CN107099799A - A kind of chlorination copper etchant solution and preparation method thereof - Google Patents
A kind of chlorination copper etchant solution and preparation method thereof Download PDFInfo
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- CN107099799A CN107099799A CN201710212876.6A CN201710212876A CN107099799A CN 107099799 A CN107099799 A CN 107099799A CN 201710212876 A CN201710212876 A CN 201710212876A CN 107099799 A CN107099799 A CN 107099799A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/42—Aqueous compositions containing a dispersed water-immiscible liquid
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Abstract
The present invention discloses a kind of chlorination copper etchant solution and preparation method thereof, is made up of etching mother liquor and the sub- liquid of etching, and the etching mother liquor includes the raw material of following parts by weight：Sodium carboxymethylcellulose, boric acid, methylbutyrate, benzoyl chloride, N chlorination p-methylphenyl sulphonylamines sodium, barium stearate, azodiisobutyronitrile, ferric trichloride, hydrofluoric acid, phosphoric acid, Methoxy acetic acid, potassium bichromate, diethanol amine and triethanolamine, the sub- liquid of etching include the raw material of following parts by weight：Copper chloride, ammoniacal liquor, ammonium chloride and cobalt chloride, the compound method of this kind of roller copper plating bath are simple, and the etching efficiency of etching solution is high, and the gas environmental pollution produced in etching process is small, quickly roller can be etched, and the etching precision of roller is high, is not likely to produce defect.
Description
Technical field
The present invention relates to a kind of chlorination copper etchant solution and preparation method thereof.
Background technology
At present, laser film-engraving gravure printing roller etching make when, be etched using ferric trichloride, be by ferric trichloride with
What the oxidation-reduction reaction of copper was realized.But its existing defects：Sediment is more, and liquid waste processing is difficult, and environmental pollution is serious；
Easily there is the irregular phenomenon of corrosion；Etching solution regeneration difficulty is big.
Intaglio printing is as one kind of typography, and abundant with its printing product layer of ink, bright-colored, saturation degree is high, printing plate
The advantages of press resistance rate is high, print quality is stable, print speed printing speed is fast occupies of crucial importance in printing packaging and picture and text publishing area
Status.And roller is the important accessory of plate-making processing industry, roller is to be turned into metal material processing respectively using mask-making technology
Plant and carry decorative pattern, word, the roller of image.Existing roller in the etching process of making, roller surface because etching effect not
Good, for example not enough, etch depth is too deep, and etch quantity is excessive, causes whole roller in printing process, accordingly for etch depth
Product it is of low quality.Therefore, existing roller is present because etching precision is low and the etching of roller surface produces defect, causes printing
Writing or pattern it is not clear enough, the problems such as ink stain is obvious, and cause above mentioned problem Producing reason be then roller etching
Etching solution used, the existing etch printing plate, the etching solution of roller of being used for is generally common etching solution, and its composition is simple, and
And the etching speed of etching solution at different temperature remains unchanged slowly, causes efficiency low, while the precision of etching is low, easily produce
Defect, and existing etching solution produces substantial amounts of gas in etching, and pollution, unfavorable workman are produced to the working environment of workman
It is healthy.
Therefore, in summary, there is compound method complexity, and the etching effect of etching solution in the etching solution for being currently used for roller
Rate is low, and the gas produced in etching process is big for environment pollution, and influence workman's is healthy, while so that roller is etched
Efficiency is low, and the etching precision of roller is low, is also easy to produce defect.
The content of the invention
In view of this, it is simple it is an object of the present invention to provide a kind of compound method, and the etching efficiency of etching solution is high, and
The gas environmental pollution produced in etching process is small, quickly can be etched roller, and the etching precision of roller is high,
It is not likely to produce the chlorination copper etchant solution of defect.
In order to solve the above-mentioned technical problem, the technical scheme is that：A kind of chlorination copper etchant solution, by etching mother liquor and
Etch sub- liquid to be made, the etching mother liquor includes the raw material of following parts by weight：16-20 parts of sodium carboxymethylcellulose, boric acid 10-14
Part, 6-10 parts of methylbutyrate, 11-15 parts of benzoyl chloride, 13-17 parts of N- chlorinations p-methylphenyl sulphonylamine sodium, barium stearate
12-16 parts, 9-13 parts of azodiisobutyronitrile, 12-16 parts of ferric trichloride, 15-17 parts of hydrofluoric acid, 8-12 parts of phosphoric acid, methoxyl group vinegar
5-7 parts of sour 8-12 parts, 7-11 parts of potassium bichromate, 5-7 parts of diethanol amine and triethanolamine, the sub- liquid of etching include following weight
The raw material of part：10-16 parts of 11-13 parts of copper chloride, 6-8 parts of ammoniacal liquor, 13-17 parts of ammonium chloride and cobalt chloride.
Further, the chlorination copper etchant solution is by etching mother liquor and etches sub- liquid and is made, the etching mother liquor include with
The raw material of lower parts by weight：20 parts of sodium carboxymethylcellulose, 10 parts of boric acid, 6 parts of methylbutyrate, 11 parts of benzoyl chloride, N- chlorine
Change 13 parts of p-methylphenyl sulphonylamine sodium, 12 parts of barium stearate, 9 parts of azodiisobutyronitrile, 12 parts of ferric trichloride, 15 parts of hydrofluoric acid,
5 parts of 8 parts of phosphoric acid, 8 parts of Methoxy acetic acid, 7 parts of potassium bichromate, 5 parts of diethanol amine and triethanolamine, the sub- liquid of the etching include with
The raw material of lower parts by weight：10 parts of 11 parts of copper chloride, 6 parts of ammoniacal liquor, 13 parts of ammonium chloride and cobalt chloride.
Further, the chlorination copper etchant solution is by etching mother liquor and etches sub- liquid and is made, the etching mother liquor include with
The raw material of lower parts by weight：16 parts of sodium carboxymethylcellulose, 14 parts of boric acid, 10 parts of methylbutyrate, 15 parts of benzoyl chloride, N- chlorine
Change 17 parts of p-methylphenyl sulphonylamine sodium, 16 parts of barium stearate, 13 parts of azodiisobutyronitrile, 16 parts of ferric trichloride, 17 parts of hydrofluoric acid,
7 parts of 2 parts of phosphatase 11,12 parts of Methoxy acetic acid, 11 parts of potassium bichromate, 7 parts of diethanol amine and triethanolamine, the sub- liquid bag of etching
Include the raw material of following parts by weight：16 parts of 13 parts of copper chloride, 8 parts of ammoniacal liquor, 17 parts of ammonium chloride and cobalt chloride.
Further, the chlorination copper etchant solution is by etching mother liquor and etches sub- liquid and is made, the etching mother liquor include with
The raw material of lower parts by weight：18 parts of sodium carboxymethylcellulose, 12 parts of boric acid, 8 parts of methylbutyrate, 13 parts of benzoyl chloride, N- chlorine
Change 15 parts of p-methylphenyl sulphonylamine sodium, 14 parts of barium stearate, 11 parts of azodiisobutyronitrile, 14 parts of ferric trichloride, 16 parts of hydrofluoric acid,
6 parts of 0 part of phosphatase 11,10 parts of Methoxy acetic acid, 9 parts of potassium bichromate, 6 parts of diethanol amine and triethanolamine, the sub- liquid of etching include
The raw material of following parts by weight：13 parts of 12 parts of copper chloride, 7 parts of ammoniacal liquor, 15 parts of ammonium chloride and cobalt chloride.
The invention solves the problems that another technical problem to provide a kind of preparation method of chlorination copper etchant solution, including following step
Suddenly：
1) specific steps of etching mother liquor are prepared：
A, take it is acid by four groups of 10-14 parts of boric acid, 15-17 parts of hydrofluoric acid, 8-12 parts of phosphoric acid and Methoxy acetic acid 8-12 parts
Water of the weight of material than 1: 2 be put into production groove in, then will production groove reclaimed water be heated to 58-60 DEG C, finally successively by boric acid,
Hydrofluoric acid, phosphoric acid and Methoxy acetic acid are added to the water, and are slowly stirred with stirring rod so that boric acid, hydrofluoric acid, phosphoric acid and methoxy
During base acetic acid incorporates, and mutually merge, 50% acid solution is made, it is standby；
B, take 16-20 parts of sodium carboxymethylcellulose, 6-10 parts of methylbutyrate, 11-15 parts of benzoyl chloride, N- chlorinations pair
13-17 parts of methyl benzenesulfonamide sodium, 12-16 parts of barium stearate, 9-13 parts of azodiisobutyronitrile, 12-16 parts of ferric trichloride, weight chromium
5-7 parts of sour potassium 7-11 parts, 5-7 parts of diethanol amine and triethanolamine are added in 50% acid solution made from specific steps B,
Then the material of addition and acid solution are stirred by stirring rod, etching mother liquor is made, it is standby；
2) specific steps of etching midnight are prepared：
A, in production groove add twice 11-13 parts of copper chloride, 13-17 parts of ammonium chloride and the composition of cobalt chloride 10-16 parts three
Divide the water of gross weight, then at normal temperatures and pressures deliver copper chloride, ammonium chloride and cobalt chloride into production groove, by being dissolved in water
In mutually and be mixed evenly, the sub- liquid of etching is made, it is standby；
B, pH value 6-8 parts of the ammoniacal liquor of addition of the sub- liquid of etching according to made from specific steps A are adjusted the sub- liquid of etching
PH value.
3) etching mother liquor is with etching sub- liquid mixed preparing：By step 1) obtained etching mother liquor and step 2) at the time of be made
Chlorination copper etchant solution is made by weight 100: 1 ratio addition mixing in sub- liquid.
The technology of the present invention effect major embodiment is in the following areas：By sodium carboxymethylcellulose, boric acid, methylbutyrate, chlorine
Change benzoyl, N- chlorination p-methylphenyl sulphonylamines sodium, barium stearate, azodiisobutyronitrile, ferric trichloride, hydrofluoric acid, phosphoric acid, first
Epoxide acetic acid, potassium bichromate, diethanol amine and triethanolamine and water mix obtained etching mother liquor, by copper chloride, ammoniacal liquor,
The sub- liquid of etching that ammonium chloride and cobalt chloride are mixed to prepare with water, and chlorine is made by weight accessory with the sub- liquid of etching in etching mother liquor
Change copper etchant solution, and the compound method of this kind of chlorination copper etchant solution is simple, and the etching efficiency of etching solution is high, and etching
During the gas environmental pollution that produces it is small, quickly roller can be etched, and the etching precision of roller is high, is difficult
Produce defect.
Embodiment
Embodiment 1
A kind of chlorination copper etchant solution, is made up of etching mother liquor and the sub- liquid of etching, and the etching mother liquor includes following parts by weight
Raw material：20 parts of sodium carboxymethylcellulose, 10 parts of boric acid, 6 parts of methylbutyrate, 11 parts of benzoyl chloride, N- chlorinations are to methyl
13 parts of benzsulfamide sodium, 12 parts of barium stearate, 9 parts of azodiisobutyronitrile, 12 parts of ferric trichloride, 15 parts of hydrofluoric acid, 8 parts of phosphoric acid,
5 parts of 8 parts of Methoxy acetic acid, 7 parts of potassium bichromate, 5 parts of diethanol amine and triethanolamine, the sub- liquid of etching include following parts by weight
Raw material：10 parts of 11 parts of copper chloride, 6 parts of ammoniacal liquor, 13 parts of ammonium chloride and cobalt chloride.
A kind of preparation method of chlorination copper etchant solution, comprises the following steps：
1) specific steps of etching mother liquor are prepared：
A, take by 1 part of boric acid, 15 parts of hydrofluoric acid, four groups of acid materials of 8 parts of phosphoric acid and Methoxy acetic acid 8 part weight ratio 1:
2 water is put into production groove, production groove reclaimed water then is heated into 58 DEG C, finally successively by boric acid, hydrofluoric acid, phosphoric acid and methoxy
Base acetic acid is added to the water, and is slowly stirred with stirring rod so that during boric acid, hydrofluoric acid, phosphoric acid and Methoxy acetic acid incorporate, and phase
Mutually fusion, obtained 50% acid solution is standby；
B, 20 parts of sodium carboxymethylcellulose, 6 parts of methylbutyrate, 11 parts of benzoyl chloride, N- chlorinations are taken to methylbenzene sulphur
13 parts of acid amides sodium, 12 parts of barium stearate, 9 parts of azodiisobutyronitrile, 12 parts of ferric trichloride, 7 parts of potassium bichromate, 5 parts of diethanol amine
5 parts are added in 50% acid solution made from specific steps B with triethanolamine, then by stirring rod by the material of addition
Stirred with acid solution, etching mother liquor is made, it is standby；
2) specific steps of etching midnight are prepared：
A, add in production groove twice 11 parts of copper chloride, 10 parts of three groups of constituents gross weights of 13 parts of ammonium chloride and cobalt chloride
Water, then at normal temperatures and pressures by copper chloride, ammonium chloride and cobalt chloride deliver to production groove in, by it is soluble in water mutually and mix
Conjunction stirs, and the sub- liquid of etching is made, standby；
B, pH value 6 parts of the ammoniacal liquor of addition of the sub- liquid of etching according to made from specific steps A are adjusted the PH for etching sub- liquid
Value.
3) etching mother liquor is with etching sub- liquid mixed preparing：By step 1) obtained etching mother liquor and step 2) at the time of be made
Chlorination copper etchant solution is made by weight 100: 1 ratio addition mixing in sub- liquid.
Embodiment 2
A kind of chlorination copper etchant solution, is made up of etching mother liquor and the sub- liquid of etching, and the etching mother liquor includes following parts by weight
Raw material：16 parts of sodium carboxymethylcellulose, 14 parts of boric acid, 10 parts of methylbutyrate, 15 parts of benzoyl chloride, N- chlorinations are to methyl
17 parts of benzsulfamide sodium, 16 parts of barium stearate, 13 parts of azodiisobutyronitrile, 16 parts of ferric trichloride, 17 parts of hydrofluoric acid, phosphatase 11 2
Part, 12 parts of Methoxy acetic acid, 11 parts of potassium bichromate, 7 parts of diethanol amine and 7 parts of triethanolamine, the sub- liquid of etching include following
The raw material of parts by weight：16 parts of 13 parts of copper chloride, 8 parts of ammoniacal liquor, 17 parts of ammonium chloride and cobalt chloride.
A kind of preparation method of chlorination copper etchant solution, comprises the following steps：
1) specific steps of etching mother liquor are prepared：
A, take by 14 parts of boric acid, 17 parts of hydrofluoric acid, four groups of acid materials of 2 parts of phosphatase 11 and Methoxy acetic acid 12 part weight
Water than 1: 2 be put into production groove in, then will production groove reclaimed water be heated to 60 DEG C, finally successively by boric acid, hydrofluoric acid, phosphoric acid and
Methoxy acetic acid is added to the water, and is slowly stirred with stirring rod so that during boric acid, hydrofluoric acid, phosphoric acid and Methoxy acetic acid incorporate,
And mutually merge, 50% acid solution is made, it is standby；
B, 16 parts of sodium carboxymethylcellulose, 10 parts of methylbutyrate, 15 parts of benzoyl chloride, N- chlorinations are taken to methylbenzene sulphur
17 parts of acid amides sodium, 16 parts of barium stearate, 13 parts of azodiisobutyronitrile, 16 parts of ferric trichloride, 11 parts of potassium bichromate, diethanol amine 7
Part and 7 parts of triethanolamine be added in 50% acid solution made from specific steps B, then by stirring rod by the material of addition
Material stirs with acid solution, and etching mother liquor is made, standby；
2) specific steps of etching midnight are prepared：
A, add in production groove twice 13 parts of copper chloride, 16 parts of three groups of constituents gross weights of 17 parts of ammonium chloride and cobalt chloride
Water, then at normal temperatures and pressures by copper chloride, ammonium chloride and cobalt chloride deliver to production groove in, by it is soluble in water mutually and mix
Conjunction stirs, and the sub- liquid of etching is made, standby；
B, pH value 8 parts of the ammoniacal liquor of addition of the sub- liquid of etching according to made from specific steps A are adjusted the PH for etching sub- liquid
Value.
3) etching mother liquor is with etching sub- liquid mixed preparing：By step 1) obtained etching mother liquor and step 2) at the time of be made
Chlorination copper etchant solution is made by weight 100: 1 ratio addition mixing in sub- liquid.
Embodiment 3
A kind of chlorination copper etchant solution, is made up of etching mother liquor and the sub- liquid of etching, and the etching mother liquor includes following parts by weight
Raw material：18 parts of sodium carboxymethylcellulose, 12 parts of boric acid, 8 parts of methylbutyrate, 13 parts of benzoyl chloride, N- chlorinations are to methyl
15 parts of benzsulfamide sodium, 14 parts of barium stearate, 11 parts of azodiisobutyronitrile, 14 parts of ferric trichloride, 16 parts of hydrofluoric acid, phosphatase 11 0
Part, 10 parts of Methoxy acetic acid, 9 parts of potassium bichromate, 6 parts of diethanol amine and 6 parts of triethanolamine, the sub- liquid of etching include following heavy
Measure the raw material of part：13 parts of 12 parts of copper chloride, 7 parts of ammoniacal liquor, 15 parts of ammonium chloride and cobalt chloride.
A kind of preparation method of chlorination copper etchant solution, comprises the following steps：
1) specific steps of etching mother liquor are prepared：
A, take by 12 parts of boric acid, 16 parts of hydrofluoric acid, four groups of acid materials of 0 part of phosphatase 11 and Methoxy acetic acid 10 part weight
Water than 1: 2 be put into production groove in, then will production groove reclaimed water be heated to 59 DEG C, finally successively by boric acid, hydrofluoric acid, phosphoric acid and
Methoxy acetic acid is added to the water, and is slowly stirred with stirring rod so that during boric acid, hydrofluoric acid, phosphoric acid and Methoxy acetic acid incorporate,
And mutually merge, 50% acid solution is made, it is standby；
B, 18 parts of sodium carboxymethylcellulose, 8 parts of methylbutyrate, 13 parts of benzoyl chloride, N- chlorinations are taken to methylbenzene sulphur
15 parts of acid amides sodium, 14 parts of barium stearate, 11 parts of azodiisobutyronitrile, 14 parts of ferric trichloride, 9 parts of potassium bichromate, 6 parts of diethanol amine
6 parts are added in 50% acid solution made from specific steps B with triethanolamine, then by stirring rod by the material of addition
Stirred with acid solution, etching mother liquor is made, it is standby；
2) specific steps of etching midnight are prepared：
A, add in production groove twice 12 parts of copper chloride, 13 parts of three groups of constituents gross weights of 15 parts of ammonium chloride and cobalt chloride
Water, then at normal temperatures and pressures by copper chloride, ammonium chloride and cobalt chloride deliver to production groove in, by it is soluble in water mutually and mix
Conjunction stirs, and the sub- liquid of etching is made, standby；
B, pH value 7 parts of the ammoniacal liquor of addition of the sub- liquid of etching according to made from specific steps A are adjusted the PH for etching sub- liquid
Value.
3) etching mother liquor is with etching sub- liquid mixed preparing：By step 1) obtained etching mother liquor and step 2) at the time of be made
Chlorination copper etchant solution is made by weight 100: 1 ratio addition mixing in sub- liquid.
Experimental example
Experimental subjects：Using common etching solution as a control group one, using special etching solution as a control group two, this
The chlorination copper etchant solution of application contrasts the etching situation of three groups of etching solutions as experimental group, and draws best etching solution.
Following table is the correction data table of three groups of experimental subjects
With reference to upper table, three groups of different experimental subjects the data obtaineds are contrasted, as a result show the application chlorination copper etchant solution pair
The etch effect of roller is more preferable.
The technology of the present invention effect major embodiment is in the following areas：By sodium carboxymethylcellulose, boric acid, methylbutyrate, chlorine
Change benzoyl, N- chlorination p-methylphenyl sulphonylamines sodium, barium stearate, azodiisobutyronitrile, ferric trichloride, hydrofluoric acid, phosphoric acid, first
Epoxide acetic acid, potassium bichromate, diethanol amine and triethanolamine and water mix obtained etching mother liquor, by copper chloride, ammoniacal liquor,
The sub- liquid of etching that ammonium chloride and cobalt chloride are mixed to prepare with water, and chlorine is made by weight accessory with the sub- liquid of etching in etching mother liquor
Change copper etchant solution, and the compound method of this kind of chlorination copper etchant solution is simple, and the etching efficiency of etching solution is high, and etching
During the gas environmental pollution that produces it is small, quickly roller can be etched, and the etching precision of roller is high, is difficult
Produce defect.
Certainly, it is the representative instance of the present invention above, in addition, the present invention can also have other a variety of specific implementations
The technical scheme of mode, all use equivalent substitutions or equivalent transformation formation, all falls within the scope of protection of present invention.
Claims (4)
1. a kind of chlorination copper etchant solution, it is characterised in that：By etching mother liquor and etch sub- liquid and be made, the etching mother liquor include with
The raw material of lower parts by weight：16-20 parts of sodium carboxymethylcellulose, 10-14 parts of boric acid, 6-10 parts of methylbutyrate, benzoyl chloride
11-15 parts, 13-17 parts of N- chlorinations p-methylphenyl sulphonylamine sodium, 12-16 parts of barium stearate, 9-13 parts of azodiisobutyronitrile, trichlorine
Change 12-16 parts of iron, 15-17 parts of hydrofluoric acid, 8-12 parts of phosphoric acid, 8-12 parts of Methoxy acetic acid, 7-11 parts of potassium bichromate, diethanol amine
5-7 parts and 5-7 parts of triethanolamine, the sub- liquid of etching include the raw material of following parts by weight：11-13 parts of copper chloride, ammoniacal liquor 6-8
10-16 parts of part, 13-17 parts of ammonium chloride and cobalt chloride.
2. a kind of chlorination copper etchant solution as claimed in claim 1, it is characterised in that：It is made up of etching mother liquor and the sub- liquid of etching,
The etching mother liquor includes the raw material of following parts by weight：20 parts of sodium carboxymethylcellulose, 10 parts of boric acid, 6 parts of methylbutyrate, chlorine
Change 11 parts of benzoyl, 13 parts of N- chlorination p-methylphenyl sulphonylamines sodium, 12 parts of barium stearate, 9 parts of azodiisobutyronitrile, ferric trichloride
5 parts of 12 parts, 15 parts of hydrofluoric acid, 8 parts of phosphoric acid, 8 parts of Methoxy acetic acid, 7 parts of potassium bichromate, 5 parts of diethanol amine and triethanolamine, institute
Stating the sub- liquid of etching includes the raw material of following parts by weight：10 parts of 11 parts of copper chloride, 6 parts of ammoniacal liquor, 13 parts of ammonium chloride and cobalt chloride.
3. a kind of chlorination copper etchant solution as claimed in claim 1, it is characterised in that：It is made up of etching mother liquor and the sub- liquid of etching,
The etching mother liquor includes the raw material of following parts by weight：16 parts of sodium carboxymethylcellulose, 14 parts of boric acid, 10 parts of methylbutyrate,
15 parts of benzoyl chloride, 17 parts of N- chlorination p-methylphenyl sulphonylamines sodium, 16 parts of barium stearate, 13 parts of azodiisobutyronitrile, trichlorine
Change 16 parts of iron, 17 parts of hydrofluoric acid, 2 parts of phosphatase 11,12 parts of Methoxy acetic acid, 11 parts of potassium bichromate, 7 parts of diethanol amine and three ethanol
7 parts of amine, the sub- liquid of etching includes the raw material of following parts by weight：13 parts of copper chloride, 8 parts of ammoniacal liquor, 17 parts of ammonium chloride and cobalt chloride
16 parts.
4. a kind of chlorination copper etchant solution as claimed in claim 1, it is characterised in that：It is made up of etching mother liquor and the sub- liquid of etching,
The etching mother liquor includes the raw material of following parts by weight：18 parts of sodium carboxymethylcellulose, 12 parts of boric acid, 8 parts of methylbutyrate, chlorine
Change 13 parts of benzoyl, 15 parts of N- chlorination p-methylphenyl sulphonylamines sodium, 14 parts of barium stearate, 11 parts of azodiisobutyronitrile, tri-chlorination
14 parts of iron, 16 parts of hydrofluoric acid, 0 part of phosphatase 11,10 parts of Methoxy acetic acid, 9 parts of potassium bichromate, 6 parts of diethanol amine and triethanolamine 6
Part, the sub- liquid of etching includes the raw material of following parts by weight：12 parts of copper chloride, 7 parts of ammoniacal liquor, 15 parts of ammonium chloride and cobalt chloride 13
Part.
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| CN201710212876.6A CN107099799A (en) | 2017-03-31 | 2017-03-31 | A kind of chlorination copper etchant solution and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710212876.6A CN107099799A (en) | 2017-03-31 | 2017-03-31 | A kind of chlorination copper etchant solution and preparation method thereof |
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Citations (4)
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|---|---|---|---|---|
| US4944807A (en) * | 1987-12-01 | 1990-07-31 | Bbc Brown Boveri Ag | Process for chemically stripping a surface-protection layer with a high chromium content from the main body of a component composed of a nickel-based or cobalt-based superalloy |
| CN101033549A (en) * | 2005-03-11 | 2007-09-12 | 关东化学株式会社 | Etching liquid composition |
| CN101445932A (en) * | 2008-12-25 | 2009-06-03 | 绍兴华立电子有限公司 | Etching solution |
| CN103409753A (en) * | 2013-07-23 | 2013-11-27 | 吴江龙硕金属制品有限公司 | Metal etchant and preparation method thereof |
-
2017
- 2017-03-31 CN CN201710212876.6A patent/CN107099799A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4944807A (en) * | 1987-12-01 | 1990-07-31 | Bbc Brown Boveri Ag | Process for chemically stripping a surface-protection layer with a high chromium content from the main body of a component composed of a nickel-based or cobalt-based superalloy |
| CN101033549A (en) * | 2005-03-11 | 2007-09-12 | 关东化学株式会社 | Etching liquid composition |
| CN101445932A (en) * | 2008-12-25 | 2009-06-03 | 绍兴华立电子有限公司 | Etching solution |
| CN103409753A (en) * | 2013-07-23 | 2013-11-27 | 吴江龙硕金属制品有限公司 | Metal etchant and preparation method thereof |
Non-Patent Citations (2)
| Title |
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| 张招贤 黄东 编著: "《涂层钛电极》", 31 May 2014, 冶金工业出版社 * |
| 杨丁 编著: "《金属蚀刻技术》", 31 January 2008, 国防工业出版社 * |
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