CN106707391B - Dual band pass cut-off type composite filter film, optical filter and preparation method thereof - Google Patents
Dual band pass cut-off type composite filter film, optical filter and preparation method thereof Download PDFInfo
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- CN106707391B CN106707391B CN201611102823.0A CN201611102823A CN106707391B CN 106707391 B CN106707391 B CN 106707391B CN 201611102823 A CN201611102823 A CN 201611102823A CN 106707391 B CN106707391 B CN 106707391B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
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Abstract
Dual band pass cut-off type composite filter film provided by the invention, film structure are (LH)S；Wherein, L is silica coating；H is titanium pentoxide film layer, and S is periodicity, value 21-23；The film layer adjacent with substrate is the 1st layer, using titanium pentoxide film layer, geometric thickness 177-178nm；Outermost layer is 2S layers, using silica coating, geometric thickness 178-179nm；In 2-S layers, even level is silica coating, and the geometric thickness of even level is 50-101nm, and odd-level is titanium pentoxide film layer, and the geometric thickness of odd-level is 30-50nm.The present invention also provides the optical filter for having above-mentioned filter coating with and preparation method thereof.Can be realized aircraft cockpit illumination through the invention does not interfere night vision goggles externally to observe, while nor affecting on the naked eye to instrument in cockpit, improves the night observation ability of pilot.
Description
Technical field
The present invention relates to optics technical field of membrane more particularly to a kind of dual band pass cut-off type composite filter film, optical filter and
Preparation method.
Background technique
Pilot is influenced by instrument in cabin lights and cockpit in order to make its vision not in night flying, needs to wear
Wear night vision goggles.C class NVIS (night vision system) dual band pass cut-off type composite filter film may be implemented aircraft cockpit illumination do not interfere it is winged
Office staff externally observes, while nor affecting on its naked eye to instrument in cockpit, realizes night viewing compatible.Therefore, such night vision
Mirror can be used for the night viewing compatible repacking of servicing aircraft, or configure for pilot, to improve the night flying device control of pilot
It is horizontal.But the film structure of existing C class NVI S dual band pass cut-off type composite filter film is complicated, leads to its preparation process
Difficulty, so that the functional lability of manufactured filter coating.As it can be seen that there are membrane system knots for existing dual band pass cut-off type composite filter mating plate
Structure is unreasonable, prepares difficult problem.
Summary of the invention
The object of the present invention is to provide dual band pass cut-off type composite filter films, can effectively filter cabin intraoral illumination light wave,
To prevent aircraft cockpit from illuminating the influence to eyes；The light that the night vision system of aircraft can be made to generate simultaneously penetrates.
In order to achieve the above object, the invention provides the following technical scheme:
Dual band pass cut-off type composite filter film, film structure are to meet the periodic membrane stack in λ/4 (LH)S,
Wherein, L is silica coating；H is titanium pentoxide film layer, and S is periodicity, value 21-23；With substrate phase
Adjacent film layer is the 1st layer, and using titanium pentoxide film layer, the 1st layer of the geometric thickness is 177-178nm；Outermost layer is
2S layers, using silica coating, 2S layers of the geometric thickness is 178-179nm；In 2-S layers, even level is two
Membranous layer of silicon oxide, the geometric thickness of even level are 50-101nm, and odd-level is titanium pentoxide film layer, and the geometry of odd-level is thick
Degree is 30-50nm.
Preferably, S value is 22.
Filter coating made of the present invention, transmitance maximum value is lower than 2% in wave band 540-585nm, in 653-671nm
The transmitance for locating any wavelength has any to reach the transmitance of 50%, 671-725nm wave band at least more than 50%.725-
The transmitance of 950nm wave band is at least more than 92%, and transmitance is averagely greater than 97%, and infrared band can almost penetrate.
In a preferred embodiment, the 1st layer of geometric thickness is 177.05nm；2nd layer of geometric thickness is
75.76nm；
3rd layer of geometric thickness is 37.27nm；4th layer of geometric thickness is 78.89nm；
5th layer of geometric thickness is 47.18nm；6th layer of geometric thickness is 53.49nm；
7th layer of geometric thickness is 38.58nm；8th layer of geometric thickness is 82.23nm；
9th layer of geometric thickness is 46.44nm；10th layer of geometric thickness is 88.18nm；
The geometric thickness of 11th layer is 51.41nm；12nd layer of geometric thickness is 92.54nm；
13rd layer of geometric thickness is 51.8nm；14th layer of geometric thickness is 83.65nm；
15th layer of geometric thickness is 38.36nm；16th layer of geometric thickness is 59.64nm；
17th layer of geometric thickness is 35.24nm；18th layer of geometric thickness is 75.89nm；
19th layer of geometric thickness is 49.73nm；20th layer of geometric thickness is 94.78nm；
21st layer of geometric thickness is 53.36nm；22nd layer of geometric thickness is 94.84nm；
23rd layer of geometric thickness is 53.07nm；24th layer of geometric thickness is 93.91nm；
25th layer of geometric thickness is 49.13nm；26th layer of geometric thickness is 77.24nm；
27th layer of geometric thickness is 30.12nm；28th layer of geometric thickness is 55.92nm；
29th layer of geometric thickness is 42.28nm；30th layer of geometric thickness is 85.93nm；
31st layer of geometric thickness is 51.6nm；32nd layer of geometric thickness is 97.17nm；
33rd layer of geometric thickness is 54.09nm；34th layer of geometric thickness is 97.98nm；
35th layer of geometric thickness is 53.76nm；36th layer of geometric thickness is 95.61nm；
37th layer of geometric thickness is 53.04nm；38th layer of geometric thickness is 100.15nm；
39th layer of geometric thickness is 53.93nm；40th layer of geometric thickness is 92.96nm；
41st layer of geometric thickness is 51.64nm；42nd layer of geometric thickness is 88.44nm；
43rd layer of geometric thickness is 48.43nm；44th layer of geometric thickness is 178.8nm.
The thickness of film layer each in membrane system is optimized in this embodiment, achieves following functions: in wave band
The maximum value of 450-520nm, 565-585nm transmitance is lower than 0.5%；Transmitance maximum value is lower than in wave band 540-550nm
2%；The wavelength transmitance at any point reaches 50% in 653-671nm wave band；Transmitance at 671-725nm is at least
Higher than 50%, transmitance is averagely greater than 85%；It is at least above 92% in the transmitance of 725-950nm wave band, transmitance is average big
In 97%.
Wave band 450-520nm and 565-585nm are the wave band of cabin intraoral illumination light source, therefore in Film Design, are needed
The light source of the wave band is filtered.Membrane system in through the invention can be filtered effectively, and transmitance is only 0.5%, be avoided
The influence of engine room inside lighting source.540-550nm is green light band, is the sensitive band of vision, is mainly used for referring in cabin
Show lamp, signal lamp, backlight, transmitance is only 2%, can reduce its influence and eyesight to night vision system and pay attention to
To its presence.Information display devices in aircraft cockpit have higher radiation energy near infrared band, these radiation enter
Night vision imaging device can activate its AGC system, lead to the sensitivity decrease of night vision device, cannot see scape out of my cabin clearly
Object, to lose night vision function.The wave band transmitance of the arbitrary point 653-671nm reaches 50%, reduces the letter in aircraft cockpit
The radiation energy of display device is ceased, but also partially can enter filter coating, guarantees that pilot is able to observe that the information displays such as instrument.
725-950nm wave band be long-wave band, almost can through the invention membrane system filtering, make the present invention by connection external equipment benefit
Infrared viewing is realized with photoelectric image transfer principle.
The present invention provides a kind of dual band pass cut-off type composite filter mating plate, further includes optical glass base using above-mentioned membrane system
Piece covers the 1st tunic layer in above-mentioned membrane system on the substrate.
The present invention also provides the preparation methods of dual band pass cut-off type composite filter mating plate, comprising the following steps:
Step S101, cleaning substrate；
Step S102, substrate is put into vacuum chamber, is evacuated to 2 × 10-2Pa heats the substrate to 170 DEG C -200
℃；
Step S103 is coated with the 1st tunic layer, fritting is carried out to titanium pentoxide coating materials particle, with five oxidations after fritting
Tritanium/Trititanium coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-2Pa, ion bombardment voltage 600V-1kV negative high voltage, when from hitting
Between be 15mi n-20mi n, make titanium pentoxide coating materials ion deposition on substrate, supervised using quartz crystal monitoring and optics
The method of control determines the thickness of the 1st tunic layer；
Step S104 is coated with the 2nd tunic layer, fritting is carried out to silica coating materials particle, with the silica after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-1Pa, ion bombardment voltage 400V-800V negative high voltage, from hitting the time
For 10min-15min, make silica coating materials ion deposition on substrate, using the side of quartz crystal monitoring and optical monitoring
Method determines the thickness of the 2nd tunic layer；
Step S105 is coated with the 3rd tunic layer, fritting is carried out to titanium pentoxide coating materials particle, with five oxidations after fritting
Tritanium/Trititanium coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-1Pa, ion bombardment voltage 200V-600V negative high voltage, from hitting
Time is 10min-15min, makes titanium pentoxide coating materials ion deposition on substrate, is supervised using quartz crystal monitoring and optics
The method of control determines the thickness of the 3rd tunic layer；
Step S106 is repeated in step S104 and step S105, is coated with the 4th~43 tunic layer；
Step S107 is coated with the 44th tunic layer, fritting is carried out to silica coating materials particle, with the silica after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-2Pa, ion bombardment voltage 600V-1kV negative high voltage are from the time is hit
15min-20min makes silica coating materials ion deposition on substrate, using the method for quartz crystal monitoring and optical monitoring
Determine the thickness of the 44th tunic layer；
Step S108 will be coated with and complete the optical filters of 44 tunic layers to be placed in vacuum chamber in 200 DEG C of temperature heat preservation 2 small
When, it takes out after cooled to room temperature.
In a kind of preferred embodiment, in step S103- step S107 further include: ion aids precipitation；It is using
Coating materials to substrate carry out ion bombardment while, by ion beam bombardment substrate surface deposit ion.Pass through ion beam
Momentum transfer makes to deposit the bigger kinetic energy of ion acquisition, to improve the consistency of film layer.
In a kind of preferred embodiment, include: in step S108
Step S1081, the optical filter that will be coated with 44 tunic layers of completion, which is placed in vacuum chamber in 200 DEG C of temperature, keeps the temperature 2
Hour, 100 DEG C are down to vacuum room temperature and is inflated hereinafter, opening vent valve into vacuum chamber, and vacuum room pressure and atmosphere are made
Press it is equal, and place 2 hours；
Step S1082 toasts optical filter under atmospheric pressure environment, toasts 2 hours in 200 DEG C of temperature.Pass through
It is toasted in atmospheric pressure, aging process is carried out to optical filter, prevents wavelength drift after the completion of being coated with.
The optical filter made leaves vacuum chamber and exposed to weather, and film layer makes to filter due to absorbing the aqueous vapor in air
The central wavelength of piece is elongated.This is because absorbing aqueous vapor causes the effective refractive index change of film layer, effective optical thickness
It changes, leads to wavelength drift.In this step, by toasting optical filter in an atmosphere, make the aqueous vapor entered in film layer evaporation,
The gather density for improving film layer on optical filter simultaneously, prevents wavelength drift after the completion of being coated with.
The invention has the benefit that
In the present invention, filter coating is interacted (LH) that superposition is formed by silica coating with titanium pentoxide film layerSFilm
System, all carries out strict control to the thickness of each film layer, makes it in the transmitance maximum value of wave band 450-585nm lower than 0.5%,
At 653-671nm the transmitance of any wavelength to a little less transmitance for reaching 50%, 671-725nm wave band at least more than
50%.For the transmitance of 725-950nm wave band at least more than 92%, transmitance is averagely greater than 97%, can be realized aircraft cockpit photograph
It is bright not interfere night vision goggles externally to observe, while the naked eye to instrument in cockpit is nor affected on, the night for improving pilot is seen
Examine ability.
Filter coating of the invention is coated on to the surface of optical glass, forms optical filtering, optical filter can be used as, can be used
In night vision goggles.
The preparation method of optical filter provided by the invention is passed through simultaneously using ion bombardment plated film, and according to thicknesses of layers
The method of quartz crystal monitoring and optical monitoring obtains more accurate thickness control result and the matching of good stress in thin film
Property, it finally ensure that the physics and optical property of entire membrane system.Meanwhile using ion source aids precipitation plated film and aging process,
Prevent wavelength drift after the completion of being coated with.
Detailed description of the invention
It in order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, below will be to institute in embodiment
Attached drawing to be used is needed to be briefly described.
Fig. 1 is the measured spectra curve of optical filter；
Fig. 2 is the part 540nm-550nm measured spectra curve；
Fig. 3 is the part 635nm-950nm measured spectra curve.
Specific embodiment
Below in conjunction with attached drawing of the invention, technical solution of the present invention is clearly and completely described, it is clear that institute
The embodiment of description is only the utility model a part of the embodiment, instead of all the embodiments.Based on the reality in the present invention
Example is applied, every other embodiment obtained by those of ordinary skill in the art without making creative efforts all belongs to
In the scope of protection of the invention.
A kind of dual band pass cut-off type composite filter mating plate, including 44 tunic layers and light glass substrate are provided in the present embodiment.
The film structure of 44 above-mentioned tunic layers meets the periodic membrane stack in λ/4 (LH)S.Wherein, L is silica coating；H is five oxygen
Change Tritanium/Trititanium film layer, S is periodicity, value 22.In 1-44 tunic layer, odd-level is titanium pentoxide film layer, even number
Layer is silica coating, and each layer of geometric thickness is specifically such as table 1.
The thickness of film layer each in membrane system is optimized in this embodiment, achieves following functions: in wave band
Transmitance maximum value is lower than 2% in 540-585nm；Wavelength transmitance in 653-671nm wave band more at least can reach
To 50%；Transmitance at 671-725nm is at least above 50%, and transmitance is averagely greater than 85%；In 725-950nm wave band
Transmitance is at least above 92%, and transmitance is averagely greater than 97%.
Table 1
Wave band 450-520nm and 565-585nm are the wave band of cabin intraoral illumination light source.Membrane system energy in through the invention
Enough effectively filterings, transmitance is only 0.5%, avoids the influence of engine room inside lighting source.540-550nm is green light band,
For the sensitive band of vision, it is mainly used for indicator light in cabin, signal lamp, backlight, transmitance is only 2%, and it is right can to reduce its
The influence of night vision system, and can guarantee that eyesight can be noted that its presence.Information display devices in aircraft cockpit are in near-infrared
Wave band has higher radiation energy, these radiation wave bands are between 653-671nm.In this example, the arbitrary point 653-671nm
Wave band transmitance is only 50%, reduces its radiation energy, but part also can enter filter coating, guarantee that pilot is able to observe that instrument
Equal information displays.725-950nm wave band be long-wave band, almost can through the invention membrane system filtering, can be by this reality
It applies example combination other component and realizes infrared viewing.
The preparation method of the dual band pass cut-off type composite filter mating plate of above-described embodiment, comprising the following steps:
Step S101, cleaning substrate, and clean substrate is put into fixture.
Step S102, substrate is put into vacuum chamber, is opened vacuum valve, is made the indoor vacuum degree 2 × 10 of vacuum- 2Pa opens baking switch, heats substrate to 170 DEG C -200 DEG C.
Step S103 is coated with the 1st tunic layer, carries out fritting to titanium pentoxide coating materials particle, the gas for adsorbing coating materials
It releases, to reduce impurity.Ion bombardment is carried out to substrate with the titanium pentoxide coating materials after fritting, vacuum degree is 2 × 10-2Pa,
Ion bombardment voltage 600V-1kV negative high voltage is 15min-20min from the time is hit, titanium pentoxide coating materials ion deposition is made to exist
On substrate.Determine the 1st tunic layer using the method for quartz crystal monitoring and optical monitoring simultaneously in Ion deposition processes
Thickness.Quartz crystal monitoring thicknesses of layers is only able to display its geometric thickness, and can not know be coated with during film layer refraction
Rate.But its output in monitoring is electric signal, changes linearly, can recorde the evaporation rate of coating materials, and is used to control plating
Membrane process.Optical monitoring method can measure the optical thickness of film layer, so as to obtain be coated with during film layer reflectivity and
Transmissivity, but its signal is in sinusoidal variations, it is difficult to monitor deposition rate.In this step, using two ways in conjunction with monitoring,
It realizes during being coated with, the thickness and refractive index of film layer can be monitored simultaneously, to realize effective control coating process
In thicknesses of layers.
Step S104 is coated with the 2nd tunic layer, fritting is carried out to silica coating materials particle, with the silica after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-1Pa, ion bombardment voltage 400V-800V negative high voltage, from hitting the time
For 10min-15min, make silica coating materials ion deposition on substrate, using the side of quartz crystal monitoring and optical monitoring
Method determines the thickness of the 2nd tunic layer.Since the thickness of the 2nd tunic layer is far smaller than the 1st layer of thickness, ion bombardment electricity
Pressure and time less than the 1st tunic are coated with parameter accordingly.On the one hand the number that ion is separated from coating materials in the unit time is reduced
Amount, i.e. reduction partition density；On the other hand the amount of ions deposited in the unit time is reduced by shortening from the time is hit.
Step S105 is coated with the 3rd tunic layer, fritting is carried out to titanium pentoxide coating materials particle, with five oxidations after fritting
Tritanium/Trititanium coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-1Pa, ion bombardment voltage 200V-600V negative high voltage, from hitting
Time is 10min-15min, makes titanium pentoxide coating materials ion deposition on substrate, is supervised using quartz crystal monitoring and optics
The method of control determines the thickness of the 3rd tunic layer；In 2-43 layers of membrane system, the thickness of odd number film layer is thinner than even number film layer, because
This, during the 3rd tunic layer is coated with, ion bombardment voltage is lower than the bombarding voltage of the 2nd tunic layer, is separated with reducing its ion from coating materials
Density.
Step S106 is repeated in step S104 and step S105, is coated with the 4th~43 tunic layer；
Step S107 is coated with the 44th tunic layer, fritting is carried out to silica coating materials particle, with the silica after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-2Pa, ion bombardment voltage 600V-1kV negative high voltage, from hitting the time
For 15min-20min, make silica coating materials ion deposition on substrate, using the side of quartz crystal monitoring and optical monitoring
Method determines the thickness of the 44th tunic layer.
Meanwhile in step S103- step S107 further include: ion aids precipitation；Using coating materials to substrate carry out from
Son bombardment while, by ion beam bombardment substrate surface deposit ion.By the momentum transfer of ion beam, make deposit from
Son obtains bigger kinetic energy, so that the consistency of film layer is improved, to reduce wavelength drift.
Step S108 will be coated with and complete the optical filters of 44 tunic layers to be placed in vacuum chamber in 200 DEG C of temperature heat preservation 2 small
When, it takes out after cooled to room temperature.
Optical filter generation wavelength drift after being coated in order to prevent is added in step S108 in one embodiment
Presbyopic processing.Specifically includes the following steps:
Step S1081, the optical filter that will be coated with 44 tunic layers of completion, which is placed in vacuum chamber in 200 DEG C of temperature, keeps the temperature 2
Hour, 100 DEG C are down to vacuum room temperature and is inflated hereinafter, opening vent valve into vacuum chamber, and vacuum room pressure and atmosphere are made
Press it is equal, and place 2 hours.Under high temperature environment, optical filter is placed in an atmosphere, make filter coating in optical filter sufficiently with
Contact with moisture in atmosphere realizes accelerated ageing.
Step S1082 toasts optical filter under atmospheric pressure environment, toasts 2 hours in 200 DEG C of temperature.Pass through
It is toasted in atmospheric pressure, carries out aging process, make the aqueous vapor entered in film layer evaporation, while improving film layer on optical filter
Gather density prevents wavelength drift after the completion of being coated with.
Spectrophotometer tester spectral characteristic, test result such as Fig. 1-3 are passed through to optical filter made of the present embodiment.?
In Fig. 1-3, X-axis is indicated wavelength (nm), and Y-axis indicates transmitance (%).Fig. 1 is the measured spectra curve of optical filter, and Fig. 2 is
The part 540nm-550nm measured spectra curve, Fig. 3 are the part 635nm-950nm measured spectra curve.It can from above three figure
Know, in optical filter made of the present embodiment, in wave band 450-520nm, 565-585nm transmitance maximum value is lower than 0.5%.?
Transmitance between 540-585nm is lower than 2%, and the wavelength transmitance at any point is at least up in 653-671nm wave band
50%；It is at least above 92% in the transmitance of 671-950nm wave band, transmitance is averagely greater than 97%.As it can be seen that made of the present invention
Optical filter can reach the light transmittance for meeting and needing in the object of the invention, meet the design requirement of optical film.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
Those familiar with the art in the technical scope disclosed by the present invention, can easily think of the change or the replacement, and should all contain
Lid is within protection scope of the present invention.Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (6)
1. dual band pass cut-off type composite filter film, which is characterized in that film structure is to meet the periodic membrane stack in λ/4 (LH)S,
Wherein, L is silica coating；H is titanium pentoxide film layer, and S is periodicity, value 21-23；It is adjacent with substrate
Film layer is the 1st layer, and using titanium pentoxide film layer, the 1st layer of the geometric thickness is 177-178nm；Outermost layer is 2S layers,
Using silica coating, 2S layers of the geometric thickness is 178-179nm；In 2-S layers, even level is silica
The geometric thickness of film layer, even level is 50-101nm, and odd-level is titanium pentoxide film layer, and the geometric thickness of odd-level is
30-50nm。
2. dual band pass cut-off type composite filter film according to claim 1, which is characterized in that S value is 22.
3. multiple using dual band pass cut-off type made of the dual band pass cut-off type composite filter film as described in any in claim 1-2
Close optical filter, which is characterized in that further include optical glass substrate, cover the 1st tunic layer on the substrate.
4. the preparation method of dual band pass cut-off type composite filter mating plate as claimed in claim 3, which is characterized in that including following step
It is rapid:
Step S101, cleaning substrate；
Step S102, substrate is put into vacuum chamber, is evacuated to 2 × 10-2Pa heats the substrate to 170 DEG C -200 DEG C；
Step S103 is coated with the 1st tunic layer, fritting is carried out to titanium pentoxide coating materials particle, with the titanium pentoxide after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-2Pa, ion bombardment voltage 600V-1kV negative high voltage are from the time is hit
15min-20min makes titanium pentoxide coating materials ion deposition on substrate, using the side of quartz crystal monitoring and optical monitoring
Method determines the thickness of the 1st tunic layer；
Step S104 is coated with the 2nd tunic layer, fritting is carried out to silica coating materials particle, with the silica coating materials after fritting
Ion bombardment is carried out to substrate, vacuum degree is 2 × 10-1Pa, ion bombardment voltage 400V-800V negative high voltage are from the time is hit
10min-15min makes silica coating materials ion deposition on substrate, using the method for quartz crystal monitoring and optical monitoring
Determine the thickness of the 2nd tunic layer；
Step S105 is coated with the 3rd tunic layer, fritting is carried out to titanium pentoxide coating materials particle, with the titanium pentoxide after fritting
Coating materials carries out ion bombardment to substrate, and vacuum degree is 2 × 10-1Pa, ion bombardment voltage 200V-600V negative high voltage, from hitting the time
For 10min-15min, make titanium pentoxide coating materials ion deposition on substrate, using quartz crystal monitoring and optical monitoring
Method determines the thickness of the 3rd tunic layer；
Step S106 is repeated in step S104 and step S105, is coated with the 4th~43 tunic layer；
Step S107 is coated with the 44th tunic layer, fritting is carried out to silica coating materials particle, with the silica coating materials after fritting
Ion bombardment is carried out to substrate, vacuum degree is 2 × 10-2Pa, ion bombardment voltage 600V-1kV negative high voltage are from the time is hit
15min-20min makes silica coating materials ion deposition on substrate, using the method for quartz crystal monitoring and optical monitoring
Determine the thickness of the 44th tunic layer；
Step S108, will be coated with complete 44 tunic layers optical filter be placed in vacuum chamber and keep the temperature 2 hours in 200 DEG C of temperature after
It takes out.
5. the preparation method of dual band pass cut-off type composite filter mating plate as claimed in claim 4, which is characterized in that in step S103-
In step S107 further include: ion aids precipitation；While carrying out ion bombardment to substrate using coating materials, banged by ion beam
Hit the deposit ion in substrate surface.
6. the preparation method of dual band pass cut-off type composite filter mating plate as claimed in claim 5, which is characterized in that in step S108
Include:
Step S1081, the optical filter that will be coated with 44 tunic layers of completion, which is placed in vacuum chamber in 200 DEG C of temperature, keeps the temperature 2 hours,
100 DEG C are down to vacuum room temperature to inflate hereinafter, opening vent valve into vacuum chamber, make vacuum room pressure and atmospheric pressure phase
Deng, and place 2 hours；
Step S1082 toasts optical filter under atmospheric pressure environment, toasts 2 hours in 200 DEG C of temperature.
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| JP2005266538A (en) * | 2004-03-19 | 2005-09-29 | Stanley Electric Co Ltd | Infrared transmission filter |
| CN203535253U (en) * | 2013-10-10 | 2014-04-09 | 杭州科汀光学技术有限公司 | Low pass filter |
| CN104536067A (en) * | 2015-01-22 | 2015-04-22 | 浙江星星瑞金科技股份有限公司 | Far-infrared sapphire window protection screen for night vision |
| CN105589123A (en) * | 2016-03-03 | 2016-05-18 | 舜宇光学(中山)有限公司 | Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof |
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