CN106547170A - A kind of markers align device and alignment methods - Google Patents
A kind of markers align device and alignment methods Download PDFInfo
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- CN106547170A CN106547170A CN201510590322.0A CN201510590322A CN106547170A CN 106547170 A CN106547170 A CN 106547170A CN 201510590322 A CN201510590322 A CN 201510590322A CN 106547170 A CN106547170 A CN 106547170A
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Abstract
The present invention discloses a kind of markers align device, it is characterised in that include：At least two groups alignment sensors, the alignment sensor include a wide-angle lens, and the field range of the wide-angle lens is more than 90 degree；At least one pair of fiducial mark remembers that the alignment mark is located in the visual field overlapping region of two groups of alignment sensors.Present invention simultaneously discloses a kind of alignment methods.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, more particularly to a kind of markers align device and alignment methods.
Background technology
Litho machine is the machine on a kind of graph exposure to substrate for needing user, is the key equipment in IC manufacturing field.In manufacture integrated circuit process, usually multi-layer graphical can be exposed on one piece of substrate.In order that integrated circuit can play due circuit characteristic, it is necessary to assure the overlapping accuracy of each layer pattern.Common means are to increase alignment mark in the specific region of substrate, and position of the measurement alignment mark in 1 coordinate system of work stage, according to this positional information, calculates correct exposure position, so that required figure is accurately exposed in the target location of substrate.
At present, alignment is mainly aligned using full lining bottom.Shown in technical scheme as disclosed in CN101385122A, full lining bottom is aligned by be taken into account disposal ability and only detects the alignment mark of the several irradiation areas on substrate to obtain the systematicness of irradiation area arrangement.
With the development of photoetching technique, the integrated level more and more higher of integrated circuit, the size of substrate are increasing, need the labelling being aligned also gradually to increase on substrate, by all of alignment mark, all alignment completes the spent time and is consequently increased, and this is unfavorable for the raising of litho machine overall productivity.In order to improve alignment efficiency, a kind of method disclosed in prior art is to increase the number of alignment sensor, as shown in CN101957567B disclosures.As shown in figure 1, Fig. 1 is a kind of alignment device of the prior art, wherein 1 is work stage, 2 is silicon chip, and 3 is sensor.Multiple alignment sensors 3 are designed, multiple alignment marks of measurement that can be parallel.Although the quantity that the technical scheme increases merely alignment sensor can increase the area that synchronization alignment sensor is irradiated on substrate to a certain extent, there is certain gap between each alignment sensor due to the limited area of the substrate of each alignment sensor irradiation；When labelling to be aligned is located between each sensor, want to be directed at all of labelling, work stage 1 will produce x directions simultaneously and the athleticism in y directions takes labelling below alignment sensor visual field to.
Content of another kind of technical scheme of the prior art as disclosed in CN101385122A.Fig. 2 is another alignment device in prior art, wherein 1 is silicon chip for work stage 1,2.Multiple alignment sensors 3 are designed, and the relative position to Barebone can be adjusted, wherein turning arm 32 can turn an angle around center of rotation 31, alignment head is entirely located at the top of substrate in turning arm away from the side of center of rotation to Barebone.The anglec of rotation of turning arm during alignment, is adjusted, just can change the position of alignment head, whereby can be according to the relative position between the alignment mark adjustment alignment head of various location on substrate.Although the relative position between the technical scheme alignment sensor is adjustable, the region that each alignment head can be aligned still is limited by turning arm and the anglec of rotation；In addition, the marker number that each alignment sensor can be aligned is limited, when wait number of the number of labels being aligned more than alignment sensor, still there is part labelling to depend on work stage 1 while the athleticism for producing x directions and y directions takes labelling below alignment sensor visual field to；In this, design also increases mechanical complications simultaneously, extends integrated, debugging cycle, reduces integrated efficiency.
The content of the invention
The purpose of the present invention is providing a kind of new markers align device, can cover the X-direction of whole aligning surface, reduces work stage move distance and movement dimension, shortens the alignment time.
In order to realize foregoing invention purpose, the present invention discloses a kind of markers align device, it is characterised in that include：At least two groups alignment sensors, the alignment sensor include a wide-angle lens, and the field range of the wide-angle lens is more than 90 degree；At least one pair of fiducial mark remembers that the alignment mark is located in the visual field overlapping region of two groups of alignment sensors.
Further, field range of the two groups of alignment sensors along vertical marker scanning direction is more than 90 degree.
Further, field range of the two groups of alignment sensors along mark scan direction is not more than 90 degree.
Further, the alignment sensor also includes a lighting unit, and the lighting unit is located on the outside of the wide-angle lens.
Further, the lighting unit is a ring illumination unit.
Further, the alignment sensor also includes an image-generating unit and a graphics processing unit.
Further, the alignment device also includes a support, and the support is used to fix the alignment sensor.
Present invention simultaneously discloses a kind of markers align method, including：Step one, the first direction along substrate arrange at least two groups alignment sensors for including wide-angle lens, arrange at least one pair of fiducial mark and remember in the visual field overlapping region of the alignment sensor；The alignment sensor is demarcated in step 2, the imaging according to the alignment mark at least two groups alignment sensors；Step 3, the alignment sensor obtain the alignment image, and the positional information of the labelling is obtained according to the alignment image.
Further, the step 2 includes：2.1 pairs this be imaged into line distortion precorrection；Line distortion demarcation is entered in 2.2 pairs of distortion precorrection；2.3 demarcate acquisition labelling location of pixels-physical location synopsis according to the distortion.
Further, the distortion precorrection in 2.1 adopts longitude and latitude correction method.
Further, the corresponding relation of the longitude and latitude correction is：
, wherein (x, y) is the coordinate of arbitrfary point P in the imaging,（β, α）For the corresponding coordinate of P points of longitude and latitude expanded view, focal lengths of the f for alignment sensor.
Compared with prior art, the visual field of alignment device provided by the present invention can cover the x directions of whole aligning surface；No matter how alignment mark is distributed on real estate, and distributed quantity is how many, can not move between alignment sensor in the case of relative position, realize substrate（By taking substrate as an example）X to size all cover, in alignment procedures work stage only need to along y to move can be on the whole real estate of covering alignment mark.Work stage move distance and movement dimension are reduced, the consumption of alignment time is shortened.
Description of the drawings
Can be described in detail by invention below with regard to the advantages and spirit of the present invention and institute's accompanying drawings are further understood.
Fig. 1 is a kind of structural representation of the alignment device disclosed in prior art；
Fig. 2 is the structural representation of another kind of alignment device disclosed in prior art；
Fig. 3 is basic alignment mark distribution schematic diagram；
Fig. 4 is alignment scene schematic diagram in prior art；
Fig. 5 is the alignment scene schematic diagram of alignment device provided by the present invention；
Fig. 6 is the structural representation of alignment sensor provided by the present invention；
Fig. 7 is the structural representation of flake alignment sensor provided by the present invention；
Fig. 8 is that fish eye lens provided by the present invention shuts out the light area schematic；
Fig. 9 is alignment methods flow chart provided by the present invention；
Figure 10 is the demarcation path schematic diagram of alignment methods provided by the present invention；
Figure 11 is the top view of alignment sensor provided by the present invention；
Figure 12 is one of side view of alignment sensor provided by the present invention；
Figure 13 is the two of the side view of alignment sensor provided by the present invention；
Figure 14 is panorama picture of fisheye lens effect emulation figure provided by the present invention.
Specific embodiment
Describe the specific embodiment of the present invention below in conjunction with the accompanying drawings in detail.
As shown in figure 3, Fig. 3 is basic alignment mark distribution schematic diagram.Alignment mark can be distributed in substrate in principle（By taking substrate 4 as an example）Any region, it is considered to limiting case, indicia distribution to be aligned is on four angles of substrate 4.For alignment device conventional at present, work stage 1 is needed to carry each marker motion on substrate 4 in Barebone visual field, as shown in Figure 4.The time that the motion of work stage 1 expends is more, causes the time that whole alignment procedures expend longer.The present invention using visual angle more than 90 degree of fish eye lens alignment sensor combination by the whole x of substrate 4 to size covered in field range entirely, under the above-mentioned distribution situation of alignment mark, work stage 1 need to be moved once, as shown in Figure 5.By reducing the motion in the aligning process of work stage 1, the overall efficiency of alignment procedures is improved.
First embodiment provided by the present invention is a kind of substrate（By taking substrate 4 as an example）Alignment device.As shown in fig. 6, a is in alignment with the side view of sensor, top views of the b for alignment sensor.The characteristics of alignment device provided by the present invention be comprising：Fish eye lens（Also known as wide-angle lens）54th, image-forming component 52, lighting unit 51, graphics processing unit 53.Fish eye lens 54 is responsible for providing the visual field more than 90 degree；Image-forming component 52 is responsible for forming image information；Further, since the special operative scenario of litho machine, substrate 4 to be aligned itself can not light, and the light for needing reflection outside can just be aligned sensor within alignment sensor visual field and see, it is therefore desirable to the offer illumination of lighting unit 51；Finally, need to process the image information for obtaining, enable to adapt to the needs of litho machine alignment.
Alignment device provided by the present invention can constitute one to Barebone, the alignment system features be comprising：Multiple above-mentioned alignment devices 5, the field of view portion of above-mentioned alignment device are overlapped, and alignment mark 6 is designed in the alignment visual field for overlapping, and the alignment mark in overlapped fov is demarcated for carrying out each alignment sensor 5 mutually, as shown in Figure 7.By taking scene shown in Fig. 7 as an example, two sets of above-mentioned alignment devices 5 are included to Barebone, the field of view portion of two sets of above-mentioned alignment devices overlaps, designs one group of alignment mark, labelling is made while occurring in two alignment device visual fields on the substrate 4 in the overlapping region of visual field.
The mutual calibration process of each alignment sensor includes：Left alignment sensor obtains the position of each alignment mark, while right alignment sensor obtains the position of each alignment mark, the result of two groups of alignment sensor acquisitions is poor, and the result for obtaining is alignment sensor and mutually marks result.The characteristics of above-mentioned alignment sensor is demarcated is that the visual field of alignment sensor has overlap, and the mutual mark of alignment sensor can be just realized in the case of not travelling workpiece platform 1.
For fish eye lens, the present embodiment takes its subregion as alignment area, other region shading treatments, as shown in Figure 8.For visual angle is α, focal length isfAlignment sensor, then the greatest length that alignment device can be covered in the present embodiment：
（1）
If the X of substrate 4 is L to length, according to（1）, cover the alignment sensor quantity needed for the X to the length of side of substrate 4 and be at least：
（2）
Fig. 9 is alignment methods flow chart provided by the present invention, and the alignment methods include that alignment sensor demarcates S1 and alignment sensor application S2.Alignment sensor scaling method S1 includes：Alignment sensor obtains image, and the image to obtaining enters line distortion precorrection S101, and the image after being corrected is imaged in the visual field of image-forming component；Enter line distortion to the image after above-mentioned correction and demarcate S102, obtain labelling location of pixels-physical location synopsis S103.Fish eye lens is a kind of short focus, the pick-up lenss of big visual field.From optical principle, focal length is shorter, and visual angle is bigger, it is also bigger into the distortion produced by image.Fish eye images distortion is serious, it is necessary to be corrected to the image are accustomed to by people.
Longitude and latitude correction method of the distortion precorrection that the present embodiment is included by using fish eye images, sets up the relation that flake picture is taken up an official post in meaning point and longitude and latitude expanded view between corresponding point：
（3）
Wherein, (x,y) for the coordinate of arbitrfary point P in fish eye images,（β,α）For the corresponding coordinate of P points of longitude and latitude expanded view,fFor the focal length of alignment sensor.
The distortion that the present embodiment is included is demarcated to be included：Arch distortion to the image remaining after precorrection is demarcated.Carried with markd substrate 4 according to the path step motion planned by work stage 1, as shown in Figure 10 so that labelling occurs in diverse location in image-forming component visual field.Per stepping once, acquisition is marked at 1 position of the location of pixels in visual field and work stage this moment.After the completion of work stage 1 is according to path planning motion, location of pixels-physical location synopsis is obtained, the corresponding physical location of each location of pixels is calculated according to interpolation algorithm, complete location of pixels-physical location synopsis M is obtained, as shown in table 1.
Table 1
Above-mentioned alignment sensor application includes：Implement to be aligned using calibrated alignment sensor.The flow process of alignment includes：Calculate the alignment desired locations of work stage 1；Work stage 1 reaches alignment desired locations；Alignment sensor obtains the alignment image comprising alignment mark；Image after the precorrection that distorts is shown in image-forming component；Region Matching is carried out with reference to alignment template；Obtain labelling location of pixels be：(p_n, p_m), according to the actual physical location that location of pixels-physical location synopsis obtains labelling be：(X, Y).
（4）
Above-mentioned alignment device also includes：Alignment sensor support 55, alignment sensor 54 are fixed on alignment sensor support 55, and alignment sensor support is fixed on the whole machine frame above substrate 44, as shown in Figure 11 ~ Figure 13.
Shown in Figure 11, alignment sensor 54 is disposed vertically above material, receives the light that material subscript note is returned；The characteristics of having wide-angular field using alignment sensor 54, alignment sensor 54 need not do corresponding movement along x directions, it is possible to receive the markd image of whole x directions institute.The technical characterstic of 54 layout of alignment sensor is the sensor or sensor combinations using wide-angular field, it is a technical advantage that saving the relative motion in alignment sensor and lower section material x directions；Shown in Figure 12,54 periphery of alignment sensor needs to arrange downward light source, and the effect of light source is light to be projected on the material below alignment sensor 54, and then material reflexes to light in 54 visual field of alignment sensor；Shown in Figure 13, the light area of the Y-direction of alignment sensor 54 can be blocked, so that alignment sensor 54 only receives the label information in one bar-shaped zone of underface, can so reduce graphics process stage amount of calculation；But alignment sensor 54 be not limited to only to receive immediately below label information in bar-shaped zone, so shield portions region it is not necessary to.
Optical simulation is carried out to fish-eye imaging effect using optical simulation software ZMAX, design sketch is as shown in figure 14.Wherein, scheme (a) and represent original image, figure (b) represents panorama picture of fisheye lens effect；Fish eye lens angle of half field-of view is set to 100o, image-forming component pixel size（Pixel Size）0.01mm is set to, X-Pixels is set to 3500, Y-Pixels and is set to 3500.As seen from Figure 14, under these conditions, fish eye lens effect effect is than more visible.
Present invention simultaneously provides second embodiment.In the embodiment, alignment device feature includes：The different fish eye lens in visual angle, image-forming component, lighting unit, graphics processing unit.Fish eye lens is responsible for providing the visual field more than 90 degree；Image-forming component is responsible for forming image information；Another lighting unit provides illumination；Finally, need to process the image information for obtaining, enable to adapt to the needs of litho machine alignment.This alignment device can constitute one to Barebone, the alignment system features be comprising：Multiple above-mentioned alignment devices, above-mentioned alignment device each fish-eye angular field of view can be with difference.According to substrate x sizes and each fish-eye visual angle, the number of fish eye lens alignment sensor flexibly can change.Substrate x sizes are s, the visual angle of fish eye lens alignment sensor is β 1, β 2 ..., β n, focal length is f1, f2 ..., fn, then the fish eye lens alignment sensor number n wanted needed for the present embodiment meets 2 (f1 tan (β 1/2)+f2 tan (β 2/2) ...+fn tan (β n/2))≤s；Wherein, n takes positive integer.
The preferred embodiment of the simply present invention described in this specification, above example is only to illustrate technical scheme rather than limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (11)
1. a kind of markers align device, it is characterised in that include：
At least two groups alignment sensors, the alignment sensor include a wide-angle lens, and the field range of the wide-angle lens is more than 90 degree；
At least one pair of fiducial mark remembers that the alignment mark is located in the visual field overlapping region of two groups of alignment sensors.
2. markers align device as claimed in claim 1, it is characterised in that field range of the two groups of alignment sensors along vertical marker scanning direction is more than 90 degree.
3. markers align device as claimed in claim 2, it is characterised in that field range of the two groups of alignment sensors along mark scan direction is not more than 90 degree.
4. markers align device as claimed in claim 1, it is characterised in that the alignment sensor also includes a lighting unit, the lighting unit is located on the outside of the wide-angle lens.
5. markers align device as claimed in claim 4, it is characterised in that the lighting unit is a ring illumination unit.
6. markers align device as claimed in claim 1, it is characterised in that the alignment sensor also includes an image-generating unit and a graphics processing unit.
7. markers align device as claimed in claim 1, it is characterised in that the alignment device also includes a support, the support is used to fix the alignment sensor.
8. a kind of markers align method, it is characterised in that include：
Step one, the first direction along substrate arrange at least two groups alignment sensors for including wide-angle lens, arrange at least one pair of fiducial mark and remember in the visual field overlapping region of the alignment sensor；
The alignment sensor is demarcated in step 2, the imaging according to the alignment mark at least two groups alignment sensors；Step 3, the alignment sensor obtain the alignment image, and the position of the labelling is obtained according to the alignment image
Information.
9. markers align method as claimed in claim 8, it is characterised in that the step 2 includes：2.1 pairs described to be imaged into line distortion precorrection；Line distortion demarcation is entered in 2.2 pairs of distortion precorrection；2.3 demarcate acquisition labelling location of pixels-physical location synopsis according to the distortion.
10. markers align method as claimed in claim 9, it is characterised in that the distortion precorrection in described 2.1 adopts longitude and latitude correction method.
11. markers align methods as claimed in claim 10, it is characterised in that the corresponding relation of longitude and latitude correction is：
, wherein (x, y) is the coordinate of arbitrfary point P in the imaging,（β, α）For the corresponding coordinate of P points of longitude and latitude expanded view, focal lengths of the f for alignment sensor.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111683514A (en) * | 2020-06-10 | 2020-09-18 | 深圳汉和智造有限公司 | False pressure alignment method and false pressure equipment |
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| EP1372040B1 (en) * | 2002-06-11 | 2008-03-05 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101221375A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Machine vision system used for step photo-etching machine alignment system and its calibration method |
| CN202111802U (en) * | 2010-02-12 | 2012-01-11 | 王炳立 | Calibration device for monitoring apparatus with multiple image sensors |
| CN104851104A (en) * | 2015-05-29 | 2015-08-19 | 大连理工大学 | Flexible-target-based close-range large-field-of-view calibrate method of high-speed camera |
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2015
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1372040B1 (en) * | 2002-06-11 | 2008-03-05 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101221375A (en) * | 2008-01-25 | 2008-07-16 | 上海微电子装备有限公司 | Machine vision system used for step photo-etching machine alignment system and its calibration method |
| CN202111802U (en) * | 2010-02-12 | 2012-01-11 | 王炳立 | Calibration device for monitoring apparatus with multiple image sensors |
| CN104851104A (en) * | 2015-05-29 | 2015-08-19 | 大连理工大学 | Flexible-target-based close-range large-field-of-view calibrate method of high-speed camera |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111683514A (en) * | 2020-06-10 | 2020-09-18 | 深圳汉和智造有限公司 | False pressure alignment method and false pressure equipment |
| CN111683514B (en) * | 2020-06-10 | 2024-03-12 | 深圳汉和智造有限公司 | False pressure equipment |
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