CN106959590A - A kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process - Google Patents
A kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process Download PDFInfo
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- CN106959590A CN106959590A CN201710230595.3A CN201710230595A CN106959590A CN 106959590 A CN106959590 A CN 106959590A CN 201710230595 A CN201710230595 A CN 201710230595A CN 106959590 A CN106959590 A CN 106959590A
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- Prior art keywords
- photoresistance
- processing procedure
- gold
- litho machine
- parts
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention relates to field of photoelectric technology, more particularly to a kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process.A kind of positive photoresistance renovation process of gold-tinted processing procedure litho machine parts of the present invention, gold-tinted processing procedure litho machine parts are born with photoresistance progress cleaning removal using the intimate nontoxic ketone organic solvent of conventional small toxicity and amide solvent compounding to use to regenerate, ketone organic solvent and amide solvent are compounded according to scientific and reasonable ratio, substantially increase the dissolving power and evaporation rate of complex solvent, cleaning performance is good, cleaning fluid low cost, it is environmentally friendly, acid amides and ketone organic solvent are respectively provided with reproducibility simultaneously, it can be very good the corrosion and aging of suppression component surface, protection parts do not result in its corrosion and aging well, ensure the regeneration using effect of parts, influence will not be produced on the use of parts；Photoresistance regeneration times are born up to 100 times using soaking and washing liquid and renovation process the regeneration gold-tinted processing procedure litho machine parts of the present invention.
Description
Technical field
The present invention relates to field of photoelectric technology, more particularly to a kind of gold-tinted processing procedure litho machine parts bear photoresistance regeneration side
Method.
Background technology
Lithographic techniques are first to be transferred to the pattern on light shield on PR, then the portion for being irradiated to PR light with solvent soaking
Divide and dissolved or retained, form the photoresistance figure identical or complementary with light shield；The technology that gold-tinted is used is lithographic techniques, yellow
Light processing procedure refers to that the ambient lighting light source of micro-photographing process uses gold-tinted, and gold-tinted processing procedure circuit precision level is high；Litho machine
(Mask Aligner) also known as：Mask registration exposure machine, exposure system, etching system etc.；Light cup is the core component of litho machine,
After photoetching development, occur defect after photoetching development needs photoetching again after photoresist layer cleaning is removed extremely；Photoresistance point is just
Photoresistance and negative photoresistance, are mostly born in the positive photoresistance of technical field of lithography in the highest flight using basic solvent in the prior art
The removal of photoresistance, it is bad that the cleaning agent of this alkali soluble agent prescription has a cleaning performance, while parts can be caused aging and
Corrosion；Or special cleaning equipment is used, production cost is high.Therefore, be badly in need of it is a kind of to solidification on litho machine light cup or
The negative photoresistance of liquid carries out cleaning removal, so that light cup can regenerate the renovation process used, can greatly reduce makes
With cost, the service life and using effect of litho machine are improved；Cleaned using organic solvent, small toxicity is almost nontoxic,
Environmentally friendly, low cost, cleaning performance is preferable, while aging and corrosion will not be caused to light cup；Cleaning method is simple, significantly
Improve production efficiency.
The content of the invention
The purpose of invention：In order to overcome the shortcomings of background technology, the invention discloses a kind of gold-tinted processing procedure litho machine zero
Part bears photoresistance renovation process, can greatly reduce use cost, improve the service life and using effect of litho machine；Negative light
Resistance processing procedure uses mark-8, is cleaned using ketone organic solvent and amide solvent compounding, small toxicity is almost nontoxic, to ring
Border is friendly, low cost, and cleaning performance is preferable, while aging and corrosion will not be caused to light cup；Cleaning method is simple.
Technical scheme：In order to realize the above object bearing photoresistance the invention discloses a kind of gold-tinted processing procedure litho machine parts
Renovation process, comprises the following steps：
1) selection and preparation of soaking and washing liquid：The selection of soaking and washing liquid is amide solvent and organic solvent of ketone, institute
The amide solvent and the compounding volume ratio of organic solvent of ketone stated are 3:1；
2) embathe：By step 1) the soaking and washing liquid for preparing pours into leaching cylinder, then the parts of regeneration to be cleaned soaked
Enter into soaking and washing liquid, dissolve the negative photoresistance of most solidification or liquid；
3) rinse：Parts after soaking well are subjected to the clean each side of parts of rinsing removing with solvent, the residual at angle is born
Photoresistance and soaking and washing liquid, are used so as to the regeneration of parts；
4) wash：Parts after rinsing are washed with ultra-pure water and removes the soaking and washing liquid of parts residual and rinses molten
Agent；
5) dry：Parts after washing are placed in ultra-clean drying equipment and are dried.
Separately, the step 1) in ketone organic solvent be specially 1-METHYLPYRROLIDONE, 1,3- dimethyl -2- imidazolidines
One kind of ketone.
Separately have, the step 1) in amide solvent be DMF, isopropanol amide, N, N '-dimethyl
One kind in lactamide.
Also, the step 2) in soak time be 1.5h-2.5h, preferably 2h.The selection of soak time is by long-term
Experiment, the time is too short, and negative photoresist layer dissolving is inadequate after immersion, also remains substantial amounts of negative photoresist layer；After soak time is more than 2h
The solubility of negative photoresist layer reaches minimum, and rate of dissolution is low；The oversize parts rinsing being also unfavorable for below of soak time and water
Wash process；Consider, it is most suitable using 2h.
Further, the step 3) in the solvent of rinsing be acetone solvent, rinsing time is 8-15min, is preferably
10min.The strong solvent that the rate of volatilization of acetone is exceedingly fast, very routine and low cost, substantially increase rinse capacity, rinsing effect
Really；Rinsing time is short, and production efficiency is high；Save time cost.
Again, the step 4) in ultra-pure water washing time be 25-35min, preferably 30min.The selection of ultra-pure water ensures
Other impurities will not be brought into, and the globule will not be left in component surface, using effect below is not interfered with；Washing time
Selection whether thoroughly determine washing parts, the time, too short washing was incomplete, still suffered from raffinate residual；Washing time is too
It is long, it is unfavorable for controlling production cost.
Further, described step 5) in drying temperature be 55-65 DEG C, the time is 1.5h-2.5h, and preferable temperature is 60 DEG C,
Time is 2h.Temperature is too low, and the time, the too short dehydration that can all cause component surface was not enough, while the production cycle is also extended,
Production efficiency is reduced, is unfavorable for the Production requirement of enterprise；Temperature is too high easily to cause the decomposition and aging of component surface, when
Between the oversize aging for being also easy to cause parts.
In addition, the equipment that the processing procedure of the negative photoresistance of gold-tinted processing procedure litho machine parts is used in described renovation process is TEL
Clean Track mark-8, producer：TEL (Tokyo Electron Limited) model：Clean Track mark-8.
Above-mentioned technical proposal can be seen that the present invention and have the advantages that：A kind of gold-tinted processing procedure of the present invention
The positive photoresistance renovation process of litho machine parts, compared with prior art, with advantages below：Small toxicity using routine is almost nontoxic
Ketone organic solvent and amide solvent compounding, using it is similar mix principle to gold-tinted processing procedure litho machine parts bear photoresistance carry out
Cleaning is removed and used to regenerate, and ketone organic solvent and amide solvent are compounded according to scientific and reasonable ratio, are greatly improved
The dissolving power and evaporation rate of complex solvent, cleaning performance are good, and cleaning fluid low cost is environmentally friendly, while acid amides and ketone
Organic solvent is respectively provided with reproducibility, can be very good to suppress the corrosion and aging of component surface, protects parts not well
It can be caused to corrode and aging, it is ensured that the regeneration using effect of parts, influence will not be produced on the use of parts；Use
Soaking and washing liquid and renovation process the regeneration gold-tinted processing procedure litho machine parts of the present invention bear photoresistance regeneration times up to 100 times.
Embodiment
With reference to table 1, the specific embodiment of the invention is described in detail.
Table 1 bears each step conditional parameter of photoresistance renovation process for a kind of embodiment 1-6 gold-tinted processing procedure litho machine parts.
Each step reagent and Parameter Conditions described in the embodiment of table 1
Gold-tinted processing procedure litho machine parts of the present invention bear photoresistance renovation process, and optimal soak time is 2h, rinsing
Liquid is acetone, and optimal rinsing time is 10min, and optimal washing time is 30min, and optimal ultra-clean drying temperature is 60 DEG C, time
For 2h.
A kind of gold-tinted processing procedure litho machine parts described in embodiment of the present invention 1-7 bear photoresistance renovation process, including following step
Suddenly：
1) selection and preparation of soaking and washing liquid：The selection of soaking and washing liquid is amide solvent and organic solvent of ketone, institute
The amide solvent and the compounding volume ratio of organic solvent of ketone stated are 3:1；
2) embathe：By step 1) the soaking and washing liquid for preparing pours into leaching cylinder, then the parts of regeneration to be cleaned soaked
It is less than in soaking and washing liquid, dissolves the negative photoresistance of most solidification or liquid；
3) rinse：By soak it is good after parts is carried out with acetone solvent the clean each side of parts of rinsing removing, angle it is residual
Negative photoresistance and soaking and washing liquid are stayed, is used so as to the regeneration of parts；
4) wash：Parts after rinsing are washed with ultra-pure water and removes the soaking and washing liquid of parts residual and rinses molten
Agent；
5) dry：The parts washed after 30min are placed in ultra-clean drying equipment and are dried.
The equipment that the processing procedure of the negative photoresistance of gold-tinted processing procedure litho machine parts is used in described renovation process is TEL Clean
Track mark-8, producer：TEL (Tokyo Electron Limited) model：Clean Track mark-8.
The above is only the preferred embodiment of the present invention, it should be noted that for those skilled in the art
For, under the premise without departing from the principles of the invention, some improvement can also be made, these improvement also should be regarded as the guarantor of the present invention
Protect scope.
Claims (8)
1. a kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process, it is characterised in that：Comprise the following steps：
1) selection and preparation of soaking and washing liquid：The selection of soaking and washing liquid be amide solvent and organic solvent of ketone, it is described
The compounding volume ratio of amide solvent and organic solvent of ketone is 3: 1；
2) embathe：By step 1) the soaking and washing liquid for preparing pours into leaching cylinder, then the parts of regeneration to be cleaned is immersed into
In soaking and washing liquid, the negative photoresistance of most solidification or liquid is dissolved；
3) rinse：Parts after soaking well are subjected to the negative photoresistance of residual that clean each side of parts, angle are removed in rinsing with solvent
With soaking and washing liquid, used so as to the regeneration of parts；
4) wash：Parts after rinsing are washed with ultra-pure water and remove soaking and washing liquid and rinse solvent that parts are remained；
5) dry：Parts after washing are placed in ultra-clean drying equipment and are dried.
2. a kind of gold-tinted processing procedure litho machine parts according to claim 1 bear photoresistance renovation process, it is characterised in that institute
State step 1）In ketone organic solvent be specially 1-METHYLPYRROLIDONE, one kind of 1,3- dimethyl -2- imidazolidinones.
3. a kind of gold-tinted processing procedure litho machine parts according to claim 1 bear photoresistance renovation process, it is characterised in that institute
State step 1）In amide solvent be N,N-dimethylformamide, isopropanol amide, N, one kind in N '-dimethyl lactamide.
4. a kind of gold-tinted processing procedure litho machine parts according to claim any one of 1-3 bear photoresistance renovation process, it is special
Levy and be, the step 2）In soak time be 2h.
5. a kind of gold-tinted processing procedure litho machine parts according to claim any one of 1-3 bear photoresistance renovation process, it is special
Levy and be, the step 3）The solvent of middle rinsing is acetone solvent, and rinsing time is 10min.
6. a kind of gold-tinted processing procedure litho machine parts according to claim any one of 1-3 bear photoresistance renovation process, it is special
Levy and be, the step 4）Middle ultra-pure water washing time is 30min.
7. a kind of gold-tinted processing procedure litho machine parts according to claim any one of 1-3 bear photoresistance renovation process, it is special
Levy and be, described step 5）Middle drying temperature is 60 DEG C, and the time is 2h.
8. a kind of gold-tinted processing procedure litho machine parts as described in claim any one of 1-3 bear the negative light in photoresistance renovation process
Resistance, it is characterised in that the equipment that processing procedure is used is Clean Track mark-8.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710230595.3A CN106959590A (en) | 2017-04-11 | 2017-04-11 | A kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process |
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| CN201710230595.3A CN106959590A (en) | 2017-04-11 | 2017-04-11 | A kind of gold-tinted processing procedure litho machine parts bear photoresistance renovation process |
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Citations (6)
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|---|---|---|---|---|
| US6265309B1 (en) * | 1998-05-14 | 2001-07-24 | Mitsubishi Gas Chemicals Co., Inc. | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same |
| CN1479780A (en) * | 2000-12-07 | 2004-03-03 | ��ʲ | Method for cleaning etcher parts |
| CN1488740A (en) * | 2002-09-09 | 2004-04-14 | ������ѧ��ʽ���� | Cleaning composition |
| CN101154558A (en) * | 2006-09-30 | 2008-04-02 | 中芯国际集成电路制造(上海)有限公司 | Method for cleaning etching equipment component |
| CN103336412A (en) * | 2013-07-03 | 2013-10-02 | 北京科华微电子材料有限公司 | Novel photoresist stripper and application technology thereof |
| CN104024394A (en) * | 2012-11-21 | 2014-09-03 | 戴纳洛伊有限责任公司 | Process And Composition For Removing Substances From Substrates |
-
2017
- 2017-04-11 CN CN201710230595.3A patent/CN106959590A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6265309B1 (en) * | 1998-05-14 | 2001-07-24 | Mitsubishi Gas Chemicals Co., Inc. | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same |
| CN1479780A (en) * | 2000-12-07 | 2004-03-03 | ��ʲ | Method for cleaning etcher parts |
| CN1488740A (en) * | 2002-09-09 | 2004-04-14 | ������ѧ��ʽ���� | Cleaning composition |
| CN101154558A (en) * | 2006-09-30 | 2008-04-02 | 中芯国际集成电路制造(上海)有限公司 | Method for cleaning etching equipment component |
| CN104024394A (en) * | 2012-11-21 | 2014-09-03 | 戴纳洛伊有限责任公司 | Process And Composition For Removing Substances From Substrates |
| CN103336412A (en) * | 2013-07-03 | 2013-10-02 | 北京科华微电子材料有限公司 | Novel photoresist stripper and application technology thereof |
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Application publication date: 20170718 |
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