CN107229188B - 感光性树脂组合物 - Google Patents

感光性树脂组合物 Download PDF

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Publication number
CN107229188B
CN107229188B CN201710178045.1A CN201710178045A CN107229188B CN 107229188 B CN107229188 B CN 107229188B CN 201710178045 A CN201710178045 A CN 201710178045A CN 107229188 B CN107229188 B CN 107229188B
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Prior art keywords
meth
acrylate
resin composition
photosensitive resin
chemical formula
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Chinese (zh)
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CN107229188A (zh
Inventor
金径录
曺伯铉
赵庸桓
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201710178045.1A 2016-03-23 2017-03-23 感光性树脂组合物 Active CN107229188B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2016-0034428 2016-03-23
KR1020160034428A KR101979980B1 (ko) 2016-03-23 2016-03-23 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
CN107229188A CN107229188A (zh) 2017-10-03
CN107229188B true CN107229188B (zh) 2020-10-09

Family

ID=59934555

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710178045.1A Active CN107229188B (zh) 2016-03-23 2017-03-23 感光性树脂组合物

Country Status (4)

Country Link
JP (1) JP6431947B2 (ko)
KR (1) KR101979980B1 (ko)
CN (1) CN107229188B (ko)
TW (1) TWI640832B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI657311B (zh) * 2017-12-29 2019-04-21 住華科技股份有限公司 感光性樹脂組成物、及應用其之彩色光阻結構和顯示器
CN111324011B (zh) * 2018-12-14 2023-01-10 北京鼎材科技有限公司 一种反应型碱溶性树脂、包含其的树脂组合物及用途
CN114945867B (zh) * 2020-01-21 2023-05-16 东丽株式会社 正型感光性树脂组合物、固化膜、层叠体、带导电图案的基板、层叠体的制造方法、触控面板及有机el显示装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700620A (en) * 1993-12-24 1997-12-23 Fuji Photo Film Co., Ltd. Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound
KR20090081208A (ko) * 2008-01-23 2009-07-28 주식회사 엘지화학 바인더 수지 및 이를 포함하는 감광성 수지조성물과, 이감광성 수지조성물에 의해 제조된 컬럼스페이서
CN102902162A (zh) * 2007-12-14 2013-01-30 旭化成电子材料株式会社 感光性树脂组合物
JP2013178407A (ja) * 2012-02-28 2013-09-09 Nippon Shokubai Co Ltd フォトスペーサー用硬化性樹脂組成物および柱状スペーサー
CN104216223A (zh) * 2013-05-28 2014-12-17 东友精细化工有限公司 间隔物形成用感光性树脂组合物及由其制造的间隔物
CN104865794A (zh) * 2014-02-20 2015-08-26 上海飞凯光电材料股份有限公司 一种光刻胶

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010152290A (ja) * 2008-11-28 2010-07-08 Seiko Epson Corp カラーフィルター用インク、カラーフィルター用インクの製造方法、カラーフィルター用インクセット、カラーフィルター、画像表示装置、および、電子機器
TWI477904B (zh) * 2010-03-26 2015-03-21 Sumitomo Chemical Co Photosensitive resin composition
JP2012078528A (ja) * 2010-09-30 2012-04-19 Fujifilm Corp 感光性組成物、感光性樹脂転写フィルム、樹脂パターン及び樹脂パターンの製造方法、並びに液晶表示装置用基板及び液晶表示装置
JP2012215833A (ja) * 2011-03-31 2012-11-08 Toyo Ink Sc Holdings Co Ltd 感光性樹脂組成物およびタッチパネル用絶縁膜
CN103688221B (zh) 2011-07-29 2016-08-17 三洋化成工业株式会社 感光性树脂组合物、固化物和间隔物
JP5772642B2 (ja) * 2012-02-09 2015-09-02 Jsr株式会社 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
JP6221862B2 (ja) * 2014-03-14 2017-11-01 Jsr株式会社 感放射線性組成物、表示素子用スペーサーまたは層間絶縁膜及びそれらの形成方法
KR101609234B1 (ko) * 2015-01-13 2016-04-05 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700620A (en) * 1993-12-24 1997-12-23 Fuji Photo Film Co., Ltd. Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound
CN102902162A (zh) * 2007-12-14 2013-01-30 旭化成电子材料株式会社 感光性树脂组合物
KR20090081208A (ko) * 2008-01-23 2009-07-28 주식회사 엘지화학 바인더 수지 및 이를 포함하는 감광성 수지조성물과, 이감광성 수지조성물에 의해 제조된 컬럼스페이서
JP2013178407A (ja) * 2012-02-28 2013-09-09 Nippon Shokubai Co Ltd フォトスペーサー用硬化性樹脂組成物および柱状スペーサー
CN104216223A (zh) * 2013-05-28 2014-12-17 东友精细化工有限公司 间隔物形成用感光性树脂组合物及由其制造的间隔物
CN104865794A (zh) * 2014-02-20 2015-08-26 上海飞凯光电材料股份有限公司 一种光刻胶

Also Published As

Publication number Publication date
CN107229188A (zh) 2017-10-03
TW201740197A (zh) 2017-11-16
TWI640832B (zh) 2018-11-11
KR20170110276A (ko) 2017-10-11
JP6431947B2 (ja) 2018-11-28
JP2017173823A (ja) 2017-09-28
KR101979980B1 (ko) 2019-05-17

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