CN106744674A - A kind of manufacture method of across the yardstick function micro-nano structure in surface - Google Patents
A kind of manufacture method of across the yardstick function micro-nano structure in surface Download PDFInfo
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- CN106744674A CN106744674A CN201710017428.0A CN201710017428A CN106744674A CN 106744674 A CN106744674 A CN 106744674A CN 201710017428 A CN201710017428 A CN 201710017428A CN 106744674 A CN106744674 A CN 106744674A
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- manufacture method
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
- B82B3/0009—Forming specific nanostructures
- B82B3/0014—Array or network of similar nanostructural elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
Abstract
The invention discloses a kind of manufacture method of across the yardstick function micro-nano structure in surface, the manufacture method step includes：First, matrix surface is scanned using millisecond pulse laser, processes micron scale construction figure；Then, using femtosecond pulse scanning it is machined go out micron scale construction figure, so as to micron scale construction patterned surface induction process nanoscale structures figure.The present invention is using millisecond pulse laser etching and the body structure surface micro-nano structure function manufacture method being combined with femtosecond laser induction, can complete surface micrometre-grade and nanoscale function microstructrue across yardstick, efficiently, low cost manufacture, processing efficiency is far above semiconductor technology, with more preferable application prospect.
Description
Technical field
A kind of material processing field of the present invention, and in particular to manufacture method of across the yardstick function micro-nano structure in surface.
Background technology
Body structure surface prepares micro-nano structure not to be possessed in itself to realize that functionalization can make body structure surface obtain structural material
Specific physical, can such as enable to possess high-absorbable to the metal surface of electromagnetic wave high reflectance originally, to solar spectrum
The metal surface of high reflection possesses superelevation absorptivity, makes the marine surface for having wellability higher to water possess super imbibition characteristic to drop
Low flow resistance etc., Stealth, drag reduction, solar heat protection, ship energy saving consumption reduction, high-efficiency solar absorb etc. field have it is important should
With.
However, prepared by body structure surface micro-nano structure function have larger technical barrier always, main cause is nanoscale
The processing of structure is needed using semiconductor technologies such as photoetching, corrosion, and apparatus expensive, process is complicated, with high costs, and producing efficiency
Very low, the exemplar size of preparation is smaller, it is impossible to meet the practical application request of the isometric larger object of aircraft.Additionally, also
Have difficult point be for micron order and nanoscale two kinds prepared across the mutually nested functional surface micro-nano structure of mesostructure,
There is presently no effective technological means and manufacturing process.
The content of the invention
The technical problem to be solved in the present invention is to overcome existing defect, there is provided a kind of across yardstick function micro-nano knot in surface
The manufacture method of structure.
In order to solve the above-mentioned technical problem, the invention provides following technical scheme：
A kind of manufacture method of across the yardstick function micro-nano structure in surface, step includes：
First, matrix surface is scanned using millisecond pulse laser, processes micron scale construction figure；
Then, using femtosecond pulse scanning it is machined go out micron scale construction figure, so as in micron scale construction figure table
Face induction processes nanoscale structures figure.
Preferably, during processing micron level structure figure, the pulse frequency of millisecond pulse laser is 100Hz-1KHz, scanning speed
It is 0.1mm/s-10mm/s to spend.
Preferably, when processing nanoscale structures figure, the pulse frequency of femtosecond pulse is 100Hz-100KHz, scanning
Speed is 0.5mm/s-50mm/s.
The present invention is using millisecond pulse laser etching and the body structure surface micro-nano structure work(being combined with femtosecond laser induction
Can manufacture method, can complete surface micrometre-grade and nanoscale function microstructrue across yardstick, efficiently, low cost manufacture.Laser
Process can be realized using high-speed vibrating mirror, therefore processing efficiency is far above semiconductor technology, and low cost, with more preferable
Application prospect.
Brief description of the drawings
Accompanying drawing is used for providing a further understanding of the present invention, and constitutes a part for specification, with reality of the invention
Applying example is used to explain the present invention together, is not construed as limiting the invention.In the accompanying drawings：
Fig. 1 is the process schematic diagram of across the yardstick function micro-nano structure in the surface of embodiment 1, wherein, 1 is undressed matrix
Surface, 2 is to add the cone-shaped structure of micron order that in matrix surface, and 3 is the nanometer induced in the cone-shaped structure of micron order
Level structure.
Fig. 2 is the process schematic diagram of across the yardstick function micro-nano structure in the surface of embodiment 2.
Specific embodiment
The preferred embodiments of the present invention are illustrated below in conjunction with accompanying drawing, it will be appreciated that preferred reality described herein
Apply example to be merely to illustrate and explain the present invention, be not intended to limit the present invention.
Embodiment 1
As shown in figure 1, it is 100 μ to use millisecond pulse laser, beam shape is modulated into the focal point length of side using triangle mask
The triangle hot spot of m, it is first along X-direction in the titanium alloy surface of 5mm using the power output of 200W, the pulse frequency of 1KHz
（Triangle hot spot base vertical direction）Upper use high-speed vibrating mirror is scanned, 100 μm of sweep span, speed 5mm/s.Complete whole
After Surface scan processing, then titanium alloy workpiece is rotated 90 °（Y-axis）, then it is scanned with same parameter again, it is finally completed
Taper microstructure（Cone）Lithography.
Then using femtosecond pulse, the pulse width of 150fs, the pulse frequency of 10KHz, 50 μm of spot size,
Irradiation, 50 μm of sweep span, speed are first scanned using high-speed vibrating mirror in the cone surface for having processed along X-direction
1mm/s.The whole Surface scan of Y direction is carried out again after completing whole Surface scan, is finally completed the Inducement fabrication of nano-micro structure.
Embodiment 2
As shown in Fig. 2 it is 300 μ to use millisecond pulse laser, beam shape is modulated into the focal point length of side using hourglass shape mask
The hourglass shape hot spot of m, it is first along X-direction in the aluminum alloy surface of 5mm using the power output of 200W, the pulse frequency of 1KHz
It is scanned using high-speed vibrating mirror, 300 μm of sweep span, speed 5mm/s.After completing the processing of whole Surface scan, then by aluminium alloy work
Part rotates 90 °（Y-axis）, then it is scanned with same parameter again, it has been finally completed the lithography of semicircle micro-structural.
Then using femtosecond pulse, the pulse width of 100fs, the pulse frequency of 12KHz, 100 μm of spot size,
Irradiation, sweep span 100 are first scanned using high-speed vibrating mirror in the semicircle micro-structure surface for having processed along X-direction
μm, speed 5mm/s.The whole Surface scan of Y direction is carried out again after completing whole Surface scan, is finally completed the induction system of nano-micro structure
Make.
Finally it should be noted that：The preferred embodiments of the present invention are the foregoing is only, are not intended to limit the invention,
Although being described in detail to the present invention with reference to the foregoing embodiments, for a person skilled in the art, it still may be used
Modified with to the technical scheme described in foregoing embodiments, or equivalent is carried out to which part technical characteristic.
All any modification, equivalent substitution and improvements within the spirit and principles in the present invention, made etc., should be included in of the invention
Within protection domain.
Claims (3)
1. a kind of manufacture method of across the yardstick function micro-nano structure in surface, step includes：
First, matrix surface is scanned using millisecond pulse laser, processes micron scale construction figure；
Then, using femtosecond pulse scanning it is machined go out micron scale construction figure, so as in micron scale construction figure table
Face induction processes nanoscale structures figure.
2. manufacture method according to claim 1, it is characterised in that：During processing micron level structure figure, millisecond pulse swashs
The pulse frequency of light is 100Hz-1KHz, and sweep speed is 0.1mm/s-10mm/s.
3. manufacture method according to claim 1, it is characterised in that：During processing nanoscale structures figure, femtosecond pulse swashs
The pulse frequency of light is 100Hz-100KHz, and sweep speed is 0.5mm/s-50mm/s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710017428.0A CN106744674A (en) | 2017-01-11 | 2017-01-11 | A kind of manufacture method of across the yardstick function micro-nano structure in surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710017428.0A CN106744674A (en) | 2017-01-11 | 2017-01-11 | A kind of manufacture method of across the yardstick function micro-nano structure in surface |
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| Publication Number | Publication Date |
|---|---|
| CN106744674A true CN106744674A (en) | 2017-05-31 |
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| CN201710017428.0A Pending CN106744674A (en) | 2017-01-11 | 2017-01-11 | A kind of manufacture method of across the yardstick function micro-nano structure in surface |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107390476A (en) * | 2017-08-10 | 2017-11-24 | 中国科学院上海光学精密机械研究所 | Across the scale lithography method of induced with laser |
| CN109473418A (en) * | 2018-10-17 | 2019-03-15 | 中南大学 | Copper-connection function microstructrue and preparation method thereof |
| CN109848551A (en) * | 2018-12-04 | 2019-06-07 | 北京航空航天大学 | A kind of method that ultrafast laser processing carbide-base ceramics surface micro-nano structure reduces light reflectivity |
| CN111515412A (en) * | 2020-05-12 | 2020-08-11 | 山东理工大学 | Cross-scale hierarchical microstructure creation method |
| CN112025098A (en) * | 2020-08-25 | 2020-12-04 | 湖北工业大学 | Preparation method of titanium alloy surface with low reflectivity to visible light |
| CN112276386A (en) * | 2020-10-29 | 2021-01-29 | 广东省科学院中乌焊接研究所 | Pre-welding pretreatment method and welding method for high-reflectivity metal material |
| CN112355484A (en) * | 2020-09-28 | 2021-02-12 | 天津津航技术物理研究所 | Surface periodic conical microstructure processing method based on Gaussian beam focusing direct writing |
| CN113579480A (en) * | 2021-07-29 | 2021-11-02 | 湖北工业大学 | Preparation method of composite structure for reducing surface light reflectivity of titanium alloy |
| CN115000203A (en) * | 2022-06-20 | 2022-09-02 | 山东大学 | Monocrystalline silicon micro-nano dual-scale antireflection suede and preparation method thereof |
| CN117505887A (en) * | 2023-10-31 | 2024-02-06 | 中国科学技术大学苏州高等研究院 | Zinc oxide semiconductor laser additive manufacturing system and process method |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107390476A (en) * | 2017-08-10 | 2017-11-24 | 中国科学院上海光学精密机械研究所 | Across the scale lithography method of induced with laser |
| CN109473418A (en) * | 2018-10-17 | 2019-03-15 | 中南大学 | Copper-connection function microstructrue and preparation method thereof |
| CN109848551A (en) * | 2018-12-04 | 2019-06-07 | 北京航空航天大学 | A kind of method that ultrafast laser processing carbide-base ceramics surface micro-nano structure reduces light reflectivity |
| CN111515412A (en) * | 2020-05-12 | 2020-08-11 | 山东理工大学 | Cross-scale hierarchical microstructure creation method |
| CN111515412B (en) * | 2020-05-12 | 2022-08-09 | 山东理工大学 | Cross-scale hierarchical microstructure creation method |
| CN112025098A (en) * | 2020-08-25 | 2020-12-04 | 湖北工业大学 | Preparation method of titanium alloy surface with low reflectivity to visible light |
| CN112355484A (en) * | 2020-09-28 | 2021-02-12 | 天津津航技术物理研究所 | Surface periodic conical microstructure processing method based on Gaussian beam focusing direct writing |
| CN112355484B (en) * | 2020-09-28 | 2022-10-18 | 天津津航技术物理研究所 | Surface periodic conical microstructure processing method based on Gaussian beam focusing direct writing |
| CN112276386A (en) * | 2020-10-29 | 2021-01-29 | 广东省科学院中乌焊接研究所 | Pre-welding pretreatment method and welding method for high-reflectivity metal material |
| CN113579480A (en) * | 2021-07-29 | 2021-11-02 | 湖北工业大学 | Preparation method of composite structure for reducing surface light reflectivity of titanium alloy |
| CN115000203A (en) * | 2022-06-20 | 2022-09-02 | 山东大学 | Monocrystalline silicon micro-nano dual-scale antireflection suede and preparation method thereof |
| CN115000203B (en) * | 2022-06-20 | 2023-11-21 | 山东大学 | Single crystal silicon micro-nano double-scale antireflection suede and preparation method thereof |
| CN117505887A (en) * | 2023-10-31 | 2024-02-06 | 中国科学技术大学苏州高等研究院 | Zinc oxide semiconductor laser additive manufacturing system and process method |
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