CN106711003A - Electron source generating device and electron beam control method - Google Patents
Electron source generating device and electron beam control method Download PDFInfo
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- CN106711003A CN106711003A CN201710082088.XA CN201710082088A CN106711003A CN 106711003 A CN106711003 A CN 106711003A CN 201710082088 A CN201710082088 A CN 201710082088A CN 106711003 A CN106711003 A CN 106711003A
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- diaphragm
- electron beam
- electron
- electromagnetic lens
- diaphragm group
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The present invention discloses an electron source generating device. The electron source generating device comprises an electron gun, an electrode, a diaphragm assembly and an electromagnetic lens; the electron gun is for emitting an electron beam; the electrode is used for accelerating the electron beam; the diaphragm assembly comprises a moving device and a plurality of diaphragm with different apertures; the moving device can be adjusted to control the accelerated electron beam to pass through one diaphragm in the diaphragm group; and the electromagnetic lens is used for converging the electron beam passing through the diaphragm so as to form an electron source. The embodiments of the present invention also disclose an electron beam control method.
Description
Technical field
The present invention relates to electron microscope field, more particularly to a kind of electronics source generating device and electron beam control method.
Background technology
The instrument detected to micro-object referred to as observation instrument, observation instrument experienced from the development of simple magnifying glass
To the Laser Scanning Confocal Microscope of scientific research level, the development of observation instrument is able to observe more and more microcosmic object, i.e., constantly
Improve microscopical resolution ratio；But, due to the presence of diffraction effect, the resolution ratio of light microscope is limited in half light wave
Magnitude long, about 200nm.
Electron microscope, such as SEM (Scanning Electron are occurred in that in the sixties in 20th century
Microscope, SEM), transmission electron microscope (Transmission Electron Microscope, TEM), scanning transmission
Electron microscope (Scanning Transmission Electron Microscope, STEM) etc.；With light microscope phase
Than, the electronics in electron microscope is by having the energy higher than photon after acceleration, the matter wave according to Broglie is theoretical,
The wavelength that electron institute has is much smaller than optical wavelength, therefore, electron microscope has the resolution ratio higher than light microscope.
The resolution sizes of electron microscope depend on being irradiated to the size of the beam spot being observed on object；Therefore,
How to reduce beam spot diameter, of the electron irradiation to object is to improve the problem that electron microscope resolving power is studied always；Usual feelings
Under condition, determining the factor of electronics convergent beams spot diameter size includes：Source electron beam dimensions, lens aberration and convergent mirror diaphragm are to electricity
The diffraction size of beamlet；It is desired, however, to obtain during resolution ratio higher, the Coulomb interactions between electronics and electronics also become
Particularly important, the Coulomb force between electronics and electronics enables to beam spot to spread；Therefore, the coulomb between electronics and electronics is mutual
Effect causes that electron microscope cannot simultaneously have high flux and high-resolution.Therefore, how to realize that electron microscope has height concurrently
Flux and high-resolution turn into the problem of urgent need to resolve.
The content of the invention
In view of this, the embodiment of the present invention is expected to provide a kind of electronics source generating device and electron beam control method, can
The characteristics of realization is provided simultaneously with high flux and high-resolution using the electron microscope of the electronics source generating device.
What the technical scheme of the embodiment of the present invention was realized in：
The embodiment of the present invention provides electronics source generating device, and described device includes：Electron gun, electrode, diaphragm group and electromagnetism
Lens；Wherein,
The electron gun, for launching electronics beam；
The electrode, for accelerating to the electron beam；
The diaphragm group includes the diaphragm of a mobile device and multiple different pore sizes, by adjusting the mobile device control
Electron beam after system acceleration is by a diaphragm in the diaphragm group；
The electromagnetic lens, for entering line convergence to the electron beam by the diaphragm, forms electron source.
In such scheme, the electrode includes drawing pole and anode.
In such scheme, the mobile device includes：First motor and the second motor；Wherein,
First motor is used to control the diaphragm to be moved in X-direction, and second motor is used to control the diaphragm
Move in the Y direction.
In such scheme, the multiple different pore size diaphragm is the diaphragm of the multiple different pore sizes of at least one row.
In such scheme, the electromagnetic lens is the lens of current excitation, and institute is changed by the size for adjusting exciting current
State the focus strength of electromagnetic lens.
In such scheme, the covering of convergence the magnetic field electron gun and the diaphragm group that the electromagnetic lens is produced, and institute
Diaphragm group is stated positioned at the center of convergence magnetic field Distribution of Magnetic Field.
The embodiment of the present invention also provides a kind of electron beam control method, and methods described includes：The electron beam of electron gun transmitting
Accelerated through electrode；
A diaphragm in controlling the electron beam after the acceleration to pass through multiple different pore size diaphragms of diaphragm group；
Line convergence is entered to the electron beam by the diaphragm group using electromagnetic lens.
In such scheme, the diaphragm group also includes mobile device, and the electron beam after the control acceleration passes through light
A diaphragm in multiple different pore size diaphragms of door screen group, including：
The mobile device is controlled to be moved with Y-direction in X direction so that the electron beam after the acceleration is by the diaphragm
One diaphragm of group.
In such scheme, the multiple different pore size diaphragm is the diaphragm of the multiple different pore sizes of at least one row.
In such scheme, the utilization electromagnetic lens enters line convergence to the electron beam by the diaphragm group, including：
The exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens；
By the electron beam of the diaphragm group electron beam is formed after the electromagnetic lens with the focus strength is assembled.
In such scheme, the covering of convergence the magnetic field electron gun and the diaphragm group that the electromagnetic lens is produced, and institute
Diaphragm group is stated positioned at the center of convergence magnetic field Distribution of Magnetic Field.
Electronics source generating device and electron beam control method that the embodiment of the present invention is provided, described device include：Electronics
Rifle, electrode, diaphragm group and electromagnetic lens；Wherein, the electron gun, for launching electronics beam；The electrode, for the electricity
Beamlet is accelerated；The diaphragm group includes the diaphragm of a mobile device and multiple different pore sizes, adjusts the mobile device
The electron beam after accelerating is controlled by a diaphragm of the diaphragm group；The electromagnetic lens, for by the diaphragm
Electron beam enters line convergence, forms electron source；In this way, the electron beam after adjusting the mobile device to control acceleration is by described
A diaphragm in diaphragm group in multiple different pore size diaphragms adjusts the size of the electron beam spot；The electromagnetic lens is produced
The raw covering of convergence the magnetic field electron gun and the diaphragm group so that electromagnetic lens is just subject to when electron gun produces electron beam
The effect in the convergence magnetic field of generation and enter line convergence, be provided simultaneously with high flux using the electron microscope of the electronics source generating device
And the characteristics of high-resolution.
Brief description of the drawings
Fig. 1 is the composition structural representation of SEM；
Fig. 2 is the composition structural representation of embodiment of the present invention electronics source generating device；
Fig. 3 is the composition structural representation of embodiment of the present invention diaphragm；
Fig. 4 is the schematic diagram that embodiment of the present invention mobile device moves control to the diaphragm；
Fig. 5 is the composition structure and electron beam of the SEM using embodiment of the present invention electronics source generating device
Path schematic diagram；
Fig. 6 is the handling process schematic diagram that the present invention implements electron beam control method.
Specific embodiment
In order to be better understood from the embodiment of the present invention, SEM of the prior art is carried out simply below
Explanation；The composition structural representation of SEM in the prior art, as shown in figure 1, electron gun 101 launches electron beam
103, electron beam 103 is accelerated through drawing pole and anode (not shown in figure 1), the diaphragm 102 fixed using a pore size
Electron beam is limited；Electron beam enters line convergence by electromagnetic lens (i.e. rifle mirror) again, the central part of the electron beam after convergence
Divide and pass through lens barrel diaphragm 106；Exposed to after the electron beam 107 of lens barrel diaphragm 106 is focused on through electromagnetic lens (i.e. object lens) again
On sample 109.When SEM has high current, the electronics in electron beam is moving to lens barrel from rifle diaphragm 102
During diaphragm 106, because the Coulomb interactions between electronics cause that the electron beam spot of final focusing spreads, electron beam
Compare fuzzy.
Below according to Figure of description and embodiment, the present invention is further elaborated.
The embodiment of the present invention provides a kind of electronics source generating device, the composition structure of the electronics source generating device, such as Fig. 2
It is shown, including：Electron gun 21, electrode 22, diaphragm group 23 and electromagnetic lens 24；Wherein,
The electron gun 21, for launching electronics beam；
The electrode 22, for accelerating to the electron beam, the electrode includes：Draw pole 221 and anode 222；
The diaphragm group 23 includes the diaphragm 232 of a mobile device 231 and multiple different pore sizes, by adjusting the shifting
Electron beam after the dynamic control of device 231 acceleration is by a diaphragm in the diaphragm group 23；
The electromagnetic lens 24, for entering line convergence to the electron beam by the diaphragm, forms electron source.
In a specific embodiment, the mobile device 231 includes the first motor 2311 and the second motor 2312；Its
In, first motor is used to control the diaphragm to be moved in X-direction, and second motor is used to control the diaphragm in Y side
To movement；
Here, the mobile device passes through a movable sealing device and first motor 2311 and second motor
2312 are attached；The movable sealing device can be bellows.
In a specific embodiment, the electromagnetic lens 24 is the lens of current excitation, by adjusting exciting current
Size changes the focus strength of the electromagnetic lens；What the electromagnetic lens was produced assembles the rifle that magnetic field covers the electron gun 21
Sharp and described diaphragm group 23 so that electron gun just enters when electron beam is produced because of the effect in the convergence magnetic field that electromagnetic lens is produced
Line convergence, is advantageously implemented bigger current density, that is, realize high flux.
In a specific embodiment, the diaphragm group is located at the center of convergence magnetic field Distribution of Magnetic Field so that
When the magnetic field of electromagnetic lens changes, can just be changed in the larger context by the electron beam of diaphragm.
In the embodiment of the present invention, the composition structural representation of the diaphragm 232, as shown in Figure 3；Wherein, Fig. 3 a are a row
Diaphragm with multiple different pore sizes, and the center of multiple apertures is conllinear；The diameter range of aperture is 5 microns to 500 micro-
Rice, the diameter of aperture can be distributed by arithmetic progression, and the number of aperture can flexibly set according to actual needs.Fig. 3 b are two
Row identical has the diaphragm of multiple different pore sizes, diaphragm of each column diaphragm with multiple different pore sizes, and multiple apertures
Center is conllinear；The diameter range of aperture is 5 microns to 500 microns, and the diameter of aperture can be distributed by arithmetic progression, diaphragm
The number in hole can flexibly set according to actual needs.
In the embodiment of the present invention, the mobile device moves the schematic diagram of control to the diaphragm, as shown in figure 4,
Cause that the diaphragm is moved in X-direction by the first motor of control 2311, the diaphragm is caused by the second motor of control 2312
Move in the Y direction, and then choose the optical axial center that the diaphragm in a certain aperture is in electron beam, so as to regulate and control electron beam spot
Size and size of current.
Using the composition structure and electron beam of the SEM of electronics source generating device described in the embodiment of the present invention
Path schematic diagram, as shown in Figure 5；Wherein, electron gun 501 produces an electron beam 503, and the electron beam 503 is by diaphragm group
A diaphragm after, then by lens barrel diaphragm 506；After the electron beam 507 of the lens barrel diaphragm 506 is focused on through object lens 508
It is irradiated on sample to be scanned 509.Be located in SEM of the prior art shown in Fig. 1 shown in rifle diaphragm 102
Compared with the quantity of the electronics 105 between lens barrel diaphragm 106, in electron scanning electron microscope described in the embodiment of the present invention
The negligible amounts of the electronics 505 between rifle diaphragm 510 and lens barrel diaphragm 506, and then reduce between electronics and electronics
Coulomb interactions so that the beam spot converged on sample 509 reduces, and improves the resolution ratio of SEM.
Above-mentioned electronics source generating device based on the embodiment of the present invention, the embodiment of the present invention also provides a kind of electron beam control
Method, the handling process of the electron beam control method, as shown in fig. 6, comprising the following steps：
Step 101, the electron beam of electron gun transmitting is accelerated through electrode；
Here, the electrode includes drawing pole and anode.
Step 102, controls the electron beam after the acceleration to pass through a light in multiple different pore size diaphragms of diaphragm group
Door screen；
Here, the diaphragm group includes the diaphragm of a mobile device and multiple different pore sizes, by adjusting the movement
Electron beam after device control acceleration is by a diaphragm in the diaphragm group；
Wherein, the mobile device includes the first motor and the second motor, and first motor is used to control the diaphragm
In X-direction movement, second motor is used to control the diaphragm to move in the Y direction；And then choose at the diaphragm in a certain aperture
In the optical axial center of electron beam, so as to regulate and control electron beam spot size and size of current；The mobile device can by one
Moving sealing device is attached with first motor and second motor；The movable sealing device can be ripple
Pipe.
In the embodiment of the present invention, the composition structural representation of the diaphragm, as shown in Figure 3；Wherein, Fig. 3 a are that a row have
The diaphragm of multiple different pore sizes, and the center of multiple apertures is conllinear；The diameter range of aperture is 5 microns to 500 microns, light
The diameter in late hole can be distributed by arithmetic progression, and the number of aperture can flexibly set according to actual needs.Fig. 3 b are two row phases
The center of the same diaphragm with multiple different pore sizes, diaphragm of each column diaphragm with multiple different pore sizes, and multiple apertures
Collinearly；The diameter range of aperture is 5 microns to 500 microns, and the diameter of aperture can be distributed by arithmetic progression, aperture
Number can flexibly set according to actual needs.
Step 103, line convergence is entered using electromagnetic lens to the electron beam that electron gun is launched；
Specifically, the exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens, it is right
The electronics that electron gun is launched enters line convergence；.
Here, the electromagnetic lens is produced the covering of convergence the magnetic field electron gun and the diaphragm group so that electron gun
Just enter line convergence because of the effect in the convergence magnetic field that electromagnetic lens is produced when electron beam is produced, be advantageously implemented bigger electric current
Density, that is, realize high flux；The diaphragm group causes the magnetic of electromagnetic lens positioned at the center of convergence magnetic field field distribution
When field changes, can just be changed in the larger context by the electron beam of diaphragm.
Presently preferred embodiments of the present invention is the foregoing is only, is not intended to limit the scope of the present invention.
Claims (11)
1. a kind of electronics source generating device, it is characterised in that described device includes：Electron gun, electrode, diaphragm group and electromagnetism are saturating
Mirror；Wherein,
The electron gun, for launching electronics beam；
The electrode, for accelerating to the electron beam；
The diaphragm group includes the diaphragm of a mobile device and multiple different pore sizes, controls to add by adjusting the mobile device
Electron beam after speed is by a diaphragm in the diaphragm group；
The electromagnetic lens, for entering line convergence to the electron beam by the diaphragm, forms electron source.
2. device according to claim 1, it is characterised in that the electrode includes drawing pole and anode.
3. device according to claim 1 and 2, it is characterised in that the mobile device includes：First motor and the second horse
Reach；Wherein,
First motor is used to control the diaphragm to be moved in X-direction, and second motor is used to control the diaphragm in Y side
To movement.
4. device according to claim 1 and 2, it is characterised in that the multiple different pore size diaphragm is that at least one row are more
The diaphragm of individual different pore size.
5. device according to claim 1 and 2, it is characterised in that the electromagnetic lens is the lens of current excitation, is passed through
The size for adjusting exciting current changes the focus strength of the electromagnetic lens.
6. device according to claim 1 and 2, it is characterised in that the convergence magnetic field covering institute that the electromagnetic lens is produced
Electron gun and the diaphragm group are stated, and the diaphragm group is located at the center of convergence magnetic field Distribution of Magnetic Field.
7. a kind of electron beam control method, it is characterised in that methods described includes：
The electron beam of electron gun transmitting is accelerated through electrode；
A diaphragm in controlling the electron beam after the acceleration to pass through multiple different pore size diaphragms of diaphragm group；
Line convergence is entered to the electron beam by the diaphragm group using electromagnetic lens.
8. method according to claim 7, it is characterised in that the diaphragm group also includes mobile device, the control institute
A diaphragm in multiple different pore size diaphragms that the electron beam after accelerating passes through diaphragm group is stated, including：
The mobile device is controlled to be moved with Y-direction in X direction so that the electron beam after the acceleration is by the diaphragm group
One diaphragm.
9. the method according to claim 7 or 8, it is characterised in that the multiple different pore size diaphragm is that at least one row are more
The diaphragm of individual different pore size.
10. the method according to claim 7 or 8, it is characterised in that the utilization electromagnetic lens is to by the diaphragm group
Electron beam enter line convergence, including：
The exciting current size of the electromagnetic lens is adjusted to change the focus strength of the electromagnetic lens；
By the electron beam of the diaphragm group electron beam is formed after the electromagnetic lens with the focus strength is assembled.
11. method according to claim 7 or 8, it is characterised in that the convergence magnetic field covering institute that the electromagnetic lens is produced
Electron gun and the diaphragm group are stated, and the diaphragm group is located at the center of convergence magnetic field Distribution of Magnetic Field.
Priority Applications (1)
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| CN201710082088.XA CN106711003B (en) | 2017-02-15 | 2017-02-15 | A kind of electronics source generating device and electron beam control method |
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| CN201710082088.XA CN106711003B (en) | 2017-02-15 | 2017-02-15 | A kind of electronics source generating device and electron beam control method |
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| CN106711003B CN106711003B (en) | 2019-03-19 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107919258A (en) * | 2017-09-28 | 2018-04-17 | 浙江大学 | A kind of device and method for producing controllable vortex electron beam |
| CN109300760A (en) * | 2017-07-25 | 2019-02-01 | 东方晶源微电子科技（北京）有限公司 | Beam control apparatus and method, electron beam imaging module, Electron-beam measuring equipment |
| CN110676147A (en) * | 2019-11-14 | 2020-01-10 | 河南河大科技发展有限公司 | Diaphragm device of movable diaphragm of transmission electron microscope |
| CN111615651A (en) * | 2018-11-02 | 2020-09-01 | 伟摩有限责任公司 | Parallax compensating spatial filter |
| CN114200504A (en) * | 2021-12-13 | 2022-03-18 | 中国核动力研究设计院 | Electron beam generator for simulating beta radiation source and testing method |
| WO2022194300A1 (en) * | 2021-09-03 | 2022-09-22 | 聚束科技私人有限公司 | Electron beam generating device and electron microscope |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05182624A (en) * | 1992-01-07 | 1993-07-23 | Jeol Ltd | Objective diaphragm |
| JPH05217536A (en) * | 1992-02-03 | 1993-08-27 | Hitachi Ltd | Throttle device for electron microscope |
| JPH09167591A (en) * | 1995-12-15 | 1997-06-24 | Hitachi Ltd | Scanning emission electron microscope |
| CN101388317A (en) * | 2008-03-21 | 2009-03-18 | 北京威孚物理科技有限公司 | Scanning electronic microscope |
| CN102163529A (en) * | 2011-03-15 | 2011-08-24 | 北京航空航天大学 | Movable diaphragm device for condensing mirror of electron microscope |
| CN103456589A (en) * | 2012-05-31 | 2013-12-18 | 睿励科学仪器（上海）有限公司 | Diaphragm for adjusting particle beam with multipole lenses and device including same |
| CN206451682U (en) * | 2017-02-15 | 2017-08-29 | 聚束科技（北京）有限公司 | A kind of electronics source generating device |
-
2017
- 2017-02-15 CN CN201710082088.XA patent/CN106711003B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05182624A (en) * | 1992-01-07 | 1993-07-23 | Jeol Ltd | Objective diaphragm |
| JPH05217536A (en) * | 1992-02-03 | 1993-08-27 | Hitachi Ltd | Throttle device for electron microscope |
| JPH09167591A (en) * | 1995-12-15 | 1997-06-24 | Hitachi Ltd | Scanning emission electron microscope |
| CN101388317A (en) * | 2008-03-21 | 2009-03-18 | 北京威孚物理科技有限公司 | Scanning electronic microscope |
| CN102163529A (en) * | 2011-03-15 | 2011-08-24 | 北京航空航天大学 | Movable diaphragm device for condensing mirror of electron microscope |
| CN103456589A (en) * | 2012-05-31 | 2013-12-18 | 睿励科学仪器（上海）有限公司 | Diaphragm for adjusting particle beam with multipole lenses and device including same |
| CN206451682U (en) * | 2017-02-15 | 2017-08-29 | 聚束科技（北京）有限公司 | A kind of electronics source generating device |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109300760A (en) * | 2017-07-25 | 2019-02-01 | 东方晶源微电子科技（北京）有限公司 | Beam control apparatus and method, electron beam imaging module, Electron-beam measuring equipment |
| CN109300760B (en) * | 2017-07-25 | 2020-10-09 | 东方晶源微电子科技（北京）有限公司 | Electron beam control device and method, electron beam imaging module, and electron beam inspection apparatus |
| CN107919258A (en) * | 2017-09-28 | 2018-04-17 | 浙江大学 | A kind of device and method for producing controllable vortex electron beam |
| CN107919258B (en) * | 2017-09-28 | 2020-06-05 | 浙江大学 | Device and method for generating controllable vortex electron beam |
| CN111615651A (en) * | 2018-11-02 | 2020-09-01 | 伟摩有限责任公司 | Parallax compensating spatial filter |
| CN111615651B (en) * | 2018-11-02 | 2022-08-16 | 伟摩有限责任公司 | Parallax compensating spatial filter |
| US11561284B2 (en) | 2018-11-02 | 2023-01-24 | Waymo Llc | Parallax compensating spatial filters |
| CN110676147A (en) * | 2019-11-14 | 2020-01-10 | 河南河大科技发展有限公司 | Diaphragm device of movable diaphragm of transmission electron microscope |
| WO2022194300A1 (en) * | 2021-09-03 | 2022-09-22 | 聚束科技私人有限公司 | Electron beam generating device and electron microscope |
| CN114200504A (en) * | 2021-12-13 | 2022-03-18 | 中国核动力研究设计院 | Electron beam generator for simulating beta radiation source and testing method |
| CN114200504B (en) * | 2021-12-13 | 2024-04-30 | 中国核动力研究设计院 | Electron beam generator for simulating beta radiation source and testing method |
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