CN107219567B - 一种成膜均匀的低折射率光学镀膜材料及制备方法 - Google Patents
一种成膜均匀的低折射率光学镀膜材料及制备方法 Download PDFInfo
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- CN107219567B CN107219567B CN201710476041.1A CN201710476041A CN107219567B CN 107219567 B CN107219567 B CN 107219567B CN 201710476041 A CN201710476041 A CN 201710476041A CN 107219567 B CN107219567 B CN 107219567B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710476041.1A CN107219567B (zh) | 2017-06-21 | 2017-06-21 | 一种成膜均匀的低折射率光学镀膜材料及制备方法 |
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CN201710476041.1A CN107219567B (zh) | 2017-06-21 | 2017-06-21 | 一种成膜均匀的低折射率光学镀膜材料及制备方法 |
Publications (2)
Publication Number | Publication Date |
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CN107219567A CN107219567A (zh) | 2017-09-29 |
CN107219567B true CN107219567B (zh) | 2019-06-28 |
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CN201710476041.1A Active CN107219567B (zh) | 2017-06-21 | 2017-06-21 | 一种成膜均匀的低折射率光学镀膜材料及制备方法 |
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CN (1) | CN107219567B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108254808A (zh) * | 2017-12-06 | 2018-07-06 | 惠州市华阳光学技术有限公司 | 一种光学功能膜及其制备方法 |
CN109082632B (zh) * | 2018-08-20 | 2021-01-01 | 中国科学院上海技术物理研究所 | 一种红外低折射率混合镀膜材料及制备方法 |
CN111733390A (zh) * | 2019-12-30 | 2020-10-02 | 宁波瑞凌新能源科技有限公司 | 一种用于双反射层膜中的复合阻隔材料及其应用 |
CN111893433A (zh) * | 2020-07-30 | 2020-11-06 | 苏州瑞康真空科技有限公司 | 一种镀膜材料及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101688292A (zh) * | 2007-06-28 | 2010-03-31 | 索尼株式会社 | 低折射率膜、其沉积方法以及防反射膜 |
CN102324424A (zh) * | 2011-09-22 | 2012-01-18 | 华南师范大学 | 一种荧光透明陶瓷透镜封装的白光led |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020160194A1 (en) * | 2001-04-27 | 2002-10-31 | Flex Products, Inc. | Multi-layered magnetic pigments and foils |
JP4968318B2 (ja) * | 2009-12-22 | 2012-07-04 | 住友金属鉱山株式会社 | 酸化物蒸着材 |
CN205443429U (zh) * | 2015-12-24 | 2016-08-10 | 福建阭石创新材料股份有限公司 | 一种低折射率蒸发镀膜材料的制备*** |
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2017
- 2017-06-21 CN CN201710476041.1A patent/CN107219567B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101688292A (zh) * | 2007-06-28 | 2010-03-31 | 索尼株式会社 | 低折射率膜、其沉积方法以及防反射膜 |
CN102324424A (zh) * | 2011-09-22 | 2012-01-18 | 华南师范大学 | 一种荧光透明陶瓷透镜封装的白光led |
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CB03 | Change of inventor or designer information | ||
CB03 | Change of inventor or designer information |
Inventor after: Qin Haibo Inventor after: Ou Dexu Inventor after: Pan Shuo Inventor before: Qin Haibo |
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Effective date of registration: 20171226 Address after: No. 14, Tianhe Road, Huangcun Town, Daxing District, Beijing Applicant after: Beijing Fuxingkai Photo-Electronic Tech. Co., Ltd. Applicant after: Huizhou Foryou Optical Technology Co., Ltd. Address before: No. 14, Tianhe Road, Huangcun Town, Daxing District, Beijing Applicant before: Beijing Fuxingkai Photo-Electronic Tech. Co., Ltd. |
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