CN106788386B - Level conversion circuit for reducing hot carrier degradation - Google Patents

Level conversion circuit for reducing hot carrier degradation Download PDF

Info

Publication number
CN106788386B
CN106788386B CN201611077581.4A CN201611077581A CN106788386B CN 106788386 B CN106788386 B CN 106788386B CN 201611077581 A CN201611077581 A CN 201611077581A CN 106788386 B CN106788386 B CN 106788386B
Authority
CN
China
Prior art keywords
nmos transistor
circuit
hot carrier
pmos transistor
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201611077581.4A
Other languages
Chinese (zh)
Other versions
CN106788386A (en
Inventor
胡晓明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Huali Microelectronics Corp
Original Assignee
Shanghai Huali Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Huali Microelectronics Corp filed Critical Shanghai Huali Microelectronics Corp
Priority to CN201611077581.4A priority Critical patent/CN106788386B/en
Publication of CN106788386A publication Critical patent/CN106788386A/en
Application granted granted Critical
Publication of CN106788386B publication Critical patent/CN106788386B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/0175Coupling arrangements; Interface arrangements
    • H03K19/017509Interface arrangements
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/003Modifications for increasing the reliability for protection
    • H03K19/00315Modifications for increasing the reliability for protection in field-effect transistor circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Logic Circuits (AREA)

Abstract

A level shift circuit for reducing hot carrier degradation includes first and second PMOS transistors, first and second NMOS transistors, an inverter, and a hot carrier suppressor circuit; the node of the second PMOS transistor and the node of the second NMOS transistor form the output of the level conversion circuit and are connected with the grid electrode of the first PMOS transistor; the source end of the second PMOS transistor is connected with an external high-voltage power supply, and the source end of the second NMOS transistor is connected with the ground level; the node of the first PMOS transistor and the node of the first NMOS transistor are connected with the grid electrode of the second PMOS transistor, the source end of the first PMOS transistor is connected with an external high-voltage power supply, and the source end of the first NMOS transistor is connected with the ground level; the first inverter input constitutes the input of a level shifter circuit, the output of which is connected to the gate of the first NMOS transistor and to the input of the hot carrier suppressor circuit, the output of which is connected to the gate of the second NMOS transistor to reduce the voltage that actually reaches the second NMOS transistor.

Description

Level conversion circuit for reducing hot carrier degradation
Technical Field
The invention belongs to the technical field of test chip design, and particularly relates to a level conversion circuit for reducing hot carrier degradation.
Background
In an integrated circuit, a level shifter circuit is an important component. The device bearing high level in the level conversion circuit has the characteristics of high working voltage and high driving capability. As chip sizes decrease, particularly in deep submicron technologies for a typical integrated circuit chip, device feature sizes, such as gate oxide thickness and channel length, decrease significantly, the supply voltage and operating voltage of the chip are not reduced much, and the corresponding electric field strength increases, resulting in an increase in the electron motion rate.
Under high working voltage, a strong transverse electric field exists in a channel of the device, so that a carrier is subjected to impact ionization in the transportation process to generate extra electron hole pairs, and part of hot carriers are injected into a gate oxide layer, so that the threshold voltage of the device is increased, the saturation current and the carrier mobility are reduced, and the like, and the phenomenon is called HCI (hot carrier injection) effect.
The HCI effect is a problem often encountered in device design, and is a main factor affecting the device characteristics and reliability, especially for NMOS devices, and the HCI cumulative effect directly causes that the level conversion circuit cannot be inverted and loses the conversion function.
Referring to fig. 1, fig. 1 is a schematic diagram of a low-to-high level conversion circuit in the prior art. As shown, the circuit is for an integrated circuit level shifter circuit having an internal low voltage power supply (VPPL) and an external high voltage power supply (VPPH), having first and second PMOS transistors 1 and 2, having first and second NMOS transistors 3 and 4, and first and second inverters 5 and 6; the node 11 of the second PMOS transistor 2 and the second NMOS transistor 4 forms the output OUT of the level shift circuit, and is connected to the gate of the first PMOS transistor 1; the source end of the second PMOS transistor 2 is connected with an external high-voltage power supply, and the source end of the second NMOS transistor 4 is connected with the ground level. The node 22 of the first PMOS transistor 1 and the first NMOS transistor 3 is connected to the gate of the second PMOS transistor 2, the source terminal of the first PMOS transistor 1 is connected to an external high voltage power supply, and the source terminal of the first NMOS transistor 3 is connected to ground. The inverter 5 has an input IN forming a level shifter circuit, an output connected to the gate of the first NMOS transistor 3 and to an input of the second inverter 6, and an output of the hot carrier suppressor circuit 6 connected to the gate of the second NMOS transistor 4.
The operating condition of the NMOS transistor under severe HCI effect is to satisfy the following relationship between the gate voltage VG and the drain voltage VD:
1/3*VD<VG<1/2*VD
as can be seen from the above level shift circuit, when the output of the level shift circuit from low to high (as shown in fig. 1) is inverted from high to low, the second NMOS transistor 4 is turned on, the drain terminal thereof is the external high voltage power supply (VPPH), and the gate thereof is the internal low voltage power supply (VPPL).
If VPPH is 3.3V voltage source and VPPL is 1.8V voltage source, then the device is under the working condition that HCI occurs, hot carriers are injected into the gate oxide layer, and the threshold voltage of the device is increased. After long-term accumulation, the driving current of the second NMOS transistor 4 is reduced after being turned on due to the rise of the threshold voltage, the driving capability of the first NMOS transistor 2 is finally not enemy, the situation that the level conversion circuit cannot output low occurs, meanwhile, the first PMOS transistor 1 cannot be turned on, and then the first NMOS transistor 2 cannot be completely turned off, so that the circuit fails.
The industry also has made a lot of work on the degradation of the performance of the MOS device caused by the injection of hot carriers, but the process for improving the HCI effect by changing the structure of the device is very complicated and high in consumption cost. Therefore, reducing the dose of LDD ion implantation for lightly doped source/drain region, increasing the energy of LDD ion implantation, and obtaining deeper LDD junction to reduce the lateral electric field is an effective means for improving HCI effect, for example, chinese patent nos. CN 102693904B and CN 100490094C.
However, as the size of MOSFET devices is reduced, the gate oxide thickness is thinner and thinner, and the LDD junction is shallower. In the above patent technology, when the LDD ion implantation is performed, in order to avoid the gate oxide breakdown during the ion implantation, the implantation energy is reduced accordingly, so that the formed LDD junction becomes shallower, which is not beneficial to improving the HCI effect; on the other hand, As the concentration gradient between As ions and P ions is relatively larger, the overlapping area between the formed LDD diffusion area and the grid electrode is smaller and smaller, so that the transverse electric field intensity in the channel is larger, and the HCI effect of the device is more and more obvious. Therefore, it is not sufficient to improve the HCI effect simply by changing the dose and energy of the LDD ion implantation.
Disclosure of Invention
In order to overcome the above problems, the level shift circuit for reducing hot carrier degradation according to the present invention embeds a hot carrier suppressor circuit with a selection signal control in a conventional level shift circuit from a circuit design point of view, and reduces a gate driving voltage of a high voltage NMOS to make a transistor avoid a severe working region where HCI occurs, thereby achieving an effect of reducing HCI influence.
In order to achieve the purpose, the technical scheme of the invention is as follows:
a level shift circuit for reducing hot carrier degradation for a level shift circuit having an internal low voltage power supply (VPPL) and an external high voltage power supply (VPPH) integrated circuit, comprising:
a first PMOS transistor 1 and a second PMOS transistor 2;
a first NMOS transistor 3 and a second NMOS transistor 4; and
a first inverter 5 and a hot carrier suppression sub-circuit 6;
the node 11 of the second PMOS transistor 2 and the second NMOS transistor 4 forms the output OUT of the level shift circuit, and is connected to the gate of the first PMOS transistor 1; the source end of the second PMOS transistor 2 is connected with an external high-voltage power supply, and the source end of the second NMOS transistor 4 is connected with the ground level;
a node 22 of the first PMOS transistor 1 and the first NMOS transistor 3 is connected with a grid electrode of the second PMOS transistor 2, a source end of the first PMOS transistor 1 is connected with an external high-voltage power supply, and a source end of the first NMOS transistor 3 is connected with a ground level;
the input of first inverter 5 constitutes the input IN of a level shifter circuit, the output of which is connected to the gate of first NMOS transistor 3 and to the input of hot carrier suppression sub-circuit 6, the output of hot carrier suppression sub-circuit 6 being connected to the gate of second NMOS transistor 4 to reduce the voltage actually reaching second NMOS transistor 4.
Preferably, the gate voltage VG and the drain voltage VD of the second transistor have the following relationship:
VT<VG<1/3*VD
preferably, the hot carrier suppressor circuit 6 is constituted by a second inverter 71, a diode 72, a third PMOS transistor 73 and a third NMOS transistor 74; the second inverter 71 and the diode 72 are connected in series, and the anode of the diode 72 and the second inverter 71 share a node; a third PMOS transistor 73 and a third NMOS transistor 74 are connected in parallel with the diode 72 and are controlled by the selection control signal EN and the anti-EN signal, respectively.
Preferably, the forward conduction voltage drop of the diode 72 is 0.3 Volt-0.8 Volt.
Preferably, the diode 72 is a schottky diode, a zener diode, or a PN junction diode.
According to the technical scheme, the level conversion circuit has certain driving capability by controlling the voltage to the grid electrode of the second NMOS transistor, and simultaneously works in a non-HCI high-risk region when the level is reversed, so that the effect of reducing HCI influence is realized, the protection of devices and circuits is realized, and the reliability of long-term work is improved.
Drawings
FIG. 1 is a diagram of a low-to-high level conversion circuit in the prior art
FIG. 2 is a schematic diagram of a low-to-high level conversion circuit according to an embodiment of the present invention
FIG. 3 is a diagram of a hot carrier suppressor circuit in a level shifter circuit according to an embodiment of the present invention
Detailed Description
Embodiments that embody features and advantages of the invention are described in detail in the description that follows. It is understood that the invention is capable of modification in various forms and that the description and drawings are to be regarded as illustrative in nature, and not as restrictive.
A level shift circuit according to the present invention will be described in detail with reference to the accompanying drawings. It should be noted that, in order to overcome the HCI risk of the level shift circuit in the prior art, the level shift circuit of the present invention adds a protection circuit for reducing hot electron injection in the front stage of the gate of the second NMOS transistor 4, so as to reduce the voltage actually reaching the gate, and make the second NMOS transistor 4 work in the non-high risk HCI occurrence environment, thereby protecting the circuit and improving the reliability of long-term work.
Referring to fig. 2, fig. 2 is a schematic diagram of a low-to-high level conversion circuit according to an embodiment of the present invention. As shown in the drawings, in an embodiment of the present invention, an integrated circuit level shifter circuit having an internal low voltage power supply VPPL and an external high voltage power supply VPPH, a first PMOS transistor 1 and a second PMOS transistor 2; a first NMOS transistor 3 and a second NMOS transistor 4; and an inverter 5 and a hot carrier suppression sub-circuit 6; the node 11 of the second PMOS transistor 2 and the second NMOS transistor 4 forms the output OUT of the level shift circuit, and is connected to the gate of the first PMOS transistor 1; the source end of the second PMOS transistor 2 is connected with an external high-voltage power supply, and the source end of the second NMOS transistor 4 is connected with the ground level; a node 22 of the first PMOS transistor 1 and the first NMOS transistor 3 is connected with a grid electrode of the second PMOS transistor 2, a source end of the first PMOS transistor 1 is connected with an external high-voltage power supply, and a source end of the first NMOS transistor 3 is connected with a ground level; the input of first inverter 5 constitutes the input IN of a level shifter circuit, the output of which is connected to the gate of first NMOS transistor 3 and to the input of hot carrier suppression sub-circuit 6, the output of hot carrier suppression sub-circuit 6 being connected to the gate of second NMOS transistor 4 to reduce the voltage actually reaching second NMOS transistor 4.
In the gate pre-stage of the second NMOS transistor 4, the voltage actually reaching the gate is reduced by the hot carrier suppressor circuit 6, and in the embodiment of the present invention, the gate voltage VG and the drain voltage VD of the second transistor preferably have the following relationship:
VT<VG<1/3*VD
that is, the second NMOS transistor 4 is operated in a non-high risk HCI generation environment, thereby protecting the circuit and improving the reliability of long-term operation.
Therefore, the gist of the present invention is to control the voltage reaching the gate of the second NMOS transistor 4 to have a certain driving capability and to operate in a non-HCI generation high-risk region during level inversion, thereby realizing protection of devices and circuits. Any method for achieving the same effect of the present invention through a circuit or a device should be within the scope of the present invention.
Exemplary details are provided below by way of hot carrier suppression sub-circuits that may be used in the level shifting circuits of the present invention.
Example one
Referring to fig. 3, fig. 3 is a schematic diagram of a hot carrier suppressor circuit in a level shifter circuit according to an embodiment of the present invention. As shown, hot carrier suppressor circuit 6 is composed of second inverter 71, diode 72, third PMOS transistor 73, and third NMOS transistor 74; the second inverter 71 and the diode 72 are connected in series, and the anode of the diode 72 and the second inverter 71 share a node; the third PMOS transistor 73 and the third NMOS transistor 74 are connected in parallel with the diode 72 and are controlled by the selection control signal EN and the anti-EN signal, respectively.
In the present embodiment, the diode 72 may be a schottky diode, a zener diode, a PN junction diode, or the like, and the forward conduction voltage drop thereof is 0.3Volt to 0.8 Volt.
That is, the gate voltage applied to the second NMOS transistor 4 is reduced by serially connecting diodes and using the characteristic that the forward voltage of the diodes drops by 0.4 to 0.8V. The second inverter 71 performs the logic function of level conversion correctly, and the third PMOS transistor 73 and the third NMOS transistor 74 are controlled as conduction pipes by the selection signal EN and whether the hot carrier suppression sub-circuit 6 is active or not.
The above description is only an embodiment of the present invention, and the embodiment is not intended to limit the scope of the present invention, so that all the equivalent structural changes made by using the contents of the specification and the drawings of the present invention should be included in the scope of the present invention.

Claims (4)

1. A level shift circuit for reducing hot carrier degradation for a level shift circuit of an integrated circuit having an internal low voltage power supply (VPPL) and an external high voltage power supply (VPPH), comprising:
a first PMOS transistor (1) and a second PMOS transistor (2);
a first NMOS transistor (3) and a second NMOS transistor (4); and
a first inverter (5) and a hot carrier suppression circuit (6);
the hot carrier suppressor circuit (6) comprises an input end, a power supply end, an output end, a control signal EN end and a grounding end; the power supply terminals of the first inverter (5) and the hot carrier suppression sub-circuit (6) are connected with an internal low voltage power supply (VPPL);
the node (11) of the second PMOS transistor (2) and the second NMOS transistor (4) forms the Output (OUT) of the level conversion circuit and is connected with the grid electrode of the first PMOS transistor (1); the source end of the second PMOS transistor (2), the source end of the first PMOS transistor (1) are connected with an external high-voltage power supply (VPPH), and the source end of the second NMOS transistor (4) is connected with the first NMOS transistor (3) in a ground level;
a node (22) of the first PMOS transistor (1) and the first NMOS transistor (3) is connected with a grid electrode of the second PMOS transistor (2), a source end of the first PMOS transistor (1) is connected with an external high-voltage power supply, and a source end of the first NMOS transistor (3) is connected with a ground level;
the input of the first inverter (5) forms the Input (IN) of a level conversion circuit, the output of the Input (IN) is connected with the grid of the first NMOS transistor (3) and the input end of the hot carrier suppression circuit (6), the output end of the hot carrier suppression circuit (6) is connected with the grid of the second NMOS transistor (4), when the level conversion circuit is under high operating voltage, the hot carrier suppression circuit (6) receives the control signal EN signal for control, and the voltage VG output by the output end of the hot carrier suppression circuit (6) to the second NMOS transistor (4) and the drain voltage VD have the following relation:
VT<VG<1/3*VD
wherein VT is the threshold voltage of the gate of the second NMOS transistor (4).
2. A level shift circuit for reducing hot carrier degradation according to claim 1, wherein the hot carrier suppression sub-circuit (6) is constituted by a second inverter (71), a diode (72), a third PMOS transistor (73) and a third NMOS transistor (74); the second inverter (71) and the diode (72) are connected in series, and the anode of the diode (72) and the second inverter (71) are in a common node; a third PMOS transistor (73) and a third NMOS transistor (74) are connected in parallel with the diode (72) and are controlled by a select control signal EN and an anti-EN signal, respectively.
3. The level shift circuit for reducing hot carrier degradation according to claim 2, wherein the forward conducting voltage drop of the diode (72) is 0.3Volt to 0.8 Volt.
4. A level shift circuit for reducing hot carrier degradation according to claim 2, characterized in that the diode (72) is a schottky diode, a zener diode and a PN junction diode.
CN201611077581.4A 2016-11-30 2016-11-30 Level conversion circuit for reducing hot carrier degradation Active CN106788386B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611077581.4A CN106788386B (en) 2016-11-30 2016-11-30 Level conversion circuit for reducing hot carrier degradation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611077581.4A CN106788386B (en) 2016-11-30 2016-11-30 Level conversion circuit for reducing hot carrier degradation

Publications (2)

Publication Number Publication Date
CN106788386A CN106788386A (en) 2017-05-31
CN106788386B true CN106788386B (en) 2021-08-06

Family

ID=58901015

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611077581.4A Active CN106788386B (en) 2016-11-30 2016-11-30 Level conversion circuit for reducing hot carrier degradation

Country Status (1)

Country Link
CN (1) CN106788386B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101777907A (en) * 2009-12-31 2010-07-14 宁波大学 Low-power dissipation RS latch unit and low-power dissipation master-slave D flip-flop
CN102386101A (en) * 2010-08-20 2012-03-21 长城半导体公司 Semiconductor device and method of forming low voltage MOSFET for portable electronic devices and data processing centers
CN104467416A (en) * 2014-11-26 2015-03-25 上海华力微电子有限公司 DC-DC switching circuit
CN106059560A (en) * 2015-04-16 2016-10-26 台湾积体电路制造股份有限公司 Voltage boost device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62245715A (en) * 1986-04-17 1987-10-27 Nec Corp Level shift circuit
JPS62245716A (en) * 1986-04-17 1987-10-27 Nec Corp Level shift circuit
JP3866111B2 (en) * 2002-01-18 2007-01-10 株式会社ルネサステクノロジ Semiconductor integrated circuit and burn-in method
US20050136664A1 (en) * 2003-12-22 2005-06-23 Taiwan Semiconductor Manufacturing Co. Novel process for improved hot carrier injection
US7876146B2 (en) * 2007-05-08 2011-01-25 Qualcomm, Incorporated Method and apparatus for powering down analog integrated circuits
US8681518B2 (en) * 2009-07-21 2014-03-25 Cree, Inc. High speed rectifier circuit
US8405442B2 (en) * 2009-10-23 2013-03-26 Taiwan Semiconductor Manufacturing Company, Ltd. Level shifters and integrated circuits thereof
KR101825114B1 (en) * 2011-11-07 2018-03-14 삼성전자주식회사 Output buffer, operating method thereof, and devices having the same
US8704579B2 (en) * 2011-12-30 2014-04-22 Taiwan Semiconductor Manufacturing Company, Ltd. Level shifting circuit and semiconductor device using the same
CN103035727B (en) * 2012-11-09 2015-08-19 上海华虹宏力半导体制造有限公司 RFLDMOS device and manufacture method
CN103151373A (en) * 2013-03-13 2013-06-12 胡勇海 Semiconductor device for expanding safety operation area
CN105610425B (en) * 2015-12-18 2019-01-11 珠海市杰理科技股份有限公司 Power-on protective circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101777907A (en) * 2009-12-31 2010-07-14 宁波大学 Low-power dissipation RS latch unit and low-power dissipation master-slave D flip-flop
CN102386101A (en) * 2010-08-20 2012-03-21 长城半导体公司 Semiconductor device and method of forming low voltage MOSFET for portable electronic devices and data processing centers
CN104467416A (en) * 2014-11-26 2015-03-25 上海华力微电子有限公司 DC-DC switching circuit
CN106059560A (en) * 2015-04-16 2016-10-26 台湾积体电路制造股份有限公司 Voltage boost device

Also Published As

Publication number Publication date
CN106788386A (en) 2017-05-31

Similar Documents

Publication Publication Date Title
CN103258814B (en) LDMOS SCR device is used in a kind of integrated circuit (IC) chip ESD protection
US7608907B2 (en) LDMOS gate controlled schottky diode
US20130099297A1 (en) Electrostatic discharge protection device
KR101232935B1 (en) Ldmos semiconductor device
US10290627B2 (en) Embedded high voltage LDMOS-SCR device with a strong voltage clamp and ESD robustness
US7723780B2 (en) Lateral DMOS device structure and manufacturing method thereof
TW201731019A (en) Semiconductor device
JP4822292B2 (en) Semiconductor device
US9953970B2 (en) Semiconductor device having ESD protection structure
CN107516679B (en) Deep-groove super-junction DMOS device
CN106788386B (en) Level conversion circuit for reducing hot carrier degradation
JP2008029059A (en) Drive circuit of semiconductor device
Mahmud et al. Reverse body bias dependence of HCI reliability in advanced FinFET
CN108604599B (en) Semiconductor device with a plurality of semiconductor chips
Mishra et al. Impact of space charge modulation on superjunction-LDMOS
Saxena et al. Floating body ring termination for trench field plate power MOSFETs
CN103151373A (en) Semiconductor device for expanding safety operation area
JP2018049950A (en) Semiconductor device and method of controlling the same
US9905680B2 (en) Lateral insulated-gate bipolar transistor
CN205123701U (en) System for chip working life under extension hot carrier&#39;s effect
Huang et al. Investigation of hot-carrier-injection assisted TDDB and multi-stage hot-hole induced leakage current in BCD HV NMOS
CN103972233A (en) SCR (Semiconductor Control Rectifier) shut-off device with latching resistant capability
Schlünder et al. Hot-carrier induced dielectric breakdown (HCIDB) challenges of a new high performance LDMOS generation
KR102435708B1 (en) Bidirectional Electrostatic Discharge Protection Device with Low On-Resistance and High Holding Voltage
Chen et al. Enhance Gate Reliability and Threshold Voltage Stability of p-GaN Gate High-Electron-Mobility Transistors

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant