CN107149880A - A kind of copper ion selection seperation film and preparation method thereof - Google Patents
A kind of copper ion selection seperation film and preparation method thereof Download PDFInfo
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- CN107149880A CN107149880A CN201610114841.4A CN201610114841A CN107149880A CN 107149880 A CN107149880 A CN 107149880A CN 201610114841 A CN201610114841 A CN 201610114841A CN 107149880 A CN107149880 A CN 107149880A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/30—Polyalkenyl halides
- B01D71/32—Polyalkenyl halides containing fluorine atoms
- B01D71/34—Polyvinylidene fluoride
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0079—Manufacture of membranes comprising organic and inorganic components
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/22—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising organic material
- B01J20/26—Synthetic macromolecular compounds
- B01J20/268—Polymers created by use of a template, e.g. molecularly imprinted polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28002—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their physical properties
- B01J20/28004—Sorbent size or size distribution, e.g. particle size
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/28—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties
- B01J20/28014—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof characterised by their form or physical properties characterised by their form
- B01J20/28033—Membrane, sheet, cloth, pad, lamellar or mat
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3214—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the method for obtaining this coating or impregnating
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/288—Treatment of water, waste water, or sewage by sorption using composite sorbents, e.g. coated, impregnated, multi-layered
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
- C02F1/62—Heavy metal compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/46—Impregnation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/02—Details relating to pores or porosity of the membranes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2220/00—Aspects relating to sorbent materials
- B01J2220/40—Aspects relating to the composition of sorbent or filter aid materials
- B01J2220/46—Materials comprising a mixture of inorganic and organic materials
Abstract
The invention discloses a kind of copper ion selection seperation film and preparation method thereof, belong to membrane material preparation science and technical field.Specifically coupled ion engram technology and hydrothermal synthesis method prepare ion blotting mesoporous silicon dioxide micro-sphere, then it is blended with PVDF, silicon dioxide microsphere is fixed on Kynoar (PVDF) fenestra by inversion of phases film build method, is made to copper ion high adsorption capacity, the PVDF/SiO of strong selectivity2Composite membrane.The present invention has given full play to the advantage such as the selective absorption characteristic of copper ion trace mesoporous silicon oxide and the regeneration porous, easy to use of pvdf membrane, had both realized the selective absorption to copper ion, and had been also convenient for operating with, has prevented SiO2Aggregation is reunited in use.In terms of film prepared by the present invention can be widely used for effluent containing heavy metal ions processing.
Description
Technical field
It is specially a kind of that copper ion selection adsorbing separation is situated between the present invention relates to a kind of copper ion selection seperation film and preparation method thereof
Hole SiO2Microballoon obtains copper ion selection seperation film and preparation method thereof with Kynoar (PVDF) blending, belongs to membrane material
Preparation science and technical field.
Background technology
Copper is the great element of harm to the human body, can trigger dermatitis and wet epidemic disease；High concentration copper compound can also cause cutaneous necrosis,
Hemoglobin is denatured, organism metabolism exception and disease of cardiovascular system.Organic synthesis, agricultural chemicals, dyestuff, rubber, chemical industry and
The copper ion that the industries such as smelting are discharged every year makes environment water receive severe contamination.It is current face that environment copper ion, which is efficiently removed,
The huge challenge faced.At present, copper ion method has absorption method, ion-exchange, membrane filter method in processing water, and chemistry is also
Former method and hyperfiltration etc..Wherein, film absorption method due to mode of operation is easy, favorable regeneration effect and secondary pollution it is small etc. excellent
Put and receive and especially favor.But common polymer film sorbing material is affected by environment larger, easily it is swelled and causes functional group
Shielded, cause that cupric ion adsorption is small, adsorption/desorption speed slow, adsorption effect is undesirable.
Mesoporous silicon oxide has hard mesopore orbit, and specific surface area and pore volume are big, are preferable adsorbents.Mesoporous dioxy
SiClx has obtained widely studied because the adsorbance of heavy metal ion is big, adsorption efficiency is high, but mesoporous silicon oxide is generally in powder
Last shape solid, easily aggregation is lumpd in use, causes adsorbance to substantially reduce；In addition, often ratio of components is more multiple for waste water
Miscellaneous, except copper ion, also containing other many kinds of metal ions components, the interference of other cations can reduce mesoporous silicon oxide pair
The absorption of copper ion；In addition, powdered silica needs to filter, regenerated after saturation absorption, and it is cumbersome, it is costly,
Easily it is lost in.Therefore, how to improve copper ion selection adsorption capacity, dispersiveness and the use of ability is mesoporous silicon oxide adsorption material
Expect urgent problem.
Based on this, coupled ion engram technology and hydrothermal synthesis method of the present invention prepare ion blotting mesoporous silicon dioxide micro-sphere, then
Silicon dioxide microsphere is fixed on Kynoar (PVDF) perforated membrane, PVDF/SiO is made2Composite membrane, gives full play to copper
The advantage such as the selective absorption characteristic of ion blotting mesoporous silicon oxide and the regeneration porous, easy to use of pvdf membrane, it is both real
Now to the selective absorption of copper ion, it has been also convenient for operating with, has prevented it from assembling reunion in use.
The content of the invention
The invention aims to solve, adsorption function film adsorption capacity is low, adsorption rate slow, and mesoporous silicon oxide does not have
Absorbing copper ion energy is selected, easily aggregation, the problems such as using and reuse inconvenience.The invention provides a kind of copper ion
Selective diffusion barrier and preparation method thereof, is prepared to copper ion trace mesoporous silicon oxide particular by ion blotting method, with
It is blended with PVDF afterwards, high adsorption capacity, the PVDF/SiO of strong selectivity is made2Composite membrane.The present invention by weight by
65-75 parts of 25-35 parts of copper ion trace mesoporous silicon oxide and PVDF polymer are made.
The technical scheme that the present invention solves the product preparation method technical problem is：Design a kind of copper ion selective diffusion barrier
Preparation method, this method be by obtained by Kynoar (PVDF) and copper ion trace mesoporous silicon oxide physical blending, including
Following steps：
(1) ion blotting mesoporous silicon oxide is prepared：
(a) solution A：By template ion Cu2+With function monomer 3- TSL 8330s (APTMS) or 3- (2-
Aminoethylamino) propyl trimethoxy silicane (AAPTS) is dissolved in distilled water, generates metallo-chelate；
(b) solution B：Crosslinking agent hexadecyl trimethoxy ammonia bromide (CTAB) is dissolved in distilled water；
(c) ion blotting mesoporous silicon oxide：Above-mentioned solution A, B are mixed and NaOH solution is added dropwise and positive silicic acid second
Ester (TEOS), stirring, standing, the solid obtained after centrifugation is eluted with hydrochloric acid-absolute ethyl alcohol mixed liquor, and repetition elution-
Centrifugation 2 times, then uses absolute ethyl alcohol and distills water washing 3 times, through being dried to obtain ion blotting mesoporous silicon oxide respectively；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide and pore-foaming agent triblock copolymer (F127) that step (1) is obtained
It is distributed in organic solvent DMF (DMF) or DMA (DMAc), is gradually added
PVDF powder, casting solution is made in stirring, deaeration；
(3) ion blotting film is prepared：The casting solution that step (2) is obtained is poured into striking film forming on the glass plate of smooth pieces, will
Glass plate is placed in solidification in coagulating bath distilled water and obtains film.
The present invention solves the problems, such as that the technical scheme of the product technology is：A kind of copper ion Selective Separation Flat Membrane is designed, it is special
Levy and be that the Flat Membrane is obtained by Kynoar and copper ion trace mesoporous silicon oxide physical blending.Physical blending method by
Preparation method defined of the present invention.
Copper ion selective diffusion barrier of the present invention, copper ion trace mesoporous silicon dioxide micro-sphere is located at fenestra surface, can be from a variety of
Selective Separation goes out copper ion in the heavy metal ion aqueous solution.The outstanding advantages of the present invention are that ion blotting mesoporous silicon oxide is micro-
Ball is fixed in fenestra, so that the adsorbance of ion blotting mesoporous silicon dioxide micro-sphere is big, the good characteristic of selectivity and perforated membrane
Load capacity it is big, adsorption-desorption speed is fast, is ideally combined together the advantages of easy to use, is a kind of new UF membrane material
Material.
The preparation method technique of copper ion selective diffusion barrier of the present invention is simple, can be carried out in a mild condition, agents useful for same
It is conventional reagent, device therefor is simple, it is easy to industrializing implementation.
Embodiment
The present invention is further discussed below with reference to embodiment：
The present invention is a kind of with copper ion selective diffusion barrier and preparation method thereof.The film is to select Kynoar (PVDF)
As film forming main material, by copper ion trace mesoporous silicon dioxide micro-sphere and its physical blending, film forming is converted using solution
Method is made.Its design principle is to form Kynoar (PVDF) with incompatible copper ion trace mesoporous silicon dioxide micro-sphere
They are separated in film forming procedure, form the Kynoar point that copper ion trace mesoporous silicon dioxide micro-sphere is located at fenestra surface
From film.Preparation method of the present invention specifically selects copper ion trace mesoporous silicon dioxide micro-sphere and Kynoar physical blending respectively
Inversion of phases film forming, prepares Kynoar (PVDF) film that separation copper ion may be selected.Due to the copper ion print positioned at fenestra
There is mark mesoporous silicon dioxide micro-sphere copper ion to select characterization of adsorption, prepared film can with selective absorption copper ion, so as to
To select separation copper ion.Therefore, product of the invention can by the silicon dioxide microsphere load capacity and membrane pore structure of adjusting film,
It is a kind of new Kynoar (PVDF) separation membrane so as to adjust heavy metal ion adsorbed selection function.
Of the present invention to have in copper ion selective diffusion barrier preparation process, resulting film is cleaned repeatedly with deionized water,
Purpose is the pore-foaming agent for removing absorption.
Although the method that the present invention is narrated preferentially selects Kynoar (PVDF) Flat Membrane, it is equally applicable to other forms
Film, including tubular membrane, the other forms such as hollow-fibre membrane, and corresponding hole is prepared with this can adjust Kynoar (PVDF)
Seperation film.
The specific embodiment of the present invention is described below：
Embodiment 1.
(1) ion blotting mesoporous silicon oxide is prepared：
(a) solution A：Take 0.5g copper nitrates (Cu (NO3)2·3H2O), 2.2g 3- TSL 8330s (APTMS)
It is dissolved in 60ml distilled water, 60 DEG C of stirring in water bath are reacted 2 hours；
(b) solution B：4.0g hexadecyl trimethoxies ammonia bromide (CTAB) is taken to be dissolved in 100ml distilled water, 40 DEG C
Stirring in water bath is reacted 1 hour；
(c) ion blotting mesoporous silicon oxide：Above-mentioned solution A, B are mixed and that NaOH (0.01mol/L) is added dropwise is molten
Liquid and 10g tetraethyl orthosilicates (TEOS), mechanical agitation 2 hours, then 80 DEG C stand 48 hours, are centrifuged obtaining
Solid elute 24h with hydrochloric acid-absolute ethyl alcohol mixed liquor, repeat elution-separation 2 times, then use absolute ethyl alcohol and distillation respectively again
Water washing 3 times, through being dried to obtain ion blotting mesoporous silicon oxide；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.28g steps (1) are obtained, 0.49g F127 and 2.95gPVDF
It is added to one by one in 18.96g DMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) ion blotting film is prepared：The casting solution that step (2) is obtained is poured into smooth pieces glass plate, is uniformly scraped with knifing rod
Film is made, film-forming in distilled water is subsequently placed in, is taken out after film is completely fallen off from glass plate in being immersed in distilled water 48 hours,
Copper ion selection seperation film is made.
Embodiment 2.
(1) be the same as Example 1；
(1) be the same as Example 1；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.67g steps (1) are obtained, 0.49g F127 and 2.50g PVDF
It is added to one by one in 18.96g DMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 3.
(1) be the same as Example 1；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 2.08g steps (1) are obtained, 0.49g F127 and 2.08g PVDF
Add one by one into 18.96gDMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 4.
(1) be the same as Example 1；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.23g steps (1) are obtained, 0.46g F127 and 2.87g PVDF
Add one by one into 18.70g DMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 5.
(1) be the same as Example 1；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.64g steps (1) are obtained, 0.46g F127 and 2.46g PVDF
Add one by one into 18.70g DMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 6.
(1) be the same as Example 1；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 2.05g steps (1) are obtained, 0.46g F127 and 2.05g PVDF
Add one by one into 18.70g DMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 7.
(a) solution A：Take 0.5g copper nitrates (Cu (NO3)2·3H2O), 1.8g 3- (2- aminoethylaminos) propyl group trimethoxy
Base silane (AAPTS) is dissolved in 60ml distilled water, and 60 DEG C of stirring in water bath are reacted 3 hours；
(b) solution B：4.0g hexadecyl trimethoxies ammonia bromide (CTAB) is taken to be dissolved in 100ml distilled water, 40 DEG C
Stirring in water bath is reacted 1 hour；
(c) ion blotting mesoporous silicon oxide：Above-mentioned solution A, B are mixed and that NaOH (0.01mol/L) is added dropwise is molten
Liquid and 10g tetraethyl orthosilicates (TEOS), mechanical agitation 2 hours, then 80 DEG C stand 48 hours, are centrifuged obtaining
Solid elute 24h with hydrochloric acid-absolute ethyl alcohol mixed liquor, elution-separation 2 times is repeated, finally with absolute ethyl alcohol, distillation water washing
Three times and it is dried to obtain ion blotting mesoporous silicon oxide；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.28g steps (1) are obtained, 0.49g F127 and 2.95g PVDF
Add one by one into 18.96g DMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 8.
(1) be the same as Example 7；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.67g steps (1) are obtained, 0.49g F127 and 2.50gPVDF
Add one by one into 18.96gDMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 9.
(1) be the same as Example 7；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 2.08g steps (1) are obtained, 0.49g F127 and 2.08g PVDF
Add one by one into 18.96g DMF, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 10.
(1) be the same as Example 7；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.23g steps (1) are obtained, 0.46g F127 and 2.87gPVDF
Add one by one into 18.70gDMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
(3) be the same as Example 1.
Embodiment 11.
(1) be the same as Example 7；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 1.64g steps (1) are obtained, 0.46g F127 and 2.46gPVDF
Add one by one into 18.70g DMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
Embodiment 12.
(1) be the same as Example 7；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide that 2.05g steps (1) are obtained, 0.46g F127 and 2.05gPVDF
Add one by one into 18.70g DMAc, mechanical agitation obtains standing and defoaming under uniform solution, vacuum condition at 60 DEG C after 6 hours
2h, obtains casting solution；
(3) be the same as Example 1.
After testing, prepared film is made up of 65-75 parts of PVDF and 25-35 parts of silica, copper ions trace silica
The less silica containing pvdf membrane of pvdf membrane there is more fenestra, fenestra particle diameter 100-300nm, porosity 90-98%；
Ion blotting mesoporous silicon oxide is spherical, and microspherulite diameter is 100-500nm, and mesoporous pore size is 2-5nm, and micropore size is
0.1-0.5nm；Prepared copper ion selection seperation film has cupric ion adsorption big, and selection absorbing copper ion energy is strong, absorption
Desorption speed is fast, and stability is relatively good.
Copper ion selection seperation film proposed by the present invention and preparation method thereof, is described, correlation technique people by embodiment
Member substantially can not departing from present disclosure, content as described herein is modified in spirit and scope or suitably change and group
Close to realize the present invention.In particular, all similar replacements and change be aobvious for a person skilled in the art
And be clear to, they are considered as being included in spirit, scope and the content of the present invention.
Claims (7)
1. a kind of copper ion selection seperation film and preparation method thereof, comprises the following steps：
(1) ion blotting mesoporous silicon oxide is prepared：
(a) solution A is prepared：By template ion Cu2+With function monomer 3- TSL 8330s or 3- (2- amino second
Base amino) propyl trimethoxy silicane is dissolved in distilled water, generates metallo-chelate；
(b) solution B is prepared：Crosslinking agent hexadecyl trimethoxy ammonia bromide is dissolved in distilled water；
(c) ion blotting mesoporous silicon oxide is prepared：Solution A and B are mixed and NaOH solution is added dropwise and positive silicic acid
Ethyl ester, stirring, standing, the solid obtained after centrifugation uses hydrochloric acid-absolute ethyl alcohol mixed liquor, absolute ethyl alcohol and distillation respectively
Water washing, through being dried to obtain ion blotting mesoporous silicon oxide；
(2) casting solution is prepared：The ion blotting mesoporous silicon oxide and pore-foaming agent triblock copolymer F127 that step (1) is obtained
It is distributed in organic solvent DMF or DMA, is gradually added PVDF powder, stirs, takes off
Bubble, is made casting solution；
(3) ion blotting film is prepared：The casting solution that step (2) is obtained is poured on the glass plate of smooth pieces striking into liquid film,
It is subsequently placed in solidification in coagulating bath distilled water and obtains film.
2. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the film is by 65-75 parts
PVDF and 25-35 parts of mesoporous silicon oxide composition.
3. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the film fenestra particle diameter
100-300nm, porosity is 90-98%.
4. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the mesoporous silicon oxide
To be spherical, particle diameter is 100-500nm, and mesoporous pore size is 2-5nm, and micropore size is 0.1-0.5nm, in fenestra.
5. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the mesoporous silicon oxide
Adsorption capacity is selected with copper ion.
6. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the film is inhaled to copper ion
Attached amount is big, and selection absorbing copper ion energy is strong, and adsorption-desorption speed is fast.
7. a kind of copper ion selects seperation film and preparation method thereof according to claim 1, it is characterised in that the film is Flat Membrane.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108993416A (en) * | 2018-08-10 | 2018-12-14 | 太原理工大学 | A kind of preparation method of copper ion blotting membrane |
| CN110813254A (en) * | 2019-11-26 | 2020-02-21 | 合肥学院 | Method for preparing hybrid membrane for selectively separating copper from mixed metal solution |
| CN113522061A (en) * | 2021-07-21 | 2021-10-22 | 昆明理工大学 | Preparation method of high-adsorption-capacity lithium ion imprinting nano composite membrane |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101264992A (en) * | 2008-04-17 | 2008-09-17 | 大连理工大学 | Absorption catalysis purification separation composite function film for removing contaminant in water and water purification method |
| CN102120146A (en) * | 2010-12-22 | 2011-07-13 | 厦门建霖工业有限公司 | Preparation method of filter core of composite ultrafiltration tube membrane |
| CN102430391A (en) * | 2011-09-11 | 2012-05-02 | 大连理工大学 | Preparation method of metal ion imprinted chitosan crosslinked membrane adsorbent and application thereof |
| CN103214689A (en) * | 2013-03-20 | 2013-07-24 | 太原理工大学 | Preparation method of ion imprinted polymer film |
| CN103285837A (en) * | 2013-06-27 | 2013-09-11 | 武汉科梦环境工程有限公司 | Preparation method of adsorption material with high selectivity on different heavy metal ions |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101264992A (en) * | 2008-04-17 | 2008-09-17 | 大连理工大学 | Absorption catalysis purification separation composite function film for removing contaminant in water and water purification method |
| CN102120146A (en) * | 2010-12-22 | 2011-07-13 | 厦门建霖工业有限公司 | Preparation method of filter core of composite ultrafiltration tube membrane |
| CN102430391A (en) * | 2011-09-11 | 2012-05-02 | 大连理工大学 | Preparation method of metal ion imprinted chitosan crosslinked membrane adsorbent and application thereof |
| CN103214689A (en) * | 2013-03-20 | 2013-07-24 | 太原理工大学 | Preparation method of ion imprinted polymer film |
| CN103285837A (en) * | 2013-06-27 | 2013-09-11 | 武汉科梦环境工程有限公司 | Preparation method of adsorption material with high selectivity on different heavy metal ions |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108993416A (en) * | 2018-08-10 | 2018-12-14 | 太原理工大学 | A kind of preparation method of copper ion blotting membrane |
| CN110813254A (en) * | 2019-11-26 | 2020-02-21 | 合肥学院 | Method for preparing hybrid membrane for selectively separating copper from mixed metal solution |
| CN113522061A (en) * | 2021-07-21 | 2021-10-22 | 昆明理工大学 | Preparation method of high-adsorption-capacity lithium ion imprinting nano composite membrane |
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