CN107346776A - Typographical display device and preparation method thereof and application - Google Patents
Typographical display device and preparation method thereof and application Download PDFInfo
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- CN107346776A CN107346776A CN201611111144.XA CN201611111144A CN107346776A CN 107346776 A CN107346776 A CN 107346776A CN 201611111144 A CN201611111144 A CN 201611111144A CN 107346776 A CN107346776 A CN 107346776A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
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- H10K50/17—Carrier injection layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/18—Carrier blocking layers
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
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- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
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Abstract
The present invention relates to a kind of typographical display device and preparation method thereof and typographical display device.The typographical display device includes substrate, first electrode layer, the first functional layer, luminescent layer, the second functional layer and the second electrode lay；Wherein, first electrode layer is located on substrate；First functional layer is located in first electrode layer；The surface of first functional layer has the hydrophilic region of patterning, and luminescent layer is located at the hydrophilic region of the first function layer surface；Second functional layer is located on the first functional layer and luminescent layer；The second electrode lay is located in the second functional layer.There is no pixel defining layer in the typographical display device and typographical display device containing the typographical display device, the preparation section of pixel defining layer can be saved in manufacturing process, pixel defining layer is avoided to impact light emitting pixel, while by setting the hydrophilic region of patterning in the first functional layer, by forming luminescent layer in hydrophilic region, the uniformity of luminescent layer can be ensured, be advantageous to further reduce cost of manufacture.
Description
Technical field
The present invention relates to display device field, more particularly, to a kind of typographical display device and preparation method thereof and application.
Background technology
The display device such as organic electroluminescence device (OLED) and quantum dot light emitting device (QLED) is widely used in various
In display device.Using the method for solution processing and fabricating display device, because its cost is low, production capacity is high, is easily achieved large scale
The advantages that making, it is the important directions of following Display Technique development.Printing technology be considered as realize display device low cost and
The most effective approach of the full-color display of large area.However, typographical display device still has numerous technical barriers to need to overcome, wherein, such as
Ink surface to the position formulated is a difficult point by what.Conventional art be using all kinds of pixel defining layers (PDL) come pair
Marking ink carries out position restriction, however, the technical matters is complicated, cost is of a relatively high, and easily because of pixel defining layer in itself
The uneven film forming that causes between pixel ink it is uneven.
The content of the invention
Based on this, it is necessary to provide a kind of typographical display device that pixel defining layer can be avoided to impact light emitting pixel
Part and preparation method thereof and application.
A kind of typographical display device, including substrate, first electrode layer, the first functional layer, luminescent layer, the second functional layer and
Two electrode layers；Wherein, the first electrode layer is located on the substrate；First functional layer is located at the first electrode layer
On；The surface of first functional layer has the hydrophilic region of patterning, and the luminescent layer is located at the first function layer surface
The hydrophilic region on；Second functional layer is located on first functional layer and the luminescent layer；The second electrode
Layer is in second functional layer.
In one of the embodiments, the substrate is that passive matrix shows that substrate or active array type show substrate；
Wherein, the active array type shows that substrate includes substrate and the film transistor device being located on substrate；When the substrate is
When active array type shows substrate, the film transistor device is located at the two of the substrate respectively with the first electrode layer
Side.
In one of the embodiments, the first electrode layer is the anode electrode layer of patterning；First functional layer
It is located in the substrate and the first electrode layer；First functional layer includes hole injection layer, hole transmission layer and electronics
At least one of barrier layer.
In one of the embodiments, the luminescent layer includes red emitting pixel layer, green emitting pixel layer and blueness
At least one of light emitting pixel layer.
In one of the embodiments, the second electrode lay is cathode layer；Second functional layer includes electric transmission
At least one of layer, electron injecting layer and hole blocking layer.
A kind of preparation method of typographical display device, comprises the following steps：
First electrode layer is formed on substrate；
The first functional layer is formed in first electrode layer；
Hydrophilic treated is carried out to the predeterminable area of the first function layer surface, forms the hydrophilic region of patterning；
Luminescent layer is formed on the hydrophilic region；
The second functional layer is formed on the luminescent layer and first functional layer；
The second electrode lay is formed in second functional layer.
In one of the embodiments, patterned process also is carried out to the first electrode layer including the use of photoetching process,
The step of to form the first electrode layer of patterning.
In one of the embodiments, it is to use that the predeterminable area on the surface of the first functional layer, which carries out hydrophilic treated,
Mask plate covers the region without hydrophilic treated, utilizes UV ozone treatment technology, ultraviolet lighting technology or plasma surface
Treatment technology carries out surface activation process to the remaining area for being not covered with mask plate, with the preset areas of first functional layer
Domain forms the hydrophilic region of the patterning with high surfaces free energy.
In one of the embodiments, it is described the hydrophilic region formed luminescent layer be using InkJet printing processes in institute
Hydrophilic region print pixel ink is stated, the luminescent layer is formed after re-dry.
A kind of typographical display device, including the typographical display device described in any of the above-described embodiment.
There is no pixel defining layer in above-mentioned typographical display device and typographical display device containing the typographical display device,
The preparation section of pixel defining layer can be saved in manufacturing process, avoids pixel defining layer from impacting light emitting pixel, simultaneously
By setting the hydrophilic region of patterning in the first functional layer, by forming luminescent layer in hydrophilic region, it is ensured that luminous
The uniformity of layer, is advantageous to further reduce cost of manufacture.
Brief description of the drawings
Fig. 1 is the structural representation of the typographical display device of an embodiment；
Fig. 2 is the manufacturing process schematic diagram of typographical display device shown in Fig. 1.
Embodiment
For the ease of understanding the present invention, the present invention is described more fully below with reference to relevant drawings.In accompanying drawing
Give presently preferred embodiments of the present invention.But the present invention can realize in many different forms, however it is not limited to this paper institutes
The embodiment of description.On the contrary, the purpose for providing these embodiments is to make the understanding to the disclosure more thorough
Comprehensively.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element
Or there may also be element placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or it may be simultaneously present centering elements.
Unless otherwise defined, all of technologies and scientific terms used here by the article is with belonging to technical field of the invention
The implication that technical staff is generally understood that is identical.Term used in the description of the invention herein is intended merely to description tool
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term as used herein "and/or" includes one or more phases
The arbitrary and all combination of the Listed Items of pass.
As shown in figure 1, the typographical display device 10 of an embodiment includes substrate 11, first electrode layer 12, the first function
Layer 13, luminescent layer 14, the second functional layer 15 and the second electrode lay 16.
Substrate 11 is used to carry other structures layer, and the other structures of typographical display device.In the present embodiment, substrate
11 can be that passive matrix (PM) shows that substrate or active array type (AM) show substrate.Wherein, active array type display lining
Bottom includes substrate and is located at the film crystal on another surface of substrate (i.e. the surface relative with the surface provided with first electrode layer 12)
Manage (TFT).Substrate can be rigid substrates or flexible base board.Rigid substrates can be ceramic material or all kinds of glass materials etc..
Flexible base board can be Kapton (PI) and its derivative, PEN (PEN), phosphoenolpyruvate third
Ketone acid (PEP) or diphenylene ether resin etc..
First electrode layer 12 is located on substrate 11.In the present embodiment, first electrode layer 12 is transparent anode layer.The
The material of one electrode layer 12 may be selected from ITO, AZO, TZO, nano-silver thread film or graphene etc..Further, in present embodiment
In, the first electrode layer 12 is the electrode layer of patterning.The processing procedure of patterning can be realized by photoetching process.
First functional layer 13 is located in the first electrode layer 12 of substrate 11 and patterning.First functional layer 13 can be individual layer
Or the combination of multiple functional layers, such as can be comprising at least one of hole injection layer, hole transmission layer and electronic barrier layer.
Wherein, hole injection layer is used for the film-forming quality for improving subsequent organic layers, and helps to inject holes into hole transmission layer
Or luminescent layer.Material for hole injection layer includes but is not limited to porphyrin compound, fluorocarbon polymer etc..Hole transmission layer
Contain at least one hole transport compound, such as aromatic uncle amine.Further, the aromatic uncle amine be containing it is at least one only
In the trivalent nitrogen atom and above-mentioned carbon atom that are connected with carbon atom it is at least one be aromatic ring compound, aromatic uncle amine can be virtue
Base amine, such as arylamine of monoarylamine, diaryl amine or polymerization etc..Hole transmission layer can be by a kind of aromatic uncle amine chemical combination
The mixture of thing or a variety of aromatic tertiary amine compounds is formed.Another kind of hole transport layer material includes polycyclc aromatic compound.
Further, it is possible to use the hole mobile material for example poly- (N- vinyl carbazoles) (PVK) of polymerization, polythiophene, polypyrrole, or copolymerization
Class, such as poly- (3,4- Ethylenedioxy Thiophene ester)/poly- (4- styrene sulfonates) (PEDOT/PSS) etc..
In the present embodiment, the surface of the first functional layer 13 has the hydrophilic region 131 of patterning.The hydrophilic region
131 have higher surface free energy than other regions of the first functional layer 13, are easy to hydrophilic pixel ink to deposit.This reality
The luminescent layer 14 for applying mode is directly arranged on the hydrophilic region 131 on the surface of the first functional layer 13, between other intervals are not present
Layer.Luminescent layer 14 is included in red emitting pixel layer 141, green emitting pixel layer 142 and blue emitting pixel layer 143 at least
One kind, preferably include 143 3 kinds of red emitting pixel layer 141, green emitting pixel layer 142 and blue emitting pixel layer, and
Red emitting pixel layer 141, green emitting pixel layer 142 and blue emitting pixel layer 143 uniformly divide in the first functional layer 13
Cloth.Material used in luminescent layer includes small molecule class luminescent material, high molecular polymerization species luminescent material and quantum dot light emitting
Material.Luminescent layer can contain homogenous material, or and one or more guest compounds are adulterated by material of main part and formed, its
In light essentially from dopant and can launch the light of multiple color.Material of main part in luminescent layer can be electric transmission
Material, hole mobile material or the combination for supporting both hole and electron compound other materials or material.Dopant can be Gao Ying
Photoinitiator dye, phosphorescent compound, such as transient metal complex can also be used, usual dopant is with 0.01 to 10% amount
It is added in material of main part.Polymeric material such as polyfluorene and polyvinyl arylenes can also be used as material of main part.Material of main part includes
But it is not limited to metal complex and similar derivative, the derivative of anthracene, indole derivatives of 8-hydroxyquinoline etc..Dopant
Including but not limited to anthracene microorganism, aphthacene, cumarin, quinacridone, fluorene derivative and quino assimilation compound.
Second functional layer 15 is located on the luminescent layer 14 of the first functional layer 13 and patterning.Second functional layer 15 can be single
The combination of layer or multiple functional layers, it can such as include at least one layer in electron transfer layer, electron injecting layer and hole blocking layer.
Second functional layer 15 is used for electron injection, transmission, hole barrier and valency electric equilibrium of device etc..Electron transfer layer is selected from but unlimited
In the oxinoid compounds of metal-chelating, butadiene derivatives, heterocyclic optical brighteners, indoles etc..In addition, in quantum dot device
Electron transport material generally is done with ZnO nano particle in part, its conduction level is advantageous to note of the electronics from negative electrode to quantum dot
Enter, and its deeper valence-band level can play a part of effectively stopping hole.In some cases, luminescent layer and electric transmission
Layer optionally overlapping can turn into an individual layer for ensureing the effect of luminous and electric transmission together, in small molecule organic electroluminescence device
In system and polymerization organic electroluminescence device system, it can overlap.Electron injecting layer is selected from, but not limited to, metallization
Compound, such as LiF, CsF, Li2O, NaF, the organic matter containing nitrogen aromatic ring structure containing electron deficient, such as 8-hydroxyquinoline lithium, 2-
The oxyquinoline of methyl -8 lithium, 4- hydroxyl phenanthridines lithiums etc..
The second electrode lay 16 is located in the second functional layer 15.In the present embodiment, the second electrode lay 16 is cathode layer.The
The material of two electrode layers 16 is selected from, but not limited to, silver, aluminium or silver-base alloy etc..
Present embodiment additionally provides a kind of preparation method of above-mentioned typographical display device 10, as shown in Fig. 2 it is included such as
Lower step：
Step 1：First electrode layer 12 is formed on the substrate 11.
Specifically, in the present embodiment, uniform transparent electrode layer is first formed on the substrate 11, reuses photoetching process
By the transparency electrode pattern layers, the transparent first electrode layer 12 of patterning is formed.
Step 2：The first functional layer 13 is formed in first electrode layer 12.
In the present embodiment, it is that the first functional layer 13 is formed in first electrode layer 12 using wet coating process.It is wet
Method painting process is selected from spin coating, slot coated, spraying or inkjet printing.In the existing typographical display device with pixel defining layer
The technique of inkjet printing can only be utilized in part to print uniform first functional layer group in specified pixel region, and this reality
The mode of applying need not make pixel defining layer, the making of the first functional layer 13 can preferably be completed with spin coating and slot coated, especially
In volume production process, slot coated technique can obtain the first highly uniform functional layer 13 for it.
Step 3：Predeterminable area on the surface of the first functional layer 13 carries out hydrophilic treated, forms the hydrophilic area of patterning
Domain 131.
Utilize UV ozone (UVO) treatment technology, plasma (Plasma) process for treating surface, ultraviolet (UV) illumination skill
The techniques such as art carry out patterning hydrophilic treated under the auxiliary of mask plate (Mask) 71 to the first functional layer 13, form what is specified
Hydrophilic region 131.Present embodiment is illustrated by taking UV ozone treatment technology and plasma surface treatment technology as an example.
With UV ozone treatment technology carry out activation process when, UV source emissioning lights ripple 72 (be usually wavelength be 185nm and
254nm light wave), there is very high energy, when these photons are applied to the first 13 surface of functional layer, due to most of hydrocarbon
Compound has stronger absorbability to the ultraviolet light of 185nm wavelength, and after the energy of ultraviolet light of 185nm wavelength is absorbed
Ion, free state atom, excited molecule and neutron, i.e. photosensitization can be resolved into.And the oxygen molecule in air is absorbing
Ozone and elemental oxygen can be also produced after the ultraviolet light of 185nm wavelength.Ozone equally has strong to the ultraviolet light of 254nm wavelength
Absorption, ozone is decomposed into elemental oxygen and oxygen again.Wherein elemental oxygen is as lively as a cricket, under its effect, the first function
The analyte of carbon and hydrocarbon on 13 surface of layer can react the volatilizable gas (carbon dioxide and vapor etc.) of synthesis
Escape surface, so as to add the surface free energy of the first functional layer 13 so that marking ink material be easier with
The surface spreading of hydrophilic region 131 of high surface free energy is opened without going to non-process region, i.e., and the after UV ozone processing
The closeer marking ink material of hydrophilic region 131 of one functional layer 13.
When carrying out activation process with Surface Treatment with Plasma technology, the electricity in high-speed motion state in plasma be present
Son, the neutral atom of state of activation, molecule, atomic group (free radical), the atom of ionization, molecule etc., all have very strong
Activity, under its effect, carbon and hydrocarbon on the surface of the first functional layer 13 can be decomposed and synthesize volatilizable gas
(carbon dioxide and vapor etc.) escapes surface, the surface free energy of the first functional layer 13 is finally equally added, so as to reach
The effect of activation so that marking ink material is easier in the drawout of hydrophilic region 131 with high surface free energy without running
To non-process area, i.e., the closeer marking ink material in the surface of the first functional layer 13 after plasma treatment.
Step 4：Luminescent layer 14 is formed on hydrophilic region 131.
In the present embodiment, using InkJet printing processes by pixel ink printed to the hydrophilic area of first functional layer 13
Domain 131, now, because treatment region and non-process area are different to the close and distant property of marking ink, (usual ink is to the first functional layer 13
The contact angle on surface has 40 °~60 ° or so of difference), marking ink can be limited at hydrophilic region.Then to marking ink
It is dried in vacuo, panel heater is dried etc. that the luminescent layer 14 of dry film can be obtained after drying process.
In the present embodiment, the luminescent layer 14 of formation is made up of the light emitting pixel layer of multiple color, such as includes red hair
Light pixel layer 141, green emitting pixel layer 142 and blue emitting pixel layer 143.
Step 5：The second functional layer 15 is formed on luminescent layer 14.
In the present embodiment, using the wet coating such as spin coating, slot coated technique, evaporation etc. in the and of the first functional layer 13
The second functional layer group 15 is formed on luminescent layer 14.
Step 6：The second electrode lay 16 is formed in the second functional layer 15.
In the present embodiment, form the second electrode lay 16 in the second functional layer 15 by the use of evaporation process and be used as negative electrode
Layer.
The typographical display device that present embodiment makes can be widely used in various light-emitting devices or have display function
In typographical display device, such as display of mobile phone, television set, tablet personal computer, VR/AR, vehicle electronics product.
There is no pixel defining layer in above-mentioned typographical display device 10 and typographical display device containing the typographical display device,
The preparation section of pixel defining layer can be saved in manufacturing process, avoids pixel defining layer from impacting light emitting pixel, together
When by setting the hydrophilic region 131 of patterning in the first functional layer 13, by forming luminescent layer 14 in hydrophilic region 131,
The uniformity of luminescent layer 14 can be ensured, be advantageous to further reduce cost of manufacture.
It is specific embodiment part below.
Embodiment 1
1) transparent first electrode layer of patterning is formed on a glass substrate.
Ito thin film is plated on a glass substrate using magnetron sputtering technique, thickness 150nm, recycles photoetching process by ITO
It is thin-film patterning, obtain ito substrate.
2) the first functional layer is made.
It is cleaned by ultrasonic processing 10 minutes respectively to ito substrate with ethanol, deionized water and acetone, then uses N2Drying, and
Handled 10 minutes using ozone-ultraviolet, to remove the impurity on ITO surfaces.Revolved on an ito substrate with 2500 revs/min of rotating speed
Apply PEDOT：PSS (poly- p styrene sulfonic acid solution), time are 30 seconds.Made annealing treatment in atmosphere at 170 DEG C after the completion of spin coating
20 minutes, form hole injection layer.It is transferred into again in the glove box of nitrogen environment, in PEDOT：In PSS layer with 2500 turns/
Rotating speed spin coating UGH-1 (biphenyl is to di-o-tolyl silane) chlorobenzene solution (concentration 6mg/mL) of minute, time are 30 seconds.Rotation
150 DEG C of annealing form hole transmission layer of the biphenyl to di-o-tolyl silane for 30 minutes in glove box after the completion of painting.
3) patterning hydrophilic treated is carried out to the first functional layer.
Mask plate is placed in the first functional layer, it is necessary to which the place of processing is exposed, it is not necessary to the place utilization of processing
Mask plate is sheltered from, and then surface is handled using nitrogen gas plasma, and processing time is 1 minute, power 120W, i.e.,
The hole transmission layer of patterning water-wetted surface can be obtained.
4) luminescent layer is made.
The water-wetted surface of ink printed to UGH-1, the present embodiment are used into blue quantum dot ink using ink jet printing device
Water, quantum dot are CdZnS/ZnS core shell structures, and launch wavelength is near 450nm, and solution is normal octane, concentration 30mg/ml,
It is transferred in Minton dryer and is dried in vacuo after printing, vacuum 66Pa, the duration is 15 seconds, vacuum drying
Reuse hot plate afterwards to be made annealing treatment, temperature is 150 DEG C, and the time is 30 minutes.
5) the second functional layer is made.
The spin coating layer of ZnO ethanol solution in the first functional layer and luminescent layer, concentration 60mg/ml, rotating speed be 2000 turns/
Minute, spin-coating time is 30 seconds, and the annealing of 30 minutes is then carried out on hot plate, that is, completes the preparation of the second functional layer.
6) the second electrode lay is made.
The Al that 100nm is deposited in the second functional layer forms the second electrode lay, that is, completes the preparation of the device.
Performance test is carried out to above-mentioned device, using CS2000 spectrometer measurement device emission peaks, used
Keithley2400 tests the current density voltage curve of device, and combines the brightness of spectrometer QE-6500 test devices, and
Calculating device efficiency, it is 465nm finally to measure device emission peak, external quantum efficiency 4.2%, performance requirement expected from satisfaction.
Embodiment 2
Difference with embodiment 1 is that the first functional layer also includes electronic barrier layer, on UGH-1 films with 2000 turns/
Minute rotating speed spin coating PMMA ethyl benzoate solution, concentration 1mg/ml, spin-coating time is 30 seconds, after spin coating again in baking oven
150 DEG C of annealing form electronic barrier layer in 60 minutes, and are patterned hydrophilic treated, and wherein PMMA thickness is 8nm.The reality
It is 465nm to apply example and measure device emission peak, external quantum efficiency 5.6%, performance requirement expected from satisfaction.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Can not therefore it be construed as limiting the scope of the patent.It should be pointed out that come for one of ordinary skill in the art
Say, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. a kind of typographical display device, it is characterised in that including substrate, first electrode layer, the first functional layer, luminescent layer, second
Functional layer and the second electrode lay；Wherein, the first electrode layer is located on the substrate；First functional layer is positioned at described the
On one electrode layer；The surface of first functional layer has the hydrophilic region of patterning, and the luminescent layer is located at first work(
On the hydrophilic region of energy layer surface；Second functional layer is located on first functional layer and the luminescent layer；It is described
The second electrode lay is located in second functional layer.
2. typographical display device as claimed in claim 1, it is characterised in that the substrate be passive matrix show substrate or
Active array type shows substrate；Wherein, the active array type shows that substrate includes substrate and the film crystal being located on substrate
Tube device；When the substrate is that active array type shows substrate, the film transistor device and the first electrode layer point
Not Wei Yu the substrate both sides.
3. typographical display device as claimed in claim 1, it is characterised in that the first electrode layer is electric for the anode of patterning
Pole layer；First functional layer is located in the substrate and the first electrode layer；First functional layer is injected including hole
At least one of layer, hole transmission layer and electronic barrier layer.
4. typographical display device as claimed in claim 1, it is characterised in that the luminescent layer include red emitting pixel layer,
At least one of green emitting pixel layer and blue emitting pixel layer.
5. typographical display device as claimed in claim 1, it is characterised in that the second electrode lay is cathode layer；Described
Two functional layers include at least one of electron transfer layer, electron injecting layer and hole blocking layer.
6. a kind of preparation method of typographical display device, it is characterised in that comprise the following steps：
First electrode layer is formed on substrate；
The first functional layer is formed in first electrode layer；
Hydrophilic treated is carried out to the predeterminable area of the first function layer surface, forms the hydrophilic region of patterning；
Luminescent layer is formed on the hydrophilic region；
The second functional layer is formed on the luminescent layer and first functional layer；
The second electrode lay is formed in second functional layer.
7. the preparation method of typographical display device as claimed in claim 6, it is characterised in that also including the use of photoetching process pair
The first electrode layer carries out patterned process, the step of to form the first electrode layer of patterning.
8. the preparation method of typographical display device as claimed in claim 6, it is characterised in that the table in the first functional layer
It is using region of the mask plate covering without hydrophilic treated that the predeterminable area in face, which carries out hydrophilic treated, utilizes UV ozone to handle skill
Art, ultraviolet lighting technology or plasma surface treatment technology are carried out at surface active to the remaining area for being not covered with mask plate
Reason, to form the hydrophilic region of the patterning with high surfaces free energy in the predeterminable area of first functional layer.
9. the preparation method of typographical display device as claimed in claim 7, it is characterised in that described in the hydrophilic region shape
It is to form the luminescent layer after the hydrophilic region print pixel ink, re-dry using InkJet printing processes into luminescent layer.
10. a kind of typographical display device, it is characterised in that including typographical display device such as according to any one of claims 1 to 5
Part.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108538892A (en) * | 2018-04-23 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method of OLED display device |
| WO2023065968A1 (en) * | 2021-10-20 | 2023-04-27 | Tcl科技集团股份有限公司 | Light-emitting device and preparation method therefor |
| WO2023065984A1 (en) * | 2021-10-20 | 2023-04-27 | Tcl科技集团股份有限公司 | Light-emitting device and preparation method therefor |
| WO2023104110A1 (en) * | 2021-12-08 | 2023-06-15 | 纳晶科技股份有限公司 | Light-emitting apparatus and manufacturing method therefor, and electronic device comprising light-emitting apparatus |
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| US20090057657A1 (en) * | 2007-09-05 | 2009-03-05 | Samsung Electronics Co., Ltd | Method for forming pattern arrays and organic devices including the pattern arrays |
| CN101714615A (en) * | 2002-08-05 | 2010-05-26 | 大日本印刷株式会社 | Method of producing electroluminescent element |
| CN101764090A (en) * | 2008-12-24 | 2010-06-30 | 乐金显示有限公司 | Organic light emitting display device and method for manufacturing the same |
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| CN101714615A (en) * | 2002-08-05 | 2010-05-26 | 大日本印刷株式会社 | Method of producing electroluminescent element |
| US20090057657A1 (en) * | 2007-09-05 | 2009-03-05 | Samsung Electronics Co., Ltd | Method for forming pattern arrays and organic devices including the pattern arrays |
| CN101764090A (en) * | 2008-12-24 | 2010-06-30 | 乐金显示有限公司 | Organic light emitting display device and method for manufacturing the same |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108538892A (en) * | 2018-04-23 | 2018-09-14 | 深圳市华星光电技术有限公司 | The production method of OLED display device |
| WO2023065968A1 (en) * | 2021-10-20 | 2023-04-27 | Tcl科技集团股份有限公司 | Light-emitting device and preparation method therefor |
| WO2023065984A1 (en) * | 2021-10-20 | 2023-04-27 | Tcl科技集团股份有限公司 | Light-emitting device and preparation method therefor |
| WO2023104110A1 (en) * | 2021-12-08 | 2023-06-15 | 纳晶科技股份有限公司 | Light-emitting apparatus and manufacturing method therefor, and electronic device comprising light-emitting apparatus |
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