CN106683978B - Cleaning equipment chip idle pulley structure and application method after CMP - Google Patents

Cleaning equipment chip idle pulley structure and application method after CMP Download PDF

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Publication number
CN106683978B
CN106683978B CN201611207241.9A CN201611207241A CN106683978B CN 106683978 B CN106683978 B CN 106683978B CN 201611207241 A CN201611207241 A CN 201611207241A CN 106683978 B CN106683978 B CN 106683978B
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China
Prior art keywords
lazy
idle pulley
combination bearing
axis
unit
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CN201611207241.9A
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CN106683978A (en
Inventor
陶利权
柳滨
熊朋
史霄
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Beijing Jingyi Precision Technology Co ltd
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Beijing Semiconductor Equipment Institute
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02057Cleaning during device manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02082Cleaning product to be cleaned
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Tyre Moulding (AREA)

Abstract

Cleaning equipment chip idle pulley structure and application method after a kind of CMP, which includes lazy axle unit, with lazy axle unit is locked in the pressing ring on lazy axle unit in the combined idle pulley unit of socket, by idle pulley unit, and is fastened in the sensor on lazy axle unit.Combination bearing is bonded on the inside of cycle surface and left end of the base mouth on the left of combination bearing in hole axle positioning method indentation pedestal.Gland and the clamping of right end of the base mouth are simultaneously compacted cycle surface on the right side of combination bearing in hole axle mode, and axis body runs through combination bearing in hole axle cooperation on the right side of lazy axis, until the step-like bayonet on lazy axis fits in inner ring end face on the left of combination bearing.Lazy axis right end penetrates in counting scale in hole axle mode, and counting scale right side is locked by retainer and lazy axis right end, and counting scale left port is compacted inner ring end face on the right side of combination bearing.The present invention effectively, accurately can carry out tracking of testing the speed online for the chip idle pulley of cleaning equipment after CMP.

Description

Cleaning equipment chip idle pulley structure and application method after CMP
Technical field
The present invention relates to the idle pulley structures and the idle pulley of auxiliary carrying and holding chip in cleaning equipment after a kind of CMP The application method of structure.
Background technique
CMP (chemical mechanical Polishing) cleaning equipment afterwards is carried out in electronic device wafer surface After high-precision polishing treatment, the equipment of progress surface accurate cleaning.Cleaning equipment prototype after current visible foreign countries CMP, it is brilliant Piece is relied on after the transmission of line manipulator is detached from place, is slid into the driven rubber tire card slot of idle pulley unit under its self weight.Because lazy Axle unit is excessively inclined using the support level of monomer bearing and bearing, and concentricity is poor, causes idle pulley unit to swing larger, thus influences The accuracy to test the speed.Driven rubber tire card slot entrance is in card slot two sides in wedge angle and clamped end simultaneously, card resistance phenomenon easily occurs.
Summary of the invention
The present invention provides cleaning equipment chip idle pulley structure and application method after a kind of CMP, cleans after solving existing CMP Equipment chip idle pulley is easy to appear card resistance phenomenon, chip idle pulley swing it is larger, influence test the speed accuracy the technical issues of.
The technical solution adopted by the present invention to solve the technical problems is:
Cleaning equipment chip idle pulley structure after this CMP, including lazy axle unit, with lazy axle unit in the combined idle pulley of socket Idle pulley unit is locked in the pressing ring on lazy axle unit, and is fastened in the sensor on lazy axle unit by unit;
The lazy axle unit includes pedestal, lazy axis, combination bearing, gland, counting scale, retainer and straight coupling;Described group Sympodium is held in hole axle positioning method indentation pedestal, is bonded on the inside of cycle surface and left end of the base mouth on the left of combination bearing;It is described Gland and the clamping of right end of the base mouth are simultaneously compacted cycle surface on the right side of combination bearing in hole axle mode, and straight coupling and gland are in screw thread Mode screwing hermetic;Axis body runs through combination bearing in hole axle cooperation on the right side of the lazy axis, until the step-like bayonet on lazy axis is bonded The inner ring end face on the left of the combination bearing, lazy axis right end penetrate in counting scale in hole axle mode, counting scale right side by retainer with it is lazy The locking of axis right end, counting scale left port are compacted inner ring end face on the right side of combination bearing;
The idle pulley unit includes left chuck, right chuck and the driven glue being held between left chuck and right chuck Wheel;The left chuck and right chuck are placed on the left of lazy axis on axis body, and are locked by pressing ring;Circumferential direction is provided among the driven rubber tire Chip card slot, and wafer portal bevelling is had at chip card slot notch, with clamped end face on the inside of driven rubber tire.
The base neck is cased with O-ring.
The right chuck is pressed into left chuck and is fixed by screw and left chuck in hole axle mode.
The sensor is fixed on gland.
The combination bearing is ceramic material.
The application method of cleaning equipment chip idle pulley structure after this CMP, using steps are as follows:
Step 1: connecting gas source, introduces atmosphere through the straight coupling in lazy axle unit;
Step 2: idle pulley unit is in connect chip.
Beneficial effects of the present invention are as follows:
Lazy axle unit of the invention and cabinet to be installed are sealed by O-ring to be fastened, and is done through straight coupling introducing atmosphere airtight Envelope, lazy axis rotary speed measuring signal are exported through counting scale.Lazy axle unit is cooperated outside support combinations bearing using pedestal and gland or so End face, step-like bayonet and counting scale left port on lazy axis or so cooperation support combinations bearing inner race end face are enclosed, and passes through meter Number disk and the centering of lazy axis rotate, and provide stable support for combination bearing, it is ensured that rationally distributed property improves the steady of lazy axis rotation It is qualitative, it swings idle pulley and reduces, it is more accurate to test the speed.Combination bearing uses ceramic material, its rigidity can be improved.Straight coupling can Atmosphere is introduced on the inside of gland, so that structure inner chamber be made to form simple and direct reliable hermetic seal.
Idle pulley unit external operating environment of the invention is in spray medium, and idle pulley unit can be used as with afer rotates Support wheel, the driven rubber tire card slot domatic entrance of chip enter, and can avoid card slot sandwich position, reduce card resistance phenomenon and occur.
The present invention effectively, accurately can carry out tracking of testing the speed online for the chip idle pulley of cleaning equipment after CMP.
Detailed description of the invention
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is backsight axonometric schematic diagram of the invention.
Fig. 2 is forward sight axonometric schematic diagram of the invention.
Fig. 3 is the schematic cross-sectional view of lazy axle unit.
Fig. 4 is the schematic cross-sectional view of idle pulley unit.
Fig. 5 is the schematic cross-sectional view of driven rubber tire.
Appended drawing reference: the lazy axle unit of 1-, 2- idle pulley unit, 3- sensor, 4- pressing ring, 5- pedestal, 6-O type circle, the lazy axis of 7-, 8- combination bearing, 9- gland, 10- counting scale, 11- retainer, 12- straight coupling, the left chuck of 13-, the right chuck of 14-, the driven glue of 15- Wheel, 15.1- chip card slot, 15.2- wafer portal bevelling, 15.3- are clamped end face.
Specific embodiment
Embodiment is referring to shown in Fig. 1, Fig. 2, cleaning equipment chip idle pulley structure after this CMP, including lazy axle unit 1, with Lazy axle unit 1 is in be socketed combined idle pulley unit 2, idle pulley unit 2 is locked in the pressing ring 4 on lazy axle unit 1, and fitting is tight The sensor 3 being fixed on the gland 9 of lazy axle unit 1.
Shown in Figure 3, the lazy axle unit 1 includes pedestal 5, lazy axis 7, combination bearing 8, gland 9, counting scale 10, lock Circle 11 and straight coupling 12.5 neck of pedestal is cased with O-ring 6.The combination bearing 8 is ceramic material, and combination bearing 8 is in Hole axle positioning method is pressed into pedestal 5, is bonded on the inside of 8 left side cycle surface of combination bearing and 5 left port of pedestal.The gland 9 It is compacted 8 right side cycle surface of combination bearing with 5 right output port clamping of pedestal and in hole axle mode, straight coupling 12 and gland 9 are in spiral shell Line mode screwing hermetic.The 7 right side axis body of lazy axis runs through combination bearing 8 in hole axle cooperation, until the step-like bayonet on lazy axis 7 Fit in 8 left side inner ring end face of combination bearing, lazy 7 right end of axis penetrates in counting scale 10 in hole axle mode, counting scale right side by Retainer 11 and lazy 7 right end of axis lock, and counting scale left port is compacted 8 right side inner ring end face of combination bearing.
Referring to fig. 2, shown in Fig. 4, the idle pulley unit 2 includes left chuck 13, right chuck 14 and is held in left chuck Driven rubber tire 15 between 13 and right chuck 14;The left chuck 13 and right chuck 14 are placed on lazy 7 left side axis body of axis, and by pressing 4 locking of circle.
Shown in Figure 4, left 13 center of chuck is provided with axis hole, and right chuck 14 is pressed into left chuck 13 simultaneously in hole axle mode It is fixed by screw and left chuck 13.
Shown in Figure 5, the driven 15 centre circumferential direction of rubber tire is provided with chip card slot 15.1, and at chip card slot notch With wafer portal bevelling 15.2, with clamped end face 15.3 on the inside of driven rubber tire 15.
The application method of cleaning equipment chip idle pulley structure after this CMP, using steps are as follows:
Step 1: connecting gas source, introduces atmosphere through the straight coupling 12 in lazy axle unit 1;
Step 2: idle pulley unit 2 is in connect chip.

Claims (5)

1. cleaning equipment chip idle pulley structure after a kind of CMP, it is characterised in that: including lazy axle unit (1) and lazy axle unit (1) In the combined idle pulley unit (2) of socket, idle pulley unit (2) is locked in the pressing ring (4) on lazy axle unit (1), and fitting is tightly The sensor (3) being fixed on lazy axle unit (1);
The lazy axle unit (1) includes pedestal (5), lazy axis (7), combination bearing (8), gland (9), counting scale (10), retainer (11) and straight coupling (12);The combination bearing (8) is interior in hole axle positioning method indentation pedestal (5), on the left of combination bearing (8) It is bonded on the inside of cycle surface and pedestal (5) left port;The gland (9) is with pedestal (5) right output port clamping and in hole axle mode pressure Cycle surface on the right side of real combination bearing (8), straight coupling (12) and gland (9) are in engagement thread screwing hermetic;The lazy axis (7) Right side axis body runs through combination bearing (8) in hole axle cooperation, until the step-like bayonet on lazy axis (7) fits in combination bearing (8) left side Side inner ring end face, lazy axis (7) right end penetrate in counting scale (10) in hole axle mode, and counting scale right side is by retainer (11) and lazy axis (7) right end locks, and counting scale left port is compacted inner ring end face on the right side of combination bearing (8);
The idle pulley unit (2) includes left chuck (13), right chuck (14) and is held in left chuck (13) and right chuck (14) the driven rubber tire (15) between;The left chuck (13) and right chuck (14) are placed on the left of lazy axis (7) on axis body, and by pressing Enclose (4) locking;The intermediate circumferential direction of the driven rubber tire (15) is provided with chip card slot (15 .1), and has at chip card slot notch Wafer portal bevelling (15 .2), driven rubber tire (15) inside is with clamped end face (15 .3).
2. cleaning equipment chip idle pulley structure after CMP according to claim 1, it is characterised in that: pedestal (5) neck It is cased with O-ring (6).
3. cleaning equipment chip idle pulley structure after CMP according to claim 1, it is characterised in that: the right chuck (14) Left chuck (13) is pressed into hole axle mode and is fixed by screw and left chuck (13).
4. cleaning equipment chip idle pulley structure after CMP according to claim 1, it is characterised in that: the sensor (3) is solid It is scheduled on gland (9).
5. cleaning equipment chip idle pulley structure after CMP according to claim 1, it is characterised in that: the combination bearing (8) For ceramic material.
CN201611207241.9A 2016-12-23 2016-12-23 Cleaning equipment chip idle pulley structure and application method after CMP Active CN106683978B (en)

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Application Number Priority Date Filing Date Title
CN201611207241.9A CN106683978B (en) 2016-12-23 2016-12-23 Cleaning equipment chip idle pulley structure and application method after CMP

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Application Number Priority Date Filing Date Title
CN201611207241.9A CN106683978B (en) 2016-12-23 2016-12-23 Cleaning equipment chip idle pulley structure and application method after CMP

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CN106683978B true CN106683978B (en) 2019-02-05

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020077649A1 (en) * 2018-10-15 2020-04-23 杭州众硅电子科技有限公司 Cmp wafer cleaning apparatus

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090068640A (en) * 2007-12-24 2009-06-29 주식회사 동부하이텍 Chemical-mechanical polishing apparatus for manufacturing semiconductor devices and method thereof
CN101712130A (en) * 2009-12-22 2010-05-26 中国电子科技集团公司第四十五研究所 Positioning conversion device applied to chemical mechanical polishing equipment of silicon wafer
CN102371535A (en) * 2010-08-11 2012-03-14 中国电子科技集团公司第四十五研究所 Silicon wafer positioning and loading device applied to chemical mechanical polishing equipment
CN105051882A (en) * 2013-03-15 2015-11-11 应用材料公司 Substrate position aligner
CN105164793A (en) * 2013-03-15 2015-12-16 应用材料公司 Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
WO2016057234A1 (en) * 2014-10-10 2016-04-14 Entegris, Inc. Point of use or point of dispense filter with multiple pleat packs

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090068640A (en) * 2007-12-24 2009-06-29 주식회사 동부하이텍 Chemical-mechanical polishing apparatus for manufacturing semiconductor devices and method thereof
CN101712130A (en) * 2009-12-22 2010-05-26 中国电子科技集团公司第四十五研究所 Positioning conversion device applied to chemical mechanical polishing equipment of silicon wafer
CN102371535A (en) * 2010-08-11 2012-03-14 中国电子科技集团公司第四十五研究所 Silicon wafer positioning and loading device applied to chemical mechanical polishing equipment
CN105051882A (en) * 2013-03-15 2015-11-11 应用材料公司 Substrate position aligner
CN105164793A (en) * 2013-03-15 2015-12-16 应用材料公司 Design of disk/pad clean with wafer and wafer edge/bevel clean module for chemical mechanical polishing
WO2016057234A1 (en) * 2014-10-10 2016-04-14 Entegris, Inc. Point of use or point of dispense filter with multiple pleat packs

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Effective date of registration: 20230306

Address after: 100176 101, floor 2, building 2, No. 1, Taihe Third Street, economic and Technological Development Zone, Daxing District, Beijing

Patentee after: Beijing Jingyi Precision Technology Co.,Ltd.

Address before: 100176 No. 1, Taihe 3rd Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing

Patentee before: BEIJING SEMICONDUCTOR EQUIPMENT INSTITUTE (THE 45TH Research Institute OF CETC)