CN106667853A - Facial mask with antiallergic repair function and production process thereof - Google Patents
Facial mask with antiallergic repair function and production process thereof Download PDFInfo
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- CN106667853A CN106667853A CN201710116383.2A CN201710116383A CN106667853A CN 106667853 A CN106667853 A CN 106667853A CN 201710116383 A CN201710116383 A CN 201710116383A CN 106667853 A CN106667853 A CN 106667853A
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
- A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/64—Proteins; Peptides; Derivatives or degradation products thereof
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
- A61Q19/005—Preparations for sensitive skin
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Abstract
The invention relates to a facial mask with an antiallergic repair function and a production process thereof. The facial mask mainly comprises the following materials in percentage by weight: 8 to 12 percent of propylene glycol, 0.1 to 0.2 percent of xanthan gum, 0.1 to 0.2 percent of sodium hyaluronate, 0.1 to 0.2 percent of hydrolyzed hyaluronic acid, 0.1 to 0.2 percent of carbomer, 0.1 to 0.2 percent of jojoba wax PEG-120 esters, 0.3 to 0.5 percent of antioxidant, 0.1 to 0.2 percent of pH regulator, 0.3 to 0.6 percent of PPG-10 methyl glucose ether, 0.3 to 0.6 percent of hydrolyzed oat protein, 1 to 2 percent of aloe extract, 0.01 to 0.02 percent of EGF, 0.01 to 0.02 percent of glycosylglycerol, 0.001 to 0.002 percent of glabridin and 0.1 to 0.2 percent of soothing repair extract. The facial mask can take care of skin.
Description
Technical field
The present invention relates to cosmetic field, specifically a kind of facial mask repaired with antiallergy and its production technology.
Background technology
Antianaphylactic product on open market, can all add antianaphylactic material, such as bisabolol, dipotassium glycyrrhizinate
Deng.These material antiallergic effects are not ideal, and product system can be made unstable;It is an object of the invention to provide a kind of
The facial mask repaired with antiallergy and its production technology, it is set forth above to solve the problems, such as.
The content of the invention
For achieving the above object, the present invention provides following technical scheme:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:8%-12% the third two
The transparent xanthan gum of alcohol, 0.1%-0.2%, 0.1%-0.2% Sodium Hyaluronates, 0.1%-0.2% hydrolysis hyaluronic acids, 0.1%-
0.2% Carbomer, 0.1%-0.2% Jojoba wax PEG-120 esters, 0.3%-0.5% antioxidants, 0.1%-0.2%PH
Conditioning agent, 0.3%-0.6%PPG-10 methyl ethers, 0.3%-0.6% hydrolysis avenin, 1%-2% extract solution from aloe,
0.01%-0.02%EGF, 0.01%-0.02% glycosylglycerol, 0.001%-0.002% glabridins, 0.1%-0.2%
Shu Min repairs quintessence;82.858%-89.379% deionized waters.
The present invention also provides a kind of production technology of the facial mask repaired with antiallergy, and it specifically includes following steps:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 75 DEG C -80 DEG C, and then stirring is until solution is transparent
One, stirring after being then incubated 30 minutes is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
Compared with prior art, the invention has the beneficial effects as follows:It is all that Chinese medicine is carried that Shu Min repairs quintessence raw material in the present invention
Thing is taken, wherein have Astragalus membranacus root extract, bighead atractylodes rhizome rhizome extract, windproof root extract, german chamomile flower extract, silk tree
Bark extract, licorice root extract, to human body milder, effect is more longlasting.It is more suitable for sensitiveness skin, the EGF being specifically added
More with the function of repairing, skin can be more takeed good care of, impaired skin can be repaired, reach reparation antiallergic effect;Quickly releived
Quick symptom, repairs Hypersensitivity Cells, improves cell allergic immune power.
Specific embodiment
The technical scheme in the embodiment of the present invention will be clearly and completely described below, it is clear that described enforcement
Example is only a part of embodiment of the invention, rather than the embodiment of whole.Based on the embodiment in the present invention, this area is common
The every other embodiment that technical staff is obtained under the premise of creative work is not made, belongs to the model of present invention protection
Enclose.
Embodiment one:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:8%-12% the third two
The transparent xanthan gum of alcohol, 0.1%-0.2%, 0.1%-0.2% Sodium Hyaluronates, 0.1%-0.2% hydrolysis hyaluronic acids, 0.1%-
0.2% Carbomer, 0.1%-0.2% Jojoba wax PEG-120 esters, 0.3%-0.5% antioxidants, 0.1%-0.2%PH
Conditioning agent, 0.3%-0.6%PPG-10 methyl ethers, 0.3%-0.6% hydrolysis avenin, 1%-2% extract solution from aloe,
0.01%-0.02%EGF, 0.01%-0.02% glycosylglycerol, 0.001%-0.002% glabridins, 0.1%-0.2%
Shu Min repairs quintessence;82.858%-89.379% deionized waters.
Have the production technology of the facial mask of antiallergy reparation as follows in the present embodiment:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 75 DEG C, and then stirring is transparent homogeneous up to solution, so
Stirring after being incubated 30 minutes afterwards is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
Embodiment two:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:8% propane diols,
0.1% transparent xanthan gum, 0.1% Sodium Hyaluronate, 0.1% hydrolysis hyaluronic acid, 0.1% Carbomer, 0.1% Jojoba wax
PEG-120 esters, 0.3% antioxidant, 0.1%PH conditioning agents, 0.3%PPG-10 methyl ethers, 0.3% hydrolysis oat egg
In vain, 1% extract solution from aloe, 0.01%EGF, 0.01% glycosylglycerol, 0.001% glabridin, 0.1% Shu Min repair essence
Extraction;89.379% deionized water.
Have the production technology of the facial mask of antiallergy reparation as follows in the present embodiment:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 77.5 DEG C, and then stirring is transparent homogeneous up to solution,
Then stirring after being incubated 30 minutes is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
Embodiment three:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:10% propane diols,
0.15% transparent xanthan gum, 0.15% Sodium Hyaluronate, 0.15% hydrolysis hyaluronic acid, 0.15% Carbomer, 0.15% flash
Bar wax PEG-120 esters, 0.4% antioxidant, 0.15%PH conditioning agents, 0.45%PPG-10 methyl ethers, 0.45% water
Solution avenin, 1.5% extract solution from aloe, 0.015%EGF, 0.015% glycosylglycerol, 0.0015% glabridin,
0.15% Shu Min repairs quintessence;86.1185% deionized water.
Have the production technology of the facial mask of antiallergy reparation as follows in the present embodiment:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 80 DEG C, and then stirring is transparent homogeneous up to solution, so
Stirring after being incubated 30 minutes afterwards is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
Example IV:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:12% propane diols,
0.2% transparent xanthan gum, 0.2% Sodium Hyaluronate, 0.2% hydrolysis hyaluronic acid, 0.2% Carbomer, 0.2% Jojoba wax
PEG-120 esters, 0.5% antioxidant, 0.2%PH conditioning agents, 0.6%PPG-10 methyl ethers, 0.6% hydrolysis oat egg
In vain, 2% extract solution from aloe, 0.02%EGF, 0.02% glycosylglycerol, 0.002% glabridin, 0.2% Shu Min repair essence
Extraction;82.858 deionized waters.
Have the production technology of the facial mask of antiallergy reparation as follows in the present embodiment:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 80 DEG C, and then stirring is transparent homogeneous up to solution, so
Stirring after being incubated 30 minutes afterwards is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
Embodiment five:
A kind of facial mask repaired with antiallergy, it is made up of by weight percentage following each component:10% propane diols,
0.1% transparent xanthan gum, 0.2% Sodium Hyaluronate, 0.2% hydrolysis hyaluronic acid, 0.1% Carbomer, 0.2% Jojoba wax
PEG-120 esters, 0.5% antioxidant, 0.2%PH conditioning agents, 0.6%PPG-10 methyl ethers, 0.6% hydrolysis oat egg
In vain, 1.5% extract solution from aloe, 0.02%EGF, 0.02% glycosylglycerol, 0.002% glabridin, 0.2% Shu Min repair essence
Extraction;85.558% deionized water.
Have the production technology of the facial mask of antiallergy reparation as follows in the present embodiment:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba are removed
Wax PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 80 DEG C, and then stirring is transparent homogeneous up to solution, so
Stirring after being incubated 30 minutes afterwards is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred 35 minutes;
S3. by step S2 adjust PH after solution be cooled to 38 DEG C, then in solution add PPG-10 methyl ethers,
Hydrolysis avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, and inspection is closed
Can discharging after lattice.
The present invention operation principle be:It is all Chinese medical extract that Shu Min repairs quintessence raw material in the present invention, wherein there is film
Pod Radix Astragali root extract, bighead atractylodes rhizome rhizome extract, windproof root extract, german chamomile flower extract, silk tree bark extract, licorice
Extract, to human body milder, effect is more longlasting.It is more suitable for sensitiveness skin, the EGF being specifically added is more with the work(repaired
Can, can more take good care of skin.
It is obvious to a person skilled in the art that the invention is not restricted to the details of above-mentioned one exemplary embodiment, Er Qie
In the case of spirit or essential attributes without departing substantially from the present invention, the present invention can be in other specific forms realized.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit is required rather than described above is limited, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.
Claims (9)
1. it is a kind of with antiallergy repair facial mask, it is characterised in that it is made up of by weight percentage following each component:8%-
The transparent xanthan gum of 12% propane diols, 0.1%-0.2%, 0.1%-0.2% Sodium Hyaluronates, 0.1%-0.2% hydrolysis hyalomitomes
Acid, 0.1%-0.2% Carbomers, 0.1%-0.2% Jojoba wax PEG-120 esters, 0.3%-0.5% antioxidants,
0.1%-0.2%PH conditioning agents, 0.3%-0.6%PPG-10 methyl ethers, 0.3%-0.6% hydrolysis avenins, 1%-
2% extract solution from aloe, 0.01%-0.02%EGF, 0.01%-0.02% glycosylglycerol, 0.001%-0.002% light Radix Glycyrrhizaes
Fixed, 0.1%-0.2% Shu Min repair quintessence;82.858%-89.379% deionized waters.
2. it is according to claim 1 it is a kind of with antiallergy repair facial mask, it is characterised in that its by weight percentage by
Following each component composition:8% propane diols, 0.1% transparent xanthan gum, 0.1% Sodium Hyaluronate, 0.1% hydrolysis hyaluronic acid,
0.1% Carbomer, 0.1% Jojoba wax PEG-120 esters, 0.3% antioxidant, 0.1%PH conditioning agents, 0.3%PPG-10
Methyl ether, 0.3% hydrolysis avenin, 1% extract solution from aloe, 0.01%EGF, 0.01% glycosylglycerol, 0.001%
Glabridin, 0.1% Shu Min repair quintessence;89.379% deionized water.
3. it is according to claim 1 it is a kind of with antiallergy repair facial mask, it is characterised in that its by weight percentage by
Following each component composition:10% propane diols, 0.15% transparent xanthan gum, 0.15% Sodium Hyaluronate, 0.15% hydrolysis hyalomitome
Acid, 0.15% Carbomer, 0.15% Jojoba wax PEG-120 esters, 0.4% antioxidant, 0.15%PH conditioning agents, 0.45%
PPG-10 methyl ethers, 0.45% hydrolysis avenin, 1.5% extract solution from aloe, 0.015%EGF, 0.015% glycerine Portugal
Glucosides, 0.0015% glabridin, 0.15% Shu Min repair quintessence;86.1185% deionized water.
4. it is according to claim 1 it is a kind of with antiallergy repair facial mask, it is characterised in that its by weight percentage by
Following each component composition:12% propane diols, 0.2% transparent xanthan gum, 0.2% Sodium Hyaluronate, 0.2% hydrolysis hyaluronic acid,
0.2% Carbomer, 0.2% Jojoba wax PEG-120 esters, 0.5% antioxidant, 0.2%PH conditioning agents, 0.6%PPG-10
Methyl ether, 0.6% hydrolysis avenin, 2% extract solution from aloe, 0.02%EGF, 0.02% glycosylglycerol, 0.002%
Glabridin, 0.2% Shu Min repair quintessence;82.858 deionized waters.
5. it is according to claim 1 it is a kind of with antiallergy repair facial mask, it is characterised in that its by weight percentage by
Following each component composition:10% propane diols, 0.1% transparent xanthan gum, 0.2% Sodium Hyaluronate, 0.2% hydrolysis hyaluronic acid,
0.1% Carbomer, 0.2% Jojoba wax PEG-120 esters, 0.5% antioxidant, 0.2%PH conditioning agents, 0.6%PPG-10
Methyl ether, 0.6% hydrolysis avenin, 1.5% extract solution from aloe, 0.02%EGF, 0.02% glycosylglycerol,
0.002% glabridin, 0.2% Shu Min repair quintessence;85.558% deionized water.
6. it is according to claim 1 it is a kind of with antiallergy repair facial mask, it is characterised in that Shu Min repair quintessence it is main
By Astragalus membranacus root extract, bighead atractylodes rhizome rhizome extract, windproof root extract, german chamomile flower extract, silk tree bark extract is sweet
Grass roots extract is mixed.
7. a kind of technique of the facial mask repaired with antiallergy described in any one of claim 1~6, is characterized in that, its is concrete
Comprise the following steps:
S1. ionized water, propane diols, transparent xanthan gum, Sodium Hyaluronate, hydrolysis hyaluronic acid, Carbomer, Jojoba wax are removed
PEG-120 esters, antioxidant are added in emulsification pot and are warming up to 75 DEG C -80 DEG C, and then stirring is transparent homogeneous up to solution,
Then stirring after being incubated is cooled to 45 DEG C;
S2. after the solution of step S1 is cooled to 45 DEG C, PH conditioning agents are added in solution and is stirred;
S3. the solution that step S2 is adjusted after PH is cooled to into 38 DEG C, PPG-10 methyl ethers, hydrolysis is then added in solution
Avenin, extract solution from aloe, EGF, glycosylglycerol, glabridin, Shu Min are repaired and stirred after quintessence, after the assay was approved
Can discharging.
8. it is according to claim 7 it is a kind of with antiallergy repair facial mask production technology, it is characterised in that step S1
In insulation when a length of 30 minutes.
9. it is according to claim 7 it is a kind of with antiallergy repair facial mask production technology, it is characterised in that step S2
In stirring when a length of 35 minutes.
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CN201710116383.2A CN106667853A (en) | 2017-02-28 | 2017-02-28 | Facial mask with antiallergic repair function and production process thereof |
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CN201710116383.2A CN106667853A (en) | 2017-02-28 | 2017-02-28 | Facial mask with antiallergic repair function and production process thereof |
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Cited By (3)
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CN108309847A (en) * | 2018-03-21 | 2018-07-24 | 珠海美高美健康科技有限公司 | Facial mask and preparation method thereof containing camellia seed oil |
CN108464959A (en) * | 2018-03-30 | 2018-08-31 | 珠海美高美健康科技有限公司 | Smoothing toner and preparation method thereof containing dendrobium candidum extract |
CN110354035A (en) * | 2019-07-24 | 2019-10-22 | 广州诚予化妆品有限公司 | A kind of whitening maintenance antiallergic mask with glycyrrhiza glabra raw material |
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Cited By (3)
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CN108309847A (en) * | 2018-03-21 | 2018-07-24 | 珠海美高美健康科技有限公司 | Facial mask and preparation method thereof containing camellia seed oil |
CN108464959A (en) * | 2018-03-30 | 2018-08-31 | 珠海美高美健康科技有限公司 | Smoothing toner and preparation method thereof containing dendrobium candidum extract |
CN110354035A (en) * | 2019-07-24 | 2019-10-22 | 广州诚予化妆品有限公司 | A kind of whitening maintenance antiallergic mask with glycyrrhiza glabra raw material |
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Application publication date: 20170517 |
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