CN106931890A - The precision measurement system and its measuring method of Micro and nano manipulation platform displacement and the anglec of rotation - Google Patents

The precision measurement system and its measuring method of Micro and nano manipulation platform displacement and the anglec of rotation Download PDF

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Publication number
CN106931890A
CN106931890A CN201710243559.0A CN201710243559A CN106931890A CN 106931890 A CN106931890 A CN 106931890A CN 201710243559 A CN201710243559 A CN 201710243559A CN 106931890 A CN106931890 A CN 106931890A
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right angle
laser interferometer
platform
displacement
optic portion
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CN106931890B (en
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张蓓
刘雨
高枫
赵子琪
闫鹏
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Beihang University
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Beihang University
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes

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  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, the precision measurement system of a kind of Micro and nano manipulation platform displacement and the anglec of rotation is disclosed, Micro and nano manipulation platform includes platform base and displacement platform, and the measuring system includes：First laser interferometer and second laser interferometer on first axle, and the 3rd laser interferometer in the second axis vertical with first axle；And be located on displacement platform and be configured to criss-cross optical module, the optical module includes the first right angle optic portion, so that the incident ray of first laser interferometer transmitting is parallel with emergent ray, second right angle optic portion, so that the transmitting of second laser interferometer incident ray is parallel with emergent ray and the 3rd right angle optic portion so that the incident ray that the 3rd laser interferometer is launched is parallel with emergent ray.Present invention also offers a kind of Micro and nano manipulation platform displacement and the measuring method of the anglec of rotation.The measuring system and its measuring method that the present invention is provided can realize the multivariant measurement in space and certainty of measurement is high.

Description

The precision measurement system and its measuring method of Micro and nano manipulation platform displacement and the anglec of rotation
Technical field
The present invention relates to the technical field of laser detection of Micro and nano manipulation platform, more particularly to a kind of Micro and nano manipulation platform position Shifting and the precision measurement system and its measuring method of the anglec of rotation.
Background technology
With the development and application of Micro and nano manipulation technology, multiple degrees of freedom especially realizes that the Micro and nano manipulation of rotary freedom is put down Platform is increasingly paid close attention to, and angular displacement and the accurate measurement of displacement of the lines are the key factors for influenceing its development.
Laser interferometer because high resolution, noncontact, it is affected by environment it is small, be quick on the draw the advantages of be widely used in it is various In precision measurement system.Laser interferometer is to carry out displacement measurement according to the interference between reference beam and measuring beam, if When twice light beam optical path difference is not changed in, detector can find the letter of stabilization between property mutually long and the two poles of the earth of destructive interference Number；If optical path difference is changed, detector can be in change in optical path length each time, between property mutually long and the two poles of the earth of destructive interference Variable signal is found, these changes can be calculated and be used for measuring the change of divergence between two light paths.The laser that presently, there are Interferometer can only often survey single translational motion or independent measurement angle, it is impossible to while measure angle peace move, when there is light path During difference change, laser interferometer cannot judge that this change is to be produced by translational motion or rotated by Micro and nano manipulation platform to produce , therefore cause the precision measurement system of Micro and nano manipulation platform displacement and the anglec of rotation cannot to be measured to its angular displacement.
The content of the invention
(1) technical problem to be solved
It is an object of the present invention to provide a kind of Micro and nano manipulation platform displacement and the precision measurement system of the anglec of rotation, the survey Amount system can be done when the i.e. existing translational motion of the non-rotary motion for centering has rotary motion again to flat in Micro and nano manipulation platform Shifting movement and angular displacement decouple and measured simultaneously, and certainty of measurement is high, simple structure.
It is a further object to provide a kind of Micro and nano manipulation platform displacement and the measuring method of the anglec of rotation.
(2) technical scheme
In order to solve the above-mentioned technical problem, surveyed the invention provides a kind of Micro and nano manipulation platform displacement and the accurate of the anglec of rotation Amount system, the Micro and nano manipulation platform includes platform base and the displacement platform on the platform base, wherein, bag Include：
First laser interferometer and second laser interferometer on first axle, the launch hole of first laser interferometer Central axis and second laser interferometer launch hole central axis it is conllinear, positioned at the second axis vertical with first axle On the 3rd laser interferometer, the 3rd laser interferometer and first laser interferometer, second laser interferometer are located at same water In plane, and the central axis of the launch hole of the 3rd laser interferometer hangs down with the central axis of the launch hole of first laser interferometer Directly；And
It is located on displacement platform and is configured to criss-cross optical module, the optical module includes and first laser interferometer pair The the first right angle optic portion answered, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first The incident ray of laser interferometer transmitting is straight through the first right angle minute surface of the first right angle optic portion and second with the incident ray Emergent ray after the mirror-reflection of angle is parallel, and optical module also includes the second right angle corresponding with second laser interferometer eyeglass portion Point, the second right angle optic portion include the first right angle minute surface and the second right angle minute surface, and second laser interferometer transmitting enter Light is penetrated with the incident ray through the outgoing after the first right angle minute surface and the second right angle mirror-reflection of the second right angle optic portion Light ray parallel；Optical module also includes the 3rd right angle optic portion corresponding with the 3rd laser interferometer, the 3rd right angle eyeglass Part includes the first right angle minute surface and the second right angle minute surface, and the incident ray and the incident ray that the 3rd laser interferometer is launched It is parallel through the emergent ray after the first right angle minute surface and the second right angle mirror-reflection of the 3rd right angle optic portion.
Wherein, optical module includes the optical module base being arranged on displacement platform, is set on optical module base Criss-cross four draw-in grooves are configured to, sheet glass is provided with each draw-in groove, wherein, near first laser interferometer Two sheet glass form the first right angle optic portion, and two sheet glass near second laser interferometer form the second right angle eyeglass Part, the 3rd right angle optic portion is formed near two sheet glass of the 3rd laser interferometer, and near the 3rd laser interferometer The two sides of two sheet glass be coated with reflective membrane, away from the 3rd laser interferometer and near the glass of first laser interferometer Piece is coated with reflective membrane towards the one side of first laser interferometer, away from the 3rd laser interferometer and near second laser interferometer Sheet glass be coated with reflective membrane towards the one side of second laser interferometer.
Present invention also offers a kind of Micro and nano manipulation platform displacement and the measuring method of the anglec of rotation, it includes：
S1：By the Kinematic Decomposition of displacement platform into along the translational motion of first axle, the translational motion of second axis and around The rotary motion of Platform center point, if displacement platform is a along the translation distance of second axis1, along the translation distance of first axle It is a2, and around Platform center point the anglec of rotation be θ；
S2：The first optical path difference Y on first axle is measured by first laser interferometer11；Measured by second laser interferometer The second optical path difference Y on first axle22；The optical path difference X in second axis is measured by the 3rd laser interferometer11；
S3：First laser interferometer is calculated because displacement platform is received along first axle translational motion by below equation The optical path difference Y for arriving1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer2And edge The translation distance a of first axle2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:It is located in the rotary motion of Platform center point, the first of displacement platform rotation preceding first right angle optic portion First reflection of the first right angle minute surface of the first right angle optic portion after first pip and the displacement platform rotation of right angle minute surface The distance between point is m, the second pip of the second right angle minute surface of displacement platform rotation preceding first right angle optic portion and position It is n to move the distance between second pip of the second right angle minute surface of the first right angle optic portion after platform rotates, then make α=m/ N, and known L0For displacement platform does not move the distance between incident ray and emergent ray of preceding first right angle optic portion, then The anglec of rotation θ of displacement platform is calculated by following formula：
S5：Displacement platform is calculated along the translation distance a in second axis by following formula1：
X11=X1+X2,
X1=2a1,
In formula, X1For the optical path difference that the 3rd laser interferometer is received by displacement platform along first axle translational motion；X2For The optical path difference that 3rd laser interferometer is received by displacement platform around Platform center point rotary motion, X2=Y2。
(3) beneficial effect
Micro and nano manipulation platform displacement and the precision measurement system of the anglec of rotation that the present invention is provided pass through on first axle two Individual laser interferometer can realize the displacement measurement in first axle direction, and can indirectly calculate the rotation of Micro and nano manipulation platform Gyration, by the 3rd laser interferometer in the second axis vertical with first axle, realizes the displacement in second axis direction Measurement, therefore the measuring system can realize first axle, the displacement of second axis both direction and the anglec of rotation three certainly By the measurement spent, the limitation of existing detection device is overcome well, meet space multivariant linear displacement and angular displacement Real-time measurement feedback.Additionally, the simple in measurement system structure, certainty of measurement are high.
Brief description of the drawings
Fig. 1 is the structural representation of the precision measurement system according to a kind of Micro and nano manipulation platform displacement of the invention and the anglec of rotation Figure；
Fig. 2 is a kind of Micro and nano manipulation platform displacement and the top view of the precision measurement system of the anglec of rotation in Fig. 1；
Fig. 3 is a structural representation for preferred embodiment of the optical module in Fig. 1；
Fig. 4 is the schematic diagram before and after the displacement platform motion in Fig. 1；
Fig. 5 is the Kinematic Decomposition schematic diagram of the displacement platform in Fig. 4, and wherein Fig. 5 upper lefts are the knot before displacement platform motion Structure schematic diagram；Fig. 5 upper rights are the schematic diagram that the displacement platform after decomposing is translated along X-axis；Fig. 5 bottom rights are the displacement platform after decomposing Along the schematic diagram that Y-axis is translated；And Fig. 5 lower-lefts are the schematic diagram that the displacement platform after decomposing rotates around displacement platform central point；
Fig. 6 is schematic diagram of the displacement platform shown in Fig. 5 upper rights along incident ray and emergent ray before and after X-axis translation；
Fig. 7 is schematic diagram of the displacement platform shown in Fig. 5 bottom rights along incident ray and emergent ray before and after Y-axis translation；
Fig. 8 is showing for incident ray and emergent ray of the displacement platform shown in Fig. 5 lower-lefts before and after the rotation of Platform center point It is intended to.
In figure, 1：First laser interferometer；2：Second laser interferometer；3：3rd laser interferometer；4：Displacement platform；5： Platform base；6：Optical module；601：Optical module base；602：Sheet glass；603：Fixed support；604：Travel(l)ing rest； 605：Bolt.
Specific embodiment
With reference to the accompanying drawings and examples, specific embodiment of the invention is described in further detail.Following instance For illustrating the present invention, but it is not limited to the scope of the present invention.
In the description of the invention, it is to be understood that term " " center ", " longitudinal direction ", " transverse direction ", " length ", " width ", " thickness ", " on ", D score, "front", "rear", "left", "right", " vertical ", " level ", " top ", " bottom " " interior ", " outward ", " up time The orientation or position relationship of the instruction such as pin ", " counterclockwise ", " axial direction ", " radial direction ", " circumference ", " X-axis " " Y-axis " are based on accompanying drawing Shown orientation or position relationship, are for only for ease of and describe of the invention and simplify description, signified rather than instruction or hint Device or element must have specific orientation, with specific azimuth configuration and operation, therefore it is not intended that to of the invention Limitation.
Additionally, term " first ", " second " are only used for describing purpose, and it is not intended that indicating or implying relative importance Or the implicit quantity for indicating indicated technical characteristic.Thus, define " first ", the feature of " second " can express or Implicitly include at least one this feature.In the description of the invention, " multiple " is meant that at least two, such as two, three It is individual etc., unless otherwise expressly limited specifically.
In the present invention, unless otherwise clearly defined and limited, term " installation ", " connected ", " connection ", " fixation " etc. Term should be interpreted broadly, for example, it may be fixedly connected, or be detachably connected, or integrally；Can be that machinery connects Connect, or electrically connect or can communicate each other；Can be joined directly together, it is also possible to be indirectly connected to by intermediary, can be with Be two element internals connection or two interaction relationships of element, unless otherwise clearly restriction.For this area For those of ordinary skill, above-mentioned term concrete meaning in the present invention can be as the case may be understood.
Figures 1 and 2 show that the one of the measuring system of a kind of Micro and nano manipulation platform displacement of the invention and the anglec of rotation Individual preferred embodiment.As shown in figure 1, Micro and nano manipulation platform includes platform base 5 and the displacement platform on platform base 5 4, the measuring system includes：First laser interferometer 1 and second laser interferometer 2 on first axle (that is, Y-axis), the The central axis of the launch hole of one laser interferometer 1 is conllinear with the central axis of the launch hole of second laser interferometer 2.The measurement System also includes the 3rd laser interferometer 3 in the second axis (that is, X-axis) vertical with first axle, the 3rd laser Interferometer 3 is located in the same horizontal plane with first laser interferometer 1, second laser interferometer 2, and the 3rd laser interferometer 3 The central axis upright of the central axis of launch hole and the launch hole of first laser interferometer 1.The measuring system also includes being located at Criss-cross optical module 6 is configured on displacement platform 4, the optical module 6 includes and first laser interferometer 1 corresponding first Right angle optic portion, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first laser is interfered The incident ray of the transmitting of instrument 1 is anti-through the first right angle minute surface and the second right angle minute surface of the first right angle optic portion with the incident ray Emergent ray after penetrating is parallel.In this embodiment, the incident ray of the transmitting of first laser interferometer 1 incides the first prism square The initial incidence angle of the first right angle minute surface of piece part is 45 °.Optical module also includes corresponding with second laser interferometer 2 the Two right angle optic portions, the second right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and second laser is dry Incident ray and incident ray of the transmitting of interferometer 2 through the second right angle optic portion the first right angle minute surface and the second right angle minute surface Emergent ray after reflection is parallel in this embodiment, and the incident ray of the transmitting of second laser interferometer 2 incides the second right angle The initial incidence angle of the first right angle minute surface of optic portion is 45 °.Optical module also includes corresponding with the 3rd laser interferometer 3 3rd right angle optic portion, the 3rd right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and the 3rd laser The incident ray of the transmitting of interferometer 3 is with the incident ray through the first right angle minute surface of the 3rd right angle optic portion and the second prism square Emergent ray after the reflection of face is parallel.In this embodiment, it is straight that the incident ray that second laser interferometer 3 is launched incides the 3rd The initial incidence angle of the first right angle minute surface of angle optic portion is 45 °.
Micro and nano manipulation platform displacement and the measuring system of the anglec of rotation that the present invention is provided pass through two laser interferences in Y-axis Instrument can realize the displacement measurement of Y-direction, and can indirectly calculate the anglec of rotation (the specific calculating side of Micro and nano manipulation platform Method will be described below), by the 3rd laser interferometer on X-axis line, realize the displacement measurement of X-direction so that the measurement system System can realize the multivariant displacement in space and angular surveying, and the limitation of existing detection device is overcome well, meet Space multivariant linear displacement is fed back with the real-time measurement of angular displacement.Additionally, the simple in measurement system structure, certainty of measurement It is high.
Specifically, as shown in figure 3, the optical module 6 includes the optical module base 601 being arranged on displacement platform 1, It is provided with optical module base 601 and is configured to criss-cross four draw-in grooves, sheet glass 602 is provided with each draw-in groove, Wherein, the two sides near two sheet glass 602 of the 3rd laser interferometer 3 is each coated with reflective membrane, away from the 3rd laser interference The sheet glass 602 of instrument 3 and close first laser interferometer 1 is coated with reflective membrane towards the one side of first laser interferometer 1, far Applied towards the one side of second laser interferometer 2 from the 3rd laser interferometer 3 and near the sheet glass 602 of second laser interferometer 2 It is covered with reflective membrane.Wherein, two sheet glass near first laser interferometer 1 are configured to the first right angle optic portion, near the Two sheet glass of dual-laser interferometer 2 are configured to the second right angle optic portion, near two glass of the 3rd laser interferometer 13 Glass piece is configured to the 3rd right angle optic portion.
Preferably, optical module can also including two fixed supports 603 on optical module base 601 and two In the travel(l)ing rest 604 of X-direction movement, one of fixed support 603 abuts in two near first laser interferometer 1 respectively On individual sheet glass, another fixed support 603 is abutted on two sheet glass of second laser interferometer 2 respectively, its In travel(l)ing rest 604 be connected to respectively on two sheet glass of the 3rd laser interferometer 3, another travel(l)ing rest 604 are connected on two sheet glass away from the 3rd laser interferometer 3 respectively, fixed support 603 and travel(l)ing rest 604 it is transversal Face is all in isosceles rectangular shaped.The outer end of travel(l)ing rest 604 is provided with bolt 605, is provided with optical module base 601 The screwed hole coordinated with bolt 605, when bolt head is twisted, bolt shank is connected on travel(l)ing rest 604, so that travel(l)ing rest 604 slide in X direction, so as to corresponding sheet glass is fixed between corresponding travel(l)ing rest 603 and fixed support 604.
The invention also discloses a kind of Micro and nano manipulation platform displacement and the measuring method of the anglec of rotation, it is comprised the following steps:
S1：The motion (as shown in Figure 5) of Micro and nano manipulation platform is resolved into displacement platform 4 along the translational motion of X-axis (as schemed Shown in 6), the translational motion (as shown in Figure 7) along Y-axis and the rotary motion (as shown in Figure 8) around Platform center point, if displacement is flat Platform 4 is a along the translation distance of X-axis1, it is a along the translation distance of Y-axis2And around Platform center point the anglec of rotation be θ；
S2：The first optical path difference Y of Y-axis is measured by first laser interferometer 111；Y-axis is measured by second laser interferometer 2 Second optical path difference Y22；The optical path difference X of X-axis is measured by the 3rd laser interferometer 311；
S3：First laser interferometer 1 is calculated because displacement platform 4 connects along first axle translational motion by below equation The optical path difference Y for receiving1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer 12With Along the translation distance a of Y-axis2(as shown in Figure 8)；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:It is located in the rotary motion of Platform center point, as shown in figure 8, displacement platform 4 rotates preceding first right angle eyeglass The distance between first pip E of first right angle optic portion is m after the first partial pip B and the rotation of displacement platform 4, Displacement platform 4 rotates the first right angle optic portion after the second pip C of preceding first right angle optic portion rotates with displacement platform 4 The distance between the second pip F be n, then make α=m/n, and known L0For displacement platform 4 does not move preceding first right angle eyeglass The distance between partial incident ray AB and emergent ray CD (as shown in Figure 7), then calculate displacement platform 4 by following formula Anglec of rotation θ：
In the figure 7, L0When not moved for displacement platform 4, the incident ray AB and emergent ray of the first right angle optic portion The distance between CD；L1For displacement platform 4 along X-axis translational motion after, the incident ray AE of the first right angle optic portion and outgoing The distance between light FG；a1It is the distance that displacement platform 4 is translated along X-axis, L1-L0=DG=2 × a1, therefore by measuring outgoing The distance of light movement can obtain displacement of the Micro and nano manipulation platform along X-axis.
When displacement platform 4 is moved along Y-axis, the change of the optical path difference of X-direction turns to 0, i.e., when being moved along Y-axis, first laser Interferometer 1 and second laser interferometer 2 export unchanged.
When displacement platform 4a is moved along Y-axis, first laser interferometer 1 is received because of displacement platform 4a along Y-axis translational motion The optical path difference Y for arriving1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer 12And edge The translation distance a of Y-axis2(as shown in Figure 8), then Y1、Y2And a2Meet following equation；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
Displacement platform 4b before and after the rotary motion of Platform center point, when the direction and constant position of incident ray AB, The direction and position of emergent ray CD also do not change.
In fig. 8, K points make horizontal linear KN excessively, and the horizontal line for crossing extended line and K points excessively that F makees GF meets at point N.
(1) angle for setting the rotation of displacement platform 4 is θ, and when rotation angle θ is 0 °, incident ray is AB, and emergent ray is CD, the incidence angle of incident ray is 45 °, and the angle of emergence of emergent ray CD is also 45 °, therefore EB//CG.
(2) when rotation angle θ is not 0 °, incident ray is AE, and emergent ray is FG, the incidence angle of incident ray for 45 °+ θ, now ∠ KEF=45 °-θ, in right angle Δ EKF, ∠ KEF=45 °-θ, ∠ EKF=90 ° can obtain ∠ EFK=45 °+θ.
In Fig. 8, ∠ FKN=45 °-θ, ∠ GHM=∠ EFK=45 °+θ, ∠ KFN=∠ GFM=45 °+θ.So ∠ KNF =180 ° of-∠ FKN- ∠ KFN=90 °.The extended line FN//EB of GF is parallel, so GF//EB.
The distance of AB to CD is BC=L1.The distance of FG to EB is EG, ∠ GEF=90 °-∠ BEK- ∠ KEF=2 θ, and EG It is vertical with GF, so EG=EF × cos2 θ, wherein
EF=EK/cos (45 ° of-θ),
BK=BC × cos45 °,
EG=L can be obtained1。
So CD is parallel with FG and distance of distance of CD to AB and FG to AB is equal, therefore straight line CD and straight line FG overlaps.
Optical path difference after displacement platform 4 rotates is：Y2=EF+FC-EB-BC.From geometric knowledge, △ EOB ≈ △ COF (two triangles with shade are similar i.e. in figure), if the likelihood ratio is
∠ GEF=2 × θ；
Equation below can be obtained by conditions above：
In Δ FJK,∠ BEK=45 °-θ, ∠ EKB=θ, are known by sine：
Equation (1) and (2) joint solve the anglec of rotation θ that can obtain Micro and nano manipulation platform.
Preferably, the measuring method also includes step：
S5：Displacement platform is calculated along the translational motion of second axis apart from a by following formula1：
X11=X1+X2,
X1=2a1,
In formula, X1For the optical path difference that the 3rd laser interferometer 3 is received by displacement platform along second axis translational motion；X2 It is the optical path difference that the 3rd laser interferometer 3 is received by displacement platform around Platform center point rotary motion, X2=Y2。
These are only presently preferred embodiments of the present invention, be not intended to limit the invention, it is all it is of the invention spirit and Within principle, any modification, equivalent substitution and improvements made etc. should be included within the scope of the present invention.

Claims (3)

1. a kind of precision measurement system of Micro and nano manipulation platform displacement and the anglec of rotation, the Micro and nano manipulation platform includes platform base And the displacement platform on the platform base, it is characterised in that including：
First laser interferometer and second laser interferometer on first axle, in the launch hole of first laser interferometer Heart axis is conllinear with the central axis of the launch hole of second laser interferometer；And positioned at the second axis vertical with first axle On the 3rd laser interferometer, the 3rd laser interferometer and first laser interferometer, second laser interferometer are located at same water In plane, and the central axis of the launch hole of the 3rd laser interferometer hangs down with the central axis of the launch hole of first laser interferometer Directly；And
It is located on displacement platform and is configured to criss-cross optical module, the optical module includes corresponding with first laser interferometer First right angle optic portion, the first right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and first laser The incident ray of interferometer transmitting is with the incident ray through the first right angle minute surface of the first right angle optic portion and the second prism square Emergent ray after the reflection of face is parallel, and optical module also includes the second right angle optic portion corresponding with second laser interferometer, The second right angle optic portion includes the first right angle minute surface and the second right angle minute surface, and the incident light that second laser interferometer is launched Line is with the incident ray through the emergent ray after the first right angle minute surface and the second right angle mirror-reflection of the second right angle optic portion It is parallel；Optical module also includes the 3rd right angle optic portion corresponding with the 3rd laser interferometer, the 3rd right angle optic portion Including the first right angle minute surface and the second right angle minute surface, and the transmitting of the 3rd laser interferometer incident ray and the incident ray through the Emergent ray after the first right angle minute surface and the second right angle mirror-reflection of three right angle optic portions is parallel.
2. measuring system as claimed in claim 1, it is characterised in that optical module includes the optics being arranged on displacement platform Unitized substructure, is provided with optical module base and is configured to criss-cross four draw-in grooves, and glass is provided with each draw-in groove Glass piece, wherein, two sheet glass near first laser interferometer form the first right angle optic portion, near second laser interference Two sheet glass of instrument form the second right angle optic portion, and two sheet glass near the 3rd laser interferometer form the 3rd right angle Optic portion, and the two sides of two sheet glass near the 3rd laser interferometer is coated with reflective membrane, it is dry away from the 3rd laser The sheet glass of interferometer and close first laser interferometer is coated with reflective membrane towards the one side of first laser interferometer, away from the 3rd The sheet glass of laser interferometer and close second laser interferometer is coated with reflective membrane towards the one side of second laser interferometer.
3. the measuring method of a kind of Micro and nano manipulation platform displacement and the anglec of rotation, it is characterised in that including：
S1：By the Kinematic Decomposition of displacement platform into edge along the translational motion of first axle, the translational motion of second axis and around flat The rotary motion of platform central point, if displacement platform is a along the translation distance of second axis1, the translation distance along first axle is a2, and around Platform center point the anglec of rotation be θ；
S2：The first optical path difference Y on first axle is measured by first laser interferometer11；First is measured by second laser interferometer The second optical path difference Y on axis22；The optical path difference X in second axis is measured by the 3rd laser interferometer11；
S3：First laser interferometer is calculated because displacement platform is received along first axle translational motion by below equation Optical path difference Y1, the optical path difference Y that is received around Platform center point rotary motion by displacement platform of first laser interferometer2With along first The translation distance a of axis2；
Y11=Y1+Y2,
Y22=-Y1+Y2,
Y1=2a2；
S4:It is located in the rotary motion of Platform center point, displacement platform rotates the first right angle of preceding first right angle optic portion After first pip of minute surface and displacement platform rotation the first pip of the first right angle minute surface of the first right angle optic portion it Between distance be m, the second pip and the displacement of the second right angle minute surface of displacement platform rotation preceding first right angle optic portion are flat The distance between second pip of the second right angle minute surface of the first right angle optic portion is n after platform rotation, then make α=m/n, and Known L0For displacement platform does not move the distance between incident ray and emergent ray of preceding first right angle optic portion, then pass through Following formula calculates the anglec of rotation θ of displacement platform：
Y 2 = L 0 c o s 2 θ + L 0 × α 1 + α t a n 2 θ - L 0 1 + α t a n 2 θ - L 0 ;
S5：Displacement platform is calculated along the translation distance a in second axis by following formula1：
X11=X1+X2,
X1=2a1,
In formula, X1For the optical path difference that the 3rd laser interferometer is received by displacement platform along first axle translational motion；X2It is the 3rd The optical path difference that laser interferometer is received by displacement platform around Platform center point rotary motion, X2=Y2。
CN201710243559.0A 2017-04-14 2017-04-14 The precision measurement system and its measurement method of Micro and nano manipulation platform displacement and rotation angle Expired - Fee Related CN106931890B (en)

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CN101216286A (en) * 2007-12-26 2008-07-09 上海微电子装备有限公司 Heterodyne interferometer measuring system for measuring displacement and its measurement method
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