CN107329246A - One kind scanning particle beam microscopy system and focusing controlling method - Google Patents
One kind scanning particle beam microscopy system and focusing controlling method Download PDFInfo
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- CN107329246A CN107329246A CN201710594997.1A CN201710594997A CN107329246A CN 107329246 A CN107329246 A CN 107329246A CN 201710594997 A CN201710594997 A CN 201710594997A CN 107329246 A CN107329246 A CN 107329246A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/006—Optical details of the image generation focusing arrangements; selection of the plane to be imaged
Abstract
Particle beam microscopy is scanned the invention discloses one kind, including：Scan particle beam microscopy and focus control system；The focus control system includes：Two illumination imaging devices, the light beam for producing the carrying focusedimage that illuminating bundle and transmission are reflected from sample surfaces；Two reflection units, the illuminating bundle for corresponding illumination imaging device to be produced reflexes to the sample surfaces and the light beam for the carrying focusedimage for reflecting the sample surfaces reflexes to the detection device；Two detection devices, for receiving the light beam of the carrying focusedimage reflected from the sample surfaces, and detect the focusedimage that the light beam is carried；Focus control device, for handling the focusedimage, obtains the distance property of the sample, and adjusts the location parameter of the sample according to the distance property, to control the operating distance for scanning particle beam microscopy.The invention also discloses a kind of focusing controlling method.
Description
Technical field
The present invention relates to scanning particle beam microscopy technology, more particularly to a kind of scanning particle beam microscopy system and focusing
Control method.
Background technology
SEM (Scanning Electron Microscope, SEM) and focused ion beam apparatus
(Focused Ion Beam Apparatus, FIB) etc. scans particle beam microscopy, makes in modern production and scientific research
With more and more extensive.
The particle beam microscopy depth of field is scanned in nm~um magnitudes, especially under the conditions of high-resolution, the depth of field is smaller；Utilize
When scanning the sample of particle beam microscopy observation, if the change of sample surfaces height exceedes the depth of field of scanning particle beam microscopy,
Just it is unable to blur-free imaging.The electromagnetic lens that particle beam microscopy is generally scanned by adjusting is focused on, to ensure that the scanning particle beams shows
The operating distance of micro mirror is constant.
But, there is hysteresis effect during due to regulation electromagnetic lens, therefore, influenceed, passed through by the hysteresis feedback time
When changing the focusing of electromagnetic lens current value adjustment electromagnetic lens, charged particle beam can not make corresponding change at once.In addition, by
It is uncertain in height of specimen variable quantity, cause the distance of microscope to sample surfaces also not know；Accordingly, it would be desirable to adjust electricity repeatedly
The current value of magnetic lenses, focus current is determined to find suitable current value near focus current, makes charged particle beam weight
Newly focus on sample surfaces.Not only the consumption of regulation process is of long duration, and charged particle beam irradiates for a long time to sample, holds
Easy damaged sample；Electric charge accumulation effect is easily produced particularly with non-conductive sample, so as to influence picture quality.
In addition, when observing sample using scanning particle beam microscopy, expecting to obtain in whole range of observation
The brightness of all images, contrast is consistent；It is therefore necessary to ensure in whole detection process charged particle beam work bar
Part keeps constant, that is, ensures that focused condition, the charged particle beam energy of charged particle beam do not change.And adjust electromagnetic lens
Focus on, it will usually change the focused condition of charged particle beam, influence the uniformity of picture quality.Also, in electromagnetic lens adjustment
During to different current values, the change in magnetic field can influence the rotation of the return signal electronics excited on initial electron beam and sample,
The rotation of observation image is caused, increases the complexity of graphical analysis.
In sample detection process, regulation sample stage makes it remain that the same distance is (i.e. logical between electromagnetic lens
The operating distance or height of specimen of charged particle beam microscopy described in often) being consistent property of image can be made；But, conventional belt
The readability that charged particle beam microscope can only be focused on by image judges whether operating distance sends change, not only needs flower
Take long time, and the standard judged can not be unified, criterion complexity is big.
The content of the invention
What the technical scheme of the embodiment of the present invention was realized in：
The embodiment of the present invention provides a kind of scanning particle beam microscopy system, including：Scan particle beam microscopy and control
The focus control system of the scanning particle beam microscopy operating distance；Wherein,
The focus control system includes：
Two illumination imaging devices, are symmetrically positioned in above the vacuum chamber of the scanning particle beam microscopy and scanning
The charged particle opticses lens barrel side of particle beam microscopy, for producing illuminating bundle and transmission from sample surfaces reflection
Carry the light beam of focusedimage；The sample is located in the vacuum chamber；
Two reflection units, are symmetrically positioned in inside the vacuum chamber, for produce corresponding illumination imaging device
Illuminating bundle reflexes to the sample surfaces and the light beam for the carrying focusedimage for reflecting the sample surfaces reflexes to institute
State detection device；
Two detection devices, are symmetrically positioned in the top of described two illumination imaging devices, for receiving from the sample table
The light beam of the carrying focusedimage of face reflection, and detect the focusedimage that the light beam is carried；
Focus control device, for handling the focusedimage, the distance property of the acquisition sample, and according to
The distance property adjusts the location parameter of the sample, the operating distance to control the scanning particle beam microscopy.
In such scheme, the scanning particle beam microscopy includes：For producing the charged particle source of charged particle beam, using
In the charged particle opticses lens barrel for focusing on, deflecting the charged particle beam and be connected with the charged particle opticses lens barrel it is true
Plenum chamber.
In such scheme, the illumination imaging device includes：
Light source, for producing illuminating bundle；
Grating, the grating pattern for forming at least one shape；
Prism, imaging len is projected to for guiding the illuminating bundle by the grating pattern；
The imaging len, for guiding after the reflected device reflection of the illuminating bundle, the grating pattern is focused on
To the sample surfaces.
In such scheme, the imaging len is additionally operable to guide the light beam of the carrying focusedimage to be projected to the spy
Survey device.
In such scheme, it is provided with the top of the vacuum chamber corresponding two with described two illumination imaging devices difference
Vacuum window, the vacuum window is used to make the illuminating bundle enter the vacuum chamber and make the carrying focusedimage
Light beam passes through the vacuum chamber.
In such scheme, the imaging len at least includes a telecentric lens system, for guiding the illuminating bundle
The grating pattern demagnification is focused into the sample surfaces and the guiding light beam amplification for carrying focusedimage is focused to
The detection device.
In such scheme, the focus control device includes：
Processor, is handled for the sample focusedimage to different distance, obtains the distance change amount of the sample；
The distance is that sample scans the distance between particle beam microscopy to described；
Position adjustment component, the location parameter for adjusting the sample according to the distance change amount.
Wherein, the position adjustment component includes at least three piezoelectric ceramic motor.
The embodiment of the present invention also provides a kind of focusing controlling method, applied to scanning particle beam microscopy system, the system
System produces the two beam illuminating bundles with symmetric position relation, including：
The two beam illuminating bundles for carrying grating pattern focus on sample surfaces by demagnification respectively, anti-through the sample surfaces
After penetrating, focal imaging is exaggerated respectively；
Separately detect be focused raster image；
The distance property of the sample is obtained based on the focusedimage, and the sample is adjusted according to the distance property
Location parameter.
In such scheme, it is saturating that the illuminating bundle is projected to imaging after grating incidence to prism, by the grating pattern
Mirror；
The grating pattern demagnification is focused to the sample by the illuminating bundle after the imaging len and reflection unit
Product surface；
The focusedimage reflected from the sample surfaces is reflected by reflection unit after imaged lens, is exaggerated and is focused on
Imaging.
In such scheme, from the light beam that focusedimage is carried described in illumination imaging systems outgoing, detection device is projected to, with
The focusedimage for carrying light beam described in the detection.
In such scheme, the distance property that the sample is obtained based on the focusedimage, and according to the distance
Attribute adjusts the location parameter of the sample, including：
The sample focusedimage of different distance is handled, the distance change amount of the sample is obtained；The distance is
Sample scans the distance between particle beam microscopy to described；
The location parameter of the sample is adjusted according to the distance change amount.
In the embodiment of the present invention, gather by the way that in the outside of traditional scanning particle beam microscopy structure, increase by one is independent
Burnt control system, the focus control system is handled the focusedimage that sample surfaces reflect, obtain the sample away from
From attribute, and according to the location parameter of the distance property regulation sample, to control the scanning particle beam microscopy
Operating distance, realize the uniformity of scan image that scanning charged particle beam microscopy is observed；Control is focused on due to described
System processed adjusts the location parameter of sample under control of the computer, this improves degree of regulation, shortens observing time.
Brief description of the drawings
Fig. 1 is a kind of composition structural representation for scanning particle beam microscopy system of the embodiment of the present invention one；
Fig. 2 is the operation principle schematic diagram of focus control system of the embodiment of the present invention；
Detection schematic diagram of the focus control system to sample when Fig. 3 is sample inclination of the embodiment of the present invention；
Fig. 4 is a kind of composition structural representation for scanning particle beam microscopy system of the embodiment of the present invention two；
Fig. 5 is the structural representation of position adjustment component of the embodiment of the present invention；
Fig. 6 is a kind of handling process schematic diagram of the focusing controlling method of the embodiment of the present invention three；
Fig. 7, which is that the embodiment of the present invention four is a kind of, scans the schematic flow sheet that particle beam microscopy realizes focus control.
Embodiment
The present invention is described in further detail with specific embodiment below in conjunction with the accompanying drawings.It should be appreciated that described herein
Specific embodiment only to explain the present invention, be not intended to limit the present invention.
Embodiment one
A kind of scanning particle beam microscopy system of the embodiment of the present invention one, the composition of the scanning particle beam microscopy system
Structure, as shown in figure 1, the scanning particle beam microscopy system includes：Scan particle beam microscopy and focus control system, institute
State the operating distance that focus control system is used to control the scanning particle beam microscopy.
In the embodiment of the present invention, the scanning particle beam microscopy includes：Charged particle source 101, charged particle opticses mirror
Cylinder 103 and vacuum chamber 140.
The charged particle beam that wherein, the charged particle source 101 is produced focuses on through the charged particle opticses lens barrel 103,
After deflection, into vacuum chamber 140.
In the embodiment of the present invention, the focus control system includes：First illumination imaging device 11, second illumination imaging dress
Put the 12, first reflection unit 115, the second reflection unit 125, the second detection device 120 and focus control device 130.
Wherein, first illumination imaging device 11 be located at it is described scanning particle beam microscopy vacuum chamber above and
The side of charged particle opticses lens barrel 103, for producing illuminating bundle.
First illumination imaging device 11 includes：First light source 110, the first grating 112, the first prism 111 and first
Imaging len 113.
Wherein, the illuminating bundle that first light source 110 is produced forms grating pattern after projecting the first grating 112, then
Change the transmission direction of illuminating bundle by the first prism 111；First prism 111 is used to guide the illuminating bundle by institute
State the image of the first grating 112 and be projected to first imaging len 113；First imaging len 113 guides the illumination light
After beam reflects through the first reflection unit 115, the grating pattern demagnification is focused into the surface of sample 141；The sample 141 is placed in
On sample stage 142 in the vacuum chamber 140.
In a preferred embodiment, first reflection unit 115 is equipped with angle adjustable system, to ensure the survey of height
Sensitivity is measured, the illumination light reflexed on sample 141 is made by the first reflection unit 115 described in the angle adjustable system fading margin
Angle between beam and sample 141 is less than 15 °；The function that first reflection unit 115 is realized can be realized by speculum.
Here, the first vacuum window 114 and the second vacuum window 124 are provided with the top of the vacuum chamber 140, it is described to shine
Mingguang City's beam enters after the vacuum chamber 140 via first vacuum window 114, exposes to first reflection unit 115；Institute
After the light beam for carrying focusedimage is stated via second vacuum window 124, second illumination imaging device 12 is exposed to；It is described
The illuminating bundle that first illumination imaging device 11 is produced is reflexed to the surface of sample 141, institute by the first reflection unit 115
State illuminating bundle and the light beam for carrying focusedimage is reflected to form on the surface of sample 141；The light beam for carrying focusedimage
After being reflected through second reflection unit 125, into second illumination imaging device 12.
Second illumination imaging device 12 includes：Second imaging len 123；Therefore, the light for carrying focusedimage
After beam is via second vacuum window 124, second imaging len 123 is exposed to；Second imaging len 123 guides institute
The light beam amplification for stating carrying focusedimage focuses to second detection device 120.
Second detection device 120, positioned at the top of second illumination imaging device 12, for detecting the light beam
The focusedimage of carrying.The focus control device 130, is handled the focusedimage, obtains the distance of the sample
Attribute, and according to the location parameter of the distance property regulation sample, to control the scanning particle beam microscopy
Operating distance.Specifically, the sample 141 can be adjusted by adjusting the movement for the sample stage 142 for carrying the sample 141
Location parameter.
In an embodiment, the focus control device 130 enters for the sample focusedimage to different distance
Row processing, obtains the distance change amount of the sample 141；The distance be the product of sample 141 to it is described scanning particle beam microscopy it
Between distance, and adjust according to the distance change amount location parameter of the sample 141.
In an embodiment, each optical element in first illumination imaging device 11 can be cured as one
Module with adjusting apparatus, can facilitate and optical parametric is adjusted outside the vacuum chamber 140, and by adjusting the mould
The Z-direction of group highly adapts to the different operating distances of the scanning particle beam microscopy.
In a preferred embodiment, the function of first light source 110 can be by light emitting diode (Light Emitting
Diode, LED) realize.First grating 112 can be the optical grating construction comprising various shapes.First imaging len
113 be telecentric lens system, different module Z-direction height is can adapt to, to improve the appearance of first illumination imaging device 11
Difference.
In a preferred embodiment, second reflection unit 125 is equipped with angle adjustable system, to ensure the survey of height
Sensitivity is measured, by the angle of inclination of the second reflection unit 125 described in the angle adjustable system fading margin, makes the first reflection dress
The angle put between 115 and second reflection unit 125 and the surface of sample 141 is consistent.Second reflection unit 125 is realized
Function can be realized by speculum.
In the embodiment of the present invention, the focusedimage reflected from the surface of sample 141 through second imaging len focuses to institute
State the image space in the second detection device 120 relevant with the apparent height of sample 141.Specifically, the focus control system
Operation principle schematic diagram, if as shown in Fig. 2 the surface of sample 141 exist it is raised, in the height of the direction sample 141 of vector 200
Change；According to optical imaging concept, focus pattern forms the position of image along vector in second detection device 120
Move in 210 directions.
Meanwhile, the image space that the focusedimage reflected from the surface of sample 141 is focused in second detection device 120
Also there is relation with the gradient on the surface of sample 141, as shown in figure 3, when between sample stage 142 or the surface of sample 141 and horizontal plane
Inclination angle be α when, according to optical imaging concept, second detection device 120 detected from the surface of sample 141 reflection
141 horizontal positioned of illuminating bundle and sample when the reflected beams 126 that are detected between angle be 2 α；Therefore, it is described poly-
Position of the burnt image in second detection device 120 can also shift.
It should be noted that in the embodiment of the present invention, first illumination imaging device 11 is located at the optical tubes 103
Left side, second illumination imaging device 12 and second detection device 120 are located at the right side of the optical tubes 103.
In another embodiment, first illumination imaging device 11 can be located at the right side of the optical tubes 103, described the
Two illumination imaging devices 12 and second detection device 120 can be located at the left side of the optical tubes 103.
Embodiment two
Because the inclination of sample in the embodiment of the present invention one or sample stage also results in the position of focusedimage on the detector
Put and shift, therefore, the embodiment of the present invention two provides a kind of scanning particle beam microscopy system, can avoid above-described embodiment
Due to the problem of result of detection is inaccurate caused by the inclination of sample or sample stage in one；The scanning particle beam microscopy system
Composition structure, as shown in figure 4, including：Particle beam microscopy and focus control system are scanned, the focus control system is used for
The operating distance of the control scanning particle beam microscopy.
In the embodiment of the present invention, the scanning particle beam microscopy includes：Charged particle source 101, charged particle opticses mirror
Cylinder 103 and vacuum chamber 140.
The charged particle beam that wherein, the charged particle source 101 is produced focuses on through the charged particle opticses lens barrel 103,
After deflection, into vacuum chamber 140.
In the embodiment of the present invention, the focus control system includes：First illumination imaging device the 11, the 3rd illumination imaging dress
Put the 13, first reflection unit 115, the second reflection unit 125, the first detection device 121, the second detection device 120 and focus on control
Device 130 processed.
Wherein, the illumination imaging device 13 of the first illumination imaging device 11 and the 3rd is symmetrically located in the scanning particle
The top of the vacuum chamber 140 of beam microscope, and the optical tubes 103 both sides；First illumination imaging device 11
With the 3rd illumination imaging device 13, it is used to produce the carrying focused view that illuminating bundle and transmission are reflected from the surface of sample 141
The light beam of picture；The sample 141 is located inside the vacuum chamber 140.
First illumination imaging device 11 includes：First light source 110, the first grating 112, the first prism 111 and first
Imaging len 113.
Wherein, the illuminating bundle that first light source 110 is produced forms grating pattern after projecting the first grating 112, then
Change the transmission direction of illuminating bundle by the first prism 111；First prism 111 is used to guide the illuminating bundle by institute
The pattern projection of grating 112 is stated to first imaging len 113；First imaging len 113 guides the illuminating bundle to pass through
After the reflection of first reflection unit 115, the grating pattern demagnification is focused into the surface of sample 141；Specifically, by the raster pattern
Case demagnification focuses on the position on the surface of sample 141, positioned at the position of optical axis 102 of the scanning particle beam microscopy；The sample
141 are placed on the sample stage 142 in the vacuum chamber 140.
In a preferred embodiment, first reflection unit 115 is equipped with angle adjustable system, to ensure the survey of height
Sensitivity is measured, the illumination light reflexed on sample 141 is made by the first reflection unit 115 described in the angle adjustable system fading margin
Angle between beam and sample 141 is less than 15 °；The function that first reflection unit 115 is realized can be realized by speculum.
Here, the top of the vacuum chamber 140 is provided with the first vacuum window 114, the illuminating bundle is via described
First vacuum window 114 enters after the vacuum chamber 140, exposes to first reflection unit 115；The carrying focusedimage
Light beam via second vacuum window 124 after, expose to the 3rd illumination imaging device 13.
The illuminating bundle that first illumination imaging device 11 is produced is reflexed to the sample by first reflection unit 115
The surface of product 141, the illuminating bundle reflects to form the light beam for carrying focusedimage on the surface of sample 141；It is described to carry poly-
After the light beam of burnt image reflects through second reflection unit 125, into the 3rd illumination imaging device 13.
3rd illumination imaging device 13 includes：Second imaging len 123, the second prism 127, the second grating 122 and
Secondary light source 126；Therefore, after the light beam for carrying focusedimage is via second vacuum window 124, described second is exposed to
Imaging len 123；Second imaging len 123 guides the light beam of the carrying focusedimage after second prism 127,
It is projected to second detection device 120.
Second detection device 120, positioned at the top of second illumination imaging device 12, for detecting the light beam
The focusedimage of carrying.The focus control device 130, is handled the focusedimage, obtains the distance of the sample
Attribute, and according to the location parameter of the distance property regulation sample, to control the scanning particle beam microscopy
Operating distance.
Specifically, the focus control device 130 includes processor 131 and position adjustment component 132, the processor
131 can be handled the focusedimage of the sample of different operating distance, obtain the distance change amount of the sample, the position
Adjust the position that component 132 adjusts the sample according to the distance change amount.When adjusting the position of the sample, it can pass through
Regulation carries the movement of the sample stage 142 of the sample 141 to adjust the location parameter of the sample 141；As adjusted carrying institute
State the Z-direction adjusting apparatus such as movement or the regulation piezoelectric ceramic motor of the horizontal X or Y-direction of the sample stage 142 of sample 141 and come real
Now to the position adjustment of the sample.
In a preferred embodiment, the structure of the position adjustment component 132, as shown in figure 5, including X/Y plane adjustment
Device 401 and at least one Z-direction adjusting apparatus 402；When the position adjustment component 132 includes some Z-direction adjusting apparatus, only
The height of the sample stage 142 can be adjusted；When the position adjustment component 132 includes more than 3 points Z-direction adjusting apparatus, not only
The height of the sample stage 142 can be adjusted, additionally it is possible to adjust the angle of inclination of the sample stage 142；Wherein, the Z-direction is adjusted
The function of engagement positions can be realized by piezoelectric ceramic motor.
Based on the explanation to above-mentioned scanning particle beam microscopy system, it can be seen that in the first illumination imaging device 11
The illuminating bundle that first light source 110 is produced is after first imaging len 113 and first reflection unit 115, illumination light
The grating pattern demagnification that first grating 112 described in Shu Jing is produced focuses on sample surfaces, produces focusedimage；I.e. described illumination light
Beam reflects to form the light beam for carrying focusedimage on the surface of sample 141；The light beam for carrying focusedimage is through described the
After the reflection of two reflection units 125, into the 3rd illumination imaging device 13.The light beam for carrying focusedimage is via described
After second vacuum window 124, second imaging len 123 is exposed to；Second imaging len 123 guides described carry to focus on
The light beam of image amplifies after second prism 127 focuses on second detection device 120.
Based on particle beam microscopy system is scanned described in the embodiment of the present invention, also there is another beam Propagation line simultaneously
Road；Specifically, the illuminating bundle that the secondary light source 126 in the 3rd illumination imaging device 13 is produced is through projecting second grating
122 form grating pattern, change illuminating bundle transmission direction by second prism 127, by second imaging len 123
And grating pattern demagnification is focused on to produce on the surface of sample 141 and gathered by the guiding illumination light beam of the second reflection unit 125
Burnt image；After the light beam for carrying focusedimage reflects through first reflection unit 115, into the described first illumination imaging
Device 11.After the light beam for carrying focusedimage is via first vacuum window 114, first imaging len is exposed to
113；First imaging len 113 guides the light beam of the carrying focusedimage to amplify focusing after first prism 111
In first detection device 121.
In an embodiment, the focus control device 130 enters for the sample focusedimage to different distance
Row processing, obtains the distance change amount of the sample 141；The distance be the product of sample 141 to it is described scanning particle beam microscopy it
Between distance, and adjust according to the distance change amount location parameter of the sample 141.
In an embodiment, each optical element in first illumination imaging device 11 can be cured as one
Module with adjusting apparatus, can facilitate and optical parametric is adjusted outside the vacuum chamber 140, and by adjusting the mould
The Z-direction of group highly adapts to the different operating distances of the scanning particle beam microscopy.
In a preferred embodiment, the function of the light source 110 can be by light emitting diode (Light Emitting
Diode, LED) realize.The grating 112 can be the optical grating construction comprising various shapes.First imaging len 113 is
Telecentric lens system, can adapt to different module Z-direction height, to improve the tolerance of first illumination imaging device 11.
In a preferred embodiment, second reflection unit 125 is equipped with angle adjustable system, the second reflection dress
Putting the function of 125 realizations can be realized by speculum.Meanwhile, first reflection unit 115 and second reflection unit 125 are closed
It is symmetrically placed in scanning particle beam microscopy optical axis 102, and first reflection unit 115 and second reflection unit 125
It is consistent with the angle on the surface of sample 141.
In the embodiment of the present invention, two beams illumination imaging beam is transmitted along symmetric path, therefore, with wherein one beam Propagation
Exemplified by path, the focusedimage reflected from the surface of sample 141 through second imaging len focuses to second detection device
Image space on 120 is relevant with the apparent height of sample 141.Specifically, the schematic diagram of the focus control system, such as Fig. 2
It is shown, if the surface of sample 141 has projection, changed in the height of the direction sample 141 of vector 200；According to optical imagery
Moved along the direction of vector 210 principle, the position that focus pattern forms image in second detection device 120.
Meanwhile, the image space that the focusedimage reflected from the surface of sample 141 is focused in second detection device 120
Also there is relation with the gradient on the surface of sample 141, as shown in figure 3, when between sample stage 142 or the surface of sample 141 and horizontal plane
Inclination angle be α when, according to optical imaging concept, second detection device 120 detected from the surface of sample 141 reflection
141 horizontal positioned of illuminating bundle and sample when the reflected beams 126 that are detected between angle be 2 α；Therefore, it is described poly-
Position of the burnt image in second detection device 120 can also shift.
In the embodiment of the present invention, the illumination imaging device 13 of the first illumination imaging device 11 and the 3rd is with the scanning grain
Centered on the microscopical optical axis of beamlet, the both sides of the optical tubes 103 and the top of the vacuum chamber 140 are symmetrically located in
Portion；First detection device 121 is located at the top of the first illumination imaging device 11, and the second detection device 120 is located at the 3rd and shone
The top of bright imaging device 13, because the position relationship of the illumination imaging device 13 of the first illumination imaging device 11 and the 3rd has
There is symmetry, therefore, the position relationship of the first detection device 121 and second detection device 120 also has symmetry.It is comprehensive
On, it can be seen that focus control system described in the embodiment of the present invention two is symmetrical structure, its two beam illuminating bundle produced
Transmitting procedure also has symmetry.Therefore, when the inclination angle between sample surfaces or sample stage and horizontal plane is α, described the
The offset direction of the image that one detection device 121 and second detection device 120 are detected is opposite, offset is identical；And work as
When the height of sample 141 changes, the image that first detection device 121 and second detection device 120 are detected
Offset direction and offset are all identical.Therefore, the processor 131 can be by calculating the side of both sides offset vector average value
Method, obtains sample position variable quantity, result of calculation is not influenceed by sample or sample stage are inclined.The symmetrical finger is on scanning
Particle beam microscopy optical axis is symmetrical.
Simultaneously as illumination imaging device described in the embodiment of the present invention is located at the outside of vacuum chamber, it therefore, it can solely
The vertical regulation focus control system, to adapt to the different operating distance for scanning particle beam microscopy.
Embodiment three
Based on above-mentioned scanning particle beam microscopy system, the embodiment of the present invention three provides a kind of focusing controlling method, described
The handling process schematic diagram of method, as shown in fig. 6, methods described is applied to scan particle beam microscopy described in above-described embodiment two
System, the system produces the two beam illuminating bundles with symmetric position relation, comprises the following steps：
Step S101, the two beam illuminating bundles for carrying raster image focus on sample surfaces by demagnification respectively, through described
After sample reflection, focal imaging is exaggerated respectively；
Specifically, the raster image is projected to by the illuminating bundle that the light source such as LED is produced after grating incidence to prism
Imaging len；The illuminating bundle focuses to the grating pattern demagnification described after the imaging len and reflection unit
Sample surfaces, form focusedimage.
Step S102, separately detects the raster image being focused；
Specifically, after the reflected device reflection of the light beam for carrying focusedimage and imaging len amplification are focused on,
Detected device detection.
Here, the detection device can be CCD camera etc..
Step S103, the distance property of the sample is obtained based on the focusedimage, and adjust according to the distance property
Save the location parameter of the sample；
Specifically, the sample focusedimage of different distance is handled, obtains the distance change amount of the sample；It is described
Distance is the distance between sample to the scanning particle beam microscopy；The position of the sample is adjusted according to the distance change amount
Put parameter.
When adjusting the location parameter of the sample, it can be adjusted by adjusting the movement for the sample stage for carrying the sample
The location parameter of the sample；The movement of the horizontal X or Y-direction of the sample stage of sample or regulation piezoelectricity as described in adjusting carrying
The Z-direction such as ceramic motor adjusting apparatus realizes the position adjustment to the sample.
Example IV
Based on above-mentioned scanning particle beam microscopy system, it is real that the embodiment of the present invention four provides a kind of scanning particle beam microscopy
The method of existing focus control, the handling process schematic diagram of methods described, as shown in fig. 7, methods described is applied to above-described embodiment
Scan particle beam microscopy system described in two, the system produces the two beam illuminating bundles with symmetric position relation, including with
Lower step：
Step S201, Initialize installation；
Specifically, the working distance of illumination imaging device is set according to the operating distance of known scanning particle beam microscopy
From, and by adjusting the angle of reflection unit so that it is micro- in the scanning particle beams in the focusedimage of sample surfaces formation
The position of optical axis 102 of mirror.
Step S202, judges whether focusedimage is clear, when judged result is to be, performs step S203；Judging knot
When fruit is no, step S204 is performed.
Step S203, sample is observed using particle beam microscopy is scanned.
Step S204, adjusts the operating distance of illumination imaging device and the operating distance of detection device；
Here, by adjusting the operating distance of illumination imaging device and the operating distance of detection device, enabling observation
To clearly focusedimage.
Step S205, judge the image that detects it is whether clear or whether non-displacement；When judged result is to be, perform
Step S203；When judged result is no, step S206 is performed.
Step S206, calculates sample position variable quantity, obtains result of calculation；
Here, specifically, during sample is observed, when the apparent height of sample changes, or even beyond scanning
During the depth of field of particle beam microscopy, the position for the raster image that detection is obtained shifts or is imaged unintelligible；This
When, according to raster image location variation, the variable quantity of sample position is calculated by computer.
Step S207, the position of sample is adjusted based on the result of calculation；
Specifically, the sample position changing value obtained according to calculating, can carry the sample by computer control, regulation
The movement of sample stage adjust the location parameter of the sample；Piezoelectric ceramic motor Z-direction adjusting apparatus is such as adjusted to realize
To the height of specimen, the adjustment of gradient, recover scanning particle beam microscopy to the condition of work of imaging clearly, so as to continue
Perform step S203 and observe sample using particle beam microscopy is scanned.
The whole scanning automatic focusing of particle beam microscopy is a regulation --- observation --- feedback --- regulation
Process, while ensureing that picture quality is consistent, improves the degree of regulation to sample, shortens observing time to sample.
The foregoing is only a specific embodiment of the invention, but protection scope of the present invention is not limited thereto, any
Those familiar with the art the invention discloses technical scope in, change or replacement can be readily occurred in, should all be contained
Cover within protection scope of the present invention.Therefore, protection scope of the present invention should be based on the protection scope of the described claims.
Claims (12)
1. one kind scanning particle beam microscopy system, it is characterised in that including：Scan particle beam microscopy and control the scanning
The focus control system of particle beam microscopy operating distance；Wherein,
The focus control system includes：
Two illumination imaging devices, are symmetrically positioned in above the vacuum chamber of the scanning particle beam microscopy and scanning particle
The charged particle opticses lens barrel side of beam microscope, for producing the carrying that illuminating bundle and transmission are reflected from sample surfaces
The light beam of focusedimage；The sample is located in the vacuum chamber；
Two reflection units, are symmetrically positioned in inside the vacuum chamber, for the illumination for producing corresponding illumination imaging device
Light beam reflexes to the sample surfaces and the light beam for the carrying focusedimage for reflecting the sample surfaces reflexes to the spy
Survey device；
Two detection devices, are symmetrically positioned in the top of described two illumination imaging devices, anti-from the sample surfaces for receiving
The light beam for the carrying focusedimage penetrated, and detect the focusedimage that the light beam is carried；
Focus control device, for handling the focusedimage, obtains the distance property of the sample, and according to described
Distance property adjusts the location parameter of the sample, the operating distance to control the scanning particle beam microscopy.
2. system according to claim 1, it is characterised in that the scanning particle beam microscopy includes：For producing band
The charged particle source of electrochondria beamlet, the charged particle opticses lens barrel for focusing on, deflecting the charged particle beam and with the band
The vacuum chamber of charged particle optical tubes connection.
3. system according to claim 1, it is characterised in that the illumination imaging device includes：
Light source, for producing illuminating bundle；
Grating, the grating pattern for forming at least one shape；
Prism, imaging len is projected to for guiding the illuminating bundle by the grating pattern；
The imaging len, for guiding after the reflected device reflection of the illuminating bundle, institute is focused to by the grating pattern
State sample surfaces.
4. system according to claim 3, it is characterised in that the imaging len, is additionally operable to guide described carry to focus on
The light beam of image is projected to the detection device.
5. system according to claim 1, it is characterised in that be provided with and described two illuminations at the top of the vacuum chamber
Imaging device distinguishes corresponding two vacuum windows, the vacuum window be used to making the illuminating bundle enter the vacuum chamber, with
And the light beam of the carrying focusedimage is passed through the vacuum chamber.
6. system according to claim 4, it is characterised in that the imaging len at least includes a telecentric lens system
System, for guiding the illuminating bundle that the grating pattern demagnification is focused into the sample surfaces and guiding described carry
The light beam amplification of focusedimage focuses to the detection device.
7. system according to claim 1, it is characterised in that the focus control device includes：
Processor, is handled for the sample focusedimage to different distance, obtains the distance change amount of the sample；It is described
Distance is the distance between sample to the scanning particle beam microscopy；
Position adjustment component, the location parameter for adjusting the sample according to the distance change amount.
8. system according to claim 7, it is characterised in that the position adjustment component includes at least three piezoelectric ceramics
Motor.
9. a kind of focusing controlling method, applied to scanning particle beam microscopy system, the system is produced, and there is symmetric position to close
Two beam illuminating bundles of system, it is characterised in that including：
The two beam illuminating bundles for carrying grating pattern focus on sample surfaces by demagnification respectively, are reflected through the sample surfaces
Afterwards, focal imaging is exaggerated respectively；
Separately detect the raster image being focused；
The distance property of the sample is obtained based on the focusedimage, and according to the position of the distance property regulation sample
Put parameter.
10. method according to claim 9, it is characterised in that the illuminating bundle is after grating incidence to prism, by institute
State grating pattern and be projected to imaging len；
The grating pattern demagnification is focused to the sample table by the illuminating bundle after the imaging len and reflection unit
Face；
The focusedimage reflected from the sample surfaces is reflected by reflection unit after imaged lens, is exaggerated and is focused into
Picture.
11. method according to claim 10, it is characterised in that carry focusedimage from described in illumination imaging systems outgoing
Light beam, be projected to detection device so that described in the detection light beam carry focusedimage.
12. method according to claim 7, it is characterised in that described that the sample is obtained based on the focusedimage
Distance property, and according to the location parameter of the distance property regulation sample, including：
The sample focusedimage of different distance is handled, the distance change amount of the sample is obtained；The distance is sample
The distance between particle beam microscopy is scanned to described；
The location parameter of the sample is adjusted according to the distance change amount.
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| CN112309812A (en) * | 2019-07-26 | 2021-02-02 | 卡尔蔡司显微镜有限责任公司 | Method for operating a particle beam microscope and particle beam microscope |
| CN113964006A (en) * | 2020-07-21 | 2022-01-21 | 聚束科技（北京）有限公司 | Method and system for tracking beam spot of particle beam device |
| CN112309812B (en) * | 2019-07-26 | 2024-05-14 | 卡尔蔡司显微镜有限责任公司 | Method for operating a particle beam microscope and particle beam microscope |
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Effective date of registration: 20200928 Address after: 3 8101-A unit, No. 3, Yongchang North Road, Beijing economic and Technological Development Zone, Beijing, Daxing District 100176, China Applicant after: Focus-eBeam Technology (Beijing) Co.,Ltd. Applicant after: ASML Holland Co.,Ltd. Address before: 3 8101-A unit, No. 100176, Yongchang North Road, Daxing District economic and Technological Development Zone, Beijing, 3 Applicant before: Focus-eBeam Technology (Beijing) Co.,Ltd. |