CN106607765A - Compact adjustable polishing solution conveying arm and working engineering thereof - Google Patents

Compact adjustable polishing solution conveying arm and working engineering thereof Download PDF

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Publication number
CN106607765A
CN106607765A CN201710038747.XA CN201710038747A CN106607765A CN 106607765 A CN106607765 A CN 106607765A CN 201710038747 A CN201710038747 A CN 201710038747A CN 106607765 A CN106607765 A CN 106607765A
Authority
CN
China
Prior art keywords
conveying arm
arm
polishing fluid
fluid conveying
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710038747.XA
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Chinese (zh)
Inventor
熊朋
李伟
张志军
姜家宏
王铮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Semiconductor Equipment Institute
Original Assignee
Beijing Semiconductor Equipment Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Semiconductor Equipment Institute filed Critical Beijing Semiconductor Equipment Institute
Priority to CN201710038747.XA priority Critical patent/CN106607765A/en
Publication of CN106607765A publication Critical patent/CN106607765A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

A compact adjustable polishing solution conveying arm comprises a horizontally arranged conveying arm, a rotating shaft vertically connected to one end of the conveying arm and a power mechanism connected to the lower end of the rotating shaft; the power mechanism comprises a rotary cylinder and a cylinder transmission shaft connected to the rotary cylinder; the shaft body of the rotating shaft is connected with the polishing machine body through a bearing and a bearing seat, and the lower end of the rotating shaft is connected with the air cylinder conveying shaft through a diaphragm coupling. The top surface of the rotary cylinder is provided with a rotary disk, and one side surface of the rotary cylinder is provided with an air inlet and an air outlet; the rotating disc is fixedly connected with the cylinder transmission shaft through a flange and a screw; the gas inlet and the gas outlet are connected with a gas flow control device. The rotating angle range of the rotating disc is 0-180 degrees. The polishing solution conveying arm solves the technical problems that an existing polishing solution conveying arm is inconvenient to adjust and inaccurate in rotating position, and solves the problems that the existing polishing solution conveying arm occupies a large space and is not beneficial to research and development of a compact CMP system.

Description

A kind of adjustable polishing fluid conveying arm of compact and its work process
Technical field
The present invention relates to polissoir field, particularly a kind of polishing fluid conveying arm and its work process.
Background technology
In chemically mechanical polishing(CMP)In technical process, polishing fluid is the key element of CMP, the direct shadow of polishing fluid performance The quality of crystal column surface after polishing is rung, suitable polishing fluid can reach high material and remove speed, flatness height, uniform film thickness Effect.Therefore the conveyer device of polishing fluid is most important, and typical CMP planarization liquid conveyer device is polishing fluid conveying arm.So And there are problems that in CMP system:First, fixed position of the transferring arm generally on pad can only once distribute to one Position.Second, according to substrate supporting part head relative to grinding pad position, possibly cannot complete grinding pad middle body it is clear Wash.To solve above-mentioned subproblem, existing polishing fluid conveying arm can be starched in whole grinding pad surface in adjustable ground transmission Material is without being arranged on whole grinding pad, but the device in conveying arm rotary course each time is required for manually adjusting Section, efficiency are low, inaccurate, it is impossible to which guarantee turns to same position every time, cause polishing fluid transfer position different and finally affect The chemical-mechanical polishing rate of wafer and cause surface quality different.There are some existing polishing fluid conveying arms to pass through ball Leading screw controls the movement of mother lead screw, and so as to control the rotation of conveying arm, but the device needs a set of independent control device, accounts for It is big with space, it is unfavorable for the research and development of compact CMP system.
The content of the invention
It is an object of the invention to provide a kind of adjustable polishing fluid conveying arm of compact and its work process, solve existing There is existing polishing fluid conveying arm to adjust inconvenience, the inaccurate technical problem in turned position, and solve existing polishing fluid conveying arm and account for With space it is big, be unfavorable for the problem of the research and development of compact CMP system.
For achieving the above object, the present invention is adopted the following technical scheme that:A kind of adjustable polishing fluid conveying arm of compact, Including horizontally disposed transferring arm, it is vertically connected on the rotary shaft of transferring arm one end and is connected to the engine of rotary shaft lower end Structure;The actuating unit includes rotary cylinder and the cylinder transmission shaft being connected on rotary cylinder;The axle body of the rotary shaft leads to Cross bearing and bearing block to be connected with buffing machine body, lower end is connected with cylinder transmission shaft by diaphragm coupling.
Preferably, the transferring arm includes shield and the fluid ejection chamber being arranged in shield and tube for transfusion;
Wherein fluid ejection chamber along transmission brachium to arranging, and lower surface be provided with a row to uniform intervals and wash away nozzle along length.
Preferably, the fluid ejection chamber passes through the external hydrojet pipeline of interface.
Preferably, foremost wash away the outward-dipping setting of nozzle, remaining washes away nozzle and is vertically arranged.
Preferably, the tube for transfusion has one, its mouth of pipe vertically downward, be arranged on the front end of transferring arm.
Preferably, the upper end of the rotary shaft is connected with the end of shield by screw.
Preferably, the bearing is arranged in pairs, is spaced the outside for being socketed in rotary shaft, and by connector and buffing machine machine Body connects.
Preferably, the top surface of the rotary cylinder is provided with rotating disk, one side and is provided with air inlet and gas outlet;The rotation Disk is fixedly connected with cylinder transmission shaft by flange and screw;The air inlet and gas outlet are connected with gas flow control device Connect.
Preferably, the rotation angle range of the rotating disk is 0 °~180 °.
The work process of the adjustable polishing fluid conveying arm of a kind of compact, it is characterised in that step is:
Step one:Open gas flow control device.
Step 2:Adjusting gas flow control device, control rotary cylinder are rotated.
Step 3:Rotary cylinder is rotated.
Step 4:Transferring arm closes gas flow control device when turning to operating position.
Step 5:Grinding pad is washed away using nozzle is washed away.
Step 6:End is washed away, starts buffing machine, tube for transfusion starts transfusion, and polishing fluid is instilled on grinding pad.
Step 7:Grinding pad is rotated with turntable, completes once to chemically-mechanicapolish polish.
Step 8:Start gas flow control device, transferring arm is reset to into off-position.
Step 9:Grinding pad prosthetic appliance is opened, grinding pad is repaired.
Step 10:Repeat step one is to step 9, until completing the polishing of wafer.
Compared with prior art the invention has the characteristics that and beneficial effect:
1st, by controlling the air inlet of rotary cylinder and the flow of gas outlet, accurately controlled as actuating unit using rotary cylinder The anglec of rotation in the range of 0~180 ° of transferring arm processed, solves the fixed position that existing transferring arm can only be on grinding pad, and one The secondary problem that can only distribute to a position, and ensure that, improve polishing efficiency, accuracy And Grinding Quality.
2nd, it is provided with and washes away nozzle, automatically grinding pad can be cleaned, it is time saving and energy saving.
3rd, present configuration is simply compact, low cost, easy to use, it is not necessary to a set of independent control device, takes empty Between it is little, beneficial to the research and development of compact CMP system.
The composite can be widely applied in chemical-mechanical polishing system.
Description of the drawings
The present invention will be further described in detail below in conjunction with the accompanying drawings.
Fig. 1 is the dimensional structure diagram of the present invention.
Fig. 2 is the cross-sectional view of the present invention.
Reference:1- shields, 2- wash away nozzle, 3- tube for transfusions, 4- screws, 5- rotary shafts, 6- bearings and axle Bearing, 7- diaphragm couplings, 8- cylinder transmission shafts, 9- rotary cylinders, 10- air inlets, 11- gas outlets.
Specific embodiment
Embodiment referring to shown in Fig. 1 and Fig. 2, a kind of adjustable polishing fluid conveying arm of compact and its work process, its A kind of adjustable polishing fluid conveying arm of middle compact includes horizontally disposed transferring arm, is vertically connected on the rotation of transferring arm one end Rotating shaft 5 and it is connected to the actuating unit of 5 lower end of rotary shaft;The actuating unit includes rotary cylinder 9 and is connected to rotary pneumatic Cylinder transmission shaft 8 on cylinder 9;The axle body of the rotary shaft 5 passes through bearing and bearing block 6 is connected with buffing machine body, and lower end leads to Cross diaphragm coupling 7 to be connected with cylinder transmission shaft 8;The transferring arm includes shield 1 and the fluid ejection chamber being arranged in shield 1 and defeated Liquid pipe 3;Wherein fluid ejection chamber along transmission brachium to arranging, and lower surface be provided with a row to uniform intervals and wash away nozzle 2 along length, it is described Fluid ejection chamber by the external hydrojet pipeline of interface, foremost wash away 2 outward-dipping setting of nozzle, remaining washes away nozzle and vertically sets Put;The tube for transfusion 3 has one, its mouth of pipe vertically downward, be arranged on the front end of transferring arm;The upper end of the rotary shaft 5 passes through Screw 4 is connected with the end of shield 1, and the bearing 6 is arranged in pairs, is spaced the outside for being socketed in rotary shaft 5, and passes through connector It is connected with buffing machine body.
The top surface of the rotary cylinder 9 is provided with rotating disk, one side and is provided with air inlet 10 and gas outlet 11;The rotating disk It is fixedly connected with cylinder transmission shaft 8 by flange and screw;The air inlet 10 and gas outlet 11 and gas flow control device Connection, the rotation angle range of the rotating disk is 0 °~180 °.
A kind of work process of the adjustable polishing fluid conveying arm of compact, step is:
Step one:Open gas flow control device.
Step 2:Adjusting gas flow control device, control rotary cylinder 9 are rotated.
Step 3:Rotary cylinder 9 is rotated It is dynamic.
Step 4:Transferring arm closes gas flow control device when turning to operating position.
Step 5:Grinding pad is washed away using nozzle 2 is washed away.
Step 6:End is washed away, starts buffing machine, tube for transfusion 3 starts transfusion, and polishing fluid is instilled on grinding pad.
Step 7:Grinding pad is rotated with turntable, completes once to chemically-mechanicapolish polish.
Step 8:Start gas flow control device, transferring arm is reset to into off-position.
Step 9:Grinding pad prosthetic appliance is opened, grinding pad is repaired.
Step 10:Repeat step one is to step 9, until completing the polishing of wafer.

Claims (10)

1. the adjustable polishing fluid conveying arm of a kind of compact, it is characterised in that:Including horizontally disposed transferring arm,
It is vertically connected on the rotary shaft of transferring arm one end(5)And it is connected to rotary shaft(5)The actuating unit of lower end;
The actuating unit includes rotary cylinder(9)Be connected to rotary cylinder(9)On cylinder transmission shaft(8);
The rotary shaft(5)Axle body pass through bearing and bearing block(6)It is connected with buffing machine body, lower end passes through diaphragm coupling (7)With cylinder transmission shaft(8)Connection.
2. the adjustable polishing fluid conveying arm of compact according to claim 1, it is characterised in that:The transferring arm includes Shield(1)Be arranged on shield(1)Interior fluid ejection chamber and tube for transfusion(3);
Wherein fluid ejection chamber along transmission brachium to arranging, and lower surface be provided with a row to uniform intervals and wash away nozzle along length(2).
3. the adjustable polishing fluid conveying arm of compact according to claim 2, it is characterised in that:The fluid ejection chamber passes through The external hydrojet pipeline of interface.
4. the adjustable polishing fluid conveying arm of compact according to claim 3, it is characterised in that:Foremost wash away spray Mouth(2)Outward-dipping setting, remaining washes away nozzle and is vertically arranged.
5. the adjustable polishing fluid conveying arm of compact according to any one of claim 2 to 4, it is characterised in that:It is described Tube for transfusion(3)Have one, its mouth of pipe vertically downward, be arranged on the front end of transferring arm.
6. the adjustable polishing fluid conveying arm of compact according to claim 5, it is characterised in that:The rotary shaft(5) Upper end pass through screw(4)With shield(1)End connection.
7. the adjustable polishing fluid conveying arm of compact according to claim 6, it is characterised in that:The bearing(6)Into Rotary shaft is socketed in arranging, being spaced(5)Outside, and be connected with buffing machine body by connector.
8. the adjustable polishing fluid conveying arm of compact according to claim 7, it is characterised in that:The rotary cylinder (9)Top surface be provided with rotating disk, one side and be provided with air inlet(10)And gas outlet(11);
The rotating disk passes through flange and screw and cylinder transmission shaft(8)It is fixedly connected;
The air inlet(10)And gas outlet(11)It is connected with gas flow control device.
9. the adjustable polishing fluid conveying arm of compact according to claim 8, it is characterised in that:The rotation of the rotating disk Gyration scope is 0 °~180 °.
10. the work process of the adjustable polishing fluid conveying arm of a kind of compact as described in any one of claim 1-9, which is special Levy and be, step is:
Step one:Open gas flow control device;
Step 2:Adjusting gas flow control device, controls rotary cylinder(9)Rotate;
Step 3:Rotary cylinder(9)Rotate(8), diaphragm coupling(7), rotary shaft(5)And transmission Arm is rotated;
Step 4:Transferring arm closes gas flow control device when turning to operating position;
Step 5:Using washing away nozzle(2)Grinding pad is washed away;
Step 6:End is washed away, starts buffing machine, tube for transfusion(3)Start transfusion, polishing fluid is instilled on grinding pad;
Step 7:Grinding pad is rotated with turntable, completes once to chemically-mechanicapolish polish;
Step 8:Start gas flow control device, transferring arm is reset to into off-position;
Step 9:Grinding pad prosthetic appliance is opened, grinding pad is repaired;
Step 10:Repeat step one is to step 9, until completing the polishing of wafer.
CN201710038747.XA 2017-01-19 2017-01-19 Compact adjustable polishing solution conveying arm and working engineering thereof Pending CN106607765A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710038747.XA CN106607765A (en) 2017-01-19 2017-01-19 Compact adjustable polishing solution conveying arm and working engineering thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710038747.XA CN106607765A (en) 2017-01-19 2017-01-19 Compact adjustable polishing solution conveying arm and working engineering thereof

Publications (1)

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CN106607765A true CN106607765A (en) 2017-05-03

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108145610A (en) * 2017-12-28 2018-06-12 上海华力微电子有限公司 Lapping liquid distribution arm and its chemical and mechanical grinding method
CN108177089A (en) * 2018-01-02 2018-06-19 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) Polishing fluid supply arm and polishing liquid supplying device
CN108326748A (en) * 2018-03-15 2018-07-27 清华大学 Polishing solution delivery device
CN109159020A (en) * 2018-10-26 2019-01-08 长江存储科技有限责任公司 Grinding device
CN109590907A (en) * 2019-01-11 2019-04-09 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) A kind of conveying swing arm of polishing fluid and polissoir
CN112959223A (en) * 2021-02-22 2021-06-15 长江存储科技有限责任公司 Chemical mechanical polishing apparatus and chemical mechanical polishing method

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CN203993559U (en) * 2014-07-25 2014-12-10 中芯国际集成电路制造(北京)有限公司 Lapping liquid supply system and lapping device
CN204124780U (en) * 2014-09-24 2015-01-28 扬州辰讯自动化设备有限公司 The toothbrush handle turn-over rig of mao feeder planted by toothbrush
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CN104827404A (en) * 2015-04-29 2015-08-12 上海华力微电子有限公司 Chemical mechanical grinding equipment
CN204711638U (en) * 2015-07-02 2015-10-21 山东英才学院 Large-scale aluminium component machining center saw blade and the vertical tool magazine of angle head
US20160101498A1 (en) * 2014-10-10 2016-04-14 Ebara Corporation Buffing apparatus and substrate processing apparatus
CN205463380U (en) * 2016-03-21 2016-08-17 浙江森永光电设备有限公司 Washing unit of pressure plate in single throwing machine

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1672876A (en) * 2004-03-25 2005-09-28 株式会社东芝 Polishing apparatus and method of polishing a subject
CN101121239A (en) * 2006-08-07 2008-02-13 上海华虹Nec电子有限公司 Chemical and mechanical grinding bench chemical liquid supplying device
CN102837200A (en) * 2012-08-14 2012-12-26 西北工业大学 Automatic turning device based on workpiece positioning
US20140069890A1 (en) * 2012-09-10 2014-03-13 Applied Materials, Inc. Substrate polishing and fluid recycling system
CN103692359A (en) * 2012-09-27 2014-04-02 盛美半导体设备(上海)有限公司 Polishing fluid arm
CN103846777A (en) * 2012-11-29 2014-06-11 盛美半导体设备(上海)有限公司 Chemical mechanical grinding device and method
CN203212629U (en) * 2013-03-26 2013-09-25 肇庆市腾胜真空技术工程有限公司 Cylinder fixing mechanism for evaporation curtain board in evaporator
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CN204711638U (en) * 2015-07-02 2015-10-21 山东英才学院 Large-scale aluminium component machining center saw blade and the vertical tool magazine of angle head
CN205463380U (en) * 2016-03-21 2016-08-17 浙江森永光电设备有限公司 Washing unit of pressure plate in single throwing machine

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108145610A (en) * 2017-12-28 2018-06-12 上海华力微电子有限公司 Lapping liquid distribution arm and its chemical and mechanical grinding method
CN108177089A (en) * 2018-01-02 2018-06-19 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) Polishing fluid supply arm and polishing liquid supplying device
CN108326748A (en) * 2018-03-15 2018-07-27 清华大学 Polishing solution delivery device
CN108326748B (en) * 2018-03-15 2020-09-15 清华大学 Polishing solution conveying device
CN109159020A (en) * 2018-10-26 2019-01-08 长江存储科技有限责任公司 Grinding device
CN109590907A (en) * 2019-01-11 2019-04-09 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) A kind of conveying swing arm of polishing fluid and polissoir
WO2020143260A1 (en) * 2019-01-11 2020-07-16 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) Swing arm for polishing slurry delivery and polishing device
CN112959223A (en) * 2021-02-22 2021-06-15 长江存储科技有限责任公司 Chemical mechanical polishing apparatus and chemical mechanical polishing method

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Application publication date: 20170503

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