CN107229189A - 基于dmd的动态掩模的水凝胶微柱阵列的快速制作方法 - Google Patents
基于dmd的动态掩模的水凝胶微柱阵列的快速制作方法 Download PDFInfo
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- 239000000017 hydrogel Substances 0.000 title claims abstract description 39
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000011521 glass Substances 0.000 claims abstract description 11
- 238000013461 design Methods 0.000 claims abstract description 10
- 238000002360 preparation method Methods 0.000 claims abstract description 9
- 150000003254 radicals Chemical class 0.000 claims abstract description 7
- 238000004132 cross linking Methods 0.000 claims abstract description 4
- 239000011259 mixed solution Substances 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000002202 Polyethylene glycol Substances 0.000 claims description 6
- 229920001223 polyethylene glycol Polymers 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 5
- 239000003999 initiator Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical group CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 3
- 230000011514 reflex Effects 0.000 claims description 3
- 238000007711 solidification Methods 0.000 claims description 3
- 230000008023 solidification Effects 0.000 claims description 3
- 229910002056 binary alloy Inorganic materials 0.000 claims description 2
- 230000006698 induction Effects 0.000 claims description 2
- 150000004702 methyl esters Chemical class 0.000 claims description 2
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 claims description 2
- 241001465805 Nymphalidae Species 0.000 claims 1
- -1 alcohol Olefin Chemical class 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 1
- 238000009738 saturating Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 15
- 239000000178 monomer Substances 0.000 abstract description 2
- 239000007788 liquid Substances 0.000 abstract 1
- 230000009466 transformation Effects 0.000 abstract 1
- 229920000671 polyethylene glycol diacrylate Polymers 0.000 description 10
- 238000012545 processing Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 125000004386 diacrylate group Chemical group 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 2
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 2
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 238000001015 X-ray lithography Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000003915 cell function Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012458 free base Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 206010073071 hepatocellular carcinoma Diseases 0.000 description 1
- 231100000844 hepatocellular carcinoma Toxicity 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 201000007270 liver cancer Diseases 0.000 description 1
- 208000014018 liver neoplasm Diseases 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000012163 sequencing technique Methods 0.000 description 1
- 238000002174 soft lithography Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
本发明涉及一种基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法。本发明利用数字微镜阵列(DMD)作为动态掩模,并结合紫外光诱导水凝胶发生聚合反应的技术在玻璃表面上形成图形可控的水凝胶微柱阵列方法。光引发剂吸收光斑紫外光产生自由基,从而引发PEGDA单体的自由基交联反应,实现从液态向固态的转变。利用这种水凝胶微柱阵列的制作方法,不需要任何的物理模板,根据所需要的水凝胶的结构通过计算机设计相应的二进制图像,通过紫外光将图形反射到玻璃基底即可得到所需的PEGDA的水凝胶微柱阵列结构。通过本发明这种方法,可以精确控制微柱的生长位置,微柱的形状,并且可以通过控制所设计图形的尺寸来控制微柱的尺寸。
Description
技术领域
本发明涉及一种快速制作水凝胶微柱阵列的技术,具体的说是一种基于DMD(数字微镜阵列)的动态掩模的水凝胶微柱阵列的快速制作方法。
背景技术
随着20世纪80年代后期微机电***(MEMS)的兴起,微加工技术作为微机电***所必需的一个手段,引起了人们的广泛重视并得到了快速的发展。微加工技术已经成为一门多学科交叉的制造***工程和综合高新技术,广泛应用于医疗、生物工程、半导体工业等领域,这一领域的发展对未来的国民经济、科学技术等奖产生巨大的影响,先进国家纷纷将之列为未来关键技术之一。
作为微加工技术的产品之一,微柱阵列在微电子机械***,微光学器件以及生物微流体等领域有着广泛的应用。田青华等人利用紫外光刻技术加工PDMS的微柱阵列拓扑结构作为基底用来培养肝癌细胞,实验结果表明基底拓扑结构是影响肝癌细胞形态功能的重要微环境因素,为细胞功能表型优化提供了重要的工程化手段。丁继亮等人利用PDMS制作的微柱阵列来分选不同的细胞。丁建东课题组利用设计的高分子微柱阵列,可以引起细胞核发生严重的自我变形。中科院力学所的赵亚溥研究员在固体表面本征湿润性能和拓扑结构的共同作用下,使得微柱阵列亲液表面成为超亲液表面,解决了该应用领域瓶颈问题。
现有的制作微柱阵列的方法主要有LIGA,ICP、软光刻和激光直写等。LIGA即光刻、电铸和注塑的缩写,是一种基于X射线光刻技术的MEMS加工技术,其可以制造大深宽比的微结构,但是却需要昂贵的设备;ICP即等离子体刻蚀工艺,在成型材料上有很大的限制,同时设备昂贵。最为常用的软光刻技术虽然易于操作,但是其工艺步骤过于繁琐(包括气相成底模、旋转烘胶、软烘、对准和曝光、显影、坚膜烘焙、显影检查等),导致制作的耗时较长。激光直写技术是今年来新兴的微加工技术之一,该技术具有高分辨率、高稳定性等优点,但是,该技术一般利用的是线扫描模式,加工时间比较长。
发明内容
针对现有技术中存在的上述不足之处,本发明要解决的技术问题是提供一种基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法。
本发明为实现上述目的所采用的技术方案是:一种基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,包括以下步骤:
将设计的二进制微柱阵列图形导入到数字微镜阵列中,并将聚乙二醇二丙烯酸甲酯PEGDA与光引发剂2,4,6-三甲基苯甲酰基-二苯基氧化膦TPO的混合溶液滴在基底表面;
数字微镜阵列将紫外入射光反射到聚焦物镜组中,并投射到基底表面;
调整紫外入射光激光器的功率,激发混合溶液发生交联反应并固化粘附在基底表面,使固化后的水凝胶微柱阵列形状与设计图形的形状和光斑形状一致;
进行水凝胶微柱阵列的生长培养。
所述混合溶液为使用75%的酒精配置的聚乙二醇二丙烯酸酯PEGDA和光引发剂TPO混合溶液,PEGDA的浓度为40%,TPO的浓度为0.5wt%。
所述混合溶液的制备方法包括以下步骤:
将PEGDA溶于酒精之中,待搅拌均匀后再加入光引发剂TPO,PEGDA的最终浓度为40%,TPO的浓度为0.5wt%。
所述交联反应具体为:经过投影物镜组的缩束后投射到玻璃基底上的图形诱导引发剂在紫外光的照射下产生自由基,并于PEGDA单体结合从而引发自由基聚合反应。
所述基底为玻璃。
所述进行水凝胶微柱阵列的生长培养,具体为:通过设计输入DMD的图片中的单个微柱图形的尺寸来控制所生长的水凝胶微柱的尺寸。
所述投影物镜组包含一个焦距为35mm的平凹紫外增透透镜,一个焦距为25mm的平凸紫外增透透镜和一个10倍紫外聚焦物镜,各个透镜按次序从下到上依次为平凸紫外增透透镜、平凹紫外增透透镜和10倍紫外聚焦物镜。
本发明可实现动态化,程序化的水凝胶的微柱阵列的快速制作,并不需要任何物理模板,制作过程简单,对环境要求低。具体具有以下特点:
1.紫外光照射激发光引发产生自由基,自由基与PEGDA单体相结合,从而引发水凝胶的交联反应。自由基只在光斑照射的地方存在。
2.通过控制设计光斑的形状来控制PEGDA交联聚合后的微柱阵列的形状。利用这种微柱阵列的制作方法,可以不需要物理模板,直接根据所需形状设计光斑,并且可以动态化的控制水凝胶微柱阵列的形状、尺寸和位置。
附图说明
图1为本发明的原理图;
图2为光斑照射到玻璃基底上后生成微柱阵列的示意图;
其中,图2(A)为微柱阵列的正视示意图,图2(B)为微柱阵列的俯视示意图;
图3为扫描电子显微镜图片;
其中,图3(A)为三角形的水凝胶微柱阵列结果图,图3(B)为方形的水凝胶微柱阵列结果图。
具体实施方式
下面结合附图及实施例对本发明做进一步的详细说明。
本发明是基于DMD的动态掩模的水凝胶微柱阵列快速制作方法:将设计的微柱阵列图案输入到DMD中,通过DMD将紫外光反射到投影物镜组中,经过投影物镜组的缩束和聚焦,设计的图案则会投影到玻璃基底上,水凝胶混合溶液中的光引发剂吸收紫外光产生自由基,从而引起水凝胶发生交联反应,形成固化的水凝胶微柱阵列结构,并且微柱阵列的形状与照射的光斑的大小和形状一致,因此,通过控制光斑的位置、形状和尺寸,就能在玻璃表面的任意位置生长出任意形状的水凝胶微柱阵列结构。
利用DMD作为动态掩模来加工水凝胶的微柱阵列的方法具有以下特点(如图1所示):
1:数字微镜阵列(DMD)作为动态掩模用于反射紫外光。
2:投影物镜组包含一个焦距为35mm的平凹紫外增透透镜,一个焦距为25mm的平凸紫外增透透镜和一个10倍紫外聚焦物镜,各个透镜按次序从下到上依次为平凸紫外增透透镜、平凹紫外增透透镜和10倍紫外聚焦物镜。平凸紫外增透透镜与平凹紫外增透透镜之间的距离为60mm,对从DMD反射来的光束进行缩束;平凹紫外增透透镜与10倍紫外聚焦物镜之间的距离为20mm。
3:水凝胶微柱阵列的示意图2所示,图2(A)为微柱阵列的正视示意图,图2(B)为微柱阵列的俯视示意图。
实施例一
1、将一片载玻片用无水乙醇清洗两次,利用氮气将盖玻片吹干待用。
2、使用75%的酒精配置聚乙二醇二丙烯酸酯(PEGDA)和光引发剂(TPO)的混合溶液,PEGDA的浓度为40%,TPO的浓度为0.5wt%。
3、取0.5ml配置好的溶液,滴在载玻片上,使得溶液均匀平铺在载玻片表面。
4、将载玻片放置在架子上,在电脑中绘制需要的图片形状,将绘制好的图片导入到数字微镜阵列中,数字微镜阵列将紫外光反射到投影物镜组中,经过投影物镜组的缩束后投射到玻璃基底上的图形会诱导聚乙二醇二丙烯酸酯和光引发剂的混合溶液发生交联反应并固化粘附在玻璃表面,而水凝胶的形状与设计图片形状和投射光斑形状一致。如图3所示,生长的两种不同形状的微柱阵列,图3(A)为三角形的微柱阵列,图3(B)为方形的微柱阵列。
Claims (7)
1.一种基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,包括以下步骤:
将设计的二进制微柱阵列图形导入到数字微镜阵列中,并将聚乙二醇二丙烯酸甲酯PEGDA与光引发剂2,4,6-三甲基苯甲酰基-二苯基氧化膦TPO的混合溶液滴在基底表面;
数字微镜阵列将紫外入射光反射到聚焦物镜组中,并投射到基底表面;
调整紫外入射光激光器的功率,激发混合溶液发生交联反应并固化粘附在基底表面,使固化后的水凝胶微柱阵列形状与设计图形的形状和光斑形状一致;
进行水凝胶微柱阵列的生长培养。
2.根据权利要求1所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述混合溶液为使用75%的酒精配置的聚乙二醇二丙烯酸酯PEGDA和光引发剂TPO混合溶液,PEGDA的浓度为40%,TPO的浓度为0.5wt%。
3.根据权利要求1或2所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述混合溶液的制备方法包括以下步骤:
将PEGDA溶于酒精之中,待搅拌均匀后再加入光引发剂TPO,PEGDA的最终浓度为40%,TPO的浓度为0.5wt%。
4.根据权利要求1所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述交联反应具体为:经过投影物镜组的缩束后投射到玻璃基底上的图形诱导引发剂在紫外光的照射下产生自由基,并于PEGDA单体结合从而引发自由基聚合反应。
5.根据权利要求1所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述基底为玻璃。
6.根据权利要求1所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述进行水凝胶微柱阵列的生长培养,具体为:通过设计输入DMD的图片中的单个微柱图形的尺寸来控制所生长的水凝胶微柱的尺寸。
7.根据权利要求1所述的基于DMD的动态掩模的水凝胶微柱阵列的快速制作方法,其特征在于,所述投影物镜组包含一个焦距为35mm的平凹紫外增透透镜,一个焦距为25mm的平凸紫外增透透镜和一个10倍紫外聚焦物镜,各个透镜按次序从下到上依次为平凸紫外增透透镜、平凹紫外增透透镜和10倍紫外聚焦物镜。
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