CN106675519A - Inorganic compound abrasive and preparation method thereof - Google Patents
Inorganic compound abrasive and preparation method thereof Download PDFInfo
- Publication number
- CN106675519A CN106675519A CN201611188153.9A CN201611188153A CN106675519A CN 106675519 A CN106675519 A CN 106675519A CN 201611188153 A CN201611188153 A CN 201611188153A CN 106675519 A CN106675519 A CN 106675519A
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- Prior art keywords
- abrasive material
- microsphere
- microspheres
- solution
- abrasive
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
Abstract
The invention discloses inorganic compound abrasive and a preparation method thereof. The abrasive takes SiO2 microspheres as the hard abrasive cores, a group of closely arranged CeO2 microspheres are uniformly adhered along the external circumferences of the SiO2 microspheres to form core-shell structured compound microspheres; a uniform mixed liquid precursor is prepared by mixing a cerous nitrate solution with a silicon solution, then the mixed liquid precursor is directly dried by using a spray dryer to obtain a mixture precursor, and finally the mixture precursor is calcined and quickly chilled to obtain the inorganic compound abrasive. Intermediate sedimentation and a sediment drying process are reduced, the operating procedure is simple and time-saving, and CeO2/SiO2 compound microspheres uniformly and completely covered with CeO2 can be obtained.
Description
Technical field
The present invention relates to polishing powder from rare earth preparing technical field, specifically a kind of inorganic compounding abrasive material and preparation method thereof.
Background technology
In recent years, the domestic polishing to high-end precision element requires more and more higher, therefore have stimulated the country to high-end polishing
The research of powder.At present, senior polishing powder is mainly used in liquid crystal display, precise electronic device, advanced optical components, liquid crystal glass
The neighborhoods such as glass substrate, hard disk glass substrate.CMP（Chemical Mechanical Polishing）It is generally acknowledged almost unique
Global planarizartion technology, but single inorganic polishing material in polishing process often cannot get gratifying result, example
Silicon oxide polishing powder has easily preparation, and hardness is little, and the advantages of slurry good dispersion, but its polishing efficiency is low；The rare earth polishing of cerium system
Powder has polishing speed fast, polishes high precision, easy cleaning, the advantages of pollute little, but which is expensive, poor dispersion, easily rolls into a ball
It is poly-；The hardness of aluminum oxide polishing powder is big, and polishing speed is high, but easily causes surface of the work scuffing.Accordingly, it would be desirable to a kind of new
Polishing material, improve polishing efficiency to workpiece.Different from the nanoparticle of single composition phase, composite particles are referred to by two kinds
Or a kind of heterogeneous material of the different combinations of substances of two or more physically and/or chemically property.Using variety classes and
Synergism between property abrasive material, reaches the purpose for improving polishing effect.
The preparation of inorganic compounding abrasive particle at present adopts the sedimentation method mostly, first synthesizes CeO2, then it is coated on the SiO for having prepared2
On microgranule, synthesis technique is complicated, and inorganic nanoparticles are difficult to be evenly coated at another kind of inorganic microsphere kernel table in the method
Face.
The content of the invention
It is an object of the invention to provide a kind of inorganic compounding abrasive material and preparation method thereof, the inorganic compounding abrasive material is with oxygen
SiClx is kernel, Compostie abrasive particles of the cerium oxide for shell, process is simple, time-consuming, and can be obtained by CeO2Be evenly coated,
Complete CeO2/SiO2Complex microsphere.
The technical solution adopted for the present invention to solve the technical problems is：
A kind of inorganic compounding abrasive material, the abrasive material is with SiO2Microsphere be hard abrasive material core, SiO2Microsphere is uniformly attached along excircle
One group of compact arranged CeO2Microsphere, forms the complex microsphere of nucleocapsid structure.
The present invention also provides a kind of preparation method of inorganic compounding abrasive material, comprises the following steps：
S1, using dehydrated alcohol and the Ludox of deionized water dissolving 40wt%, obtain silicon solution, Ludox, dehydrated alcohol with go
The volume ratio of ion is 1：2.5：2.5；
S2, silicon solution is added in the cerium nitrate solution of 1.2mol/L obtains mixed solution, silicon solution is molten with cerous nitrate
The volume ratio of liquid is 50:3；
S3, the cetyl trimethylammonium bromide for adding 5wt%, cetyl trimethylammonium bromide with the volume ratio of silicon solution is
3:5；In 55 DEG C of constant temperature water baths heating, insulation, with speed magnetic stirrer 3h of 400r/min, make cerium
Grain is uniformly dispersed in colloidal sol, obtains uniform mixed liquor presoma；
S4, by mixed liquor presoma by spray dryer be dried, obtain mix precursor；
S5, mix precursor is incubated into 6 hours in 1000 DEG C of Muffle kiln roastings, after taking out cooling, obtains the inorganic of the present invention
Abrasive compound.
The invention has the beneficial effects as follows, give up traditional preparation method, first nitric hydrate cerium mixed homogeneously with Ludox,
Then mix precursor is directly prepared by spray drying method, then by calcining, obtains CeO2With SiO2Composite oxides
Abrasive material, reduces the dry run of intermediate sedimentation and precipitate, and operating procedure is simple, time-consuming, and can obtain quilt
CeO2Be evenly coated, complete CeO2/SiO2Complex microsphere.
Description of the drawings
The present invention is further described with reference to the accompanying drawings and examples：
Fig. 1 is the structural representation of the present invention.
Specific embodiment
As shown in figure 1, the present invention provides a kind of inorganic compounding abrasive material, the abrasive material is with SiO2Microsphere 1 is hard abrasive material core
The heart, SiO2Microsphere 1 uniformly adheres to one group of compact arranged CeO along excircle2Microsphere 2, forms the complex microsphere of nucleocapsid structure.
The present invention also provides a kind of preparation method of inorganic compounding abrasive material, comprises the following steps：
S1, using the 50ml Ludox of dehydrated alcohol and deionized water dissolving 40wt%, obtain silicon solution, Ludox, dehydrated alcohol
It is 1 with deionized volume ratio：2.5：2.5；
The Ludox can adopt tetraethyl orthosilicate for silicon source, with dehydrated alcohol as solvent, be incubated, reacting balance at 70 ± 2 DEG C
Selected pH value is 1.5~2.0, obtains Ludox by hydrolysis；
S2, the cerium nitrate solution 3ml for removing 1.2mol/L, silicon solution are added in cerium nitrate solution and obtain mixed solution；
Cerium nitrate solution can adopt industrial pure cerous carbonate, CeO2/ TREO >=99.9%, TREO >=50% add 1mol/L
Dissolve in the salpeter solution of concentration, obtain cerium nitrate solution；
S3, the cetyl trimethylammonium bromide for adding 30ml mass percents 5wt%；In 55 DEG C of constant temperature water baths
Heating, insulation, with speed magnetic stirrer 3h of 400r/min, make that cerium is evengranular to be dispersed in colloidal sol, obtain
Uniform mixed liquor presoma；
S4, by mixed liquor presoma by spray dryer be dried, obtain mix precursor；
Inlet temperature during spray drying be 150~250 DEG C, leaving air temp be 75~125 DEG C, admission pressure 3.5Bar, air inlet
Mouth air mass flow 1000L/h, mixed liquor presoma 1000~1200ml/h of flow, the solid content of mixed liquor presoma is 15%；
S5, mix precursor is incubated into 6 hours in 1000 DEG C of Muffle kiln roastings, after taking-up, room temperature was cooled in 1 hour,
Obtain the inorganic compounding abrasive material of the present invention.
Cerium is evengranular to be dispersed in colloidal sol, obtains uniform mixed liquor presoma；Mixed liquor presoma is in spray dried
When being dried on dry device, moisture flash evapn, so as to get mix precursor soilless sticking, good dispersion；The mixture forerunner of preparation
Body calcination time is more than 300min, easily makes grain shape spherical in shape；Then quick cooling obtains CeO2/SiO2Compostie abrasive particles are polished
Powder, rapidly cooling advantageously form defect particles, with more preferable absorbability, and then improve polishing cutting force；Reduce centre
The dry run of precipitation and precipitate, operating procedure are simple, time-consuming, and can obtain by CeO2Be evenly coated, it is complete
Whole CeO2/SiO2Complex microsphere.
The above, is only presently preferred embodiments of the present invention, not makees any pro forma restriction to the present invention；Appoint
What those of ordinary skill in the art, under without departing from technical solution of the present invention ambit, all using the side of the disclosure above
Method and technology contents make many possible variations and modification, or the equivalent reality for being revised as equivalent variations to technical solution of the present invention
Apply example.Therefore, every content without departing from technical solution of the present invention, is done to above example according to the technical spirit of the present invention
Any simple modification, equivalent, equivalence changes and modification, still fall within the range of technical solution of the present invention protection.
Claims (2)
1. a kind of inorganic compounding abrasive material, it is characterised in that the abrasive material is with SiO2Microsphere be hard abrasive material core, SiO2Microsphere edge
Excircle uniformly adheres to one group of compact arranged CeO2Microsphere, forms the complex microsphere of nucleocapsid structure.
2. a kind of preparation method of inorganic compounding abrasive material, it is characterised in that comprise the following steps：
S1, using dehydrated alcohol and the Ludox of deionized water dissolving 40wt%, obtain silicon solution, Ludox, dehydrated alcohol with go
The volume ratio of ion is 1：2.5：2.5；
S2, silicon solution is added in the cerium nitrate solution of 1.2mol/L obtains mixed solution, silicon solution is molten with cerous nitrate
The volume ratio of liquid is 50:3；
S3, the cetyl trimethylammonium bromide for adding 5wt%, cetyl trimethylammonium bromide with the volume ratio of silicon solution is
3:5；In 55 DEG C of constant temperature water baths heating, insulation, with speed magnetic stirrer 3h of 400r/min, make cerium
Grain is uniformly dispersed in colloidal sol, obtains uniform mixed liquor presoma；
S4, by mixed liquor presoma by spray dryer be dried, obtain mix precursor；
S5, mix precursor is incubated into 6 hours in 1000 DEG C of Muffle kiln roastings, after taking-up, room temperature was cooled in 1 hour,
Obtain the inorganic compounding abrasive material described in claim 1.
Priority Applications (1)
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| CN201611188153.9A CN106675519A (en) | 2016-12-21 | 2016-12-21 | Inorganic compound abrasive and preparation method thereof |
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| CN201611188153.9A CN106675519A (en) | 2016-12-21 | 2016-12-21 | Inorganic compound abrasive and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108569718A (en) * | 2018-06-13 | 2018-09-25 | 四川大学 | Nano ceric oxide coats the preparation method of nanometer spherical silica composite granules |
| CN108929634A (en) * | 2018-07-11 | 2018-12-04 | 佛山腾鲤新能源科技有限公司 | A kind of preparation method of rare-earth base polishing crystal powder |
| CN111171788A (en) * | 2020-01-02 | 2020-05-19 | 长江存储科技有限责任公司 | Abrasive fine particles, method for producing same, and abrasive |
| CN116144323A (en) * | 2022-12-15 | 2023-05-23 | 上海应用技术大学 | Composite microsphere with mesoporous core-shell structure for copper CMP, preparation method thereof, chemical mechanical polishing solution and application thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108569718A (en) * | 2018-06-13 | 2018-09-25 | 四川大学 | Nano ceric oxide coats the preparation method of nanometer spherical silica composite granules |
| CN108929634A (en) * | 2018-07-11 | 2018-12-04 | 佛山腾鲤新能源科技有限公司 | A kind of preparation method of rare-earth base polishing crystal powder |
| CN111171788A (en) * | 2020-01-02 | 2020-05-19 | 长江存储科技有限责任公司 | Abrasive fine particles, method for producing same, and abrasive |
| CN116144323A (en) * | 2022-12-15 | 2023-05-23 | 上海应用技术大学 | Composite microsphere with mesoporous core-shell structure for copper CMP, preparation method thereof, chemical mechanical polishing solution and application thereof |
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Address after: 28 No. 233010 Anhui province Bengbu Huai District Industrial Park Avenue Kaiyuan Mo Estuary Applicant after: ANHUI ZHONGCHUANG ELECTRONIC INFORMATION MATERIAL CO., LTD. Applicant after: Bengbu Zhongheng New Materials Scientific and Technological Co., Ltd. Applicant after: Bengbu design Institute of Glass Industry Address before: Tu Shan Lu Yuhui District 233010 Anhui city of Bengbu Province, No. 1047 Applicant before: ANHUI ZHONGCHUANG ELECTRONIC INFORMATION MATERIAL CO., LTD. Applicant before: Bengbu Zhongheng New Materials Scientific and Technological Co., Ltd. Applicant before: Bengbu design Institute of Glass Industry |
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