound coat (CL2), additionally compound coat can be plating to
Compound coat (CLn), herein each coating need the component ratio different from inferior coatings and/or top coating.Can
To be metal A and metal B mixed proportion (MeA:MeB) different or reaction coefficient X is different, also or neither
Together.Here the n in CLn is the non-designated integer of applied compound coat quantity.The sum of applied compound coat can be with
It is the numeral of 1 or 2 or any other integer such as 3 or 4 or higher.These compound coats CL1, CL2 ... CLn shape
Into the sub- membrane system of absorbefacient inter coat (CL1-CLn) for establishing selective solar heat absorption coating.
Reference picture 1, can be extra above compound coat (CL1) or above the sub- membrane system of inter coat (CL1-CLn)
It is coated with a dielectric layer (DL).The dielectric layer (DL) uses silica SiO2, silicon nitride Si3N4 or its mixture
(SiOxNy), it has a sufficiently low refractive index, to suppress to reflect, strengthens absorbability.
Reference picture 2 and Fig. 3, Fig. 2 and Fig. 3 give compound coat CLn composition design schematic diagram.Each common sputtering
Technique includes a dual magnetron including sputtering target material A and sputtering target material B and configured.Sputtering target material A contains metal A or metal
Alloy A (MeA) and sputtering target material B contains metal B or metal alloy B (MeB).Each sputtering target material can pass through a technique
Rotation is operated alone independently of subsidiary target for power supply.Therefore produced from vapor stream flux (VA) caused by target A and target B
Vapor stream flux (VB) be different.One can be mixed to form newly by reaching two kinds of vapor stream flux (VA) on base material and (VB)
Film layer.By adding a reacting gas such as nitrogen N 2, the depositional coating can react and form a hybrid metal
Compound layer.Due to the arranged of sputtering target material and the angle of inclination in target orientation, corresponding vapor stream flux may
It will not be uniformly mixed.R (A+B) gives the total distributed of deposition on substrate surface.In this example, vapor stream flux
(VA) contribution is 60%, and the contribution of vapor stream flux (VB) is 40%.Apparent vapor stream flux (VA) is in R (A+B)
Contribution is higher.(RA) the deposition distribution of vapor stream flux (VA) is only embodied, and (RB) only embodies the heavy of vapor stream flux (VB)
Product rate distribution.It thus can be inferred that the gradient mixed between metal A (MeA) and metal B (MeB).This is not one
Individual problem, because it can be accounted for by the particular design to compound layer.It is appreciated that by this method,
The mean refractive index n and extinction coefficient k of compound layer can be drafted.Again by the arrangement of sputtering target material and arrangement and splash
The angle of inclination in material orientation of shooting at the target, the gradient of mixing can be adjusted.
The sputtering target material used in common sputtering technology can include alloying element, for example, aluminium Al in silicon Si to be formed
Si/Al or chromium Cr is in silicon Si to form Si/Cr.As long as chromium Cr or silicon Si are the decision elements of target, then the present invention just should
This includes the use of Cr alloy target materials and Si alloy target materials.
Reference picture 1 and Fig. 4, Figure of description 4 give the scheme of in general film plating process.The film plating process is suitable for
The plated film of the stainless strip (SST) of continuity reel-to-reel.Stainless strip (SST) is all austenites with corrosion resistance
Stainless steel alloy, 214 alloys and 304 alloys are for example there are here.
Reference picture 1 and Fig. 4, the dimensions of stainless strip (SST) should be：0.2mm thickness is to 1.0mm thickness；500mm
Width is to 1500mm width；Band length is depending on the weight per coiled strip, and the weight per coiled strip should be not above here
7000kg.And the web form that stainless strip needs to be wound into a roll is present.
Reference picture 1 and Fig. 4, before plated film, the surface of stainless strip (SST) must oil-free, without fat, free from dust and other
Pollutant.This can be handled to realize by carrying out degreasing, cleaning and heated-air drying to band before plated film, art technology
Personnel can complete above-mentioned plated film pre-treatment according to prior art, be not added with repeating herein.
Reference picture 1 and Fig. 4, the coiled strip of stainless strip (SST) is arranged on a uncoiler (UC), the uncoiler
(UC) it is located at the outside of vacuum coating system (VCS).
Reference picture 1 and Fig. 4, stainless strip (SST) are unreeled out and enter entrance band from uncoiler (UC)
In storage area (SS1).The function of entrance band storage area (SS1) is：Stainless strip (SST) can not stopped in Vacuum Deposition
Under conditions of membranous system (VCS) interior Mobile Transmission and plated film, switch the coiled strip in uncoiler (UC), play cushioning effect.This allows
The band length of the accumulation plated film of one continuous coating process is up to tens of kms.
In order to meet to have the requirement of large-duty large-area coating film, corresponding coating speed generally arrives at 3 ms/min
Between 20 ms/min.Target speed of production is at 10 ms/min.
Reference picture 1 and Fig. 4, when stainless strip (SST) enter vacuum coating system (VCS) it is interior when, stainless strip
(SST) it must first go through entry lock closed chamber (EC1).Entry lock closed chamber (EC1) partly comes by using some individually seal areas
Ensure that gas pressure is reduced to high vacuum state step by step from atmospheric pressure.
Reference picture 1 and Fig. 4, after entry lock closed chamber (EC1), stainless strip (SST) can enter a pre- place
Manage area.Pretreating zone can be optionally using glow discharge pretreatment (P1) or reverse ise pretreatment (P2) come complete
Into, or both of which use.The function of glow discharge pretreatment (P1) is desorption moisture and to remove a certain amount of remaining volatility miscellaneous
Matter, and strip surface is activated by plasma.The major function of reverse ise processing (P2) is to remove stainless steel band
The relatively thin oxide on surface of self-assembling formation on material (SST).Both pretreating process can be subsequently in stainless strip
(SST) coated tape prepared on surface carrys out excellent and uniform tack.
Reference picture 1 and Fig. 4, after pretreating zone, stainless strip (SST) can be sputtered by sputter coating area
Plated film area includes the first sputtering zone (SP1), the second sputtering zone (SP2) and the 3rd sputtering zone (SP3) successively.Optionally,
One step is first coated with an adhesion layer (AL) using the first sputtering zone (SP1).Plated using single magnetron sputtering and double magnetron sputterings
Adhesion layer processed is all feasible.May the power supply that can use include dc source, direct current pulse power source, bi-polar AC current with
And monopole AC power.Selected power supply depends on application and the occasion used.Prepare the magnetron that the adhesion layer need to use
Minimum number should be 1 and up to 4 magnetron, and depend on coating speed.
Reference picture 1 and Fig. 4, be coated with the second sputtering zone (SP2) coating membrane system the sub- membrane system of inter coat (CL1-
CLn).As described above, double magnetron sputterings are used., can be with order to be independently adjustable the power of each sputtering target material
Use dc source, direct current pulse power source, bi-polar AC power supply.Selected power supply depends on application and the occasion used.System
The minimum number for the magnetron that each compound coat of the standby sub- membrane system need to use should be 2 and up to 16 magnetrons,
Quantity depends on coating speed.
Reference picture 1 and Fig. 4, the sub- membrane system (CL1- of absorbefacient inter coat can possessed in the 3rd sputtering zone (SP3)
CLn dielectric layer (DL) is coated with).It is double magnetron sputterings to prepare the preferred sputtering method of dielectric layer (DL).The power supply that can be used
There are direct current pulse power source, bi-polar AC power supply and monopole AC power.Selected power supply depends on application and the field used
Close.The magnetron minimum number that preparing the dielectric layer need to use should be 1 and up to 4 magnetron, and quantity depends on plating
Film speed.In addition, can in electron beam evaporation area (EB) using electron beam evaporation process come instead of using the 3rd sputtering zone (SP3)
It is coated with dielectric layer (DL).Allow have higher deposition using electron beam evaporation process contrast magnetron sputtering technique.Here it is for
It is preferred method that what is this.
Reference picture 1 and Fig. 4, after electron beam evaporation area (EB), stainless strip (SST) can pass through exit lock room
(EC2).The exit lock room (EC2) by using it is some individually seal areas come ensure gas pressure again from vacuum state by
The increase of step ground is returned under atmospheric pressure.
Reference picture 1 and Fig. 4, after stainless strip (SST) is finally by outlet band storage area (SS2) and winder (RC)
Coiled strip is again wrapped around into, outlet band storage area (SS2) provides certain delay for the coiled strip switching carried out on winder (RC)
Rush the time.
Reference picture 1, in common application, the coating layer thickness of adhesion layer (AL) should be 20nm to 30nm.But equally
The thicknesses of layers that can be used is less than 20nm situation, or considers not adding adhesion layer (AL).Sub- membrane system (the CL1- of inter coat
CLn the coating layer thickness of each compound layer) can change between 5nm to 100nm, and the thickness depends on its application scenario.It is situated between
The coating layer thickness of matter layer (DL) can also change between 5nm to 200nm.Choosing can be adjusted by the thickness for adjusting dielectric layer (DL)
The color and optical property of selecting property solar heat absorber coatings.In addition it is also possible to by adjusting the sub- membrane system (CL1- of inter coat
CLn the thickness of each compound layer) and/or the composition of compound layer is adjusted to adjust selective solar heat absorption coating
Color and optical property.
Reference picture 5, every title represents respectively in Fig. 5：A：Absorptivity；ε：Transmitting ratio, in the bar that surface temperature is 80 °C
Measured under part；ΔA：The absorptivity after 72 hours neutral salt spray tests is performed according to ISO 9227-2012 standards to decay；Δε：Root
The transmitting ratio increase after 72 hours neutral salt spray tests is performed according to ISO 9227-2012 standards；ΔE*ab：According to ISO 9227-
2012 standards perform the color change after 72 hours neutral salt spray tests；Al1：Selective solar heat absorption product 1, the product
It is based on the coating prepared on aluminum strip base material by PVD.Al2：Selective solar heat absorption product 2, the product
It is based on the coating prepared on aluminum strip base material by PVD.SST：Our selective solar heat absorption product, should
Product is based on the coating prepared on stainless strip base material by PVD.
Reference picture 5, Fig. 6, Fig. 7 and Fig. 8, by contrasting each accompanying drawing, using choosing made of the film plating process of the present invention
Selecting property solar heat absorbing membrane coating, absorptivity is very stable, and deviation is within ± 0.1%, and transmitting ratio is also very stable, and deviation exists
Within ± 1%, and color change Δ E*ab indexs are less than 1.5（The color change Δ E*ab colour indexs that human eye can recognize that are
>2.5.）.Product produced by the present invention after 72 hours neutral salt spray tests without being evident that color change.It can be seen that this
Selective solar heat absorption film coating made of the film plating process of invention possesses the good resistance of centering salt fog atmosphere, and
And have the advantages that absorptivity is stable, transmitting ratio is stable, color change Δ E*ab indexs are small.
The embodiment of the present invention is above are only, but the design concept of the present invention is not limited thereto, it is all to utilize this
Conceive the change that unsubstantiality is carried out to the present invention, the behavior for invading the scope of the present invention all should be belonged to.
Claims (10)
1. the film plating process of selective solar heat absorption product, it is characterised in that：Vacuum coating used in the film plating process
System (VCS) includes entry lock closed chamber (EC1), pretreating zone, sputter coating area and exit lock room (EC2) successively；The plated film
Method comprises the following steps：（1）Stainless strip (SST) first passes through entry lock closed chamber (EC1), and entry lock closed chamber (EC1) passes through
Ensure that gas pressure is reduced to high vacuum state step by step from atmospheric pressure using some individually seal areas；（2）Stainless steel band
Material (SST) enters pretreating zone, and pretreating zone is using glow discharge pretreatment (P1) and/or reverse ise pretreatment
(P2)；（3）Stainless strip (SST) enters sputter coating area；The sputter coating area includes the second sputtering zone (SP2) and the successively
Three sputtering zones (SP3), in the second sputtering zone (SP2), it is coated with the sub- membrane system of inter coat (CL1-CLn)；In the 3rd sputtering zone
(SP3) in, dielectric layer (DL) is coated with the sub- membrane system of inter coat (CL1-CLn)；（4）By exit lock room (EC2), this goes out
Mouth locking room (EC2) ensures that gas pressure increases back step by step from vacuum state again by using some individually seal areas
To under atmospheric pressure.
2. the film plating process of selective solar heat absorption product according to claim 1, it is characterised in that：Also include solution
Volume machine (UC), entrance band storage area (SS1), outlet band storage area (SS2) and winder (RC), the uncoiler (UC) are located at
On the outside of the feed end of vacuum coating system (VCS), the coiled strip of stainless strip (SST) is arranged in uncoiler (UC), it is stainless
Steel band (SST) is unreeled out and entered in entrance band storage area (SS1) from uncoiler (UC), then passes through entry lock
Closed chamber (EC1)；Band storage area (SS2) is exported on the outside of the discharge end of vacuum coating system (VCS), stainless strip (SST)
After exit lock room (EC2), furled again in winder (RC) through exporting band storage area (SS2).
3. the film plating process of selective solar heat absorption product according to claim 1, it is characterised in that：The step
（3）In, sputter coating area is additionally provided with the first sputtering zone (SP1) before the second sputtering zone (SP2), at the first sputtering zone (SP1)
In, an adhesion layer (AL) is coated with the surface of stainless strip (SST).
4. the film plating process of the selective solar heat absorption product according to claim 1 or 3, it is characterised in that：It is described
Vacuum coating system (VCS) is additionally provided with electron beam evaporation area (EB) between sputter coating area and exit lock room (EC2), can make
The electron beam evaporation process in deposited by electron beam evaporation area (EB) instead of using the 3rd sputtering zone (SP3) is coated with dielectric layer (DL).
5. the film plating process of selective solar heat absorption product according to claim 2, it is characterised in that：It is described stainless
The surface of steel band (SST) must oil-free, without fat, free from dust and other pollutants；Can be by entering before plated film to band
Row degreasing, cleaning and heated-air drying are handled to realize.
6. a kind of coating membrane system that as claimed in claim 3 prepared by film plating process, including stainless strip (SST), its feature exist
In：Plating is formed with several immersion coatings on the stainless strip (SST), forms the sub- membrane system of an inter coat (CL1-CLn)；
And several immersion coatings are made up of metal A and metal B mixture, and its be part to completely with nitrogen N react
, the use of chemical formula is (MeA:MeB)Nx；Here (MeA:MeB) the ratio between metal A and metal B, Nx index X
For the reaction coefficient with nitrogen N；The component ratio of two neighboring compound coat is different, can be metal A and metal B mixing ratio
Example (MeA:MeB) different or reaction coefficient X is different, also or neither same；Sub- membrane system (the CL1 of inter coat
- CLn) on plating be formed with dielectric layer (DL).
7. the coating membrane system that according to claim 6 prepared by film plating process, it is characterised in that：The metal A's and metal B is mixed
Composition and division in a proportion example can be with simple metal A (100% MeA:0% MeB) it is leading, with simple metal B (0% MeA: 100% MeB)
For any ratio between leading or both；In chemical formula, reaction coefficient X can change between X=0 and X=1.
8. the coating membrane system that according to claim 7 prepared by film plating process, it is characterised in that：The metal A is pure chromium Cr, gold
Category B is pure silicon Si, silicochromium (Si/Cr) or silico-aluminum (Si/Al), and corresponding compound layer chemical formula is (Cr:Si)Nx、
(Cr:Si/Al) Nx or (Cr:Si/Cr)Nx.
9. the coating membrane system that according to claim 7 prepared by film plating process, it is characterised in that：The stainless strip (SST)
Also plating is formed with adhesion layer (AL) between the sub- membrane system of inter coat (CL1-CLn), the adhesion layer (AL) be by pure chromium Cr or
The chromium Cr slightly reacted with oxygen or nitrogen.
10. the coating membrane system that according to claim 7 prepared by film plating process, it is characterised in that：The described dielectric layer (DL) is
Silica SiO2, silicon nitride Si3N4 or both mixture (SiOxNy).
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108048814A (en) * | 2017-12-22 | 2018-05-18 | 凌嘉科技股份有限公司 | There is the continous way coating system of reactive ion etch |
| CN110400856A (en) * | 2018-04-24 | 2019-11-01 | 北京铂阳顶荣光伏科技有限公司 | A kind of thin-film solar cells producing device and substrate transfer device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101768725A (en) * | 2008-12-30 | 2010-07-07 | 深圳市鹏桑普太阳能股份有限公司 | Continuous preparation method of selective solar absorbing film |
| CN102206806A (en) * | 2010-03-31 | 2011-10-05 | 甘国工 | Flat solar heat absorption coated plate production method and vertical coating apparatus |
| CN102534497A (en) * | 2012-03-29 | 2012-07-04 | 德州金亨新能源有限公司 | High temperature selective absorption coating based on stainless steel material and manufacture method thereof |
| CN104048431A (en) * | 2013-01-24 | 2014-09-17 | 冯·阿德纳有限公司 | Selective solar energy absorber and manufacturing method thereof used for solar panels, comprises absorber layer containing mixture layer(s) containing high-refractive index dielectric material, and transparent, low-refractive index dielectric layer on substrate |
| CN105296953A (en) * | 2015-12-01 | 2016-02-03 | 肇庆市科润真空设备有限公司 | Film coating device for solar heat absorption films |
-
2017
- 2017-08-03 CN CN201710656119.8A patent/CN107385409A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101768725A (en) * | 2008-12-30 | 2010-07-07 | 深圳市鹏桑普太阳能股份有限公司 | Continuous preparation method of selective solar absorbing film |
| CN102206806A (en) * | 2010-03-31 | 2011-10-05 | 甘国工 | Flat solar heat absorption coated plate production method and vertical coating apparatus |
| CN102534497A (en) * | 2012-03-29 | 2012-07-04 | 德州金亨新能源有限公司 | High temperature selective absorption coating based on stainless steel material and manufacture method thereof |
| CN104048431A (en) * | 2013-01-24 | 2014-09-17 | 冯·阿德纳有限公司 | Selective solar energy absorber and manufacturing method thereof used for solar panels, comprises absorber layer containing mixture layer(s) containing high-refractive index dielectric material, and transparent, low-refractive index dielectric layer on substrate |
| CN105296953A (en) * | 2015-12-01 | 2016-02-03 | 肇庆市科润真空设备有限公司 | Film coating device for solar heat absorption films |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108048814A (en) * | 2017-12-22 | 2018-05-18 | 凌嘉科技股份有限公司 | There is the continous way coating system of reactive ion etch |
| CN108048814B (en) * | 2017-12-22 | 2020-01-31 | 凌嘉科技股份有限公司 | Continuous coating system with reactive ion etching function |
| CN110400856A (en) * | 2018-04-24 | 2019-11-01 | 北京铂阳顶荣光伏科技有限公司 | A kind of thin-film solar cells producing device and substrate transfer device |
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