CN107190243A - A kind of TiB2/ AlTiN composite coatings and preparation method and application - Google Patents

A kind of TiB2/ AlTiN composite coatings and preparation method and application Download PDF

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Publication number
CN107190243A
CN107190243A CN201710340294.6A CN201710340294A CN107190243A CN 107190243 A CN107190243 A CN 107190243A CN 201710340294 A CN201710340294 A CN 201710340294A CN 107190243 A CN107190243 A CN 107190243A
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tib
altin
matrix
composite coatings
target
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代伟
高翔
王启民
刘凡
费加喜
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Guangdong University of Technology
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Guangdong University of Technology
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias

Abstract

The invention discloses a kind of TiB2/ AlTiN composite coatings, the TiB2/ AlTiN composite coatings are with TiB2Ceramic target and AlTi sputtering targets are raw material, replace the TiB of sputtering sedimentation formation sandwich construction on matrix by multi-target magnetic control sputtering2/ AlTiN composite coatings.The TiB2AlTiN layers and TiB in/AlTiN composite coatings2Total number of plies of layer is 10~100 layers, and the thickness of modulation period is 0.1~1 μm.The TiB of the preparation of the present invention2/ AlTiN composite coatings show higher hardness, good toughness and high temperature oxidation resistance.The double target codeposition techniques of the magnetron sputtering of the present invention are easy to operate, without techniques such as post processings, and short preparation period, cost is low, and reproducibility is good, has a wide range of application, and industrialized production can be achieved.

Description

A kind of TiB2/ AlTiN composite coatings and preparation method and application
Technical field
The invention belongs to surfacecti proteon related coating materials technical field, more particularly, to a kind of TiB2/ AlTiN is multiple Close coating and preparation method and application.
Background technology
With the development and the progress of industrial technology of society, industrial circle proposes higher and higher want to the performance of material Ask, there is excellent combination property in many engineer applied application requirements materials；Do not require nothing more than it there is high hardness, it is corrosion-resistant Performance, also requires that it has low coefficient of friction, good high-temperature stability etc..To meet increasingly complicated and diversified engineering need Ask, coat one layer of hard coat in material surface, arisen at the historic moment with improving the protective coating of combination property of material.Hard is applied Layer can improve the surface property of material, reduce the friction and wear with workpiece, it is effective improve material surface hardness, it is toughness, resistance to Mill property and high-temperature stability, increase substantially the service life of coating product.Hard coat is improve material surface performance one Economical and practical means are planted, at present in machining, are particularly occupied an important position in metal cutting.Its development is adapted to High-tech requirement of the modern manufacturing industry to metal cutting tool, causes the great change of cutter material and performance, can be widely used In fields such as machine-building, auto industry, textile industry, geological drilling, mould industry, Aero-Space.
Titanium diboride (TiB2) as magnesium-yttrium-transition metal boride, with high rigidity, high-melting-point, high wearability and corrosion resistant Corrosion, good electrical conductivity and a series of excellent physicochemical properties such as thermal conductivity, chemical stability be excellent, be it is a kind of have it is excellent Structural behaviour and functional performance advanced ceramics material.Yet with TiB2Coating toughness is poor, high temperature oxidation resistance not Enough ideals, limit its application in Tool in Cutting field.Therefore, how TiB is being kept2While excellent properties, it is reduced Residual stress and thermal conductivity, improve its toughness, obtain strong, the longitudinal thermal conductivity of hardness height, good toughness, adhesive force low comprehensive Close the excellent TiB of performance2Coating is an important problem in science.
The content of the invention
The invention aims to the defect for overcoming prior art, there is provided a kind of TiB2/AlTiN composite coatings, this is combined Coating has high rigidity, high friction resistance energy, low stress, excellent toughness and high temperature oxidation resistance and anisotropy thermal conductivity etc. Overall characteristic is excellent.
It is a further object of the present invention to provide a kind of above-mentioned TiB2The preparation method of/AlTiN composite coatings.
Another object of the present invention is to provide above-mentioned TiB2The application of/AlTiN composite coatings.
Above-mentioned purpose of the present invention is achieved by the following technical programs：
A kind of TiB2/ AlTiN composite coatings, the TiB2/ AlTiN composite coatings are with TiB2Ceramic target and AlTi sputterings Target is raw material, and by multi-target magnetic control sputtering, sputtering sedimentation forms alternate TiB on matrix2Layer and AlTiN layers.
Preferably, described matrix is monocrystalline silicon piece, glass, high-speed steel or hard alloy.
Preferably, the TiB2The number of plies of/AlTiN composite coatings is 10~100 layers, described AlTiN layers and TiB2The tune of layer Periodic thickness processed is 0.1~1 μm.
Above-mentioned TiB2The preparation method of/AlTiN composite coatings, is comprised the following specific steps that：
S1. matrix is cleaned：Matrix after polished processing is sent into supersonic wave cleaning machine, successively with acetone, absolute ethyl alcohol 10~20min of ultrasonic cleaning is carried out with 15~30kHz respectively, then rinsed with deionized water, then it is general with purity >=99.5% Nitrogen is dried up；
S2. vacuumize and clean plated film cavity with ion beam etching：Matrix after ultrasonic cleaning is placed in the workpiece of vacuum chamber On support, vacuum 5.0 × 10 is evacuated to-3~8.0 × 10-4Pa, later on ion gun, 80~100sccm is passed through to ion gun Argon gas, the power for setting ion gun is 0.9kW, and the bias for setting work support is -300~-500V, and etch cleaner process continues 20~30min；
S3. ion beam etching matrix：By matrix as in front of ion gun, setting bias is -300~-500V, working time For 15~20min；
S4. depositing Ti B2/ AlTiN laminated coatings：By target AlTi targets and TiB2Target is installed into equipment, using magnetron sputtering Method, be passed through 80~100sccm of argon gas, control 0.56~0.7Pa of gas pressure in vacuum, open TiB2Target power supply simultaneously sets power supply Parameter, matrix and support parameter, build-up of luminance carry out starting sputtering sedimentation TiB after pre-sputtering2TiB is closed after layer, 10~60min2Target Power supply, stopping is passed through argon gas, is changed to be passed through 80~100sccm of nitrogen, controls 0.56~0.7Pa of gas pressure in vacuum, opens AlTi Target power supply simultaneously sets power parameter to start AlTiN layers of sputtering sedimentation, and sedimentation time is 10~60min, is so alternately and repeatedly deposited, Sedimentation time was controlled at 3 hours, and deposition terminates to close power supply, treated that vacuum room temperature is down to room temperature, is opened vacuum chamber and is taken out matrix, In the coating of matrix surface formation, as TiB2/ AlTiN composite coatings.
Preferably, matrix described in step S1 is monocrystalline silicon piece, glass, high-speed steel or hard alloy.
Preferably, matrix and support parameter are described in step S4：Substrate bias -100~-300V, support rotation 2~ 3rpm/min, revolve round the sun 2~5rpm/min, sets 300 DEG C of depositing temperature；The power parameter is：Frequency 80kHz, power 3~ 4kW。
Preferably, the distance of target and matrix described in step S4 is 6~10cm.
Preferably, the number of times of alternating deposit described in step S4 is 5~50 times.
Above-mentioned TiB2/ AlTiN composite coatings are in metal machinery parts, precision die, precision drive plant equipment, axle Hold, the application in the surfacecti proteon field of electronic product, decorative product, knife mold and material.
The principle of the present invention：The inventive method formation alternate multiple is to be rotated by support and alternating either on or off TiB2 What target and AlTi target power supplies were realized, when sample faces TiB2During ceramic target, one layer of TiB of matrix deposition2Ceramic layer；Face post During shape AlTi targets, one layer AlTiN layers are deposited；Rotary speed speed determines every layer of TiB2Ceramic layer and AlTiN layers of thickness. AlTiN coatings have well wear-resistant, antioxygenic property and low thermal conductivity.This is due to that AlTiN thermal conductivities are low, TiB2Heat Conductance is high, and the longitudinal lower thermal conductivity of horizontal high heat conductance can be achieved after alternate multiple, and the excellent antioxygenic property of AlTiN coatings can return After the part Al oxidations of work(coating surface when high temperature, in chip/tool interface formation Al2O3Film, while the Al formed2O3 But cutter is kept apart with cutting heat, heat is seldom passed to cutter, so as to keep point of a knife in longer time It is hard and sharp.
Compared with prior art, the invention has the advantages that：
1. the TiB of Rotating fields prepared by the present invention2/ AlTiN composite coatings, in traditional individual layer TiB2Tool is introduced in coating There are good high temperature oxidation resistance and the AlTiN of toughness, by the control to substrate support rotary speed, form TiB2Ceramic layer With AlTiN layers of periodicity alternating multilayered structure, while reduction residual stress, enhancing coating toughness, strengthen the flexible of coating Property and adhesive force, improve coating wear Characteristics and thermal stability so that coating is more suitable for harsher application ring Border, such as component of machine, the protection of knife mold product surface.
2. the present invention is by changing the TiB in coating2Ceramic layer and AlTiN layers of individual layer thickness and coating cycle, regulation Microstructure, the microhardness performance of coating, to adapt to different processing objects and machining condition.Easy to operate, technique is simple, Short preparation period, cost is low, is easy to large-scale industrial production.
3. the present invention prepares the TiB of Rotating fields2/ AlTiN composite coatings, it has longitudinal lower thermal conductivity, transverse direction highly thermally conductive The anisotropy thermal conductivity function of rate, good wear-resistant and high temperature oxidation resistance；In addition, multi-layer structure design can improve coating Adhesion, coating interface toughness and resistance to crack extension ability with matrix, while reducing fragility, improve pliability and carrying Power, is conducive to synthesizing the thicker surface peening coating system for being suitable for practical application.
Brief description of the drawings
Fig. 1 is present invention design TiB2The microstructure schematic diagram of/AlTiN sandwich construction coatings.
Fig. 2 is the TiB in embodiment 12The coefficient of friction of/AlTiN sandwich construction coatings.
Embodiment
Present disclosure is further illustrated with reference to specific embodiment, but be should not be construed as limiting the invention. Unless otherwise specified, the conventional meanses that technological means used in embodiment is well known to those skilled in the art.Except non-specifically Illustrate, the reagent of the invention used, method and apparatus is the art conventional reagent, methods and apparatus.
Embodiment 1
1. clean matrix：WC-Co hard alloy matrix after polished processing is sent into supersonic wave cleaning machine, successively with third Ketone, absolute ethyl alcohol carry out ultrasonic cleaning 10min respectively with 30kHz, are then cleaned with deionized water, then with purity >=99.5% Nitrogen is dried up.
2. vacuumize and ion beam etching cleaning chamber and matrix：Ion plating equipment installs TiB2Flat target and AlTi columns Target, coating chamber is cleaned with high power dust catcher.Matrix after ultrasonic cleaning is placed on the work support of vacuum chamber, vacuum is evacuated to Degree 5.0 × 10-3Below Pa, later on ion gun is passed through 80sccm argon gas to ion gun, sets ion source power 0.9kW, if Work support bias -300V is put, this etching cleaning process continues 20min.
3. ion beam etching matrix：Pivoted frame is rotated, by matrix as in front of ion gun, bias -500V, working time are set For 20min.
4. depositing Ti B2/ AlTiN laminated coatings：By target AlTi targets and TiB2Target is installed into equipment, target and matrix away from From for 6cm, using the method for magnetron sputtering, argon gas 80sccm is passed through, gas pressure in vacuum 0.6Pa is controlled, using magnetron sputtering Method, opens TiB2Target power supply simultaneously sets power parameter：Frequency 80kHz, power 4kW；Setting matrix and support parameter are：Matrix Bias -300V, support rotation 2rpm/min, revolve round the sun 5rpm/min, sets 300 DEG C of depositing temperature.Build-up of luminance, is opened after carrying out pre-sputtering Beginning sputtering sedimentation TiB2TiB is closed after layer, 10min2Target power supply, stopping is passed through argon gas, is changed to be passed through nitrogen 80sccm, control is true Empty room air pressure 0.6Pa, opens AlTi target power supplies and sets power parameter：Frequency 80kHz, power 4kW；Matrix and support parameter are not Become, start AlTiN layers of sputtering sedimentation, sedimentation time is 10min.So alternately and repeatedly deposited 50 times in 3 hours, deposition knot Beam, closes power supply, treats that vacuum room temperature is down to room temperature, and air is filled toward vacuum chamber, opens vacuum chamber and takes out sample, hard in WC-Co Matter alloy substrate prepares TiB on surface2/ AlTiN composite coatings.
Fig. 1 is present invention design TiB2The microstructure schematic diagram of/AlTiN sandwich construction coatings.Institute's shape in embodiment 1 Into TiB2In/AlTiN composite coatings, AlTiN layers and TiB2Ceramic layer is overlapped mutually and forms sandwich construction, wherein TiB2/ AlTiN layers and TiB in AlTiN coatings2The number of plies of ceramic layer is that 30 layers, every layer AlTiN layers of thickness is 60nm, every layer of TiB2Layer Thickness be 50nm.
By residual stress, nano-indenter test, friction testing, and high annealing test, prepared nano lamellar The TiB of structure2The residual stress of/AlTiN coatings is 0.6GPa, and hardness is 32GPa, and coefficient of friction is 0.53, while coating table Reveal excellent pliability and heat endurance.Fig. 2 is the TiB in embodiment 12The coefficient of friction of/AlTiN sandwich construction coatings. Wherein, abscissa is the test number of turns, and ordinate is coefficient of friction, as can be known from Fig. 2, TiB2/ AlTiN sandwich construction coatings have Low coefficient of friction.
Embodiment 2
1. clean matrix：The single crystal silicon substrate of (100) orientation after polished processing is sent into supersonic wave cleaning machine, successively Ultrasonic cleaning 10min is carried out with 30kHz respectively with acetone, absolute ethyl alcohol, then rinsed with deionized water, then with purity >= 99.5% nitrogen drying.
2. vacuumize and ion beam etching cleaning chamber and matrix：Ion plating equipment installs TiB2Flat target and AlTi columns Target, coating chamber is cleaned with high power dust catcher.Matrix after ultrasonic cleaning is placed on the work support of vacuum chamber, vacuum chamber is taken out Vacuum, to 5.0 × below 10-3Pa of vacuum, later on ion gun is passed through 80sccm argon gas to ion gun, sets ion gun work( Rate 0.9kW, sets work support to bias 300V, and this etching cleaning process continues 20min.
3. ion beam etching matrix：Pivoted frame is rotated, by above-mentioned matrix as in front of ion gun, bias -500V is set, worked Time is 20min.
4. depositing Ti B2/ AlTiN composite coatings：By target AlTi targets and TiB2Target is installed into equipment, target and matrix away from From for 10cm, using the method for magnetron sputtering, argon gas 80sccm is passed through, gas pressure in vacuum 0.6Pa is controlled, using magnetron sputtering Method, opens TiB2Target power supply simultaneously sets power parameter：Frequency 80kHz, power 4kW；Setting matrix and support parameter are：Matrix Bias -300V, support rotation 3rpm/min, revolve round the sun 2rpm/min, sets 300 DEG C of depositing temperature.Build-up of luminance, is opened after carrying out pre-sputtering Beginning sputtering sedimentation TiB2TiB is closed after layer, 10min2Target power supply, stopping is passed through argon gas, is changed to be passed through nitrogen 80sccm, control is true Empty room air pressure 0.6Pa, opens AlTi target power supplies and sets power parameter：Frequency 80kHz, power 3kW；Matrix and support parameter are not Become, start AlTiN layers of sputtering sedimentation, sedimentation time is 10min.So alternately and repeatedly deposited 5 times in 3 hours, deposition terminates, Power supply is closed, treats that vacuum room temperature is down to room temperature, air is filled toward vacuum chamber, vacuum chamber is opened and takes out sample, be orientated in (100) Single crystal silicon substrate prepares TiB on surface2/ AlTiN composite coatings.
Above-described embodiment is preferably embodiment, but embodiments of the present invention are not by above-described embodiment of the invention Limitation, other any Spirit Essences without departing from the present invention and the change made under principle, modification, replacement, is combined and simplification, Equivalent substitute mode is should be, is included within protection scope of the present invention.

Claims (9)

1. a kind of TiB2/ AlTiN composite coatings, it is characterised in that the TiB2/ AlTiN composite coatings are with TiB2Ceramic target and AlTi sputtering targets are raw material, and by multi-target magnetic control sputtering, sputtering sedimentation forms alternate TiB on matrix2Layer and AlTiN layers.
2. TiB according to claim 12/ AlTiN composite coatings, it is characterised in that described matrix is monocrystalline silicon piece, glass Glass, high-speed steel or hard alloy.
3. TiB according to claim 12/ AlTiN composite coatings, it is characterised in that the TiB2/ AlTiN composite coatings The number of plies be 10~100 layers, described AlTiN layers and TiB2Thickness modulation period of layer is 0.1~1 μm.
4. a kind of TiB according to claim any one of 1-32The preparation method of/AlTiN composite coatings, it is characterised in that Comprise the following specific steps that：
S1. matrix is cleaned：Matrix after polished processing is sent into supersonic wave cleaning machine, successively with acetone, absolute ethyl alcohol with 15 ~30kHz carries out 10~20min of ultrasonic cleaning respectively, is then rinsed with deionized water, then is blown with the general nitrogen of purity >=99.5% It is dry；
S2. vacuumize and clean plated film cavity with ion beam etching：Matrix after ultrasonic cleaning is placed in the work support of vacuum chamber On, it is evacuated to vacuum 5.0 × 10-3~8.0 × 10-4Pa, later on ion gun is passed through 80~100sccm argons to ion gun Gas, the power for setting ion gun is 0.9kW, and the bias for setting work support is -300~-500V, and etch cleaner process continues 20 ~30min；
S3. ion beam etching matrix：By matrix as in front of ion gun, it is -300~-500V to set bias, and the working time is 15 ~20min；
S4. depositing Ti B2/ AlTiN laminated coatings：By target AlTi targets and TiB2Target is installed into equipment, using the side of magnetron sputtering Method, is passed through 80~100sccm of argon gas, controls 0.56~0.7Pa of gas pressure in vacuum, opens TiB2Target power supply simultaneously sets power supply to join Number, matrix and support parameter, build-up of luminance carry out starting sputtering sedimentation TiB after pre-sputtering2TiB is closed after layer, 10~60min2Target electricity Source, stopping is passed through argon gas, is changed to be passed through 80~100sccm of nitrogen, controls 0.56~0.7Pa of gas pressure in vacuum, opens AlTi targets Power supply simultaneously sets power parameter to start AlTiN layers of sputtering sedimentation, and sedimentation time is 10~60min, is so alternately and repeatedly deposited, and is sunk Product time control was at 3 hours, and deposition terminates to close power supply, treated that vacuum room temperature is down to room temperature, opens vacuum chamber and takes out matrix, The coating of matrix surface formation, as TiB2/ AlTiN composite coatings.
5. TiB according to claim 42The preparation method of/AlTiN composite coatings, it is characterised in that described in step S1 Matrix is monocrystalline silicon piece, glass, high-speed steel or hard alloy.
6. TiB according to claim 42The preparation method of/AlTiN composite coatings, it is characterised in that described in step S4 Matrix and support parameter are：Substrate bias -100~-300V, support 2~3rpm/min of rotation, revolve round the sun 2~5rpm/min, sets 300 DEG C of depositing temperature；The power parameter is：Frequency 80kHz, 3~4kW of power.
7. TiB according to claim 42The preparation method of/AlTiN composite coatings, it is characterised in that described in step S4 The distance of target and matrix is 6~10cm.
8. TiB according to claim 42The preparation method of/AlTiN composite coatings, it is characterised in that described in step S4 The number of times of alternating deposit is 5~50 times.
9. the TiB described in claim any one of 1-32/ AlTiN composite coatings are in metal machinery parts, precision die, precision Application in the surfacecti proteon field of transmission machinery, bearing, electronic product, decorative product or knife mold and material.
CN201710340294.6A 2017-05-15 2017-05-15 A kind of TiB2/ AlTiN composite coatings and preparation method and application Withdrawn CN107190243A (en)

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CN110029320A (en) * 2019-05-14 2019-07-19 天津师范大学 Magnetron sputtering method prepares titanium diboride/zirconium dioxide gradient nano structural membrane and its application
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CN113981369A (en) * 2021-10-28 2022-01-28 赣州澳克泰工具技术有限公司 Multilayer coating system and method for producing same
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刘思鹏: ""调制比对TiB2/TiAlN纳米多层膜结构和机械性能的影响"", 《天津师范大学学报（自然科学版）》 *

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108754415A (en) * 2018-04-28 2018-11-06 广东工业大学 A kind of periodic multilayer nanostructure AlTiN/AlCrSiN hard coats and its preparation method and application
CN110857465A (en) * 2018-08-22 2020-03-03 赣州澳克泰工具技术有限公司 Cutting tool and method for manufacturing same
CN110857465B (en) * 2018-08-22 2021-11-19 赣州澳克泰工具技术有限公司 Cutting tool and method for manufacturing same
CN109161845A (en) * 2018-09-18 2019-01-08 岭南师范学院 A kind of marine environment wear-resistant self-lubricating nano-composite coating and its preparation method and application
CN110029320A (en) * 2019-05-14 2019-07-19 天津师范大学 Magnetron sputtering method prepares titanium diboride/zirconium dioxide gradient nano structural membrane and its application
CN113981369A (en) * 2021-10-28 2022-01-28 赣州澳克泰工具技术有限公司 Multilayer coating system and method for producing same
CN115029662A (en) * 2022-06-23 2022-09-09 安徽工业大学 High-temperature wear-resistant self-lubricating composite coating and preparation method thereof
CN115233158A (en) * 2022-06-23 2022-10-25 安徽工业大学 Composite coating for surface layer of internal combustion engine valve rod piece and preparation method thereof
CN115233158B (en) * 2022-06-23 2023-12-26 安徽工业大学 Composite coating for surface layer of valve rod of internal combustion engine and preparation method thereof
CN115029662B (en) * 2022-06-23 2023-12-26 安徽工业大学 High-temperature wear-resistant self-lubricating composite coating and preparation method thereof

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Application publication date: 20170922