CN106508170A - Seed processing device and method for improving drought resistance of wheat buds - Google Patents
Seed processing device and method for improving drought resistance of wheat buds Download PDFInfo
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- CN106508170A CN106508170A CN201610920417.9A CN201610920417A CN106508170A CN 106508170 A CN106508170 A CN 106508170A CN 201610920417 A CN201610920417 A CN 201610920417A CN 106508170 A CN106508170 A CN 106508170A
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01C—PLANTING; SOWING; FERTILISING
- A01C1/00—Apparatus, or methods of use thereof, for testing or treating seed, roots, or the like, prior to sowing or planting
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01C—PLANTING; SOWING; FERTILISING
- A01C1/00—Apparatus, or methods of use thereof, for testing or treating seed, roots, or the like, prior to sowing or planting
- A01C1/02—Germinating apparatus; Determining germination capacity of seeds or the like
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- Environmental Sciences (AREA)
- Health & Medical Sciences (AREA)
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- Cultivation Of Plants (AREA)
- Pretreatment Of Seeds And Plants (AREA)
Abstract
The invention discloses a seed processing device and method for improving the drought resistance of wheat buds. The device comprises an adjustable frequency alternating current high voltage power supply, a reactor and an electrical parameter detection system. The peak voltage of the alternating current high voltage power supply can be adjusted in 0-50 kV, and the frequency is adjustable in 50-1000 Hz; a stainless steel sheet is adopted as a high voltage electrode; a quartz glass sheet used as a discharge medium clings to the bottom surface of the high voltage electrode; and a metal mesh is adopted as a grounding electrode. The high voltage terminal of the alternating current high voltage power supply is connected with the high voltage electrode of the reactor, and the low voltage terminal of the alternating current high voltage power supply is connected with the grounding electrode of the reactor. A digital oscilloscope, a voltage probe and a current probe form the electrical parameter detection system which is used for detecting a discharge voltage and a current signal. The device and the method can promote the germination of wheat seeds under a drought condition and promote the growth of wheat seedlings under the drought condition, the membrane lipid peroxidation level of buds is reduced after discharge treatment, damages of oxygen radicals to the buds are reduced, and the discharge treatment improves the drought resistance of the buds.
Description
Technical field
The invention belongs to agricultural technology field, is related to a kind of device for treatment of seeds for improving shoots of wheat drought resistance and side
Method, specifically, is related to a kind of atmospheric dielectric barrier discharge plasma seed treatment dress for improving shoots of wheat drought resistance
Put and method.
Background technology
As global climate persistently warms, shortage of water resources and its cause including including China in global spatial and temporal distributions inequality
More than 80 country's serious water shortages, arid has become the key constraints of world agriculture production.Semen Tritici aestivi is that China is second largest
Cereal crops, have very important status in agricultural production.Shan sweet peaceful one is the important wheat belt of China with profile in dry highland of Loess Plateau,
Yield potential is big, but belongs to semiarid and semi-moist easily drought type this area's weather more, and drought and water shortage is to limit this area's Semen Tritici aestivi to produce
One of principal element of amount.Therefore, improve this area's drought resistance of wheat to increase income wheat increase yield, solve shortage of water resources to Semen Tritici aestivi
The negative effect of production is significant.
It is biological in environment to there is important adjustment effect with abiotic factor to crops gene expression.Generally,
Most of genes are in silence state and do not express；Gene expression is excited by the environmental stimuli of certain way, promotes crop life
It is long, it is the effective way for improving Plant Drought Resistance.Conventional drought resistance regulation and control method mainly has hormonal regulation (abscisic acid, red
Mycin, the basic element of cell division, polyamines etc.), drought hardening, seed immersion (drought resistance agent, nutrient etc.), fertilising, silicon apply, external source mistake
Hydrogen oxide applying, magnetic field regulation and control, highfield process, ultraviolet radioactive etc..Wherein, magnetic field regulation and control and highfield are processed because without xenobioticses
The introducing of matter and receive significant attention.However, electric field and magnetic field are single physical factor, regulation and control process time for needing compared with
Long, efficiency is low, and average amount of increase in production is about 6%, and treatment effect is unstable.Therefore, new and effective crop drought resistance regulation and control side
The research and development of method are very necessary.
Plasma is the 4th kind of state that material is present, and is made up of the gaseous conductor for ionizing wholly or in part, empty at which
Between be contained within the particles such as abundant high activity atom, molecule, ion and free radical.Put with the gas that high pressure non-uniform electric field causes
Electricity is the method for the conventional acquisition discharge plasma of laboratory, its process produce a large amount of high energy electrons, ion, free radical, point
The physical and chemical effect such as sub (ozone, hydrogen peroxide etc.), ultraviolet radioactive and highfield.When with material surface contact, electric discharge etc. from
Self-energy can be passed to the molecule and atom of material surface for daughter, and some active particles can also be injected into material surface to be caused
Collide, excite, resetting, isomery etc., so as to change the surface property of material.At present, discharge plasma is in seed sprouting, farming
The aspects such as thing volume increase have obtained widely studied.Existing research is concentrated mainly on macroscopical biological effect of seed sprouting and production should
With aspect, whether plasma regulation and control can cause the research of wheat seed drought resistance more rarely seen.
The content of the invention
It is an object of the invention to overcome the defect that above-mentioned technology is present, there is provided a kind of kind of raising shoots of wheat drought resistance
Sub-processing unit and method, the device can promote biological characters of wheat under drought conditions seed to sprout, and promote biological characters of wheat under drought conditions children
Seedling grows, and after discharge process, the level of Membrane Lipid Peroxidation of plumelet is reduced, and oxygen-derived free radicals weaken to plumelet injury, and discharge process can
Improve resistivity of the plumelet to arid.
Its concrete technical scheme is：
It is a kind of improve shoots of wheat drought resistance device for treatment of seeds, including Frequency Adjustable ac high voltage source, reactor and
Electric parameter detecting system.Crest voltage 0～the 50kV of range of accommodation of ac high voltage source 2,50～1000Hz of frequency is adjustable；It is high
Piezoelectricity extremely stainless steel substrates；Quartz glass plate is close to immediately below high-field electrode, used as discharge medium；Wire netting is ground connection electricity
Pole.The high-pressure side of ac high voltage source 2 is connected with the high-field electrode of reactor 1, the ground electrode phase of its low-pressure end and reactor 1
Even.Digital oscilloscope 3, voltage probe 4 and current probe 5 collectively form electric parameter detecting system, detection discharge voltage and electricity
Stream signal.In experiment, the distance between high-field electrode and ground electrode are adjustable, and wheat seed is positioned on ground electrode.Carrier gas
Supplied by gas cylinder 8, its flow is controlled by effusion meter 7；Carrier gas enters reaction from the entrance of reactor 1 after the regulation and control of effusion meter 7
System, discharges after then passing through wire netting；The tail gas of discharge is absorbed using KI absorbing liquids 9, and detects gas phase with ozone tester 6
Residual ozone concentration.
Further, the reactor is screen cloth-board-like dielectric barrier discharge reactor.
A kind of method for treating seeds for improving shoots of wheat drought resistance, comprises the following steps：Dielectric barrier discharge is processed
Seed afterwards is placed in 50ml triangular flasks is sterilized 10min with medical alcohol, presoaking and germinating after aseptic water washing 3 times；Matched group is adopted
Soaked seed with sterilized water, drought stress group adopts Polyethylene Glycol PEG-6000 solution seed soakings；The surface of the seed moisture is sucked with absorbent paper,
Uniformly it is placed in the culture dish of moistening, places Jing in culture dish in advance and be sprayed to moistening but do not have the two panels of liquid flowing qualitative
Filter paper, drought stress group sprinkling PEG-6000 solution, matched group sprinkling sterilized water, 50 seeds of each culture dish, plus 10ml steam
Distilled water or solution；Seed is allowed to sprout naturally by being placed in after culture dish label in 20 DEG C of constant temperature and humidity illumination boxs, normal control
Group is poured daily with appropriate amounts of sterilized water, and drought stress group is sprayed PEG-6000 solution to keep germinating bed to moisten daily；Record daily
A number of germination, cultivates four days, takes out 15 seeds, measurement root length, bud length, fresh weight, dry weight etc. at random within the 4th day from every disk,
And calculate germination percentage, germinating energy, germination index, vitality index.
Compared with prior art, beneficial effects of the present invention are：
The present invention can promote biological characters of wheat under drought conditions seed to sprout, and promote biological characters of wheat under drought conditions growth of seedling, put
After electric treatment, the level of Membrane Lipid Peroxidation of plumelet is reduced, and oxygen-derived free radicals weaken to plumelet injury, and discharge process can improve plumelet
Resistivity to arid.After discharge process, wheat germination gesture and germination percentage increase 24.0% and 8.8% respectively；And for
20%PEG drought stress groups, after discharge process, wheat germination gesture and germination percentage increase 107.6% and 33.4% respectively.Electric discharge
After process, wheat root length and bud length increase 11.8% and 4.7% respectively；And for 15%PEG drought stress groups, discharge process
Wheat root length and bud length increase 33.7% and 84.1% respectively afterwards.Plumelet O after discharge plasma process2·-Content is
Reduce.After this explanation discharge process, peroxy radical weakens to plumelet injury, and discharge process can improve plumelet and arid is supported
Anti- ability.
Description of the drawings
Fig. 1 is the structural representation of the device for treatment of seeds that the present invention improves shoots of wheat drought resistance；
Structural representations of the Fig. 2 for reactor；
Fig. 3 is Semen Tritici aestivi seed coat structure change before and after discharge process, wherein, a and c:Before processing；B and d:After process；Arrow in d
Head indicates slight crack.
Specific embodiment
Technical scheme is described in more detail with specific embodiment below in conjunction with the accompanying drawings.
The present invention adopts gas phase media barrier discharge plasma system (such as Fig. 1).Mainly by Frequency Adjustable AC high voltage
Source, reactor and electric parameter detecting system composition.Crest voltage 0～the 50kV of range of accommodation of Frequency Adjustable ac high voltage source,
50～1000Hz of frequency.The reactor that this research is adopted is screen cloth-board-like dielectric barrier discharge reactor (such as Fig. 2), reactor
Wall 10 is lucite tube, and high-field electrode 11 is the thick stainless steel substrates for 2mm, using 12 conduct of mica sheet or quartz glass plate
Discharge medium, ground electrode 13 are fine and close stainless steel wire meshes, and pending seed filling is on ground electrode 13.During process, first
A certain amount of wheat seed monolayer is laid on ground electrode 13, high voltage power supply is then opened and is started electric discharge, realize atmospheric pressure
Under the conditions of process of the air plasma to seed.In experimentation, gas is entered from dielectric barrier discharge reactor inlet 14,
Discharge from outlet 15 through after wire netting.The process intensity of seed can be controlled by regulating and controlling plasma service condition.Electrically
Parameter detecting system includes voltage probe, current probe and oscillograph.Voltage probe and current probe are to gather discharge system
In voltage, current signal, by oscilloscope display and record corresponding voltage, current parameters and waveform.Ozone tester is used for
Ozone concentration in detection tail gas.
Seed after dielectric barrier discharge is processed is placed in 50ml triangular flasks with medical alcohol sterilization 10min, sterilized water
Presoaking and germinating after rinsing 3 times；Matched group is soaked seed using sterilized water, and drought stress group is soaked using Polyethylene Glycol PEG-6000 solution
Kind.The surface of the seed moisture is sucked with absorbent paper, is uniformly placed in the culture dish of moistening and (is placed Jing in advance to be sprayed in culture dish
The two panels qualitative filter paper for moistening but not having liquid to flow, drought stress group sprinkling PEG-6000 solution, matched group sprinkling are aseptic
Water), 50 seeds of each culture dish, plus 10ml distilled water or solution.20 DEG C of constant temperature and humidity illumination will be placed in after culture dish label
Seed is allowed to be sprouted in incubator naturally, Normal group is poured daily with appropriate amounts of sterilized water, drought stress group sprays PEG- daily
6000 solution are moistened with keeping germinating bed.A number of record germination daily, cultivates four days, takes out 15 at random within the 4th day from every disk
Seed, measurement root length, bud length, fresh weight, dry weight etc., and calculate germination percentage, germinating energy, germination index, vitality index.
(1) with without discharge plasma treatment group as matched group.In discharge voltage 13.0kV, discharge process time 4min
Under conditions of, impact of the different PEG concentrations to wheat seeds sprouting is as shown in table 1.Test result indicate that, with Middle altitude mountain
Increase, matched group and discharge process group wheat seed germinating gesture and germination percentage are constantly reduced；Additionally, compared with matched group, Jing
After overdischarge corona treatment, each group wheat seed germinating gesture and germination percentage are significantly increased.Drought stress group is through electric discharge etc.
After gas ions process, the rate of increase of germinating energy and germination percentage is more than without drought stress group；For without drought stress group, and to photograph
Than after discharge process, wheat germination gesture and germination percentage increase 24.0% and 8.8% respectively；And for 20%PEG drought stresses
Group, after discharge process, wheat germination gesture and germination percentage increase 107.6% and 33.4% respectively.At this explanation discharge plasma
Reason can promote biological characters of wheat under drought conditions seed to sprout.
The germination percentage (%) of wheat seed under 1. difference PEG dosage of table
The significance of difference * p compared with matched group<0.05, * * p<0.01
(2) in discharge voltage 13.0kV, under conditions of discharge process time 4min, different PEG concentrations are sprouted to wheat seed
The impact of the root length and bud length sent out is as shown in table 2.Test result indicate that, with the increase of Middle altitude mountain, at matched group and electric discharge
Reason group Wheat Species daughter root length and bud length are constantly reduced；Additionally, compared with matched group, each group after discharge plasma process
Wheat Species daughter root length and bud length are significantly increased.Drought stress group through discharge plasma process after, the increasing of root length and bud length
Long rate is more than without drought stress group；For without drought stress group, compared with the control, wheat root length and bud length difference after discharge process
Increase 11.8% and 4.7%；And for 15%PEG drought stress groups, after discharge process, wheat root length and bud length increase respectively
33.7% and 84.1%.This explanation discharge plasma is processed and can promote biological characters of wheat under drought conditions growth of seedling.
Under 2. difference PEG dosage of table, the root length of wheat germination and bud are long
The significance of difference * p compared with matched group<0.05, * * p<0.01
(3) in discharge voltage 13.0kV, under conditions of discharge process time 4min, investigated different drought intensity (0%,
5%, 10%, 15% and 20%PEG addition) impact to wheat seed plumelet MDA, as shown in table 3, with place of not discharging in experiment
Reason group is matched group.Test result indicate that, matched group and discharge process group shoots of wheat MDA contents are with the increase of PEG dosage
Dramatically increase, illustrate that Middle altitude mountain increased the injury to film.Additionally, compared with each matched group, after discharge plasma process
Plumelet MDA contents decrease.After this explanation discharge process, the level of Membrane Lipid Peroxidation of plumelet is reduced, and oxygen-derived free radicals are to plumelet
Injury weakens, and discharge process can improve resistivity of the plumelet to arid.
Under 3. different drought strength condition of table before and after discharge process shoots of wheat MDA change (1d)
* represent compared with non-discharge process group, significance of difference p<0.05 (0%：P=0.029；5%：P=0.016；
10%：P=0.013；15%：P=0.023；20%：P=0.016)
(4) in discharge voltage 13.0kV, under conditions of discharge process time 4min, investigated different drought intensity (0%,
5%, 10%, 15% and 20%PEG addition) to wheat seed plumelet O2·-Impact, as shown in table 4, not discharging in experiment
Treatment group is matched group.Test result indicate that, matched group and discharge process group shoots of wheat O2·-Content increases with PEG dosage
And dramatically increase, illustrate that Middle altitude mountain increased the synthesis of peroxy radical ion in plumelet body.Additionally, with each matched group phase
Than plumelet O after discharge plasma process2·-Content decreases.After this explanation discharge process, peroxy radical is to plumelet
Injury weakens, and discharge process can improve resistivity of the plumelet to arid.
Shoots of wheat O before and after discharge process under 4. different drought strength condition of table2·-Change (1d)
* represent compared with non-discharge process group, significance of difference p<0.05 (0%：P=0.031；5%：P=0.047；
10%：P=0.034；15%：P=0.027；20%：p<0.01)
(5) after discharge plasma before processing Semen Tritici aestivi seed coat structure SEM photograph as shown in figure 3, wherein discharge process electricity
Press as 11kV.It can be seen that the Wheat Species skin without discharge plasma process is presented multiple edge contours clearly
Rectangle cell domain (Fig. 3 a)；And these rectangle cell domains become more soft after discharge plasma process, its edge wheel
It is wide to obscure and be difficult to distinguish (Fig. 3 b).Additionally, there is slight crack in Semen Tritici aestivi seed coat surface local after discharge plasma process, such as
Arrow indication in Fig. 3 d.This explanation Semen Tritici aestivi seed coat structure is discharged plasma active species oxidation, locally because active substance is attacked
Hit and be etched, this may promote wheat seed water suction, and then promote to sprout.
The above, preferably specific embodiment only of the invention, protection scope of the present invention not limited to this are any ripe
Those skilled in the art are known in the technical scope of present disclosure, the letter of the technical scheme that can be become apparent to
Altered or equivalence replacement are each fallen within protection scope of the present invention.
Claims (3)
1. it is a kind of improve shoots of wheat drought resistance device for treatment of seeds, it is characterised in that including Frequency Adjustable ac high voltage source,
Reactor and electric parameter detecting system, the crest voltage 0～50kV of range of accommodation of ac high voltage source 2, frequency 50～
1000Hz is adjustable；High-field electrode is stainless steel substrates；Quartz glass plate is close to immediately below high-field electrode, used as discharge medium；Gold
Category net is ground electrode.The high-pressure side of ac high voltage source 2 is connected with the high-field electrode of reactor 1, its low-pressure end and reactor 1
Ground electrode be connected.Digital oscilloscope 3, voltage probe 4 and current probe 5 collectively form electric parameter detecting system, detection
Discharge voltage and current signal.In experiment, the distance between high-field electrode and ground electrode are adjustable, and wheat seed is positioned over ground connection
On electrode.Carrier gas is supplied by gas cylinder 8, and its flow is controlled by effusion meter 7；Carrier gas through effusion meter 7 regulation and control after, from reactor 1
Entrance enters response system, discharges after then passing through wire netting；The tail gas of discharge is absorbed using KI absorbing liquids 9, and is surveyed with ozone
The examination detection gas phase residual ozone concentration of instrument 6.
2. it is according to claim 1 improve shoots of wheat drought resistance device for treatment of seeds, it is characterised in that the reaction
Device is screen cloth-board-like dielectric barrier discharge reactor.Wall of reactor 10 is lucite tube, and high-field electrode 11 is thick for 2mm
Stainless steel substrates, using mica sheet or quartz glass plate 12 as discharge medium, ground electrode 13 is fine and close stainless steel wire mesh,
On ground electrode 13, carrier gas is entered pending seed filling from dielectric barrier discharge reactor inlet 14, through after wire netting
Discharge from outlet 15.
3. it is a kind of improve shoots of wheat drought resistance method for treating seeds, it is characterised in that comprise the following steps：By dielectric impedance
Seed after discharge process is placed in 50ml triangular flasks is sterilized 10min with medical alcohol, presoaking and germinating after aseptic water washing 3 times；
Matched group is soaked seed using sterilized water, and drought stress group adopts Polyethylene Glycol PEG-6000 solution seed soakings；Seed is sucked with absorbent paper
Surface moisture, is uniformly placed in the culture dish of moistening, places Jing in advance and be sprayed to moistening but the flowing of no liquid in culture dish
Two panels qualitative filter paper, drought stress group sprinkling PEG-6000 solution, matched group sprinkling sterilized water, 50 kinds of each culture dish
Son, plus 10ml distilled water or solution；Seed is allowed to sprout naturally by being placed in after culture dish label in 20 DEG C of constant temperature and humidity illumination boxs
Send out, Normal group is poured daily with appropriate amounts of sterilized water, and drought stress group is sprayed PEG-6000 solution to keep germinating bed wet daily
Profit；A number of daily record germination, cultivates four days, takes out within the 4th day 15 seeds from every disk at random, measurement root length, bud length,
Fresh weight, dry weight etc., and calculate germination percentage, germinating energy, germination index, vitality index.
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| CN201610920417.9A CN106508170A (en) | 2016-10-21 | 2016-10-21 | Seed processing device and method for improving drought resistance of wheat buds |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610920417.9A CN106508170A (en) | 2016-10-21 | 2016-10-21 | Seed processing device and method for improving drought resistance of wheat buds |
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| CN106508170A true CN106508170A (en) | 2017-03-22 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107633993A (en) * | 2017-08-17 | 2018-01-26 | 南京市蔬菜科学研究所 | A kind of cold plasma double glow discharge vegetables and fruits device for treatment of seeds |
| CN107911931A (en) * | 2017-12-01 | 2018-04-13 | 南京苏曼等离子科技有限公司 | Atmospheric low-temperature plasma handles seed device and operating method |
| CN110036717A (en) * | 2019-05-16 | 2019-07-23 | 中国农业大学 | A kind of dielectric barrier discharge device for treatment of seeds |
| CN115943772A (en) * | 2022-12-23 | 2023-04-11 | 中国农业大学 | Negative pressure drainage type sliding arc discharge plasma seed treatment system and method |
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| CN115943772A (en) * | 2022-12-23 | 2023-04-11 | 中国农业大学 | Negative pressure drainage type sliding arc discharge plasma seed treatment system and method |
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