CN107203065A - 彩膜基板、显示面板及装置 - Google Patents
彩膜基板、显示面板及装置 Download PDFInfo
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Abstract
本发明提供一种彩膜基板,包括依次层叠设置的彩膜层、相位差层及第一线栅偏振片,所述相位差层包括交替设置的若干第一相移结构和第二相移结构,所述相位差层能够使经过所述第一相移结构的P光与经过所述第二相移结构的P光产生相位差,从而可降低对P光的反射作用;同时通过相位差层、第一线栅偏振片的S光无相位差,因此不影响S光的亮度。此外,本发明还提供了一种运用了所述彩膜基板的显示面板以及相应的显示装置,所述显示面板和显示装置皆具有降低反光作用且不影响显示亮度的优点。
Description
技术领域
本发明涉及显示技术领域,具体而言,本发明涉及一种彩膜基板,同时还涉及运用了该彩膜基板的显示面板及显示装置。
背景技术
WGP(wire grid polarizer,即线栅偏振片)目前被广泛应用于显示领域,其结构如图1所示,其线栅采用具有较高导电率的金属材料,如Al等。线栅偏振片的线栅采用slit分布,即相邻线栅之间形成缝隙,通常,线栅的宽度约为50nm,缝隙宽度约为50nm,线栅高度约为150nm。线栅偏振片的分光原理为:外接自然光(可认为是与传播方向垂直的平面内的正交光组合而成)照射到线栅偏振片表面时,和线栅缝隙平行的光(P即光)被反射,和线栅缝隙垂直的光(即S光)发生折射。
线栅偏振片不同于常规的吸收型偏光片,常规的吸收型偏光片利用透过和吸收而得到偏振光,而线栅偏振片中面板发出的P光经反射后被TFT基板二次反射后成为S光,因此可继续利用,所以面板的亮度得到提高。但是,当将线栅偏振片应用于彩膜侧时,环境光被线栅偏振片反射后会降低面板对比度。
发明内容
本发明的目的旨在提供一种彩膜基板,其特点是可降低反光作用,同时不影响经过线栅偏振片出射的S光的亮度。
本发明的另一目的旨在提供一种显示面板,其运用了所述彩膜基板,降低了反光作用,同时不影响显示亮度。
本发明的再一目的旨在提供一种显示装置,其运用了所述显示面板,同理,所述显示装置包含了所述显示面板所具有的特点。
为了实现上述目的,本发明提供以下技术方案:
本发明提供一种彩膜基板,包括依次层叠设置的彩膜层、相位差层及第一线栅偏振片,所述相位差层包括交替设置的若干第一相移结构和第二相移结构,所述相位差层能够使经过所述第一相移结构的P光与经过所述第二相移结构的P光产生相位差。
较佳地,经所述第一相移结构入射后又经所述第一相移结构而出射的P光与经所述第二相移结构入射后又经所述第二相移结构而出射的P光的相位差为π,依次经所述相位差层、第一线栅偏振片透射的S光无相位差。
优选地,所述第一相移结构采用第一介质,所述第二相移结构采用第二介质,并且所述第一介质和第二介质为折射率不同的单轴介质,二者满足:(Nxa-Nxb)*d=λ/2,(Nya-Nyb)*d=0;其中,Nxa、Nxb分别表示第一、第二介质中与P光偏振方向平行的方向上的折射率,Nya、Nyb分别表示第一、第二介质中与S光偏振方向平行的方向上的折射率,d表示所述相位差层的厚度,λ表示入射光波长。
较佳地,所述第一相移结构和第二相移结构皆呈条状。
优选地,所述相位差层中两相邻的第一相移结构和第二相移结构之间通过掩膜法形成缝隙。
相应地,本发明提供一种显示面板,其包括依次层叠设置的阵列基板、液晶层及上述任意一项技术方案所述的彩膜基板。
优选地,所述液晶层采用VA或TN模式液晶,所述显示面板还包括设于所述第一线栅偏振片下方的ITO层。
具体地,所述阵列基板包括依次层叠设置的TFT层、第二线栅偏振片及衬底基板,或者,所述阵列基板包括依次层叠设置的TFT层、衬底基板和第二线栅偏振片。
较佳地,所述第一线栅偏振片和第二线栅偏振片的线栅相互正交。
相应地,本发明还提供一种显示装置,其上述任意一项技术方案所述的显示面板。
相比现有技术,本发明的方案具有以下优点:
本发明提供的彩膜基板中,所述相位差层能够使经过所述第一相移结构的P光与经过所述第二相移结构的P光产生相位差,从而使得经所述第一线栅偏振片反射并经过所述第一相移结构出射的P光与经所述第一线栅偏振片反射并经过所述第二相移结构出射的P光在靠近所述彩膜层的一侧产生干涉相消,因此可降低所述彩膜基板的反光作用。
通过将所述第一相移结构采用为第一介质,第二相移结构采用第二介质,一方面,由于(Nxa-Nxb)*d=λ/2,因此经所述第一相移结构入射后由所述第一线栅偏振片反射并经过所述第一相移结构而出射的P光与经所述第二相移结构入射后由所述第一线栅偏振片反射并经过所述第二相移结构而出射的P光在靠近所述彩膜层的一侧产生相位差τp=2*π*λ/2/λ=π,即经所述第一相移结构入射后由所述第一线栅偏振片反射并经过所述第一相移结构出射的P光与经所述第二相移结构入射后由所述第一线栅偏振片反射并经过所述第二相移结构而出射的P光完全相消;另一方面,由于(Nya-Nyb)*d=0,因此经所述相位差层及第一线栅偏振片透射的S光满足τs=0,即S光无相位差,无相消作用,故不影响S光的显示亮度。
本发明的显示装置和显示面板均包括所述彩膜基板,因此皆具有所述彩膜基板所具有的优点,即,降低了反光作用,并且不影响显示亮度。
本发明附加的方面和优点将在下面的描述中部分给出,这些将从下面的描述中变得明显,或通过本发明的实践了解到。
附图说明
本发明上述的和/或附加的方面和优点从下面结合附图对实施例的描述中将变得明显和容易理解,其中:
图1为现有技术中线栅偏振片的分光原理示意图;
图2为本发明的彩膜基板的一种典型实施例的分解示意图;
图3为本发明的显示面板的一种典型实施例的分解示意图。
具体实施方式
下面详细描述本发明的实施例,所述实施例的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的,仅用于解释本发明,而不能解释为对本发明的限制。此外,如果已知技术的详细描述对于示出本发明的特征是不必要的,则将其省略。
请参阅图2,本发明的彩膜基板100,包括依次层叠设置的上基板层40、彩膜层30、相位差层20及第一线栅偏振片10。具体地,所述相位差层20包括交替设置的若干第一相移结构201和第二相移结构202,优选地,所述第一相移结构201和第二相移结构202沿所述相位差层20的宽度方向交替设置。所述第一线栅偏振片10包括若干线栅101,且相邻两线栅101之间形成线栅缝隙102。公知地,入射光可以认为是处于与其传播方向垂直平面内的正交光(即P光和S光)组合而成。当入射光照射到所述第一线栅偏振片10表面时,与所述线栅缝隙102平行的光(即沿图中x方向的P光)被反射,与所述线栅缝隙102垂直的光(即沿图中y方向的S光)发生折射通过所述第一线栅偏振片10。所述相位差层20能够使分别经过所述第一相移结构201的P光与经过所述第二相移结构202的P光产生相位差,图中X(Ψ-τ)和X(Ψ)分别表示分别经过所述第一相移结构201入射后又经所述第一相移结构201而出射的P光、经所述第二相移结构202入射后又经所述第二相移结构202而出射的P光的波动函数,其中,τ表示相位差。
可见,本发明提供的彩膜基板100中,所述相位差层20能够使分别经过所述第一相移结构201的P光与经过所述第二相移结构202的P光产生相位差,从而使得经所述第一线栅偏振片10反射并经过所述第一相移结构201而出射的P光与经所述第一线栅偏振片10反射并经所述第二相移结构202而出射的P光在靠近所述彩膜层30一侧产生干涉相消,降低了所述彩膜基板100的反光作用。
较佳地,所述相位差层20能够经所述第一相移结构201入射后又经第一相移结构201而出射的P光与经所述第二相移结构202入射后又经所述第二相移结构202而出射的P光的相位差为π,换言之,经所述第一相移结构201入射后由所述第一线栅偏振片10反射并经过所述第一相移结构201而出射的P光与经所述第二相移结构202入射后由所述第一线栅偏振片10反射并经过所述第二相移结构202而出射的P光的相位差为π,因此,经所述第一相移结构201入射后由所述第一线栅偏振片10反射并经过所述第一相移结构201而出射的P光与经所述第二相移结构202入射后由所述第一线栅偏振片10反射并经所述第二相移结构202而出射的P光在靠近所述彩膜层30的一侧能够完全干涉相消,从而降低反光作用。并且,经所述相位差层20、第一线栅偏振片10透射的S光无相位差,故不影响S光的显示亮度。
较佳地,所述第一相移结构201采用第一介质,所述第二相移结构202采用第二介质,并且所述第一介质201和第二介质202为折射率不同的单轴介质,二者满足如下条件:(Nxa-Nxb)*d=λ/2,(Nya-Nyb)*d=0。其中,Nxa、Nxb分别表示第一、第二介质中与P光偏振方向平行的方向上的折射率,Nya、Nyb分别表示第一、第二介质中与S光偏振方向平行的方向上的折射率,d表示所述相位差层的厚度,λ表示入射光波长。
由于(Nxa-Nxb)*d=λ/2,因此经所述第一介质201入射后由所述第一线栅偏振片10反射并经过所述第一介质201而出射的P光与经所述第二介质202后由所述第一线栅偏振片10反射并经过所述第二介质202而出射的P光在靠近所述彩膜层30的一侧产生相位差τp=2*π*λ/2/λ=π,即经所述第一介质201入射后又经所述第一介质201而出射的P光与经所述第二介质202入射后又经所述第二介质而出射的P光完全相消;同时,由于(Nya-Nyb)*d=0,因此经过所述相位差层20及第一线栅偏振片10透射的S光满足τs=0,即S光无相位差,无相消作用,故不影响S光的显示亮度。
较佳地,所述第一相移结构201和第二相移结构202皆呈条状。
优选地,所述相位差层20中,两相邻的第一相移结构201和第二相移结构202间通过掩膜法形成缝隙,以形成毗邻的条状缝隙。
进一步地,请参阅图3,本发明还提供一种显示面板1000。所述显示面板1000可以为LED面板或OLED面板等。所述显示面板1000包括依次层叠设置的阵列基板300、液晶层200以及所述彩膜基板100。
由于所述显示面板1000运用了所述彩膜基板100,因此所述显示面板1000具有所述彩膜基板所具有的优点,即,降低了反光作用,并且不影响所述显示面板1000的显示亮度。
具体地,所述液晶层200可采用IPS、VA或TN模式的液晶。而当所述液晶层采用VA或TN模式液晶时,所述显示面板1000还包括设于所述第一线栅偏振片10下方的ITO层(IndiumTin Oxide,掺稀氧化铟,未图示),以提高透光率。
具体地,所述阵列基板300包括依次层叠设置的TFT层(Thin Film Transistor,薄膜晶体管)301、第二线栅偏振片302及衬底基板303。其中,所述第二偏振片302和衬底基板303的位置可对调,而当所述衬底基板303处于所述TFT层301和所述第二线栅偏振片302之间时,所述第二线栅偏振片302可用常规的偏光片代替。所述衬底基板303可以为玻璃基板或柔性基板。
进一步地,所述第一线栅偏振片10和第二线栅偏振片302的线栅相互正交,亦即二者的线栅缝隙正交,从而可选择偏振方向特定的偏振光。
对应地,本发明还提供一种显示装置。所述显示装置可以为电子纸、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。由于运用了所述显示面板1000,因此所述显示装置也具有所述显示面板1000所具有的优点,故不赘述。
以上所述仅是本发明的部分实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本发明的保护范围。
Claims (10)
1.一种彩膜基板,其特征在于,包括依次层叠设置的彩膜层、相位差层及第一线栅偏振片,所述相位差层包括交替设置的若干第一相移结构和第二相移结构,所述相位差层能够使经过所述第一相移结构的P光与经过所述第二相移结构的P光产生相位差。
2.根据权利要求1所述的彩膜基板,其特征在于,经所述第一相移结构入射后又经所述第一相移结构而出射的P光与经所述第二相移结构入射后又经所述第二相移结构而出射的P光的相位差为π,依次经所述相位差层、第一线栅偏振片透射的S光无相位差。
3.根据权利要求1或2所述的彩膜基板,其特征在于,所述第一相移结构采用第一介质,所述第二相移结构采用第二介质,并且所述第一介质和第二介质为折射率不同的单轴介质,二者满足:
(Nxa-Nxb)*d=λ/2,(Nya-Nyb)*d=0;
其中,Nxa、Nxb分别表示第一、第二介质中与P光偏振方向平行的方向上的折射率,Nya、Nyb分别表示第一、第二介质中与S光偏振方向平行的方向上的折射率,d表示所述相位差层的厚度,λ表示入射光波长。
4.根据权利要求1所述的彩膜基板,其特征在于,所述第一相移结构和第二相移结构皆呈条状。
5.根据权利要求1所述的彩膜基板,其特征在于,所述相位差层中两相邻的第一相移结构和第二相移结构之间通过掩膜法形成缝隙。
6.一种显示面板,其特征在于,包括依次层叠设置的阵列基板、液晶层及权利要求1-5中任意一项所述的彩膜基板。
7.根据权利要求6所述的显示面板,其特征在于,所述液晶层采用VA或TN模式液晶,所述显示面板还包括设于所述第一线栅偏振片下方的ITO层。
8.根据权利要求6所述的显示面板,其特征在于,所述阵列基板包括依次层叠设置的TFT层、第二线栅偏振片及衬底基板,或者,所述阵列基板包括依次层叠设置的TFT层、衬底基板和第二线栅偏振片。
9.根据权利要求8所述的显示面板,其特征在于,所述第一线栅偏振片和第二线栅偏振片的线栅相互正交。
10.一种显示装置,其特征在于,包括权利要求6-9中任意一项所述的显示面板。
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