CN107330411A - A kind of fingerprint identification device and preparation method thereof, touch control display apparatus - Google Patents
A kind of fingerprint identification device and preparation method thereof, touch control display apparatus Download PDFInfo
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- CN107330411A CN107330411A CN201710537830.1A CN201710537830A CN107330411A CN 107330411 A CN107330411 A CN 107330411A CN 201710537830 A CN201710537830 A CN 201710537830A CN 107330411 A CN107330411 A CN 107330411A
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- film layer
- photodiode
- pattern
- photoresist
- underlay substrate
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Abstract
The invention discloses a kind of fingerprint identification device and preparation method thereof, touch control display apparatus, to avoid the problem of wet hand touches the fingerprint recognition less effective that fingerprint identification device is caused.The fingerprint identification device, including underlay substrate, are arranged on light-inductive unit that is on the underlay substrate and being arranged in array, are arranged on the hydrophobic structure on the light-inductive unit.
Description
Technical field
The present invention relates to fingerprint identification technology field, more particularly to a kind of fingerprint identification device and preparation method thereof, touch-control
Display device.
Background technology
Fingerprint identification technology is biometrics identification technology most ripe and cheap at present.Fingerprint recognition at present
Technology be most widely used, we not only in gate inhibition, attendance checking system it can be seen that fingerprint identification technology figure, in the market
It there has also been the application of more fingerprint recognitions：As notebook computer, mobile phone, automobile, bank paying all can employing fingerprint identification skill
Art.
With the development of science and technology fingerprint identification technology has begun to slowly enter in PC World.Many companies and grind
Study carefully mechanism and very big breakthrough progress is all achieved in fingerprint identification technology field, release many fingerprint recognitions and tradition IT technologies are complete
The application product that U.S. combines, these products are approved by increasing user.
Fingerprint recognition device can be divided into：The types such as condenser type, photo-electric and ultrasonic wave.
For the fingerprint recognition device of photo-electric, after user touches fingerprint recognition device with wet hand, because wet hand can be right
Opto-electronic conversion produces certain influence, so as to influence the fingerprint recognition effect of photo-electric fingerprint recognition device.
The content of the invention
In view of this, the embodiments of the invention provide a kind of fingerprint identification device and preparation method thereof, touch control display apparatus,
To avoid the problem of wet hand touches the fingerprint recognition less effective that fingerprint identification device is caused.
The embodiments of the invention provide a kind of fingerprint identification device, including underlay substrate, be arranged on the underlay substrate it
On and the light-inductive unit that is arranged in array, be arranged on the hydrophobic structure on the light-inductive unit.
In a kind of possible embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, the hydrophobic knot
Structure includes being successively set on the CNT film layer and silicon fluoride film layer on the light-inductive unit.
In a kind of possible embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, the photaesthesia
Unit is answered to specifically include：The photodiode of electric signal is converted to for sensing the optical signal reflected at fingerprint median ridge or paddy, with
And for by the switching transistor of the electric signal output of the photodiode；
The fingerprint identification device also includes：Voltage signal line for providing voltage signal to the photodiode,
And for providing the scan line of scanning signal to the switching transistor.
In a kind of possible embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, the hydrophobic knot
Projection projection with the photodiode on the underlay substrate of the structure on the underlay substrate is overlapping.
In a kind of possible embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, the hydrophobic knot
Projection and the photodiode and switching transistor throwing on the underlay substrate of the structure on the underlay substrate
Shadow is overlapping.
Correspondingly, the embodiment of the present invention additionally provides a kind of touch control display apparatus, including it is provided in an embodiment of the present invention on
State any fingerprint identification device.
Correspondingly, the embodiment of the present invention additionally provides a kind of any of the above-described kind provided in an embodiment of the present invention of fingerprint recognition
The preparation method of device, this method includes：
The pattern of light-inductive unit is formed on underlay substrate using patterning processes；
The pattern of hydrophobic structure is formed on the light-inductive unit using patterning processes.
In a kind of possible embodiment, the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention
In, the use patterning processes form the pattern of light-inductive unit on underlay substrate, including：
The pattern of switching transistor is formed on the underlay substrate, the switching transistor includes grid, gate insulator
Layer, active layer, source electrode and drain electrode；The pattern of photodiode is formed on the underlay substrate, the photodiode includes
First electrode, photosensitive conducting layer and second electrode；Wherein, the first electrode is electrically connected with the source electrode or drain electrode；Or,
The pattern of photodiode is formed on the underlay substrate, the photodiode includes first electrode, photosensitive
Conductive layer and second electrode；On the underlay substrate formed switching transistor pattern, the switching transistor include grid,
Gate insulator, active layer, source electrode and drain electrode；Wherein, the first electrode is electrically connected with the source electrode or drain electrode.
In a kind of possible embodiment, the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention
In, the pattern of hydrophobic structure is formed on the light-inductive unit using patterning processes, including：
CNT film layer and silicon fluoride film layer are sequentially formed on the light-inductive unit；
In silicon fluoride film layer formation photoresist layer；
Development is exposed to the photoresist layer using the mask plate for the pattern for forming the photodiode, light is formed
Region is fully retained in photoresist and photoresist removes region completely；Wherein, region and the photoelectricity two is fully retained in the photoresist
Pole pipe is corresponding；
Etch away the photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, formed hydrophobic
The pattern of structure.
In a kind of possible embodiment, the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention
In, the pattern of hydrophobic structure is formed on the light-inductive unit using patterning processes, including：
CNT film layer and silicon fluoride film layer are sequentially formed on the light-inductive unit；
In silicon fluoride film layer formation photoresist layer；
The photoresist layer is exposed using the mask plate for the pattern for forming the photodiode and switching transistor
Photodevelopment, region is fully retained for formation photoresist and photoresist removes region completely；Wherein, region is fully retained in the photoresist
It is corresponding with the photodiode and the switching transistor；
Etch away the photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, formed hydrophobic
The pattern of structure.
In a kind of possible embodiment, the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention
In, etch away the photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, including：
By the way of dry etching, etch away the photoresist remove completely CNT film layer corresponding to region and
Silicon fluoride film layer.
The present invention has the beneficial effect that：
By the embodiments of the invention provide fingerprint identification device, and the light-inductive unit that is arranged in array on
Set hydrophobic structure, because hydrophobic structure plays a part of hydrophobic oleophobic so that when user with wet hand touch fingerprint identification device
When, improve the effect of fingerprint recognition.
Brief description of the drawings
Fig. 1 is a kind of structural representation of fingerprint identification device provided in an embodiment of the present invention；
Fig. 2 is the structural representation of second of fingerprint identification device provided in an embodiment of the present invention；
Fig. 3 is the structural representation of the third fingerprint identification device provided in an embodiment of the present invention；
Fig. 4 is the structural representation of the 4th kind of fingerprint identification device provided in an embodiment of the present invention；
Fig. 5 is the structural representation of the 5th kind of fingerprint identification device provided in an embodiment of the present invention；
Fig. 6 is a kind of schematic flow sheet of the preparation method of fingerprint identification device provided in an embodiment of the present invention；
Fig. 7 (a)-Fig. 7 (e) is respectively that a kind of preparation method of fingerprint identification device provided in an embodiment of the present invention is being performed
Structural representation after each step.
Embodiment
It is understandable to enable the above objects, features and advantages of the present invention to become apparent, below in conjunction with accompanying drawing and implementation
The present invention will be further described for example.However, example embodiment can be implemented in a variety of forms, and it is not understood as limited to
Embodiment set forth herein；On the contrary, these embodiments are provided so that the present invention more comprehensively and completely, and by example embodiment party
The design of formula comprehensively conveys to those skilled in the art.Identical reference represents same or similar knot in figure
Structure, thus repetition thereof will be omitted.It is described in the present invention expression position and direction word, be using accompanying drawing as
The explanation that example is carried out, but can also make a change as needed, make change and be all contained in the scope of the present invention.The present invention
Accompanying drawing be only used for illustrate relative position relation, the thickness at some positions employs the plotting mode lavished praise on oneself in order to understand, attached
Thickness in figure does not represent the proportionate relationship of actual thickness.
It should be noted that elaborating detail in the following description to fully understand the present invention.But this hair
Bright to be different from other manner described here with a variety of and be implemented, those skilled in the art can be without prejudice in the present invention
Similar popularization is done in the case of culvert.Therefore the present invention is not limited by following public embodiment.Such as in specification and
Some vocabulary have been used to censure specific components among claim.Those skilled in the art are, it is to be appreciated that hardware manufacturer can
Same component can be called with different nouns.This specification and claims are not used as differentiation group with the difference of title
The mode of part, but it is used as the criterion of differentiation with the difference of component functionally.Such as work as in specification in the whole text and claim
Mentioned in "comprising" be an open language, therefore " include but be not limited to " should be construed to.Specification subsequent descriptions are real
The better embodiment of the application is applied, so the description is for the purpose of the rule for illustrating the application, to be not limited to
Scope of the present application.The protection domain of the application is worked as to be defined depending on the appended claims person of defining.It should be understood that working as element such as
Layer, film, region or substrate be referred to as being located at another element " on " when, its can on another element, or
One or more intermediary elements can be inserted with.
The embodiments of the invention provide a kind of fingerprint identification device and preparation method thereof, touch control display apparatus, to avoid
The problem of wet hand touches the fingerprint recognition less effective that fingerprint identification device is caused.
Below in conjunction with the accompanying drawings, fingerprint identification device provided in an embodiment of the present invention and preparation method thereof, touch-control display are filled
The embodiment put is described in detail.
The thickness and shape of each film layer do not reflect actual proportions in accompanying drawing, and purpose is schematically illustrate present invention.
Referring to Fig. 1, the embodiments of the invention provide a kind of fingerprint identification device, including underlay substrate 01, substrate is arranged on
Light-inductive unit 02 that is on substrate 01 and being arranged in array, is arranged on the hydrophobic structure on light-inductive unit 02
03。
It should be noted that in order to avoid between light-inductive unit and hydrophobic structure signal interfere, hydrophobic
Matcoveredn 07 is set between structure 03 and light-inductive unit 02, and protective layer 07 plays a part of insulation.The material of protective layer
It is not specifically limited herein.
It is also to set it should be noted that in the embodiment of the present invention, hydrophobic structure is arranged on light-inductive unit
On the surface of fingerprint identification device, when user's finger touches fingerprint identification device, to first pass through the hydrophobic of hydrophobic structure and dredge
Oil effect, the fingerprint of finger is being detected by light-inductive unit.Therefore, the hydrophobic structure in the embodiment of the present invention is arranged on light
On quick sensing unit, to avoid the problem of wet hand touches the fingerprint recognition less effective that fingerprint identification device is caused.
Wherein, hydrophobic structure is arranged on light-inductive unit, including hydrophobic structure is flood structure, is arranged on fingerprint
The surface of identifying device, or the top of light-inductive unit is provided only on, it is not specifically limited herein.
Hydrophobic structure in the embodiment of the present invention refers to structure or film layer with hydrophobic effect and oleophobic effect.Herein
It is not specifically limited.
In a particular embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, referring to Fig. 2, hydrophobic structure bag
Include the CNT film layer 031 and silicon fluoride film layer 032 being successively set on light-inductive unit 02.Specifically, hydrophobic knot
Structure can be arranged on light-inductive unit to form film layer by carbon nano-tube material, then carry out surface by silicon fluoride again
Processing, forms the film layer of hydrophobic oleophobic effect.Wherein, light-inductive unit can be completely covered in hydrophobic structure.
In a particular embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, referring to Fig. 3, light-inductive list
Member 02 is specifically included：The photodiode 021 of electric signal is converted to for sensing the optical signal reflected at fingerprint median ridge or paddy, with
And for by the switching transistor 022 of the electric signal output of photodiode；Fingerprint identification device also includes：For to photoelectricity two
Pole pipe provides the voltage signal line 04 of voltage signal, and for providing the scan line of scanning signal to switching transistor.
Specifically, referring to Fig. 3, photodiode 021 includes being successively set on the first electrode layer on underlay substrate 01
0211st, photosensitive conducting layer 0212 and the second electrode lay 0213；Wherein, the second electrode lay 0213 is transparency conducting layer；First electrode
Layer 0211 can be transparency conducting layer or metal conducting layer.Switching transistor 022 include be successively set on underlay substrate 01 it
On grid 0221, gate insulator 0222, active layer 0223, and the source electrode 0224 that is electrically connected with active layer 0223 and drain electrode
0225；Wherein, fingerprint identification device also includes：The scan line electrically connected with the grid 0221 of switching transistor (is not drawn in figure
Go out).Wherein, the source electrode 0224 of switching transistor or drain electrode 0225 are electrically connected with the first electrode layer 0211 of photodiode 021.
Fingerprint identification device also includes：The voltage signal line 04 electrically connected with the second electrode lay 0213 of photodiode 021.Wherein,
The second electrode lay 0213 is electrically connected with by conductive layer 05 with voltage signal line 04.
Further, for the insulation protection to photodiode or switching diode in fingerprint identification device, fingerprint
Identifying device also includes：The insulating barrier 06 of source electrode 0224 or the 0225 place film layer that drains is arranged on, wherein conductive layer 05 is set
Put on insulating barrier 06, and electrically connected with the second electrode lay by the via through insulating barrier 06 and gate insulator 0222
Connect.
It should be noted that the structure of the photodiode 021 and switching transistor 022 shown in Fig. 3 is only one specific
Embodiment, but be not limited to the structure shown in Fig. 3.In the embodiment of the present invention, for photodiode and switching diode
Structure is not specifically limited.
In a particular embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, referring to Fig. 4, hydrophobic structure (carbon
Nanotube film layer 031 and silicon fluoride film layer 032) projection on underlay substrate with photodiode 021 on underlay substrate
Projection is overlapping.
Specifically, hydrophobic structure is placed only on photodiode 021, to touch fingerprint identification device in wet hand
When, play a part of hydrophobic oleophobic, improve the precision of fingerprint recognition.
In a particular embodiment, above-mentioned fingerprint identification device provided in an embodiment of the present invention, referring to Fig. 5, hydrophobic structure (carbon
Nanotube film layer 031 and silicon fluoride film layer 032) projection on underlay substrate and photodiode 021 and switching transistor 022
Projection on underlay substrate is overlapping.
Specifically, the photodiode and switching transistor in hydrophobic structure covering light-inductive unit, in wet hand
When touching fingerprint identification device, play a part of hydrophobic oleophobic, improve the precision of fingerprint recognition.
It should be noted that the hydrophobic structure in the embodiment of the present invention can also be covered in the whole table of fingerprint identification device
Face.
Based on same invention thought, the embodiment of the present invention additionally provides a kind of touch control display apparatus, including the present invention is implemented
Any of the above-described kind of the fingerprint identification device that example is provided.The embodiment of touch control display apparatus provided in an embodiment of the present invention
It is identical with above-mentioned fingerprint identification device with beneficial effect, it will not be repeated here.
Based on same invention thought, referring to Fig. 6, the embodiment of the present invention additionally provide it is a kind of it is provided in an embodiment of the present invention on
The preparation method for stating any fingerprint identification device, this method includes：
S601, the pattern that light-inductive unit is formed using patterning processes on underlay substrate；
S602, the pattern that hydrophobic structure is formed using patterning processes on light-inductive unit.
Wherein, the patterning processes in the embodiment of the present invention can only include photoetching process, or, can include photoetching process and
Etch step, while including printing, ink-jet etc. other technique for forming predetermined pattern can also to be used for；Photoetching process refers to include
The technique of the formation figure such as utilization photoresist, mask plate, exposure machine of the technical process such as film forming, exposure, development.In specific implementation
When, corresponding patterning processes of structure choice that can be according to formed in the present invention.
In a particular embodiment, in the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention, step
Form the pattern of light-inductive unit in S601 on underlay substrate using patterning processes, including：
Form the pattern of switching transistor on underlay substrate, switching transistor includes grid, gate insulator, active
Layer, source electrode and drain electrode；The pattern of photodiode is formed on underlay substrate, photodiode includes first electrode, photosensitive led
Electric layer and second electrode；Wherein, first electrode is electrically connected with source electrode or drain electrode；Or,
On underlay substrate formed photodiode pattern, photodiode include first electrode, photosensitive conducting layer and
Second electrode；Form the pattern of switching transistor on underlay substrate, switching transistor includes grid, gate insulator, active
Layer, source electrode and drain electrode；Wherein, first electrode is electrically connected with source electrode or drain electrode.
Specifically, the pattern of the first electrode of photodiode is formed while the grid of switching transistor is formed, the
One electrode is set with grid with layer, or, the material of first electrode is identical with grid material；Second electrode can be electrically conducting transparent
Layer.
In a particular embodiment, in the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention, step
S602 forms the pattern of hydrophobic structure using patterning processes on light-inductive unit, including：On light-inductive unit
Sequentially form CNT film layer and silicon fluoride film layer；In silicon fluoride film layer formation photoresist layer；Using forming photoelectricity two
The mask plate of the pattern of pole pipe is exposed development to photoresist layer, and region is fully retained for formation photoresist and photoresist is gone completely
Except region；Wherein, that region is fully retained is corresponding with photodiode for photoresist；Etch away photoresist remove completely region institute it is right
The CNT film layer and silicon fluoride film layer answered, form the pattern of hydrophobic structure.
Specifically, projection of the projection with photodiode on underlay substrate when hydrophobic structure on underlay substrate is overlapping
When, the pattern of hydrophobic structure can be formed using the mask plate for forming photodiode, so as to save to form hydrophobic structure institute
The mask plate of use, so as to simplify technique.Wherein, formed CNT film layer and silicon fluoride film layer can using deposition or
The mode of coating, is not specifically limited herein.
In a particular embodiment, in the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention, step
S602 forms the pattern of hydrophobic structure using patterning processes on the light-inductive unit, including：In light-inductive unit
On sequentially form CNT film layer and silicon fluoride film layer；In silicon fluoride film layer formation photoresist layer；Using forming light
The mask plate of electric diode and the pattern of switching transistor is exposed development to photoresist layer, forms photoresist and area is fully retained
Domain and photoresist remove region completely；Wherein, that region is fully retained is corresponding with photodiode and switching transistor for photoresist；
Etch away photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, form the pattern of hydrophobic structure.
Specifically, when projection of the hydrophobic structure on underlay substrate with photodiode and switching transistor in underlay substrate
On projection it is overlapping when, the pattern of hydrophobic structure can using forming photodiode and the mask plate of switching transistor is formed,
So as to save to form the mask plate that hydrophobic structure is used, so as to simplify technique.Wherein, CNT film layer and fluorine are formed
Silane film layer can be herein not specifically limited by the way of deposition or coating.
In a particular embodiment, in the preparation method of above-mentioned fingerprint identification device provided in an embodiment of the present invention, etch away
Photoresist removes the CNT film layer and silicon fluoride film layer corresponding to region completely, including：By the way of dry etching, carve
Eating away photoresist removes the CNT film layer and silicon fluoride film layer corresponding to region completely.
The preparation method of fingerprint identification device provided in an embodiment of the present invention is described in detail below by specific embodiment
Specific steps, including：
Step one, grid 0221, the pattern of first electrode layer 0211 are formed on underlay substrate 01 using patterning processes, with
And the pattern of the voltage signal line 04 set with grid 0221 with layer is formed, shown in such as Fig. 7 (a)；
Step 2, forms photosensitive conducting layer 0212 and the second electrode lay 0213, such as Fig. 7 on first electrode layer 0211
(b) shown in；
Step 3, forms the gate insulator of covering grid 0221 and the second electrode lay 0213 on grid 0221
0222, active layer 0223, and the source electrode 0224 electrically connected with active layer 0223 are sequentially formed on gate insulator 0222
With drain electrode 0225, such as shown in Fig. 7 (c)；
Step 4, in source electrode 0224 or the place film layer formation insulating barrier 06 of drain electrode 0225, play photodiode and
The effect of switching transistor, and on insulating barrier 06 formed conductive layer 05 pattern, wherein conductive layer 05 is by through insulation
The via of layer 06 and gate insulator 0222 is electrically connected with the second electrode lay 0213, and by through insulating barrier 06 and grid
The via of insulating barrier 0222 is electrically connected with voltage signal line 04, shown in such as Fig. 7 (d)；
Step 5, receives in the body structure surface formation protective layer 07 shown in Fig. 7 (d), and in the top of protective layer 07 formation carbon
Mitron film layer 031 and silicon fluoride film layer 032, so that hydrophobic structure is formed, shown in such as Fig. 7 (e).
In summary, fingerprint identification device provided in an embodiment of the present invention, is included in the light-inductive list being arranged in array
Hydrophobic structure is formed on member, hydrophobic structure includes CNT film layer and silicon fluoride film layer, so as to serve hydrophobic oleophobic
Effect, it is to avoid when wet hand touches fingerprint identification device, cause the problem of fingerprint recognition effect is not good.Specifically, it is of the invention
The projection that the hydrophobic structure that embodiment is provided is projected with photodiode on underlay substrate on underlay substrate is overlapping, or dredges
Projection of projection of the water-bound on underlay substrate with photodiode and switching transistor on underlay substrate is overlapping so that logical
Cross the effect of hydrophobic structure, it is to avoid influence of the wet hand to photodiode.
Obviously, those skilled in the art can carry out the essence of various changes and modification without departing from the present invention to the present invention
God and scope.So, if these modifications and variations of the present invention belong to the scope of the claims in the present invention and its equivalent technologies
Within, then the present invention is also intended to comprising including these changes and modification.
Claims (11)
1. a kind of fingerprint identification device, it is characterised in that including underlay substrate, it is arranged on the underlay substrate and in battle array
The light-inductive unit of arrangement is arranged, the hydrophobic structure on the light-inductive unit is arranged on.
2. device according to claim 1, it is characterised in that
The hydrophobic structure includes being successively set on the CNT film layer and silicon fluoride film layer on the light-inductive unit.
3. device according to claim 1 or 2, it is characterised in that the light-inductive unit is specifically included：For sensing
The optical signal reflected at fingerprint median ridge or paddy is converted to the photodiode of electric signal, and for by the photodiode
The switching transistor of electric signal output；
The fingerprint identification device also includes：Voltage signal line for providing voltage signal to the photodiode, and
Scan line for providing scanning signal to the switching transistor.
4. device according to claim 3, it is characterised in that projection of the hydrophobic structure on the underlay substrate with
Projection of the photodiode on the underlay substrate is overlapping.
5. device according to claim 3, it is characterised in that projection of the hydrophobic structure on the underlay substrate with
The projection of the photodiode and the switching transistor on the underlay substrate is overlapping.
6. a kind of touch control display apparatus, it is characterised in that including the fingerprint identification device described in any claims of claim 1-5.
7. a kind of preparation method of the fingerprint identification device described in any claims of claim 1-5, it is characterised in that this method bag
Include：
The pattern of light-inductive unit is formed on underlay substrate using patterning processes；
The pattern of hydrophobic structure is formed on the light-inductive unit using patterning processes.
8. method according to claim 7, it is characterised in that the use patterning processes form photosensitive on underlay substrate
The pattern of sensing unit, including：
The pattern of switching transistor is formed on the underlay substrate, the switching transistor includes grid, gate insulator, had
Active layer, source electrode and drain electrode；The pattern of photodiode is formed on the underlay substrate, the photodiode includes the first electricity
Pole, photosensitive conducting layer and second electrode；Wherein, the first electrode is electrically connected with the source electrode or drain electrode；Or,
The pattern of photodiode is formed on the underlay substrate, the photodiode includes first electrode, photosensitive conducting
Layer and second electrode；The pattern of switching transistor is formed on the underlay substrate, the switching transistor includes grid, grid
Insulating barrier, active layer, source electrode and drain electrode；Wherein, the first electrode is electrically connected with the source electrode or drain electrode.
9. method according to claim 8, it is characterised in that use patterning processes shape on the light-inductive unit
Into the pattern of hydrophobic structure, including：
CNT film layer and silicon fluoride film layer are sequentially formed on the light-inductive unit；
In silicon fluoride film layer formation photoresist layer；
Development is exposed to the photoresist layer using the mask plate for the pattern for forming the photodiode, photoresist is formed
Region is fully retained and photoresist removes region completely；Wherein, region and the photodiode is fully retained in the photoresist
It is corresponding；
Etch away the photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, form hydrophobic structure
Pattern.
10. method according to claim 8, it is characterised in that using patterning processes on the light-inductive unit
The pattern of hydrophobic structure is formed, including：
CNT film layer and silicon fluoride film layer are sequentially formed on the light-inductive unit；
In silicon fluoride film layer formation photoresist layer；
The photoresist layer is exposed using the mask plate for the pattern for forming the photodiode and switching transistor aobvious
Shadow, region is fully retained for formation photoresist and photoresist removes region completely；Wherein, region and institute is fully retained in the photoresist
State photodiode corresponding with the switching transistor；
Etch away the photoresist and remove CNT film layer and silicon fluoride film layer corresponding to region completely, form hydrophobic structure
Pattern.
11. method according to claim 9 or 10, it is characterised in that etch away the photoresist and remove completely corresponding to region
CNT film layer and silicon fluoride film layer, including：
By the way of dry etching, etch away the photoresist and remove CNT film layer and fluorine silicon corresponding to region completely
Alkane film layer.
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| CN201710537830.1A CN107330411A (en) | 2017-07-04 | 2017-07-04 | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus |
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| CN201710537830.1A CN107330411A (en) | 2017-07-04 | 2017-07-04 | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109190563A (en) * | 2018-09-05 | 2019-01-11 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, display device |
| CN109993149A (en) * | 2019-04-12 | 2019-07-09 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint recognition mould group |
| CN110086873A (en) * | 2019-04-30 | 2019-08-02 | 芜湖翼讯飞行智能装备有限公司 | A kind of enterprise's office is with multiple terminals computer without disc system and equipment |
| CN110210442A (en) * | 2019-06-11 | 2019-09-06 | 京东方科技集团股份有限公司 | A kind of ultrasound fingerprint recognition circuit and its driving method, fingerprint identification device |
| CN110783326A (en) * | 2019-10-31 | 2020-02-11 | 京东方科技集团股份有限公司 | Substrate, preparation method thereof, display panel and display device |
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| CN109190563A (en) * | 2018-09-05 | 2019-01-11 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, display device |
| CN109993149A (en) * | 2019-04-12 | 2019-07-09 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint recognition mould group |
| CN109993149B (en) * | 2019-04-12 | 2021-10-26 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint identification module |
| CN110086873A (en) * | 2019-04-30 | 2019-08-02 | 芜湖翼讯飞行智能装备有限公司 | A kind of enterprise's office is with multiple terminals computer without disc system and equipment |
| CN110210442A (en) * | 2019-06-11 | 2019-09-06 | 京东方科技集团股份有限公司 | A kind of ultrasound fingerprint recognition circuit and its driving method, fingerprint identification device |
| US11361577B2 (en) | 2019-06-11 | 2022-06-14 | Boe Technology Group Co., Ltd. | Ultrasonic fingerprint identification circuit, driving method thereof, and fingerprint identification device |
| CN110783326A (en) * | 2019-10-31 | 2020-02-11 | 京东方科技集团股份有限公司 | Substrate, preparation method thereof, display panel and display device |
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Application publication date: 20171107 |