CN106997147A - A kind of mask plate, substrate and display device - Google Patents
A kind of mask plate, substrate and display device Download PDFInfo
- Publication number
- CN106997147A CN106997147A CN201710392813.3A CN201710392813A CN106997147A CN 106997147 A CN106997147 A CN 106997147A CN 201710392813 A CN201710392813 A CN 201710392813A CN 106997147 A CN106997147 A CN 106997147A
- Authority
- CN
- China
- Prior art keywords
- mask plate
- display device
- corner
- substrate
- flat board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
- G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The present invention relates to display device preparing technical field, a kind of mask plate, substrate and display device are disclosed, the mask plate is prepared for display device, including flat board, flat board is provided with the one-to-one multiple openings of pixel cell with display device；Wherein, in the corner being each open, rounding off between every two adjacent sides.When being patterned using above-mentioned mask plate cooperation high-res exposure machine, can be with the pattern of more visible, definite reduction mask plate, and rounding off between two adjacent edges of the corner of the open area of obtained pattern, it is not easy to assemble electric charge, be conducive to the cleaning of the charged particle of residual, and then the display device prepared to the mask plate provided using the present invention has the effect for improving image retention.
Description
Technical field
The present invention relates to display device preparing technical field, more particularly to a kind of mask plate, substrate and display device.
Background technology
As shown in figure 1, the opening design of black matrix mask plate in the prior art, its corner that is open has different 1-10 μm not
Deng sharp chamfering, the pattern openings corner exposed in the past under the exposure machine compared with low-res is rounder and more smooth, and with
The resolution of exposure machine is improved in the prior art, makes the pattern corner exposed clearly demarcated, although what the exposure machine of high-res was exposed
As a result the pattern of black matrix mask plate is more reduced, but at the chamfering in pattern openings corner that exposes of high-res exposure machine
Radius of curvature is smaller, and structure interval is larger, and electric charge is easily assembled, and such corner easily remains charged particle, makes by height parsing
The glass that degree exposure machine is produced is not easy to clean up, and then the display device image retention being thus made can be caused bad.
The content of the invention
The invention provides a kind of mask plate, substrate and display device, high-res are coordinated to expose using the mask plate
, can be with the pattern of more visible reduction mask plate, and two phases of corner of the open area of obtained pattern when machine is patterned
Rounding off between adjacent side, it is not easy to assemble electric charge, is conducive to the cleaning of the charged particle of residual, and then to being carried using the present invention
Display device prepared by the mask plate of confession has the effect for improving image retention.
To reach above-mentioned purpose, the present invention provides following technical scheme：
A kind of mask plate, is prepared for display device, including flat board, and the flat board is provided with the pixel list with display device
First one-to-one multiple openings；Wherein, in the corner of each opening, rounding off between every two adjacent sides.
Above-mentioned mask plate, is prepared for display device, and mask plate includes flat board, and flat board is provided with the pixel with display device
In the one-to-one multiple openings of unit, the corner being each open, rounding off between every two adjacent sides, when using above-mentioned
When the exposure machine of mask plate cooperation high-res is patterned, the pattern of mask plate can be preferably reduced, and obtained pattern
Open area two adjacent edges of corner between rounding off, then make the turning radius of curvature between adjacent both sides larger,
Structural elements gap is small, it is not easy to assemble electric charge, is conducive to the cleaning of the charged particle of residual.
Therefore, can be with more visible, definite reduction when being patterned using above-mentioned mask plate cooperation high-res exposure machine
Rounding off between the pattern of mask plate, and two adjacent edges of corner of the open area of obtained pattern, it is not easy to assemble
Electric charge, is conducive to the cleaning of the charged particle of residual, and then the display device prepared to the mask plate provided using the present invention is had
Improve the effect of image retention.
Further, in multiple openings that the flat board is provided with, the corner in each described opening, per adjacent
The junction on two sides forms smooth curve type structure.
Further, the corner of each opening, the junction per two adjacent sides forms arcuate structure.
On in the patterning step prepared present invention also offers a kind of substrate, including substrate and black matrix, the black matrix
State any one mask plate described in technical scheme and be exposed processing.
In addition, present invention also offers a kind of display device, including the substrate described in above-mentioned technical proposal.
Brief description of the drawings
Fig. 1 is the part-structure schematic diagram of black matrix mask plate in the prior art；
Fig. 2 is the part-structure schematic diagram of mask plate provided in an embodiment of the present invention；
Fig. 3 is the partial enlarged drawing at I in Fig. 2；
Fig. 4 is the partial enlarged drawing at II in Fig. 2.
Icon：1- flat boards；2- is open.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 2 is refer to, the embodiments of the invention provide a kind of mask plate, is prepared for display device, including flat board 1, put down
Plate 1 is provided with the one-to-one multiple openings 2 of pixel cell with display device；Wherein, in the corner of each opening 2, per phase
Rounding off between two adjacent sides.
Above-mentioned mask plate, is prepared for display device, and mask plate includes flat board 1, and flat board 1 is provided with the picture with display device
In the one-to-one multiple openings 2 of plain unit, the corner of each opening 2, per two adjacent sides between rounding off, when using
When the exposure machine of above-mentioned mask plate cooperation high-res is patterned, the pattern of mask plate can be preferably reduced, and obtain
Rounding off between two adjacent edges of corner of the open area of pattern, then make turning radius of curvature between adjacent both sides compared with
Greatly, structural elements gap is small, it is not easy to assemble electric charge, is conducive to the cleaning of the charged particle of residual.
Therefore, can be with more visible, definite reduction when being patterned using above-mentioned mask plate cooperation high-res exposure machine
Rounding off between the pattern of mask plate, and two adjacent edges of corner of the open area of obtained pattern, it is not easy to assemble
Electric charge, is conducive to the cleaning of the charged particle of residual, and then the display to being prepared using mask plate provided in an embodiment of the present invention
Device has the effect for improving image retention.
As shown in Figure 3 and Figure 4, in above-mentioned mask plate, in multiple openings 2 that flat board 1 is provided with, in each opening 2
Corner, the junction per two adjacent sides forms smooth curve type structure.Be open junction shape between 2 corner adjacent edges
Into smooth curve type structure, the effect of rounding off between two adjacent sides of the corner of opening 2, and structure letter can be reached
It is single, it is easy to process.
Specifically, the corner of each opening 2, the junction per two adjacent sides forms arcuate structure.Corner
The junction on two neighboring side forms arcuate structure, processes simple and convenient, it is easy to manufacture.
The embodiment of the present invention is additionally provided in a kind of substrate, including substrate and black matrix, patterning step prepared by black matrix
Any one mask plate in above-mentioned technical proposal is exposed processing.The opening corner phase of the black matrix pattern of aforesaid substrate
Rounding off between adjacent both sides, the charged particle for being conducive to cleaning to remain, and then to having improvement using the display device of the substrate
The effect of image retention.
In addition, the embodiment of the present invention additionally provides a kind of display device, including the substrate in above-mentioned technical proposal.
Obviously, those skilled in the art can carry out various changes and modification without departing from this hair to the embodiment of the present invention
Bright spirit and scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies
Within the scope of, then the present invention is also intended to comprising including these changes and modification.
Claims (5)
1. a kind of mask plate, is prepared for display device, it is characterised in that including flat board, the flat board is provided with to be filled with display
The one-to-one multiple openings of pixel cell put；Wherein, in the corner of each opening, circle between every two adjacent sides
Slip over and cross.
2. mask plate according to claim 1, it is characterised in that in multiple openings that the flat board is provided with, each
Corner in the opening, the junction per two adjacent sides forms smooth curve type structure.
3. mask plate according to claim 2, it is characterised in that the corner of each opening, per adjacent two
The junction on individual side forms arcuate structure.
4. a kind of substrate, including substrate and black matrix, it is characterised in that including：Profit in patterning step prepared by the black matrix
Processing is exposed with the mask plate described in claim any one of 1-3.
5. a kind of display device, it is characterised in that including the substrate described in claim 4.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710392813.3A CN106997147A (en) | 2017-05-27 | 2017-05-27 | A kind of mask plate, substrate and display device |
| PCT/CN2018/080962 WO2018219032A1 (en) | 2017-05-27 | 2018-03-28 | Mask plate, substrate and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710392813.3A CN106997147A (en) | 2017-05-27 | 2017-05-27 | A kind of mask plate, substrate and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106997147A true CN106997147A (en) | 2017-08-01 |
Family
ID=59436219
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710392813.3A Pending CN106997147A (en) | 2017-05-27 | 2017-05-27 | A kind of mask plate, substrate and display device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN106997147A (en) |
| WO (1) | WO2018219032A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018219032A1 (en) * | 2017-05-27 | 2018-12-06 | 京东方科技集团股份有限公司 | Mask plate, substrate and display device |
| CN109725486A (en) * | 2019-01-16 | 2019-05-07 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, the manufacturing method of display base plate |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5966677A (en) * | 1997-02-28 | 1999-10-12 | Fiekowsky; Peter J. | High accuracy particle dimension measurement system |
| JP2004125690A (en) * | 2002-10-04 | 2004-04-22 | Dainippon Printing Co Ltd | Method for automatically measuring roundness and measurement apparatus for mask pattern quality |
| CN1688933A (en) * | 2003-02-28 | 2005-10-26 | 富士通株式会社 | Photomask and its production method, and pattern forming method |
| CN101823180A (en) * | 2009-03-06 | 2010-09-08 | 索尼公司 | Light processing method and mask |
| US20110269060A1 (en) * | 2010-04-28 | 2011-11-03 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5926362Y2 (en) * | 1976-11-30 | 1984-07-31 | 大日本スクリ−ン製造株式会社 | Exposure aperture in image scanning recording device |
| JPS58200238A (en) * | 1982-05-19 | 1983-11-21 | Toshiba Corp | Photomask |
| US6368516B1 (en) * | 1999-06-24 | 2002-04-09 | Infineon Technologies North America Corp. | Semiconductor manufacturing methods |
| JP2003307750A (en) * | 2002-02-12 | 2003-10-31 | Seiko Epson Corp | Thin-film semiconductor device, electro-optical device, method for manufacturing the same, and reticle |
| JP2008209636A (en) * | 2007-02-26 | 2008-09-11 | Epson Imaging Devices Corp | Exposure mask for manufacturing liquid crystal display device, and method for manufacturing liquid crystal display device |
| CN202886789U (en) * | 2012-11-19 | 2013-04-17 | 京东方科技集团股份有限公司 | Mask plate, color film substrate and liquid crystal display device |
| CN106997147A (en) * | 2017-05-27 | 2017-08-01 | 京东方科技集团股份有限公司 | A kind of mask plate, substrate and display device |
-
2017
- 2017-05-27 CN CN201710392813.3A patent/CN106997147A/en active Pending
-
2018
- 2018-03-28 WO PCT/CN2018/080962 patent/WO2018219032A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5966677A (en) * | 1997-02-28 | 1999-10-12 | Fiekowsky; Peter J. | High accuracy particle dimension measurement system |
| JP2004125690A (en) * | 2002-10-04 | 2004-04-22 | Dainippon Printing Co Ltd | Method for automatically measuring roundness and measurement apparatus for mask pattern quality |
| CN1688933A (en) * | 2003-02-28 | 2005-10-26 | 富士通株式会社 | Photomask and its production method, and pattern forming method |
| CN101823180A (en) * | 2009-03-06 | 2010-09-08 | 索尼公司 | Light processing method and mask |
| US20110269060A1 (en) * | 2010-04-28 | 2011-11-03 | Semiconductor Energy Laboratory Co., Ltd. | Photomask |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018219032A1 (en) * | 2017-05-27 | 2018-12-06 | 京东方科技集团股份有限公司 | Mask plate, substrate and display device |
| CN109725486A (en) * | 2019-01-16 | 2019-05-07 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, the manufacturing method of display base plate |
| CN109725486B (en) * | 2019-01-16 | 2022-08-16 | 京东方科技集团股份有限公司 | Mask plate, manufacturing method thereof and manufacturing method of display substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2018219032A1 (en) | 2018-12-06 |
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170801 |
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| RJ01 | Rejection of invention patent application after publication |