CN106694497B - A kind of cleaning process for dry film/solder mask developing trough - Google Patents
A kind of cleaning process for dry film/solder mask developing trough Download PDFInfo
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- CN106694497B CN106694497B CN201510407943.0A CN201510407943A CN106694497B CN 106694497 B CN106694497 B CN 106694497B CN 201510407943 A CN201510407943 A CN 201510407943A CN 106694497 B CN106694497 B CN 106694497B
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- developing trough
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Abstract
The present invention provides a kind of cleaning process for dry film/solder mask developing trough, the cleaning process includes the following steps: after discharging developer solution in developing trough completely, rinses sundries with tap water；With tap water circulation flushing 10 minutes；Developing trough is heated to 45~55 DEG C, 40~100wt.% of developing trough cleaning agent aqueous solution is added and impregnates；Starting spray pumping, circulated sprinkling clean 2~4 hours, and cotton core is filtered in the taking-up in 1 hour of every circulation, place into lauter tub after cleaning filtering cotton core with tap water；After circulated sprinkling cleans, the waste liquid in developing trough is exhausted；With tap water wash cycles 1 hour, ejected wash water is exhausted；Developer solution is injected, is used with continuing cycling through.Developing trough spray spout can be dredged because of blocking caused by dirt using cleaning process of the invention, the dirt that can clean the adherency of row rumble idler wheel improves the quality of developing procedure to improve the effect of cleaning, and production process is pollution-free, is suitble to industrialized production.
Description
Technical field
The present invention relates to the cleanings of hard circuit board dry/solder mask developing trough dirt, so that the developing trough after cleaning
Cleaning, nozzle is without blocking, row rumble idler wheel noresidue.
Background technique
The development of hard route version pattern transfer dry film and solder mask development are not exposed with carbonic acid oil developer solution to dissolve
Calcium and magnesium ion in the dry film or ink and water of light easily forms dirt, is adhered to cell wall, and plug nozzle seriously affects development
Effect.It is adhered on row rumble idler wheel, easily scratches dry film or ink, be the yields of development to influence the quality of developing procedure
Decline.Many printed wiring board factories usually use dilute sulfuric acid soaking and washing, but its defect is that cleaning effect is poor, and time-consuming, and need eight are small
When or so, and the cleaning frequency is short, and cleaning is primary weekly, and nozzle and row rumble idler wheel must be removed and disclose the side of scraping with steel wire and metal
It can remove, a developing line has hundreds of nozzles, thousands of rows rumble idler wheel, and workload is very huge and developing trough is used to clean
Agent.With the development of electronics industry printed wiring board, production efficiency is increasingly improved, produce with go out time it is shorter and shorter, grasp in addition
The worsening shortages of workmanship, so that efficiently, quickly becoming the means of seeking results.Therefore, dry film/solder mask developing trough is solved
Cleaning process the problem of it is extremely urgent.
Summary of the invention
It is an object of the invention to a kind of cleaning processes for dry film/solder mask developing trough, can reach fast
Speed, high-efficiency washing developing trough dirt.
To achieve the goals above, the present invention provides a kind of cleaning process for dry film/solder mask developing trough,
The cleaning process includes the following steps: 1) to rinse sundries with tap water for after developer solution discharges completely in the developing trough；2)
With tap water circulation flushing 10 minutes；3) heat the developing trough to 45~55 DEG C, be added developing trough cleaning agent aqueous solution 40~
100wt.% impregnates；The cleaning agent is NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L；4) starting spray
Leaching pumping, circulated sprinkling clean 2~4 hours, wherein every circulation takes out the filtering cotton core of developing trough cycle filter pump for 1 hour, uses
It is placed into the lauter tub of developing trough cycle filter pump after tap water cleaning filtering cotton core；5) it after circulated sprinkling cleaning, exhausts
Waste liquid in the developing trough；6) it uses tap water wash cycles 1 hour, exhausts ejected wash water；And 7) developer solution is injected, to continue
It is recycled.Developing trough spray spout can be dredged because of blocking caused by dirt using the cleaning process, the rolling of row rumble can be cleaned
The dirt of wheel adherency improves the quality of developing procedure to improve the effect of cleaning.
As the further explanation to the cleaning process of the invention, it is preferable that the developing trough cleaning agent aqueous solution
PH > 13, specific gravity be 1.10~1.30g/cm3。
As the further explanation to the cleaning process of the invention, it is preferable that the developing trough cleaning agent aqueous solution
In water be deionized water.
As the further explanation to the cleaning process of the invention, it is preferable that spray pressure is 1~2kg/cm2。
Cleaning process of the invention has following beneficial effect: 1) without dismantling nozzle and row rumble idler wheel and simple process, only
Circulation, which need to be embathed, can easily clean removing dirt, improve the cleaning ability of developing trough dirt；2) since cleaning agent is to spray
The Fouling Cleaning of nozzle and row rumble idler wheel is thorough, it is ensured that the quality of developing procedure；3) cleaning frequency only need one month into
Row is primary, alleviates the labor intensity of operative employee, extends the cleaning frequency of developing trough；4) raw material sources are wide, cheap, at
This is low, and production process is pollution-free, therefore is with a wide range of applications in printed wiring board field.
Specific embodiment
It is detailed now in conjunction with appended preferred embodiment in order to further appreciate that structure of the invention, feature and other purposes
It is carefully described as follows, this attached drawing embodiment described is only used to illustrate the technical scheme of the present invention, and the non-limiting present invention.
Embodiment 1
After developer solution in developing trough is discharged completely, sundries is rinsed with tap water, is then divided with tap water circulation flushing 10
Clock.Then heating developing trough is to 45 DEG C.Developing trough cleaning agent aqueous solution 100wt.% is added to impregnate；The cleaning agent is NaOH
100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein pH > 13 of developing trough cleaning agent aqueous solution, specific gravity are
1.10g/cm3, the water in developing trough cleaning agent aqueous solution is deionized water.Starting spray pumping, spray pressure 1kg/cm2, circulation
Spray cleaning 2 hours, in this process, every circulation takes out the filtering cotton core of developing trough cycle filter pump for 1 hour, uses tap water
It is placed into the lauter tub of developing trough cycle filter pump after cleaning filtering cotton core.After circulated sprinkling cleans, exhaust in developing trough
Waste liquid.With tap water wash cycles 1 hour, ejected wash water is then exhausted.Developer solution is reinjected, is used with continuing cycling through.Cleaning
Developing trough quality performance afterwards refers to table 1.
Table 1
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble idler wheel | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
Embodiment 2
After developer solution in developing trough is discharged completely, sundries is rinsed with tap water, is then divided with tap water circulation flushing 10
Clock.Then heating developing trough is to 55 DEG C.Developing trough cleaning agent aqueous solution 40wt.% is added to impregnate；The cleaning agent is NaOH
100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein pH > 13 of developing trough cleaning agent aqueous solution, specific gravity are
1.30g/cm3, the water in developing trough cleaning agent aqueous solution is deionized water.Starting spray pumping, spray pressure 2kg/cm2, circulation
Spray cleaning 4 hours, in this process, every circulation takes out the filtering cotton core of developing trough cycle filter pump for 1 hour, uses tap water
It is placed into the lauter tub of developing trough cycle filter pump after cleaning filtering cotton core.After circulated sprinkling cleans, exhaust in developing trough
Waste liquid.With tap water wash cycles 1 hour, ejected wash water is then exhausted.Developer solution is reinjected, is used with continuing cycling through.Cleaning
Developing trough quality performance afterwards refers to table 2.
Table 2
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble idler wheel | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
Embodiment 3
After developer solution in developing trough is discharged completely, sundries is rinsed with tap water, is then divided with tap water circulation flushing 10
Clock.Then heating developing trough is to 50 DEG C.Developing trough cleaning agent aqueous solution 60wt.% is added to impregnate, which is NaOH
100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein the ratio of pH > 13 of developing trough cleaning agent aqueous solution, NaOH
Weight is 1.30g/cm3, the water in developing trough cleaning agent aqueous solution is deionized water.Starting spray pumping, spray pressure 2kg/cm2,
Circulated sprinkling cleans 3 hours, and in this process, every circulation takes out the filtering cotton core of developing trough cycle filter pump for 1 hour, with certainly
It is placed into the lauter tub of developing trough cycle filter pump after water cleaning filtering cotton core.After circulated sprinkling cleans, development is exhausted
Waste liquid in slot.With tap water wash cycles 1 hour, ejected wash water is then exhausted.Developer solution is reinjected, is used with continuing cycling through.
Developing trough quality performance after cleaning refers to table 3.
Table 3
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble idler wheel | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
It is to be understood that foregoing invention content and specific embodiment are intended to prove technical solution provided by the present invention
Practical application should not be construed as limiting the scope of the present invention.Those skilled in the art are in spirit and principles of the present invention
It is interior, when can various modifications may be made, equivalent replacement or improvement.Protection scope of the present invention is subject to the appended claims.
Claims (4)
1. a kind of cleaning process for dry film/solder mask developing trough, which is characterized in that the cleaning process includes as follows
Step:
1) by after developer solution discharges completely in the developing trough, sundries is rinsed with tap water；
2) it uses tap water circulation flushing 10 minutes；
3) developing trough is heated to 45~55 DEG C, and 40~100wt.% of developing trough cleaning agent aqueous solution is added and impregnates；It is described clear
Lotion is NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L；
4) pumping of starting spray, circulated sprinkling clean 2~4 hours, wherein 1 hour taking-up developing trough cycle filter pump of every circulation
Filtering cotton core, with tap water clean filtering cotton core after place into the lauter tub of developing trough cycle filter pump；
5) after circulated sprinkling cleaning, the waste liquid in the developing trough is exhausted；
6) it uses tap water wash cycles 1 hour, exhausts ejected wash water；
7) developer solution is injected, is used with continuing cycling through.
2. cleaning process according to claim 1, which is characterized in that pH > 13 of the developing trough cleaning agent aqueous solution, than
Weight is 1.10~1.30g/cm3。
3. cleaning process according to claim 1 or 2, which is characterized in that the water in the developing trough cleaning agent aqueous solution
For deionized water.
4. cleaning process according to claim 1, which is characterized in that spray pressure is 1~2kg/cm2。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510407943.0A CN106694497B (en) | 2015-07-13 | 2015-07-13 | A kind of cleaning process for dry film/solder mask developing trough |
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| CN201510407943.0A CN106694497B (en) | 2015-07-13 | 2015-07-13 | A kind of cleaning process for dry film/solder mask developing trough |
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| CN106694497A CN106694497A (en) | 2017-05-24 |
| CN106694497B true CN106694497B (en) | 2019-02-05 |
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| CN114130745A (en) * | 2021-12-06 | 2022-03-04 | 广东喜珍电路科技有限公司 | Automatic maintenance method for horizontal line of circuit board |
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| JPH1039518A (en) * | 1996-07-25 | 1998-02-13 | Konica Corp | Cleaning method of developing machine |
| JP2003209337A (en) * | 2002-01-15 | 2003-07-25 | Hitachi Chem Co Ltd | Cleaning method for developing apparatus for printed wiring board |
| WO2004092320A1 (en) * | 2003-04-11 | 2004-10-28 | Asahi Denka Co., Ltd. | Detergent composition for alkali development apparatus |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN102053507A (en) * | 2010-10-18 | 2011-05-11 | 东莞市威迪膜科技有限公司 | Cleaning system and cleaning method of developing solution circulation process equipment |
| CN102486619A (en) * | 2010-12-02 | 2012-06-06 | 台湾永光化学工业股份有限公司 | Cleaning solution composition |
| CN102757871A (en) * | 2012-06-19 | 2012-10-31 | 瀚宇博德科技（江阴）有限公司 | Cleaning agent for dry-film developing tank of printed circuit board (PCB) and preparation method of cleaning agent |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI544291B (en) * | 2012-05-22 | 2016-08-01 | 斯克林半導體科技有限公司 | Development processing device |
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2015
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Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1039518A (en) * | 1996-07-25 | 1998-02-13 | Konica Corp | Cleaning method of developing machine |
| JP2003209337A (en) * | 2002-01-15 | 2003-07-25 | Hitachi Chem Co Ltd | Cleaning method for developing apparatus for printed wiring board |
| WO2004092320A1 (en) * | 2003-04-11 | 2004-10-28 | Asahi Denka Co., Ltd. | Detergent composition for alkali development apparatus |
| CN1296470C (en) * | 2003-04-11 | 2007-01-24 | 株式会社Adeka | Detergent composition for alkali development apparatus |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN102053507A (en) * | 2010-10-18 | 2011-05-11 | 东莞市威迪膜科技有限公司 | Cleaning system and cleaning method of developing solution circulation process equipment |
| CN102486619A (en) * | 2010-12-02 | 2012-06-06 | 台湾永光化学工业股份有限公司 | Cleaning solution composition |
| CN102757871A (en) * | 2012-06-19 | 2012-10-31 | 瀚宇博德科技（江阴）有限公司 | Cleaning agent for dry-film developing tank of printed circuit board (PCB) and preparation method of cleaning agent |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
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