CN107170909A - The preparation method of OLED display screen and its optical compensating layer - Google Patents
The preparation method of OLED display screen and its optical compensating layer Download PDFInfo
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- CN107170909A CN107170909A CN201610130926.1A CN201610130926A CN107170909A CN 107170909 A CN107170909 A CN 107170909A CN 201610130926 A CN201610130926 A CN 201610130926A CN 107170909 A CN107170909 A CN 107170909A
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/16—Electron transporting layers
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- H—ELECTRICITY
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- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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Abstract
The present invention relates to a kind of preparation method of the optical compensating layer of OLED display screen, for following dot structure：Green sub-pixels and blue subpixels in each pixel cell are adjacent with red sub-pixel；Methods described comprises the following steps：Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；The first layer optical compensation layer material covers the light-emitting zone of red sub-pixel, green sub-pixels and blue subpixels simultaneously；Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；The second layer optical compensation layer material covers the light-emitting zone of red sub-pixel and green sub-pixels simultaneously；Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；The third layer optical compensation layer material covers the light-emitting zone of red sub-pixel and blue subpixels simultaneously.The invention further relates to a kind of preparation method of OLED display screen.The above method is higher to the utilization rate of deposition material, more saves material.
Description
Technical field
The present invention relates to OLED display technology fields, more particularly to a kind of OLED display screen and its optics
The preparation method of compensation layer.
Background technology
OLED is new Display Technique of future generation and lighting engineering, and application prospect is huge.
In the dot structure of AMOLED display screens, each sub-pixel includes anode layer, hole and noted successively
Enter layer, hole transmission layer, luminescent layer, electron transfer layer, electron injecting layer and cathode layer.Risen to be simple
See, OLED structure such as Fig. 3 is provided.According to the requirement that top is luminous or bottom is luminous, electronics can be used to pass
Defeated layer (ETL) or hole transmission layer (HTL) or hole injection layer (HIL) are used for as optical compensating layer
Adjust microcavity effect, improve device efficiency.The thickness for defining the optical compensating layer of red sub-pixel is Rh, green
The thickness G h of the optical compensating layer of sub-pixels, the thickness of the optical compensating layer of blue subpixels are Bh.
Usually, it is desirable to Rh>Gh>Bh.
The small-medium size AMOLED of traditional volume production uses " red sub-pixel, green sub-pixels and indigo plant
Sub-pixels are adjacent successively " evaporation coating technique of (RGB side by side).Following structure is luminous to push up
Illustrated exemplified by AMOLED display screens, it is assumed that optical compensating layer is used as using hole transmission layer (HTL).
With reference to Fig. 1, in order to which optical compensating layer is deposited to this pixel arrangement structure, typically using following method.
First, it is a+c using common metal mask plate (Common Metal Mask, CMM) evaporation thickness
First layer optical compensation layer material.The first layer optical compensation layer material covers red sub-pixel simultaneously, green
Sub-pixels and blue subpixels.
Then, it is the of b using fine metal mask plate (Fine Metal Mask, FMM) evaporation thickness
Two layers of optical compensation layer material.The second layer optical compensation layer material only covers red sub-pixel.
Finally, it is b-a's using fine metal mask plate (Fine Metal Mask, FMM) evaporation thickness
Third layer optical compensation layer material.The third layer optical compensation layer material only covers green sub-pixels.
In the optical compensating layer of above method formation：The thickness covered on the luminous material layer of red sub-pixel is
The thickness covered on a+b+c, the luminous material layer of green sub-pixels is b+c, the luminescent material of blue subpixels
The thickness covered on layer is a+c.Here b is required>a.Thus meet above-mentioned Rh>Gh>Bh requirement.
It can be seen that, in the latter two steps of the above method, being deposited each time is covered using fine metal
One sub-pixel is deposited diaphragm plate.So perforate size and sub-pixel of fine metal mask plate
Size is deposited identical.When needing the display screen for higher resolution to make optical compensating layer, fine gold
The perforate for belonging to mask plate is just smaller.
However, diminishing with fine metal mask plate perforate, it is increasing to organic material waste rate,
It is unfavorable for the reduction of AMOLED display screen costs.
The content of the invention
Based on this, it is necessary to provide a kind of preparation method of the optical compensating layer of OLED display screen, it can
Improve stock utilization.
In addition, also providing a kind of preparation method of OLED display screen.
A kind of preparation method of the optical compensating layer of OLED display screen, for following dot structure：Each picture
Green sub-pixels and blue subpixels in plain unit are adjacent with red sub-pixel；Methods described includes as follows
Step：
Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；The first layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel, green sub-pixels and blue subpixels simultaneously；
Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；The second layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel and green sub-pixels simultaneously；
Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；The third layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel and blue subpixels simultaneously；
Wherein, evaporation first layer optical compensation layer material, second layer optical compensation layer material and third layer light
The order for learning compensation layer material is random order.
In one of the embodiments, in each pixel cell green sub-pixels, red sub-pixel, blueness
Sub-pixel is bar shaped, and arranged in parallel successively.
In one of the embodiments, in each pixel cell green sub-pixels, red sub-pixel, blueness
Sub-pixel is bulk, and arranged in parallel, red are sub in a first direction for green sub-pixels and red sub-pixel
Pixel and blue subpixels arranged in parallel in a second direction.The first direction and second direction are vertical.
In one of the embodiments, when evaporation second layer optical compensation layer material is prior to evaporation third layer optics
When compensating layer material, b>a；When evaporation third layer optical compensation layer material is prior to evaporation second layer optical compensating layer
During material, a>b.
A kind of preparation method of the optical compensating layer of OLED display screen, for following dot structure：Each picture
Green sub-pixels, red sub-pixel in plain unit, blue subpixels are bar shaped, and arranged in parallel successively；
The same sub-pixels of adjacent pixel unit are adjacent；Methods described comprises the following steps：
Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；The first layer
Optical compensation layer material covers red sub-pixel, green sub-pixels and blueness in each pixel cell simultaneously
The light-emitting zone of pixel；
Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；The second layer
Optical compensation layer material covers the hair of the red sub-pixel and green sub-pixels in two neighboring pixel cell simultaneously
Light region；
Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；The third layer
Optical compensation layer material covers the red sub-pixel in two neighboring pixel cell and the hair of blue subpixels simultaneously
Light region.
In one of the embodiments, when evaporation second layer optical compensation layer material is prior to evaporation third layer optics
When compensating layer material, b>a；When evaporation third layer optical compensation layer material is prior to evaporation second layer optical compensating layer
During material, a>b.
A kind of preparation method of OLED display screen, including the step of formation optical compensating layer, the formation light
Learn compensation layer the step of using above-mentioned optical compensating layer preparation method.
In one of the embodiments, the display screen is top ray structure or bottom ray structure.Wherein one
In individual embodiment, the optical compensating layer is hole transmission layer, electron transfer layer or hole injection layer.
The preparation method of above-mentioned OLED display screen and its optical compensating layer, is steamed using fine metal mask plate
When plating optical compensating layer, because the perforate of mask plate is more than twice of each sub-pixel width.Making phase
With resolution ratio OLED display screen when, when the making for being related to optical compensating layer, its material than conventional method
Utilization rate is higher, more saves material.
Brief description of the drawings
Fig. 1 is the layer structure figure of traditional optical compensating layer；
Fig. 2 is the profile of single sub-pixel in OLED display；
Fig. 3 is the layer structure figure of luminescent layer；
Fig. 4 a are a kind of pixel arrangement structure；
Fig. 4 b are another pixel arrangement structure；
Fig. 5 a are the stratiform figure after formation first layer optical compensation layer material in the method for first embodiment；
Fig. 5 b are the stratiform figure after formation second layer optical compensation layer material in the method for first embodiment；
Fig. 5 c are the stratiform figure after formation third layer optical compensation layer material in the method for first embodiment；
Fig. 5 d are the pixel arrangement structure formation second layer, the third layer optical compensation layer material using Fig. 4 b
Position and direction schematic diagram；
The dot structure that Fig. 6 is used by the method for second embodiment；
Fig. 7 a are the stratiform figure after formation first layer optical compensation layer material in the method for second embodiment；
Fig. 7 b are the stratiform figure after formation second layer optical compensation layer material in the method for second embodiment；
Fig. 7 c are the stratiform figure after formation third layer optical compensation layer material in the method for second embodiment.
Embodiment
It is further described below in conjunction with drawings and examples.
The displaying principle that Fig. 2 briefly describes OLED display is combined first.
Fig. 2 shows the longitudinal sectional drawing of OLED display 10.The OLED display 10 includes substrate
11st, driving layer 20, the first insulating barrier 30, first electrode 40, luminescent layer 50, second electrode 60 and the
Two insulating barriers 70.Layer 20 is driven to include gate electrode 21, gate insulator 22, semiconductor layer 23, interlayer exhausted
Edge layer 24 and lead conductive layer 25.The OLED display 10 is to push up luminous display unit, i.e. light from second
Projected at electrode 60.First electrode 40 passes through the through hole on the first insulating barrier 30 and lead conductive layer 25
Electrical connection.Opening is provided with the corresponding position of luminescent layer 50 on second insulating barrier 70, what luminescent layer 50 was launched
Light-transmissive second electrode 60 is projected.
When first electrode 40 drives acquisition positive voltage by driving layer 20, luminescent layer 50 is in first electrode 40
Part between second electrode 60 can be excited because of the voltage between first electrode 40 and second electrode 60
Visible ray is produced, according to the size of voltage, light there are different brightness.According to the difference of luminescent material, light meeting
There are different colors.
With reference to Fig. 3, luminescent layer 50 includes the hole transmission layer 41 adjacent with first electrode 40 and the second electricity
Luminous material between the adjacent electron transfer layer 61 in pole 60 and hole transmission layer 41 and electron transfer layer 61
The bed of material 51.In the ray structure of top, using hole transmission layer 41 as optical compensating layer, to improve light extraction efficiency.
Structure in Fig. 2 sends the light of a sub-pixel.One red sub-pixel, a green sub-pixels and
One blue subpixels constitutes a pixel cell.
The preparation method of the light compensation layer of first embodiment presented below.This method is used for following dot structure：
Green sub-pixels and blue subpixels in each pixel cell are adjacent with red sub-pixel.
The dot structure both can be green sub-pixels, red in each pixel cell as shown in fig. 4 a
Sub-pixel, blue subpixels are bar shaped, and arranged in parallel successively.
The dot structure can also be green sub-pixels, red in each pixel cell as shown in Figure 4 b
Sub-pixel, blue subpixels are bulk, and green sub-pixels and red sub-pixel are arranged side by side in a first direction
Arrangement, red sub-pixel and blue subpixels arranged in parallel in a second direction.The first direction and second
Direction can be vertical.
Processing of the method for first embodiment to each pixel is identical, therefore procedure below is conceived to list
The processing procedure of individual pixel, whole pixel is all identical in the processing that same stage is carried out.And following mistakes
Journey is illustrated by taking the dot structure shown in Fig. 4 a as an example.
Step S110：Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；
The first layer optical compensation layer material covers red sub-pixel, green sub-pixels and blue subpixels simultaneously
Light-emitting zone.Common metal mask plate is the larger mask plate of perforate, and a general perforate can cover 3
The light-emitting zone of sub-pixel.If setting the width of each sub-pixel as w, common metal mask plate is that perforate is wide
Spend for 3w.After this step process, the structure of optical compensating layer is as shown in Figure 5 a.
Step S120：Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；
The second layer optical compensation layer material covers the light-emitting zone of red sub-pixel and green sub-pixels simultaneously.By
Two sub-pixels are covered simultaneously in second layer optical compensation layer material.The fine metal mask plate that then uses is opened
Hole width is 2w.After this step process, the structure of optical compensating layer is as shown in Figure 5 b.
Step S130：Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；
The third layer optical compensation layer material covers the light-emitting zone of red sub-pixel and blue subpixels simultaneously.By
Two sub-pixels are covered simultaneously in third layer optical compensation layer material.The fine metal mask plate that then uses is opened
Hole width is 2w.After this step process, the structure of optical compensating layer is as shown in Figure 5 c.
After above-mentioned processing, the optical compensation thickness on the light-emitting zone of red sub-pixel is a+b+c, green
Optical compensation thickness on the light-emitting zone of sub-pixel is that the optics on b+c, the light-emitting zone of blue subpixels is mended
Thickness is repaid for a+c.Because the optical compensation thickness of green sub-pixels needs the optical compensation more than blue subpixels
Thickness, it requires b ＞ a.
In the method for above-mentioned first embodiment, due in step S120 and step S130, using fine gold
Belong to mask plate to be deposited during optical compensating layer, the perforate of mask plate is 2w, is each sub-pixel width w
Twice.When making the OLED display screen of equal resolution, when the making for being related to optical compensating layer, it compares
The stock utilization of conventional method is higher, more saves material.
According to Fig. 4 b dot structure, the process and the dot structure using Fig. 4 a of optical compensating layer are made
It is similar.Simply when performing step S120 and step S130, the light-emitting zone of two adjacent subpixels is deposited
Optical compensation layer material direction and position difference.With reference to Fig. 5 d.
In said process, step S120 and step S130 order can also be changed.When evaporation second layer light
When learning compensation layer material prior to evaporation third layer optical compensation layer material, b ＞ a；When evaporation third layer optics is mended
When repaying layer material prior to evaporation second layer optical compensation layer material, a ＞ b.
The preparation method of the light compensation layer of second embodiment presented below.This method is used for following dot structure：
Green sub-pixels G, red sub-pixel R, blue subpixels B in each pixel cell are bar shaped, and
Arranged in parallel successively；The same sub-pixels of adjacent pixel unit are adjacent.As shown in fig. 6, three adjacent pictures
Plain unit P1, P2, P3 green sub-pixels G, red sub-pixel R, blue subpixels B are bar shaped,
And arranged in parallel successively.And pixel cell P1 and pixel cell P2 blue subpixels B is adjacent, pixel list
First P2 and pixel cell P3 green sub-pixels are adjacent.
Processing of the method for second embodiment to each pixel is not fully identical, it is per treatment in may be same
When be related to two adjacent pixels.
Step S210：Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；
The first layer optical compensation layer material is while cover the red sub-pixel in each pixel cell, green sub- picture
The light-emitting zone of element and blue subpixels.Common metal mask plate is the larger mask plate of perforate, a perforate
The light-emitting zone of 3 sub-pixels can be covered.If setting the width of each sub-pixel as w, common metal is covered
Diaphragm plate is that aperture widths are 3w.After this step process, the structure of optical compensating layer is as shown in Figure 7a.
Step S220：Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；
The second layer optical compensation layer material covers red sub-pixel and green in two neighboring pixel cell simultaneously
The light-emitting zone of sub-pixel.Because second layer optical compensation layer material covers two neighboring pixel cell simultaneously
Four sub-pixels.The aperture widths of the fine metal mask plate then used is 4w.After this step process,
The structure of optical compensating layer is as shown in Figure 7b.
Step S230：Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；
The third layer optical compensation layer material covers red sub-pixel and blueness in two neighboring pixel cell simultaneously
The light-emitting zone of sub-pixel.Because third layer optical compensation layer material covers two neighboring pixel cell simultaneously
Four sub-pixels.The aperture widths of the fine metal mask plate then used is 4w.After this step process,
The structure of optical compensating layer is as shown in Figure 7 c.
In the method for above-mentioned second embodiment, due in step S220 and step S230, using fine gold
Belong to mask plate to be deposited during optical compensating layer, the perforate of mask plate is 4w, is each sub-pixel width w
Four times.When making the OLED display screen of equal resolution, when the making for being related to optical compensating layer, it compares
The stock utilization of conventional method is higher, more saves material.
In said process, step S220 and step S230 order can also be changed.When evaporation second layer light
When learning compensation layer material prior to evaporation third layer optical compensation layer material, b ＞ a；When evaporation third layer optics is mended
When repaying layer material prior to evaporation second layer optical compensation layer material, a ＞ b.
The method of above-described embodiment, can apply the system in the OLED display screen with corresponding dot structure
During work.With reference to Fig. 2, the manufacturing process of the OLED display screen includes the making of driving layer 20, first
Formation, the making of luminescent layer 50 and formation of second electrode 60 of electrode 40 etc..Wherein drive layer 20
Making, the formation of first electrode 40 and the formation of second electrode 60 it is identical with conventional method, herein not
Repeat.
In the manufacturing process of luminescent layer 50, just include hole transmission layer 41, luminous material layer 51 and
The formation of electron transfer layer 61.Wherein, mended when using hole transmission layer 41 or electron transfer layer 61 as optics
It is necessary to using the preparation method of the optical compensating layer of above-described embodiment when repaying layer.
The OLED display screen can be top ray structure, then the optical compensating layer can be hole transmission layer
41。
The OLED display screen can also be bottom ray structure, then the optical compensating layer can be electric transmission
Layer 61.
Each technical characteristic of embodiment described above can be combined arbitrarily, not right to make description succinct
The all possible combination of each technical characteristic in above-described embodiment is all described, as long as however, these skills
Contradiction is not present in the combination of art feature, is all considered to be the scope of this specification record.
Embodiment described above only expresses the several embodiments of the present invention, and it describes more specific and detailed,
But can not therefore it be construed as limiting the scope of the patent.It should be pointed out that for this area
For those of ordinary skill, without departing from the inventive concept of the premise, some deformations can also be made and changed
Enter, these belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended power
Profit requires to be defined.
Claims (10)
1. a kind of preparation method of the optical compensating layer of OLED display screen, for following dot structure：Each
Green sub-pixels and blue subpixels in pixel cell are adjacent with red sub-pixel；Methods described is included such as
Lower step：
Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；The first layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel, green sub-pixels and blue subpixels simultaneously；
Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；The second layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel and green sub-pixels simultaneously；
Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；The third layer
Optical compensation layer material covers the light-emitting zone of red sub-pixel and blue subpixels simultaneously；
Wherein, evaporation first layer optical compensation layer material, second layer optical compensation layer material and third layer light
The order for learning compensation layer material is random order.
2. the preparation method of the optical compensating layer of OLED display screen according to claim 1, its feature
It is, green sub-pixels, red sub-pixel in each pixel cell, blue subpixels are bar shaped, and
Arranged in parallel successively.
3. the preparation method of the optical compensating layer of OLED display screen according to claim 1, its feature
It is, green sub-pixels, red sub-pixel in each pixel cell, blue subpixels are bulk, and
Arranged in parallel, red sub-pixel and blue subpixels exist in a first direction for green sub-pixels and red sub-pixel
Arranged in parallel in second direction.
4. the preparation method of the optical compensating layer of OLED display screen according to claim 3, its feature
It is, the first direction and second direction are mutually perpendicular to.
5. the preparation method of the optical compensating layer of OLED display screen according to claim 1, its feature
It is, when second layer optical compensation layer material is deposited prior to evaporation third layer optical compensation layer material, b>a；
When third layer optical compensation layer material is deposited prior to evaporation second layer optical compensation layer material, a>b.
6. a kind of preparation method of the optical compensating layer of OLED display screen, for following dot structure：Each
Green sub-pixels, red sub-pixel in pixel cell, blue subpixels are bar shaped, and are arranged side by side successively
Row；The same sub-pixels of adjacent pixel unit are adjacent；Methods described comprises the following steps：
Common metal mask plate evaporation thickness is used for c first layer optical compensation layer material；The first layer
Optical compensation layer material covers red sub-pixel, green sub-pixels and blueness in each pixel cell simultaneously
The light-emitting zone of pixel；
Fine metal mask plate evaporation thickness is used for b second layer optical compensation layer material；The second layer
Optical compensation layer material covers the hair of the red sub-pixel and green sub-pixels in two neighboring pixel cell simultaneously
Light region；
Fine metal mask plate evaporation thickness is used for a third layer optical compensation layer material；The third layer
Optical compensation layer material covers the red sub-pixel in two neighboring pixel cell and the hair of blue subpixels simultaneously
Light region.
7. the preparation method of the optical compensating layer of OLED display screen according to claim 6, its feature
It is, when second layer optical compensation layer material is deposited prior to evaporation third layer optical compensation layer material, b>a；
When third layer optical compensation layer material is deposited prior to evaporation second layer optical compensation layer material, a>b.
8. a kind of preparation method of OLED display screen, including the step of formation optical compensating layer, the formation
The step of optical compensating layer using the optical compensating layer described in any one of claim 1~7 preparation method.
9. the preparation method of display screen according to claim 8, it is characterised in that the display screen is
Push up ray structure or bottom ray structure.
10. the preparation method of display screen according to claim 8, it is characterised in that the optics is mended
Layer is repaid for hole transmission layer, electron transfer layer or hole injection layer.
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