CN106861781A - A kind of microchannel preparation method based on nano surface bubble reduction fluid resistance - Google Patents
A kind of microchannel preparation method based on nano surface bubble reduction fluid resistance Download PDFInfo
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- CN106861781A CN106861781A CN201710229403.7A CN201710229403A CN106861781A CN 106861781 A CN106861781 A CN 106861781A CN 201710229403 A CN201710229403 A CN 201710229403A CN 106861781 A CN106861781 A CN 106861781A
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- microchannel
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
- B01L3/502707—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip characterised by the manufacture of the container or its components
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T70/00—Maritime or waterways transport
- Y02T70/10—Measures concerning design or construction of watercraft hulls
Abstract
The invention discloses a kind of microchannel preparation method for realizing reducing fluid flow resistance based on nano surface bubble.Photoetching technique is used first（photolithography）With electrochemical etching technology（electrochemical etching）Microchannel of the bottom surface with poroid micro-structural is obtained on a silicon surface；Then silanization treatment is carried out to the microchannel surface, makes surface that there is preferable hydrophobicity；Glass is finally covered in the another side of microchannel and using the sealing of anode welding technology.The microchannel that the present invention makes can generate the nano bubble with different prominent angles by changing inlet and outlet pressure at microcellular structure, and then realize different degrees of fluid drag-reduction effect, improve the efficiency of transmission of microfluid.
Description
Technical field
It is specifically a kind of to realize that microfluid slides based on nano surface bubble the present invention relates to microfluidic chip technology field
The preparation method of the microchannel of drag reduction.
Background technology
With microfluid (Microfluidics) technology and micro-/nano electromechanical systems（Micro/nano electro
mechanical systems, MEMS/NEMS）Development, the Surface Science technology of micro-/ nano yardstick is particularly important.
Under micro-/ nano yardstick, fluid passage has a larger surface-to-volume ratio, the flowing of microfluid by material surface nature such as
The influence of surface force, hydrophobicity and roughness much larger than the influence suffered by macrofluid, and study under micro-/ nano yardstick how
Realize that reducing fluid flow resistance also has very important theory significance and actual application value.
Nano bubble（Nanobubble）It is predominant gas form present on solid-liquid interface, typical nano bubble is in
Spherical crown shape, is highly tens nanometers, a diameter of hundreds of nanometers of contact line, because there is special property to be answered with widely potential for it
With and turn into the hot issue of field of interfaces.According to the model of gas on solid-liquid interface and slip length relation, slip length with
The thickness of gas blanket is directly proportional on solid-liquid interface.It can be seen that, the gas on solid-liquid interface（Nano bubble, nanometer gas-bearing formation）To help
In the slip length of increase fluid, reduce flow resistance.
At present, although having had many scholar's research and having confirmed that nano bubble has sliding drag reduction effect, all in
Experiment and theoretical research stage, realize that microfluid slides the application of drag reduction still without any based on nano surface bubble.Therefore, make
A kind of standby microfluidic channel that reduction fluid flow resistance is realized based on nano bubble is that nano bubble is walked in terms of drag reduction is slid
To the premise of application, have for the development of micro-/ nano passage technology, microfluid system and micro-/nano electromechanical systems particularly significant
Realistic meaning.
The content of the invention
It is an object of the invention to provide a kind of microchannel that microfluid sliding drag reduction is realized based on nano surface bubble
Preparation method, to solve the problems, such as to be proposed in above-mentioned background technology.
To achieve the above object, the present invention provides following technical scheme：
A kind of preparation method of the microchannel that microfluid sliding drag reduction is realized based on nano surface bubble, it is characterised in that described
Realize that the preparation method of the microchannel of microfluid sliding drag reduction is comprised the following steps based on nano surface bubble.
1）Using RCA cleaning cleaning silicon chips（The monocrystalline silicon of N-type 100）, resistivity is 0.04-0.1 V cm.
2）Using photoetching technique（photolithography）With electrochemical etching technology（electrochemical
etching）The main channel of microchannel is processed on a silicon surface, and poroid micro-structural is then processed on passage bottom.
3）Microchannel surface of the bottom surface with microcellular structure is cleaned（RCA techniques）, dried up with nitrogen, carry out silane
Change is processed, and surface is had preferable hydrophobicity.
4）Sheet glass is covered in above microchannel and using the sealing of anode welding technology.
As further scheme of the invention：Step 2）Described in the master that microchannel is processed on silicon substrate surface lead to
Road, and poroid micro-structural is processed on the bottom surface of main channel.W=200 μm of main channel width, depth H=50 μm；Hole it is a diameter of
1.6 μm, depth is 3 μm.
As further scheme of the invention：Step 3）Described in utilization OTS
（Octadecyltrichlorosilane）The anhydrous toluene solution microchannel surface that has microcellular structure to bottom surface carry out silane
Change is processed, and the volume ratio of the anhydrous toluene solution of OTS is 1%.When carrying out silanization treatment to microchannel surface, by microchannel table
Face is immersed in the anhydrous toluene solution of octadecyl trichlorosilane alkane (Octadecyltrichlorosilane, OTS)（Volume ratio
It is 1%）, the immersion time is 5 hours.The microchannel surface of silanization is cleaned by ultrasonic 3 times, every time 5 points with toluene solution after taking-up
Clock, is then cleaned by ultrasonic 5 times, every time 3 minutes with deionized water.
The beneficial effects of the invention are as follows：1）With preferable etching effect, meanwhile, have on the main channel bottom surface for being obtained
Microcellular structure, the pressure that can be imported and exported by changing microchannel traps nano bubble over the microporous structure, contributes to increase
Slip length, and then reduce fluid flow resistance；2）Whole microchannel surface carries out silanization treatment using OTS, has surface
There is good hydrophobicity, further increase the slip length of fluid, reduce fluid flow resistance.
Brief description of the drawings
1. a kind of microchannel preparation process schematic diagrames based on nano surface bubble drag-reduction of Fig. 1.Wherein,（a）It is microchannel
Main channel；（b）It is the microcellular structure of microchannel bottom surface；（c）Microchannel after out being sealed afterwards and with glass plate for silanization.
2. Fig. 2 is based on nano surface in a kind of microchannel preparation process schematic diagram based on nano surface bubble drag-reduction
The microchannel schematic diagram of bubble drag-reduction.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 1 and Fig. 2 is referred to, it is using RCA cleanings that Wafer Cleaning is clean first in the embodiment of the present invention, then
Using photoetching technique（Photolithography）With electrochemical etching technology（Electrochemical etching）Method
（The machined surface of silicon chip is etched using etching liquid, and bottom surface utilizes the Infrared irradiation of long wavelength）Width W=is processed on a silicon surface
200 μm, the microchannel main channel of depth H=50 μm；During processing, the etching liquid for being used is hydrofluoric acid solution
（Hydrofluoric, HF）；Then a diameter of 1.6 μm, the hole depth in hole are obtained on passage bottom still with same technology
It is 3 μm of poroid micro-structural；Next microchannel surface of the bottom surface with microcellular structure is cleaned（RCA techniques）, use nitrogen
Air-blowing is done, using volume ratio for the anhydrous toluene solution of 1%OTS carries out silanization treatment；Sheet glass is finally covered in microchannel
Above and using the sealing of anode welding technology.The method has preferable etching effect, and the microchannel for being processed can be by changing
Become the pressure imported and exported microchannel and trap nano bubble over the microporous structure, realize using nano bubble reduction flow of fluid resistance
The application of power.
It is obvious to a person skilled in the art that the invention is not restricted to the details of above-mentioned one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be in other specific forms realized.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires to be limited rather than described above, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Any reference in claim should not be considered as the claim involved by limitation.
Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each implementation method is only wrapped
Containing an independent technical scheme, this narrating mode of specification is only that for clarity, those skilled in the art should
Specification an as entirety, the technical scheme in each embodiment can also be formed into those skilled in the art through appropriately combined
May be appreciated other embodiment.
Claims (5)
1. it is a kind of to realize that microfluid slides the preparation method of the microchannel of drag reduction based on nano surface bubble, it is characterised in that described
Realize that the preparation method of microchannel of microfluid sliding drag reduction is comprised the following steps based on nano surface bubble：
1）Using RCA cleaning cleaning silicon chips（The monocrystalline silicon of N-type 100, resistivity is 0.04-0.1 V cm）；
2）Using photoetching technique（photolithography）With electrochemical etching technology（electrochemical etching）
The main channel of microchannel is processed on a silicon surface, and poroid micro-structural is then processed on passage bottom；
3）Microchannel surface of the bottom surface with microcellular structure is cleaned（RCA techniques）, dried up with nitrogen, carry out at silanization
Reason, makes surface have preferable hydrophobicity；
4）Sheet glass is covered in above microchannel and using the sealing of anode welding technology.
2. it is a kind of as claimed in claim 1 to realize that microfluid slides the preparation side of the microchannel of drag reduction based on nano surface bubble
Method, it is characterised in that step 1）Described in silicon chip be the monocrystalline silicon of N-type 100, resistivity be 0.04-0.1 V cm.
3. it is a kind of as claimed in claim 1 to realize that microfluid slides the preparation side of the microchannel of drag reduction based on nano surface bubble
Method, it is characterised in that step 2）Described in the main channel that microchannel is processed on silicon substrate surface, and on the bottom surface of main channel
Process poroid micro-structural；W=200 μm of main channel width, depth H=50 μm；A diameter of 1.6 μm of hole, depth is 3 μm.
4. it is a kind of as claimed in claim 1 to realize that microfluid slides the preparation side of the microchannel of drag reduction based on nano surface bubble
Method, it is characterised in that step 3）Described in utilization OTS（Octadecyltrichlorosilane）Anhydrous toluene solution pair
The microchannel surface that there is microcellular structure bottom surface carries out silanization treatment, and the volume ratio of the anhydrous toluene solution of OTS is 1%.
5. it is a kind of as claimed in claim 1 to realize that microfluid slides the preparation side of the microchannel of drag reduction based on nano surface bubble
Method, it is characterised in that step 4）Described in microchannel sheet glass is sealed in the another side of microchannel using anode welding technology.
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| CN201710229403.7A CN106861781B (en) | 2017-04-10 | 2017-04-10 | Micro-channel preparation method for reducing fluid resistance based on surface nano-bubbles |
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| CN106861781B CN106861781B (en) | 2023-04-11 |
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Cited By (2)
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| CN111282604A (en) * | 2020-02-12 | 2020-06-16 | 赛纳生物科技(北京)有限公司 | Method for entering biochemical chip microspheres |
| WO2024015772A3 (en) * | 2022-07-11 | 2024-03-07 | The Trustees Of The University Of Pennsylvania | Very large scale microfluidic integrated chip with micro-patterned wettability for high throughput multiple droplet generation |
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| CN106861781B (en) | 2023-04-11 |
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